CN105842997A - 一种动态气体锁的试验装置和试验方法 - Google Patents
一种动态气体锁的试验装置和试验方法 Download PDFInfo
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- CN105842997A CN105842997A CN201610390695.8A CN201610390695A CN105842997A CN 105842997 A CN105842997 A CN 105842997A CN 201610390695 A CN201610390695 A CN 201610390695A CN 105842997 A CN105842997 A CN 105842997A
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- 238000001900 extreme ultraviolet lithography Methods 0.000 abstract description 16
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
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- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Environmental & Geological Engineering (AREA)
- Plasma & Fusion (AREA)
- Sampling And Sample Adjustment (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
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CN201610390695.8A CN105842997B (zh) | 2016-06-03 | 2016-06-03 | 一种动态气体锁的试验装置和试验方法 |
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CN201610390695.8A CN105842997B (zh) | 2016-06-03 | 2016-06-03 | 一种动态气体锁的试验装置和试验方法 |
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CN105842997B CN105842997B (zh) | 2018-03-06 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107369600A (zh) * | 2017-07-31 | 2017-11-21 | 武汉华星光电技术有限公司 | 一种真空机台 |
CN111258340A (zh) * | 2020-03-13 | 2020-06-09 | 中国科学院长春光学精密机械与物理研究所 | 一种流量稳定的euv碳污染实验气体供气装置 |
CN111736431A (zh) * | 2020-06-15 | 2020-10-02 | 上海集成电路研发中心有限公司 | 一种更换动态气体锁的装置 |
CN113281463A (zh) * | 2021-04-02 | 2021-08-20 | 中国科学院微电子研究所 | 动态气体锁的测试装置及应用其测试的方法 |
CN114384145A (zh) * | 2021-12-27 | 2022-04-22 | 常熟市虞华真空设备科技有限公司 | 行星大气成分配比在线检测系统、混合系统和方法 |
Citations (6)
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---|---|---|---|---|
US20030197844A1 (en) * | 2002-02-01 | 2003-10-23 | Mertens Jeroen Johannes Sophia Maria | Lithographic apparatus and device manufacturing method |
CN1530756A (zh) * | 2003-02-12 | 2004-09-22 | Asml荷兰有限公司 | 包括气体冲洗系统的光刻装置 |
JP2013522866A (ja) * | 2010-03-12 | 2013-06-13 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射源、リソグラフィ装置およびデバイス製造方法 |
CN103399464A (zh) * | 2013-07-26 | 2013-11-20 | 中国科学院光电研究院 | 一种动态气体锁 |
US20150015856A1 (en) * | 2011-11-17 | 2015-01-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN104749893A (zh) * | 2013-12-30 | 2015-07-01 | 上海微电子装备有限公司 | 一种极紫外光刻设备投影系统的环境控制装置 |
-
2016
- 2016-06-03 CN CN201610390695.8A patent/CN105842997B/zh active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030197844A1 (en) * | 2002-02-01 | 2003-10-23 | Mertens Jeroen Johannes Sophia Maria | Lithographic apparatus and device manufacturing method |
CN1530756A (zh) * | 2003-02-12 | 2004-09-22 | Asml荷兰有限公司 | 包括气体冲洗系统的光刻装置 |
JP2013522866A (ja) * | 2010-03-12 | 2013-06-13 | エーエスエムエル ネザーランズ ビー.ブイ. | 放射源、リソグラフィ装置およびデバイス製造方法 |
US20150015856A1 (en) * | 2011-11-17 | 2015-01-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN103399464A (zh) * | 2013-07-26 | 2013-11-20 | 中国科学院光电研究院 | 一种动态气体锁 |
CN104749893A (zh) * | 2013-12-30 | 2015-07-01 | 上海微电子装备有限公司 | 一种极紫外光刻设备投影系统的环境控制装置 |
Non-Patent Citations (1)
Title |
---|
陈进新 等: ""极紫外真空动态气体锁流场分析与研究"", 《真空科学与技术学报》 * |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107369600A (zh) * | 2017-07-31 | 2017-11-21 | 武汉华星光电技术有限公司 | 一种真空机台 |
CN111258340A (zh) * | 2020-03-13 | 2020-06-09 | 中国科学院长春光学精密机械与物理研究所 | 一种流量稳定的euv碳污染实验气体供气装置 |
CN111258340B (zh) * | 2020-03-13 | 2021-06-29 | 中国科学院长春光学精密机械与物理研究所 | 一种流量稳定的euv碳污染实验气体供气装置 |
CN111736431A (zh) * | 2020-06-15 | 2020-10-02 | 上海集成电路研发中心有限公司 | 一种更换动态气体锁的装置 |
CN111736431B (zh) * | 2020-06-15 | 2023-03-03 | 上海集成电路研发中心有限公司 | 一种更换动态气体锁的装置 |
CN113281463A (zh) * | 2021-04-02 | 2021-08-20 | 中国科学院微电子研究所 | 动态气体锁的测试装置及应用其测试的方法 |
CN114384145A (zh) * | 2021-12-27 | 2022-04-22 | 常熟市虞华真空设备科技有限公司 | 行星大气成分配比在线检测系统、混合系统和方法 |
CN114384145B (zh) * | 2021-12-27 | 2024-04-12 | 常熟市虞华真空设备科技有限公司 | 行星大气成分配比在线检测系统、混合系统和方法 |
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Effective date of registration: 20200803 Address after: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee after: Institute of Microelectronics of the Chinese Academy of Sciences Address before: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee before: Aerospace Information Research Institute,Chinese Academy of Sciences Effective date of registration: 20200803 Address after: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee after: Aerospace Information Research Institute,Chinese Academy of Sciences Address before: 100094, No. 9 Deng Nan Road, Beijing, Haidian District Patentee before: Academy of Opto-Electronics, Chinese Academy of Sciences |