CN106324880B - The production method of crystal liquid substrate - Google Patents
The production method of crystal liquid substrate Download PDFInfo
- Publication number
- CN106324880B CN106324880B CN201610891063.XA CN201610891063A CN106324880B CN 106324880 B CN106324880 B CN 106324880B CN 201610891063 A CN201610891063 A CN 201610891063A CN 106324880 B CN106324880 B CN 106324880B
- Authority
- CN
- China
- Prior art keywords
- substrate
- area
- transparent area
- organic coating
- exposure region
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133357—Planarisation layers
Abstract
The present invention provides a kind of production method of crystal liquid substrate, organic insulation flatness layer is formed on color filter film using halftone mask technology, so that the corresponding height being located in the blue pixel area of organic insulation flatness layer is located at the red pixel area than corresponding, height in green pixel area is high, so as to be effectively improved large scale, the display Mura of height parsing liquid crystal display device, reduce parasitic capacitance, while promoting charge efficiency, maintain the normal box thickness parameter of liquid crystal display device, display color difference and transmitance is effectively avoided to reduce problem, guarantee the optical quality of liquid crystal display device.
Description
Technical field
The present invention relates to field of display technology more particularly to a kind of production methods of crystal liquid substrate.
Background technique
Active Thin Film Transistor-LCD (Thin Film Transistor-LCD, TFT-LCD) obtains in recent years
To development at full speed and it is widely applied.Liquid crystal display device on existing market is largely backlight liquid crystal display dress
It sets comprising liquid crystal display panel and backlight module (backlight module).Usual liquid crystal display panel is by color membrane substrates
(CF, Color Filter Substrate), thin film transistor base plate (TFT, Thin Film Transistor
Substrate), liquid crystal (LC, Liquid Crystal) and the sealing frame being sandwiched between color membrane substrates and thin film transistor base plate
Glue (Sealant) composition.
With consumer to liquid crystal display device require it is higher and higher, TFT-LCD just gradually to large scale, high-res,
The directions such as curved-surface display are developed.As liquid crystal display device size increases, by liquid crystal cell box thick (cell gap) homogeneity not
Display brightness caused by good uneven (Mura) etc. is bad will be more obvious.Therefore, in the production of large scale liquid crystal display panel
In the process, it has been formed on the substrate of thin film transistor (TFT) it is generally necessary to which covering layer of transparent organic insulating film is flat as organic insulation
Smooth (planarization, PLN) layer prevents electric field from interfering with each other, to change the planarization of lower layer's film surface so as to effective
Improve the display Mura of the liquid crystal display device as caused by orographic factor, reduce parasitic capacitance, reduces by electric loading (RC
Loading the displays such as flashing caused by) excessive are abnormal, promote the taste of display device.
Color membrane substrates are usually made of black matrix and colored filter etc., wherein colored filter includes red (R), green
(G), the color blocking unit of blue (B) three color, a pixel electrode of each color blocking unit all corresponding array substrates, and black matrix is then right
Answer signal wire and the thin film transistor (TFT) etc. of array substrate.And COA (Color Filter on Array) technology is then to filter colour
Mating plate prepares the technology in array substrate.The region of the corresponding red resistance unit of liquid crystal display panel is referred to as red sub- picture below
Element, the region of corresponding green resistance unit are referred to as green sub-pixels, and the region of corresponding blue resistance unit is referred to as blue subpixels.
In TFT-LCD, the transmitance of liquid crystal is influenced by 2 Δ nd/ λ, and wherein Δ n is the birefringence of liquid crystal, and d is liquid
The thickness of crystal layer, that is, box is thick, and λ is the wavelength of light.If the thickness of liquid crystal layer of corresponding each sub-pixel is identical, due to three color of red, green, blue
The λ of light is different, therefore liquid crystal is all different in the transmitance of red, green, blue sub-pixels, to will lead to table after three kinds of pixel mixing
Revealing the color come and required color has difference, and visually quality reduces.Therefore, a kind of existing COA type liquid as shown in Fig. 1
The structure of crystal panel, the film thickness of the red color resistance unit 101 of colored filter 100 and green color blocking unit 102 in liquid crystal display panel
Quite, the film thickness of blue color blocking unit 103 is than red color resistance unit 101 and high 0.1-0.2 μm or so of green color blocking unit 102,
So that the thickness of liquid crystal layer relative reduction of corresponding blue subpixels, so that when liquid crystal corresponds to red, green, blue sub-pixels
Maintain identical transmitance.
