CN108832027A - A kind of raising WOLED+COA manufacture of substrates - Google Patents
A kind of raising WOLED+COA manufacture of substrates Download PDFInfo
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- CN108832027A CN108832027A CN201810582101.2A CN201810582101A CN108832027A CN 108832027 A CN108832027 A CN 108832027A CN 201810582101 A CN201810582101 A CN 201810582101A CN 108832027 A CN108832027 A CN 108832027A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/50—OLEDs integrated with light modulating elements, e.g. with electrochromic elements, photochromic elements or liquid crystal elements
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/60—Forming conductive regions or layers, e.g. electrodes
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Abstract
The invention discloses a kind of raising WOLED+COA manufacture of substrates, and specific step is as follows：S1：The planarization layer of organic material is coated on the WOLED CF substrate made, and is added binder and stood 3-7min；S2：After planarization layer is bonded on substrate completely, negative photoresist is coated on substrate and forms color membrane substrates, stands 5-10min；S3：After completing S2, it is exposed processing 10-15min using exposure machine on color membrane substrates, so that rgb pixel exposes 45-55%, is exposed completely at black matrix；S4：After completing S3, development treatment is carried out by developing machine on color membrane substrates, and developer is added, the photoresist of dissolution is sprayed into 5-10min by hydraulic giant and is cleaned up, 15-25min is dried using dryer；S5：After completing S4, color membrane substrates are carried out curing process 15-20min by addition curing agent, until the planarization layer at black matrix is fully cured.Present invention preparation is simple, and processing is fast, can effectively improve the planarization of rgb pixel, product quality is improved, to improve image quality.
Description
Technical field
The present invention relates to WOLED+COA matrix technique field more particularly to a kind of raising WOLED+COA substrate manufacturing methods
Method.
Background technique
In WOLED array substrate manufacturing process, the planarization of color membrane substrates rgb pixel electrode is for showing the shadow of quality
Sound is most important.But in actual production, the phenomenon that substrate prepares out-of-flatness frequent occurrence.The preparation of rgb pixel electrode is uneven
The whole yields for leading to product, and then reduce image quality.
Existing WOLED+COA manufacture of substrates has the following disadvantages：RGB picture in the substrate of existing method production
Plain electrode preparation out-of-flatness reduces image quality so that product is of poor quality, not directly proportional to the economic benefit of creation.
Summary of the invention
The purpose of the present invention is to provide a kind of raising WOLED+COA manufacture of substrates, have preparation simply, processing
Fastly, the planarization of rgb pixel can be effectively improved, product quality is improved, so that the advantages of improving image quality, solves existing side
Rgb pixel electrode, which prepares out-of-flatness, in the substrate made in method reduces image quality so that product is of poor quality, the warp with creation
The not directly proportional problem of benefit of helping.
A kind of raising WOLED+COA manufacture of substrates according to an embodiment of the present invention, specific step is as follows：
S1：The planarization layer of organic material is coated on the WOLED CF substrate made, and is added binder and stood 3-7min；
S2：After planarization layer is bonded on substrate completely, negative photoresist is coated on substrate and forms color membrane substrates, stands 5-
10min；
S3：After completing S2, it is exposed processing 10-15min using exposure machine on color membrane substrates, so that rgb pixel exposes
45-55% is exposed completely at black matrix；
S4：After completing S3, development treatment is carried out by developing machine on color membrane substrates, and developer is added, by the photoetching of dissolution
Glue sprays 5-10min by hydraulic giant and cleans up, and 15-25min is dried using dryer；
S5：After completing S4, color membrane substrates are carried out curing process 15-20min by addition curing agent, until flat at black matrix
Change layer to be fully cured, solidifying area at RGB is 45-55%, is completed the production.
On the basis of above scheme, the binder includes the raw material of following parts by weight：10-15 parts of acrylic acid, titanium dioxide
20-25 parts of silicon, 5-15 parts of epoxy resin, 20-25 parts of odium stearate, 15-25 parts of cyano benzene olefin(e) acid ester, 10-20 parts of chloride salt,
20-30 parts of benzenediol.
On the basis of above scheme, the chloride salt is one of sodium chloride, potassium chloride.
On the basis of above scheme, in the S4, the development treatment time is 20-30min.
