CN105637391A

CN105637391A - Anti-glare film

Info

Publication number: CN105637391A
Application number: CN201480054621.6A
Authority: CN
Inventors: 古谷勉
Original assignee: Sumitomo Chemical Co Ltd
Current assignee: Sumitomo Chemical Co Ltd
Priority date: 2013-10-04
Filing date: 2014-10-01
Publication date: 2016-06-01
Also published as: WO2015050275A1; JP2015072413A; KR20160067142A; TW201518765A

Abstract

Provided is an anti-glare film which exhibits excellent anti-glare properties at a wide observation angle even when the haze is low, and which can sufficiently inhibit glare and color fading from occurring when disposed on an image display device. Provided is an anti-glare film having a transparent support body, and an anti-glare layer formed thereon and having minute irregularities, wherein: the root-mean-square roughness is within a predetermined range when measured at a predetermined cut-off length, for example, the root-mean-square roughness (Rq) (0.08) is between 0.01 and 0.05 [mu]m, inclusive, when measured at a cut-off length of 0.08 mm; and the ratio (RSCE/RSCI) between the luminous reflectance (RSCI) measured using a specular component included method and the luminous reflectance (RSCE) measured using a specular component excluded method is 0.1 or less.

Description

Antiglare film

Technical field

The present invention relates to anti-dazzle (antiglare) film that anti-glare is excellent.

Background technology

For the image display devices such as liquid crystal display, plasm display panel, Braun tube (cathode ray tube: CRT) display, organic field luminescence (EL) display, the deterioration of the observation (property) in order to avoid causing because extraneous light mirrors its display surface, is configured with antiglare film at this display surface.

As antiglare film, mainly investigate the hyaline membrane possessing surface unevenness profile. Such antiglare film is by utilizing surface unevenness profile to make extraneous light generation scattered reflection (extraneous light scattering light) reduce and mirror, thus showing anti-glare. But, when outside light scatter light is strong, it is possible to the display surface entirety of image display device can be caused to turn white, show the generation of the not distinct such what is called of color " whiting (white Chi �� ) ". It addition, it may also happen that the concave-convex surface of the pixel of image display device and antiglare film interferes, produces Luminance Distribution and causes the what is called " dazzling (�� Star ��) " being difficult to recognize. Based on background above, for antiglare film, it is desirable to while guaranteeing the anti-glare of excellence, be substantially prevented from the generation of this " whiting " and " dazzling ".

As such antiglare film, such as in patent documentation 1, as twinkling without occurring when being configured at the image display device of fine, and the antiglare film of the generation of whiting can be substantially prevented from, disclose following antiglare film: it is formed with fine surface unevenness profile over the transparent substrate, and the average length PSm of the arbitrary section curve of this surface unevenness profile is less than 12 ��m, the ratio Pa/PSm of arithmetic average height Pa and the average length PSm of this section curve is more than 0.005 and less than 0.012, the inclination angle of this surface unevenness profile is the ratio in the face of less than 2 �� is less than 50%, this inclination angle is the ratio in the face of less than 6 �� is more than 90%.

Antiglare film disclosed in patent documentation 1, by making the average length PSm of arbitrary section curve very little, eliminates the surface unevenness profile with the cycle close to 50 ��m being easily caused generation of dazzling such that it is able to effectively suppress this to dazzle. But, for the antiglare film disclosed in patent documentation 1, if to reduce mist degree (low haze) further, then anti-glare when may result in the image display device display surface being configured with this antiglare film from oblique observation reduces. Therefore, the antiglare film disclosed in patent documentation 1, in the anti-glare of wide viewing angle, remains the leeway in improvement.

Prior art literature

Patent documentation

Patent documentation 1: Japanese Unexamined Patent Publication 2007-187952 publication

Summary of the invention

The problem that invention to solve

It is an object of the invention to provide a kind of antiglare film, although it is low haze but have the anti-glare of excellence in wide viewing angle, and can fully suppress whiting and the generation dazzled when being configured at image display device.

Means for solving the above

The present inventor conducts in-depth research to solve above-mentioned problem, and result completes the present invention. That is, the present invention relates to:

(1) a kind of antiglare film, described antiglare film possesses transparent supporting mass and the antiglare layer with minute asperities surface being formed on this transparent supporting mass, it is characterised in that

Total mist degree of described antiglare film is more than 0.1% and less than 3%,

Surface haze is more than 0.1% and less than 2%,

With intercepted length (�� Off) 0.08mm measure time r.m.s. roughness Rq (0.08) for more than 0.01 ��m and less than 0.05 ��m,

With intercepted length 0.25mm measure time r.m.s. roughness Rq (0.25) for more than 0.05 ��m and less than 0.1 ��m,

With intercepted length 0.8mm measure time r.m.s. roughness Rq (0.8) for more than 0.07 ��m and less than 0.12 ��m,

With intercepted length 2.5mm measure time r.m.s. roughness Rq (2.5) for more than 0.08 ��m and less than 0.15 ��m,

With luminous reflectance (luminousreflectance) R that the light mode containing normal reflection measures_SCI, and luminous reflectance R to measure without normal reflection light mode_SCERatio R_SCE/R_SCIIt is less than 0.1.

Additionally, in the present invention, it is preferred to the antiglare film of following (2)��(4).

(2) antiglare film as described in above-mentioned (1), its with intercepted length 0.25mm measure time average length Sm (0.25) for more than 90 ��m and less than 160 ��m,

With intercepted length 0.8mm measure time average length Sm (0.8) for more than 100 ��m and less than 300 ��m,

With intercepted length 2.5mm measure time average length Sm (2.5) for more than 200 ��m and less than 400 ��m.

(3) antiglare film as described in above-mentioned (1) or (2), the transmission definition sum Tc that five kinds of light combs of width respectively 0.125mm, 0.25mm, 0.5mm, 1.0mm and the 2.0mm in its use dark portion and bright portion measure is more than 375%

Use reflection definition sum Rc (45) that four kinds of light combs of width respectively 0.25mm, 0.5mm, 1.0mm and the 2.0mm in dark portion and bright portion measure with the angle of incidence 45 �� of light for less than 180%,

Use reflection definition sum Rc (60) that four kinds of light combs of width respectively 0.25mm, 0.5mm, 1.0mm and the 2.0mm in dark portion and bright portion measure with the angle of incidence 60 �� of light for less than 240%.

(4) antiglare film as according to any one of above-mentioned (1)��(3), its described luminous reflectance R to measure without normal reflection light mode_SCEIt is less than 0.5%.

The effect of invention

Based on the present invention, it is provided that a kind of antiglare film, although it for low haze but has sufficient anti-glare in wide viewing angle, and can fully suppress whiting and the generation dazzled when being configured at image display device.

Accompanying drawing explanation

Fig. 1: schematically show for measuring luminous reflectance R_SCIThe figure of optics system.

Fig. 2: schematically show for measuring luminous reflectance R_SCEThe figure of optics system.

Fig. 3: schematically show the figure of a preferred example of the manufacture method (first half) of mould.

Fig. 4: schematically show the figure of a preferred example of the manufacture method (latter half) of mould.

Fig. 5: be shown schematically in the manufacture method of the antiglare film of the present invention figure of the preferred example manufacturing device used.

Fig. 6: be shown schematically in the present invention antiglare film manufacture method in the figure of preferred precuring operation.

Fig. 7: schematically show the figure of unit cell (unitcell) for twinkling evaluation.

Fig. 8: schematically show the figure of twinkling evaluating apparatus.

Fig. 9: represent the figure of the part of the pattern A used in embodiment 1��3 and comparative example 1.

Figure 10: represent the figure of the part of the pattern B used in comparative example 2.

Figure 11: represent the figure of power spectrum �� (f) pattern A and B being carried out discrete Fourier transform and obtain.

Detailed description of the invention

Hereinafter, in conjunction with accompanying drawing, the preferred embodiment of the present invention is illustrated as required, but this size shown in the drawings etc. arbitrarily set for the ease of observation.

The antiglare film of the present invention is characterised by, to specify r.m.s. roughness Rq when intercepted length measures respectively in above-mentioned scope, with the luminous reflectance R that the light mode containing normal reflection measures_SCIWith the luminous reflectance R to measure without normal reflection light mode_SCERatio R_SCE/R_SCIIt is less than 0.1.

First, for the antiglare film of the present invention, to r.m.s. roughness Rq, luminous reflectance R_SCIAnd luminous reflectance R_SCEMethod for solving illustrate.

[r.m.s. roughness Rq]

In the antiglare film of the present invention, r.m.s. roughness Rq (0.08) when the micro concavo-convex surface of the antiglare layer for possessing in this antiglare film is measured with intercepted length 0.08mm, 0.25mm, 0.8mm and 2.5mm, Rq (0.25), Rq (0.8) and Rq (2.5) respectively more than 0.01 ��m and less than 0.05 ��m, more than 0.05 ��m and less than 0.1 ��m, more than 0.07 ��m and less than 0.12 ��m and more than 0.08 ��m and less than 0.15 ��m. These Rq (0.08), Rq (0.25), Rq (0.8) and Rq (2.5) can pass through to set condition determination as follows, utilize the method according to JISB0601 to be measured.

Rq (0.08): intercepted length 0.08mm, evaluation length 0.4mm

Rq (0.25): intercepted length 0.25mm, evaluation length 1.25mm

Rq (0.8): intercepted length 0.8mm, evaluation length 4mm

Rq (2.5): intercepted length 2.5mm, evaluation length 12.5mm

To specify r.m.s. roughness when intercepted length measures to refer to, from the section curve utilizing the assay method specified by above-mentioned JIS to obtain, specified long wavelength's component of more than intercepted length by high pass filter shielding, use the surface roughness that so obtained roughness curve is obtained. Therefore, r.m.s. roughness when measuring with intercepted length 0.08mm refers to, solve r.m.s. roughness according to roughness curve when removing the surface unevenness profile with 0.08mm wavelength above from above-mentioned section curve, mainly the surface unevenness profile of the wavelength of below the 0.04mm having as intercepted length 1/2 is evaluated. Similarly, r.m.s. roughness when measuring with intercepted length 0.25mm, 0.8mm or 2.5mm refers to, use the surface roughness removing roughness curve when there is the surface unevenness profile of more than 0.25mm, more than 0.8mm or 2.5mm wavelength above from above-mentioned section curve and solve, mainly the surface unevenness profile of the wavelength with below 0.125mm, below 0.4mm as intercepted length 1/2 or below 1.25mm is evaluated.

Rq (0.08) means that greatly the surface unevenness profile of the antiglare layer that the antiglare film of the present invention has has the surface unevenness profile of the substantial amounts of wavelength with below 0.04mm. Similarly, Rq (0.25) means that greatly antiglare layer has the surface unevenness profile of the wavelength in a large number with more than 0.04mm and below 0.125mm, Rq (0.8) means greatly the surface unevenness profile with the wavelength in a large number with more than 0.125mm and below 0.4mm, and Rq (2.5) means greatly the surface unevenness profile with the wavelength in a large number with more than 0.4mm and below 1.25mm. If Rq (0.08) is lower than 0.01 ��m, then short-period surface unevenness profile of below wavelength 0.04mm is considerably less, i.e. forming the antiglare film with the antiglare layer only formed by macrocyclic surface unevenness profile, therefore its surface tactile sensation is roughening. If Rq (0.08) is more than 0.05 ��m, then being formed and have the antiglare film of the antiglare layer of scattering strongly producing to be caused by short-period surface unevenness profile of below wavelength 0.04mm, the image display device therefore possessing such antiglare film easily produces to whiten. Although the Rq of the antiglare film of the present invention (0.08) is above-mentioned scope, but it is preferably more than 0.02 ��m and less than 0.04 ��m.

If Rq (0.25) is less than 0.05 ��m, then form the antiglare film of the few antiglare layer of the surface unevenness profile with more than wavelength 0.04mm and below 0.125mm, thus when the image display device possessing this antiglare film is observed from front (about 0��10 ��), its anti-glare is insufficient. If Rq (0.25) is more than 0.1 ��m, then the surface unevenness profile of more than wavelength 0.04mm and below 0.125mm increases. The surface unevenness profile of such wave band especially with twinkling generation strong correlation, the image display device therefore possessing this antiglare film easily produces to dazzle. Although the Rq of the antiglare film of the present invention (0.25) is above-mentioned scope, but it is preferably more than 0.06 ��m and less than 0.08 ��m.

