CN105676590A - Photosensitive resin - Google Patents
Photosensitive resin Download PDFInfo
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- CN105676590A CN105676590A CN201610221249.4A CN201610221249A CN105676590A CN 105676590 A CN105676590 A CN 105676590A CN 201610221249 A CN201610221249 A CN 201610221249A CN 105676590 A CN105676590 A CN 105676590A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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Abstract
The invention relates to photosensitive resin.The photosensitive resin is prepared from, by mass, 20-30 parts of epoxy-acrylic resin, 20-30 parts of maleic anhydride, 1-6 parts of catalyst N,N-dimethylethanolamine, 10-20 parts of a photopolymerization initiator, 4-8 parts of water dispersion latex, 1-5 parts of rubber, 4-10 parts of inorganic additives with surfaces modified by organosilane and 60-80 parts of a solvent.The water development speed of the resin can be increased through the water dispersion latex, and meanwhile the image reproducibility is improved; due to the photopolymerization initiator, a liquid crystal display screen manufactured by adopting the resin has the high-quality imaging; in addition, the preparation method of the photosensitive resin is simple and controllable in technological process, short in production period, capable of sufficiently utilizing heat generated by a chemical reaction in the resin synthetizing process, capable of saving energy sources and free of three wastes.
Description
Technical field
The present invention relates to field of photoelectric technology, namely relate to liquid crystal display colored filter; Particularly to a kind of photosensitive resin field.
Background technology
Thin Film Transistor-LCD (TFT-LCD) is configured with the glass substrate of tft array with the glass substrate with colored filter with preset space length lamination, liquid crystal is infused between above-mentioned two glass substrates, thus forming panel, apply the signal of telecommunication to this panel, to provide display.
Light source according to backlight, above-mentioned LCD can be divided into reflective, transmission-type and transflective. Reflective LCD reflects external light source and used as backlight, thus needing preset reflecting plate, and transmission type LCD adopts internal light source as backlight, namely adopts the light of back light unit self.
Transflective LCD is the form combined with reflective LCD and transmission type LCD, adopts external light source and internal light source. Because transflective LCD is provided with reflecting plate and back light unit, so using on the one hand by the exterior light of baffle reflection, use the interior lights launched from back light unit on the other hand.
When the brightness ratio periphery illumination of LCD is not high, display performance is likely to be due to the difference of contrast and reduces. In order to solve this problem, exist and utilize the transflective LCD method partly using exterior light and the method improving transmission type LCD self brightness. Because utilizing exterior light can improve brightness under a bright ambient environment, so transflective LCD has advantage, but transflective LCD has a problem in that, the reflector element worked in this reflection mode constitutes the 50% of whole open regions (openingarea), and efficiency is very low in reflective mode, to the degree lower than 5%, undesirably reduce brightness in dark conditions.
Display panels includes two panels glass substrate: Array substrate and colored filter ColorFilter(CF), wherein Array substrate includes TFT device and peripheral circuit, colored filter includes R, G, B color layers, then by two plate bases to box. Owing to there is deviation when to box, it is necessary to what increase black matrix (BM) arranges live width to avoid box deviation is caused light leak, and the design live width of the BM increased just reduces aperture opening ratio naturally, affects display effect. COA(ColorFilteronArray) structure can solve this problem, makes chromatic filter layer on the Array substrate that TFT element manufacturing completes, it is to avoid error during to box, therefore BM can be designed as narrow linewidth, improves aperture opening ratio.But, coated currently used as the Photosensitve resin composition for colourama resist, exposure, after development, it is impossible to forms the via at flat grade angle, and makes ITO bad in the attachment of via medial surface.
Accordingly, it would be desirable to exploitation promotes pattern to be formed and the Photosensitve resin composition good with ITO tack.
Summary of the invention
The technical problem to be solved in the present invention is to provide and a kind of promotes that pattern is formed and the photosensitive resin good with ITO tack.
