KR20160067142A - Anti-glare film - Google Patents

Abstract

An object of the present invention is to provide an antiglare film which has excellent antiglare property even at a low observation angle even at low haze and can sufficiently suppress the occurrence of fading and glare when placed in an image display device.
A transparent support, and an antiglare layer having fine irregularities formed thereon. For example, when a square-root-mean-square roughness Rq (0.08) measured at a cut-off length of 0.08 mm is in a range of 0.01 탆 or more and 0.05 탆 or less, And the ratio R _SCE / R _SCI of the luminous reflectance R _SCE measured by the regular reflection light eliminating method to the luminous reflectance R _SCI measured by the regular reflection light containing method is less than 0.1 An antiglare film is provided.

Description

ANTI-GLARE FILM

The present invention relates to an anti-glare film having excellent anti-glare properties.

An image display apparatus such as a liquid crystal display, a plasma display panel, a cathode ray tube (CRT) display, and an organic electroluminescence (EL) display has a structure in which, in order to avoid deterioration of visibility due to external light, And an antiglare film is disposed on the surface.

As the antiglare film, a transparent film having a surface irregularity shape is mainly studied. Such an antiglare film exhibits anti-scattering property by reducing non-reflectance by scattering reflection of external light (external light scattering light) by surface irregularities. However, when the external light scattering light is strong, the entire display surface of the image display apparatus may become blurred or the display may become a whitish color. There is also a case where so-called " flashing " occurs in which the surface irregularities of the antiglare film interfere with the pixels of the image display device, and the luminance distribution is generated and becomes invisible. In view of the above, it is desired that the antiglare film sufficiently prevent the occurrence of this "desire" and "flash" while ensuring excellent antifogging property.

As such an anti-glare film, for example, Patent Document 1 discloses a anti-glare film in which glare does not occur even when placed in an image display apparatus with high definition and flare is sufficiently prevented, and fine surface irregularities are formed on the transparent substrate , An average length PSm of an arbitrary section curve of the surface irregularity shape is not more than 12 占 퐉, a ratio Pa / PSm of an arithmetic mean height Pa and an average length PSm in the section curve is not less than 0.005 and not more than 0.012, Wherein a ratio of a plane having an inclination angle of 2 DEG or less is 50% or less, and a ratio of a plane having an inclination angle of 6 DEG or less is 90% or more.

The anti-glare film disclosed in Patent Document 1 effectively suppresses the above-mentioned glare by making the average length PSm in an arbitrary cross-sectional curve very small, thereby eliminating the surface irregularities having a period of about 50 탆 which makes it easier to generate glare . However, in the antiglare film disclosed in Patent Document 1, when the haze is intended to be made smaller (low haze), the antiglare property when the display surface of the image display device including the antiglare film is observed from the oblique side is lowered. Therefore, the anti-glare film disclosed in Patent Document 1 still had room for improvement in terms of retardation at a wide viewing angle.

Patent Document 1: Japanese Patent Application Laid-Open No. 2007-187952

An object of the present invention is to provide an antiglare film which has excellent antiglare property even at a low observation angle even at low haze and can sufficiently suppress the occurrence of fading and glare when placed in an image display device.

Means for Solving the Problems The present inventors have conducted intensive studies to solve the above problems, and as a result, they have completed the present invention. That is,

(1) An antiglare film comprising a transparent support and an antiglare layer having a fine uneven surface formed thereon,

The total haze is 0.1% or more and 3% or less,

A surface haze of 0.1% or more and 2% or less,

A root-mean-square root roughness Rq (0.08) of 0.01 占 퐉 or more and 0.05 占 퐉 or less as measured at a cut-off length of 0.08 mm,

A root mean square roughness Rq (0.25) of 0.05 占 퐉 or more and 0.1 占 퐉 or less when measured at a cutoff length of 0.25 mm,

A root-mean-square root roughness Rq (0.8) of 0.07 탆 or more and 0.12 탆 or less when measured at a cut-off length of 0.8 mm,

Mean square root roughness Rq (2.5) of not less than 0.08 mu m and not more than 0.15 mu m when measured at a cut-off length of 2.5 mm,

_Wherein the ratio R _SCE / R _SCI of the luminous reflectance R _SCI measured by the regular reflection light containing method and the luminous reflectance R _SCE measured by the regular reflection light removing method is 0.1 or less.

In the present invention, the antiglare films described below (2) to (4) are preferable.

(2) an average length Sm (0.25) measured at a cut-off length of 0.25 mm of 90 占 퐉 or more and 160 占 퐉 or less,

An average length Sm (0.8) of 100 占 퐉 or more and 300 占 퐉 or less as measured at a cut-off length of 0.8 mm,

The antiglare film as described in (1) above, wherein the average length Sm (2.5) measured at a cut-off length of 2.5 mm is 200 占 퐉 or more and 400 占 퐉 or less.

(3) The sum Tc of transmission sharpness measured using five kinds of optical combs having widths of arm portions and nominal portions of 0.125 mm, 0.25 mm, 0.5 mm, 1.0 mm and 2.0 mm, respectively, is 375%

The sum Rc (45) of the reflection sharpness measured at an incident angle of light of 45 degrees using four kinds of optical combs having widths of the arm portion and the nominal portion of 0.25 mm, 0.5 mm, 1.0 mm and 2.0 mm is 180% or less,

(1) or (2), wherein the sum of the reflectance sharpness Rc (60) measured at an incident angle of light of 60 ° is 240% or less using four kinds of optical combs having widths of the arm portion and the list portion of 0.25 mm, 0.5 mm, 1.0 mm and 2.0 mm, respectively (2).

(4) The antiglare film according to any one of (1) to (3), wherein the luminous reflectance R _SCE measured by the regularly reflected light removing method is 0.5% or less.

INDUSTRIAL APPLICABILITY According to the present invention, it is possible to provide an antiglare film which has sufficient antifogging property even at a low observation angle even at low haze, and can sufficiently suppress the occurrence of flare and glare when placed in an image display device.

1 is a diagram schematically showing an optical system for measuring the luminous reflectance R _SCI .
2 is a diagram schematically showing an optical system for measuring the luminous reflectance R _SCE .
Fig. 3 is a diagram schematically showing a preferable example of a method for manufacturing a mold (first half portion).
Fig. 4 is a diagram schematically showing a preferable example of the method for manufacturing a mold (the latter half).
5 is a diagram schematically showing a preferable example of the production apparatus used in the method for producing an antiglare film of the present invention.
6 is a diagram schematically showing an appropriate preliminary curing step in the method for producing an antiglare film of the present invention.
7 is a diagram schematically showing a unit cell for glare evaluation.
8 is a diagram schematically showing the flashing evaluation apparatus.
Fig. 9 is a view showing a part of a pattern A used in Examples 1 to 3 and Comparative Example 1. Fig.
10 is a view showing a part of the pattern B used in Comparative Example 2. Fig.
11 is a diagram showing a power spectrum Γ (f) obtained by performing discrete Fourier transform on the patterns A and B.

Hereinafter, preferred embodiments of the present invention will be described with reference to the drawings as necessary, but the dimensions and the like shown in the drawings are arbitrary for easy viewing.

The antiglare film of the present invention is characterized in that the spectral reflectance R _SCI measured by the method including regular reflection light and the spectral reflectance R r measured by the regular reflection light removal method the ratio R _SCE / _SCI R of R _SCE is characterized in that not more than 0.1.

First, with respect to the antiglare film of the present invention, a method of obtaining the root-mean-square roughness Rq, the luminous reflectance R _SCI, and the luminous reflectance R _SCE will be described.

[Root mean square root roughness Rq]

The antiglare film of the present invention is characterized in that the surface roughness of the antiglare layer of the antiglare film provided in the antiglare film has a square root mean square roughness Rq (0.08) when the cutoff length is 0.08 mm, 0.25 mm, 0.8 mm and 2.5 mm, Rq (0.25), Rq (0.8) and Rq (2.5) are 0.01 占 퐉 or more and 0.05 占 퐉 or less, 0.05 占 퐉 or more and 0.1 占 퐉 or less, 0.07 占 퐉 or more and 0.12 占 퐉 or less and 0.08 占 퐉 or more and 0.15 占 퐉 or less, respectively. These Rq (0.08), Rq (0.25), Rq (0.8) and Rq (2.5) can be measured by the method according to JIS B 0601 by setting the measurement conditions as follows.

Rq (0.08): Cutoff length 0.08 mm, Evaluation length 0.4 mm

Rq (0.25): cut-off length 0.25 mm, evaluation length 1.25 mm

Rq (0.8): cut-off length 0.8 mm, evaluation length 4 mm

Rq (2.5): cut-off length 2.5 mm, evaluation length 12.5 mm

Root mean square roughness when measured with a predetermined cutoff length is obtained by using a roughness curve obtained by cutting a long wavelength component longer than a predetermined cutoff length by a high-pass filter from a section curve obtained by a measuring method determined by the above-mentioned JIS Which means surface roughness. Therefore, the root-mean-square root roughness when measured at a cut-off length of 0.08 mm means that the root-mean-square root roughness is obtained from the roughness curve obtained by removing the surface relief shape having a wavelength of 0.08 mm or more from the above- The surface irregularity shape having a wavelength of 0.04 mm or less, which is 1/2 of the length, is evaluated. Similarly, the root-mean-square root roughness when measured at a cut-off length of 0.25 mm, 0.8 mm, or 2.5 mm is defined as a value obtained by removing the surface unevenness shape having a wavelength of 0.25 mm or more, 0.8 mm or more, Refers to surface roughness that can be obtained by using a roughness curve, and the surface irregularity shape having a wavelength of 0.125 mm or less, 0.4 mm or less or 1.25 mm or less, which is 1/2 of the cutoff length, is evaluated.

When Rq (0.08) is large, it means that the surface roughness of the antiglare layer of the antiglare film of the present invention has a large number of surface relief shapes having a wavelength of 0.04 mm or less. Similarly, when Rq (0.25) is large, it means that the antiglare layer has a large number of surface irregularities having a wavelength of 0.04 mm or more and 0.125 mm or less, and Rq (0.8) is large means that 0.125 mm or more and 0.4 mm or less Means that a large number of surface concavo-convex shapes having wavelengths are present, and when Rq (2.5) is large, it means that the number of surface concavo-convex shapes having a wavelength of 0.4 mm or more and 1.25 mm or less is large. When Rq (0.08) is less than 0.01 탆, an antiglare film having a very small surface irregularity shape with a short period of 0.04 mm or less in wavelength, that is, having an antiglare layer formed only in a surface irregularity shape for a long period, It becomes rough. If Rq (0.08) is more than 0.05 占 퐉, the antiglare layer having strong scattering due to the surface concavo-convex shape of a short period of 0.04 mm or less in wavelength is generated. Therefore, It gets easier. The Rq (0.08) of the antiglare film of the present invention is in the above-mentioned range, but it is preferably 0.02 mu m or more and 0.04 mu m or less.

When the Rq (0.25) is less than 0.05 탆, the antiglare film having the antiglare layer with a wavelength of 0.04 탆 or more and 0.125 탆 or less is less in the irregular surface irregularities. Therefore, Deg.], The antifouling property becomes insufficient. When Rq (0.25) is more than 0.1 占 퐉, the number of surface concavities and valleys having a wavelength of 0.04 mm or more and 0.125 mm or less increases. Since the irregularities on the surface of the wavelength region have a strong correlation with the generation of glare, the image display device provided with such an antiglare film is liable to cause glare. Rq (0.25) of the antiglare film of the present invention is in the above-mentioned range, but it is preferably 0.06 탆 or more and 0.08 탆 or less.