However, as shown in Fig. 2, it is organic exhausted when being formed on colored filter 100 in large size TFT-LCD technology
It is color with good levelability since organic insulation flatness layer 200 is usually organic photoresist material when edge flatness layer 200
The landform of colo(u)r filter 100 is compared to the structure for not adding organic insulation flatness layer 200, it will becomes relatively flat, liquid crystal layer 300
It is identical in the thickness of each sub-pixel, such TFT-LCD just will appear colour cast, transmitance reduce the problems such as, seriously affect display product
Matter.
Summary of the invention
The purpose of the present invention is to provide a kind of production methods of crystal liquid substrate, using halftone mask (Half Tone
Mask, HTM) technology, it solves to cause the liquid for blue pixel area by the levelability of PLN layer material in existing TFT-LCD
Crystal layer thickness problem bigger than normal.
To achieve the above object, the present invention provides a kind of production method of crystal liquid substrate, includes the following steps:
Step 1 provides a substrate, and the substrate is equipped with one layer of color filter film, and the color filter film includes several
Red color resistance unit, green color blocking unit and blue color blocking unit are coated with a layer photoresist material on the color filter film
Material forms organic coating；
Step 2 provides a halftone mask, and the halftone mask is corresponded to and is placed in above the substrate, in the base
Marked off on plate respectively red pixel area corresponding with several red, greens, blue color blocking unit, green pixel area,
Blue pixel area and the pixel separation area between the blue pixel area and red pixel area, green pixel area；The light
Cover has the first transparent area corresponding with red, the green pixel area, and with the blue pixel area corresponding second
Transparent area；
The organic coating is exposed using the halftone mask, corresponding first on the organic coating, the
Two transparent areas are respectively formed the first, second exposure region, wherein the light transmittance of second transparent area is higher than the saturating of the first transparent area
Light rate, so that the depth of exposure of the second exposure region is higher than the depth of exposure of the first exposure region；
Step 3 provides developer solution, is developed using the developer solution to the organic coating, due to the second exposure region
Depth of exposure be higher than the depth of exposure of the first exposure region, thus after the organic coating is developed, the on the organic coating
The height of two exposure regions is higher than the height of first exposure region；
Step 4 carries out high-temperature baking to the organic coating, solidifies the organic coating sufficiently, forms organic insulation
Flatness layer.
The halftone mask provided in the step 2, first transparent area is with the second transparent area in the corresponding pixel
It is connected directly above spacer region.
The halftone mask provided in the step 2, between first transparent area and the second transparent area also have with
The corresponding third transparent area in the pixel separation area, wherein the light transmittance of the third transparent area is higher than the second transparent area
Light transmittance, to further include corresponding to third transparent area on the organic coating to form third exposure region, institute in the step 2
The depth of exposure for stating third exposure region is higher than the depth of exposure of the second exposure region；In the step 3, the organic coating is developed
Afterwards, on the organic coating third exposure region height be higher than second exposure region height.
The light transmittance of second transparent area is 5%-20% higher than the light transmittance of the first transparent area.
The light transmittance of second transparent area is 5%-20% higher than the light transmittance of the first transparent area；The third transparent area
Light transmittance is 5%-20% higher than the light transmittance of second transparent area.
The substrate provided in the step 1 be tft array substrate, the substrate include underlay substrate and be set to substrate base
Tft array layer between plate and color filter film.
In the step 1, the viscosity of the Other substrate materials between 3.0-5.0cp, solid content 15-25wt% it
Between；
The step 1 further includes after being coated with a layer photoresist material on color filter film, to the light on color filter film
Photoresist material is successively dried in vacuo and electric hot plate heating, to form organic coating, the film thickness of the organic coating exists
Between 1.0-5.0 μm；
Wherein, to the heating temperature range of Other substrate materials progress electric hot plate heating between 90-120 DEG C, heating time
Between 80-150s.