If Rq (0.8) is less than 0.07 ��m, then form the antiglare layer that the concaveconvex shape of more than wavelength 0.125mm and below 0.4mm is few, thus the anti-glare when the image display device possessing the antiglare film with this antiglare layer is observed from oblique (about 10��30 ��) becomes insufficient. If Rq (0.8) is more than 0.12 ��m, then the concaveconvex shape of more than wavelength 0.125mm and below 0.4mm is too much, obtains easily producing the image display device of whiting. Although the Rq of the antiglare film of the present invention (0.8) is above-mentioned scope, but it is preferably more than 0.08 ��m and less than 0.10 ��m.

If Rq (2.5) is less than 0.08 ��m, then form the antiglare layer that the concaveconvex shape of more than wavelength 0.4mm and below 1.25mm is few, thus the anti-glare when the image display device possessing the antiglare film with this antiglare layer is observed from oblique (more than 30 ��) becomes insufficient. If Rq (2.5) is more than 0.15 ��m, then the macrocyclic concaveconvex shape of more than wavelength 0.4mm and below 1.25mm is too much, and the surface tactile sensation of antiglare film is roughening. Although the Rq of the antiglare film of the present invention (2.5) is above-mentioned scope, but it is preferably more than 0.09 ��m and less than 0.11 ��m.

[luminous reflectance R_SCIWith luminous reflectance R_SCE]

Fig. 1 schematically shows for measuring luminous reflectance R in the light mode containing normal reflection_SCIFigure, Fig. 2 of optics system schematically show for measure luminous reflectance R without normal reflection light mode_SCEThe figure of optics system. Fig. 1 and Fig. 2 illustrates the optics system of diffused illumination mode. Diffused illumination mode is the method using integrating sphere etc. that mensuration sample is illuminated equably from all directions, in fig. 1 and 2, integrating sphere 12 (almost by the ball of inner face with white coatings such as barium sulfate of complete for light scattered reflection) it is provided with. Spread in the inside of integrating sphere 12 from light source 13 light out, reflected on the surface measuring sample 14. In fig. 2, it is provided with ligh trap 15 (in FIG in the position of the integrating sphere 12 being positioned at normal reflection direction relative to light accepting part, its structure is: be provided with the fixture with cone cavity, the light entering cone cavity is absorbed in cavity, will not return in integrating sphere 12), the light in the normal reflection direction of light accepting part can not arrive mensuration sample surfaces.

The optics system not using ligh trap as shown in Figure 1 is referred to as containing normal reflection optical mode (SCI pattern). On the other hand, the optics system employing ligh trap as shown in Figure 2 is referred to as without normal reflection optical mode (SCE pattern). The luminous reflectance that reflectance spectrum according to the sample measured with both of which calculates according to the method described in JISZ8722 is the luminous reflectance R measured in the light mode containing normal reflection_SCIWith the luminous reflectance R to measure without normal reflection light mode_SCE��

The luminous reflectance R that should measure in the light mode containing normal reflection_SCIWith the luminous reflectance R to measure without normal reflection light mode_SCERatio R_SCE/R_SCIWhen more than 0.1, using the environment light in environment to strengthen to the reflection light in user direction on the surface of antiglare film, result possesses the image display device of this antiglare film and whitens. It addition, this image display device has produces the trend that bright room contrast reduces. Compare R_SCE/R_SCIIt is preferably less than 0.08, more preferably less than 0.06. It addition, with the luminous reflectance R measured without normal reflection light mode_SCEIt is preferably less than 0.5%, more preferably less than 0.4%, more preferably less than 0.3%.

[total mist degree, Surface haze]

In order to show anti-glare, preventing whiting, the antiglare film of the present invention is the film relative to the scope that the scope that total mist degree is more than 0.1% and less than 3% of vertical incidence light, Surface haze are more than 0.1% and less than 2%. Total mist degree of antiglare film can be measured according to the method shown in JISK7136. The image display device being configured with total mist degree or the Surface haze antiglare film lower than 0.1% cannot demonstrate sufficient anti-glare, therefore not preferred. It addition, when total mist degree is more than 3% or Surface haze more than 2% when, the image display device being configured with this antiglare film can whiten, therefore not preferred. Such image display device is it also occur that its contrast also not enough such unfavorable condition.

The internal haze deducting Surface haze with total mist degree and obtain is more low more preferred. It is configured with the image display device of this internal haze antiglare film higher than 2.5%, there is the tendency that contrast declines.

[to specify average length Sm when intercepted length measures]

In the antiglare film of the present invention, the surface unevenness profile of this antiglare layer is the surface unevenness profile that r.m.s. roughness during to specify intercepted length to measure is above-mentioned scope, it is preferable that the average length respectively scope shown below when measuring with this appointment intercepted length. Specifically, preferably with intercepted length 0.25mm measure time average length Sm (0.25) for more than 90 ��m and less than 160 ��m, with intercepted length 0.8mm measure time average length Sm (0.8) for more than 100 ��m and less than 300 ��m, with intercepted length 2.5mm measure time average length Sm (2.5) for more than 200 ��m and less than 400 ��m.

The Sm (0.25) antiglare film less than 90 ��m has close to the many antiglare layer of the surface unevenness profile of 50 ��m, and the image display device being configured with this antiglare film is sometimes prone to produce to dazzle. The Sm (0.25) antiglare film more than 160 ��m has the antiglare layer that macrocyclic surface unevenness profile is too much, and the surface tactile sensation of this antiglare film is sometimes roughening. The Sm (0.8) antiglare film less than 100 ��m help to from oblique (about 10��30 ��) observe time the few antiglare layer of the surface unevenness profile in the cycle with 100��200 ��m of anti-glare, be configured with this antiglare film image display device from oblique observation time anti-glare sometimes decline. The Sm (0.8) antiglare film more than 300 ��m has the antiglare layer that macrocyclic surface unevenness profile is too much, and the surface tactile sensation of this antiglare film is sometimes roughening. The Sm (2.5) antiglare film less than 200 ��m help to from oblique (more than 30 ��) observe antiglare film time the few antiglare layer of the surface unevenness profile in the cycle with 200��300 ��m of anti-glare, possess this antiglare film image display device from oblique (more than 30 ��) observe antiglare film time anti-glare sometimes decline. The Sm (2.5) antiglare film more than 400 ��m has the antiglare layer that macrocyclic surface unevenness profile is too much, and the surface tactile sensation of this antiglare film is sometimes roughening.

[transmission definition (lightness) Tc, reflection definition Rc (45) and reflection definition Rc (60)]

The transmission definition sum Tc obtained under following condition determination of the antiglare film of the present invention is preferably more than 375%. Transmission definition sum Tc can obtain as follows: utilizes the method based on JISK7105, use the light comb of specified width, which width to measure image definition respectively, then obtains its adduction. Specifically, use five kinds of light combs that the ratio of the width in dark portion and bright portion is 1:1 and its width is 0.125mm, 0.25mm, 0.5mm, 1.0mm and 2.0mm, measure image definition respectively, then obtain its adduction, be set to Tc. When the Tc antiglare film lower than 375% is configured at the image display device of more fine, it is sometimes prone to occur to dazzle. For the upper limit of Tc, it is possible to select in the scope as less than the 500% of its maximum, if but this Tc is too high, then can obtain the image display device that anti-glare when observing easily reduces from front, and therefore this Tc is preferably such as less than 450%.

Reflection definition Rc (45) that the incident illumination utilizing angle of incidence 45 �� of the antiglare film of the present invention measures is preferably less than 180%. Reflection definition Rc (45) is same with above-mentioned Tc, the available method based on JISK7105 measures, the four kinds of light combs using width in above-mentioned five kinds of light comb to be 0.25mm, 0.5mm, 1.0mm and 2.0mm measure image definition respectively, and obtain its adduction, it is set to Rc (45). When Rc (45) is less than 180%, be configured with such antiglare film image display device from front and oblique observation time anti-glare become more good, it is thus preferred to. The lower limit of Rc (45) is not particularly limited, but in order to suppress whiting and the generation dazzled well, it is preferred to such as more than 80%.

Reflection definition Rc (60) that the incident illumination utilizing angle of incidence 60 �� of the antiglare film of the present invention measures is preferably less than 240%. Except changing angle of incidence, the method based on JISK7105 is utilized to measure reflection definition Rc (60) in the same manner as reflection definition Rc (45). When Rc (60) is less than 240%, be configured with this antiglare film image display device from oblique observe time anti-glare become more good, it is thus preferred to. The lower limit of Rc (60) is not particularly limited, but in order to suppress whiting and the generation dazzled well, it is preferred to such as more than 150%.

[manufacture method of the antiglare film of the present invention]

The antiglare film of the present invention such as can manufacture as described below. 1st method includes: prepare to be formed with the micro concavo-convex shape die for forming of the surface unevenness profile based on given pattern at molded surface, by the shape transfer of the convex-concave surface of this mould after transparent supporting mass, the transparent supporting mass of the shape transferred with male and fomale(M&F) is peeled off from mould. 2nd method includes: prepare the compositions comprising microgranule, resin (binding agent) and solvent and described microgranule is scattered in resin solution, said composition is coated on transparent supporting mass, and be dried as required, make the coated film (coated film comprising microgranule) being consequently formed solidify. In 2nd method, adjust the state of aggregation of coating film thickness, microgranule according to the drying condition etc. of the composition of above-mentioned composition, above-mentioned coated film, thus make microgranule expose on the surface of coated film, thus being formed random concavo-convex on transparent supporting mass. From the view point of the production stability of antiglare film, production repeatability, it is preferable that utilize the 1st method to manufacture the antiglare film of the present invention.

Here, it is described in detail for preferred 1st method of the manufacture method of the antiglare film as the present invention.

In order to form the antiglare layer of the surface unevenness profile with character described above accurately, the micro concavo-convex shape die for forming (hereinafter also referred to as " mould ") that prepare is important. More specifically, the surface unevenness profile (hereinafter also referred to " mould convex-concave surface ") that mould has is formed based on the pattern specified, and this given pattern is preferably curve chart calculated when representing its one-dimensional power spectrum with the form relative to the intensity of spatial frequency spatial frequency 0.015 ��m^-1Above and 0.05 ��m^-1Hereinafter there is a minimizing pattern. Here, described " pattern " refers to, in order to form the view data on the micro concavo-convex surface of the antiglare layer that antiglare film has or to have the mask etc. of transmittance section and light shielding part, hereinafter referred to as " pattern ".

First, the method for the pattern on the micro concavo-convex surface of the antiglare layer having for the antiglare film determining to be formed the present invention illustrates.

Such as, for the situation that this pattern is view data so that the method for solving of the two-dimensional power spectrum of pattern to be described. First, after this view data is converted to the binary image data of 2 tonal gradations, with binary function g, (x y) represents this tonal gradation. By the binary function g that obtains, (x y) carries out Fourier transformation to calculate binary function G (f as shown in following formula (1)_x, f_y), for another example shown in following formula (2) like that, to gained binary function G (f_x, f_y) absolute value take quadratic power, thus ask calculation two-dimensional power spectrum �� (f_x, f_y). Here, x and y represents the orthogonal coordinates in view data face. It addition, f_xAnd f_yRepresent the frequency in x direction and y direction respectively, there is the dimension that length is reciprocal.

�� in formula (1) is pi, i is imaginary unit.

��(f_x,f_y)=| G (f_x,f_y)|²... formula (2)

This two-dimensional power spectrum �� (f_x, f_y) represent pattern spatial frequency distribution. Generally, it is desirable to antiglare film is isotropism, therefore, the antiglare film manufacture pattern of the present invention is also isotropism. Thus, the binary function �� (f of the two-dimensional power spectrum of pattern is represented_x, f_y) can be represented by function of a single variable �� (f) of the distance f only relying upon distance initial point (0,0). This function of a single variable �� (f) represents the One-dimensional power spectrum of pattern. It follows that for by binary function �� (f_x, f_y) ask the method calculating function of a single variable �� (f) to illustrate. First, as formula (3), utilize polar coordinate representation as the binary function �� (f of the two-dimensional power spectrum of absolute altitude_x, f_y)��

��(f_x,f_y)=�� (fcos ��, fsin ��) ... formula (3)

Here, �� is the drift angle in Fourier space. Function of a single variable �� (f) can pass through to calculate the rotation of the binary function �� (fcos ��, fsin ��) of polar coordinate representation as formula (4) and on average obtain.