On the basis of above scheme, in the S4, the hydraulic pressure of hydraulic giant is 0.3-0.4Mpa.
On the basis of above scheme, in the S4, dryer is microwave dryer.
On the basis of above scheme, in the S4, drying temperature is 50-60 DEG C
On the basis of above scheme, the curing agent includes the raw material of following parts by weight：2- methylglutaric acid dimethyl ester 10-15
Part, 20-30 parts of aromatic amine, 5-10 parts of polyester resin, 15-25 parts of acetone, 10-20 parts of antioxidant, 20-30 parts of polyalcohol.
On the basis of above scheme, the polyalcohol is the mixing of polyethylene glycol, polypropylene glycol and polybutylene ether glycol
Object.
On the basis of above scheme, in the S4, developer be hydroquinone, N- methyl-p-aminophenol sulfate,
The mixture of 1- phenyl -3- pyrazolidone.
The mechanism of action
Epoxy resin in binder contains polar hydroxyl and ehter bond, there is certain wetability to substrate surface, has good
Adhesive force reinforces the bonding of planarization layer and substrate, and in cyano benzene olefin(e) acid ester in binder containing highly polar cyano and
Ester bond has very strong adhesion strength to polarity adherend, shows very high adhesive strength, accelerates bonding progress；In curing agent
Aromatic amine molecular structure in contain stable benzene ring structure, amido is connected directly with phenyl ring, and cured product can be made with high
Elasticity and bonding force and water resistance reinforce substrate solidification, shorten curing time.
Compared with the prior art, the invention has the beneficial effects that：By above rgb pixel electrode light bond it is flat
Change layer, keep the surface of rgb pixel electrode more smooth, to improve picture matter, while binder is by planarization layer and substrate
Adhesion strength improves 15-30%；By using the photoetching technique in TFT-LCD technology, using negative photoresist, in rgb pixel electricity
One layer of over coating is formed above pole, the over coating at black matrix exposes completely, the over coating part at rgb pixel electrode
Exposure, and then formed in rgb pixel electrode district partially cured, black matrix area is then fully cured, it is filled with surface thickness, so that
Rgb pixel electrode is more smooth, by the effect of curing agent, shortens curing time 28-46%；Present invention preparation is simple, processing
Fastly, the planarization of rgb pixel can be effectively improved, product quality is improved, to improve image quality.
Detailed description of the invention
Attached drawing is used to provide further understanding of the present invention, and constitutes part of specification, with reality of the invention
It applies example to be used to explain the present invention together, not be construed as limiting the invention.
Fig. 1 is a kind of WOLED of coating negative photoresist for improving WOLED+COA manufacture of substrates proposed by the present invention
+ COA schematic diagram of substrate structure.
In figure：1-RGB pixel electrode, 2- over coating, 3- glass substrate, 4- black matrix, 5- anti-dazzling screen.
Specific embodiment
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation description, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
Embodiment 1
Referring to Fig.1, a kind of raising WOLED+COA manufacture of substrates is present embodiments provided, specific step is as follows：
S1：The planarization layer of organic material is coated on the WOLED CF substrate made, and is added binder and stood 3min；
S2：After planarization layer is bonded on substrate completely, negative photoresist is coated on substrate and forms color membrane substrates, is stood
5min；
S3：After completing S2, it is exposed processing 10min using exposure machine on color membrane substrates, so that rgb pixel exposure 45%,
It is exposed completely at black matrix；
S4：After completing S3, development treatment is carried out by developing machine on color membrane substrates, and developer is added, by the photoetching of dissolution
Glue sprays 5min by hydraulic giant and cleans up, and 15min is dried using dryer；
S5：After completing S4, color membrane substrates are carried out curing process 15min by addition curing agent, until the planarization at black matrix
Layer is fully cured, and solidifying area at RGB is 45%, completes the production.
Wherein, binder includes the raw material of following parts by weight：10 parts of acrylic acid, 20 parts of silica, 5 parts of epoxy resin,
20 parts of odium stearate, 15 parts of cyano benzene olefin(e) acid ester, 10 parts of chloride salt, 20 parts of benzenediol；Chloride salt is sodium chloride；In S4
In, the development treatment time is 20min；In S4, the hydraulic pressure of hydraulic giant is 0.3Mpa；In S4, dryer is microwave dryer；?