In the step 3, developer solution using the TMAH solution of 0.04wt%, 2.38wt% TMAH solution or
The KOH solution of 0.04wt%, developing time is between 60-120s.
In the step 4, high-temperature baking, high-temperature baking time are carried out to the organic coating at a temperature of 220-240 DEG C
For 20-30min.
The blue color blocking unit is 0.1-0.2 μm higher than the red color resistance unit, green color blocking unit；
The organic insulation flatness layer formed in the step 4, the corresponding height being located in the blue pixel area is than corresponding to
Height in the red pixel area, green pixel area is 0.1-0.2 μm high.
Beneficial effects of the present invention: the production method of crystal liquid substrate of the invention, using halftone mask technology in colour
Organic insulation flatness layer is formed on filter coating, so that the corresponding height ratio being located in the blue pixel area of organic insulation flatness layer
The corresponding height in the red pixel area, green pixel area is high, so as to be effectively improved large scale, high desorbed solution
The display Mura of crystal device reduces parasitic capacitance, while promoting charge efficiency, maintains the normal box of liquid crystal display device
Thick parameter effectively avoids display color difference and transmitance from reducing problem, guarantees the optical quality of liquid crystal display device.
Detailed description of the invention
For further understanding of the features and technical contents of the present invention, it please refers to below in connection with of the invention detailed
Illustrate and attached drawing, however, the drawings only provide reference and explanation, is not intended to limit the present invention.
In attached drawing,
Fig. 1 is a kind of existing structural schematic diagram of COA type liquid crystal display panel；
Fig. 2 is that colorized optical filtering on piece is provided with machine insulation by the prior art in COA type liquid crystal display panel shown in FIG. 1
Schematic diagram after flatness layer；
Fig. 3 is the flow diagram of the production method of crystal liquid substrate of the invention；
Fig. 4 is the schematic diagram of the step 2 of the first embodiment of the production method of crystal liquid substrate of the invention；
Fig. 5 is the schematic diagram of the step 3 of the first embodiment of the production method of crystal liquid substrate of the invention；
Fig. 6 is the schematic diagram of the step 2 of the second embodiment of the production method of crystal liquid substrate of the invention；
Fig. 7 is the schematic diagram of the step 3 of the second embodiment of the production method of crystal liquid substrate of the invention.
Specific embodiment
Further to illustrate technological means and its effect adopted by the present invention, below in conjunction with preferred implementation of the invention
Example and its attached drawing are described in detail.
Referring to Fig. 3, the present invention provides a kind of production method of crystal liquid substrate, wherein the first embodiment of the present invention is specific
Include the following steps:
Step 1 provides a substrate 10, and the substrate 10 is equipped with one layer of color filter film 11, the color filter film 11
Including several red color resistance units 111, green color blocking unit 112 and blue color blocking unit 113, in the color filter film 11
Then Other substrate materials on color filter film 11 are successively dried in vacuo (Vacuum by one layer photoresist material of upper coating
Dry, VCD) and electric hot plate heating (Hot Plate, HP), form organic coating 20.
Specifically, the substrate 10 can be common color membrane substrates, or tft array substrate, in the present embodiment
In, the substrate 10 provided in the step 1 is tft array substrate, and the substrate 10 is including underlay substrate and is set to underlay substrate
Tft array layer between color filter film 11, i.e., the described substrate 10 are COA type tft array substrate.
Specifically, the blue color blocking unit 113 and the red, green color blocking unit 111,112 are mutually be overlapped in intersection
Folded, the blue color blocking unit 113 is than the red color resistance unit 111, high 0.1-0.2 μm of green color blocking unit 112.
Specifically, in the step 1, the viscosity of the Other substrate materials is between 3.0-5.0cp, and solid content is in 15-
Between 25wt%.
Specifically, the film thickness of the organic coating 20 formed in the step 1 is between 1.0-5.0 μm.
