CN105319617A - Anti-glare film - Google Patents

Abstract

The objective of the invention lies in providing an anti-glare film. Although the film is low in haze, the film is excellent in anti-glare performance in a wide observation angle. Moreover, when the film is configured on an image display device, the film can fully inhibit glare. The film is provided with a transparent supporting body and an anti-glare layer which is formed on the supporting body and has a fine surface concave-convex shape. The total haze of the film is greater than 0.1% and less than 3%, and the surface haze of the film is greater than 0.1% and less than 2%. The mean value of inclination angles of the fine surface concave-convex shape is greater than 0.2 degrees and less than 1.2 degrees, and the standard deviation of the inclination angles is greater than 0.1 degrees and less than 0.8 degrees. The intensity ratios of the power spectrum of a complex amplitude, calculated through the elevation of the fine surface concave-convex shape and the refractive index of the anti-glare layer, at two spatial frequencies are respectively located in a specific range.

Description

Antiglare film

Technical field

The present invention relates to anti-dazzle (antiglare) film of a kind of anti-glare excellence.

Background technology

The image display devices such as liquid crystal display or plasm display panel, Braun tube (cathode-ray tube (CRT): CRT) display, organic electroluminescent (EL) display, in order to avoid being mirrored the deterioration of the observability that its display surface causes by ambient light, are configured with antiglare film at this display surface.

As antiglare film, mainly have studied the hyaline membrane possessing surface unevenness profile.This antiglare film by making ambient light scattered reflection (ambient light scattered light) with its surface unevenness profile, mirror by minimizing, shows anti-glare.But when external light intensity of light scattering, there is the situation producing following what is called " whiting ", that is, the whole display surface of image display device turns white or shows and becomes unclear color.In addition, produce the situation that following what is called " is dazzle the eyes " in addition, that is, the pixel of image display device and the concave-convex surface of antiglare film interfere, and produce Luminance Distribution and are difficult to viewing.Based on above situation, for antiglare film, it is desirable to, while guaranteeing excellent anti-glare, to prevent the generation of these " whiting ", " dazzling the eyes " fully.

Thus, such as in patent documentation 1, also can not dazzle the eyes as when being configured at the image display device of fine, the antiglare film of the generation of whitening can also be prevented fully, disclose following antiglare film, namely, be formed with fine surface unevenness profile over the transparent substrate, the average length PSm of the arbitrary cross section curve of this surface unevenness profile is less than 12 μm, the arithmetic average height Pa of this cross section curve and the ratio Pa/PSm of average length PSm are more than 0.005 and less than 0.012, angle of inclination in this surface unevenness profile is the ratio in the face of less than 2 ° is less than 50%, angle of inclination is the ratio in the face of less than 6 ° is more than 90%.

Antiglare film disclosed in patent documentation 1 by making the average length PSm of arbitrary cross section curve very little, and eliminates the surface unevenness profile with the cycle easily producing about 50 μm that dazzle the eyes, and can effectively suppress this to dazzle the eyes.But, if antiglare film disclosed in patent documentation 1 is wanted to reduce mist degree (wanting to be set to low haze) further, then have the situation that anti-glare when being configured with the display surface of the image display device of this antiglare film from oblique observation reduces.Thus, the anti-glare of antiglare film disclosed in patent documentation 1 under large viewing angle in still have the leeway of improvement.

Prior art document

Patent documentation

Patent documentation 1: Japanese Unexamined Patent Publication 2007-187952 publication

Summary of the invention

Invent problem to be solved

The object of the invention is to, a kind of antiglare film is provided, although it is low haze, but there is under large viewing angle excellent anti-glare, when being configured at image display device, the generation whitened and dazzle the eyes can be suppressed fully.

For the method for dealing with problems

The present inventor etc. conduct in-depth research to solve the problem, and consequently, complete the present invention.That is, the invention provides a kind of antiglare film, is possess transparent supporting mass and the antiglare film with the antiglare layer of fine surface unevenness profile formed thereon, preferably

Total mist degree is more than 0.1% and less than 3%,

Surface haze is more than 0.1% and less than 2%,

For with the incident light of incident angle 30 °, the reflectivity R (30) of reflection angle 30 ° and ratio R (the 40)/R (30) of the reflectivity R (40) of reflection angle 40 ° are more than 0.00001 and less than 0.0025,

It is 50 μm with the mean value of polygonal area that the summit of the protuberance of above-mentioned surface unevenness profile carries out being formed when fertile Luo Nuoyi (Voronoi) is split to this surface for generator ²above and 150 μm ²below, and the coefficient of variation of this polygonal area is more than 40% and less than 80%.

In this antiglare film,

The transmission sharpness sum Tc that the 5 kinds of light combs using the width of shading light part and transmissive portion to be respectively 0.125mm, 0.25mm, 0.5mm, 1.0mm and 2.0mm measure is more than 375%,

The reflection sharpness sum Rc (45) that the 4 kinds of light combs using the width of shading light part and transmissive portion to be respectively 0.25mm, 0.5mm, 1.0mm and 2.0mm measure with the incident angle 45 ° of light for less than 180%,

The reflection sharpness sum Rc (60) that the 4 kinds of light combs using the width of shading light part and transmissive portion to be respectively 0.25mm, 0.5mm, 1.0mm and 2.0mm measure with the incident angle 60 ° of light is for less than 240%.

The effect of invention

According to the present invention, a kind of antiglare film can being provided, although it is low haze, but under large viewing angle, there is enough anti-glares, when being configured at image display device, the generation whitened and dazzle the eyes can be suppressed fully.

Accompanying drawing explanation

Fig. 1 is for illustrating simply from antiglare layer side with the stereographic map of the reflectivity of each angle during incident angle 30 ° of incident lights.

Fig. 2 is the Voronoi diagram representing the example that fertile Luo Nuoyi is split.

Fig. 3 is the stereographic map of the algorithm that the protuberance schematically showing antiglare film judges.

Fig. 4 is the figure of a preferred example of the first half of the manufacture method schematically showing mould.

Fig. 5 is the figure of a preferred example of the latter half of the manufacture method schematically showing mould.

Fig. 6 is the figure schematically showing the configuration being applicable to the device used when manufacturing antiglare film.

Fig. 7 is the figure of the suitable precuring operation schematically shown when manufacturing antiglare film.

Fig. 8 is the vertical view of the assembly unit (unitcell) schematically shown for dazzling the eyes evaluation.

Fig. 9 is the sectional view schematically showing the device of dazzling the eyes evaluation.

Figure 10 is the figure of the part representing pattern used in embodiment 1 ~ 3 and comparative example 1.

Figure 11 is the figure of the part representing pattern used in embodiment 4.

Figure 12 is the figure of the part representing pattern used in embodiment 5.

Figure 13 is the figure of the part representing pattern used in comparative example 2.

Embodiment

Below, be preferred embodiment described of the present invention with reference to accompanying drawing as required, but for ease of viewing, the size etc. shown in these figure is arbitrary.

Antiglare film of the present invention is for the incident light of incident angle 30 °, ratio R (the 40)/R (30) of the reflectivity R (30) of reflection angle 30 ° and the reflectivity R (40) of reflection angle 40 ° is more than 0.00001 and less than 0.0025, is 50 μm with the polygonal area formed when fertile Luo Nuoyi is split to be carried out for generator in the summit of the protuberance of surface unevenness profile mean value to this surface ²above and 150 μm ²below, and the coefficient of variation of this polygonal area is more than 40% and less than 80%.

First, about antiglare film of the present invention, be described to luminance factor R (40)/R (30) and with the method for asking of the summit of the protuberance of surface unevenness profile for the polygonal area formed when generator carries out fertile Luo Nuoyi segmentation to this surface.

[luminance factor]

The method of asking of ratio R (the 40)/R (30) of reflectivity is described.Fig. 1 is for illustrating that the antiglare layer side had from antiglare film of the present invention is with the figure (stereographic map) of the reflectivity of each angle during incident angle 30 ° of incident lights, schematically shows the incident direction relative to the light from antiglare layer side of antiglare film 10 and reflection direction simply.With reference to Fig. 1, for in the antiglare layer side of antiglare film 10 relative to tilting the incident light of direction 11 incidence of 30 ° from normal 20, by the direction to reflection angle 30 °, that is, the reflection light reflectance (namely normal reflection rate) to normal reflection direction 12 is set to R (30).In addition, represented in the direction of the reflected light on arbitrary reflection angle θ with symbol 15, the direction 12,15 of reflected light when making mensuration reflectivity is in the face 30 in the direction 11 and normal 20 that comprise incident light.In addition, the reflectivity in the direction to reflection angle 40 ° is set to R (40).

When measuring the reflectivity of antiglare film, need precision to measure the reflectivity of less than 0.001% excellently.For this reason, effective way is the detecting device using dynamic range large, preferably can use the light power meter etc. that this kind commercially available.Providing holes before the detecting device of this light power meter, makes to watch the angle of antiglare film to be that the goniophotometer of 2 ° measures.As the incident light in this situation, wavelength can be used to be the luminous ray of 380 ~ 780nm.As mensuration light source, both can use the light source collimated by the light penetrated from the light sources such as Halogen lamp LED, and laser etc. also can be used as monochromatic source and the high light source of the depth of parallelism.When requiring the reflectivity of the antiglare film that the back side (with the face of antiglare layer opposition side) is level and smooth and transparent, due to the situation that the reflection had from the antiglare film back side impacts measured value, therefore need to avoid this impact.For this reason, when measuring reflectivity, preferably utilize the acrylic resin board of bonding agent and black closely sealed the even surface of the antiglare film as determination object, or it is closely sealed to use the liquid such as water, glycerine to make it optics, just only can measure the reflectivity of antiglare film most surface thus.