In S4, drying temperature is 50 DEG C；Curing agent includes the raw material of following parts by weight：10 parts of 2- methylglutaric acid dimethyl ester, aromatic amine
20 parts, 5 parts of polyester resin, 15 parts of acetone, 10 parts of antioxidant, 20 parts of polyalcohol；Polyalcohol be polyethylene glycol, polypropylene glycol and
The mixture of polybutylene ether glycol；In S4, developer is hydroquinone, N- methyl-p-aminophenol sulfate, 1- phenyl-
The mixture of 3- pyrazolidone.
Embodiment 2
Referring to Fig.1, a kind of raising WOLED+COA manufacture of substrates is present embodiments provided, specific step is as follows：
S1：The planarization layer of organic material is coated on the WOLED CF substrate made, and is added binder and stood 7min；
S2：After planarization layer is bonded on substrate completely, negative photoresist is coated on substrate and forms color membrane substrates, is stood
10min；
S3：After completing S2, it is exposed processing 15min using exposure machine on color membrane substrates, so that rgb pixel exposure 55%,
It is exposed completely at black matrix；
S4：After completing S3, development treatment is carried out by developing machine on color membrane substrates, and developer is added, by the photoetching of dissolution
Glue sprays 10min by hydraulic giant and cleans up, and 25min is dried using dryer；
S5：After completing S4, color membrane substrates are carried out curing process 20min by addition curing agent, until the planarization at black matrix
Layer is fully cured, and solidifying area at RGB is 55%, completes the production.
Wherein, binder includes the raw material of following parts by weight：15 parts of acrylic acid, 25 parts of silica, 15 parts of epoxy resin,
25 parts of odium stearate, 25 parts of cyano benzene olefin(e) acid ester, 20 parts of chloride salt, 30 parts of benzenediol；Chloride salt is sodium chloride；In S4
In, the development treatment time is 30min；In S4, the hydraulic pressure of hydraulic giant is 0.4Mpa；In S4, dryer is microwave dryer；?
In S4, drying temperature is 60 DEG C；Curing agent includes the raw material of following parts by weight：15 parts of 2- methylglutaric acid dimethyl ester, aromatic amine
30 parts, 10 parts of polyester resin, 25 parts of acetone, 20 parts of antioxidant, 30 parts of polyalcohol；Polyalcohol is polyethylene glycol, polypropylene glycol
With the mixture of polybutylene ether glycol；In S4, developer is hydroquinone, N- methyl-p-aminophenol sulfate, 1- benzene
The mixture of base -3- pyrazolidone.
Embodiment 3
Referring to Fig.1, a kind of raising WOLED+COA manufacture of substrates is present embodiments provided, specific step is as follows：
S1：The planarization layer of organic material is coated on the WOLED CF substrate made, and is added binder and stood 5min；
S2：After planarization layer is bonded on substrate completely, negative photoresist is coated on substrate and forms color membrane substrates, is stood
7min；
S3：After completing S2, it is exposed processing 12min using exposure machine on color membrane substrates, so that rgb pixel exposure 50%,
It is exposed completely at black matrix；
S4：After completing S3, development treatment is carried out by developing machine on color membrane substrates, and developer is added, by the photoetching of dissolution
Glue sprays 7min by hydraulic giant and cleans up, and 20min is dried using dryer；
S5：After completing S4, color membrane substrates are carried out curing process 17min by addition curing agent, until the planarization at black matrix
Layer is fully cured, and solidifying area at RGB is 50%, completes the production.
Wherein, binder includes the raw material of following parts by weight：12 parts of acrylic acid, 22 parts of silica, 10 parts of epoxy resin,
22 parts of odium stearate, 20 parts of cyano benzene olefin(e) acid ester, 15 parts of chloride salt, 25 parts of benzenediol；Chloride salt is potassium chloride；In S4
In, the development treatment time is 25min；In S4, the hydraulic pressure of hydraulic giant is 0.35Mpa；In S4, dryer is microwave dryer；
In S4, drying temperature is 55 DEG C；Curing agent includes the raw material of following parts by weight：12 parts of 2- methylglutaric acid dimethyl ester, fragrance
25 parts of amine, 7 parts of polyester resin, 20 parts of acetone, 15 parts of antioxidant, 25 parts of polyalcohol；Polyalcohol is polyethylene glycol, polypropylene glycol
With the mixture of polybutylene ether glycol；In S4, developer is hydroquinone, N- methyl-p-aminophenol sulfate, 1- benzene
The mixture of base -3- pyrazolidone.
