CN105891929A - Method for manufacturing optical film - Google Patents
Method for manufacturing optical film Download PDFInfo
- Publication number
- CN105891929A CN105891929A CN201610076537.5A CN201610076537A CN105891929A CN 105891929 A CN105891929 A CN 105891929A CN 201610076537 A CN201610076537 A CN 201610076537A CN 105891929 A CN105891929 A CN 105891929A
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- Prior art keywords
- base material
- liquid crystal
- cleaning
- roller
- film
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3016—Polarising elements involving passive liquid crystal elements
Abstract
An object of the invention is to manufacture an optical film having fewer defects with variation in local film thickness. In a method for manufacturing an optical film of the invention, a long substrate (1) having a film formation surface (11) and a back surface (12) is unwound from a winding body (2) of the flexible substrate, and after the back surface (12) of the substrate (1) is cleaned, the film formation surface (11) of the substrate (1) is coated with a liquid crystal material. A cleaning liquid is supplied between the back surface of the substrate and a cleaning roller (41), and the cleaning liquid is coated over the substrate by the cleaning roller, thereby cleaning the back surface of the substrate.
Description
Technical field
The present invention relates to the manufacture method of a kind of blooming employing liquid crystal material.
Background technology
The optical anisotropy of liquid crystal material is bigger than common resin material, is therefore using it for phase retardation film, polarization
In the case of the bloomings such as sheet, it is possible to reduce thickness, and slimming, the lightweight to device is favourable.By on film base material
Coating of liquid crystalline material (liquid crystal monomer and/or liquid crystal polymer), and carry out the polymerization of liquid crystal monomer, liquid crystal material as required
Orientation process, solvent remove (being dried) etc., form liquid crystal layer, thus manufacture liquid crystal optics film.
Following problems it is found that: the foreign matter etc. being attached on base material is mixed into coating layer and base material in the manufacture of blooming
In interface, coating layer, become optical defect.It addition, there is also following problems in utilizing the manufacture of blooming of liquid crystal material:
If there is foreign matter on base material, then produce orientation defect, protrusion defect at the liquid crystal being coated on.
Therefore, it is proposed to the method being coated liquid crystal material after the coated face of base material is carried out and removes foreign matter.
As the method removing the foreign matter being attached to base material, it is known that: use the method (such as patent document 1) of ultrasonic wave air, winding-up
The side that the method (such as patent document 2) of purge gas, the method (such as patent document 3) of washing base material contact with bond roll
Method (such as patent document 4) etc..
In the case of using to make liquid crystal molecule implement the base material of friction treatment along prescribed direction orientation, due to
A large amount of foreign matters are adhered to, therefore to remove attachment foreign matter and carry out cleaning treatment before the coating of liquid crystal material at substrate surface.
Owing to the surface of the base material implementing the orientation process such as friction be cannot be carried out clean, therefore generally use non-contacting cleaning side
Method.Such as Patent Document 5 discloses the surface irradiation ultraviolet radiation of the base material implementing orientation process is removed attachment different
The method of thing.
Prior art literature
Patent document
Patent document 1: Japanese Unexamined Patent Publication 10-309553 publication
Patent document 2: Japanese Unexamined Patent Publication 2009-66982 publication
Patent document 3: Japanese Unexamined Patent Publication 2007-105662 publication
Patent document 4: Japanese Unexamined Patent Publication 9-304621 publication
Patent document 5: Japanese Unexamined Patent Publication 2003-4948 publication
Summary of the invention
The problem that invention is to be solved
The blooming that the thickness of the coating layer being formed at base material as liquid crystal optics film is little produces point-like sometimes
Interfere the shortcoming (following, sometimes referred to as " point-like is uneven ") of inequality etc.According to the research of the present inventor etc., by base material
Surface (the formation face of liquid crystal layer) is carried out, and can reduce and be derived from the various of liquid crystal layer or liquid crystal layer and the interface of base material
Defect, but the generation number of point-like inequality is hardly visible change.
Studied further, result: the part of point-like inequality is occurring, and the thickness of film can locally diminish, sometimes
Periodically it is embodied on the carriage direction (MD) of base material, is estimated as by the impact being attached to caused by the foreign matter of applicator roll.To this end,
The present inventor etc. by make foreign matter removing blade (scraper) contact with applicator roll during coating of liquid crystalline material on base material into
The cleaning on row roller surface, has attempted the minimizing that point-like is uneven.But, in the method on cleaning roller surface, it is impossible to confirm clearly
The reducing effect that point-like is uneven.
In view of the foregoing, it is an object of the invention to: in the manufacture of the blooming forming liquid crystal layer on base material, reduce
The generation of " point-like is uneven " defect that locally thickness diminishes, obtains the blooming of high-quality.
For solving the means of problem
Study in view of the foregoing, found that: until the period of coating of liquid crystalline material after base material is extracted out, right
The masking face of base material and the face (back side) of opposition side carry out on-line cleaning, and thus point-like inequality reduces.The result of research further
Discovery carries out wet-cleaned simultaneously by utilizing cleaning fluid to make the back side of base material contact with roller, thus makes point-like inequality significantly subtract
Few, thus complete the present invention.
The present invention relates to employ the manufacture method of the blooming of liquid crystal material.Manufacture method at the blooming of the present invention
In, from the coiling body of flexible substrate by the base material debatching of long shape, downstream side transports (extraction operation) continuously.Base material has work
The first interarea for masking face and second interarea at the back side as masking face.In the manufacture method of the present invention, by base material
Second interarea cleans (matting), thereafter, and coating of liquid crystalline material (film making process) on the first interarea of base material.