If Rq (0.8) is less than 0.07 占 퐉, the antiglare layer having a small concavo-convex shape with a wavelength of 0.125 占 퐉 or more and 0.4 mm or less is obtained. Therefore, the image display device provided with the antiglare film having such antiglare layer is inclined ) Is insufficient. If Rq (0.8) is more than 0.12 占 퐉, the number of concavo-convex shapes having a wavelength of 0.125 mm or more and 0.4 mm or less increases, and an image display apparatus in which fading occurs easily can be obtained. Rq (0.8) of the antiglare film of the present invention is in the above-mentioned range, but it is preferably 0.08 탆 or more and 0.10 탆 or less.

When Rq (2.5) is less than 0.08 占 퐉, an antiglare layer having a small concavo-convex shape with a wavelength of 0.4 占 퐉 or more and 1.25 mm or less is obtained. Therefore, the image display device having such antiglare film The blurring property upon observation becomes insufficient. If Rq (2.5) is more than 0.15 占 퐉, the shape of the concavo-convex shape of the long period of time of 0.4 mm or more and 1.25 mm or less increases, and the surface texture of the antiglare film becomes rough. Rq (2.5) of the antiglare film of the present invention is in the above-mentioned range, but it is preferably 0.09 탆 or more and 0.11 탆 or less.

[Luminous reflectance R _SCI and luminous reflectance R _SCE ]

FIG. 1 is a diagram schematically showing an optical system for measuring the luminous reflectance R _SCI in the manner of including the regularly reflected light, and FIG. 2 is a diagram schematically showing an optical system for measuring the luminous reflectance R _SCE by the regularly reflected light removing method. 1 and 2 show a diffused illumination type optical system. The diffuse illumination method is a method of uniformly illuminating the measurement sample in all directions using an integrating sphere or the like. In Figs. 1 and 2, the integrating sphere 12 (barium sulfate or the like And the inner surface is coated with a white paint). Light emitted from the light source 13 is diffused in the integrating sphere 12 and reflected from the surface of the measurement sample 14. [ In Fig. 2, a light trap 15 (in Fig. 1, a jig having a conical cavity is attached to the position of the integrating sphere 12 in the regular reflection direction with respect to the light receiving portion, And is not returned to the integrating sphere 12), so that the light in the direction of specular reflection with respect to the light-receiving unit is prevented from touching the surface of the measurement sample.

An optical system that does not use a light trap as shown in Fig. 1 is called a regular reflected light including mode (SCI mode). On the other hand, an optical system using a light trap as shown in FIG. 2 is called a regularly reflected light removal mode (SCE mode). The luminous reflectance calculated according to the method described in JIS Z 8722 from the reflection spectrum of the sample measured in both modes is the luminous reflectance R _SCI measured with the regular reflection light including method and the luminous reflectance R _SCE measured with the regular reflection light removing method.

When the ratio R _SCE / R _SCI of the luminous reflectance R _SCI measured by the regular reflected light containing method to the luminous reflectance R _SCE measured by the regular reflection light removing method exceeds 0.1, the environment in the use environment The reflected light in the user direction of light becomes strong, and consequently, the image display device provided with such an antiglare film has a desire. In addition, the image display device tends to cause a reduction in spot contrast. The ratio R _SCE / R _SCI is more preferably 0.08 or less, and still more preferably 0.06 or less. Further, the luminous reflectance R _SCE measured by the regular reflection light removing method is preferably 0.5% or less, more preferably 0.4% or less, further preferably 0.3% or less.

[Total haze, surface haze]

The antiglare film of the present invention has a total haze of not less than 0.1% and not more than 3% with respect to the normal incident light and exhibits a surface haze of not less than 0.1% and not more than 2% in order to exhibit antifogging properties and prevent fretting. The total haze of the antiglare film can be measured in accordance with the method described in JIS K7136. An image display device in which an antiglare film having a total haze or surface haze of less than 0.1% is disposed is not preferable because it does not exhibit sufficient diffusibility. The antiglare film when the total haze exceeds 3% or the surface haze exceeds 2% is not preferable because the image display device in which the antiglare film is disposed causes fading. In addition, such an image display apparatus also has a problem that the contrast thereof becomes insufficient.

The lower the internal haze that can be obtained by subtracting the surface haze from the total haze, the better. An image display device in which an antiglare film having an internal haze of more than 2.5% is disposed has a tendency to lower its contrast.

[Average length Sm measured by a predetermined cut-off length]

In the antiglare film of the present invention, the surface roughness of the surface of the antiglare layer has a square root mean square roughness when measured at a predetermined cutoff length within the above-mentioned range, but the mean length when measured by the predetermined cut- Is preferable. More specifically, when the average length Sm (0.25) measured at a cut-off length of 0.25 mm is 90 占 퐉 or more and 160 占 퐉 or less and the average length Sm (0.8) of the cut-off length measured at 0.8 mm is 100 占 퐉 or more and 300 占 퐉 or less , And the average length Sm (2.5) when measured at a cut-off length of 2.5 mm is preferably 200 m or more and 400 m or less.

An anti-glare film in which Sm (0.25) is less than 90 占 퐉 has an anti-glare layer having many surface irregularities in the vicinity of 50 占 퐉. In such an image display device in which such an anti-glare film is disposed, glare may easily occur. An antiglare film having a Sm (0.25) of more than 160 탆 has an antiglare layer with an excessively large number of surface irregularities in a long period, and the surface texture thereof may become rough. The antiglare film in which Sm (0.8) is less than 100 탆 has an antiglare layer having a surface irregularity shape having a period of 100 to 200 탆 contributing to the antiglare property when observed from an oblique angle (about 10 to 30 °) , The image display apparatus in which such an antiglare film is disposed may sometimes have deteriorated diaphragm characteristics when observed from oblique lines. An antiglare film having a Sm (0.8) of more than 300 μm has an antiglare layer having an excessively increased surface irregularity shape for a long period of time, and the surface texture of the antiglare film may become rough. The antiglare film in which Sm (2.5) is less than 200 占 퐉 has an antiglare layer having a surface irregularity shape having a period of 200 to 300 占 퐉 contributing to the antiglare property when observing the antiglare film from an oblique angle (30 ° or more) In the image display device provided with such an antiglare film, the antiglare property when observing the antiglare film from an inclination (30 degrees or more) may be lowered. The antiglare film having Sm (2.5) of more than 400 탆 has an antiglare layer with an excessively increased surface irregularity shape for a long period, and the surface texture of the antiglare film may become rough.

[Transmission clarity Tc, reflection sharpness Rc (45), and reflection sharpness Rc (60)]

In the antiglare film of the present invention, it is preferable that the sum Tc of the transmission clarity determined under the following measurement conditions is 375% or more. The sum of transmission sharpness Tc is calculated by measuring the sharpness of each image by using an optical comb of a predetermined width by a method in accordance with JIS K 7105, and then calculating the sum. Specifically, the image clarity was measured using five kinds of optical combs each having a ratio of the width of the arm portion and the width of the name portion of 1: 1 and the widths of 0.125 mm, 0.25 mm, 0.5 mm, 1.0 mm and 2.0 mm, To obtain Tc. When the anti-glare film having a Tc of less than 375% is arranged in an image display device with higher image clarity, the anti-glare film may easily become flicker. The upper limit of Tc is selected within the range of 500% or less of its maximum value. However, if the Tc is too high, an image display apparatus which is susceptible to deterioration of the retardation from the front surface can be obtained.

The antiglare film of the present invention preferably has a reflectance sharpness Rc (45) measured with incident light at an incident angle of 45 degrees of 180% or less. The reflection sharpness Rc (45) is measured by a method in accordance with JIS K 7105 in the same manner as Tc. Four types of optical combs having the widths of 0.25 mm, 0.5 mm, 1.0 mm, and 2.0 mm And the total of the measured sharpnesses is obtained as Rc (45). When the Rc (45) is 180% or less, the image display apparatus including such an antiglare film is preferable because the retardation when viewed from the front and the oblique side becomes better. The lower limit of the Rc (45) is not particularly limited, but is preferably 80% or more, for example, in order to suppress occurrence of desire or glare.

The antiglare film of the present invention preferably has a reflectance sharpness Rc (60) of 240% or less as measured with incident light at an incident angle of 60 °. The reflection sharpness Rc (60) is measured by a method in accordance with JIS K 7105 which is the same as the reflection sharpness Rc (45) except that the incident angle is changed. When the Rc (60) is 240% or less, it is preferable that the image display device provided with such an antiglare film has better anti-glare properties when observed from oblique angles. The lower limit of the Rc (60) is not particularly limited, but is preferably 150% or more, for example, in order to suppress occurrence of desire or glare.

[Method of producing antiglare film of the present invention]

The antiglare film of the present invention is produced, for example, as follows. The first method is a method in which a surface irregular shape based on a predetermined pattern is prepared by preparing a mold for forming fine irregularities formed on a molding surface and transferring the shape of the irregular surface of the mold to the transparent support, And the transparent support is peeled from the mold. A second method is a coating method comprising the steps of preparing a composition containing fine particles, a resin (binder) and a solvent and dispersing the fine particles in a resin solution, applying the composition onto a transparent support, A coating film containing fine particles) is cured. In the second method, fine particles are exposed on the surface of the coating film to form random irregularities on the transparent support by adjusting the coating film thickness and the coagulation state of the fine particles by the composition of the composition and the drying conditions of the coating film. From the viewpoints of production stability and production reproducibility of the antiglare film, it is preferable to produce the antiglare film of the present invention by the first method.

Here, a first method preferable as a method for producing an antiglare film of the present invention will be described in detail.

In order to form the antiglare layer having the surface irregularities having the above-described characteristics with good precision, the fine irregularities forming mold (hereinafter sometimes abbreviated as " mold ") is important. More specifically, the surface irregularities (hereinafter sometimes referred to as " mold irregularities ") of the metal mold are formed on the basis of a predetermined pattern, and the predetermined pattern is formed on the spatial frequency of the one- It is preferable that the graph obtained when expressed as the intensity with a spatial frequency of 0.015 mu m- ¹ or more and 0.05 mu m- ¹ or less has one minimum value. Here, the " pattern " means image data for forming the fine uneven surface of the antiglare layer of the antiglare film, a mask having the transparent portion and the light shielding portion, and the like.

First, a method of determining a pattern for forming the micro concavity and convexity surface of the antiglare layer of the antiglare film of the present invention will be described.

A method of obtaining the two-dimensional power spectrum of the pattern is shown, for example, when the pattern is image data. First, after converting the image data into two-gradation binary image data, the gradation is represented by a two-dimensional function g (x, y). The obtained two-dimensional function g (x, y) is Fourier transformed as shown in the following equation (1) to calculate the two-dimensional function G (f _x , f _y ) By squaring the absolute value of G (f _x , f _y ), a two-dimensional power spectrum Γ (f _x , f _y ) is obtained. Here, x and y represent the Cartesian coordinates in the image data plane. Further, f _x and f _y represent frequencies in the x and y directions, respectively, and have dimensions of reciprocal of length.

In the equation (1),? Is the circumference and i is the imaginary unit.