Embodiment 4
Referring to Fig.1, a kind of raising WOLED+COA manufacture of substrates is present embodiments provided, specific step is as follows：
S1：The planarization layer of organic material is coated on the WOLED CF substrate made, and is added binder and stood 4min；
S2：After planarization layer is bonded on substrate completely, negative photoresist is coated on substrate and forms color membrane substrates, is stood
6min；
S3：After completing S2, it is exposed processing 11min using exposure machine on color membrane substrates, so that rgb pixel exposure 47%,
It is exposed completely at black matrix；
S4：After completing S3, development treatment is carried out by developing machine on color membrane substrates, and developer is added, by the photoetching of dissolution
Glue sprays 6min by hydraulic giant and cleans up, and 17min is dried using dryer；
S5：After completing S4, color membrane substrates are carried out curing process 16min by addition curing agent, until the planarization at black matrix
Layer is fully cured, and solidifying area at RGB is 47%, completes the production.
Wherein, binder includes the raw material of following parts by weight：11 parts of acrylic acid, 21 parts of silica, 7 parts of epoxy resin,
21 parts of odium stearate, 17 parts of cyano benzene olefin(e) acid ester, 12 parts of chloride salt, 22 parts of benzenediol；Chloride salt is sodium chloride；In S4
In, the development treatment time is 22min；In S4, the hydraulic pressure of hydraulic giant is 0.32Mpa；In S4, dryer is microwave dryer；
In S4, drying temperature is 52 DEG C；Curing agent includes the raw material of following parts by weight：11 parts of 2- methylglutaric acid dimethyl ester, fragrance
22 parts of amine, 6 parts of polyester resin, 17 parts of acetone, 12 parts of antioxidant, 22 parts of polyalcohol；Polyalcohol is polyethylene glycol, polypropylene glycol
With the mixture of polybutylene ether glycol；In S4, developer is hydroquinone, N- methyl-p-aminophenol sulfate, 1- benzene
The mixture of base -3- pyrazolidone.
Embodiment 5
Referring to Fig.1, a kind of raising WOLED+COA manufacture of substrates is present embodiments provided, specific step is as follows：
S1：The planarization layer of organic material is coated on the WOLED CF substrate made, and is added binder and stood 6min；
S2：After planarization layer is bonded on substrate completely, negative photoresist is coated on substrate and forms color membrane substrates, is stood
8min；
S3：After completing S2, it is exposed processing 13min using exposure machine on color membrane substrates, so that rgb pixel exposure 52%,
It is exposed completely at black matrix；
S4：After completing S3, development treatment is carried out by developing machine on color membrane substrates, and developer is added, by the photoetching of dissolution
Glue sprays 8min by hydraulic giant and cleans up, and 22min is dried using dryer；
S5：After completing S4, color membrane substrates are carried out curing process 18min by addition curing agent, until the planarization at black matrix
Layer is fully cured, and solidifying area at RGB is 52%, completes the production.
Wherein, binder includes the raw material of following parts by weight：13 parts of acrylic acid, 23 parts of silica, 12 parts of epoxy resin,
23 parts of odium stearate, 22 parts of cyano benzene olefin(e) acid ester, 17 parts of chloride salt, 27 parts of benzenediol；Chloride salt is potassium chloride；In S4
In, the development treatment time is 27min；In S4, the hydraulic pressure of hydraulic giant is 0.37Mpa；In S4, dryer is microwave dryer；
In S4, drying temperature is 57 DEG C；Curing agent includes the raw material of following parts by weight：13 parts of 2- methylglutaric acid dimethyl ester, fragrance
27 parts of amine, 8 parts of polyester resin, 22 parts of acetone, 17 parts of antioxidant, 27 parts of polyalcohol；Polyalcohol is polyethylene glycol, polypropylene glycol
With the mixture of polybutylene ether glycol；In S4, developer is hydroquinone, N- methyl-p-aminophenol sulfate, 1- benzene
The mixture of base -3- pyrazolidone.