In matting, between the back side of base material and cleaning roller, supply cleaning fluid, utilize and clean roller by cleaning fluid painting
Cloth is deployed on base material, is thus carried out.Clean roller and preferably on surface, there is relief pattern, wherein, bump maps is preferably used
The protuberance of case and the circumferencial direction of roller extend the cleaning roller of existence non-parallelly.Think: like this, in the present invention, by every
Cleaning fluid makes the cleaning roller rear-face contact with base material to carry out wet-cleaned, and the foreign matter at the back side thereby adhering to base material is removed
Going, point-like inequality reduces.
As the example cleaning roller used in the present invention, gravure roll, bar roller etc. can be enumerated.It addition, as cleaning
Liquid, is preferably used the high volatile liquid that boiling point is lower than water.
Invention effect
Manufacturing method according to the invention, it is possible to the generation obtaining " point-like is uneven " defect that thickness local diminishes is suppressed
The blooming of high-quality.
Accompanying drawing explanation
Fig. 1 is the schematic diagram of the embodiment representing blooming film forming apparatus.
Fig. 2 is the diagrammatic top view of the surface configuration for gravure roll is described.
Fig. 3 A is the diagrammatic top view of the surface configuration for bar roller is described.
Fig. 3 B is the sectional view of the B1-B2 line of the bar roller of Fig. 3 A.
Detailed description of the invention
Fig. 1 is the schematic diagram of an embodiment of the film forming apparatus used in the manufacture of the blooming representing the present invention.
In the film forming apparatus 100 shown in Fig. 1, the coiling body 2 of the base material of long shape is arranged at extraction unit 10.Base from coiling body 2 debatching
Material 1 transports to the downstream of film forming apparatus continuously from extraction unit 10, through deflector roll 51,52, to the downstream being arranged at deflector roll 52
The cleaning part 40 of side transports (extraction operation).At cleaning part 40, clean the back side (matting) of base material 1.Base after cleaning
Material 1 is swum side further downward and is transported, and through deflector roll 54, transports to masking portion 60, carries out the coating of liquid crystal material on base material
(film making process).
[base material]
As long as base material 1 has flexibility, base material that mechanical strength, heat endurance, water preventing ability etc. excellent is preferably used.Base
Material has the first interarea and the second interarea, forms liquid crystal layer on the first interarea.Hereinafter, in this manual, by the first interarea
It is referred to as in " masking face ", second interarea in the face as its opposition side is referred to as " back side ".
As base material, use such as resin molding, metal forming, paper, cloth and their duplexer etc..Wherein, put down due to surface
Slip is excellent and few from the generation of the foreign matter of base material itself, and resin molding is therefore preferably used.
As the resin material of composition base material film, polyethylene terephthalate, poly-naphthalenedicarboxylic acid ethylene glycol can be enumerated
The polyesters such as ester；The cellulose-based polymer such as diacetyl cellulose, triacetyl cellulose；The acrylic acid such as polymethyl methacrylate
Based polymer；The styrenic such as polystyrene, acrylonitritrile-styrene resin；Polyethylene, polypropylene, ethylene-propylene
The polyolefin such as copolymer；The cyclic polyolefins such as polynorbornene；The acid amides based polymer such as nylon, aromatic polyamide；Poly-carbonic acid
Ester；Vinyl chloride；Imide series polymer；Sulfone based polymer；Polyether sulfone；Polyether-ether-ketone；Polyphenylene sulfide；Vinyl alcohol system polymer；
Vinyl chloride；Epoxy polymer etc..Wherein, the resin material of solvent it is not dissolved in when being preferably used in coating of liquid crystalline material.
Base material can be water white transparency, it is also possible to for coloured or opaque.Base material is formed after liquid crystal layer, by base material with
The duplexer of liquid crystal layer as blooming for practicality in the case of, base material is preferably used the transparent and uniform base of optical characteristics
Material.
As long as base material has self-supporting and flexibility concurrently, its thickness is just not particularly limited.The thickness of base material is generally 20 μm
～200 about μm, preferably 30 μm～150 μm, more preferably 35 μm～100 μm.When forming liquid crystal layer in the flexible substrate such as film
In the case of, due to the limited length of base material, therefore, it is possible to the limited length of continuous masking.After extraction unit 10, masking
Reeling end (not shown), be arranged at the weight of the coiling body of pallet, the upper limit of diameter has determined that.Therefore, if the thickness of base material
Little, then continuous masking length can be made to become big, it is achieved the raising of productivity ratio.Therefore, without compromising on masking, the model of operability
In enclosing, the thickness of preferred substrates is the least.
On the other hand, according to the research of the present inventor, in the case of the thickness of base material is little, base material is formed with liquid crystal
It is observed that the uneven tendency occurring number to increase of point-like in the blooming of layer.On the other hand, as narration in detail below,
In the present invention, by cleaning the back side of base material before the coating of liquid crystal material by the method specified, even if thus at base material
In the case of thickness is little, it is also possible to the generation that suppression point-like is uneven.
In order to make liquid crystal molecule be orientated along prescribed direction, it is possible to use oriented substrate.As oriented substrate, stretching can be enumerated
Polymeric membrane, surface was carried out the film of friction treatment, possessed the film etc. of friction orientation film on surface.As alignment films, permissible
Use polyvinyl alcohol film, polyimides system film, polysiloxane series film, nature of glass macromolecule membrane etc..Friction treatment
Such as enter by carrying out friction on base material with the friction roller being wound with the friction cloth formed by the fine fibre such as artificial silk, cotton
OK.By adjusting the arrangement angles of friction roller, so that the carriage direction of base material keeps the angle of regulation with frictional direction, it is possible to
To make the blooming with various optical axis (differently-oriented directivity of liquid crystal molecule).