Specifically, in the step 1, the heating temperature range of electric hot plate heating is carried out at 90-120 DEG C to Other substrate materials
Between, heating time between 80-150s, under the premise of not influencing Other substrate materials performance, preferentially chooses higher heating
Temperature and longer heating time carry out electric hot plate heating to Other substrate materials.
Step 2, as shown in figure 4, provide a halftone mask 50, by the halftone mask 50 correspondence be placed in the substrate
10 tops, marked off on the substrate 10 respectively with several red, the greens, 111,112,113 phases of blue color blocking unit
Corresponding red pixel area, green pixel area, blue pixel area and be located at the blue pixel area and red pixel area, green
Pixel separation area between pixel region, the light shield 50 have the first transparent area corresponding with red, the green pixel area
51, and the second transparent area 52 corresponding with the blue pixel area；
The organic coating 20 is exposed using the halftone mask 50, corresponding the on the organic coating 20
One, the second transparent area 51,52 is respectively formed the first, second exposure region, wherein the light transmittance of second transparent area 52 is higher than the
The light transmittance of one transparent area 51, so that the depth of exposure of the second exposure region is higher than the depth of exposure of the first exposure region.
Specifically, in the present embodiment, the halftone mask 50 provided in the step 2, first transparent area 51 with
Second transparent area 52 is connected directly above the correspondence pixel separation area.
Specifically, the light transmittance of second transparent area 52 is 5%-20% higher than the light transmittance of the first transparent area 51, wherein
The light transmittance of second transparent area 52 is 80-95%, and the light transmittance of first transparent area 51 is 60-90%.
Step 3 provides developer solution, is developed using the developer solution to the organic coating 20, due to the second exposure
The depth of exposure in area is higher than the depth of exposure of the first exposure region, thus after the organic coating 20 is developed, the organic coating
The height of second exposure region is higher than the height of first exposure region on 20.
Specifically, in the step 3, developer solution using 0.04wt% tetramethylammonium hydroxide (TMAH) solution,
The TMAH solution of 2.38wt% or potassium hydroxide (KOH) solution of 0.04wt%, developing time is between 60-120s, in not shadow
Under the premise of ringing Other substrate materials performance, preferably shorter developing time.
Step 4 carries out high-temperature baking, high-temperature baking time 20- to the organic coating 20 at a temperature of 220-240 DEG C
30min makes the sufficiently solidification of organic coating 20, forms organic insulation flatness layer.
Specifically, since in step 3, the height of second exposure region is higher than first exposure region on the organic coating 20
Height, therefore, the organic insulation flatness layer formed in the step 4 through high-temperature baking is corresponding to be located at the blue pixel area
On height it is still higher than the corresponding red pixel area, the height in green pixel area of being located at.
Specifically, the corresponding height being located in the blue pixel area of the organic insulation flatness layer is than corresponding positioned at described
Height in red pixel area, green pixel area is 0.1-0.2 μm high.
The production method of crystal liquid substrate of the invention remains to after forming organic insulation flatness layer on color filter film 11
The landform of color filter film 11 is maintained, so that organic insulation flatness layer is compared in the corresponding height being located in the blue pixel area
Should be high positioned at the height in the red pixel area, green pixel area, so that made crystal liquid substrate is applied to liquid crystal display
When device, parasitic capacitance can be reduced, promotion is filled in the display Mura for being effectively improved large scale, high parsing liquid crystal display device
While electrical efficiency, the normal box thickness parameter of liquid crystal display device is maintained, display color difference and transmitance is effectively avoided to reduce problem,
Guarantee the optical quality of liquid crystal display device.