In antiglare film of the present invention, when with incident angle 30 ° of incident lights, the reflectivity R (40) in the direction that reflection angle is 40 ° and the reflectivity in the direction of reflection angle 30 °, i.e. ratio R (the 40)/R (30) of normal reflection rate R (30) are more than 0.00001 and less than 0.0025.Be configured with more not enough than the anti-glare of the image display device of R (40)/R (30) antiglare film below 0.00001.On the other hand, be configured with and easilier than the image display device of R (40)/R (30) antiglare film more than 0.0025 produce whiting.In order to obtain the image display device that there is excellent anti-glare, prevent the generation of whiting fully, ratio R (the 40)/R (30) of the reflectivity of antiglare film is more preferably more than 0.00005 and less than 0.001, and more preferably more than 0.0001 and less than 0.001.

[with the polygonal area of protuberance summit for being formed when generator carries out fertile Luo Nuoyi segmentation to convex-concave surface]

About the surface unevenness profile of antiglare film, be described for generator carries out the polygonal area of formation when fertile Luo Nuoyi is split to this surface with the summit of protuberance.First, if be described fertile Luo Nuoyi segmentation, when being then configured with some points (being called generator) in the plane, the most recently the figure split this plane according to the arbitrary point in this plane and which generator and produce is called Voronoi diagram, this segmentation is called fertile Luo Nuoyi and splits.In Fig. 2, indicate with the summit of the protuberance in the surface of antiglare film as generator to carry out the example of fertile Luo Nuoyi segmentation to this surface.In this figure, the point 26,26 of corner is generator, and each polygon 27,27 comprising a generator is the regions utilizing fertile Luo Nuoyi segmentation to be formed, and is referred to as fertile Luo Nuoyi region or Voronoi polygon, but hereinafter referred to as Voronoi polygon.In this figure, for the part 28,28 of smearing thinly of surrounding, illustrate below.In Voronoi diagram, the number of generator is consistent with the number of Voronoi polygon.What is called for the polygonal area formed when generator carries out fertile Luo Nuoyi segmentation to this surface, refers to the area of this Voronoi polygon with the summit of the protuberance of surface unevenness profile.

When obtaining mean value and the coefficient of variation of the area by carrying out the Voronoi polygon obtained with the fertile Luo Nuoyi segmentation that is generator of the summit of the protuberance on antiglare film surface, the devices such as confocal microscope, interference microscope, atomic force microscope (AFM) are utilized to measure surface configuration, after obtaining the coordinate figure of the three-dimensional of each point on antiglare film surface, utilize algorithm shown below to carry out fertile Luo Nuoyi segmentation, calculate mean value and the coefficient of variation of the area of Voronoi polygon.When the mensuration of surface configuration, in order to precision excellent measure the micro concavo-convex surface of antiglare film, and reduce error, measure region and be preferably 150 μm × more than 150 μm and 500 μm × less than 500 μm.In addition, the region of more than 3 is preferably measured, using its mean value as measured value.

Method for the fertile Luo Nuoyi segmentation being generator with the summit of the protuberance on the micro concavo-convex surface of antiglare film is specifically described.First, the summit of the protuberance on this micro concavo-convex surface is obtained.That is, when being conceived at arbitrary of antiglare film surface, when the surrounding of this some point that to there is not absolute altitude higher than the point had in mind, think that this point is the summit of protuberance, with the summit of the protuberance so obtained for generator carries out fertile Luo Nuoyi segmentation.More specifically, as shown in Figure 3, be conceived to the arbitrary point 21 on antiglare film surface, centered by this point 21, describe the bowlder that the radius parallel with antiglare film reference field 23 is 2.5 μm, in the middle of point on the antiglare film surface 22 comprised in the projecting plane 24 of this circle, when there is not the absolute altitude point higher than the point 21 had in mind, this point 21 is judged to be the summit of protuberance., the scope comparing absolute altitude be set in the scope of the circle 24 of radius 2.5 μm, be the impact of surface unevenness profile in order to remove the anti-glare substantially not participating in antiglare film, the high frequency of dazzling the eyes herein.

Then, project to antiglare film reference field 23 summit of calculated protuberance.Thereafter, the all three-dimensional coordinates obtained utilizing the mensuration of surface configuration project to this reference field, the all points be projected by making these belong to immediate generator and carry out fertile Luo Nuoyi segmentation, obtain divided and polygonal area that is that obtain, obtain mean value and the coefficient of variation of the area of Voronoi polygon thus.Herein, the percentile form of value that the coefficient of variation obtains divided by this mean value with the standard deviation of the area by Voronoi polygon calculates.The index of inequality as the area evaluating Voronoi polygon does not adopt standard deviation and adopts the reason of the coefficient of variation to be because remove the impact that caused by the size of the mean value of the area of Voronoi polygon and evaluate inequality.

As shown in previous section illustrates, Fig. 2 is the Voronoi diagram representing the example for generator this surface being carried out to fertile Luo Nuoyi segmentation with the summit of the protuberance of antiglare film.Have the summit that multiple generators 26,26 is protuberances of antiglare film, utilize fertile Luo Nuoyi segmentation, distribute a Voronoi polygon 27 to a generator 26.In this figure, the Voronoi polygon 28,28 smeared thinly is the Voronoi polygons connected with the border in the visual field.The Voronoi polygon that should connect with the border in the visual field is not necessarily only determined by the summit of the protuberance as generator, does not therefore use when mean value and the coefficient of variation of the area of calculating Voronoi polygon.And, in the figure, only extension line and symbol are put on to the generator of a part and Voronoi polygon, but easily should understand from above explanation and this figure and have multiple generator and Voronoi polygon.

Antiglare film of the present invention is by being set to the scope of regulation respectively by the mean value of the area of above-mentioned Voronoi polygon and the coefficient of variation, utilize the cooperative effect of mist degree described later and above-mentioned luminance factor, while preventing the generation whitened and dazzle the eyes well, show excellent anti-glare.In order to effectively show this effect, the mean value of the area of Voronoi polygon is made to be 50 μm ²above and 150 μm ²below.The mean value of this area is more preferably 75 μm ²above and 125 μm ²below.Based on identical reason, the coefficient of variation of the area of Voronoi polygon is made to be more than 40% and less than 80%.This coefficient of variation is more preferably more than 50% and less than 70%.

When the mean value of the area of Voronoi polygon is below described scope, the protuberance on the micro concavo-convex surface of antiglare film is too closely configured, and is difficult to obtain enough anti-glares.On the other hand, when the mean value of the area of Voronoi polygon is more than described scope, the protuberance on the micro concavo-convex surface of antiglare film is too loosely configured, and produces dazzle the eyes when being configured at image display device.

When the coefficient of variation of the area of Voronoi polygon is below described scope, the area distributions of Voronoi polygon does not have enough scopes, the configuration with the protuberance at the interval of more than 50 μm is not enough, is difficult to obtain from the large enough anti-glares observing angle views.On the other hand, when the coefficient of variation of the area of Voronoi polygon is more than described scope, the area distributions of Voronoi polygon is excessively wide, and cannot obtain the configuration of protuberance closely, generation is dazzle the eyes.

[total mist degree and Surface haze]

Antiglare film of the present invention in order to show anti-glare, prevent whiting, make the total mist degree for vertical incidence light be in more than 0.1% and the scope of less than 3%, Surface haze are in more than 0.1% and the scope of less than 2%.Total mist degree of antiglare film can measure according to the method for regulation in the JISK7136:2000 mist degree of the plastics-transparent material " ask method ".The antiglare film below 0.1% for total mist degree or Surface haze, because the image display device being configured with it can not show enough anti-glares, therefore not preferred.In addition, for total mist degree more than 3% or the antiglare film of Surface haze more than 2%, because the image display device being configured with it can produce whiting, therefore not preferred.In addition, this image display device also has its contrast also sufficient not unfavorable condition.

Surface haze is deducted and the internal haze obtained is more low better from total mist degree.The contrast being configured with the image display device of the antiglare film of this internal haze more than 2.5% has the trend of reduction.

[transmission sharpness Tc, reflection sharpness Rc (45) and reflection sharpness Rc (60)]

The transmission sharpness sum Tc utilizing following method to obtain of antiglare film of the present invention is preferably more than 375%.That is, transmission sharpness sum Tc is the method utilizing regulation in JISK7374:2007 " the asking method of plastics-image definition ", uses the light of Rack to comb the image definition measured respectively based on transmission beam method, obtains with the form of their aggregate value.Specifically, the ratio using shading light part and transmissive portions to divide is 1: 1 and 5 kinds of light that its width is 0.125mm, 0.25mm, 0.5mm, 1.0mm and 2.0mm comb the image definition measured respectively based on transmission beam method, obtains their total, is set to Tc.When the antiglare film of Tc below 375% is configured at the image display device of more fine, have the situation easily producing and dazzle the eyes.The upper limit of Tc as its maximal value less than 500% scope in select, if but this Tc is excessive, then easily become may not be good from the anti-glare in front image display device, be therefore such as preferably less than 450%, be more preferably less than 410%.