In the case of using friction treatment base material, the coiling body of the base material after friction treatment can be arranged at masking dress
Put the extraction unit 10 of 100, it is also possible in the friction treatment that untreated base material is carried out after extraction unit 10 is extracted out base material.From anti-
From the viewpoint of only foreign matter is mixed into liquid crystal layer, prevents operation from polluting, preferably the coiling body of the base material after friction treatment is arranged
Re-use after the extraction unit of film forming apparatus.When in the friction treatment that untreated base material is carried out after extraction unit is extracted out base material
In the case of, implement friction treatment after the extraction of base material and before cleaning treatment.
Furthermore, it is possible to the surface of base material film is carried out easy bonding process, demoulding process, antistatic treatment, resist blocking and that process
Deng process.It addition, for preventing the purposes such as adhesion, the end of the width of base material can be implemented stamp processing
(knurling, annular knurl) etc..
[liquid crystal material]
Liquid crystal material contains liquid crystal monomer or liquid crystal polymer or their mixture.Liquid crystal monomer and polymerizable mesogenic
Thing (sometimes they be referred to as and be recited as " liquid-crystal compounds ") can be the material of display thermotropic liquid crystal, it is also possible to molten for display
Cause the material of liquid crystal liquid crystal property.
As liquid crystal monomer, it is possible to use show the orientation such as nematic, smectic and at end, there is at least 1 propylene
The liquid crystal compounds of the polymerizable functional group such as unsaturated double-bond, epoxy radicals such as acyl group, methylacryloyl, vinyl.Contain
The liquid crystal material of liquid crystal monomer can also contain polymerization initiator in addition to liquid crystal monomer.Polymerization side as polymerizable liquid crystal monomer
Method, include, for example thermal polymerization, polymerizable ultraviolet etc., can use suitable polymerization initiator according to polymerization.
As liquid crystal polymer, it is possible to use the display liquid crystal aligning such as nematic, smectic, main chain liquid crystalline polymer
Or side chain liquid crystalline polymer or their compound liquid crystal compounds.The molecular weight of liquid crystal polymer there is no especially
Limiting, preferable weight-average molecular weight is the liquid crystal polymer of 2000～about 100000.
Chiral agent can also be contained by making the liquid crystal material of nematic or in the structure of liquid crystal polymer, import hand
Property composition and make liquid crystal material become cholesterol orientation.The kind of chiral agent, addition can be according to cholesterol liquid crystals
The setting value selecting reflection wavelength, helix pitch etc. suitably determines.
When coating of liquid crystalline material on base material, generally use the solution of liquid-crystal compounds.Make that liquid crystal material dissolves is molten
Agent suitably can determine according to the kind of the kind of liquid crystal material, base material.As the concrete example of solvent, can enumerate: chloroform, dichloro
The halogenated hydrocarbons such as methane, dichloroethanes, tetrachloroethanes, trichloro ethylene, tetrachloro-ethylene, chlorobenzene；The phenols such as phenol, parachlorophenol；
Benzene,toluene,xylene, methoxybenzene, 1,2-dimethoxy benzene etc. is aromatic hydrocarbon；Acetone, ethyl acetate, the tert-butyl alcohol, sweet
Oil, ethylene glycol, triethylene glycol, ethylene glycol monomethyl ether, diethylene glycol dimethyl ether, ethyl cellosolve, butyl cellosolve, 2-
Pyrrolidones, METHYLPYRROLIDONE, pyridine, triethylamine, oxolane, dimethylformamide, dimethylacetamide
Amine, dimethyl sulfoxide (DMSO), acetonitrile, butyronitrile, carbon disulfide etc..Solvent can be used in mixed way two or more.
In addition to polymerization initiator, chiral agent etc., liquid crystal material solution can also comprise as required pigment, levelling agent,
The additives such as plasticizer, ultra-violet absorber, anti-deterioration agent.The solid constituent of liquid crystal material solution, viscosity etc. can be according to liquid
The brilliant kind of material, molecular weight, the thickness of liquid crystal layer, film-forming method etc. are appropriately configured.
[cleaning part]
In the transport path of base material 1, between extraction unit 10 and masking portion 60, it is provided with cleaning part 40.At cleaning part
40, while make the back side 12 of base material 1 carry out wet-cleaned with cleaning roller 41 across cleaning fluid contact edge.Presumption in the present invention: will
Clean the cleaning fluid of supply between roller and substrate backside utilize clean roller on base material, be coated with expansion time, by cleaning fluid and
The interface of base material gives shearing force, can effectively clean and remove the foreign matter etc. being attached to base material, and point-like can be suppressed uneven.
In the mode shown in Fig. 1, cleaning part 40 possesses the support arranged in the way of contacting with the masking face 11 of base material 1
Roller 42 and the cleaning roller 41 arranged in the way of contacting with the back side 12 of base material 1.Cleaning fluid 47 it is stored with in cleaning dish 48,
The remainder that will attach to clean the cleaning fluid on the surface of roller 41 with scraping blade 44 is wiped off, and described cleaning fluid is drawn towards base material 1
The back side 12.
＜ cleans roller ＞
As cleaning roller 41, use rotor (comma roller), lick liquid roller (キ ス ロ Le), gravure roll, bar roller etc. molten
The various rollers used in liquid coating.Cleaning roller can be rotating roller, it is also possible to be not rotating roller.When cleaning roller is rotating roller, rotation
Turn direction can be rotate forward, counter-rotating any one.
From the viewpoint of the cleaning efficiency improving base material, preferably it is formed concavo-convex on the surface cleaning roller.Clean roller table
The preferred protuberance of relief pattern in face and the circumferencial direction of roller extend existence non-parallelly.By non-with the circumferencial direction cleaning roller 41
Extend parallel to the rear-face contact of the protuberance and the base material that exist, have more effectively to clean and remove the foreign matter being attached to base material
Deng the tendency that, suppression point-like is uneven.