However in the step 4 of above-mentioned first embodiment, organic coating 20 can generate levelling because of heat flow in high-temperature baking
Effect, at this moment, the material on the organic coating 20 in second exposure region can be flowed into the first exposure region, so as to cause organic
The flatness layer that insulate is corresponding in the red pixel area, green pixel area corresponding positioned at the blue pixel Qu Shangyu
Difference in height reduces.Therefore, Fig. 6-7 is please referred to, the second embodiment of the present invention is compared with above-mentioned first embodiment, the step 2
The halftone mask 50 of middle offer also has and the pixel separation between first transparent area 51 and the second transparent area 52
The corresponding third transparent area 53 in area, wherein the light transmittance of the third transparent area 53 is higher than the light transmittance of the second transparent area 52,
To in the step 2, further include correspond to the formation third exposure region of third transparent area 53 on the organic coating 20, described the
The depth of exposure of three exposure regions is higher than the depth of exposure of the second exposure region；In the step 3, the organic coating 20 is developed
Afterwards, on the organic coating 20 third exposure region height be higher than second exposure region height.
Specifically, the light transmittance of second transparent area 52 is 5%-20% higher than the light transmittance of the first transparent area 51；It is described
The light transmittance of third transparent area 52 is 5%-20% higher than the light transmittance of second transparent area 51；Wherein, the third transparent area
52 light transmittance is 100%, and the light transmittance of second transparent area 52 is 80-95%, the light transmittance of first transparent area 51
For 60-90%.
In the second embodiment of the present invention, since the halftone mask 50 is saturating in first transparent area 51 and second
Also there is third transparent area 53 corresponding with the pixel separation area between light area 52, it is therefore, described to have in the step 3
After organic coating 20 is developed, third exposure region outstanding also will form between the first, second exposure region thereon, thus in step
In 4, it can prevent the material on the organic coating 20 in second exposure region from flowing into the first exposure region and cause organic exhausted
Edge flatness layer is located in the blue pixel area and the corresponding height in the red pixel area, green pixel area corresponding
The phenomenon that difference reduces.
In conclusion the production method of crystal liquid substrate of the invention, using halftone mask technology on color filter film
Organic insulation flatness layer is formed, so that the corresponding height being located in the blue pixel area of organic insulation flatness layer is located at than correspondence
Height in the red pixel area, green pixel area is high, so as to be effectively improved large scale, high parsing liquid crystal display dress
The display Mura set reduces parasitic capacitance, while promoting charge efficiency, maintains the normal box thickness parameter of liquid crystal display device,
It effectively avoids display color difference and transmitance from reducing problem, guarantees the optical quality of liquid crystal display device.
The above for those of ordinary skill in the art can according to the technique and scheme of the present invention and technology
Other various corresponding changes and modifications are made in design, and all these change and modification all should belong to the appended right of the present invention
It is required that protection scope.
Claims (9)
1. a kind of production method of crystal liquid substrate, which comprises the steps of:
Step 1 provides a substrate (10), and the substrate (10) is equipped with one layer of color filter film (11), the color filter film
It (11) include several red color resistance units (111), green color blocking unit (112) and blue color blocking unit (113), in the coloured silk
It is coated with a layer photoresist material on color filter coating (11), is formed organic coating (20)；
Step 2 provides a halftone mask (50), and the halftone mask (50) are corresponded to and are placed in above the substrate (10),
It is marked off on the substrate (10) corresponding with several red, greens, blue color blocking unit (111,112,113) respectively
Red pixel area, green pixel area, blue pixel area and be located at the blue pixel area and red pixel area, green pixel
Pixel separation area between area；The light shield (50) has the first transparent area corresponding with red, the green pixel area
And the second transparent area (52) corresponding with the blue pixel area (51),；
The organic coating (20) is exposed using the halftone mask (50), it is corresponding on the organic coating (20)
First, second transparent area (51,52) is respectively formed the first, second exposure region, wherein the light transmittance of second transparent area (52)
Higher than the light transmittance of the first transparent area (51), so that the depth of exposure of the second exposure region is higher than the exposure journey of the first exposure region
Degree；
Step 3 provides developer solution, is developed using the developer solution to the organic coating (20), due to the second exposure region
Depth of exposure be higher than the depth of exposure of the first exposure region, thus after the organic coating (20) is developed, the organic coating
(20) height of the second exposure region is higher than the height of first exposure region on；
Step 4 carries out high-temperature baking to the organic coating (20), solidifies the organic coating (20) sufficiently, is formed organic
Insulate flatness layer；
The halftone mask (50) provided in the step 2, between first transparent area (51) and the second transparent area (52)
Also there is third transparent area (53) corresponding with the pixel separation area, wherein the light transmittance of the third transparent area (53)
Higher than the light transmittance of the second transparent area (52), to further include corresponding to third on the organic coating (20) in the step 2
Transparent area (53) forms third exposure region, and the depth of exposure of the third exposure region is higher than the depth of exposure of the second exposure region；Institute
It states in step 3, after the organic coating (20) is developed, the height of third exposure region is higher than described on the organic coating (20)
The height of second exposure region.