Antiglare film of the present invention with the incident light of incident angle 45 ° measure reflection sharpness Rc (45) be preferably less than 180%, be more preferably less than 160%.Reflection sharpness Rc (45) is identical with above-mentioned Tc, the method specified in JISK7374:2007 is utilized to measure, but herein, 4 kinds of light combs that its width in the middle of above-mentioned 5 kinds of light comb is 0.25mm, 0.5mm, 1.0mm and 2.0mm are used to utilize reflectometry to measure the image definition of incident angle 45 ° respectively, obtain their total, as Rc (45).5 kinds of light combs are specified as described above in JIS, use the whole of them or select width as required, and in the antiglare film specified in the present invention, the value itself employing reflection sharpness when width is the light comb of 0.125mm is little, thus error at measurment becomes large, therefore using the image definition sum using the above-mentioned 4 kinds of light comb except it to measure as reflection sharpness.If Rc (45) is less than 180%, then the image display device being configured with this antiglare film is good from anti-glare when front and oblique observation, thus preferably, if be less than 160%, then more good, thus preferably.The lower limit of Rc (45) is not particularly limited, but in order to suppress the generation of whitening, dazzling the eyes well, such as, is preferably more than 80%.

In addition, antiglare film of the present invention with the incident light of incident angle 60 ° measure reflection sharpness Rc (60) be preferably less than 240%, be more preferably less than 220%.Reflection sharpness Rc (60), except changing incident angle, utilizes the method according to JISK7374:2007 to measure with above-mentioned reflection sharpness Rc (45) in the same manner.If Rc (60) is less than 240%, then the image display device being configured with this antiglare film is good from anti-glare during oblique observation, thus preferably, if be less than 220%, then more good, thus preferably.The lower limit of Rc (60) is not particularly limited, but in order to suppress the generation of whitening, dazzling the eyes well, such as, is preferably more than 150%.

[whole manufacture methods of antiglare film]

Antiglare film of the present invention such as can manufacture as shown below.First method is following method, namely, prepare the micro concavo-convex shape die for forming being formed with the surface unevenness profile of the pattern based on regulation at profiled surface, in the shape of the male and fomale(M&F) by this mould after transparent supporting mass transfer printing, the transparent supporting mass of the shape being transferred male and fomale(M&F) is peeled off from mould.Second method is following method, that is, prepare containing particulate, adhesive resin and solvent and the composition of this microparticulate in resin solution, said composition is coated on transparent supporting mass, carry out drying as required, by solidifying containing fine-grained coated film of being formed thus.In second method, by utilizing the composition of described composition, the drying condition etc. of described coated film adjusts the state of aggregation of coating film thickness, particulate, makes particulate expose on the surface of coated film thus, transparent supporting mass formed random concavo-convex.From the production stability of antiglare film and produce reproducible viewpoint and consider, preferably utilize the first method to manufacture antiglare film of the present invention.

Herein, preferred first method of manufacture method as antiglare film of the present invention is described in detail.In order to precision excellent form the antiglare layer of the surface unevenness profile with characteristic as above, the micro concavo-convex shape die for forming prepared (below sometimes referred to as " mould ") is very important.More specifically, the pattern based on regulation forms the surface unevenness profile (hereinafter sometimes referred to as " mould convex-concave surface ") that mould has, and it is 0.075 μm that this predetermined pattern preferably uses according to the average frequency of its one dimension spectra calculation ^-1above and 0.105 μm ^-1below, standard deviation is 0.095 μm ^-1above and 0.125 μm ^-1following pattern.Herein said " pattern ", refer to the view data of the surface unevenness profile of the antiglare layer had for the formation of antiglare film, there is the mask etc. of transmittance section and light shielding part, hereinafter referred to as " pattern ".

First, the method for the pattern determining the surface unevenness profile forming the antiglare layer that antiglare film of the present invention has is described.

What the situation being such as view data for this pattern illustrated the two-dimensional power spectrum of pattern asks method.First, be after the binary image data of 2 gray scales by this image data transformation, this gray scale two-dimensional function g (x, y) is represented.The two-dimensional function g (x, y) of gained is calculated two-dimensional function G (f as shown in the formula carrying out Fourier transform shown in (1) _x, f _y), shown in (2), by the two-dimensional function G (f of gained _x, f _y) squared absolute value, obtain two-dimensional power spectrum Γ (f thus _x, f _y).Herein, x and y represents the normal coordinates in view data face.In addition, f _xand f _yrepresent the frequency in x direction and y direction respectively, there is the dimension of the inverse of length.

[several 1]

$G(f_x,f_y)=\underset{-\mathrm{\&infin;}}{\overset{\mathrm{\&infin;}}{\&Integral;}}\underset{-\mathrm{\&infin;}}{\overset{\mathrm{\&infin;}}{\&Integral;}}\&lsqb;g(x,y)-<g>\&rsqb;\exp \&lsqb;2\mathrm{\&pi;}i(f_{x}x+f_{y}y)\&rsqb;dxdy$ Formula (1)

π in formula (1) is circular constant, and i is imaginary unit, and < g > is the mean value of two-dimensional function g (x, y).

[several 2]

Γ (f _x, f _y)=| G (f _x, f _y) | ²formula (2)

Two-dimensional power spectrum Γ (the f of gained _x, f _y) represent the spatial frequency distribution of pattern.Usually, be isotropy owing to obtaining antiglare film, the pattern also isotropy of therefore antiglare film manufacture of the present invention.Thus, the two-dimensional function Γ (f of the two-dimensional power spectrum of pattern is represented _x, f _y) can represent with one-dimensional functions Γ (f) only depended on relative to the distance f of initial point (0,0).

Below, to by two-dimensional function Γ (f _x, f _y) method of obtaining one-dimensional functions Γ (f) is described.First, using the two-dimensional function Γ (f of the two-dimensional power spectrum of the gray scale as pattern _x, f _y) as shown in the formula (3) shown polar coordinate representation.

[several 3]

Γ (f _x, f _y)=Γ (fcos θ, fsin θ) ... formula (3)

Herein, θ is the drift angle in fourier space.One-dimensional functions Γ (f) can by average obtaining as shown in the formula the rotation calculating the two-dimensional function Γ (fcos θ, fsin θ) having carried out polar coordinate representation (4) Suo Shi.Below also using the two-dimensional function Γ (f of the two-dimensional power spectrum according to the gray scale as pattern _x, f _y) one-dimensional functions Γ (f) on average obtained of rotation be called One-dimensional power spectrum Γ (f).

[several 4]

$\mathrm{\&Gamma;}\left(f\right)\&equiv;\frac{1}{2\mathrm{\&pi;}}\underset{0}{\overset{2\mathrm{\&pi;}}{\&Integral;}}\mathrm{\&Gamma;}(fcos\mathrm{\&theta;},fsin\mathrm{\&theta;})d\mathrm{\&theta;}$ Formula (4)

In order to precision excellent obtain antiglare film of the present invention, the average frequency < f > preferably calculated according to the One-dimensional power of pattern spectrum is 0.075 μm ^-1above and 0.105 μm ^-1below, standard deviation _fit is 0.095 μm ^-1above and 0.125 μm ^-1below.Herein, according to average frequency < f > and the standard deviation of the One-dimensional power spectrum calculating of pattern _fdefined by following formula (5) and (6) respectively.

[several 5]

$<f>\&equiv;\frac{\underset{0}{\overset{\mathrm{\&infin;}}{\&Integral;}}f\mathrm{\&Gamma;}\left(f\right)df}{\underset{0}{\overset{\mathrm{\&infin;}}{\&Integral;}}\mathrm{\&Gamma;}\left(f\right)df}$ Formula (5)

[several 6]

${{\mathrm{\&sigma;}}_f}^2\&equiv;\frac{\underset{0}{\overset{\mathrm{\&infin;}}{\&Integral;}}{\&lsqb;f\mathrm{\&Gamma;}\left(f\right)-<f>\&rsqb;}^{2}df}{\underset{0}{\overset{\mathrm{\&infin;}}{\&Integral;}}\mathrm{\&Gamma;}\left(f\right)df}$ Formula (6)

When obtaining the two-dimensional power spectrum of pattern, the two-dimensional function g (x, y) of gray scale obtains usually used as discrete function.In this situation, as long as utilize discrete Fourier transform (DFT) to calculate two-dimensional power spectrum.The One-dimensional power spectrum of pattern is similarly obtained according to the two-dimensional power spectrum of pattern.

In addition, in order to make the surface unevenness profile of gained be evenly and continuous print curved surface, the mean value of two-dimensional function g (x, y) is preferably two-dimensional function g (x, 30 ~ 70% of the difference of the minimum value of maximal value y) and two-dimensional function g (x, y).When utilizing etching (lithography) method mfg. moulding die convex-concave surface, this two-dimensional function g (x, y) becomes the aperture opening ratio of pattern.For the situation utilizing etching method mfg. moulding die convex-concave surface, first define the aperture opening ratio of said pattern herein.Aperture opening ratio when resist used in etching method is eurymeric refers to, in the coated film of this eurymeric resist during delineate, the region be exposed is relative to the ratio in all surfaces region of this coated film.On the other hand, aperture opening ratio when resist used in etching method is minus refers to, in the coated film of this negative resist during delineate, the region be not exposed is relative to the ratio in all surfaces region of this coated film.Aperture opening ratio when etching method is disposable exposure refers to the ratio of the transmittance section of the mask with transmittance section and light shielding part.