Extend, as having, the roller of protuberance existed in direction nonparallel with circumferencial direction, can enumerate such as gravure roll,
Bar roller, graining roll etc..Owing to not making base material damage that cleaning fluid coating is deployed in substrate backside, the most particularly preferably use
Gravure roll and bar roller are as cleaning roller.
Fig. 2 is the top view of an example of the relief pattern shape on the surface showing gravure roll.On the surface of gravure roll 140 with
Pattern-like is formed with recess (intaglio plate ditch) 141 and protuberance 142.Think: when using gravure roll as cleaning roller, store at this recess
The liquid deposited contacts with substrate surface, and is attached to the foreign matter of substrate surface by being scraped with contacting of protuberance, thus
Remove foreign matter.It should be noted that in fig. 2, as intaglio pattern shape, it is illustrated that the pattern shape of quadrangle (Square type)
Shape, if but protuberance adipping extend exist, then the shape of intaglio pattern is not particularly limited, can be such as triangle,
The wire such as honeycomb type etc. are polygon-shaped, oblique line shape, curve shape.
Fig. 3 A is the top view of an example of the relief pattern shape on the surface representing bar roller 240, and Fig. 3 B is B1-B2 line
Sectional view.Bar roller is the roller that the fine rules such as line 242 spirally wind on the surface of roller main body (cylinder) 241, by carefully
Line 242, is formed at direction nonparallel with circumferencial direction and extends the protuberance existed.Think: using bar roller as cleaning roller
Time, the liquid in the storage of the gap of adjacent fine rule 242 contacts with substrate surface, and the foreign matter being attached to substrate surface passes through
It is scraped with the contacting of fine rule 242 spirally wound, thus removes foreign matter.It should be noted that in Fig. 3 A and B,
Illustrate a fine rule 242 and be wound in the form of cylinder, but bar can also be formed by a plurality of fine rule winding.Fine rule 242 is permissible
Wind very close to each otherly, also can wind at certain intervals.Preferably identical with the width of the fine rule journey in the adjacent interval between fine rule
Spend or below it.
The height of protuberance cleaning roller surface is not particularly limited, but with the protuberance of common gravure roll, bar roller etc.
Scope about the most preferably 0.1 μm～10 μm.If the height of protuberance is too small, cleaning performance becomes not fill the most sometimes
Point.On the other hand, if protrusion height is excessive, then the expansion thickness of cleaning fluid becomes big, and cleaning efficiency reduces or cleans the most sometimes
The dry needs of liquid are long-time, so that production efficiency reduces.
＜ cleaning fluid ＞
In matting, supply cleaning fluid between roller 41 and the back side 12 of base material 1 cleaning.By cleaning roller 41 and base
The back side 12 of material 1 contacts, and the backsize at base material launches cleaning fluid, is carried out.Cleaning fluid is liquid, if insoluble base
Material 1 is just not particularly limited, it is possible to use water, organic solvent, water and the mixture etc. of organic solvent.
From the viewpoint of on-line cleaning from effectively carrying out from extraction unit 10 to the delivery line in masking portion 60, preferably
Use low boiling and the high liquid of volatility as cleaning fluid.As high volatile liquid, can enumerate: methyl alcohol, ethanol, isopropyl
The alcohols such as alcohol；The ketone such as acetone, MEK；The halo alkanes such as chloroform, dichloromethane, dichloroethanes；Diethyl ether, ethylene-propylene ether, second
The ethers etc. such as base isopropyl ether.Alternatively, it is also possible to use the mixing of the mixture of these organic solvents, these organic solvents and water
Thing etc..It addition, for the purpose of raising of cleaning force etc., surfactant, hydrophily organic compound can be added in cleaning fluid
Thing etc..As hydrophilic organic compound, can enumerate and there is hydroxyl, amino, amide groups, imido grpup, imide, nitro, cyanogen
The organic compound of base, NCO, carboxyl, ester group, ether, carbonyl, sulfonic group, SO base etc..
＜ cleaning method ＞
As long as cleaning method will be deployed in base in the cleaning fluid coating cleaning supply between roller 41 and the back side 12 of base material 1
Method on material is just not particularly limited.Cleaning fluid is also not particularly limited to cleaning the method for supply between roller and base material.
The form (direct intagliotype) that cleaning roller 41 directly contacts with the cleaning fluid 47 in cleaning dish 48 in fig. 1 it is illustrated that send as an envoy to, but also
Can use such as: make other rollers (hectograph roller) contact with the cleaning fluid in cleaning dish, make to be attached to the cleaning on hectograph roller surface
Liquid cleans, to configure in the way of contacting with hectograph roller, the method (Offset gravure (offset gravure)) etc. that roller moves.Remove
Cleaning fluid is made to be attached to clean beyond the method on the surface of roller 41, it is also possible to before base material 1 contacts with cleaning roller 41, by profit
With slot die, spraying etc. be coated with at the back side 12 of base material 1 method of cloth cleaning fluid, the method making base material move in cleaning dish,
Spraying etc. is utilized to make cleaning fluid be attached to clean the method etc. on roller 41 surface and supply between roller 41 and the back side 12 of base material 1 cleaning
To cleaning fluid.
Base material 1 limit contacts with cleaning roller 41, and downstream side, limit (left side of Fig. 1) transports, and is therefore cleaning roller 41 and base material
Between the cleaning fluid of supply is inevitable launches in substrate surface coating.Clean roller 41 directly to contact, also with the back side 12 of base material 1
Can have gap.Clean about gap the most such as 0.1 μm～10 μm at the back side of roller and base material.When excesssive gap, roller
Diminish with the shearing force of base material interface when cleaning fluid contacts, there is the tendency that cleaning efficiency reduces.Clean roller at table
When mask has relief pattern, as it was previously stated, the height of the protuberance according to roller surface, can adjust cleaning the roller gap with base material
To desired scope.Clean roller when surface does not has relief pattern, can be according to cleaning the roller position relative with base material
Relation adjusts gap.