2. the production method of crystal liquid substrate as described in claim 1, which is characterized in that the halftoning provided in the step 2
Light shield (50), first transparent area (51) are connected directly above the corresponding pixel separation area with the second transparent area (52)
It connects.
3. the production method of crystal liquid substrate as claimed in claim 2, which is characterized in that the light transmission of second transparent area (52)
Rate is 5%-20% higher than the light transmittance of the first transparent area (51).
4. the production method of crystal liquid substrate as described in claim 1, which is characterized in that the light transmission of second transparent area (52)
Rate is 5%-20% higher than the light transmittance of the first transparent area (51)；The light transmittance of the third transparent area (52) is than second light transmission
The high 5%-20% of light transmittance in area (51).
5. the production method of crystal liquid substrate as described in claim 1, which is characterized in that the substrate provided in the step 1
It (10) is tft array substrate, the substrate (10) includes underlay substrate and is set between underlay substrate and color filter film (11)
Tft array layer.
6. the production method of crystal liquid substrate as described in claim 1, which is characterized in that in the step 1, the photoetching glue material
The viscosity of material is between 3.0-5.0cp, and solid content is between 15-25wt%；
The step 1 further includes, after a layer photoresist material is coated on color filter film (11), on color filter film (11)
Other substrate materials be successively dried in vacuo and electric hot plate heating, to form organic coating (20), the organic coating
(20) film thickness is between 1.0-5.0 μm；
Wherein, to the heating temperature range of Other substrate materials progress electric hot plate heating between 90-120 DEG C, heating time is in 80-
Between 150s.
7. the production method of crystal liquid substrate as described in claim 1, which is characterized in that in the step 3, developer solution is used
The KOH solution of the TMAH solution of 0.04wt%, the TMAH solution of 2.38wt% or 0.04wt%, developing time 60-120s it
Between.
8. the production method of crystal liquid substrate as described in claim 1, which is characterized in that in the step 4, at 220-240 DEG C
At a temperature of to the organic coating (20) carry out high-temperature baking, high-temperature baking time 20-30min.
9. the production method of crystal liquid substrate as described in claim 1, which is characterized in that blue color blocking unit (113) ratio
The red color resistance unit (111), green color blocking unit (112) are 0.1-0.2 μm high；
The organic insulation flatness layer formed in the step 4, the corresponding height being located in the blue pixel area are located at than correspondence
Height in the red pixel area, green pixel area is 0.1-0.2 μm high.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610891063.XA CN106324880B (en) | 2016-10-12 | 2016-10-12 | The production method of crystal liquid substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610891063.XA CN106324880B (en) | 2016-10-12 | 2016-10-12 | The production method of crystal liquid substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106324880A CN106324880A (en) | 2017-01-11 |
| CN106324880B true CN106324880B (en) | 2019-10-11 |
Family
ID=57821447
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201610891063.XA Active CN106324880B (en) | 2016-10-12 | 2016-10-12 | The production method of crystal liquid substrate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106324880B (en) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107589583B (en) * | 2017-09-15 | 2021-08-06 | 惠科股份有限公司 | Display panel and manufacturing method thereof |
| WO2019084751A1 (en) * | 2017-10-31 | 2019-05-09 | 华为技术有限公司 | Display assembly, manufacturing method therefor, display, and terminal device |
| CN107608123A (en) * | 2017-11-03 | 2018-01-19 | 惠科股份有限公司 | Display panel and its manufacture method |
| CN108832027A (en) * | 2018-06-07 | 2018-11-16 | 广州市得胜光电科技有限公司 | A kind of raising WOLED+COA manufacture of substrates |