Antiglare film of the present invention can by the average frequency < f > of the One-dimensional power spectrum calculating according to pattern and standard deviation _fbe set to described scope respectively, the mould needed for manufacture, use this mould to utilize the manufacture of described first party method.

In order to make the pattern of the One-dimensional power spectrum with this kind of strength ratio, make collocation point and the pattern made or there is the pattern (pre-pattern) utilizing random number or determined deep or light random Luminance Distribution by the pseudo random number of Practical computer teaching randomly in advance, from this pre-pattern, remove the composition of specific spatial frequency range.Composition for this specific spatial frequency range removes, as long as make described pre-pattern pass through from bandpass filter.

In order to manufacture the antiglare film of the antiglare layer with the surface unevenness profile be formed with based on predetermined pattern, manufacturing and there is the mould of the surface unevenness profile for being formed based on this predetermined pattern to the convex-concave surface of transparent supporting mass transfer printing.Described first method of this mould is used to be the Decal making antiglare layer on transparent supporting mass.

If classified further to this Decal, then there are the light Decal using light-cured resin, the thermo printing method etc. using thermoplastic resin.Wherein, from the viewpoint of throughput rate, preferred light Decal.

Light Decal is following method, namely, on transparent supporting mass, (surface of transparent supporting mass) forms light-cured resin layer, by convex-concave surface from this light-cured resin layer to mould pushing while make it solidification, thus by the shape of the convex-concave surface of mould to the transfer printing of light-cured resin layer.Specifically, light-cured resin is coated with on transparent supporting mass, under the state making the convex-concave surface of formed light-cured resin layer and mould closely sealed, light (this light uses the light that light-cured resin can be solidified) is irradiated from transparent supporting side, light-cured resin layer is solidified, thereafter, the transparent supporting mass being formed with the cured layer of light-cured resin is peeled off from mould.In the antiglare film utilizing this kind of method to obtain, the cured layer of light-cured resin becomes antiglare layer.And if from the easness manufactured, as the preferred uv curing resin of light-cured resin, when using this uv curing resin, the light irradiated uses ultraviolet.To the Decal of uv curing resin be used to be called " UV Decal " as light-cured resin below.In order to the antiglare film having manufactured integrated with polarizing coating, use polarizing coating as transparent supporting mass, as long as in Decal illustrated herein, transparent supporting mass is replaced into polarizing coating and implements.

The kind of uv curing resin used in UV Decal is not particularly limited, and in the middle of commercially available resin, can use appropriate resin according to the kind of transparent supporting mass used, ultraviolet kind.Said uv curing resin comprises the concept utilizing Ultraviolet radiation to carry out photopolymerisable monomer (polyfunctional monomer), oligomer and polymkeric substance and their potpourri herein.In addition, also can use following resin, that is, combinationally use the light trigger suitably selected according to the kind of uv curing resin, even utilize the longer visible ray of wavelength ratio ultraviolet also can solidify thus.The suitable example etc. of this uv curing resin is described below.

As transparent supporting mass used in UV Decal, such as, glass, plastic foil etc. can be enumerated.As long as plastic foil has the appropriate transparency and physical strength just can use.Specifically, such as cellulose ethanoate system resins such as comprising triacetyl cellulose can be enumerated; Acrylic resin; Polycarbonate-based resin; The polyester based resins such as polyethylene terephthalate; The transparent resin film of the polyolefin-based resins such as tygon, polypropylene etc.These transparent resin films both can be solvent cast films, also can be extruded films.

The thickness of transparent supporting mass is such as 10 ~ 500 μm, is preferably 10 ~ 100 μm, is more preferably 10 ~ 60 μm.If the thickness of transparent supporting mass is this scope, be then in the trend easily obtaining and have the antiglare film of enough physical strengths, the image display device possessing this antiglare film is difficult to generation more dazzles the eyes.

On the other hand, thermo printing method is following method, that is, push, by the surface unevenness profile of this mould to transparent resin film transfer printing the transparent resin film formed by thermoplastic resin heating being made it the convex-concave surface to mould under softening state.As long as transparent resin film used in thermo printing method is also be substantially optically transparent film, then at all events plant film can, specifically, as transparent resin film used in UV Decal, can enumerate at illustrative film above.

[manufacture method of mould]

Next, the method manufacturing mould used in Decal is described.For the manufacture method of mould, as long as the forming face of this mould is can by the scope of the above-mentioned surface unevenness profile formed based on predetermined pattern to transfer printing on transparent supporting mass (can form the antiglare layer of the surface unevenness profile formed based on predetermined pattern), just be not particularly limited, but manufacture the antiglare layer of this surface unevenness profile well, preferred etching method in order to the excellent and reappearance of precision.In addition, this etching method preferably comprises (1) first plating process, (2) first grinding steps, (3) photosensitive resin film formation process, (4) exposure process, (5) developing procedure, (6) first etching work procedures, (7) photosensitive resin film stripping process, (8) second etching work procedures, (9) second plating process and (10) diaphragm formation process successively.

Fig. 4 is the figure of a preferred example of the first half (before the developing procedure of above-mentioned (5)) of the manufacture method schematically showing mould.In this figure, schematically show the cross section of the mould in each operation.Below, with reference to while Fig. 4, each operation of the manufacture method of the mould of antiglare film manufacture is described in detail.

(1) first plating process

First, prepare base material (mould base material) used in Making mold, copper facing is implemented to the surface of this mould base material.By implementing copper facing to the surface of mould base material like this, adaptation, the glossiness of the nickel plating in the second plating process described later just can be improved.Copper facing due to high, the other smoothing effect of coating property strong, therefore the landfills such as small concavo-convex, the space of mould base material can be formed the smooth and glossiness surface of tool.Thus, by implementing copper facing to mould substrate surface like this, after just can implementing nickel plating in the second plating process described later, eliminate the rough surface likely produced because of small concavo-convex, the space be present in base material.Thus can be formed after based on the surface unevenness profile (micro concavo-convex surface configuration) of predetermined pattern in mould base material forming face, prevent the skew caused by the impact on substrate (mould base material) surfaces such as small concavo-convex, space fully.

Copper used in the copper facing of the first plating process both can be the simple metal of copper, also can be the alloy (aldary) using copper as major component.Thus, " copper " used in copper facing is the concept comprising Copper and its alloy.Copper facing both can be plating, also can be electroless coating, but in the copper facing of the first plating process, preferably use plating.In addition, the preferred coating in the first plating process can be not only the coating comprising copper plate, also can be the coating be laminated with the coating of the metal comprised beyond copper by copper plate.

If the coating implemented copper facing to the surface of mould base material and formed is too thin, then can not get rid of the impact (small concavo-convex or space, crackle etc.) of substrate surface completely, therefore its thickness is preferably more than 50 μm.The upper limit of thickness of coating does not have the limit, but in the situations such as consideration cost, is preferably less than about 500 μm.

Mould base material is metal material, however from the viewpoint of cost, as the material of this metal material, preferred aluminium, iron etc.If considered from the convenience of the disposal of mould base material in addition, then particularly preferably comprise the base material of the aluminium of lightweight as mould base material.And said aluminium, iron do not need to be respectively simple metal yet herein, it also can be the alloy that is major component with aluminium or iron.

As long as the shape of mould base material and the manufacture method of antiglare film are appropriate shape accordingly.Specifically, can select from the base material of flat base material, cylindric or cylindric (roll shape) etc.When manufacturing antiglare film continuously, mould is preferably roll shape.This kind of mould is manufactured by the mould base material of roll shape.

(2) first grinding steps

In ensuing first grinding step, the surface (coating) implementing copper-plated mould base material in the first above-mentioned plating process is ground.In the manufacture of mould used in the manufacture of antiglare film, preferably through this first grinding step, mould substrate surface is ground to the state close to minute surface.In order to the commercially available product of the flat plate-like substrate used as mould base material, roll shape base material is made required precision, often implement the machinings such as cutting, grinding, fine processing seam can be had at remained on surface thus.For this reason, even if utilize the first plating process to form copper plate, the situation of residual above-mentioned processing seam is also had.In addition, even if implement copper facing in the first plating process, the surface of mould base material is also not necessarily completely level and smooth.Namely, even if the operation of (3) described later ~ (10) implemented by the mould base material this kind to the surface remaining dark processing seam etc., sometimes the concaveconvex shape of the die surface of gained also can be different from the shape based on predetermined pattern, or comprise come from processing seam etc. concavo-convex.When using the Making mold antiglare film of the impact remaining processing seam etc., the optical characteristics such as required anti-glare cannot be shown fully, likely bring the impact that cannot expect.

The Ginding process applied in first grinding step is not particularly limited, and can select the method for answering with the shape and character pair that become the mould base material grinding object.If illustrate the Ginding process that can be applied in the first grinding step particularly, then can enumerate mechanical milling method, electrolytic polishing method, chemical grinding method etc.In the middle of them, as mechanical milling method, any one of superfinishing method, polishing, fluid polishing, polishing (buff) polishing etc. can be used.In addition, also by using cutting tool to carry out mirror-finish cutting in grinding step, and minute surface can be made in the surface of mould base material.Cutting tool in this situation according to the material of mould base material (kind of metal material), can use superhard cutter, CBN cutter, sintex, diamond cutter etc., but preferably uses diamond cutter from the viewpoint of machining precision.Surfaceness after grinding is to represent according to the center line average roughness Ra of JISB0601:2013 " geometrical property specification (the GPS)-surface texture of product: contour curve mode-term, definition and surface texture parameter ", be preferably less than 0.1 μm, be more preferably less than 0.05 μm.If the center line average roughness Ra after grinding is greater than 0.1 μm, then likely in the impact of the convex-concave surface remaining surface roughness of the mould finally obtained.In addition, the lower limit of center line average roughness Ra is not particularly limited, as long as determine lower limit from the viewpoint of the process time (milling time) in the first grinding step, processing cost.