In order to precision excellent obtain the antiglare film of the present invention, it is preferable that One-dimensional power spectrum �� (f) of pattern is spatial frequency 0.015 ��m^-1Above and 0.05 ��m^-1Hereinafter there is minimum.

When asking for the two-dimensional power spectrum of pattern, (x y) generally obtains the binary function g of tonal gradation with the form of discrete function. Now, two-dimensional power spectrum is calculated by discrete Fourier transform. The One-dimensional power spectrum of pattern similarly can be obtained according to the two-dimensional power spectrum of pattern.

Additionally, in order to make gained surface unevenness profile be homogeneous and continuous print curved surface, it is preferable that make binary function g (x, meansigma methods y) is binary function g (x, y) maximum and binary function g (x, the 30��70% of the difference of minima y). When manufacturing mould convex-concave surface by photoetching process, (x, y) for the aperture opening ratio of pattern for this binary function g. For the situation being manufactured mould convex-concave surface by photoetching process, the aperture opening ratio of pre-defined described pattern here. When for photolithographic photoresist (�� ) for positive photoresist, its aperture opening ratio refers to: when describing view data to the coated film of this positive photoresist, relative to the region, whole surface of this coated film, the ratio shared by the region of exposure. On the other hand, when being negative photoresist for photolithographic photoresist, its aperture opening ratio refers to: when describing view data to the coated film of this negative photoresist, relative to the region, whole surface of this coated film, the ratio shared by the region of exposure. When photoetching process is disposable exposure, its aperture opening ratio refers to the transmittance section proportion of the mask with transmittance section and light shielding part.

The antiglare film of the present invention can be obtained as below: the One-dimensional power of pattern is composed spatial frequency 0.015 ��m^-1Above and 0.05 ��m^-1Hereinafter there is a minimum, manufacture desired mould, and use this mould, utilize above-mentioned 1st method to manufacture the antiglare film of the present invention.

In order to be produced on spatial frequency 0.015 ��m^-1Above and 0.05 ��m^-1Hereinafter there is the pattern of minimizing One-dimensional power spectrum, make the pattern of collocation point randomly in advance or determined the deep or light pattern (preparation pattern) with random lightness distribution by random number or the pseudo random number that utilizes computer to generate, from this preparation pattern, removing the component of specific spatial frequency range. In order to remove the component of this specific spatial frequency range, make above-mentioned preparation pattern by band filter.

In order to manufacture the antiglare film with the antiglare layer being formed with the surface unevenness profile based on given pattern, manufacture in order to the micro concavo-convex surface transfer that will be formed based on this given pattern in the mould with mould convex-concave surface of transparent supporting mass. Above-mentioned 1st method using such mould is to make the embossing that antiglare layer is feature on transparent supporting mass.

As above-mentioned embossing, the heat embossing method etc. the photo-embossing method using light-cured resin can be enumerated, using thermoplastic resin. Wherein, from productive viewpoint, it is preferable that photo-embossing method.

Photo-embossing method is to form light-cured resin layer by transparent supporting mass (surface of transparent supporting mass), it is made to solidify while this light-cured resin layer is urged to the mould convex-concave surface of mould, thus by the shape transfer of the mould convex-concave surface of mould in the method for light-cured resin layer. It is specific as follows: when the light-cured resin layer making to be coated with light-cured resin on transparent supporting mass and formed is sealed at mould convex-concave surface, light (this light uses the light that light-cured resin can be made to solidify) is irradiated from transparent supporting side, so that light-cured resin (light-cured resin contained by light-cured resin layer) solidifies, then, will be formed with the transparent supporting mass of the light-cured resin layer after solidifying to peel off from mould. For the antiglare film obtained by such manufacture method, the light-cured resin layer after solidification becomes antiglare layer. It should be noted that, from the viewpoint of the easy degree manufactured, as light-cured resin, preferred uv curing resin, when using this uv curing resin, the light irradiated uses ultraviolet (following, to be called " UV embossing " using using the uv curing resin embossing as light-cured resin). For the antiglare film having manufactured integrated with polarizing coating, use polarizing coating as transparent supporting mass, in the embossing being here illustrated, transparent supporting mass is replaced into polarizing coating and implements.

Kind for the uv curing resin of UV embossing is not particularly limited, it is possible to select to use suitable resin from commercial resins according to the kind of the transparent supporting mass used, ultraviolet kind. Such uv curing resin is the concept including being occurred photopolymerisable monomer (polyfunctional monomer), oligomer and polymer and their mixture by irradiation ultraviolet radiation. It addition, use, by combining, the light trigger suitably selected according to the kind of uv curing resin, it is possible to use also be able to the resin solidified by the visible ray of wavelength ratio ultraviolet line length. The preferences of this uv curing resin etc. are in aftermentioned explanation.

As the transparent supporting mass for UV embossing, such as glass, plastic foil etc. can be used. As plastic foil, as long as there is the suitable transparency, mechanical strength can use. Specifically can enumerate such as: by cellulose acetate esters resins such as TAC (cellulose triacetate); Acrylic resin; Polycarbonate resin; The polyester resins such as polyethylene terephthalate; The transparent resin film that the polyolefin resin such as polyethylene, polypropylene etc. are formed. These transparent resin films can be solvent cast film, it is also possible to is extruded film.

The thickness of transparent supporting mass is such as 10��500 ��m, is preferably 10��100 ��m, is more preferably 10��60 ��m. When this scope, there is the tendency obtaining the antiglare film with abundant mechanical strength in the thickness of transparent supporting mass, the image display device possessing this antiglare film is not susceptible to dazzle more.

On the other hand, heat embossing method is when heated and be pushed on mould convex-concave surface when softening by the transparent resin film formed by thermoplastic resin, the method that the surface unevenness profile of this mould convex-concave surface is needed on transparent resin film. As long as the transparent resin film also substantially optically transparent film for heat embossing method can be then any film, specifically, the material enumerated as the transparent resin film for UV embossing can be enumerated.

Hereinafter, illustrate for the method manufacturing the mould for embossing.

Manufacture method about mould, the scope of the mould that if the above-mentioned surface unevenness profile formed based on given pattern can be needed on transparent supporting mass by the forming surface that can manufacture this mould (can form the antiglare layer of the surface unevenness profile formed based on given pattern), then it is not particularly limited, but in order to manufacture the antiglare layer of this surface unevenness profile well with high accuracy, repeatability, it is preferable that photoetching process. Further, this photoetching process preferably includes following operation: [1] the 1st plating operation, [2] grinding step, [3] photosensitive resin film formation process, [4] exposure process, [5] developing procedure, [6] the 1st etching work procedures, [7] photosensitive resin film stripping process, [8] the 2nd etching work procedures, [9] the 2nd plating operations.

Fig. 3 is a preferred example of the first half schematically showing mould manufacturing method. Fig. 3 schematically shows the section of the mould in each operation. Hereinafter, in conjunction with Fig. 3, each operation of the manufacture method of the antiglare film die for manufacturing of the present invention is described in detail.

[1] the 1st plating operation

First, it is ready for the base material (mould base material) of Making mold, implements copper facing on the surface of this mould base material. By implementing copper facing in this wise on the surface of mould base material, the adaptation of chromium plating in aftermentioned 2nd plating operation, glossiness can be made to improve. For copper facing, owing to its covering property is high and smoothing effect is strong, therefore, it is possible to landfill mould base material small concavo-convex, empty etc. and formed smooth and have glossiness surface. Thus, by implementing copper facing at mould substrate surface in this wise, even if implementing chromium plating in the 2nd plating operation described later, it is also possible to elimination is considered as the coarse of the chrome-plated surface that causes of the micro concavo-convex that existed by base material, cavity. Further, since copper-plated covering property is high, reduce the generation of tiny crackle. Therefore, even if forming the surface unevenness profile (micro concavo-convex surface configuration) based on given pattern in mould substrate forming face, it is also possible to be substantially prevented from the deviation because the impact on substrate (mould base material) surfaces such as small concavo-convex, empty, crackle causes.

As the copper used in the copper facing of the 1st plating operation, it is possible to use the simple metal of copper, it is possible to use the alloy (copper alloy) being main constituent with copper. Therefore, it is the concept comprising copper and copper alloy for copper-plated " copper ". Copper facing can be plating, can also be electroless plating, but the copper facing of the 1st plating operation preferably employs plating. Further, the preferred coating in the 1st plating operation is not only for the coating that is made up of copper coating, it is also possible to be the coating being laminated by copper coating and the coating that formed by the metal beyond copper.

If the coating implemented copper facing on the surface of mould base material and formed is excessively thin, then cannot thoroughly getting rid of the impact (small concavo-convex, empty, crackle etc.) of substrate surface, therefore its thickness is preferably more than 50 ��m. The upper limit of thickness of coating is also absent from critical, but from the viewpoint of cost etc., it is preferred to less than about 500 ��m.

Mould base material is preferably the base material being made up of metal material. Further, from the view point of cost, as the material of this metal material, it is preferable that aluminum, ferrum etc. Further, from the viewpoint of the convenience of the operation of mould base material, it is particularly preferred to using the base material be made up of the aluminum of lightweight as mould base material. It should be noted that described aluminum here, ferrum are also respectively without for simple metal, it is also possible to be main constituent with aluminum or ferrum alloy.

As long as the shape that the shape of mould base material is suitable for the manufacture method of the antiglare film of the present invention. Specifically, it is possible to select from flat plate-like substrate, cylindrical substrate or cylindrical shape (tubular) base material etc. When manufacturing the antiglare film of the present invention continuously, it is preferable that mould is tubular, thus such mould can be manufactured by the mould base material of tubular.

[2] grinding step

In ensuing grinding step, the surface (coating) implementing copper-plated mould base material in above-mentioned 1st plating operation is ground. In the manufacture method of the mould adopted in the manufacture method of the antiglare film of the present invention, it is preferable that through this grinding step, mould substrate surface is ground to the state close to minute surface. For the commercially available product of the flat plate-like substrate used with base material as mould, tubular base material, in order to reach desired precision, implement the machinings such as cutting, grinding more, and thus can remain fine cutter trade at mould substrate surface. So, even if defined plating (being preferably copper facing) layer by the 1st plating operation, above-mentioned cutter trade can sometimes also be remained. Even if it addition, the plating implemented in the 1st plating operation, the surface of mould base material sometimes also may not necessarily be made to reach to smooth completely. Namely, even if the mould base material with such surface remaining deep processing vestige etc. being implemented the operation of [3] described later��[9], the surface unevenness profile of gained die surface is likely to and there are differences with the surface unevenness profile based on given pattern, or, it is possible to can comprise by cutter trade etc. cause concavo-convex. When using the mould of impact remaining cutter trade etc. to manufacture antiglare film, it is possible to cannot fully demonstrate the optical characteristics such as anti-glare of target, cause and cannot intended affect.

The Ginding process adopted in grinding step is not particularly limited, and can select Ginding process according to as the grinding shape of mould base material of object, character. As the concrete example of the Ginding process that can be applicable to grinding step, mechanical milling method, electrolytic polishing method and chemical grinding method etc. can be enumerated. Wherein, as mechanical milling method, any means in microstoning method, polishing, fluid polishing, buff wheel polishing etc. can be used. Alternatively, it is also possible to by using cutting element to carry out mirror-finish cutting in grinding step, so that the surface of mould base material becomes minute surface. For the material of cutting element now, shape, superhard cutter, CBN cutter, sintex, diamond cutter etc. can be used according to the kind of the material (metal material) of mould base material, but from the view point of machining accuracy, it is preferred to use diamond cutter. Surface roughness after grinding represents with the center line average roughness Ra based on JISB0601 standard, it is preferred to less than 0.1 ��m, be more preferably less than 0.05 ��m. When center line average roughness Ra after grinding is more than 0.1 ��m, it is possible to the impact of this surface roughness can be remained at the surface unevenness profile of the mould finally given. It addition, the lower limit of center line average roughness Ra is not particularly limited. Therefore, the process time from grinding step (milling time), processing cost viewpoint go out to send and determine lower limit.