Reference examples
The substrate as made from the method for above-mentioned five experimental examples is tested with substrate made from the prior art in the market, point
Not Ce Shi strippable substrate intensity, curing time and image definition, test result is as follows：
| Index | Peel strength（N/cm） | Curing time（min） | Image definition（Pixel/inch） |
| Experimental example 1 | 2.2 | 15 | 280 |
| Experimental example 2 | 2.3 | 16 | 290 |
| Experimental example 3 | 2.5 | 17 | 300 |
| Experimental example 4 | 2.1 | 18 | 285 |
| Experimental example 5 | 1.9 | 20 | 279 |
| Reference examples | 1.6 | 28 | 206 |
In conclusion strippable substrate intensity obtained improves 18-56% through the invention, curing time shortens 28-46%, figure
Image sharpness increases substantially, therefore product quality produced by the present invention is more preferable, and image quality more preferably, is worthy to be popularized.
Place is not described in detail by the present invention, is the well-known technique of those skilled in the art.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
A variety of variations, modification, replacement can be carried out to these embodiments without departing from the principles and spirit of the present invention by understanding
And modification, the scope of the present invention is defined by the appended.
Claims (10)
1. a kind of raising WOLED+COA manufacture of substrates, it is characterised in that：Specific step is as follows：
S1：The planarization layer of organic material is coated on the WOLED CF substrate made, and is added binder and stood 3-7min；
S2：After planarization layer is bonded on substrate completely, negative photoresist is coated on substrate and forms color membrane substrates, stands 5-
10min；
S3：After completing S2, it is exposed processing 10-15min using exposure machine on color membrane substrates, so that rgb pixel exposes
45-55% is exposed completely at black matrix；
S4：After completing S3, development treatment is carried out by developing machine on color membrane substrates, and developer is added, by the photoetching of dissolution
Glue sprays 5-10min by hydraulic giant and cleans up, and 15-25min is dried using dryer；
S5：After completing S4, color membrane substrates are carried out curing process 15-20min by addition curing agent, until flat at black matrix
Change layer to be fully cured, solidifying area at RGB is 45-55%, is completed the production.
2. a kind of raising WOLED+COA manufacture of substrates according to claim 1, it is characterised in that：The binder
Raw material including following parts by weight：10-15 parts of acrylic acid, 20-25 parts of silica, 5-15 parts of epoxy resin, odium stearate 20-
25 parts, 15-25 parts of cyano benzene olefin(e) acid ester, 10-20 parts of chloride salt, 20-30 parts of benzenediol.
3. a kind of raising WOLED+COA manufacture of substrates according to claim 2, it is characterised in that：The chloride
Salt is one of sodium chloride, potassium chloride.
4. a kind of raising WOLED+COA manufacture of substrates according to claim 1, it is characterised in that：In the S4,
The development treatment time is 20-30min.
5. a kind of raising WOLED+COA manufacture of substrates according to claim 1, it is characterised in that：In the S4,
The hydraulic pressure of hydraulic giant is 0.3-0.4Mpa.
6. a kind of raising WOLED+COA manufacture of substrates according to claim 1, it is characterised in that：In the S4,
Dryer is microwave dryer.
7. a kind of raising WOLED+COA manufacture of substrates according to claim 1, it is characterised in that：In the S4,
Drying temperature is 50-60 DEG C.
8. a kind of raising WOLED+COA manufacture of substrates according to claim 1, it is characterised in that：The curing agent
Raw material including following parts by weight：10-15 parts of 2- methylglutaric acid dimethyl ester, 20-30 parts of aromatic amine, 5-10 parts of polyester resin,
15-25 parts of acetone, 10-20 parts of antioxidant, 20-30 parts of polyalcohol.
9. a kind of raising WOLED+COA manufacture of substrates according to claim 8, it is characterised in that：The polyalcohol
For polyethylene glycol, the mixture of polypropylene glycol and polybutylene ether glycol.
10. a kind of raising WOLED+COA manufacture of substrates according to claim 1, it is characterised in that：In the S4
In, developer is the mixture of hydroquinone, N- methyl-p-aminophenol sulfate, 1- phenyl -3- pyrazolidone.
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Application publication date: 20181116 |