(3) photosensitive resin film formation process

Next, for photosensitive resin film formation process, be described with reference to Fig. 4.The surface that Fig. 4 (a) indicates mould base material 40 becomes the state in the plating face 41 be polished after the first plating process above and the first grinding step.In photosensitive resin film formation process, on the plating face 41 be polished of the mould base material 40 utilizing the first above-mentioned grinding step to obtain, photoresist is dissolved in the solution (photoresist solution) obtained in solvent by coating, carry out heating, dry, form photosensitive resin film (resist film) thus.In Fig. 4 (b), schematically show the state forming photosensitive resin film 50 on the plating face 41 be polished of mould base material 40.

Known resin can be used as photoresist, the resin that also can directly be used as resist commercially to sell in addition, can also be utilized as required to filter and wait rear use of purifying.Such as; as the photoresist of minus there is photographic department dividing the character that solidification occurs, the monomer of (methyl) acrylate in the molecule with acryloyl group or methacryl or the potpourri, polyvinyl cinnamate based compound etc. of prepolymer, two-fold nitrogen and diene rubber can be used.In addition, utilizing development by the photoresist of photosensitive part stripping, the only eurymeric of the character of residual not photosensitive part as having, phenolics system, novolac resin system etc. can be used.The photoresist of this kind of eurymeric or minus also easily can obtain as eurymeric resist, negative resist from the market.In addition, photoresist solution also can coordinate the various adjuvants such as sensitizer, development accelerant, adaptation modifier, coating modifying agent as required, and the solution that also can obtain mixing this kind of adjuvant in commercially available resist uses as photoresist solution.

In order to these photoresist solution are coated on the plating face 41 be polished of mould base material 40, the photoresist solution that preferred use obtains as follows, namely, select at the solvent forming the best in level and smooth photosensitive resin film, in this solvent, dissolve photoresist and dilute and obtain.This kind of solvent can be selected according to the kind of photoresist and dissolubility thereof.Specifically, such as select from cellosolve series solvent, propylene glycol series solvent, ester series solvent, alcohol series solvent, ketone series solvent, high polar solvent etc.When using commercially available resist, also according to the kind of solvent contained in this resist, or suitable preliminary experiment can be carried out, selecting best resist, use as photoresist solution.

On the plating face 41 be polished of mould base material, the method for photosensitive resin coating solution can be coated with from meniscus, jetting type coating, dip-coating, rotary coating, roller coat, in the middle of known method such as line rod coating, airblade coating, scraper plate coating, curtain-type coating, ring-type coating etc., to select accordingly with the shape etc. of this mould base material.The thickness of the photosensitive resin film after coating is preferably set to the scope of 1 ~ 10 μm after the drying, is more preferably set to the scope of 6 ~ 9 μm.

(4) exposure process

Ensuing exposure process is by the operation of this pattern to photosensitive resin film 50 transfer printing by exposing required pattern to the photosensitive resin film 50 formed in above-mentioned photosensitive resin film formation process.As long as the wavelength photoreceptor of photoresist contained in light source used in exposure process and photosensitive resin film, sensitivity etc. are appropriately selected matchingly, such as can use the g ray (wavelength: 436nm) of high-pressure sodium lamp, h ray (wavelength: 405nm) or i ray (wavelength: 365nm), semiconductor laser (wavelength: 830nm, 532nm, 488nm, 405nm etc.), YAG laser (wavelength: 1064nm), KrF excimer laser (wavelength: 248nm), ArF excimer laser (wavelength: 193nm), F2 excimer laser (wavelength: 157nm) etc.Exposure mode both can be the mode using the mask corresponding with required pattern to carry out disposable exposure, also can be description mode.Pattern needed for what is called, as shown in illustrating, is the average frequency < f > and standard deviation that calculate according to the One-dimensional power spectrum of pattern _fbe set as the pattern of the preferred scope of regulation respectively.

In the manufacture of mould, in order to precision excellent form the surface unevenness profile of this mould, preferably expose with the state that required pattern is critically controlled on photosensitive resin film 50.In order to expose under this kind of state, preferably make required pattern in the form of image data on computers, utilize the laser sent from the laser head be computer controlled to describe (laser description) pattern based on this view data at photosensitive resin film.In laser is described, such as, can use device general in galley making etc.As the commercially available product of this kind of laser drawing apparatus, such as, can enumerate LaserStreamFX ((strain) ThinkLaboratory system) etc.

Fig. 4 (c) schematically shows the state of pattern exposure the photosensitive resin film 50 in identical (b).Containing (specifically employing the situation of negative resist as photoresist solution) when the photoresist of minus in photosensitive resin film 50, the region 51 be exposed accepts exposure energy and advances the cross-linking reaction of photoresist, reduces relative to the dissolubility of developer solution described later.Thus, the region 52 be not exposed is dissolved in developer solution in developing procedure, and the region 51 be only exposed residues on substrate surface, becomes mask 60 (with reference to Fig. 4 (d)).On the other hand, containing (specifically employing the situation of eurymeric resist as photoresist solution) when the photoresist of eurymeric in photosensitive resin film 50, the region 51 be exposed accept exposure energy and by photoresist in conjunction with cut-out etc., thus to be easily dissolved in developer solution described later.Thus, the region 51 be exposed is dissolved in developer solution in developing procedure, and the region 52 be not only exposed residues on substrate surface, becomes mask 60 (with reference to Fig. 4 (e)).

(5) developing procedure

In developing procedure, when containing the photoresist of minus in photosensitive resin film 50, the region 52 be not exposed is dissolved in developer solution, and the region 51 be exposed residues on mould base material, becomes mask 60.On the other hand, when containing the photoresist of eurymeric in photosensitive resin film 50, the region 51 be exposed is dissolved in developer solution, and the region 52 be not exposed residues on mould base material, becomes mask 60.Define the mould base material of the pattern of regulation with the form of photosensitive resin film in the first etching work procedure described later, the photosensitive resin film residued on mould base material plays a role as mask.

For developer solution used in developing procedure, in the middle of known developer solution, suitable developer solution can be selected accordingly with the kind of photoresist used.This developer solution such as can enumerate the inorganic base of NaOH, potassium hydroxide, sodium carbonate, sodium silicate, sodium metasilicate, ammoniacal liquor and so on; The primary amine class of ethamine, n-propylamine and so on; The secondary amine class of diethylamine, di-n-butylamine and so on; The tertiary amines of triethylamine, methyl-diethyl-amine and so on; The alcamines of dimethylethanolamine, triethanolamine and so on; The quarternary ammonium salt compound of Tetramethylammonium hydroxide, tetraethyl ammonium hydroxide, trimethyl hydroxyethylammoniumhydroxide hydroxide and so on; Be dissolved with the alkaline aqueous solution of the cyclic amine of pyrroles, piperidines and so on etc.; The organic solvent etc. of dimethylbenzene, toluene and so on.

Developing method in developing procedure is not particularly limited, immersion development, spray development, fur brush development, supersonic wave development etc. can be used.

Fig. 4 (d) schematically shows and uses the resin of minus to carry out the state after developing procedure as photoresist.The region 52 be not exposed in Fig. 4 (c) is dissolved in developer solution, and the region 51 be only exposed residues in substrate surface, and the photosensitive resin film in this region becomes the mask 60 in Fig. 4 (d).Fig. 4 (e) schematically shows and uses the resin of eurymeric to carry out the state after developing procedure as photoresist.The region 51 be exposed in Fig. 4 (c) is dissolved in developer solution, and the region 52 be not only exposed residues in substrate surface, and the photosensitive resin film in this region becomes the mask 60 in Fig. 4 (e).

(6) first etching work procedures

First etching work procedure is following operation, that is, to residue in the photosensitive resin film of mould substrate surface as mask after above-mentioned developing procedure, in the middle of mould substrate surface, main etch is in the coating in the region not having mask.

Fig. 5 is the figure of a preferred example of the latter half (after first etching work procedure of above-mentioned (6)) of the manufacture method schematically showing mould.Fig. 5 (a) schematically shows the state after utilizing etching work procedure main etch not have the coating in the region of mask.The coating of the bottom of mask 60 is not etched because photosensitive resin film plays a role as mask 60, but along with the carrying out etched, never the etching in the region 45 of mask advances gradually.Thus, near the border in region 45 having the region of mask 60 and do not have a mask, the coating being in the bottom of mask 60 is also etched.For like this have the region of mask 60 and do not have mask region 45 border near the coating also etched situation of bottom of mask 60, be called lateral erosion.

Etch processes in first etching work procedure is normally by using iron chloride (FeCl ₃) aqueous solution, cupric chloride (CuCl ₂) aqueous solution, alkali etching liquid (Cu (NH ₃) ₄cl ₂) etc. etching solution, make in the middle of mould substrate surface mainly not having the coating in the region of mask 60 (metal surface) corrode and carry out.In this etch processes, also the strong acid such as hydrochloric acid, sulfuric acid can being used as etching solution, when utilizing plating to carry out the first plating process, also can adopting the inverse electrolytic etching undertaken by applying the current potential contrary with during plating.The surface unevenness profile on mould base material is formed at different according to the kind of the etch processes in the constituent material (metal material) of mould base material or the kind of coating, the kind of photosensitive resin film and etching work procedure etc. by implementing etch processes, therefore cannot treat different things as the same, but when etch quantity is below 10 μm, roughly isotropically etch from the mould substrate surface contacted with etching solution.Said etch quantity is herein by the thickness of coating reamed by etching.