[3] photosensitive resin film formation process

Hereinafter, in conjunction with Fig. 3, photosensitive resin film formation process is illustrated.

In photosensitive resin film formation process, the solution (photoresist solution) that photoresist is dissolved in solvent it is coated with on the surface 41 of the above-mentioned mould base material 40 implementing mirror ultrafinish obtained by grinding step, and be heated, dry, it is consequently formed photosensitive resin film (photoresist film). Fig. 3 schematically shows the state (Fig. 3 (b)) being formed with photosensitive resin film 50 on the surface 41 of mould base material 40.

As photoresist, conventional known photoresist can be used, it is also possible to directly or carry out refining using afterwards as needed through filtration etc. using commercially available as photoresist resin. Such as; as the photoresist of the minus with the raw character solidified of photographic department distribution, monomer or prepolymer, two-fold nitride (bisazide) and the mixture of diene rubber, the poly-vinyl cinnamate compounds etc. of (methyl) acrylate with acryloyl group or methylacryloyl can be used in molecule. It addition, the photoresist of the eurymeric as the character that there is the dissolution that photosensitive part occurs by developing, only remain not photosensitive part, phenolic resin class, novolac type resinae etc. can be used. The photoresist of such eurymeric or minus easily can also obtain from the market as positive photoresist or negative photoresist. Additionally, photoresist solution can also coordinate the various additives such as sensitizer, development accelerant, adaptation improving agent, coating modifying agent as desired, it is also possible to use as photoresist solution after being mixed with commercially available photoresist by such additive.

In order to these photoresist solution being coated the surface 41 of mould base material 40, from the viewpoint of form smoother photosensitive resin film, preferably select optimal solvent, use the photoresist solution being dissolved in such solvent by photoresist and being diluted and obtain. Such solvent also can select according to the kind of photoresist and dissolubility thereof. Specifically, it is possible to select from such as cellosolve type solvents, propandiols solvent, esters solvent, alcohols solvent, ketones solvent, highly polar solvent etc. When using commercially available photoresist, it is possible to according to the kind of solvent contained in this photoresist or carry out suitable preliminary experiment and select optimal photoresist, and photoresist solution is it can be used as to use.

Method as the surface photosensitive resin coating solution that have passed through mirror ultrafinish at mould base material, it is possible to select from following known method according to the shape of this mould base material etc.: meniscus coating, jetting type coating, dip-coating, spin coating, roller coat, wire rod coating, airblade coating, blade coating, curtain coating, ring coating (ringcoat) etc. The thickness of the photosensitive resin film after coating is preferably the scope of 1��10 ��m with dried thickness gauge, is more preferably the scope of 6��9 ��m.

[4] exposure process

Ensuing exposure process is by the above-mentioned photosensitive resin film 50 formed in photosensitive resin film formation process is exposed, thus the pattern of target is transferred to the operation of this photosensitive resin film 50. for wavelength photoreceptor according to photoresist contained in photosensitive resin film of the light source of exposure process, sensitivity etc. and suitably select, such as, can use: the g line (wavelength: 436nm) of high-pressure mercury-vapor lamp, h line (wavelength: 405nm), or i line (wavelength: 365nm), semiconductor laser (wavelength: 830nm, 532nm, 488nm, 405nm etc.), YAG laser (wavelength: 1064nm), KrF excimer laser (wavelength: 248nm), ArF excimer laser (wavelength: 193nm), F2 excimer laser (wavelength: 157nm) etc. Exposure mode can be the mode using the mask corresponding with the pattern of target to carry out disposable exposure, it is also possible to be description mode. it should be noted that the pattern as target is, as it have been described that, represent that the curve chart of One-dimensional power time spectrum is spatial frequency 0.015 ��m with the form relative to the intensity of spatial frequency^-1Above and 0.05 ��m^-1Hereinafter there is a minimizing pattern.

In the manufacture method of mould, in order to form the surface unevenness profile of this mould with higher precision, it is preferable that be exposed under the state being in that on photosensitive resin film critically to control target pattern. In order to be exposed in such a state, preferably on computers the pattern of target is made view data, utilizes the laser sent by the laser head being computer controlled to describe (laser description) pattern based on this view data on photosensitive resin film. Carry out laser when describing, it is possible to use such as general in galley making etc. laser drawing apparatus. As the commercially available product of such laser drawing apparatus, such as LaserStreamFX ((strain) ThinkLaboratory system) etc. can be enumerated.

Fig. 3 (c) schematically shows the state to photosensitive resin film 50 exposing patterns. When photosensitive resin film 50 comprises the photoresist of minus (such as, when using negative photoresist as photoresist solution), exposed region 51 accepts exposure energy and the cross-linking reaction of photoresist occurs, thus the dissolubility in aftermentioned developer solution reduces. Thus, in developing procedure, not exposed region 52 is dissolved by the developing, and only exposed region 51 residues on substrate surface, becomes mask 60. On the other hand, when photosensitive resin film 50 comprises the photoresist of eurymeric (such as, when using positive photoresist as photoresist solution), exposed region 51 accepts exposure energy and the scission of link etc. of photoresist occurs, and thus becomes easily to be dissolved in developer solution described later. Thus, in developing procedure, exposed region 51 is dissolved by the developing, and only not exposed region 52 residues on substrate surface, becomes mask 60.

[5] developing procedure

In developing procedure, when photosensitive resin film 50 comprises the photoresist of minus, not exposed region 52 is dissolved by the developing, and exposed region 51 remains on mould base material, becomes mask 60. On the other hand, when photosensitive resin film 50 comprises the photoresist of eurymeric, only exposed region 51 is dissolved by the developing, and not exposed region 52 remains on mould base material, becomes mask 60. For the mould base material defining given pattern with the form of photosensitive resin film, in the 1st etching work procedure, the photosensitive resin film remained on mould base material plays a role as the mask in aftermentioned 1st etching work procedure.

For the developer solution for developing procedure, it is possible to select suitable developer solution from conventional known developer solution according to the kind of the photoresist used. Such as, this developer solution can be enumerated: the alkaline aqueous solution of the cyclic amines etc. such as the quaternary ammonium compounds such as the alcaminess such as the tertiary amines such as the secondary amine such as primary amine class, diethylamine, di-n-butyl amine, triethylamine, methyidiethylamine, dimethylethanolamine, triethanolamine, Tetramethylammonium hydroxide, tetraethyl ammonium hydroxide, trimethyl hydroxyethylammoniumhydroxide hydroxide, pyrroles, piperidines such as the inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, ammonia, ethamine, n-propylamine; The organic solvent such as dimethylbenzene, toluene etc.

Developing method in developing procedure is not particularly limited, and can adopt immersion development, spray developing, brush development, supersonic wave development etc.

Fig. 3 (d) schematically shows and uses the resin of minus to carry out the state after developing procedure as photoresist. In Fig. 3 (d), not exposed region 52 is dissolved by the developing, and only exposed region 51 residues on substrate surface, and the photosensitive resin film in this region becomes mask 60. Fig. 3 (e) schematically shows and uses the resin of eurymeric to carry out the state after developing procedure as photoresist. In Fig. 3 (e), exposed region 51 is dissolved by the developing, and only not exposed region 52 residues on substrate surface, and the photosensitive resin film in this region becomes mask 60.

[6] the 1st etching work procedures

1st etching work procedure is to use the above-mentioned photosensitive resin film remained in after developing procedure on mould substrate surface as mask, the operation that the coating being mostly in maskless region in mould substrate surface is etched.

Fig. 4 schematically shows a preferred example of the latter half of mould manufacturing method. Fig. 4 (a) schematically shows the state after mainly being etched by the coating in maskless region by the 1st etching work procedure. Owing to photosensitive resin film plays a role as mask 60, therefore the coating of the bottom of mask 60 is not etched, but along with the carrying out of etching, the etching started from maskless region 45 is carried out. Thus, near the border in the region and maskless region 45 that there is mask 60, the coating of the bottom being positioned at mask 60 also can be etched. So, the coating also etched situation of mask 60 bottom near the border in the region and maskless region 45 that there is mask 60 is called lateral erosion.

Etch processes (the 1st etch processes) in 1st etching work procedure carries out usually by following operation: use iron chloride (FeCl₃) liquid, copper chloride (CuCl₂) liquid, alkali etching liquid (Cu (NH₃)₄Cl₂) etc. etching solution, make mould substrate surface is predominantly located at coating (metal surface) corrosion in the region of maskless 60. As this etch processes, it is possible to use the strong acid such as hydrochloric acid, sulphuric acid is as etching solution, when forming this coating by plating, it is also possible to the back-electrolysis etching of current potential contrary when applying with plating by adopting is etched process. The surface unevenness profile formed on mould base material when implementing etch processes is different according to the kind of etch processes in the constituent material (metal material) of mould base material or the kind of coating, the kind of photosensitive resin film and the 1st etching work procedure etc., cannot treat different things as the same, but when etch quantity is below 10 ��m, substantially isotropically it is etched from the mould substrate surface that etching solution contacts. Here described etch quantity refers to, the thickness of the coating being cut in because of etching.

Etch quantity in 1st etching work procedure is preferably 1��10 ��m, more preferably 2��5 ��m. When etch quantity is more than 10 ��m, the concavo-convex difference of height of the surface unevenness profile formed on mould increases. Its result, when using this Making mold antiglare film, compares R_SCE/R_SCISometimes more than 0.1. It is therefore preferable that the etch quantity in the 1st etching work procedure is set to less than 10 ��m and manufactures mould through aftermentioned operation, and then by using this Making mold antiglare film, it is possible to obtain being substantially prevented from the antiglare film that whiting occurs. On the other hand, when etch quantity is less than 1 ��m, mould is hardly formed surface unevenness profile, form the mould on the surface with general planar, so even use this Making mold antiglare film, this antiglare film also has surface unevenness profile hardly, therefore can not obtain the antiglare film of abundant anti-glare. It should be noted that the etch processes in the 1st etching work procedure can also be undertaken by an etch processes, it is also possible to be divided into twice etch processes carried out above. At this, when being divided into twice etch processes carried out above, the total of the etch quantity in the etch processes of more than twice is preferably 1��10 ��m.

[7] photosensitive resin film stripping process

Ensuing photosensitive resin film stripping process is the operation removed by the photosensitive resin film played a role as mask 60 in the 1st etching work procedure and remain on mould base material, it is preferable that completely removed by the photosensitive resin film remained on mould base material by this operation. In photosensitive resin film stripping process, it is preferred to use photosensitive resin film is dissolved by stripper. As stripper, the solution prepared by the concentration of the material enumerated as developer solution, pH etc. being modified can be used. Or, it is possible to use the solution identical with the developer solution used in developing procedure, by changing temperature, dip time etc. relative to developing procedure, photosensitive resin film is peeled off. In photosensitive resin film stripping process, the contact method (stripping means) for stripper Yu mould base material is not particularly limited, and can adopt dipping and stripping, injection stripping, brush stripping, ultrasound wave stripping etc.

Fig. 4 (b) schematically shows the state being completely dissolved by the photosensitive resin film used as mask 60 in the 1st etching work procedure and remove by photosensitive resin film stripping process. By the mask 60 being made up of photosensitive resin film and etch processes, define the 1st surface unevenness profile 46 at mould substrate surface.

[8] the 2nd etching work procedures

2nd etching work procedure is the operation for being made the 1st surface unevenness profile 46 passivation formed through the 1st etching work procedure by further etch processes (the 2nd etch processes). By the 2nd etch processes, at the 1st surface unevenness profile 46 place formed through the 1st etch processes, surface tilts precipitous partial disappearance (following, such situation making surface in surface unevenness profile tilt precipitous partial deactivation is called " shape passivation "). Fig. 4 (c) illustrates following state: by utilizing the 2nd etch processes to make the 1st surface unevenness profile 46 of mould base material 40 occur shape to be passivated, thus, surface tilts precipitous partial deactivation, defines and has the 2nd surface unevenness profile 47 that mild surface tilts. The optical characteristics of the antiglare film of the present invention that the mould carrying out the 2nd etch processes as described above and obtain has this mould of use and manufactures becomes more preferably effect.