This two-dimensional power spectrum Γ (f _x , f _y ) represents the spatial frequency distribution of the pattern. Normally, since the antiglare film is required to be isotropic, the pattern for producing the antiglare film of the present invention becomes isotropic. Therefore, the two-dimensional function Γ (f _x , f _y ) representing the two-dimensional power spectrum of the pattern can be represented by a one-dimensional function Γ (f) depending only on the distance f from the origin (0, 0). This one-dimensional function Γ (f) represents the one-dimensional power spectrum of the pattern. Next, a method for obtaining the one-dimensional function Γ (f) from the two-dimensional function Γ (f _x , f _y ) will be described. First, the two-dimensional power spectrum Γ (f _x , f _y ), which is the two-dimensional power spectrum of the elevation, is expressed in polar coordinates as shown in equation (3).

Here,? Is a declination angle in the Fourier space. The one-dimensional function Γ (f) can be obtained by calculating the rotation average of the two-dimensional function Γ (fcosθ, fsinθ) expressed in polar coordinates, as shown in equation (4).

In order to obtain the antiglare film of the present invention with good precision, it is preferable that the one-dimensional power spectrum Γ (f) of the pattern has a minimum at a spatial frequency of 0.015 μm ^-1 or more and 0.05 μm ^-1 or less.

When the two-dimensional power spectrum of the pattern is obtained, the two-dimensional function g (x, y) of the gradation is usually obtained as a discrete function. In this case, the two-dimensional power spectrum may be calculated by discrete Fourier transform. The one-dimensional power spectrum of the pattern can be obtained in the same way from the two-dimensional power spectrum of the pattern.

The average value of the two-dimensional function g (x, y) is determined by the maximum value of the two-dimensional function g (x, y) and the maximum value of the two-dimensional function g ) Of the difference between the minimum value and the minimum value. In the case where the surface of the mold concavity and convexity is manufactured by the lithography method, this two-dimensional function g (x, y) is the aperture ratio of the pattern. With respect to the case where the surface of the mold concavity and convexity is manufactured by the lithography method, the aperture ratio of the pattern described here is defined. The aperture ratio when the resist used in the lithography method is a positive resist means the ratio of the exposed area to the entire surface area of the coating film when image data is drawn on the coating film of the positive resist. On the other hand, the aperture ratio when the resist used in the lithography method is a negative resist means the ratio of the unexposed area to the entire surface area of the coating film when image data is drawn on the coating film of the negative resist. The aperture ratio when the lithography method is a batch exposure means the ratio of the transparent portion of the mask having the transparent portion and the shielding portion.

The antiglare film of the present invention is produced by making a one-dimensional power spectrum of a pattern to have a minimum value at a spatial frequency of 0.015 mu m- ¹ or more and 0.05 mu m- ¹ or less, and according to the first method using the mold, can do.

In order to create a pattern of a one-dimensional power spectrum having a very small value at a spatial frequency of 0.015 mu m- ¹ or more and 0.05 mu m- ¹ or less, a pattern prepared by randomly arranging dots or a random number or a pseudo random number generated by a calculator, A pattern (preliminary pattern) having a random brightness distribution is prepared in advance, and a specific spatial frequency range component is removed from the preliminary pattern. To remove the component of the specific spatial frequency range, the preliminary pattern may be passed through a bandpass filter.

In order to produce an antiglare film having an antiglare film on which a surface irregularity shape based on a predetermined pattern is formed, a mold having a mold irregular surface for transferring a fine irregular surface formed on the basis of the predetermined pattern to a transparent support is produced. The first method using such a mold is an emboss method in which an antiglare layer is formed on a transparent support.

Examples of the embossing method include an optical embossing method using a photo-curable resin, a hot embossing method using a thermoplastic resin, and the like. Above all, from the viewpoint of productivity, the optical emboss method is preferable.

The optical embossing method is a method in which a photo-curable resin layer is formed on a transparent support (a surface of a transparent support), and the photo-curable resin layer is cured on the surface of the metal mold concavity and convexity, It is a method of transferring to a photocurable resin layer. Specifically, the photo-curing resin layer formed by applying the photo-curable resin on the transparent support is placed in close contact with the surface of the mold unevenness, and light (the light which can be cured by the photo-curable resin is used from the transparent support side ) Is cured to cure the photo-curable resin (the photo-curing resin included in the photo-curable resin layer), and then the transparent support on which the photo-curable resin layer after curing is formed is peeled from the mold. In the antiglare film obtained by such a production method, the photocurable resin layer after curing becomes an antiglare layer. From the viewpoint of ease of manufacture, ultraviolet curable resin is preferable as the photo-curing resin. When the ultraviolet curable resin is used, ultraviolet light is used as the light to be irradiated (as the photo-curable resin, an emboss method Hereinafter referred to as " UV emboss method "). In order to produce an antiglare film integrated with a polarizing film, a polarizing film may be used as the transparent support, and the transparent support may be replaced with a polarizing film in the embossing method described herein.

The type of the ultraviolet ray-curable resin used in the UV embossing method is not particularly limited, and among commercially available resins, an appropriate one may be used depending on the kind of the transparent support and the kind of the ultraviolet ray. Such a UV-curable resin is a concept including a monomer (multifunctional monomer), an oligomer and a polymer which are photopolymerized by ultraviolet irradiation, and a mixture thereof. Further, by using a photoinitiator suitably selected depending on the kind of the ultraviolet ray-curable resin, a resin capable of curing even visible light having a longer wavelength than ultraviolet ray can be used. Examples of the compatibility of the ultraviolet-curable resin and the like will be described later.

As the transparent support used in the UV embossing method, for example, glass or a plastic film can be used. Plastic films can be used if they have appropriate transparency and mechanical strength. Specifically, for example, a cellulose acetate-based resin such as TAC (triacetylcellulose); Acrylic resin; Polycarbonate resin; Polyester-based resins such as polyethylene terephthalate; And a transparent resin film made of a polyolefin-based resin such as polyethylene or polypropylene. These transparent resin films may be solvent cast films or extruded films.

The thickness of the transparent support is, for example, 10 to 500 占 퐉, preferably 10 to 100 占 퐉, and more preferably 10 to 60 占 퐉. When the thickness of the transparent support is within this range, an antiglare film having sufficient mechanical strength tends to be obtained, and the image display device provided with the antiglare film is more likely to cause glare.

On the other hand, the hot emboss method is a method in which a transparent resin film formed of a thermoplastic resin is pressed and bonded to the surface of the mold concavity and convexity while being heated and softened, and the surface concavo-convex shape of the mold concave and convex surface is transferred to the transparent resin film. The transparent resin film used in the hot embossing method may be any substantially transparent as long as it is substantially optically transparent. Specifically, those exemplified as the transparent resin film used in the UV embossing method may be mentioned.

Next, a method of manufacturing a mold used in the embossing method will be described.

With regard to the method for producing a mold, it is preferable that the mold surface of the above-mentioned mold is formed so that a surface irregularity formed on the basis of the aforementioned predetermined pattern can be transferred onto the transparent support However, the lithography method is preferable in order to manufacture the antiglare layer having the surface relief shape with good precision and good reproducibility. The lithography method may further include the steps of [1] a first plating step, [2] a polishing step, [3] a photosensitive resin film forming step, [4] an exposure step, [5] A first etching step, a photosensitive resin film peeling step, a second etching step, and a second plating step.

3 is a diagram schematically showing a preferable example of the first half of the method for manufacturing a mold. Fig. 3 schematically shows a cross section of a mold in each step. Hereinafter, with reference to FIG. 3, each step of the method for producing a mold for producing an antiglare film of the present invention will be described in detail.

[1] First plating process

First, a base material (base material for mold) used in the production of a mold is prepared, and copper is plated on the surface of the base material for a die. As described above, by performing copper plating on the surface of the mold base material, the adhesion and gloss of the chromium plating in the second plating process, which will be described later, can be improved. Copper plating has a high covering property and a strong smoothing action, so that it is possible to form a smooth and glossy surface by filling minute unevenness and voids of the substrate for a mold. Therefore, even if chromium plating is performed in the second plating process described later, by performing the copper plating on the surface of the substrate for a die in this manner, the surface of the chromium plating surface, which is considered to be caused by minute unevenness and voids existing in the substrate The roughness is eliminated and the coating property of the copper plating is high, so that occurrence of fine cracks is reduced. Therefore, even if the surface irregularities based on the predetermined pattern (fine irregularities) are formed on the mold base material molding surface, the irregularities due to the influence of the surface of the base (base material) .

As the copper used for the copper plating in the first plating step, a pure metal of copper may be used, or an alloy (copper alloy) containing copper as a main component may be used. Therefore, " copper " used for copper plating is a concept including copper and a copper alloy. The copper plating may be electrolytic plating or electroless plating, but it is preferable to use electrolytic plating for copper plating in the first plating step. The preferable plating layer in the first plating step may be not only a copper plating layer but also a copper plating layer and a plating layer formed of a metal other than copper.

When the plating layer formed by performing copper plating on the surface of the mold base material is too thin, the influence of the base surface (minute unevenness, voids, cracks, etc.) can not be completely eliminated. Although the upper limit of the thickness of the plating layer is not critical, it is preferably about 500 占 퐉 or less in consideration of cost and the like.

The substrate for a mold is preferably a substrate made of a metal material. From the viewpoint of cost, aluminum, iron, or the like is preferable as a material of the metal material. From the viewpoint of handling convenience of the mold base material, a base material made of lightweight aluminum is particularly preferable as a mold base material. The aluminum or the railway referred to herein is not necessarily a pure metal, and may be an alloy containing aluminum or iron as a main component.

The shape of the base material for the mold may be any suitable shape according to the method for producing an antiglare film of the present invention. Specifically, it is selected from a flat substrate, a cylindrical substrate, or a cylindrical (roll-shaped) substrate. In the case of continuously producing the antiglare film of the present invention, since it is preferable that the mold is roll-shaped, such a mold is produced from a roll-shaped mold base.

[2] Polishing process

In the subsequent polishing step, the surface (plating layer) of the substrate for copper which has undergone copper plating in the above-described first plating step is polished. In the method for producing a mold used in the method for producing an antiglare film of the present invention, it is preferable that the surface of the mold base is polished to a state close to a mirror surface through the above polishing step. Commercial products such as a flat substrate or a roll substrate used as a substrate for a mold often have been subjected to machining such as cutting or grinding in order to obtain a desired accuracy. As a result, a fine workpiece remains on the surface of the substrate for a die. Therefore, even if a plating (preferably copper plating) layer is formed by the first plating step, the above-mentioned processing mark may remain. Further, even if plating is performed in the first plating step, the surface of the mold base material may not be completely smoothed. That is, even if the steps [3] to [9] to be described later are carried out on the substrate for a mold having such a deep processing mark remaining on the surface, the surface irregularity of the obtained mold surface differs from the surface irregular shape based on the predetermined pattern There may be cases in which irregularities originating from a processing station or the like are included. When an antiglare film is produced by using a mold having an influence of a processing station or the like remaining thereon, optical characteristics such as desired antiglare properties can not be sufficiently exhibited, which may cause unexpected effects.

