CN103399464A - 一种动态气体锁 - Google Patents
一种动态气体锁 Download PDFInfo
- Publication number
- CN103399464A CN103399464A CN2013103206529A CN201310320652A CN103399464A CN 103399464 A CN103399464 A CN 103399464A CN 2013103206529 A CN2013103206529 A CN 2013103206529A CN 201310320652 A CN201310320652 A CN 201310320652A CN 103399464 A CN103399464 A CN 103399464A
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- Prior art keywords
- spout
- stack shell
- dynamic gas
- central shaft
- chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 239000007789 gas Substances 0.000 claims description 74
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 5
- 229910052786 argon Inorganic materials 0.000 claims description 4
- 239000001307 helium Substances 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- 239000001257 hydrogen Substances 0.000 claims description 4
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims description 4
- 229910052757 nitrogen Inorganic materials 0.000 claims description 4
- 238000001900 extreme ultraviolet lithography Methods 0.000 abstract description 5
- 239000012535 impurity Substances 0.000 abstract description 5
- 238000009792 diffusion process Methods 0.000 abstract description 4
- 230000001154 acute effect Effects 0.000 abstract description 3
- 238000007664 blowing Methods 0.000 abstract 1
- 239000000126 substance Substances 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 239000003344 environmental pollutant Substances 0.000 description 4
- 231100000719 pollutant Toxicity 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 239000002912 waste gas Substances 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000740 bleeding effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 238000006552 photochemical reaction Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
- 210000000689 upper leg Anatomy 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
Landscapes
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310320652.9A CN103399464B (zh) | 2013-07-26 | 2013-07-26 | 一种动态气体锁 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201310320652.9A CN103399464B (zh) | 2013-07-26 | 2013-07-26 | 一种动态气体锁 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103399464A true CN103399464A (zh) | 2013-11-20 |
CN103399464B CN103399464B (zh) | 2015-04-08 |
Family
ID=49563112
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201310320652.9A Active CN103399464B (zh) | 2013-07-26 | 2013-07-26 | 一种动态气体锁 |
Country Status (1)
Country | Link |
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CN (1) | CN103399464B (zh) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104597115A (zh) * | 2015-02-12 | 2015-05-06 | 中国科学院光电研究院 | 极紫外辐照材料测试系统的真空获得装置及相应测试方法 |
CN105842997A (zh) * | 2016-06-03 | 2016-08-10 | 中国科学院光电研究院 | 一种动态气体锁的试验装置和试验方法 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009124660A1 (en) * | 2008-04-08 | 2009-10-15 | Asml Netherlands B.V. | Lithographic apparatus comprising a closing device and device manufacturing method using the same |
US20100002207A1 (en) * | 2008-06-13 | 2010-01-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN102782582A (zh) * | 2010-03-12 | 2012-11-14 | Asml荷兰有限公司 | 辐射源、光刻设备以及器件制造方法 |
CN103108480A (zh) * | 2012-11-22 | 2013-05-15 | 中国科学院微电子研究所 | 一种euv光源污染物收集装置 |
-
2013
- 2013-07-26 CN CN201310320652.9A patent/CN103399464B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2009124660A1 (en) * | 2008-04-08 | 2009-10-15 | Asml Netherlands B.V. | Lithographic apparatus comprising a closing device and device manufacturing method using the same |
US20100002207A1 (en) * | 2008-06-13 | 2010-01-07 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
CN102782582A (zh) * | 2010-03-12 | 2012-11-14 | Asml荷兰有限公司 | 辐射源、光刻设备以及器件制造方法 |
CN103108480A (zh) * | 2012-11-22 | 2013-05-15 | 中国科学院微电子研究所 | 一种euv光源污染物收集装置 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104597115A (zh) * | 2015-02-12 | 2015-05-06 | 中国科学院光电研究院 | 极紫外辐照材料测试系统的真空获得装置及相应测试方法 |
CN104597115B (zh) * | 2015-02-12 | 2019-03-19 | 中国科学院光电研究院 | 极紫外辐照材料测试系统的真空获得装置及相应测试方法 |
CN105842997A (zh) * | 2016-06-03 | 2016-08-10 | 中国科学院光电研究院 | 一种动态气体锁的试验装置和试验方法 |
CN105842997B (zh) * | 2016-06-03 | 2018-03-06 | 中国科学院光电研究院 | 一种动态气体锁的试验装置和试验方法 |
Also Published As
Publication number | Publication date |
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CN103399464B (zh) | 2015-04-08 |
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Effective date of registration: 20200814 Address after: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Patentee after: Institute of Microelectronics of the Chinese Academy of Sciences Address before: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee before: Aerospace Information Research Institute,Chinese Academy of Sciences Effective date of registration: 20200814 Address after: 100190, No. 19 West Fourth Ring Road, Beijing, Haidian District Patentee after: Aerospace Information Research Institute,Chinese Academy of Sciences Address before: 100094, No. 9 Deng Nan Road, Beijing, Haidian District Patentee before: Academy of Opto-Electronics, Chinese Academy of Sciences |
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