2nd etch processes of the 2nd etching work procedure can also adopt the etch processes using the etching solution same with the 1st etching work procedure and back-electrolysis etching. The degree (in the surface unevenness profile after the 1st etching work procedure, surface tilts the disappearance degree of precipitous part) of the shape passivation after the 2nd etch processes is different according to concavo-convex size and the degree of depth etc. in the material of mould base material, the method for the 2nd etch processes and the surface unevenness profile that obtains through the 1st etching work procedure, therefore cannot treat different things as the same, but most important factor is the etch quantity in the 2nd etch processes in the situation (degree of shape passivation) controlling passivation. Here described etch quantity is also in the same manner as the situation of the 1st etching work procedure, and the thickness of the base material to be cut in because of the 2nd etch processes represents. If the etch quantity of the 2nd etch processes is little, then the effect for the shape passivation of the surface unevenness profile obtained by the 1st etching work procedure becomes insufficient. Therefore, shape is used to be passivated the antiglare film of insufficient Making mold it some times happens that whiten. On the other hand, if the etch quantity in the 2nd etch processes is excessive, then the concavo-convex basic disappearance of the surface unevenness profile formed through the 1st etching work procedure, it is possible to the mould with almost smooth surface can be obtained. Using the antiglare film of such Making mold with almost smooth surface, its anti-glare is likely to insufficient. Therefore, the etch quantity of the 2nd etch processes preferably in the scope of 1��50 ��m, more preferably in the scopes of 4��20 ��m it is preferred that in the scope of 13��18 ��m. About the 2nd etch processes, also in the same manner as the 1st etching work procedure, can be undertaken by the etch processes of 1 time, it is also possible to point 2 etch processes carried out above. Wherein, when etch processes is divided 2 times carried out above, it is preferable that the summation of the etch quantity in the etch processes of more than 2 times is 1��50 ��m.

[9] the 2nd plating operations

The final stage of Making mold is, the mould base material to the operation that have passed through above-mentioned [6] and [7], the operation preferably past above-mentioned [6]��[8] the surface of mould base material implement the 2nd plating operation of plating (be preferably chromium plating described later). By carrying out the 2nd plating operation, while the surface unevenness profile 47 making mould base material is passivated further, die surface can be protected by this plating. Fig. 4 (d) illustrates that surface unevenness profile there occurs the state of shape passivation (surface 70) by forming chromium coating 71 through the 2nd etch processes on the 2nd surface unevenness profile 47 formed as described above.

As the coating formed by the 2nd plating operation, from the viewpoint of having gloss, hardness is high, coefficient of friction is little, can obtain good release property, it is preferable that chromium plating. In chromium plating, it is particularly preferred to be referred to as the chromium plating of the display good gloss of so-called gloss chromium plating, decoration chromium plating etc. Chromium plating carries out usually by electrolysis, bathes as its plating, can use and comprise anhydrous chromic acid (CrO₃) and a small amount of sulfur aqueous acid as plating solution. By regulating electric current density and electrolysis time, the thickness of chromium coating can be controlled.

By so implementing the plating in the 2nd plating operation, preferred chromium plating, the mould of the antiglare film manufacture of the present invention can be obtained. By the surface unevenness profile of the mould substrate surface after the 2nd etch processes is implemented chromium plating, it is possible to obtain there occurs the mould that shape is passivated, its case hardness is improved simultaneously. In controlling the degree of the passivation of shape now, most important factor is the thickness of chromium coating. If this thickness is thin, then the degree of shape passivation is insufficient, if the thickness of chromium coating is blocked up, then productivity ratio is deteriorated, and produces to be referred to as the plating defect of the overshooting shape of dross, is therefore not suitable as the mould of the antiglare film manufacture of the present invention. The thickness of chromium coating is preferably in the scope of 1��20 ��m, more preferably in the scope of 3��15 ��m, more preferably in the scope of 3��6 ��m.

For the chromium coating formed through the 2nd plating operation, it is preferable that to be formed in the way of making Vickers hardness reach more than 800, more preferably to be formed in the way of making Vickers hardness reach more than 1000. When the Vickers hardness of chromium coating is lower than 800, when using mould to manufacture antiglare film, there is the tendency causing that the durability of this mould reduces.

Hereinafter, for the method as the antiglare film in order to manufacture the present invention, preferred above-mentioned photo-embossing method illustrates. As it has been described above, as photo-embossing method, it is particularly preferred to UV embossing, here, it is specifically described for the embossing using active energy ray-curable resin.

When being made the antiglare film of the present invention by photo-embossing legal system in order to be continuously manufactured by the antiglare film of the present invention, it is preferable that include following operation:

[P1] working procedure of coating: by the coating coating liquid containing active energy ray-curable resin on the transparent supporting mass of continuous transport, thus forming overlay;

[P2] main curing process: when die surface is pushed on overlay surface, irradiates active energy beam from transparent supporting side.

It addition, when being made the antiglare film of the present invention by photo-embossing legal system, more preferably include following operation:

[P3] precuring operation: after working procedure of coating [P1], before curing process [P2], irradiates active energy beam to the end regions of the both sides of the width of overlay.

Hereinafter, in conjunction with accompanying drawing, each operation is described in detail. Fig. 5 schematically shows the preferred example manufacturing device of the manufacture method of the antiglare film for the present invention. Arrow in Fig. 5 represents the carrying direction of film or the direction of rotation of roller.

[P1] working procedure of coating

In working procedure of coating, the coating coating liquid containing active energy ray-curable resin on transparent supporting mass, thus forming overlay. Working procedure of coating as shown in Figure 5, relative to the transparent supporting mass 81 being exported from outlet roller 80, contains the coating liquid of actinic energy ray curable resion composition in coating region 83 coating.

Coating liquid coating on transparent supporting mass 81 can pass through such as gravure coating process, micro-gravure coating process, stick coating method, scraper for coating method, air knife coating method, lick coating, die coating method etc. carries out.

(transparent supporting mass)

As long as transparent supporting mass 81 has the supporting mass of light transmission, such as glass, plastic foil etc. can be used. As plastic foil, as long as having the transparency of appropriateness, mechanical strength. Specifically, any supporting mass in the above-mentioned supporting mass enumerated as the transparent supporting mass for UV embossing can be used, further, in order to be continuously manufactured by the antiglare film of the present invention by photo-embossing method, can be chosen with the flexible material of appropriateness.

For improveing the screening characteristics of coating liquid, improveing the transparent supporting mass purpose with the cementability of overlay, it is possible to various surface treatment is implemented on the surface (overlay side surface) of transparent supporting mass 81. As surface treatment, can enumerate: Corona discharge Treatment, glow discharge process, acid surfaces process, alkali surface treatment, ultraviolet radiation process etc. Alternatively, it is also possible to form other layers such as such as priming coat on transparent supporting mass 81, and on this other layer coating liquid coating.

Additionally, antiglare film as the present invention, when having manufactured antiglare film integrated with polarizing coating, in order to improve the cementability between transparent supporting mass and polarizing coating, it is preferable that beforehand through various surface treatments, the surface (surface with overlay opposite side) of transparent supporting mass is carried out hydrophiling. This surface treatment can also carry out after the manufacture of antiglare film.

(coating liquid)

Coating liquid contains active energy ray-curable resin, comprises Photoepolymerizationinitiater initiater (radical polymerization initiator) generally further. The various additives such as light transmission microgranule, organic solvent equal solvent, levelling agent, dispersant, antistatic additive, anti-fouling agent, surfactant can also be comprised as desired.

(1) active energy ray-curable resin

As active energy ray-curable resin, it may be preferable to use the resin such as containing multifunctional (methyl) acrylate compounds. Described multifunctional (methyl) acrylate compounds, is the compound in molecule with at least 2 (methyl) acryloxies. As the concrete example of multifunctional (methyl) acrylate compounds, can enumerate such as: the multifunctional polymerizable compound etc. that polyhydric alcohol comprises more than 2 (methyl) acryloyl groups with the ester compounds of (methyl) acrylic acid formation, carbamate (methyl) acrylate compounds, polyester (methyl) acrylate compounds, epoxy (methyl) acrylate compounds etc.

As polyhydric alcohol, can enumerate such as: ethylene glycol, diethylene glycol, triethylene glycol, TEG, Polyethylene Glycol, propylene glycol (�� Application �� U Le), dipropylene glycol, tripropylene glycol, four propylene glycol, polypropylene glycol, propylene glycol (�� Application �� Le), butanediol, pentanediol, hexanediol, neopentyl glycol, 2-ethyl-1,3-hexanediol, 2, the such 2 yuan of alcohol of 2 '-dihydroxyethylsulfide, 1,4-CHDM; Trimethylolpropane, glycerol, tetramethylolmethane, two glycerol, dipentaerythritol, such more than 3 yuan of double trimethylolpropane alcohol.

As the carboxylate that polyhydric alcohol is formed with (methyl) acrylic acid, specifically can enumerate: ethylene glycol bisthioglycolate (methyl) acrylate, diethylene glycol two (methyl) acrylate, 1, 6-hexanediol two (methyl) acrylate, neopentyl glycol two (methyl) acrylate, trimethylolpropane tris (methyl) acrylate, trimethylolethane trimethacrylate (methyl) acrylate, tetramethylol methane three (methyl) acrylate, 1, 6-hexanediol two (methyl) acrylate, tetramethylol methane four (methyl) acrylate, five polyglycereol three (methyl) acrylate, tetramethylolmethane three (methyl) acrylate, tetramethylolmethane four (methyl) acrylate, glycerol three (methyl) acrylate, dipentaerythritol three (methyl) acrylate, dipentaerythritol four (methyl) acrylate, dipentaerythritol five (methyl) acrylate, dipentaerythritol six (methyl) acrylate.

As carbamate (methyl) acrylate compounds, the organic isocyanate in 1 molecule with multiple NCO can be enumerated and the ammonia reactant of esterification of (methyl) acrylic acid derivative with hydroxyl. As the organic isocyanate in 1 molecule with multiple NCO, can enumerate: have the organic isocyanate of 2 NCOs in 1 molecules such as hexamethylene diisocyanate, isophorone diisocyanate, toluene di-isocyanate(TDI), naphthalene diisocyanate, methyl diphenylene diisocyanate, XDI, dicyclohexyl methyl hydride diisocyanate, these organic isocyanates are isocyanurate-modified, adduct modified, have the organic isocyanate etc. of 3 NCOs in 1 biuret modified molecule. As (methyl) acrylic acid derivative with hydroxyl, can enumerate: (methyl) acrylic acid 2-hydroxy methacrylate, (methyl) acrylic acid 2-hydroxy propyl ester, (methyl) acrylic acid 4-hydroxybutyl, (methyl) acrylic acid 2-hydroxybutyl, (methyl) acrylic acid 2-hydroxyl-3-phenoxy-propyl, pentaerythritol triacrylate.

As polyester (methyl) acrylate compounds, it is preferred to make polyester (methyl) acrylate that hydroxyl polyester reacts with (methyl) acrylic acid and obtains. The hydroxyl polyester being preferably used is by polyhydric alcohol and carboxylic acid or has a compound of multiple carboxyl and/or hydroxyl polyester that its anhydride obtains through esterification. As polyhydric alcohol, the polyhydric alcohol identical with aforesaid compound can be enumerated. It addition, except polyhydric alcohol, the bisphenol-A etc. as phenols also can be enumerated. As carboxylic acid, formic acid, acetic acid, butyl carboxylic acid, benzoic acid etc. can be enumerated. As compound and/or its anhydride with multiple carboxyl, can enumerate: maleic acid, phthalic acid, fumaric acid, itaconic acid, adipic acid, p-phthalic acid, maleic anhydride, phthalic anhydride, trimellitic acid, cyclohexane cyclohexanedimethanodibasic acid anhydride etc.