The polishing method used in the polishing step is not particularly limited, and a polishing method in accordance with the shape and properties of the substrate for a mold to be polished is selected. Specific examples of the polishing method applicable to the polishing step include mechanical polishing, electrolytic polishing, and chemical polishing. Among these, as the mechanical polishing, a super finishing method, a lapping method, a fluid polishing method, and a buff polishing method can be used. Further, the surface of the mold base may be mirror-finished by mirror-cutting using a cutting tool in the polishing step. In this case, the material and shape of the cutting tool can be selected from among cemented carbide, CBN, ceramic, and diamond bite depending on the type of material (metallic material) of the mold base material. From the viewpoint of machining accuracy, desirable. The surface roughness after polishing is preferably 0.1 占 퐉 or less and more preferably 0.05 占 퐉 or less as expressed by a centerline average roughness (Ra) according to JIS B 0601. If the centerline average roughness (Ra) after polishing is larger than 0.1 占 퐉, the surface roughness of the finally obtained mold may be influenced by such surface roughness. The lower limit of the center line average roughness Ra is not particularly limited. Therefore, the lower limit may be set in view of the processing time (polishing time) and the processing cost in the polishing step.

[3] Photosensitive resin film forming process

Next, the photosensitive resin film forming process will be described with reference to Fig.

In the step of forming a photosensitive resin film, a solution (photosensitive resin solution) in which a photosensitive resin is dissolved in a solvent is applied to the surface 41 of the mold base material 40 subjected to the mirror polishing obtained by the above-mentioned polishing step and heated and dried , And a photosensitive resin film (resist film) are formed. 3 schematically shows a state in which the photosensitive resin film 50 is formed on the surface 41 of the mold base material 40 (Fig. 3 (b)).

As the photosensitive resin, conventionally known photosensitive resins can be used. Those which are already commercially available as a resist can be used as it is, or after purification by filtration if necessary. Examples of the negative-type photosensitive resin having a property of curing the photosensitive portion include monomers and prepolymers of (meth) acrylic acid esters having acryloyl groups or methacryloyl groups in the molecule, mixtures of bisazides and diene rubbers, Vinyl cinnamate-based compounds, and the like. Further, as the positive photosensitive resin having the property that the photosensitive portion is eluted by the development and only the non-photosensitive portion remains, a phenol resin-based nano-block resin-based resin or the like can be used. Such a positive or negative photosensitive resin can be easily obtained as a positive resist or a negative resist on the market. The photosensitive resin solution may be blended with various additives such as a sensitizer, a development promoter, an adhesion modifier, and a coating property improving agent, if necessary. Alternatively, a mixture of such additives in a commercially available resist may be used as a photosensitive resin solution have.

In order to apply these photosensitive resin solutions to the surface 41 of the mold base material 40, a solvent most suitable for forming a smoother photosensitive resin film is selected, and a photosensitive resin obtained by dissolving and diluting the photosensitive resin in such a solvent Solution is preferable. Such a solvent is also selected depending on the kind of the photosensitive resin and its solubility. Specifically, it is selected from a cellosolve solvent, a propylene glycol solvent, an ester solvent, an alcohol solvent, a ketone solvent, a high polar solvent, and the like. In the case of using a commercially available resist, an optimum resist may be selected and used as a photosensitive resin solution, depending on the type of the solvent contained in the resist or a suitable preliminary experiment.

The method of applying the photosensitive resin solution to the mirror polished surface of the mold base material can be carried out by a method such as meniscus coat, fountain coat, dip coat, spin coating, roll coating, wire bar coating, air knife coating, blade coating, , The shape of the mold base material, and the like. The thickness of the photosensitive resin film after the application is preferably in the range of 1 to 10 mu m, more preferably in the range of 6 to 9 mu m, after the drying.

[4] Exposure Process

The subsequent exposure step is a step of transferring the intended pattern onto the photosensitive resin film 50 by exposing the photosensitive resin film 50 formed in the above-described photosensitive resin film forming step. The light source used in the exposure process may be appropriately selected in accordance with the photosensitive wavelength and the sensitivity of the photosensitive resin included in the photosensitive resin film. For example, a g line (wavelength: 436 nm), h line (wavelength: 405 nm) (Wavelength: 365 nm), a semiconductor laser (wavelength: 830 nm, 532 nm, 488 nm, 405 nm), a YAG laser A laser (wavelength: 193 nm), and an F2 excimer laser (wavelength: 157 nm). The exposure method may be a method of collective exposure using a mask corresponding to a target pattern, or a drawing method. Further, the pattern of interest is a graph of time as described above, nd that the one-dimensional power spectrum as the strength of the spatial frequency, in the frequency space over 0.015 ㎛ ^-1 0.05 ㎛ ^-1 or less will have one of the minimum value .

In the method of manufacturing a mold, it is preferable to expose a desired pattern on a photosensitive resin film in a precisely controlled state in order to form the surface relief shape of the mold with higher precision. In order to expose in such a state, it is desirable to draw a desired pattern on the computer as image data and draw (pattern) a pattern based on the image data on the photosensitive resin film by laser light emitted from a computer-controlled laser head Do. When laser drawing is performed, for example, a laser drawing apparatus generally used in the production of a printing plate or the like can be used. Commercially available products of such a laser beam drawing apparatus include, for example, Laser Stream FX (manufactured by Sink Laboratories).

Fig. 3 (c) schematically shows a state in which the pattern is exposed on the photosensitive resin film 50. Fig. When a negative photosensitive resin is contained in the photosensitive resin film 50 (for example, when a negative resist is used as the photosensitive resin solution), the exposed region 51 is exposed to the exposure energy and the crosslinking reaction of the photosensitive resin proceeds And the solubility in a developing solution to be described later is lowered. Therefore, in the developing step, the unexposed area 52 is dissolved by the developing solution, and only the exposed area 51 remains on the substrate surface to become the mask 60. [ On the other hand, in the case where a positive type photosensitive resin is contained in the photosensitive resin film 50 (for example, when a positive resist is used as the photosensitive resin solution), in the exposed region 51, Is likely to dissolve in a developer to be described later. Thus, in the developing process, the exposed area 51 is dissolved by the developing solution, and only the unexposed area 52 remains on the substrate surface to become the mask 60. [

[5] Development process

In the developing step, when the photosensitive resin film 50 contains a negative-type photosensitive resin, the unexposed area 52 is dissolved by the developing solution, and the exposed area 51 remains on the mold substrate, (60). On the other hand, when the photosensitive resin film 50 contains a positive photosensitive resin, only the exposed area 51 is dissolved by the developing solution, and the unexposed area 52 remains on the mold base material, 60). In the substrate for a mold in which a predetermined pattern is formed as a photosensitive resin film, in the first etching step, the photosensitive resin film remaining on the substrate for a mold acts as a mask in a first etching step described later.

As the developing solution used in the developing process, among those conventionally known, those suitable for the type of the photosensitive resin used can be selected. For example, the developing solution may contain inorganic alkalis such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, and aqueous ammonia; Primary amines such as ethylamine, n-propylamine and the like; Secondary amines such as diethylamine and di-n-butylamine; Tertiary amines such as triethylamine and methyldiethylamine; Alcohol amines such as dimethylethanolamine and triethanolamine; Quaternary ammonium compounds such as tetramethylammonium hydroxide, tetraethylammonium hydroxide and trimethylhydroxyethylammonium hydroxide; Alkaline aqueous solutions such as cyclic amines such as pyrrole and piperidine; And organic solvents such as toluene, xylene, and toluene.

The developing method in the developing step is not particularly limited, and an immersion phenomenon, a spray phenomenon, a brush phenomenon, an ultrasonic phenomenon, or the like can be used.

Fig. 3 (d) schematically shows the state after the development process is performed by using a negative-type photosensitive resin. In Fig. 3 (d), the unexposed area 52 is dissolved by the developing solution, and only the exposed area 51 remains on the surface of the substrate, and the photosensitive resin film of this area becomes the mask 60. [ Fig. 3 (e) schematically shows the state after the development process is performed using a positive photosensitive resin. In Fig. 3E, the exposed area 51 is dissolved by the developing solution, and only the unexposed area 52 remains on the substrate surface, and the photosensitive resin film of this area becomes the mask 60. Fig.

[6] First etching step

The first etching step is a step of etching the plating layer mainly in the maskless area on the surface of the mold base material using the photosensitive resin film remaining on the surface of the mold base after the above-described development process as a mask.

Fig. 4 is a diagram schematically showing a preferable example of the second half of the method for producing a mold. Fig. 4 (a) schematically shows a state after the plating layer in the region mainly having no mask is etched by the first etching step. The plating layer under the mask 60 is not etched due to the photosensitive resin film acting as the mask 60 but the etching from the maskless region 45 proceeds with the progress of the etching. Therefore, the plating layer underlying the mask 60 is also etched near the boundary between the masked region 45 and the masked region 45. As described above, the plating on the lower plating layer of the mask 60 is also referred to as side etching in the vicinity of the boundary between the mask 60 and the maskless region 45.

(FeCl ₃ ) solution, cupric chloride (CuCl ₂ ) solution, alkali etching solution (Cu (NH ₃ ) ₄ Cl ₂ ), and the like are used for the etching treatment (first etching treatment) (Metal surface) in a region where the mask 60 is not present, among the surface of the substrate for the mold. As the etching treatment, a strong acid such as hydrochloric acid or sulfuric acid may be used as an etching solution. In the case where the plating layer is formed by electrolytic plating, etching treatment is performed using reverse electrolytic etching by applying a potential opposite to that at electrolytic plating You may. The surface irregularities formed on the mold base material when the etching treatment is performed are different depending on the kind of the constituent material (metal material) or the plating layer of the mold base material, the type of the photosensitive resin film, and the type of the etching treatment in the first etching step It is not uniformly etched. However, when the etching amount is 10 m or less, etching is substantially isotropic from the surface of the mold base material contacting the etching liquid. The etching amount referred to here is the thickness of the plating layer cut by etching.

The etching amount in the first etching step is preferably 1 to 10 mu m, more preferably 2 to 5 mu m. When the etching amount exceeds 10 占 퐉, the surface irregularities formed on the metal mold have large irregularities in height. As a result, when the antiglare film is produced using the mold, the non-R _SCE / R _SCI may exceed 0.1. Therefore, it is preferable that the amount of etching in the first etching step is 10 占 퐉 or less and the metal mold is manufactured through the process described later. Further, by producing the antiglare film using the metal mold, Can be obtained. On the other hand, when the etching amount is less than 1 占 퐉, the mold has almost no irregular surface irregularities and becomes a metal mold having a substantially flat surface. Therefore, even if an antiglare film is produced using the metal mold, It is difficult to obtain an antiglare film having sufficient antifogging properties. The etching treatment in the first etching step may be performed by one etching treatment or may be performed by dividing the etching treatment two or more times. In the case where the etching treatment is divided into two or more times, it is preferable that the total etching amount in two or more etching treatments is 1 to 10 mu m.

[7] Photosensitive resin film peeling step

In the subsequent photosensitive resin film peeling step, the photosensitive resin film remaining on the mold base material is completely removed by the above-described step, acting as the mask 60 in the first etching step and removing the photosensitive resin film remaining on the mold base material. It is preferable to remove it. In the photosensitive resin film peeling step, it is preferable to dissolve the photosensitive resin film using a peeling liquid. As the exfoliation liquid, those prepared by changing the concentration, pH and the like of the exemplified developer can be used. Alternatively, the same developer as that used in the developing process may be used, and the photosensitive resin film may be peeled off by changing the temperature or immersion time with the developing process. In the photosensitive resin film peeling step, the method of contacting the peeling liquid and the substrate for the mold (peeling method) is not particularly limited, and the peeling may be peeling off, spray peeling, brush peeling, ultrasonic peeling or the like.