Etch quantity in first etching work procedure is preferably 1 ~ 20 μm, is more preferably 1 ~ 8 μm, more preferably 3 ~ 5 μm.When etch quantity is less than 1 μm, mould almost cannot form surface unevenness profile, have the surface of general planar, even if therefore use this Making mold antiglare film, also can be the antiglare film substantially without surface unevenness profile.Be configured with in the image display device of this kind of antiglare film, enough anti-glares can not be demonstrated.In addition, when etch quantity is excessive, the convex-concave surface of the mould finally obtained easily has large difference of height.When the antiglare film of planting Making mold is thus applied to image display device, have the situation that cannot prevent the generation of whitening fully.Etching work procedure both can utilize the etch processes of 1 time to carry out, and also can be divided into and carry out etch processes with Shangdi 2 times.This is in and is divided into when carrying out etch processes with Shangdi 2 times, and what preferably make the etch quantity of the etch processes of more than 2 times adds up to 1 ~ 20 μm.

(7) photosensitive resin film stripping process

Ensuing photosensitive resin film stripping process is the operation removing the photosensitive resin film on mould base material that plays a role as mask 60 in the first etching work procedure, residues in, in this operation, preferably the photosensitive resin film residued on mould base material is removed completely.In photosensitive resin film stripping process, stripper is preferably used to dissolve photosensitive resin film.As stripper, rear use such as its concentration, pH etc. can be changed to as the illustrative solution of developer solution.Or, also can using the solution identical with developer solution used in developing procedure, peeling off photosensitive resin film by changing temperature, dip time etc. relative to developing procedure.In photosensitive resin film stripping process, the contact method (stripping means) of stripper and mould base material is not particularly limited, and can use dipping and stripping, spraying stripping, hairbrush stripping, ultrasound wave stripping etc.

Fig. 5 (b) schematically shows the state that the photosensitive resin film used as mask 60 in the first etching work procedure is dissolved completely, removed in photosensitive resin film stripping process.By based on the mask 60 of photosensitive resin film and etch processes, form first surface concaveconvex shape 46 on the surface of mould base material.

(8) second etching work procedures

Second etching work procedure is the operation for first surface concaveconvex shape 46 rust utilizing further etch processes (the second etch processes) to make to be formed in the first etching work procedure.Utilize this second etch processes, the partial disappearance (will the situation of the part rust that surface inclination is precipitous in the middle of surface unevenness profile being made like this to be called " shape passivation " below) that the surface in the first surface concaveconvex shape 46 formed in the first etch processes tilts precipitous.In Fig. 5 (c), indicate to make by utilizing the second etch processes to make the first surface concaveconvex shape 46 of mould base material 40 that shape passivation occur surface tilt precipitous part rust, form the state with the second surface concaveconvex shape 47 that mild surface tilts.The second etch processes is utilized to carry out shape passivation like this and the mould obtained has the effect making to use the optical characteristics of the antiglare film of this Making mold to be more preferably.

In the second etching work procedure, also can use the etch processes utilizing the etching solution identical with the first etching work procedure, inverse electrolytic etching.The degree of the shape passivation after the second etch processes disappearance degree of precipitous part (surface in the surface unevenness profile after the first etching work procedure tilt) according to the material of mould base material, the method for the second etch processes and utilize the first etching work procedure to obtain surface unevenness profile in concavo-convex size and the degree of depth etc. and different, therefore cannot treat different things as the same, but be the etch quantity in the second etch processes in the maximum factor in rust degree (degree of shape passivation) that controls.Said etch quantity is also identical with the situation of the first etching work procedure herein, and the thickness of the base material reamed to utilize the second etch processes represents.If the etch quantity of the second etch processes is little, then the effect of the shape passivation of the surface unevenness profile utilizing the first etching work procedure to obtain becomes insufficient.Thus, the antiglare film of the insufficient Making mold of shape passivation is used to have the situation that whiting occurs.On the other hand, if the etch quantity in the second etch processes is excessive, then the surface unevenness profile sometimes utilizing the first etching work procedure to be formed disappears substantially, becomes the mould on the surface with general planar.This kind is used to have the frequent anti-glare of antiglare film of the Making mold on the surface of general planar insufficient.Thus, the etch quantity in the second etch processes is preferably in the scope of 1 ~ 50 μm, is more preferably in the scope of 2 ~ 16 μm, is especially preferably in the scope of 6 ~ 10 μm.Second etching work procedure is also identical with the first etching work procedure, both can utilize the etch processes of 1 time to carry out, and also can be divided into and carry out etch processes with Shangdi 2 times.When being divided into 2 times to carry out etch processes with Shangdi, preferably make the scope adding up to 1 ~ 50 μm of the etch quantity of the etch processes of more than 2 times.

(9) second plating process

In second plating process, to through the mould base material of described (6) first etching work procedures and (7) photosensitive resin film stripping process, the preferred surface also passing through the mould base material of described (8) second etching work procedures, implement plating (being preferably gloss nickel plating described later).By carrying out the second plating process, just can make surface unevenness profile 47 rust further of mould base material, and this plating can be utilized to protect die surface.Fig. 5 (d) indicates and on the second surface concaveconvex shape 47 utilizing the second etch processes to be formed, forms nickel coating 71 as described above, and makes the passivation of concave-convex surface generation shape, becomes the state of final mould convex-concave surface 70.

The coating formed in second plating process is preferably set to has gloss and the also excellent nickel plating of corrosion resistance.In the middle of nickel plating, nickel plating that be particularly preferably referred to as gloss nickel plating etc., that show good gloss.Nickel plating both can utilize plating to carry out, and also can utilize electroless coating to carry out.When adopting plating, as its plating bath, preferably use containing nickelous sulfate, nickel chloride and boron aqueous acid.By regulating current density and electrolysis time, the thickness of nickel coating can be controlled.When adopting electroless coating, as its plating bath, preferred use contains nickel salt (nickelous sulfate, nickel chloride, nickelous carbonate, nickel acetate, nickel sulfamic acid, nickelous hypophosphite etc.), reductive agent (hypophosphorous acid, sodium hypophosphite, potassium hypophosphite, nickelous hypophosphite, calcium hypophosphite, dimethylamino boron, diethylamino boron, boron hydroxide sodium etc.), complexing agent (the amines class such as ethylenediamine, glycollic acid, lactic acid, gluconic acid, the monocarboxylic acid classes such as propionic acid, tartrate, malic acid, succinic acid, the omega-dicarboxylic acids such as malonic acid, the tricarboxylic acids such as citric acid, or the sodium salt of these carboxylic acidss, sylvite, the metal carboxylates such as ammonium salt), stabilizing agent (Pb, Bi, Tl, In, the heavy metal system stabilizing agents such as Sn, the organic system stabilizing agents such as propargyl ethanol, sulfide compound, thiocyanation compound, thionic acid, thion hydrochlorate) etc. aqueous solution.By regulating concentration or temperature, the processing time etc. of plating solution, the thickness of nickel coating can be controlled.

By implementing nickel plating to the concaveconvex shape being in the mould substrate surface after the second etch processes, and obtain realizing further shape passivation and the mould that improves of skin hardness.Control shape passivation now degree in maximum factor be the thickness of nickel coating.If nickel coating is thin, then the degree of shape passivation is insufficient, and the antiglare film that kind mould obtains thus has ratio R (40)/R (30) situation more than 0.0025 of its reflectivity R (30) and reflectivity R (40).On the other hand, if nickel coating is blocked up, then luminance factor R (40)/R (30) is through being everlasting less than 0.00001.In order to make the generation preventing from fully whitening, the antiglare film that can provide the image display device with excellent anti-glare, find that effective way makes the thickness of nickel coating carry out mfg. moulding die for the mode of the scope of regulation.That is, the thickness of nickel coating is preferably in the scope of 2 ~ 12 μm, is more preferably in the scope of 5 ~ 10 μm.

(10) diaphragm formation process

The last stage of Making mold is the diaphragm formation process forming diaphragm on the surface (nickel coating) utilizing the second above-mentioned plating process to implement the mould base material of nickel plating.Although nickel plating has gloss, excellent corrosion resistance, but hardness is abundant not, if therefore continue to manufacture antiglare film like this, then likely wear and tear or damage in surface.Thus, preferably arrange diaphragm formation process, in nickel plating, formation hardness is high and friction factor is little, can give the diaphragm of good release property.