In order to solve above-mentioned technical problem, the technical solution used in the present invention is, this photosensitive resin, component including following mass fraction: epoxy acrylic resin 20 ~ 30, maleic anhydride 20 ~ 30 parts, catalyst n, N-dimethylethanolamine 1 ~ 6 part, Photoepolymerizationinitiater initiater 10 ~ 20 parts, water-dispersed latices 4 ~ 8 parts, rubber 1 ~ 5 part, through the inorganic additive 4 ~ 10 parts of organosilan surfaction and solvent 60 ~ 80 parts.
Preferred version as the present invention, component including following mass fraction: epoxy acrylic resin 25, maleic anhydride 20 parts, catalyst n, N-dimethylethanolamine 5 parts, Photoepolymerizationinitiater initiater 14 parts, water-dispersed latices 6 parts, rubber 4 parts, through the inorganic additive 6 parts of organosilan surfaction and solvent 70 parts.
By technique scheme, the water development speed of resin can be improved by water-dispersed latices, improve the repeatability of image simultaneously; Photoepolymerizationinitiater initiater can make the LCDs that this resin of employing makes have high-quality imaging; Wherein inorganic additive is metal-oxide; In addition the not only technological process of the preparation method of this photosensitive resin is simply controlled, with short production cycle, and in resin synthesis process, makes full use of the heat that chemical reaction produces, the energy-conservation energy and producing without the three wastes.
Further improvement is that, described solvent is one or more combinations in formic acid, acetic acid, chloroform, acetone, butanone, fatty alcohol, glycol monoethyl ether, ethylene glycol monoethyl ether, ethylene glycol ether, ethylene glycol monobutyl ether.
Further improvement is that, described water-dispersed latices is Photoepolymerizationinitiater initiater is one or both combinations in alkyl phenones type, 1-Phenylethanone. type, Benzoinum ether type, benzophenone type, thioxanthone type, anthraquinone type and benzylic type.
Further improvement is that, one or more combinations in described polybutadiene latex, natural rubber latex, SB latex, acrylonitrile-butadiene copolymer latex.
The present invention also to solve the technical problem that and be to provide a kind of preparation method promoting pattern formation and the photosensitive resin good with ITO tack.
In order to solve above-mentioned technical problem, the technical solution used in the present invention is, the preparation method of photosensitive resin specifically comprises the following steps that
(1) at normal temperatures, all raw material is weighed by weight ratio, stand-by;
(2) at normal temperatures, by maleic anhydride, epoxy acrylic resin and catalyst n, N-dimethylethanolamine adds after the 50% of solvent total amount is dissolved and mixes to be sufficiently stirred for again makes its mix homogeneously;
(3) in the solution of the mix homogeneously of gained in step (2), add water-dispersed latices to stir, then transpiring moisture in the drying machine that heating-up temperature is 100 ~ 110 DEG C;
(4) add in the mixed solution in step (3) Photoepolymerizationinitiater initiater, rubber, after the inorganic additive of organosilan surfaction and 50% mixed dissolution of solvent total amount and be sufficiently stirred for and make its mix homogeneously, it is then placed in mixing roll, mixing at least 2 hours, then at 25 DEG C, namely maintenance obtained photosensitive resin after at least 18 hours.
Compared with prior art, the invention have the advantages that: the water development speed of resin can be improved by water-dispersed latices, improve the repeatability of image simultaneously; Photoepolymerizationinitiater initiater can make the LCDs that this resin of employing makes have high-quality imaging; In addition the not only technological process of the preparation method of this photosensitive resin is simply controlled, with short production cycle, and in resin synthesis process, makes full use of the heat that chemical reaction produces, the energy-conservation energy and producing without the three wastes.
Detailed description of the invention
Embodiment 1: proportioning raw materials is: epoxy acrylic resin 25, maleic anhydride 20 parts, catalyst n, N-dimethylethanolamine 5 parts, Photoepolymerizationinitiater initiater 14 parts, water-dispersed latices 6 parts, rubber 4 parts, through the inorganic additive 6 parts of organosilan surfaction and solvent 70 parts.