In fig. 1 it is illustrated that the back side 12 going out base material 1 contacts at cleaning part 40 with cleaning roller 41, masking face 11 and support roller
The forms of 42 contacts, if but constituted the transport of base material by the back side 12 of base material 1 with cleaning roller 41 in the way of cleaning fluid contacts
Path, then the support roller being not necessarily required in cleaning part 40.Replace propping up further, it is possible to use have irregular roller etc. on surface
Support roller 42, is carried out masking face 11 with the back side 12 of base material 1 simultaneously.
The base material 1 cleaned at the back side 12 at cleaning part 40 transports to masking portion 60 through deflector roll 54.It should be noted that
When being transported to masking portion 60 from cleaning part 40 by base material, can carry out being attached to being dried of cleaning fluid of substrate surface.It is dried
Method is not particularly limited, and can enumerate the method for winding-up clean gas, make base material pass through the method etc. in heated oven.
[masking portion]
In masking portion 60, coating of liquid crystalline material solution on the masking face 11 of base material 1, according to conventional method system
Film.In fig. 1 it is illustrated that the mould going out to employ extruding (extrusion) die head 61 is coated with machine.In this coating machine, while make base material 1
The back side 12 contact with supporting roller 62, while be coated with the liquid crystal material discharged from the die lip of die head 61 on the masking face of base material.Logical
Cross coating weight and the travelling speed of base material adjusting the liquid crystal material from die head, thus adjust the thickness of the film of liquid crystal material
Degree.
Film-forming method in masking portion 60 is not limited to die coating cloth, it is possible to use lick liquid roller coat cloth, intaglio plate coating, reversion painting
The various methods such as cloth, spraying, bar coating, airblade coating, showering.
The characteristic of the blooming employing liquid crystal material depends on the thickness of liquid crystal layer more.The delay of such as phase retardation film
Value, the anglec of rotation of optical axis of optically-active element, polarizer absorbance proportional to the thickness of liquid crystal layer.Therefore, in order to make light
The characteristic learning film is uniform, preferably makes uniform film thickness during masking.In order to make uniform film thickness, as it is shown in figure 1, preferably limit is with supporting roller
The back side 12 side-strut of base material 1 is filmed by 62.
On the other hand, if there is foreign matter supporting between roller 62 and the back side 12 of base material 1, then base material is made by this extruding
The masking face 11 of 1 is deformed into convex.Think: if coating of liquid crystalline material thereon, then the coating thickness office of the part of substrate deformation
Portion diminishes, and produces point-like uneven.On the other hand, in the present invention, by the back side 12 of base material 1 is carried out on-line cleaning, thus
Remove attachment foreign matter, even if therefore presumption also can suppress point-like inequality when base material side-strut is filmed by limit support roller
Occur.
Characteristic etc. according to objective optics film such as sets liquid in the way of dried thickness is about 0.1 μm～20 μm
The thickness of crystal layer.The thickness being usually present liquid crystal layer is the least, and the generation of point-like inequality is the most significantly inclined to.To this, in the present invention
In, by through above-mentioned matting, even if thus in the case of the thickness of liquid crystal layer after the drying is below 20 μm, also
The generation that point-like is uneven can be suppressed.Therefore, the manufacture method of the present invention is suitable for manufacturing the little liquid crystal light of thickness of coating layer
Learn film.
[operation after coating]
The film of the liquid crystal material of coating on the masking face 11 of base material 1 is transported together with base material 1 in drying oven 20,
Remove solvent, thus form film.In addition to being dried, it is also possible to carry out the polymerization etc. of the orientation process of liquid crystal molecule, liquid crystal monomer.
Such as use display thermotropic liquid crystal liquid crystal monomer in the case of, be heated to monomer display liquid crystalline phase temperature province with
On so that it is dried, it is cooled to show the temperature of the state of liquid crystalline phase, is irradiated by ultraviolet and be polymerized, thus enable that
The state of orientation of liquid crystal is fixed.It addition, lysotropic liquid crystal can also make liquid crystal molecule along regulation orientation by giving shear strength
Orientation.
Forming the base material after liquid crystal layer can be directly so that the base material state closely sealed with liquid crystal layer be batched.Can will be formed in
Liquid crystal layer on base material is transferred to other films or base material and liquid crystal layer is rolled up respectively after base material and liquid crystal layer being peeled off
Take.Furthermore it is possible to by the liquid crystal layer peeled off from base material or the liquid crystal layer that is needed on other films for being dried, orientation process,
Other operations such as stretching.
The liquid crystal layer batched using the state closely sealed with base material can with base material integratedly as blooming for practicality.Separately
Outward, it is also possible to so that the state that liquid crystal layer is sealed on base material is for other operations such as stretchings.Thereafter, can be by base material and liquid crystal
Layer uses as blooming integratedly, it is also possible to used as blooming by the liquid crystal layer peeled off from base material, or can also be by
Liquid crystal layer uses as blooming after being transferred on other films.Other coating layers can also be coated with further on liquid crystal layer
Deng.
Reduce due to the point-like inequality of the blooming of the present invention obtained like this and optical defect is few, therefore can conduct
The blooming of device used for image display uses.As the blooming of device used for image display, specifically, polarizer can be enumerated
Deng optical compensation films, polarizer, polaroid protective film etc..
Embodiment
The present invention will be described in more detail below to enumerate the embodiment of making about liquid crystal optics film, but the present invention
It is not limited to following embodiment.
[making example 1: employ the making of the negative C-plate of cholesteric liquid crystal material]
In making example 1A～1M, the polyester film (not carrying out friction treatment) of use thickness 75 μm is as base material film, and incites somebody to action
Following coating solution, on base material film, is fabricated to possess the negative C-plate formed by cholesteric liquid crystal layer and (selects back wave
Long: 200～220nm) blooming.