As the preferred carbon film of the tunicle formed in diaphragm formation process, such as, can enumerate diamond film, diamond-like carbon film, Hydrogenated amorphous carbon film (also diamond-like carbon film being called DLC film briefly) etc.Various vapour deposition method is used in the formation of this carbon film, such as diamond thin utilizes the formation such as microwave plasma CVD technique, filament CVD, Plasma Jet method, ecr plasma CVD, and diamond-like carbon film and DLC film utilize the formation such as plasma CVD method, ion beam sputtering, ion-beam evaporation, plasma sputtering in addition.When these carbon films are formed, by combinationally using the IBM (Ion Mixing) side by side injecting the ion of at least one being selected from inert gas, nitrogen and carbon with film forming or the PBII (Plasma based ion implantation) applying pulsed bias to injected mould base material and carry out, interface clearly would not be had between film and mould base material, can adaptation be improved.The thickness of these carbon films is preferably in the scope of 0.1 ~ 5 μm, is more preferably in the scope of 0.5 ~ 3 μm.If carbon is lepthymenia, then likely become insufficient as the permanance of mould.On the other hand, if carbon film is blocked up, then productivity is deteriorated, therefore not ideal enough.

[employing the manufacture of the antiglare film of mould]

Below, be described as the preferred described smooth Decal of method for the manufacture of antiglare film of the present invention.As already described, as light Decal particularly preferably UV Decal, and herein for using the Decal of active energy ray-curable resin to be specifically described.

When utilizing light Decal to manufacture antiglare film continuously, preferably possess the painting process of at least (P1) in the middle of following each operation and the main curing process of (P3) successively.In addition, the precuring operation of (P2) more preferably between two operations, is possessed.

(P1) to formed by the coating fluid of coating on the transparent supporting mass that transports continuously containing active energy ray-curable resin coating layer painting process,

(P2) to two of the Width of the coating layer formed in painting process end regions irradiate active energy beams precuring operation and

(P3) irradiates the main curing process of active energy beam under the state on the surface of the surperficial pushing against mold to coating layer from transparent supporting side.

Below, with reference to while accompanying drawing, each operation is being described in detail.Fig. 6 is the figure schematically showing the configuration being applicable to the device used when manufacturing antiglare film continuously.In Fig. 6, straight arrows represents the conveyance direction of film, and curve arrow represents the sense of rotation of roller.

(P1) painting process

In painting process, on transparent supporting mass, coating contains the coating fluid of active energy ray-curable resin and forms coating layer.Painting process such as shown in Figure 6, to the transparent supporting mass 81 of debatching from outlet roller 80, is coated with the coating fluid containing active energy ray-curable resin in applying area 83.

Coating fluid such as can utilize the painting of gravure coating process, micro gravure coating method, stick coating method (rodcoating), scraper for coating method, air knife coating method, kiss method, mould Tu Fa etc. to carry out to the coating on transparent supporting mass 81.

(transparent supporting mass)

Such as, as long as the material of transparent supporting mass 81 light transmission, can use glass, plastic foil etc.As long as plastic foil has the transparency and the physical strength of appropriateness.Specifically, before can use as the illustrative material of transparent supporting mass used in UV Decal, in addition in order to utilize light Decal to manufacture antiglare film continuously, select the material of flexibility with appropriateness.

Also for improveing coating, improveing the object of the cementability of transparent supporting mass and coating layer, various surface treatment can be implemented to the surface (being coated with the surface of coating fluid) of transparent supporting mass 81.As surface treatment, Corona discharge Treatment, glow discharge process, acid surfaces process, alkali surface treatment, Ultraviolet radiation process etc. can be enumerated.In addition also can on transparent supporting mass 81, such as form other the layer such as undercoat, applied coating solution on these other layer.

In addition, when to make antiglare film and polarizing coating fit and make for the purpose of anti-dazzling polarizing plate, in order to improve the cementability of transparent supporting mass and polarizing coating, preferably various surface treatment is utilized to carry out hydrophiling in advance by the surface of transparent supporting mass (with the surface of opposition side, face being coated with coating fluid).This surface treatment also can be carried out after the manufacture of antiglare film.

(coating fluid)

Coating fluid contains active energy ray-curable resin, usually also containing Photoepolymerizationinitiater initiater (radical polymerization initiator).As required, also the various adjuvants such as light transmission particulate, organic solvent equal solvent, levelling agent, spreading agent, antistatic agent, anti fouling agent, surfactant can be contained.

(1) active energy ray-curable resin

As active energy ray-curable resin, such as, preferably can use the resin containing multifunctional (methyl) acrylate compounds.So-called multifunctional (methyl) acrylate compounds is the compound in the molecule with at least 2 (methyl) acryloxies.If enumerate the concrete example of multifunctional (methyl) acrylate compounds, then there are polyvalent alcohol and (methyl) acrylic acid ester compounds, carbamate (methyl) acrylate compounds, polyester (methyl) acrylate compounds, epoxy (methyl) acrylate compounds etc.

Polyvalent alcohol used in formation as above-mentioned ester compounds, such as can enumerate ethylene glycol, diethylene glycol, triethylene glycol, TEG, polyglycol, propylene glycol, dipropylene glycol, tripropylene glycol, four propylene glycol, polypropylene glycol, propylene glycol, butylene glycol, pentanediol, hexanediol, neopentyl glycol, 2-ethyl-1,3-hexanediol, 2, the alcohol of 2 yuan of 2 '-thiodiethanol, 1,4-CHDM and so on; The alcohol of more than 3 yuan of trimethylolpropane, glycerine, pentaerythrite, diglycerol, dipentaerythritol, double trimethylolpropane and so on.

As polyvalent alcohol and (methyl) acrylic acid ester compounds, specifically, ethylene glycol bisthioglycolate (methyl) acrylate can be enumerated, diethylene glycol two (methyl) acrylate, 1, 6-hexanediol two (methyl) acrylate, neopentyl glycol two (methyl) acrylate, trimethylolpropane tris (methyl) acrylate, glycerine three (methyl) acrylate, five glycerine three (methyl) acrylate, pentaerythrite three (methyl) acrylate, pentaerythrite four (methyl) acrylate, dipentaerythritol three (methyl) acrylate, dipentaerythritol four (methyl) acrylate, dipentaerythritol five (methyl) acrylate, dipentaerythritol six (methyl) acrylate etc.

Carbamate (methyl) acrylate compounds can be have in 1 molecule multiple isocyanato (-N=C=O) polyisocyanate, with the urethane reaction product of (methyl) acrylic acid derivative with hydroxyl.As the polyisocyanate in 1 molecule with multiple isocyanato, can enumerate hexamethylene diisocyanate, isophorone diisocyanate, toluene diisocyanate, naphthalene diisocyanate, methyl diphenylene diisocyanate, Xylene Diisocyanate, dicyclohexyl methyl hydride diisocyanate etc. have in 1 molecule 2 isocyanato diisocyanate, isocyanurate-modified, addition modification or the biuret modified triisocyanate etc. in 1 molecule with 3 isocyanato are carried out to these diisocyanate.As (methyl) acrylic acid derivative with hydroxyl, (methyl) acrylic acid 2-hydroxy methacrylate, (methyl) acrylic acid 2-hydroxy propyl ester, (methyl) acrylic acid 4-hydroxybutyl, (methyl) acrylic acid 2-hydroxybutyl, 2-hydroxyl-3-phenoxy propyl (methyl) acrylate, pentaerythrite three (methyl) acrylate etc. can be enumerated.

It is the compound polyester containing hydroxyl and (methyl) acrylic acid being reacted and obtains as the preferred compound of polyester (methyl) acrylate compounds.Preferred use be the compound utilizing polyvalent alcohol, obtain with the esterification of carboxylic acid or the compound and/or its acid anhydrides with multiple carboxyl containing the polyester of hydroxyl.As polyvalent alcohol, the compound same with aforesaid Compound Phase can be exemplified.In addition, beyond polyvalent alcohol, the polyatomic phenols such as bisphenol-A can also be used.As carboxylic acid, formic acid, acetic acid, butyl carboxylic acid, benzoic acid etc. can be enumerated.As compound and/or its acid anhydrides with multiple carboxyl, maleic acid, phthalic acid, fumaric acid, itaconic acid, hexane diacid, terephthalic acid (TPA), maleic anhydride, phthalic anhydride, trimellitic acid, cyclohexane cyclohexanedimethanodibasic acid anhydride etc. can be enumerated.

In the middle of multifunctional (methyl) acrylate compounds as above, from the viewpoint of the raising intensity of its solidfied material, the easiness of acquisition, the ester compounds such as preferred hexanediol two (methyl) acrylate, neopentyl glycol two (methyl) acrylate, diethylene glycol two (methyl) acrylate, tripropylene glycol two (methyl) acrylate, trimethylolpropane tris (methyl) acrylate, pentaerythrite three (methyl) acrylate, dipentaerythritol six (methyl) acrylate, the addition product of hexamethylene diisocyanate and (methyl) acrylic acid 2-hydroxy methacrylate, the addition product of isophorone diisocyanate and (methyl) acrylic acid 2-hydroxy methacrylate, the addition product of toluene diisocyanate and (methyl) acrylic acid 2-hydroxy methacrylate, the addition product of addition modification isophorone diisocyanate and (methyl) acrylic acid 2-hydroxy methacrylate, carbamate (methyl) acrylate compounds such as the addition product of biuret modified isophorone diisocyanate and (methyl) acrylic acid 2-hydroxy methacrylate.These multifunctional (methyl) acrylate compounds may be used alone, or combinationally use two or more.