In multifunctional (methyl) acrylate compounds as above, the easiness improved from the viewpoint of the intensity of its solidfied material and obtain, it is preferable that the ester compounds such as hexanediol two (methyl) acrylate, neopentyl glycol two (methyl) acrylate, diethylene glycol two (methyl) acrylate, tripropylene glycol two (methyl) acrylate, trimethylolpropane tris (methyl) acrylate, tetramethylolmethane three (methyl) acrylate, dipentaerythritol six (methyl) acrylate; The addition product of hexamethylene diisocyanate and (methyl) acrylic acid 2-hydroxy methacrylate; The addition product of isophorone diisocyanate and (methyl) acrylic acid 2-hydroxy methacrylate; The addition product of toluene di-isocyanate(TDI) and (methyl) acrylic acid 2-hydroxy methacrylate; The addition product of adduct modified isophorone diisocyanate and (methyl) acrylic acid 2-hydroxy methacrylate; And the addition product of biuret modified isophorone diisocyanate and (methyl) acrylic acid 2-hydroxy methacrylate. Further, these multifunctional (methyl) acrylate compounds can individually use, or two or more combination is used.

In active energy ray-curable resin except above-mentioned multifunctional (methyl) acrylate compounds, it is also possible to containing simple function (methyl) acrylate compounds. as simple function (methyl) acrylate compounds, can enumerate such as: (methyl) acrylic acid methyl ester., (methyl) ethyl acrylate, (methyl) butyl acrylate, (methyl) Isobutyl 2-propenoate, (methyl) tert-butyl acrylate, (methyl) acrylic acid 2-hydroxy methacrylate, (methyl) acrylic acid 2-hydroxy propyl ester, (methyl) hydroxy butyl acrylate, (methyl) acrylic acid 2-hydroxybutyl, (methyl) acrylic acid 2-hydroxyl-3-phenoxy-propyl, (methyl) glycidyl acrylate, acryloyl morpholine, NVP, (methyl) tetrahydrofurfuryl acrylate, (methyl) cyclohexyl acrylate, (methyl) 2-EHA, (methyl) isobornyl acrylate, acetyl group (methyl) acrylate, (methyl) benzyl acrylate, (methyl) acrylic acid 2-ethoxy ethyl ester, (methyl) acrylic acid 3-methoxy butyl acrylate, ethyl carbitol (methyl) acrylate, phenoxy group (methyl) acrylate, ethylene-oxide-modified phenoxy group (methyl) acrylate, epoxy pronane modification (methyl) acrylate, nonyl phenol (methyl) acrylate, ethylene-oxide-modified (methyl) acrylate, epoxy pronane modification nonyl phenol (methyl) acrylate, methoxyl group diethylene glycol (methyl) acrylate, 2-(methyl) acryloyl-oxyethyl-2-hydroxypropyl phthalate, (methyl) acrylate, (methyl) esters of acrylic acids such as methoxy triethylene (methyl) acrylate. these compounds can individually use, or two or more combination is used.

It addition, active energy ray-curable resin can also contain polyreactive oligomers. By containing polyreactive oligomers, it is possible to adjust the hardness of solidfied material. Polyreactive oligomers can be such oligomer such as the dimer of such as above-mentioned multifunctional (methyl) acrylate compounds, i.e. polyhydric alcohol and the ester compounds of (methyl) acrylic acid formation, carbamate (methyl) acrylate compounds, polyester (methyl) acrylate compounds or epoxy (methyl) acrylate etc., trimer.

As other polyreactive oligomers, can enumerate: by molecule having the polyisocyanates of at least 2 NCOs and having that the polyhydric alcohol of at least 1 (methyl) acryloxy is reacted and carbamate (methyl) acrylate oligomer that obtains. as polyisocyanates, can enumerate: hexamethylene diisocyanate, isophorone diisocyanate, toluene di-isocyanate(TDI), methyl diphenylene diisocyanate, the polymer etc. of XDI, as the polyhydric alcohol with at least 1 (methyl) acryloxy, hydroxyl (methyl) acrylate obtained by polyhydric alcohol and (methyl) acrylic acid can be enumerated through esterification, and polyhydric alcohol is such as 1, 3-butanediol, 1, 4-butanediol, 1, 6-hexanediol, diethylene glycol, triethylene glycol, neopentyl glycol, Polyethylene Glycol, polypropylene glycol, trimethylolpropane, glycerol, tetramethylolmethane, dipentaerythritol etc. this polyhydric alcohol with at least 1 (methyl) acryloxy is a part and (methyl) acrylic acid generation esterification of the alcohol hydroxyl group of polyhydric alcohol and has alcohol hydroxyl group to remain in the polyhydric alcohol in molecule.

Additionally, as the example of other polyreactive oligomers, polyester (methyl) acrylate oligomer that is reacted with the polyhydric alcohol with at least 1 (methyl) acryloxy by the compound and/or its anhydride with multiple carboxyl and that obtain can be enumerated. As compound and/or its anhydride with multiple carboxyl, the compound identical with record in polyester (methyl) acrylate of above-mentioned multifunctional (methyl) acrylate compounds and/or its anhydride can be enumerated. It addition, as the polyhydric alcohol with at least 1 (methyl) acryloxy, the polyhydric alcohol identical with record in above-mentioned carbamate (methyl) acrylate oligomer can be enumerated.

Except polyreactive oligomers as above, example as carbamate (methyl) acrylate oligomer, it is possible to enumerate further: make the hydroxyl reaction of isocyanates and hydroxyl polyester, hydroxyl polyethers or hydroxyl (methyl) acrylate and the compound that obtains. The hydroxyl polyester being preferably used is by polyhydric alcohol and carboxylic acid or has a compound of multiple carboxyl and/or hydroxyl polyester that its anhydride obtains through esterification. As polyhydric alcohol, the compound with multiple carboxyl and/or its anhydride, the compound identical with record in polyester (methyl) acrylate compounds of multifunctional (methyl) acrylate compounds can be enumerated respectively. The hydroxyl polyethers being preferably used is the alkylene oxide one kind or two or more by addition on polyhydric alcohol and/or 6-caprolactone and the hydroxyl polyethers that obtains. Polyhydric alcohol can be the polyhydric alcohol same with the polyol phase that can be used for above-mentioned hydroxyl polyester. As hydroxyl (methyl) acrylate being preferably used, hydroxyl (methyl) acrylate identical with the record in carbamate (methyl) acrylate oligomer of polyreactive oligomers can be enumerated. As isocyanates, it is preferable that molecule has the compound of more than 1 NCO, it is particularly preferred to divalent isocyanate compounds such as toluene di-isocyanate(TDI), hexamethylene diisocyanate, isophorone diisocyanate.

These polyreactive oligomers compounds can be used alone respectively or and use two or more.

(2) Photoepolymerizationinitiater initiater

Photoepolymerizationinitiater initiater suitably can select according to the kind of the active energy beam of the antiglare film manufacture suitable in the present invention. It addition, when using electron beam as active energy beam, also the coating liquid not containing Photoepolymerizationinitiater initiater is used for the antiglare film manufacture of the present invention sometimes.

As Photoepolymerizationinitiater initiater, can use such as: 1-Phenylethanone. system Photoepolymerizationinitiater initiater, benzoin system Photoepolymerizationinitiater initiater, benzophenone series Photoepolymerizationinitiater initiater, thiaxanthone system Photoepolymerizationinitiater initiater, triazine system Photoepolymerizationinitiater initiater, diazole system Photoepolymerizationinitiater initiater etc. Additionally; as Photoepolymerizationinitiater initiater; can also use such as: TMDPO, 2; 2 '-bis-(Chloro-O-Phenyls)-4; 4 ', 5,5 '-tetraphenyl-1; 2 '-bis-imidazoles, 10-butyl-2-chloro-acridine ketone, 2-ethyl-anthraquinone, benzil, 9,10-phenanthrenequione, camphorquinone, methyl benzoylformate, titanocenes compound etc. Relative to active energy ray-curable resin 100 weight portion, the consumption that makes of Photoepolymerizationinitiater initiater is generally 0.5��20 weight portion, is preferably 1��5 weight portion.

In order to improve the coating liquid screening characteristics relative to transparent supporting mass, coating liquid also comprises organic solvent equal solvent sometimes. As organic solvent, it may be considered that select from following solvents to viscosity etc. to use: the aliphatic hydrocarbons such as hexane, hexamethylene, octane; The aromatic hydrocarbon such as toluene, dimethylbenzene; The alcohols such as ethanol, 1-propanol, isopropanol, n-butyl alcohol, Hexalin; The ketones such as methyl ethyl ketone, methyl iso-butyl ketone (MIBK), Ketohexamethylene; The esters such as ethyl acetate, butyl acetate, isobutyl acetate; The glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monomethyl ether, TC, propylene glycol monomethyl ether, propylene glycol monoethyl; The esterification glycol ethers such as ethylene glycol monomethyl ether acetic acid ester, propylene glycol monomethyl ether; The cellosolve classes such as 2-methyl cellosolve, cellosolvo, butoxy ethanol; The carbitol classes etc. such as 2-(2-methoxy ethoxy) ethanol, 2-(2-ethoxy ethoxy) ethanol, 2-(2-Butoxyethoxy) ethanol. These solvents can be used alone, it is also possible to multiple mixing is used as desired. After coating, it is necessary to make above-mentioned organic solvent evaporation. For this, it is preferable that boiling point is the scope of 60 DEG C��160 DEG C. Additionally, it is preferred that the saturated vapor at 20 DEG C is pressed in the scope of 0.1kPa��20kPa.

In the solvent-laden situation of coating liquid bag, it is preferable that the drying process making solvent evaporate and to be dried is set after above-mentioned working procedure of coating, before the 1st curing process. Dry can example as shown in Figure 5 such, by making the transparent supporting mass 81 possessing overlay by carrying out in dry section 84. Baking temperature suitably can select according to the solvent used, the kind of transparent supporting mass. Generally the scope of 20 DEG C��120 DEG C, but it is not limited to this. It addition, when drying oven has multiple, it is possible to change temperature for each drying oven. The thickness of dried overlay is preferably 1��30 ��m.

Thus, transparent supporting mass is formed and duplexer that overlay is laminated.

[P2] curing process

This operation is by irradiating active energy beam from transparent supporting side when the mould convex-concave surface (forming surface) with desired surface unevenness profile is pushed on overlay surface, overlay is made to solidify, thus forming the operation of the resin bed of solidification on transparent supporting mass. Thus, it is possible to while making overlay solidify, the surface unevenness profile of mould convex-concave surface is needed on overlay surface. Mould used herein is the mould of tubular, is the mould using the mould base material of tubular to manufacture in the mould manufacturing method that described above is crossed.

This operation can be as shown in Figure 5, such as, it is configured at the ultraviolet lamp isoreactivity energy-ray irradiation unit 86 of transparent supporting mass 81 side in coating region 83 (when being dried by utilizing, for dry section 84, when carrying out precuring operation described later, farther include to carry out the precuring district of the irradiation based on active energy beam irradiation unit 86) by have overlay duplexer irradiate active energy beam and carry out.

First, utilize niproll 88 press fit device such as grade that the mould 87 of tubular is pushed on the surface of overlay of the duplexer after have passed through curing process, and in this condition, use active energy beam irradiation unit 86 to irradiate active energy beam from transparent supporting mass 81 side, so that overlay 82 solidifies. Here, described " making overlay solidify " refers to, makes active energy ray-curable resin contained in this overlay accept the energy of active energy beam and curing reaction occurs. Use niproll for prevent bubble be mixed between the overlay of duplexer and mould for be effective. Active energy beam irradiation unit can use 1, it is possible to use multiple stage.

After irradiating active energy beam, duplexer is peeled off from mould 87 with the niproll 89 of outlet side for fulcrum. For the overlay of the transparent supporting mass of gained and solidification, the overlay of this solidification becomes antiglare layer, obtains the antiglare film of the present invention. The usual tunicle coiler device 90 of gained antiglare film winds. Now, for the purpose of protection antiglare layer, it is possible to be wound while the protecting film that anti-glare layer surface laminating is made up of polyethylene terephthalate, polyethylene etc. across the adhesive phase with releasable. It should be noted that the situation that mould used herein above has been for cylindrical die is illustrated but it also may use the mould beyond tubular. Alternatively, it is also possible to the active energy beam carrying out adding after peeling off from mould irradiates.