4B schematically shows a state in which the photosensitive resin film used as the mask 60 in the first etching step is completely dissolved and removed by the photosensitive resin film peeling step. The first surface relief shape 46 is formed on the surface of the mold base material by the mask 60 made of the photosensitive resin film and the etching treatment.

[8] Second etching process

In the second etching step, the first surface irregularities 46 formed by the first etching step are subjected to a further etching treatment (second etching treatment) to reduce the surface irregularities. By this second etching treatment, in the first surface relief shape 46 formed by the first etching treatment, there is no portion where the surface inclination is steeply inclined (hereinafter, among the surface relief shapes, Is referred to as " shape slowing "). 4C shows a state in which the first surface irregularities 46 of the mold base material 40 are reduced in shape by the second etching treatment so that the portion having a steeply sloped surface tends to be slackened, And a second surface relief shape 47 is formed. The mold obtained by performing the second etching treatment in this way has the effect that the optical characteristics of the antiglare film of the present invention produced using the mold are more preferable.

The second etching process of the second etching process can also use an etching process using the same etching liquid as the first etching process or an inverse electrolytic etching process. The degree of shape reduction after the second etching treatment (degree of disappearance of a portion where the surface inclination of the surface irregularity shape after the first etching step is steep) is determined by the material of the mold base material, the means of the second etching treatment, And the depth and the depth of the concavities and convexities in the concavo-convex shape obtained by the second concavo-convex shape, the largest factor in controlling the slowing state (degree of shape reduction) . The amount of etching referred to here is also expressed by the thickness of the substrate shaved by the second etching treatment, as in the case of the first etching step. If the etching amount of the second etching treatment is small, the effect of the shape reduction of the surface irregularity shape obtained by the first etching step becomes insufficient. Therefore, the antiglare film produced using a mold having insufficient shape reduction may have a drawback. On the other hand, if the amount of etching in the second etching treatment is excessively large, the irregularities of the surface irregularities formed by the first etching step hardly occur, and the metal may have a substantially flat surface. The antiglare film produced using such a mold having a substantially flat surface may sometimes have insufficient flicker. Therefore, the etching amount of the second etching treatment is preferably in the range of 1 to 50 mu m, more preferably in the range of 4 to 20 mu m, and further preferably in the range of 13 to 18 mu m. Similar to the first etching step, the second etching treatment may be performed by one etching treatment, or the etching treatment may be performed at least two times. In the case where the etching treatment is divided into two or more times, it is preferable that the total etching amount in two or more etching treatments is 1 to 50 占 퐉.

[9] Second plating process

The final step of the production of the mold is to coat the surface of the mold base material that has undergone the steps of [6] and [7] described above, preferably the steps of [6] to [8] Chrome plating) is performed. By performing the second plating step, the surface irregularities 47 of the mold base material can be further reduced, and the surface of the mold can be protected by the plating. 4D, the chromium plating layer 71 is formed on the second surface relief shape 47 formed by the second etching treatment as described above, whereby the surface relief shape is reduced in shape (surface 70) Respectively.

As the plating layer formed by the second plating process, chromium plating is preferable in that it is glossy, has a high hardness, has a small coefficient of friction, and can impart good releasability. Among the chromium plating, chromium plating, which is called so-called glossy chromium plating or decorative chromium plating, which exhibits good glossiness, is particularly preferable. Chrome plating is carried out, but by the conventional electrolytic, and the plating bath, the aqueous solution containing chromic anhydride (CrO ₃₎ and a small amount of sulfuric acid is used as the plating solution. By controlling the current density and the electrolysis time, the thickness of the chromium plating layer can be controlled.

In this manner, plating in the second plating step, preferably chromium plating, is performed to obtain a mold for producing the antiglare film of the present invention. By performing chromium plating on the surface irregularities on the surface of the mold base material after the second etching treatment, the shape can be reduced and a mold having increased surface hardness can be obtained. The largest factor in controlling the degree of shape reduction in this case is the thickness of the chromium plating layer. If the thickness is thin, the degree of shape reduction is insufficient, and if the thickness of the chromium plating layer is too thick, the productivity is deteriorated and a plating defect of a projection-like shape called nodule is generated. It is not preferable as a mold for producing a film. The thickness of the chromium plating layer is preferably in the range of 1 to 20 mu m, more preferably in the range of 3 to 15 mu m, and still more preferably in the range of 3 to 6 mu m.

The chromium plating layer formed in the second plating step is preferably formed so as to have a Vickers hardness of 800 or more, more preferably 1,000 or more. When the Vickers hardness of the chrome plated layer is less than 800, the durability of the mold tends to be lowered when an antiglare film is produced using the mold.

Hereinafter, the optical embossing method preferable as a method for producing the antiglare film of the present invention will be described. As described above, the UV embossing method is particularly preferable as the optical embossing method. Here, the embossing method using the active energy ray-curable resin will be specifically described.

In order to continuously produce the antiglaving film of the present invention, when the antiglare film of the present invention is produced by the optical embossing method, the following steps:

[P1] A coating process for coating a coating liquid containing an active energy ray-curable resin on a transparent support continuously conveyed to form a coating layer,

A final curing step of irradiating an active energy ray from the side of the transparent support with the surface of the mold pressed on the surface of the [P2] coated layer,

.

Further, when the antiglare film of the present invention is produced by the optical embossing method,

[P3] It is more preferable to include a pre-hardening step after the coating step [P1] and prior to the hardening step [P2], in which both end regions in the width direction of the coated layer are irradiated with active energy rays.

Hereinafter, each step will be described in detail with reference to the drawings. 5 is a diagram schematically showing a preferable example of the production apparatus used in the method for producing an antiglare film of the present invention. Arrows in Fig. 5 indicate the transport direction of the film or the rotation direction of the roll.

[P1] Coating process

In the coating step, a coating solution containing an active energy ray-curable resin is coated on a transparent support to form a coating layer. 5, a coating liquid containing an active energy ray-curable resin composition is applied to a transparent support 81 fed from a feed roll 80 in a coating zone 83. In this coating process,

Coating of the coating liquid onto the transparent support 81 can be performed by, for example, a gravure coating method, a micro gravure coating method, a rod coating method, a knife coating method, an air knife coating method, a kiss coating method, a die coating method, .

(Transparent support)

The transparent support 81 may be of a light transmitting type, for example, glass or a plastic film. The plastic film may have appropriate transparency and mechanical strength. Concretely, any of those exemplified as the transparent support already used in the UV embossing method can be used. In order to continuously produce the antiglare film of the present invention by the optical embossing method, those having suitable flexibility are selected.

Various surface treatments may be performed on the surface (coating layer side surface) of the transparent support 81 for the purpose of improving the coating property of the coating liquid and improving the adhesiveness between the transparent support and the coating layer. Examples of the surface treatment include a corona discharge treatment, a glow discharge treatment, an acid surface treatment, an alkali surface treatment, and an ultraviolet ray irradiation treatment. Further, another layer such as a primer layer may be formed on the transparent support 81, and a coating liquid may be coated on the other layer.

In order to improve the adhesion between the transparent support and the polarizing film, the surface of the transparent support (the surface opposite to the coating layer) is subjected to various surface treatments It is preferable to make it hydrophilic. This surface treatment may be carried out after the production of the antiglare film.

(Coating solution)

The coating liquid contains an active energy ray curable resin and usually contains a photopolymerization initiator (radical polymerization initiator). If necessary, various additives such as a light-transmitting fine particle, a solvent such as an organic solvent, a leveling agent, a dispersant, an antistatic agent, an antifouling agent and a surfactant may be contained.

(1) Active energy ray curable resin

As the active energy ray-curable resin, for example, a resin containing a polyfunctional (meth) acrylate compound can be preferably used. The polyfunctional (meth) acrylate compound is a compound having at least two (meth) acryloyloxy groups in the molecule. Specific examples of the polyfunctional (meth) acrylate compound include esters of polyhydric alcohol and (meth) acrylic acid, urethane (meth) acrylate compounds, polyester (meth) acrylate compounds, epoxy (meth) And polyfunctional polymerizable compounds containing two or more (meth) acryloyl groups.

Examples of the polyhydric alcohol include polyhydric alcohols such as ethylene glycol, diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, propylene glycol, dipropylene glycol, tripropylene glycol, tetrapropylene glycol, polypropylene glycol, Dihydric alcohols such as diol, hexanediol, neopentyl glycol, 2-ethyl-1,3-hexanediol, 2,2'-thiodiethanol and 1,4-cyclohexanedimethanol; Trimethylol propane, glycerol, pentaerythritol, diglycerol, dipentaerythritol, ditrimethylol propane and the like.

Specific examples of the esters of polyhydric alcohol and (meth) acrylic acid include ethylene glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, 1,6-hexanediol di (meth) (Meth) acrylate, trimethylol ethane tri (meth) acrylate, tetramethylol methane tri (meth) acrylate, 1,6-hexanediol di (meth) (Meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, glycerin tri (meth) acrylate, dipentaerythritol tri (Meth) acrylate, dipentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (meth) acrylate, It may include a relay agent.

Examples of the urethane (meth) acrylate compound include an urethane formation reaction product of an organic isocyanate having a plurality of isocyanate groups in one molecule and a (meth) acrylic acid derivative having a hydroxyl group. Examples of the organic isocyanate having a plurality of isocyanate groups in one molecule include hexamethylene diisocyanate, isophorone diisocyanate, tolylene diisocyanate, naphthalene diisocyanate, diphenylmethane diisocyanate, xylylene diisocyanate and dicyclohexylmethane diisocyanate. Organic isocyanates having two isocyanate groups in one molecule, and organic isocyanates having three isocyanate groups in one molecule in which isocyanurate modification, adduct modification and biuret modification of these organic isocyanates are exemplified. Examples of the (meth) acrylic acid derivative having a hydroxyl group include 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 4-hydroxybutyl (meth) acrylate, 2-hydroxybutyl (Meth) acrylate, 2-hydroxy-3-phenoxypropyl (meth) acrylate and pentaerythritol triacrylate.

The polyester (meth) acrylate compound is preferably a polyester (meth) acrylate obtained by reacting a hydroxyl group-containing polyester with (meth) acrylic acid. The hydroxyl group-containing polyester which is preferably used is a hydroxyl group-containing polyester obtained by an esterification reaction of a polyhydric alcohol with a compound having a carboxylic acid or a plurality of carboxyl groups and / or anhydride thereof. As the polyhydric alcohol, the same compounds as the above-mentioned compounds can be exemplified. In addition to polyhydric alcohols, bisphenol A and the like may be mentioned as phenols. Examples of the carboxylic acid include formic acid, acetic acid, butylcarboxylic acid, and benzoic acid. Examples of the compound having a plurality of carboxyl groups and / or anhydrides thereof include maleic acid, phthalic acid, fumaric acid, itaconic acid, adipic acid, terephthalic acid, maleic anhydride, phthalic anhydride, trimellitic acid and cyclohexanedicarboxylic acid anhydride. .