The preparation ＞ of the coating fluid of ＜ liquid crystal material
Nematic liquid crystal monomer by following: 90 weight portions,
[changing 1]
The polymerizable chiral agent of following formula: 10 weight portions,
[changing 2]
With UV polymerization initiator (trade name " Irgacure 907 " BASF AG's system): 5 weight portions are dissolved in MEK:
In 300 weight portions, it is prepared as the polymerizable liquid crystal material solution comprising chiral agent.
[making example 1A (embodiment)]
The coiling body of base material film is positioned over the extraction unit of film forming apparatus, while base material film is extracted out and moves it, Bian Jiang
Isopropanol is as cleaning fluid and makes gravure roll and the rear side of base material film rotated along the carriage direction rightabout with base material
Contact, thus carries out the cleaning of substrate backside.So that dried thickness reaches 2 μm on the masking face of base material after cleaning
Mode is coated with above-mentioned polymerizable liquid crystal material solution, after making it be dried 3 minutes at 70 DEG C, is cooled to room temperature, with 300mJ/cm2
Accumulated light irradiation ultraviolet radiation, thus make liquid crystal monomer solidify, the orientation of fixing liquid crystal molecule.The liquid crystal layer of gained coils into
Duplexer with base material film.
[making example 1B (embodiment)]
In above-mentioned making example 1A, in addition to the rear side of base material film, also in side, masking face also using isopropanol as cleaning fluid
It is carried out while make it contact gravure roll limit.That is, making in example 1B, while make the back side of gravure roll and base material film and masking face this
Two sides contact edge is carried out.Thereafter, with make carry out polymerizable liquid crystal material solution in the same manner as example 1A coating, be dried, cold
But irradiate with ultraviolet, base material film is formed liquid crystal layer.
[making example 1C, 1D (embodiment)]
Bar roller is used to replace gravure roll.In addition, after being carried out in the same manner as making example 1A, 1B, gather
The coating of conjunction property liquid crystal material solution, dry, cooling and ultraviolet irradiate, and form liquid crystal layer.That is, in making example 1C, while make
Bar roller is carried out with the rear-face contact limit of base material film, and in making example 1D, limit makes the two sides contact edge of bar roller and base material film
It is carried out.
[making example 1E (comparative example)]
The back side, the masking face of base material film is not carried out, carries out polymerizable liquid crystal material in the same manner as making example 1A
The coating of solution, dry, cooling and ultraviolet irradiate, and form liquid crystal layer on base material film.
[making example 1F (comparative example)]
In above-mentioned making example 1B, do not carry out the cleaning of the rear side of base material film, while make gravure roll only with the system of base material film
Face contact edge is carried out.Thereafter, with make carry out polymerizable liquid crystal material solution in the same manner as example 1A coating, be dried, cold
But irradiate with ultraviolet, base material film is formed liquid crystal layer.
[making example 1G (comparative example)]
In above-mentioned making example 1D, do not carry out the cleaning of the rear side of base material film, while make bar roller only with the system of base material film
Face contact edge is carried out.Thereafter, with make carry out polymerizable liquid crystal material solution in the same manner as example 1A coating, be dried, cold
But irradiate with ultraviolet, base material film is formed liquid crystal layer.
[making example 1H (comparative example)]
In the same manner as making example 1E, the back side, the masking face of base material film is not carried out, and as making example 1A
Ground carries out the coating of polymerizable liquid crystal material solution, dry, cooling and ultraviolet and irradiates, and forms liquid crystal layer on base material film.?
Make in example 1H, when the coating of polymerizable liquid crystal material solution, make scraper and contact with the support roller being connected on substrate backside, limit
Often clean support roller limit to be filmed.
[making example 1I (comparative example)]
By being changed to bond roll with the deflector roll of the rear-face contact of base material before the masking portion of next-door neighbour's film forming apparatus, pass through
The cleaning of substrate backside is carried out with contacting of bond roll.On the other hand, in making example 1I, do not carry out using and clean the clear of roller
Wash.In addition, carry out the coating of polymerizable liquid crystal material solution, dry, cooling and ultraviolet in the same manner as making example 1A to shine
Penetrate, base material film is formed liquid crystal layer.
[making example 1J (comparative example)]
The deflector roll contacted with the masking face of base material before the masking portion of next-door neighbour's film forming apparatus is changed to bond roll, logical
Cross and carry out the cleaning in base material masking face with contacting of bond roll.On the other hand, in making example 1J, do not carry out using and clean roller
Clean.In addition, the coating of polymerizable liquid crystal material solution, dry, cooling and ultraviolet are carried out in the same manner as making example 1A
Irradiate, base material film is formed liquid crystal layer.
[making example 1K (comparative example)]
By before the masking portion of next-door neighbour's film forming apparatus with the deflector roll of the rear-face contact of base material and contacting with masking face
Deflector roll is changed to bond roll respectively, by carrying out the back side and the cleaning in masking face of base material with contacting of bond roll.On the other hand,
In making example 1K, do not carry out using the cleaning cleaning roller.In addition, polymerizable liquid crystal material is carried out in the same manner as making example 1A
The coating of material solution, dry, cooling and ultraviolet irradiate, and form liquid crystal layer on base material film.
[making example 1L (comparative example)]
In the same manner as making example 1A, while as cleaning fluid and make it contact gravure roll isopropanol, base material film is cleaned on limit
Rear side.Thereafter, it is not coated with liquid crystal material solution, batches base material film (off-line cleaning) for the time being.Base material film after batching is again
It is positioned over film forming apparatus, the back side, the masking face of base material film is not carried out, carries out the painting of polymerizable liquid crystal material solution
Cloth, dry, cooling and ultraviolet irradiate, and form liquid crystal layer on base material film.