| CN108646490B (en) * | 2018-06-11 | 2021-01-26 | Tcl华星光电技术有限公司 | COA type array substrate and manufacturing method thereof |
| CN109143700B (en) * | 2018-08-20 | 2020-12-04 | 武汉华星光电半导体显示技术有限公司 | TFT array substrate and manufacturing method thereof |
| CN111781767A (en) * | 2020-07-09 | 2020-10-16 | 深圳市华星光电半导体显示技术有限公司 | Liquid crystal display panel and preparation method thereof |
| CN113156689B (en) * | 2020-12-30 | 2022-08-23 | 厦门天马微电子有限公司 | Array substrate, display panel and display device |
| CN113189812B (en) * | 2021-04-29 | 2022-11-29 | 滁州惠科光电科技有限公司 | Color filter layer manufacturing method, related substrate and manufacturing method thereof |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005272912A (en) * | 2004-03-24 | 2005-10-06 | ▲ぎょく▼徳科技股▲ふん▼有限公司 | Method for producing stamper of light transmission plate by half tone technique |
| JP2006030650A (en) * | 2004-07-16 | 2006-02-02 | Koninkl Philips Electronics Nv | Color filter, manufacturing method thereof, and liquid crystal display device using the color filter |
| CN100445836C (en) * | 2007-02-08 | 2008-12-24 | 友达光电股份有限公司 | Liquid crystal display panel and array base plate and method for manufacturing same |
| CN104965333B (en) * | 2015-07-15 | 2018-05-01 | 深圳市华星光电技术有限公司 | COA type liquid crystal display panels and preparation method thereof |
-
2016
- 2016-10-12 CN CN201610891063.XA patent/CN106324880B/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN106324880A (en) | 2017-01-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN106324880B (en) | The production method of crystal liquid substrate | |
| CN105974636B (en) | The production method of liquid crystal display panel | |
| CN104965333B (en) | COA type liquid crystal display panels and preparation method thereof | |
| CN102681246B (en) | Color film substrate, method for manufacturing same and liquid crystal display | |
| CN104749817B (en) | A kind of display panel and display device | |
| CN102799017B (en) | Color membrane substrates, display panels and manufacture method thereof | |
| CN108535909A (en) | The production method and BPS type array substrates of BPS type array substrates | |
| CN106842687B (en) | Color membrane substrates and preparation method thereof | |
| KR102202165B1 (en) | Color film substrate, liquid crystal panel, liquid crystal display device, and manufacturing method thereof | |
| CN103278963A (en) | Color filtering array substrate, manufacturing method thereof and display device thereof | |
| CN109116617A (en) | Barrier wall structure, color membrane array substrate and liquid crystal display panel | |
| CN103676297A (en) | Colorful film substrate and liquid crystal display device | |
| CN110221473A (en) | Color membrane substrates and preparation method thereof and display device | |
| US10197845B2 (en) | Manufacturing method of color filter substrate and manufacturing method of liquid crystal panel | |
| CN103901659B (en) | Filter, liquid crystal indicator for IPS mode liquid crystal display panel | |
| CN108363233A (en) | Colored filter substrate and preparation method thereof | |
| CN103246154A (en) | Manufacturing method of mask plate for solidifying and shielding sealing frame glue | |
| CN109270725A (en) | Liquid crystal display panel and liquid crystal display device | |
| CN109188764A (en) | Liquid crystal display panel and preparation method thereof | |
| CN105739166A (en) | Liquid crystal display module and liquid crystal display device | |
| CN107688254A (en) | COA type liquid crystal display panels and preparation method thereof | |
| US9513413B2 (en) | Display device, color filter substrate and manufacturing method thereof | |
| CN103149730A (en) | Color film substrate and manufacturing method thereof, as well as liquid crystal display screen | |
| CN106918950A (en) | A kind of display base plate and display device | |
| CN104932138A (en) | Photomask and method for manufacturing colored film substrate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee after: TCL Huaxing Photoelectric Technology Co.,Ltd. Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. |
|
| CP01 | Change in the name or title of a patent holder |