Among the above-mentioned polyfunctional (meth) acrylate compounds, hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate and diethylene glycol di (meth) acrylate are preferable from the viewpoints of improving the strength of the cured product, Ester compounds such as trimethylolpropane tri (meth) acrylate, tripropylene glycol di (meth) acrylate, trimethylolpropane tri (meth) acrylate, pentaerythritol tri (meth) acrylate and dipentaerythritol hexa (meth) acrylate; Adducts of hexamethylene diisocyanate and 2-hydroxyethyl (meth) acrylate; Adducts of isophorone diisocyanate and 2-hydroxyethyl (meth) acrylate; Adducts of tolylene diisocyanate and 2-hydroxyethyl (meth) acrylate; Adducts of adducts of modified adduct of isophorone diisocyanate and 2-hydroxyethyl (meth) acrylate; And adducts of biuret-modified isophorone diisocyanate and 2-hydroxyethyl (meth) acrylate are preferred. These polyfunctional (meth) acrylate compounds may be used alone or in combination of two or more.

The active energy ray-curable resin may contain a monofunctional (meth) acrylate compound in addition to the above-mentioned multi-functional (meth) acrylate compound. Examples of monofunctional (meth) acrylate compounds include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, isobutyl (meth) acrylate, (Meth) acrylate, 2-hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, 2-hydroxybutyl (Meth) acrylate, glycidyl (meth) acrylate, acryloylmorpholine, N-vinylpyrrolidone, tetrahydrofurfuryl (meth) acrylate, cyclohexyl (Meth) acrylate, isobornyl (meth) acrylate, acetyl (meth) acrylate, benzyl (meth) acrylate, 2-ethoxyethyl (meth) acrylate, 3-methoxybutyl (Meth) acrylate, ethyl carbitol (meth) acrylate, phenoxy ) Acrylate, ethylene oxide modified phenoxy (meth) acrylate, propylene oxide (meth) acrylate, nonylphenol (meth) acrylate, ethylene oxide modified (meth) acrylate, propylene oxide modified nonylphenol Acrylate, methoxydiethylene glycol (meth) acrylate, 2- (meth) acryloyloxyethyl-2-hydroxypropyl phthalate, dimethylaminoethyl (meth) acrylate and methoxy triethylene glycol (Meth) acrylates. These compounds may be used alone or in combination of two or more.

Further, the active energy ray curable resin may contain a polymerizable oligomer. By containing a polymerizable oligomer, the hardness of the cured product can be adjusted. The polymerizable oligomer can be obtained, for example, by reacting the polyfunctional (meth) acrylate compound, that is, an ester compound of a polyhydric alcohol and (meth) acrylic acid, a urethane (meth) acrylate compound, a polyester (meth) ) Acrylate, and oligomers such as trimers and the like.

Examples of other polymerizable oligomers include urethane (meth) acrylate oligomers obtained by reacting a polyisocyanate having at least two isocyanate groups in a molecule with a polyhydric alcohol having at least one (meth) acryloyloxy group . Examples of the polyisocyanate include a polymer of hexamethylene diisocyanate, isophorone diisocyanate, tolylene diisocyanate, diphenylmethane diisocyanate, and xylylene diisocyanate. The polyisocyanate includes at least one (meth) acryloyloxy group- Examples of the alcohol include hydroxyl group-containing (meth) acrylic acid esters obtained by an esterification reaction between a polyhydric alcohol and (meth) acrylic acid. Examples of the polyhydric alcohol include 1,3-butanediol, 1,4- Diol, diethylene glycol, triethylene glycol, neopentyl glycol, polyethylene glycol, polypropylene glycol, trimethylol propane, glycerin, pentaerythritol, dipentaerythritol and the like. In the polyhydric alcohol having at least one (meth) acryloyloxy group, a part of the alcoholic hydroxyl group of the polyhydric alcohol is esterified with (meth) acrylic acid and the alcoholic hydroxyl group remains in the molecule.

Examples of other polymerizable oligomers include polyester (meth) acrylates obtained by reacting a compound having a plurality of carboxyl groups and / or anhydride thereof with a polyhydric alcohol having at least one (meth) acryloyloxy group Oligomers. Examples of the compound having a plurality of carboxyl groups and / or anhydrides thereof include the same ones described in the polyester (meth) acrylate of the polyfunctional (meth) acrylate compound. Examples of the polyvalent alcohol having at least one (meth) acryloyloxy group include the same ones described for the urethane (meth) acrylate oligomer.

In addition to the polymerizable oligomer as described above, a compound obtained by reacting an isocyanate with a hydroxyl group of a hydroxyl group-containing polyester, a hydroxyl group-containing polyether or a hydroxyl group-containing (meth) acrylate ester as an example of a urethane (meth) . The hydroxyl group-containing polyester which is preferably used is a hydroxyl group-containing polyester obtained by an esterification reaction of a polyhydric alcohol with a compound having a carboxylic acid or a plurality of carboxyl groups and / or anhydride thereof. Examples of the polyhydric alcohol, compound having a plurality of carboxyl groups and / or anhydrides thereof are the same as those described in the polyester (meth) acrylate compound of the polyfunctional (meth) acrylate compound. The hydroxyl group-containing polyether which is preferably used is a hydroxyl group-containing polyether obtained by adding one or more kinds of alkylene oxide and / or epsilon -caprolactone to a polyhydric alcohol. The polyhydric alcohol may be the same as that usable for the hydroxyl group-containing polyester. Examples of the hydroxyl group-containing (meth) acrylate ester which is preferably used include the same ones described in the urethane (meth) acrylate oligomer of the polymerizable oligomer. As the isocyanate, a compound having at least one isocyanate group in the molecule is preferable, and a divalent isocyanate compound such as tolylene diisocyanate, hexamethylene diisocyanate, and isophorone diisocyanate is particularly preferable.

These polymerizable oligomer compounds may be used alone or in combination of two or more.

(2) Photopolymerization initiator

The photopolymerization initiator can be appropriately selected depending on the kind of active energy ray to be applied to the production of the antiglare film of the present invention. When an electron beam is used as the active energy ray, a coating liquid containing no photopolymerization initiator may be used for producing the antiglare film of the present invention.

Examples of the photopolymerization initiator include an acetophenone photopolymerization initiator, a benzoin photopolymerization initiator, a benzophenone photopolymerization initiator, a thioxanthone photopolymerization initiator, a triazine photopolymerization initiator, and an oxadiazole photopolymerization initiator. Examples of the photopolymerization initiator include 2,4,6-trimethylbenzoyldiphenylphosphine oxide, 2,2'-bis (o-chlorophenyl) -4,4 ', 5,5'- 2-chloroacridone, 2-ethyl anthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methyl phenylglyoxylate, and titanocene compounds can also be used . The photopolymerization initiator is usually used in an amount of 0.5 to 20 parts by weight, preferably 1 to 5 parts by weight, based on 100 parts by weight of the active energy ray curable resin.

The coating liquid may contain a solvent such as an organic solvent in order to improve the coating property to the transparent support. Examples of the organic solvent include aliphatic hydrocarbons such as hexane, cyclohexane and octane; Aromatic hydrocarbons such as toluene and xylene; Alcohols such as ethanol, 1-propanol, isopropanol, 1-butanol and cyclohexanol; Ketones such as methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone; Esters such as ethyl acetate, butyl acetate and isobutyl acetate; Glycol ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether and propylene glycol monoethyl ether; Esterified glycol ethers such as ethylene glycol monomethyl ether acetate and propylene glycol monomethyl ether acetate; Cellosolves such as 2-methoxyethanol, 2-ethoxyethanol and 2-butoxyethanol; And carbitols such as 2- (2-methoxyethoxy) ethanol, 2- (2-ethoxyethoxy) ethanol and 2- (2-butoxyethoxy) ethanol, Can be used. These solvents may be used alone or in combination of two or more of them if necessary. After the coating, it is necessary to evaporate the organic solvent. Therefore, the boiling point is preferably in the range of 60 占 폚 to 160 占 폚. The saturated vapor pressure at 20 占 폚 is preferably in the range of 0.1 kPa to 20 kPa.

When the coating liquid contains a solvent, it is preferable to form a drying step after the coating step and before the first curing step in which the solvent is evaporated to dry. The drying can be performed, for example, by passing a transparent support 81 having a coating layer through the drying zone 84, as in the example shown in Fig. The drying temperature is appropriately selected depending on the type of solvent and transparent support to be used. But is not limited thereto. When there are a plurality of drying furnaces, the temperature may be changed for each drying furnace. The thickness of the coating layer after drying is preferably 1 to 30 mu m.

Thus, a laminate in which a transparent support and a coating layer are laminated is formed.

[P2] Curing process

In this step, an active energy ray is irradiated from the side of the transparent support in the state that the surface of the coating layer has a concavo-convex metallic concave surface (molding surface) having a desired surface concavo-convex shape, and the coating layer is cured, Thereby forming a cured resin layer. As a result, the coating layer is hardened, and the surface irregularities on the surface of the mold concavity and convexity are transferred onto the surface of the coating layer. The mold used here is in the form of a roll, which is manufactured by using a roll-shaped mold base material in the previously described mold production method.

5, for example, a coating zone 83 (in the case of drying, a drying zone 84, in the case of performing a pre-curing process described later, 86), an active energy ray irradiating device 86 such as an ultraviolet irradiating device arranged on the side of the transparent support 81 was used for the laminate having the coating layer passed through the preliminary curing zone It can be done by irradiating the energy line.

First, the rolled mold 87 is pressed onto the surface of the coated layer of the laminate subjected to the curing process by using a compression device such as a nip roll 88, and in this state, the active energy ray irradiating device 86, , An active energy ray is irradiated from the side of the transparent support 81 to cure the coating layer 82. Here, "curing the coating layer" means that the active energy ray-curable resin contained in the coating layer receives the energy of the active energy ray to cause a curing reaction. The use of a nip roll is effective in preventing bubbles from being mixed in between the coating layer of the laminate and the mold. One or more active energy ray irradiating devices may be used.

After irradiating the active energy ray, the laminate is peeled from the mold 87 using the nip roll 89 on the exit side as a fulcrum. The cured coating layer of the obtained transparent support and the cured coating layer becomes an antiglare layer, and the antiglare film of the present invention can be obtained. The obtained antiglare film is usually wound by a film winding device 90. At this time, for the purpose of protecting the antiglare layer, the protective film made of polyethylene terephthalate or polyethylene may be wound on the surface of the antiglare layer through a pressure-sensitive adhesive layer having re-releasability. Although the case where the mold used is roll-shaped is explained here, a mold other than the roll-shaped mold may also be used. Further, after peeling from the mold, additional active energy ray irradiation may be performed.

The active energy ray to be used in this step can be appropriately selected from ultraviolet rays, electron rays, near ultraviolet rays, visible rays, near-infrared rays, infrared rays, and X rays depending on the kind of active energy ray curable resin contained in the coating solution. An electron beam is preferable, ultraviolet rays are particularly preferable because it is easy to handle and high energy is obtained (as described above, the UV emboss method is preferable in the optical embossing method).

As the light source of ultraviolet rays, for example, low pressure mercury lamp, medium pressure mercury lamp, high pressure mercury lamp, ultra high pressure mercury lamp, carbon arc lamp, electrodeless lamp, metal halide lamp, xenon arc lamp and the like can be used. An ArF excimer laser, a KrF excimer laser, an excimer lamp, or a synchrotron radiation can also be used. Of these, ultra-high pressure mercury lamps, high-pressure mercury lamps, low-pressure mercury lamps, electrodeless lamps, xenon arc lamps and metal halide lamps are preferably used.

The electron beam may be 50 to 1000 keV, preferably 100 to 1000 keV, emitted from various electron beam accelerators such as a COCORT WALTON type, a Vandegraph type, a resonance type, an insulating core type, a linear type, a Dynamitron type, And an electron beam having an energy of ~ 300 keV.