As the active energy beam used in this operation, suitably can select from ultraviolet, electron beam, nearultraviolet rays, visible ray, near infrared ray, infrared ray, X ray etc. according to the kind of the active energy ray-curable resin comprised in coating liquid, in these, preferred ultraviolet and electron beam, from the viewpoint of easy and simple to handle, high-energy can be obtained, particularly preferably ultraviolet (as it has been described above, as photo-embossing method, it is preferable that UV embossing).

As ultraviolet light source, can use such as: low pressure mercury lamp, middle medium pressure mercury lamp, high-pressure mercury-vapor lamp, extra-high-pressure mercury vapour lamp, carbon arc lamp, Non-polarized lamp, metal halide lamp, xenon arc lamp etc. Furthermore it is also possible to use ArF excimer laser, KrF excimer laser, Excimer lamp or synchrotron radiation light etc. In these, it is preferred to use extra-high-pressure mercury vapour lamp, high-pressure mercury-vapor lamp, low pressure mercury lamp, Non-polarized lamp, xenon arc lamp, metal halide lamp.

Additionally, as electron beam, can enumerate by Cockcroft-Wal pause (CockcroftWalton) type, model De Graff (VandeGraaff) type, resonance variable-pressure, insulating core variable-pressure, linear type, the electron beam of the energy with 50��1000keV, preferably 100��300keV of various electron-beam accelerators release of that rice (Dynamitron) type, high-frequency type etc.

Active energy beam is in ultraviolet situation, and the accumulative light quantity under ultraviolet UVA is preferably 100mJ/cm²Above and 3000mJ/cm²Below, it is more preferably 200mJ/cm²Above and 2000mJ/cm²Below. Further, since there is also transparent supporting mass to absorb the ultraviolet situation of short wavelength side, therefore ultraviolet accumulative light quantity in UVV (395��445nm) is preferably 100mJ/cm²Above and 3000mJ/cm²Below, it is more preferably 200mJ/cm²Above and 2000mJ/cm²Below. Accumulative light quantity is lower than 100mJ/cm²When, the solidification of overlay is insufficient, exists and causes the hardness of gained antiglare layer to reduce or uncured resin is attached to deflector roll etc. and becomes the tendency of the reason causing operation to pollute. It addition, accumulative light quantity is more than 3000mJ/cm²When, ultraviolet lamp the heat radiated may become and causes that transparent supporting mass shrinks and wrinkling reason.

[P3] precuring operation

The end regions that this operation is the both sides of the width of the transparent supporting mass of the forward direction overlay at above-mentioned curing process irradiates active energy beam, so that the operation of this region, both ends precuring. Fig. 6 is the profile schematically showing precuring operation. In figure 6, the end regions 82b of the width (direction vertical with carrying direction) of overlay is that the end comprising overlay is in interior and specified width, which width from end region.

In precuring operation, by making end regions solidify in advance, it is possible to make in end regions and the adaptation of transparent supporting mass 81 improves further, thus the operation after curing process preventing from pollute operation because solidifying peeling-off the falling of a part of resin. End regions 82b can be set to such as more than the 5mm from the end of overlay 82 and 50mm area below.

To the irradiation of the active energy beam that the end regions of overlay carries out referring to Fig. 5 and Fig. 6, such as, can pass through to utilize be respectively arranged at ultraviolet lamp isoreactivity energy-ray irradiation unit 85 near the both ends of overlay 82 side to when coating region 83 (when being dried, for dry section 84) by after the transparent supporting mass 81 with overlay 82 irradiate active energy beam and carry out. As long as the end regions 82b of overlay 82 can be irradiated the device of active energy beam by active energy beam irradiation unit 85, it is possible to be arranged at transparent supporting mass 81 side.

About kind and the light source of active energy beam, same with main curing process. Active energy beam is in ultraviolet situation, and the accumulative light quantity under ultraviolet UVA is preferably 10mJ/cm²Above and 400mJ/cm²Below, it is more preferably 50mJ/cm²Above and 400mJ/cm²Below. By with 50mJ/cm²Above accumulative light quantity is irradiated, it is possible to more effectively prevent the deformation in main curing process. It should be noted that accumulative light quantity is more than 400mJ/cm²Time, curing reaction excessively carries out, its result, it is possible to cause the border in cured portion Yu uncured portion, film thickness difference, the distortion of internal stress cause resin to peel off.

Above, the 1st method to the antiglare film manufacturing the present invention centered by preferred embodiment, it is illustrated, but the antiglare film of the present invention manufactures also by above-mentioned 2nd method. Such 2nd method is described above, it is that fine-grained for dispersion resin solution is coated on transparent supporting mass, microgranule is made to expose on coated film surface, on transparent supporting mass, thus form method concavo-convex at random, at this point it is possible to adjust the particle diameter (mean diameter) of microgranule and the thickness of coated film or atomic dispersity that use. Especially, the thickness being made coated film by the particle diameter and adjustment increasing microgranule is more than particle diameter, fine particle the scattering light caused reduces, it is possible to reduces and compares R_SCE/R_SCIWith the luminous reflectance R to measure without normal reflection light mode_SCE. Even if it addition, by microgranule by adjusting the forming of coating liquid, manufacturing condition in the way of to a certain degree condensing, it is also possible to reduce and compare R_SCE/R_SCIWith luminous reflectance R_SCE��

[purposes of the antiglare film of the present invention]

The antiglare film of the present invention obtained as indicated above can be used for image display device etc., is usually implemented as the viewing side protecting film of viewing side polarization plates and fits in polarizing coating and use (that is, the surface being configured at image display device). It addition, as it has been described above, when use polarizing coating as transparent supporting mass, the antiglare film one-piece type in order to obtain polarizing coating, it is also possible to antiglare film one-piece type for such polarizing coating is used for image display device. The image display device of the antiglare film possessing the present invention has sufficient anti-glare in wide viewing angle, and can prevent whiting and the generation dazzled well.

Embodiment

Hereinafter, enumerate embodiment the present invention is described in more detail. In example, expression content or " % " and " part " that make consumption are weight basis when not having specified otherwise.

Mould or the evaluation methodology of antiglare film in following example are as described below.

[1] mensuration of the surface configuration of antiglare film

(surface roughness parameter of surface unevenness profile)

By the method according to JISB0601, the surfagauge SurftestSJ-301 of (strain) Mitutoyo is used to determine the surface roughness parameter of antiglare film. In order to prevent from measuring the warpage of sample, use optically transparent binding agent, be used for measuring after the face with antiglare layer opposition side measuring sample is fitted in glass substrate.

[2] mensuration of the optical characteristics of antiglare film

(mist degree)

Total mist degree of antiglare film measures as follows: for antiglare film, use optically transparent binding agent, the face with antiglare layer opposite side measuring sample is fitted in glass substrate, and to fitting in the antiglare film of this glass substrate, from glass substrate side incident illumination, utilize the method based on JISK7136, use haze meter " HM-150 " type that in (strain) village, color technical research institute manufactures to measure. By obtaining the internal haze of antiglare film and deducting internal haze according to following formula with total mist degree, Surface haze thus can be obtained.

Surface haze=total mist degree-internal haze

Internal haze measures as follows: utilize glycerol after the mensuration through total mist degree measure sample anti-dazzle aspect laminating mist degree essentially 0 tri cellulose acetate membrane, then utilize the method identical with total mist degree measured.

(transmission definition)

Utilize the method based on JISK7105, use SugaTestInstruments (strain) the reflection analyzer " ICM-1DP " made to determine the transmission definition of antiglare film. Now, in order to prevent the warpage of sample, optically transparent binding agent is also used to be used for measuring after the face with antiglare layer opposite side measuring sample is fitted in glass substrate. Under this state, make light incident from glass substrate side, measured. Here measured value, is that five kinds of light of width respectively 0.125mm, 0.25mm, 0.5mm, 1.0mm and 2.0mm of using dark portion and bright portion comb the aggregate value measuring the value obtained respectively.

(the reflection definition measured under angle of light 45 ��)

Utilize the method based on JISK7105, use SugaTestInstruments (strain) the reflection analyzer " ICM-1DP " made to determine the reflection definition of antiglare film. Now, in order to prevent the warpage of sample, optically transparent binding agent is also used to be used for measuring after the face with antiglare layer opposite side measuring sample is fitted in black acrylic resin substrate. Under this state, make light from anti-dazzle aspect side with 45 �� of incidences, measured. Here measured value, is that four kinds of light of width respectively 0.25mm, 0.5mm, 1.0mm and 2.0mm of using dark portion and bright portion comb the aggregate value measuring the value obtained respectively.

(the reflection definition measured under angle of light 60 ��)

Utilize the method based on JISK7105, use SugaTestInstruments (strain) the reflection analyzer " ICM-1DP " made to determine the reflection definition of antiglare film. Now, in order to prevent the warpage of sample, optically transparent binding agent is also used to be used for measuring after the face with antiglare layer opposite side measuring sample is fitted in black acrylic resin substrate. Under this state, make light from anti-dazzle aspect side with 60 �� of incidences, measured. Here measured value, is that four kinds of light of width respectively 0.25mm, 0.5mm, 1.0mm and 2.0mm of using dark portion and bright portion comb the aggregate value measuring the value obtained respectively.

(luminous reflectance R_SCIWith luminous reflectance R_SCE)

Use spectral photometric colour measuring meter CM2002 (KonicaMinoltaSensing system), determine the luminous reflectance R measured in the light mode containing normal reflection_SCIWith the luminous reflectance R to measure without normal reflection light mode_SCE. Eliminate from the reflection with antiglare layer opposite side measuring sample. In order to prevent from measuring the warpage of sample, optically transparent binding agent is used to be used for measuring after the face with antiglare layer opposition side measuring sample is fitted in black acrylic board.

[3] evaluation of the anti-dazzle performance of antiglare film

(visual assessment mirror, whitened)

In order to prevent the reflection at the back side from antiglare film, the face with antiglare layer opposite side as the antiglare film measuring sample is fitted in black acrylic resin plate, in the bright indoor with fluorescent lamp, carry out perusal from antiglare layer side, the degree of the degree mirrored of fluorescent lamp, whiting has been carried out visual assessment. About mirroring, be respectively directed to from front observe antiglare film time mirror degree and from oblique 30 �� observe antiglare film time the degree that mirrors evaluated. Mirror and whiten respectively according to the Three Estate of 1��3, evaluated based on following benchmark.

Mirror 1: do not observe and mirror.

2: somewhat observe and mirror.

3: observe clearly and mirror.

Whiting 1: do not observe whiting.

2: somewhat observe whiting.

3: observe whiting clearly.

(evaluation dazzled)

Dazzle according to following program appraisal. That is, first, prepared in Fig. 7 to have the photomask of unit cell pattern shown in plane graph. In this figure, unit cell 100 on transparent substrate, be formed with the chromium light-shielding pattern 101 of hook-type with live width 10 ��m, the part not forming this chromium light-shielding pattern 101 becomes peristome 102. Here, the unit cell adopted is of a size of: 211 �� m 70 ��m (figure's is vertical �� horizontal), and therefore peristome is of a size of 201 �� m 60 ��m (figure's is vertical �� horizontal). By the unit cell of multiple diagrams through arranging in length and breadth, form photomask.

Then, as as shown in the schematic cross sectional view of Fig. 8, the chromium light-shielding pattern 111 making photomask 113 is placed on lamp box 115 upward, and the sample obtained utilizing binding agent that in the way of making its antiglare layer become surface, antiglare film 110 is fitted in glass plate 117 is placed on photomask 113. Lamp box 115 is configured with light source 116. In this condition, the position 119 being about 30cm in distance sample carries out perusal, thus divides 7 grades that twinkling degree has been carried out sensory evaluation. Level 1 corresponds to corresponding to completely unconfirmed significantly observe that twinkling state, level 4 are that twinkling state is faintly observed in pole to the state dazzled, level 7.