[making example 1M (comparative example)]
In above-mentioned making example 1L, use bar roller to replace gravure roll, the rear side of base material film is carried out off-line cleaning
After, batch base material film for the time being.Base material film after batching is positioned over film forming apparatus again, equal to the back side, the masking face of base material film
It is not carried out, carries out the coating of polymerizable liquid crystal material solution, dry, cooling and ultraviolet and irradiate, base material film is formed
Liquid crystal layer.
[evaluation]
In darkroom, to the blooming of gained in above-mentioned making example 1A～1M, to be laminated with liquid crystal layer on base material film
State irradiates white light from liquid crystal layer side, is visually confirmed to be and produces ring-type interference fringe with or without because of Thickness Variation in reflection light
Position.Count at 1m2Region in produce the number at position of ring-type interference fringe, as point-like not mean.?
In table 1, guide look illustrates cleaning condition and the point-like not mean of the base material made in example 1A～1M.
[table 1]
Making in example 1F, 1G, carrying out the cleaning in the masking face of base material, but with the making example 1E phase not being carried out
Ratio, does not observes the clearly change of point-like not mean.Even if it addition, cleaning making example 1H supporting roller and by masking face profit
In making example 1J cleaned with bond roll, do not observe the clearly change of point-like not mean yet.
On the other hand, having carried out online in making example 1A of Wafer Backside Cleaning～1D and making example 1I, 1K, point-like not mean is big
Width reduces.On the other hand, in off-line has carried out making example 1L of Wafer Backside Cleaning, 1M, do not observe the clear and definite of point-like not mean
Change.From these results: by the back side of on-line cleaning base material, thus point-like inequality is greatly decreased.
The every 1m in making example 1I of the Wafer Backside Cleaning of base material, 1K has been carried out by contacting with bond roll2Point-like not
Mean is respectively 7 and 6.At every 1m2Exist at 6 by point-like inequality cause bad time, if at the picture dimension of 5 inches
Image display device (every 1m2It is about 140) middle use blooming, then be equivalent to fraction defective about 4%.But, at picture dimension
When being 11 inches, fraction defective is about 20%, if picture dimension is more than 20 inches, fraction defective rises to about 100%.Therefore may be used
Know: when blooming is used for being formed large-scale image display device, under the cleaning utilizing bond roll, point-like inequality cause
Fraction defective is high, it is extremely difficult to obtain the sheet of the blooming of high-quality.
On the other hand, it is known that: as making example 1A～1D, by making roller contact with base material across cleaning fluid, carry out base
The wet-cleaned at the material back side, thus uneven almost without point-like, can obtain in the formation of large-scale image display device also
The blooming of the high-quality that can use aptly.
[making example 2: the making of the positive A sheet in friction substrate]
In making example 2A～2M, use the tri acetyl cellulose film of thickness 40 μm that surface is implemented friction treatment
As base material film, and by following coating solution on base material film, it is fabricated to possess the positive A sheet that formed by nematic liquid crystal layer
Blooming.
The preparation ＞ of the coating fluid of ＜ liquid crystal material
Liquid crystal monomer (trade name " Paliocolor LC242 " BASF AG's system) by display nematic liquid crystal phase: 100 weights
Amount part and Photoepolymerizationinitiater initiater (trade name " Irgacure 907 " BASF AG's system): 3 weight portions are dissolved in toluene 400 weight
Part, it is prepared as polymerizable liquid crystal material solution.
Friction treatment ＞ of ＜ base material
Utilize the method described in embodiment 1-1 of Japanese Unexamined Patent Publication 2006-235611 to implementing what saponification processed
The tri acetyl cellulose film of thickness 40 μm implements friction treatment.Rubbing angle tilts relative to the carriage direction of base material film
24.3°.For the base material after friction treatment, carrying out washing and dried, coiling into roll for the time being.
[making example 2A～2D (embodiment)]
The coiling body of the base material film through friction treatment is positioned over the extraction unit of film forming apparatus, while extracted out also by base material film
Moving it, limit carries out the cleaning of base material in the same manner as making example 1A～1D.So that doing on the masking face of base material after cleaning
Thickness after dry reaches the mode of 1 μm and is coated with above-mentioned polymerizable liquid crystal material solution, after making it be dried 2 minutes at 90 DEG C, cold
But room temperature is arrived, with 300mJ/cm2Accumulated light irradiation ultraviolet radiation, thus make liquid crystal monomer solidify, taking of fixing liquid crystal molecule
To.The liquid crystal layer of gained coils into the duplexer with base material film.
[making example 2E～2M (comparative example)]
The cleaning method of the base material through friction treatment is changed to the method as making example 1E～1M.Except this with
Outward, carry out the coating of polymerizable liquid crystal material solution, dry, cooling and ultraviolet in the same manner as above-mentioned making example 2A～2D to shine
Penetrate, base material film is formed liquid crystal layer.
[evaluation]
Utilize the evaluation method as above-mentioned making example 1, have rated and make the point of the blooming of gained in example 2A～2M
The number that shape is uneven.Evaluation result is shown in Table 2.
[table 2]
In making example 2E～2M, compared with making example 1E～1M, it was observed that the number of point-like inequality becomes many tendencies.Its
Reason is estimated as coming from the foreign matter (friction dregs etc.) produced when friction treatment and is attached to substrate surface.On the other hand, online
Carry out in making example 2A～the 2D of Wafer Backside Cleaning, as making example 1A～1D, do not observe that point-like is uneven.
From these results: no matter with or without friction treatment, the kind of liquid crystal material of base material, by utilizing the present invention's
Method carries out on-line cleaning to the back side of base material, thus obtains and the blooming of high-quality uneven almost without point-like.