When the active energy ray is ultraviolet ray, the accumulated amount of light in UVA of ultraviolet ray is preferably 100 mJ / cm2 or more and 3000 mJ / cm2 or less, and more preferably 200 mJ / cm2 or more and 2,000 mJ / cm2 or less. The amount of accumulated light in UVV (395 to 445 nm) of ultraviolet rays is preferably 100 mJ / cm2 or more and 3000 mJ / cm2 or less, and more preferably 200 mJ / cm2 or less, because the transparent support may absorb ultraviolet rays on a short wavelength side. And not more than 2000 mJ / cm < 2 >. When the accumulated light quantity is less than 100 mJ / cm 2, the curing of the coating layer becomes insufficient, the hardness of the obtained antiglare layer becomes low, or the uncured resin adheres to a guide roll or the like, which tends to cause process contamination. When the accumulated light quantity exceeds 3000 mJ / cm 2, the transparent support shrinks due to heat radiated from the ultraviolet irradiator to cause wrinkles.

[P3] Pre-hardening process

The present step is a step of preliminarily curing the both end regions by irradiating active energy rays to both end regions in the width direction of the transparent support of the coating layer prior to the curing step. 6 is a cross-sectional view schematically showing a preliminary curing step. In Fig. 6, the end region 82b in the width direction (the direction orthogonal to the transport direction) of the coating layer is a region having a predetermined width from the end portion including the end portion of the coating layer.

By adhering the end regions in advance in the preliminary curing step, the adhesion with the transparent support 81 is further enhanced in the end regions. In the process after the curing step, part of the cured resin is peeled off and falls, Can be prevented. The end region 82b can be, for example, an area of 5 mm or more and 50 mm or less from the end of the coating layer 82.

The irradiation of the active energy ray with respect to the end region of the coating layer can be carried out by irradiating the coating layer 82 which has passed through the coating zone 83 (in the case of drying, the drying zone 84) Can be performed by irradiating an active energy ray using an active energy ray irradiating device 85 such as an ultraviolet ray irradiating device provided in the vicinity of both end portions on the coating layer 82 side with respect to the transparent support 81 having the above- The active energy ray irradiating device 85 may be provided so as to irradiate an active energy ray to the end region 82b of the coating layer 82 and may be provided on the transparent support 81 side.

The kind of active energy ray and the light source are the same as the present curing process. When the active energy ray is ultraviolet ray, the accumulated amount of light in UVA of ultraviolet ray is preferably 10 mJ / cm2 or more and 400 mJ / cm2 or less, more preferably 50 mJ / cm2 or more and 400 mJ / cm2 or less. The irradiation at 50 mJ / cm 2 or more can more effectively prevent deformation in the final curing step. On the other hand, if it exceeds 400 mJ / cm 2, the curing reaction proceeds excessively, and as a result, the resin peeling may occur at the boundary between the hardened portion and the uncured portion due to the difference in the thickness of the film and the distortion of the internal stress.

Although the first method of producing the antiglare film of the present invention has been described above with emphasis on the preferred embodiments, the antiglare film of the present invention can also be produced by the second method. This second method is a method of forming random irregularities on the transparent support by applying a resin solution in which fine particles are dispersed on a transparent support and exposing the fine particles to the surface of the coating film as described above. In this case, (Average particle diameter) of the fine particles, the film thickness of the coating film, or the dispersion state of the fine particles may be adjusted. In particular, while increasing the particle size of the fine particles, by controlling the coating film thickness is at least diameter, and reduces the scattering light caused by fine particles, decreasing the luminous reflectance R _SCE measured by the ratio R _SCE / R _SCI and the regularly reflected light ablative . Also, the ratio R _SCE / R _SCI and the luminous reflectance R _SCE can be reduced by adjusting the composition and the manufacturing conditions of the coating liquid so that the fine particles aggregate to some extent.

[Use of Antiglare Film of the Present Invention]

The antiglare film of the present invention obtained as described above is used in an image display apparatus or the like and is usually used by being bonded to a polarizing film as a visible side protective film of a viewer side polarizing plate (that is, disposed on the surface of an image display apparatus). Further, as described above, when a polarizing film is used as the transparent support, an antiglare film integrated with a polarizing film can be obtained. Therefore, such an antiglare film integrated with a polarizing film can be used for an image display apparatus. The image display apparatus provided with the antiglare film of the present invention has satisfactory flicker resistance at a wide viewing angle, and also can prevent both fading and glare from occurring well.

Example

Hereinafter, the present invention will be described in more detail by way of examples. In the examples, "% " and " part " representing the content or amount are based on weight unless otherwise specified.

The evaluation method of the mold or the antiglare film in the following examples is as follows.

[1] Measurement of surface shape of antiglare film

(Surface roughness parameter of fine uneven surface)

The surface roughness parameters of the antiglare film were measured using a surface roughness meter Surf test SJ-301 manufactured by Mitsutoyo Co., Ltd. according to the method according to JIS B 0601. In order to prevent warpage of the measurement sample, an optically transparent pressure-sensitive adhesive was used and the surface opposite to the antiglare layer of the measurement sample was bonded to the glass substrate and then provided for measurement.

[2] Measurement of Optical Properties of Antiglare Film

(Hayes)

The total haze of the antiglare film was obtained by bonding the antiglare film to the glass substrate on the side opposite to the antiglare layer of the measurement sample by using an optically transparent pressure-sensitive adhesive and measuring the antiglare film bonded to the glass substrate from the glass substrate side Light was incident thereon and measured by a method in accordance with JIS K 7136 using a haze meter " HM-150 " type manufactured by Murakami Shikisai Seiki Seisakusho Co., Ltd. The surface haze was obtained by determining the internal haze of the antiglare film and subtracting the internal haze from the total haze by the following equation. The inner haze was measured in the same manner as the total haze after adhering a triacetylcellulose film having haze of almost zero to the surface of the light-scattering layer of the measurement sample after measuring the total haze with glycerin.

Surface Haze = Overall Haze - Inner Haze

(Transmission sharpness)

The transparency clearance of the antiglare film was measured by a method conforming to JIS K 7105 using a mattimeter "ICM-1DP" manufactured by Suga Shikenki Corporation. Also in this case, in order to prevent warping of the sample, an optically transparent pressure-sensitive adhesive was used and the surface opposite to the antiglare layer of the measurement sample was bonded to the glass substrate and then provided for measurement. In this state, light was incident from the glass substrate side, and measurement was performed. Here, the measured values are the sum of measured values using five types of optical combs having widths of the arm portion and the light portion of 0.125 mm, 0.25 mm, 0.5 mm, 1.0 mm, and 2.0 mm, respectively.

(Reflection sharpness measured at an incident angle of light of 45 degrees)

The reflectance sharpness of the antiglare film was measured by a method conforming to JIS K 7105 using a "ICM-1DP" measuring instrument of Suga Shikenki Co., Ltd. Also in this case, in order to prevent warpage of the sample, a surface opposite to the antiglare layer of the measurement sample was bonded to the black acrylic substrate using an optically transparent pressure-sensitive adhesive, and then provided for measurement. In this state, light was incident at an angle of 45 DEG from the side of the antiglare layer, and measurement was performed. Here, the measured values are the sum of measured values using four kinds of optical combs having widths of the arm portion and the nominal portion of 0.25 mm, 0.5 mm, 1.0 mm and 2.0 mm, respectively.

(Reflection sharpness measured at an incident angle of light of 60 degrees)

The reflectance sharpness of the antiglare film was measured by a method conforming to JIS K 7105 using a "ICM-1DP" measuring instrument of Suga Shikenki Co., Ltd. Also in this case, in order to prevent warpage of the sample, a surface opposite to the antiglare layer of the measurement sample was bonded to the black acrylic substrate using an optically transparent pressure-sensitive adhesive, and then provided for measurement. In this state, light was incident at 60 ° from the side of the antiglare layer, and measurement was performed. Here, the measured values are the sum of measured values using four kinds of optical combs having widths of the arm portion and the nominal portion of 0.25 mm, 0.5 mm, 1.0 mm and 2.0 mm, respectively.

(Luminous reflectance R _SCI and luminous reflectance R _SCE )

The spectral reflectance R _SCI measured with the specular reflection colorimeter CM2002 (manufactured by Konica Minolta Sensing) and the spectral reflectance R _SCE measured with the regular reflection light elimination method were measured. Reflection from the side opposite to the antiglare layer of the measurement sample was removed. In order to prevent warpage of the measurement sample, the surface opposite to the antiglare layer of the measurement sample was bonded to a black acrylic plate using an optically transparent pressure-sensitive adhesive, and then provided for measurement.

[3] Evaluation of anti-glare performance of antiglare film

(Non-visual inspection, evaluation of visual confirmation of visual acuity)

In order to prevent reflection from the back surface of the antiglare film, a surface opposite to the antiglare layer of the measurement sample was adhered to a black acrylic resin plate by an antiglare film and observed visually from the side of the antiglare layer in a bright room with a fluorescent lamp, The degree of non-visualization and the degree of visual desirability were visually confirmed and evaluated. With respect to the non-penetration, the degree of non-penetration when the antiglare film was observed from the front side and the degree of non-penetration when observed from the inclined angle of 30 degrees were respectively evaluated. The non-penetration and the desire were evaluated by the following criteria in three steps of 1 to 3, respectively.

Non-contact 1: No contact is observed.

      2: A small amount of non-visible light is observed.

      3: Visible light is clearly observed.

Hope 1: No desire is observed.

      2: A slight desire is observed.

      3: The desire is clearly observed.

(Evaluation of flashing)

The glare was evaluated by the following procedure. That is, first, a photomask having a pattern of a unit cell as shown in a plan view in FIG. 7 was prepared. In this figure, a unit cell 100 has a transparent substrate, a claw-shaped chromium shielding pattern 101 having a line width of 10 mu m, and a portion where the chromium shielding pattern 101 is not formed is formed in an opening 102). Here, the dimensions of the unit cells were 211 占 퐉 占 70 占 퐉 (lengthwise and widthwise in the figure), and thus the dimensions of the openings were 201 占 퐉 占 60 占 퐉 (length × width of the drawing). A plurality of unit cells shown are arranged longitudinally and laterally to form a photomask.

8, the chromium light shielding pattern 111 of the photomask 113 is placed on the light box 115 and the antiglare film 110 is adhered to the glass plate 117 with an adhesive agent. Then, as shown in a schematic cross- A sample bonded to the surface of the antiglare layer is placed on the photomask 113. In the light box 115, a light source 116 is disposed. In this state, the sample was visually observed at a position (119), which was about 30 cm away from the sample, and the degree of glare was evaluated in seven steps. Level 1 corresponds to a state in which no glare is observed, Level 7 corresponds to a state in which a strong glow is observed, and Level 4 indicates a state in which a slight glare is observed.

