CN105761939A - 一种高比容电容负极箔及其制备的镀膜装置 - Google Patents
一种高比容电容负极箔及其制备的镀膜装置 Download PDFInfo
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- 239000011888 foil Substances 0.000 title claims abstract description 42
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 26
- 239000003990 capacitor Substances 0.000 title abstract description 11
- 239000007888 film coating Substances 0.000 title abstract 5
- 238000009501 film coating Methods 0.000 title abstract 5
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims abstract description 23
- 238000009504 vacuum film coating Methods 0.000 claims abstract description 23
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 21
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 17
- 239000010439 graphite Substances 0.000 claims abstract description 17
- 238000005096 rolling process Methods 0.000 claims abstract description 12
- 239000005030 aluminium foil Substances 0.000 claims description 25
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 14
- 238000000576 coating method Methods 0.000 claims description 14
- 239000010936 titanium Substances 0.000 claims description 14
- 229910052719 titanium Inorganic materials 0.000 claims description 14
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 13
- 238000004544 sputter deposition Methods 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- 150000002829 nitrogen Chemical class 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 7
- 229910052782 aluminium Inorganic materials 0.000 abstract description 7
- 229910052799 carbon Inorganic materials 0.000 abstract description 4
- 238000002474 experimental method Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract 1
- 239000007787 solid Substances 0.000 abstract 1
- 238000001771 vacuum deposition Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 210000002469 basement membrane Anatomy 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002848 electrochemical method Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
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Abstract
本发明公开了一种高比容电容负极箔,具有铝箔,所述铝箔的表面溅射有氮化钛层,氮化钛层的表面溅射有氮化钛和石墨的混合层。本发明的高比容电容负极箔,实验测试表明:氮化钛层与铝箔表面结合牢固,氮化钛和石墨的混合层与氮化钛层结合牢固,在作为负极箔时,同比电容量达到铝箔的数倍、高于碳箔,具有比铝箔更低的阻抗和损耗,尤其适合制作固态电容器和大容量电解电容器,具有体积小、寿命长、热稳定性好的特点。本发明同时还公开了制备该高比容电容负极箔的镀膜装置,主要包括真空放卷室、第一真空镀膜室、第二真空镀膜室和真空收卷室,本镀膜装置从放卷到收卷可以实现连续镀膜,镀膜速度快、生产效率高。
Description
技术领域
本发明涉及一种高比容电容负极箔,本发明还涉及到制备该高比容电容负极箔的镀膜装置。
背景技术
以往电容器负极箔主要有两种形式,一种是纯铝箔经过电化学方法将表面腐蚀,直接用来作负极箔;另一种是在铝箔上涂上薄薄石墨胶体后烘干作为负极箔使用。