Symbol description
1: base material
11: masking face (the first interarea)
12: the back side (the second interarea)
2: coiling body
10: extraction unit
20: drying oven
40: cleaning part
41: clean roller
42: support roller
44: scraping blade
47: cleaning dish
48: cleaning fluid
51,52,54: deflector roll
60: masking portion
61: die head
62: support roller
140: gravure roll
141: recess
142: protuberance
240: bar roller
241: cylinder
242: fine rule (protuberance)
Claims (4)
1. a manufacture method for blooming, it has:
Extract operation out, will be provided with the base material debatching of the long shape of the first interarea and the second interarea from the coiling body of flexible substrate, and to
Downstream is transported continuously；
Matting, is carried out the second interarea of described base material；With
Film making process, coating of liquid crystalline material on the first interarea of described base material,
In described matting, between second interarea and cleaning roller of described base material, supply cleaning fluid, utilize described cleaning
Described cleaning fluid is coated with expansion on base material by roller, thus carries out the cleaning of described base material.
The manufacture method of blooming the most according to claim 1, wherein,
Described cleaning roller has relief pattern on surface, and the protuberance of described relief pattern extends non-parallelly with the circumferencial direction of roller
Exist.
The manufacture method of blooming the most according to claim 2, wherein,
Described cleaning roller is gravure roll or bar roller.
4. according to the manufacture method of the blooming according to any one of claims 1 to 3, wherein,
Described cleaning fluid is the liquid that boiling point is lower than water.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202210561136.4A CN114791645A (en) | 2015-02-16 | 2016-02-03 | Method for manufacturing optical film |
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| Application Number | Priority Date | Filing Date | Title |
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| JP2015028071A JP6482891B2 (en) | 2015-02-16 | 2015-02-16 | Manufacturing method of optical film |
| JP2015-028071 | 2015-02-16 |
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| CN202210561136.4A Division CN114791645A (en) | 2015-02-16 | 2016-02-03 | Method for manufacturing optical film |
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| CN202210561136.4A Pending CN114791645A (en) | 2015-02-16 | 2016-02-03 | Method for manufacturing optical film |
| CN201610076537.5A Pending CN105891929A (en) | 2015-02-16 | 2016-02-03 | Method for manufacturing optical film |
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| CN202210561136.4A Pending CN114791645A (en) | 2015-02-16 | 2016-02-03 | Method for manufacturing optical film |
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|---|---|
| JP (1) | JP6482891B2 (en) |
| KR (1) | KR102353400B1 (en) |
| CN (2) | CN114791645A (en) |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106291785A (en) * | 2016-10-27 | 2017-01-04 | 宁波视睿迪光电有限公司 | Lens arra manufacture method and birefringent lens array |
| CN110691998A (en) * | 2017-06-13 | 2020-01-14 | 富士胶片株式会社 | Method for producing liquid crystal film and method for producing functional film |
| CN112138959A (en) * | 2019-06-28 | 2020-12-29 | 日东电工株式会社 | Method and apparatus for manufacturing polarizing plate |
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| JP6875964B2 (en) * | 2016-09-07 | 2021-05-26 | 東山フイルム株式会社 | Manufacturing method of long hard coat film for transparent conductive film |
| JP6859109B2 (en) * | 2017-01-18 | 2021-04-14 | 日東電工株式会社 | Polarizing plate with optical compensation layer and organic EL panel using it |
| JP6962210B2 (en) * | 2018-01-19 | 2021-11-05 | 株式会社リコー | Device that discharges liquid |
| JP2020166059A (en) * | 2019-03-28 | 2020-10-08 | 日本ゼオン株式会社 | Manufacturing method for liquid crystal hardening film |
| KR20220032587A (en) | 2019-08-16 | 2022-03-15 | 후지필름 가부시키가이샤 | Manufacturing method of optical film |
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- 2016-01-29 TW TW105102943A patent/TWI666304B/en active
- 2016-02-03 CN CN202210561136.4A patent/CN114791645A/en active Pending
- 2016-02-03 CN CN201610076537.5A patent/CN105891929A/en active Pending
- 2016-02-12 KR KR1020160016174A patent/KR102353400B1/en active IP Right Grant
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| JPH09304621A (en) * | 1996-05-17 | 1997-11-28 | Kanegafuchi Chem Ind Co Ltd | Production of phase difference film |
| CN1872546A (en) * | 2005-05-26 | 2006-12-06 | 日东电工株式会社 | Cleaning sheet and cleaning method for a screen printing plate |
| CN102224287A (en) * | 2008-11-25 | 2011-10-19 | 3M创新有限公司 | Apparatus and method for cleaning flexible webs |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN106291785A (en) * | 2016-10-27 | 2017-01-04 | 宁波视睿迪光电有限公司 | Lens arra manufacture method and birefringent lens array |
| CN110691998A (en) * | 2017-06-13 | 2020-01-14 | 富士胶片株式会社 | Method for producing liquid crystal film and method for producing functional film |
| CN110691998B (en) * | 2017-06-13 | 2021-11-16 | 富士胶片株式会社 | Method for producing liquid crystal film and method for producing functional film |
| CN112138959A (en) * | 2019-06-28 | 2020-12-29 | 日东电工株式会社 | Method and apparatus for manufacturing polarizing plate |
| CN112138959B (en) * | 2019-06-28 | 2024-01-12 | 日东电工株式会社 | Method and apparatus for producing polarizing plate |
Also Published As
| Publication number | Publication date |
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| TW201634671A (en) | 2016-10-01 |
| KR20160100834A (en) | 2016-08-24 |
| KR102353400B1 (en) | 2022-01-19 |
| JP2016150286A (en) | 2016-08-22 |
| JP6482891B2 (en) | 2019-03-13 |
| TWI666304B (en) | 2019-07-21 |
| CN114791645A (en) | 2022-07-26 |
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Application publication date: 20160824 |