(Evaluation of contrast)

The polarizing plates on both sides of the front and rear sides were peeled off from a commercially available liquid crystal television ("KDL-32EX550" manufactured by Sony Corporation). In place of these original polarizing plates, a polarizing plate " Sumikaran SRDB831E " manufactured by Sumitomo Chemical Co., Ltd. was bonded on the back side and the display surface side through the pressure-sensitive adhesive so that the absorption axes thereof coincided with the absorption axes of the original polarizing plates, On the polarizing plate, the antiglare films shown in each of the following examples were bonded through a pressure-sensitive adhesive so that the uneven surface became the surface. The thus obtained liquid crystal television was activated in the dark room and the luminance in the black display state and the white display state was measured using the luminance meter " BM5A " type manufactured by TOPCON CORPORATION, and the contrast was calculated. Here, the contrast is expressed by the ratio of the luminance in the white display state to the luminance in the black display state. The results are shown by the ratio of the contrast measured when the antiglare film was bonded to the contrast measured when the antiglare film was not bonded.

[4] Evaluation of patterns for producing antiglare film

The generated pattern data is regarded as two-gradation binary image data, and the gradation is expressed as a two-dimensional discrete function g (x, y). The horizontal resolutions? X and? Y of the discrete function g (x, y) are all 2 占 퐉. The obtained two-dimensional function g (x, y) is subjected to discrete Fourier transform to obtain a two-dimensional function G (f _x , f _y ). Dimensional function Γ (f _x , f _y ) of the two-dimensional power spectrum by squaring the absolute values of the two-dimensional functions G (f _x , f _y ) Dimensional function Γ (f).

≪ Example 1 >

(Production of mold for producing anti-glare film)

A surface of aluminum roll (A6063 by JIS) having a diameter of 300 mm was coated with copper ballard. The copper ballard plating was made of a copper plating layer / a thin silver plating layer / a surface copper plating layer, and the thickness of the entire plating layer was set to be about 200 占 퐉. The copper-plated surface was mirror-polished, the polished copper-plated surface was coated with a photosensitive resin, and dried to form a photosensitive resin film. Subsequently, a pattern in which the pattern A shown in Fig. 9 is repeatedly arranged was exposed on the photosensitive resin film by a laser beam and developed. Exposure by laser light and development were carried out using Laser Stream FX (manufactured by Sink Laboratories). As the photosensitive resin film, a film containing a positive photosensitive resin was used. Here, the pattern A is obtained by passing through a plurality of Gaussian function type band-pass filters from a pattern having a random brightness distribution, and has an aperture ratio of 45.0% and a one-dimensional power spectrum having a minimum value at a frequency of 0.0195 탆 ^-1 .

Thereafter, the first etching treatment was performed with a cupric chloride solution. The etching amount at that time was set to be 4 占 퐉. The photosensitive resin film was removed from the roll after the first etching treatment, and the second etching treatment was again performed with the cupric chloride solution. The etching amount at that time was set to be 13 占 퐉. Thereafter, chromium plating was carried out to prepare a mold A. At this time, the chromium plating thickness was set to be 3 占 퐉.

(Fabrication of antiglare film)

An ultraviolet curable resin composition A was prepared in which the following components were dissolved in ethyl acetate at a solid concentration of 60% and a film showing a refractive index of 1.53 after curing was formed.

Pentaerythritol triacrylate 60 parts

Multifunctional urethane acrylate 40 parts

(The reaction product of hexamethylene diisocyanate and pentaerythritol triacrylate)

Diphenyl (2,4,6-trimethoxybenzoyl) phosphine oxide 5 parts

This ultraviolet ray curable resin composition A was applied on a triacetylcellulose (TAC) film having a thickness of 60 占 퐉 so that the thickness of the coated layer after drying became 5 占 퐉 and dried in a drier set at 60 占 폚 for 3 minutes. The dried film was pressed against the molding surface (surface having the surface irregularities) of the previously obtained mold A with a rubber roll so that the coated layer after drying became the mold side, and was closely contacted. In this state, an antiglare film was prepared from the TAC film side by irradiating light from a high-pressure mercury lamp of intensity 20 mW / cm 2 with a h-line converted light quantity of 200 mJ / cm 2 to cure the coating layer. Thereafter, the resulting antiglare film was peeled off from the mold to prepare a transparent antiglare film A having an antiglare layer on the TAC film.

≪ Example 2 >

A mold B was produced in the same manner as in the production of the mold A of Example 1 except that the etching amount of the first etching treatment was set to 3 탆 and the same procedure as in Example 1 was carried out except that the mold A was replaced with the mold B An antiglare film was produced. This antiglare film is referred to as antiglare film B.

≪ Example 3 >

A mold C was produced in the same manner as in the production of the mold A in Example 1 except that the etching amount in the first etching treatment was set to be 5 탆 and the same procedure as in Example 1 was carried out except that the mold A was replaced with the mold C An antiglare film was produced. This antiglare film is used as the antiglare film C.

≪ Comparative Example 1 &

A mold D was produced in the same manner as in the production of the mold A of Example 1 except that the etching amount of the first etching treatment was set to be 6 占 퐉 and the same procedure as in Example 1 was carried out except that the mold A was replaced with the mold D An antiglare film was produced. This antiglare film is referred to as an antiglare film D.

≪ Comparative Example 2 &

A pattern in which the pattern B shown in FIG. 10 is repeatedly arranged is exposed on the photosensitive resin film by the laser beam so that the etching amount of the first etching treatment is set to 5 m and the etching amount of the second etching treatment is set to 13 Mu] m, and that the chromium plating thickness was set to 4 [mu] m, the same procedure as in the production of the mold A of Example 1 was carried out, and the mold A was replaced with the mold E. To prepare an antiglare film. This antiglare film is referred to as an antiglare film E. Here, the pattern B is obtained by passing through a plurality of Gaussian function type band-pass filters from a pattern having a random brightness distribution. The aperture ratio is 45.0% and the one-dimensional power spectrum of the pattern is 0.015 탆 ^-1 or more and 0.05 탆 ^{- 1} &^lt; / ^RTI >

≪ Comparative Example 3 &

The surface of an aluminum roll (A5056 by JIS) having a diameter of 300 mm was mirror-polished and the zirconia bead TZ-SX-17 (Toso Co., Ltd.) was polished on the polished aluminum surface using a blasting machine Blasted with a blast pressure of 0.1 MPa (gauge pressure, the same applies hereinafter) and a bead amount of 8 g / cm 2 (the amount used per 1 cm 2 of the surface area of the roll, hereinafter the same) Unevenness was formed on the roll surface. An electroless nickel plating process was performed on the obtained aluminum roll having the unevenness to prepare a mold F. [ At this time, the electroless nickel plating thickness was set to be 15 占 퐉. An antiglare film was produced in the same manner as in Example 1 except that the mold A was replaced with the mold F. [ This antiglare film is referred to as antiglare film F.

≪ Comparative Example 4 &

A copper ballard plating was performed on the surface of an aluminum roll (A5056 according to JIS) having a diameter of 200 mm. The copper ballard plating was made of a copper plating layer / a thin silver plating layer / a surface copper plating layer, and the thickness of the entire plating layer was about 200 占 퐉. TZ-SX-17 "(manufactured by TOSOH CORPORATION; average particle diameter: 10 μm) was applied to the polished surface of the copper-plated surface by a blast apparatus (manufactured by Fuji Seisakusho Co., Ltd.) 20 탆) was blasted at a blast pressure of 0.05 MPa (gauge pressure, the same applies hereinafter) and a bead usage amount of 6 g / cm ² to form irregularities on the surface of the aluminum roll. The resulting copper-plated aluminum roll with unevenness was chrome-plated to produce a mold G. At this time, the chromium plating thickness was set to be 6 mu m. An antiglare film was produced in the same manner as in Example 1 except that the mold A was replaced with the mold G. This antiglare film is used as the antiglare film G. [

[One-dimensional power spectrum of pattern used for manufacturing each mold]

Fig. 11 is a view showing a power spectrum Γ (f) obtained by performing discrete Fourier transform on the patterns A and B used in the fabrication of the antiglare films A to E (Examples 1 to 3 and Comparative Examples 1 and 2).

[Evaluation results]

Table 1 shows the results of evaluation of the above-mentioned antiglare film with respect to the above Examples and Comparative Examples.

The antiglare films A to C (Examples 1 to 3) satisfying the requirements of the present invention were excellent in anti-glare properties even when the viewing angles were both frontal and oblique, despite the low haze, and the effect of suppressing fading and glare was sufficient. On the other hand, the antiglare film D (Comparative Example 1) had a desire. And the antiglare film E (Comparative Example 2) had insufficient anti-glare properties when observed from obliquely. The antiglare film F (Comparative Example 3) was easy to cause glare. The antiglare film G (Comparative Example 4) had insufficient anti-glare properties when observed from an oblique direction.

12: Integral sphere
13: Light source
14: Sample of luminous reflectance of anti-ghost film
15: Light trap
40: Mold base material
41: Surface of mold substrate (plated layer) after first plating and polishing
46: a first surface relief shape formed by the first etching treatment
47: surface irregularity shape reduced in shape by the second etching treatment
50: Photosensitive resin film
60: Mask
70: The surface irregularity shape after chromium plating is a surface with reduced shape
71: chrome plated layer
80: delivery roll
81: transparent support
83: Potting Zone
86: Active energy ray irradiator
87: roll mold
88, 89: nip roll
90: Film winding device
Industrial availability
The antiglare film of the present invention is useful for an image display apparatus such as a liquid crystal display.

Claims (4)

An antiglare film comprising a transparent support and an antiglare layer having a fine uneven surface formed thereon,
The total haze is 0.1% or more and 3% or less,
A surface haze of 0.1% or more and 2% or less,
A root-mean-square root roughness Rq (0.08) of 0.01 占 퐉 or more and 0.05 占 퐉 or less as measured at a cut-off length of 0.08 mm,
A root mean square roughness Rq (0.25) of 0.05 占 퐉 or more and 0.1 占 퐉 or less when measured at a cutoff length of 0.25 mm,
A root-mean-square root roughness Rq (0.8) of 0.07 탆 or more and 0.12 탆 or less when measured at a cut-off length of 0.8 mm,
Mean square root roughness Rq (2.5) of not less than 0.08 mu m and not more than 0.15 mu m when measured at a cut-off length of 2.5 mm,
_Wherein the ratio R _SCE / R _SCI of the luminous reflectance R _SCI measured by the regular reflected light including method and the luminous reflectance R _SCE measured by the regular reflection light removing method is 0.1 or less. The optical recording medium according to claim 1, wherein an average length Sm (0.25) measured at a cut-off length of 0.25 mm is 90 占 퐉 or more and 160 占 퐉 or less,
An average length Sm (0.8) of 100 占 퐉 or more and 300 占 퐉 or less as measured at a cut-off length of 0.8 mm,
Wherein an average length Sm (2.5) of the film measured at a cut-off length of 2.5 mm is 200 占 퐉 or more and 400 占 퐉 or less. The optical information recording medium according to any one of claims 1 to 4, wherein the sum Tc of the transmission sharpness measured using five types of optical combs having widths of 0.125 mm, 0.25 mm, 0.5 mm, 1.0 mm and 2.0 mm is 375% ,
The sum Rc (45) of the reflection sharpness measured at the incident angle of 45 [deg.] Of the light using the four types of optical combs having widths of 0.25 mm, 0.5 mm, 1.0 mm, and 2.0 mm,
Wherein a sum Rc (60) of the reflection sharpness measured at an incident angle of light of 60 占 using the four kinds of optical combs having the widths of the arm portion and the list portion of 0.25 mm, 0.5 mm, 1.0 mm and 2.0 mm is 240% or less. . The antiglare film according to any one of claims 1 to 3, wherein the luminous reflectance R _SCE measured by the regular reflection light removing method is 0.5% or less.

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