(evaluation of contrast)

Double-edged polarization plates is peeled off from commercially available LCD TV [Sony's (strain) system " KDL-32EX550 "]. Replace these original polarization plates, all fit Sumitomo Chemical (strain) polarization plates processed " SumikaranSRDB831E " make these polarization plates respective absorption axle consistent with the absorption axle of original polarization plates via binding agent in side and display surface side overleaf, then, via binding agent by the antiglare film shown in following example to be fitted in the way of its male and fomale(M&F) becomes surface on display surface lateral deviation vibration plate. The LCD TV thus obtained is started in darkroom, utilizes (strain) TOPCON luminance meter " BM5A " type to measure the brightness under black display state and white display state, and calculate contrast. Here, contrast represents relative to the ratio of the brightness of black display state with the brightness showing state in vain. As a result, the contrast measured when being fitted with antiglare film is illustrated with the ratio relative to the contrast measured when not fitting antiglare film.

[4] evaluation of antiglare film manufacture pattern

Making the binary image data that pattern data is 2 tonal gradations of making, with the discrete function g of binary, (x y) represents tonal gradation. (x, horizontal resolution �� x and �� y y) are 2 ��m to make discrete function g. By the binary function g that obtains, (x, y) carries out discrete Fourier transform, obtains binary function G (f_x, f_y). By binary function G (f_x, f_y) absolute value squared, calculate the binary function �� (f of two-dimensional power spectrum_x, f_y), it is calculated as function of a single variable �� (f) of the One-dimensional power spectrum of the function of the distance f relative to initial point.

(making of antiglare film die for manufacturing)

Prepare the aluminum roller to diameter 300mm (A6063 based on JIS) surface and implement the material of Ba Lade copper facing (�� De �� I). Ba Lade copper facing is made up of copper coating/thin silvering/surface copper coating, and the thickness of coating entirety is set as about 200 ��m. This copper coatings is carried out mirror ultrafinish, through grinding after copper coatings photosensitive resin coating and be dried, define photosensitive resin film. Then, utilize laser to be exposed on photosensitive resin film by the pattern of pattern A repeated arrangement as shown in Figure 9, and developed. LaserStreamFX ((strain) ThinkLaboratory system) is used to carry out the exposure based on laser and development. As photosensitive resin film, employ the resin molding of the photoresist comprising eurymeric. At this, pattern A is made up by multiple Gaussian function type band filters of the pattern with the distribution of random lightness, and to be aperture opening ratio be 45.0%, One-dimensional power spectrum is frequency 0.0195 ��m^-1There is minimizing pattern.

Subsequently, copper chloride liquid is utilized to carry out the 1st etch processes. Etch quantity now is set as 4 ��m. Remove photosensitive resin film from the roller after the 1st etch processes, carry out the 2nd etch processes again with copper chloride liquid. Etch quantity now is set as 13 ��m. Then, carry out chromium plating processing, make mould A. Now, chromium plating thickness is set as 3 ��m.

(making of antiglare film)

Following each composition is dissolved in ethyl acetate according to the solid component concentration of 60%, has prepared the ultra-violet solidified resin composition A of the film of the refractive index that can form display 1.53 after hardening.

Pentaerythritol triacrylate 60 parts

Multifunctional urethane acrylate 40 parts

(product of hexamethylene diisocyanate and pentaerythritol triacrylate)

Diphenyl (2,4,6-trimethoxybenzoy) phosphine oxide 5 parts

By this ultra-violet solidified resin composition A to make the thickness of dried coating layer reach to coat in the way of in the of 5 ��m on cellulose triacetate (TAC) film of thickness 60 ��m, dry 3 minutes in being set in the exsiccator of 60 DEG C. Rubber rollers is utilized dried film to be pushed on the forming surface (having the face of surface unevenness profile) of mould A obtained above in the way of making dried overlay become die side and makes it closely sealed. In this condition, from TAC film side exposure rate 20mW/cm²The light from high-pressure mercury-vapor lamp and make this light with h line convert quantometer reach 200mJ/cm², make overlay solidify, thus manufactured antiglare film. Then, gained antiglare film is peeled off from mould, has made the transparent antiglare film A possessing antiglare layer on TAC film.

< embodiment 2 >

In the same manner as being set as by the etch quantity in the 1st etch processes except 3 ��m and making with the mould A of embodiment 1, make mould B, and except mould A is replaced into mould B, makes antiglare film similarly to Example 1. Using this antiglare film as antiglare film B.

< embodiment 3 >

In the same manner as being set as by the etch quantity in the 1st etch processes except 5 ��m and making with the mould A of embodiment 1, make mould C, and except mould A is replaced into mould C, makes antiglare film similarly to Example 1. Using this antiglare film as antiglare film C.

< comparative example 1 >

In the same manner as being set as by the etch quantity in the 1st etch processes except 6 ��m and making with the mould A of embodiment 1, make mould D, and except mould A is replaced into mould D, makes antiglare film similarly to Example 1. Using this antiglare film as antiglare film D.

< comparative example 2 >

Laser is utilized to expose the pattern of pattern B shown in repeated arrangement Figure 10 on photosensitive resin film, the etch quantity of the 1st etch processes is set as 5 ��m, the etch quantity of the 2nd etch processes is set as 13 ��m, chromium plating thickness is set as 4 ��m, make mould E in the same manner as making with the mould A of embodiment 1 in addition, except mould A is replaced into mould E, makes antiglare film similarly to Example 1. Using this antiglare film as antiglare film E. Herein, pattern B is made up by multiple Gaussian function type band filters of the pattern with the distribution of random lightness, and to be aperture opening ratio be 45.0%, the One-dimensional power spectrum of pattern is frequency 0.015 ��m^-1Above and 0.05 ��m^-1Hereinafter there is minimizing pattern.

The surface of the aluminum roller (A5056 based on JIS) of diameter 300mm is carried out mirror ultrafinish, uses sand blasting unit ((strain) only making is made) that with blasting pressure 0.1MPa (gauge pressure, lower with), pearl, the aluminum face after grinding is made consumption 8g/cm²(the per surface area 1cm of roller²Make consumption, lower with) sandblasting zirconium oxide bead TZ-SX-17 (and east Cao (strain) system, mean diameter: 20 ��m), impart concavo-convex for aluminum roller surface. Carry out electroless nickel plating processing to what obtain with concavo-convex aluminum roller, make mould D. Now, electroless nickel plating thickness is set as 15 ��m. Mould A is replaced with mould F, in addition, makes antiglare film similarly to Example 1. Using this antiglare film as antiglare film F.

The material of Ba Lade copper facing is implemented on the surface having prepared the aluminum roller to diameter 200mm (A5056 based on JIS). Ba Lade copper facing is made up of copper coating/thin silvering/surface copper coating, and the thickness of coating entirety is about 200 ��m. This copper coatings is carried out mirror ultrafinish, re-uses sand blasting unit ((strain) only making is made) and this abradant surface is made consumption 6g/cm with blasting pressure 0.05MPa (gauge pressure, lower with), pearl²Sandblasting zirconium oxide bead " TZ-SX-17 " (east Cao (strain) system, mean diameter: 20 ��m), imparts concavo-convex for aluminum roller surface. Carry out chromium plating processing to what obtain with concavo-convex copper facing aluminum roller, make mould G. Now, chromium plating thickness is set as 6 ��m. Mould A is replaced with mould G, in addition, makes antiglare film similarly to Example 1. Using this antiglare film as antiglare film G.

[for manufacturing the One-dimensional power spectrum of the pattern of each mould]

Figure 11 is equivalent to expression and pattern A and the B used in the making of antiglare film A��E (embodiment 1��3, comparative example 1 and 2) is carried out discrete Fourier transform and the figure of power spectrum �� (f) that obtains.

[evaluation result]

About above embodiments and comparative example, the result that above-mentioned antiglare film is evaluated is shown in Table 1.

Table 1

	Embodiment 1	Embodiment 2	Embodiment 3	Comparative example 1	Comparative example 2	Comparative example 3	Comparative example 4
								The antiglare film used	A	B	C	D	E	F	G
Total mist degree	0.9	0.6	1.0	1.3	0.3	0.9	1.7
								Surface haze	0.8	0.5	0.9	1.1	0.3	0.8	1.7
Transmission definition	395.1	405.1	376.8	366.8	433.3	242.5	468.7
								Rq(0.08)	0.04	0.03	0.03	0.04	0.03	0.05	0.04
Rq(0.25)	0.07	0.06	0.06	0.08	0.05	0.15	0.05
								Rq(0.8)	0.10	0.08	0.10	0.10	0.06	0.15	0.06
Rq(2.5)	0.10	0.08	0.11	0.12	0.09	0.16	0.06
								Sm(0.25)	105.0	123.2	127.9	134.2	91.2	81.4	55.2
Sm(0.8)	124.5	134.4	156.7	140.5	93.2	95.0	51.6
								Sm(2.5)	206.1	226.1	247.1	255.6	202.0	140.8	137.5
R_SCE/R_SCI	0.06	0.05	0.07	0.11	0.05	0.08	0.08
								Reflection definition (45 ��)	132.2	154.2	110.0	100.5	183.0	21.4	308.6
Reflection definition (60 ��)	196.6	233.4	180.1	158.7	275.1	58.3	346.7
								R_SCE	0.32	0.23	0.40	0.52	0.20	0.35	0.36
Mirror (front)	1	1	1	1	1	1	1
								Mirror (oblique)	1	1	1	1	2	1	3
Whiting	1	1	1	2	1	1	2
								Dazzle	3	2	3	3	2	6	1
Contrast	99	100	99	99	100	99	98

Although meeting the antiglare film A��C (embodiment 1��3) of the important document of the present invention for low haze, but its oblique viewing angle that is no matter front is respectively provided with the anti-glare of excellence, and whiting and the inhibition dazzled are also abundant. On the other hand, antiglare film D (comparative example 1) there occurs whiting. Antiglare film E (comparative example 2) from oblique observation time anti-glare not enough. Antiglare film F (comparative example 3) is susceptible to dazzle. Antiglare film G (comparative example 4) from oblique observation time anti-glare not enough.

Symbol description

12 integrating spheres, 13 light sources, the luminous reflectance of 14 antiglare film measures sample,

15 ligh traps,

40 mould base materials,

41 moulds after the 1st plating operation and grinding step with substrate surface (plating layer),

46 the 1st surface unevenness profile formed by the 1st etch processes,

47 surface unevenness profile having been carried out shape passivation by the 2nd etch processes,

50 photosensitive resin films, 60 masks,

Surface unevenness profile after 70 chromium plating there occurs the surface that shape is passivated,

71 chromium coatings,

80 outlet rollers, 81 transparent supporting masses, 83 coating regions,

86 active energy beam irradiation units, the mould of 87 tubulars,

88,89 niprolls, 90 film roll winding apparatus.

Industrial applicability

The antiglare film of the present invention is useful for image display devices such as liquid crystal displays.

Claims

1. an antiglare film, it possesses transparent supporting mass and the antiglare layer with minute asperities surface being formed on this transparent supporting mass, it is characterised in that

Total mist degree of this antiglare film is more than 0.1% and less than 3%,

Surface haze is more than 0.1% and less than 2%,

With intercepted length 0.08mm measure time r.m.s. roughness Rq (0.08) for more than 0.01 ��m and less than 0.05 ��m,

With the luminous reflectance R that the light mode containing normal reflection measures_SCIWith the luminous reflectance R to measure without normal reflection light mode_SCERatio R_SCE/R_SCIIt is less than 0.1.

2. antiglare film as claimed in claim 1, it is characterised in that

With intercepted length 0.25mm measure time average length Sm (0.25) for more than 90 ��m and less than 160 ��m,

3. antiglare film as claimed in claim 1 or 2, it is characterised in that

Using the transmission definition sum Tc that width is 0.125mm, 0.25mm, 0.5mm, 1.0mm and 2.0mm five kinds of light combs in dark portion and bright portion measure is more than 375%,

Use reflection definition sum Rc (45) that width is 0.25mm, 0.5mm, 1.0mm and 2.0mm four kinds of light combs in dark portion and bright portion measure with the angle of incidence 45 �� of light for less than 180%,

Use reflection definition sum Rc (60) that width is 0.25mm, 0.5mm, 1.0mm and 2.0mm four kinds of light combs in dark portion and bright portion measure with the angle of incidence 60 �� of light for less than 240%.

4. the antiglare film as described in any one in claims 1 to 3, it is characterised in that the described luminous reflectance R to measure without normal reflection light mode_SCEIt is less than 0.5%.