从性能上来讲,腐蚀的铝箔作为负极箔,电容量小、阻抗高、损耗值大,因此该负极箔只能做一些传流电解电容,并且腐蚀的铝箔作为负极箔体积大、寿命短、不稳定。而碳箔比起腐蚀铝箔的负极箔性能有较大改善,电容量高于铝箔数倍,并且阻抗小、损耗值小,但制造成本高,生产效率低,因此碳箔常用来制成一些高端固态电容器,具有体积小、寿命长、热稳定性好的特点。
发明内容
本发明要解决的技术问题是提供一种作为负极箔时电容量高、阻抗小、损耗值小且容易加工制造的高比容电容负极箔,本发明同时还提供制备该高比容电容负极箔的镀膜装置。
为解决上述技术问题,本发明中的高比容电容负极箔,具有铝箔,所述铝箔的表面溅射有氮化钛层,氮化钛层的表面溅射有氮化钛和石墨的混合层。
采用上述结构的高比容电容负极箔,实验测试表明:氮化钛层与铝箔表面结合牢固,氮化钛和石墨的混合层与氮化钛层结合牢固,可以通过磁控钛靶及磁控石墨靶溅射的方式在铝箔基膜上镀膜,制造成本低且生产效率高;另外本发明产品在作为负极箔时,同比电容量达到铝箔的数倍、高于碳箔,具有比铝箔更低的阻抗和损耗,尤其适合制作固态电容器和大容量电解电容器,具有体积小、寿命长、热稳定性好的特点。
为解决上述技术问题,本发明中的制备高比容电容负极箔的镀膜装置,包括真空放卷室、第一真空镀膜室、第二真空镀膜室和真空收卷室,所述真空放卷室内设有放卷机构,真空收卷室内设有收卷机构,铝箔从所述放卷机构开始,经第一真空镀膜室和第二真空镀膜室,由所述收卷机构收卷;所述第一真空镀膜室内位于铝箔的上、下方均布设有多个磁控钛靶,第二真空镀膜室内位于铝箔的上、下方均布设有多个磁控钛靶和磁控石墨靶;还包括充氮气装置,该充氮气装置通过管线与所述第一、二真空镀膜室相连通。
作为本发明中制备高比容电容负极箔的镀膜装置的改进,位于所述第二真空镀膜室内的磁控钛靶的数量多于磁控石墨靶的数量。
采用上述结构的制备高比容电容负极箔的镀膜装置,在所述第一真空镀膜室内磁控钛靶溅射的钛与氮气发生化学反应生成氮化钛在铝箔表面形成一层氮化钛膜,在第二真空镀膜室内磁控钛靶溅射的钛与氮气发生化学反应生成氮化钛,加上磁控石墨靶溅射的石墨在铝箔表面氮化钛层的基础上形成一层氮化钛和石墨的混合层,本镀膜装置从放卷到收卷可以实现连续镀膜,镀膜速度快、生产效率高。
附图说明
下面结合附图对本发明作进一步地详细说明。
图1是本发明中高比容电容负极箔的剖视结构示意图。
图2是本发明中制备高比容电容负极箔的镀膜装置的结构组成示意图。
具体实施方式
首先参见图1,本发明的高比容电容负极箔,具有铝箔1,所述铝箔1的表面溅射有氮化钛层2,氮化钛层2的表面溅射有氮化钛和石墨的混合层3。
再参见图2,图2示出了制备高比容电容负极箔的镀膜装置的结构组成示意图,本发明的镀膜装置包括真空放卷室10、第一真空镀膜室20、第二真空镀膜室30和真空收卷室40,所述真空放卷室10内设有放卷机构11,真空收卷室40内设有收卷机构41,铝箔1从所述放卷机构11开始,经第一真空镀膜室20和第二真空镀膜室30,由所述收卷机构41收卷;所述第一真空镀膜室20内位于铝箔1的上、下方均布设有多个磁控钛靶21,第二真空镀膜室30内位于铝箔1的上、下方均布设有多个磁控钛靶21和磁控石墨靶31;还包括充氮气装置50,该充氮气装置50通过管线与所述第一、二真空镀膜室20、30相连通。位于所述第二真空镀膜室30内的磁控钛靶21的数量多于磁控石墨靶31的数量。
Claims (3)
1.一种高比容电容负极箔,具有铝箔(1),其特征在于:所述铝箔(1)的表面溅射有氮化钛层(2),氮化钛层(2)的表面溅射有氮化钛和石墨的混合层(3)。
2.一种制备权利要求1所述高比容电容负极箔的镀膜装置,其特征在于:包括真空放卷室(10)、第一真空镀膜室(20)、第二真空镀膜室(30)和真空收卷室(40),所述真空放卷室(10)内设有放卷机构(11),真空收卷室(40)内设有收卷机构(41),铝箔(1)从所述放卷机构(11)开始,经第一真空镀膜室(20)和第二真空镀膜室(30),由所述收卷机构(41)收卷;所述第一真空镀膜室(20)内位于铝箔(1)的上、下方均布设有多个磁控钛靶(21),第二真空镀膜室(30)内位于铝箔(1)的上、下方均布设有多个磁控钛靶(21)和磁控石墨靶(31);还包括充氮气装置(50),该充氮气装置(50)通过管线与所述第一、二真空镀膜室(20、30)相连通。
3.如权利要求2所述的制备高比容电容负极箔的镀膜装置,其特征在于:位于所述第二真空镀膜室(30)内的磁控钛靶(21)的数量多于磁控石墨靶(31)的数量。
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
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CN108400177A (zh) * | 2018-03-14 | 2018-08-14 | 河南科技大学 | 一种电池电极用金属化类石墨膜层及其制备方法 |
CN110706930A (zh) * | 2019-08-20 | 2020-01-17 | 深圳云容新能源有限公司 | 一种高压固液混合型铝电解电容器及其制备方法 |
CN111197156A (zh) * | 2020-02-21 | 2020-05-26 | 王殿儒 | 一种多弧型带材真空连续镀膜系统 |
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CN111197156B (zh) * | 2020-02-21 | 2022-07-08 | 王殿儒 | 一种多弧型带材真空连续镀膜系统 |
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