Concrete preparation process is as follows:
(1) at normal temperatures, all raw material is weighed by weight ratio, stand-by;
(2) at normal temperatures, by maleic anhydride, epoxy acrylic resin and catalyst n, N-dimethylethanolamine adds after the 50% of solvent total amount is dissolved and mixes to be sufficiently stirred for again makes its mix homogeneously;
(3) in the solution of the mix homogeneously of gained in step (2), add water-dispersed latices to stir, then transpiring moisture in the drying machine that heating-up temperature is 100 DEG C;
(4) add in the mixed solution in step (3) Photoepolymerizationinitiater initiater, rubber, after the inorganic additive of organosilan surfaction and 50% mixed dissolution of solvent total amount and be sufficiently stirred for and make its mix homogeneously, it is then placed in mixing roll, mixing 4 hours, then at 25 DEG C, namely maintenance obtained photosensitive resin after 24 hours.
Embodiment 2:
Proportioning raw materials is: epoxy acrylic resin 20, maleic anhydride 25 parts, catalyst n, N-dimethylethanolamine 3 parts, Photoepolymerizationinitiater initiater 10 parts, water-dispersed latices 8 parts, rubber 2 parts, through the inorganic additive 4 parts of organosilan surfaction and solvent 60 parts.
Concrete preparation process is as follows:
(1) at normal temperatures, all raw material is weighed by weight ratio, stand-by;
(2) at normal temperatures, by maleic anhydride, epoxy acrylic resin and catalyst n, N-dimethylethanolamine adds after the 50% of solvent total amount is dissolved and mixes to be sufficiently stirred for again makes its mix homogeneously;
(3) in the solution of the mix homogeneously of gained in step (2), add water-dispersed latices to stir, then transpiring moisture in the drying machine that heating-up temperature is 100 DEG C;
(4) add in the mixed solution in step (3) Photoepolymerizationinitiater initiater, rubber, after the inorganic additive of organosilan surfaction and 50% mixed dissolution of solvent total amount and be sufficiently stirred for and make its mix homogeneously, it is then placed in mixing roll, mixing 6 hours, then at 25 DEG C, namely maintenance obtained photosensitive resin after 30 hours.
Embodiment 3: proportioning raw materials is: epoxy acrylic resin 30, maleic anhydride 30 parts, catalyst n, N-dimethylethanolamine 6 parts, Photoepolymerizationinitiater initiater 20 parts, water-dispersed latices 8 parts, rubber 5 parts, through the inorganic additive 10 parts of organosilan surfaction and solvent 80 parts.
Concrete preparation process is as follows:
(1) at normal temperatures, all raw material is weighed by weight ratio, stand-by;
(2) at normal temperatures, by maleic anhydride, epoxy acrylic resin and catalyst n, N-dimethylethanolamine adds after the 50% of solvent total amount is dissolved and mixes to be sufficiently stirred for again makes its mix homogeneously;
(3) in the solution of the mix homogeneously of gained in step (2), add water-dispersed latices to stir, then transpiring moisture in the drying machine that heating-up temperature is 110 DEG C;
(4) add in the mixed solution in step (3) Photoepolymerizationinitiater initiater, rubber, after the inorganic additive of organosilan surfaction and 50% mixed dissolution of solvent total amount and be sufficiently stirred for and make its mix homogeneously, it is then placed in mixing roll, mixing 8 hours, then at 25 DEG C, namely maintenance obtained photosensitive resin after 36 hours.
Finally, in addition it is also necessary to be only several specific embodiments of the present invention it is noted that listed above. It is clear that the invention is not restricted to above example, it is also possible to there are many deformation. All deformation that those of ordinary skill in the art can directly derive from present disclosure or associate, are all considered as protection scope of the present invention.
Claims (5)
1. a photosensitive resin, it is characterized in that, component including following mass fraction: epoxy acrylic resin 20 ~ 30, maleic anhydride 20 ~ 30 parts, catalyst n, N-dimethylethanolamine 1 ~ 6 part, Photoepolymerizationinitiater initiater 10 ~ 20 parts, water-dispersed latices 4 ~ 8 parts, rubber 1 ~ 5 part, through the inorganic additive 4 ~ 10 parts of organosilan surfaction and solvent 60 ~ 80 parts.
2. photosensitive resin according to claim 1, it is characterized in that, component including following mass fraction: epoxy acrylic resin 25, maleic anhydride 20 parts, catalyst n, N-dimethylethanolamine 5 parts, Photoepolymerizationinitiater initiater 14 parts, water-dispersed latices 6 parts, rubber 4 parts, through the inorganic additive 6 parts of organosilan surfaction and solvent 70 parts.
3. photosensitive resin according to claim 2, it is characterized in that, described solvent is one or more combinations in formic acid, acetic acid, chloroform, acetone, butanone, fatty alcohol, glycol monoethyl ether, ethylene glycol monoethyl ether, ethylene glycol ether, ethylene glycol monobutyl ether.
4. photosensitive resin according to claim 3, it is characterized in that, described water-dispersed latices is Photoepolymerizationinitiater initiater is one or both combinations in alkyl phenones type, 1-Phenylethanone. type, Benzoinum ether type, benzophenone type, thioxanthone type, anthraquinone type and benzylic type.
5. photosensitive resin according to claim 4, it is characterised in that one or more combinations in described polybutadiene latex, natural rubber latex, SB latex, acrylonitrile-butadiene copolymer latex.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610221249.4A CN105676590A (en) | 2016-04-12 | 2016-04-12 | Photosensitive resin |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610221249.4A CN105676590A (en) | 2016-04-12 | 2016-04-12 | Photosensitive resin |
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| Publication Number | Publication Date |
|---|---|
| CN105676590A true CN105676590A (en) | 2016-06-15 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201610221249.4A Pending CN105676590A (en) | 2016-04-12 | 2016-04-12 | Photosensitive resin |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107145036A (en) * | 2017-05-19 | 2017-09-08 | 合肥市惠科精密模具有限公司 | A kind of Thin Film Transistor-LCD photosensitive resin |
| CN109856913A (en) * | 2019-01-29 | 2019-06-07 | 晟光科技股份有限公司 | A kind of photoresist and its photoetching process applied to OGS touch screen |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102792223A (en) * | 2010-03-25 | 2012-11-21 | 东海橡塑工业株式会社 | Photosensitive resin composition, printing plate precursor and flexographic printing plate |
| CN102981367A (en) * | 2012-12-05 | 2013-03-20 | 北京化工大学常州先进材料研究院 | Photosensitive composition containing 4-(2,4,6-trimethyl benzene formyl) diphenyl sulfide as photoinitiator |
-
2016
- 2016-04-12 CN CN201610221249.4A patent/CN105676590A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102792223A (en) * | 2010-03-25 | 2012-11-21 | 东海橡塑工业株式会社 | Photosensitive resin composition, printing plate precursor and flexographic printing plate |
| CN102981367A (en) * | 2012-12-05 | 2013-03-20 | 北京化工大学常州先进材料研究院 | Photosensitive composition containing 4-(2,4,6-trimethyl benzene formyl) diphenyl sulfide as photoinitiator |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107145036A (en) * | 2017-05-19 | 2017-09-08 | 合肥市惠科精密模具有限公司 | A kind of Thin Film Transistor-LCD photosensitive resin |
| CN109856913A (en) * | 2019-01-29 | 2019-06-07 | 晟光科技股份有限公司 | A kind of photoresist and its photoetching process applied to OGS touch screen |
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Application publication date: 20160615 |