Active energy ray-curable resin also except above-mentioned multifunctional (methyl) acrylate compounds, can also contain the monofunctional compound only in 1 molecule with 1 polymerism carbon-to-carbon double bond.Simple function (methyl) acrylate compounds is the representational compound of monofunctional compound, if will enumerate concrete example, then has (methyl) methyl acrylate, (methyl) ethyl acrylate, (methyl) butyl acrylate, (methyl) isobutyl acrylate, (methyl) tert-butyl acrylate, (methyl) acrylic acid 2-hydroxy methacrylate, (methyl) acrylic acid 2-hydroxy propyl ester, (methyl) acrylic acid 4-hydroxybutyl, (methyl) acrylic acid 2-hydroxybutyl, 2-hydroxyl-3-phenoxy propyl (methyl) acrylate, (methyl) 2-EHA, (methyl) acrylic acid 2-ethoxy ethyl ester, (methyl) acrylic acid 3-methoxybutyl, (methyl) cyclohexyl acrylate, (methyl) isobornyl acrylate, (methyl) benzyl acrylate, (methyl) glycidyl acrylate, (methyl) acrylic acid tetrahydro furfuryl ester, (methyl) acrylic acid ethyl carbitol ester, (methyl) acrylate, ethylene-oxide-modified phenoxy group (methyl) acrylate, epoxy pronane modification phenoxy group (methyl) acrylate, nonyl phenol (methyl) acrylate, ethylene-oxide-modified nonyl phenol (methyl) acrylate, epoxy pronane modification nonyl phenol (methyl) acrylate, methoxyl diethylene glycol (methyl) acrylate, 2-(methyl) acryloyl-oxyethyl-2-hydroxypropyl phthalate, dimethyl aminoethyl (methyl) acrylate, methoxy triethylene (methyl) acrylate etc.In addition, acryloyl morpholine, NVP etc. also can become monofunctional compound.These monofunctional compound may be used alone, or combinationally use two or more.

In addition, active energy ray-curable resin also can contain polyreactive oligomers.By making it containing polyreactive oligomers, the hardness of solidfied material can be adjusted.Polyreactive oligomers can be such as above-mentioned multifunctional (methyl) acrylate compounds, i.e. the dipolymer of polyvalent alcohol and (methyl) acrylic acid ester compounds, carbamate (methyl) acrylate compounds, polyester (methyl) acrylate compounds or epoxy (methyl) acrylate or trimer etc.

As other polyreactive oligomers, polyisocyanate that utilization has at least 2 isocyanato in the molecule and carbamate (methyl) acrylate oligomer be obtained by reacting of compound with at least 1 (methyl) acryloxy and hydroxyl can be enumerated.As the polyisocyanate used for this reason, hexamethylene diisocyanate can be enumerated, isophorone diisocyanate, toluene diisocyanate, methyl diphenylene diisocyanate, Xylene Diisocyanate etc., in addition, the compound with at least 1 (methyl) acryloxy and hydroxyl is (methyl) acrylate containing hydroxyl utilizing polyvalent alcohol and (methyl) acrylic acid esterification to obtain, a part and (methyl) acrylic acid of the alcohol hydroxyl group of polyvalent alcohol carry out esterification, and a part for alcohol hydroxyl group residues in molecule.Polyhydric alcohols used herein is as being 1,3-BDO, BDO, 1,6-hexanediol, diethylene glycol, triethylene glycol, neopentyl glycol, polyglycol, polypropylene glycol, trimethylolpropane, glycerine, pentaerythrite, dipentaerythritol etc.

In addition, as the example of other polyreactive oligomers, can also enumerate utilize have the compound of multiple carboxyl and/or its acid anhydrides, with polyester (methyl) acrylate oligomer be obtained by reacting of compound with at least 1 (methyl) acryloxy and hydroxyl.As the compound with multiple carboxyl used and/or its acid anhydrides for this reason, can exemplify with the Compound Phase enumerated in polyester (methyl) acrylate compounds of described multifunctional (methyl) acrylate compounds with compound.In addition, as the compound with at least 1 (methyl) acryloxy and hydroxyl, can exemplify with the Compound Phase enumerated in above-mentioned carbamate (methyl) acrylate oligomer with compound.

Except polyreactive oligomers as above, as the example of other carbamate (methyl) acrylate oligomer, can enumerate and make isocyanates and the hydroxyl reaction containing the polyester of hydroxyl, the polyethers containing hydroxyl or (methyl) acrylate containing hydroxyl and the compound that obtains.What use can utilize the esterification of polyvalent alcohol and carboxylic acid or the compound and/or its acid anhydrides with multiple carboxyl to obtain containing the polyester of hydroxyl for this reason and preferably.As polyvalent alcohol and compound and/or its acid anhydrides with multiple carboxyl, the compound same with the Compound Phase enumerated in polyester (methyl) acrylate compounds of multifunctional (methyl) acrylate compounds can be exemplified respectively above.The polyethers containing hydroxyl of preferred use can pass through to the one kind or two or more epoxyalkane of polyvalent alcohol addition and/or 6-caprolactone and obtain.Polyvalent alcohol can be and the above-mentioned polyvalent alcohol same containing operable polyol phase in the polyester of hydroxyl.As (methyl) acrylate containing hydroxyl preferably used, can exemplify with the Compound Phase enumerated in the carbamate of polyreactive oligomers (methyl) acrylate oligomer with compound.As long as isocyanates has the compound of at least 1 isocyanato in the molecule, but the isocyanate compound of the particularly preferably divalent such as toluene diisocyanate, hexamethylene diisocyanate, isophorone diisocyanate.

These polyreactive oligomerses may be used alone, or combinationally use two or more.

(2) Photoepolymerizationinitiater initiater

Photoepolymerizationinitiater initiater suitably can be selected according to the kind of active energy beam of the manufacture being applied to antiglare film.In addition, when using electron beam as active energy beam, the coating fluid not containing Photoepolymerizationinitiater initiater can also be used in the manufacture of antiglare film.As Photoepolymerizationinitiater initiater, such as, can use acetophenone system Photoepolymerizationinitiater initiater, benzoin system Photoepolymerizationinitiater initiater, benzophenone series Photoepolymerizationinitiater initiater, thioxanthones system Photoepolymerizationinitiater initiater, Photoepolymerizationinitiater initiater, oxadiazole system of triazine system Photoepolymerizationinitiater initiater etc.In addition; as Photoepolymerizationinitiater initiater; such as also can use TMDPO, 2; 2 '-bis-Chloro-O-Phenyl-4; 4 ', 5,5 '-tetraphenyl-1; 2 '-diimidazole, 10-butyl-2-chloro-acridine ketone, 2-EAQ, benzil, 9,10-phenanthrenequione, camphorquinone, methyl benzoylformate, two cyclopentadiene titanium compounds etc.The use amount of Photoepolymerizationinitiater initiater, relative to active energy ray-curable resin 100 weight portion, is generally 0.5 ~ 20 weight portion, is preferably 1 ~ 5 weight portion.

(3) other any composition of coating fluid is formed

In order to improve the coating relative to transparent supporting mass, coating fluid is sometimes also containing organic solvent.As organic solvent, can from aliphatic hydrocarbons such as hexane, cyclohexane, octanes; Toluene, dimethylbenzene etc. are aromatic hydrocarbon based; The alcohols such as ethanol, 1-propyl alcohol, isopropyl alcohol, n-butyl alcohol, cyclohexanol; The ketones such as MEK, methyl isobutyl ketone, cyclohexanone; The ester classes such as ethyl acetate, butyl acetate, isobutyl acetate; The dibasic alcohol ethers such as glycol monoethyl ether, ethylene glycol monoethyl ether, diethylene glycol monoethyl ether, propylene glycol monomethyl ether, dihydroxypropane single-ether; The esterification such as ethylene glycol monomethyl ether acetate, propylene glycol methyl ether acetate dibasic alcohol ethers; The cellosolve classes such as 2-methyl cellosolve, cellosolvo, butoxy ethanol; In the carbitol classes such as 2-(2-methoxy ethoxy) ethanol, 2-(2-ethoxy ethoxy) ethanol, 2-(2-Butoxyethoxy) ethanol etc., consider viscosity etc. and choice for use.These solvents both can be used alone, also can as required used in combination several.When coating fluid contains solvent, need after coating this solvent is evaporated.Thus, solvent preferably has the solvent of the boiling point of the scope of 60 DEG C ~ 160 DEG C.In addition, the saturated vapour pressure at its 20 DEG C is preferably in the scope of 0.1kPa ~ 20kPa.

(other the operation arranged arbitrarily in painting process and the summary of painting process)

When coating fluid contains solvent, preferably after above-mentioned painting process, before main curing process, in addition when arranging precuring operation, preferably before it, arranging and making solvent evaporate and carry out dry drying process.Drying such as can example be such as shown in Figure 6, is passed through and carry out by the transparent supporting mass 81 after making formation coating layer in dry section 84.Baking temperature can be selected rightly according to the kind of used solvent, transparent supporting mass.Be generally the scope of 20 DEG C ~ 120 DEG C, but be not limited thereto.In addition, when there being multiple drying oven, also can change temperature to each drying oven.The thickness of dried coating layer is preferably 1 ~ 30 μm.

Through painting process as described above, as required again through drying process, the duplexer transparent supporting mass being laminated with coating layer will be formed in.

(P2) precuring operation

Precuring operation be forward direction coating layer at main curing process described later transparent supporting mass Width both ends area illumination active energy beam, make the operation of this region, both ends precuring.Fig. 7 is the sectional view schematically showing precuring operation.In Fig. 7, the end regions 82b being present in the two ends of the Width (direction orthogonal with conveyance direction) of coating layer is the region that the end comprising coating layer reaches the width of regulation from end.

In precuring operation, by making both ends regions curing in advance, and improve this part further with the adaptation of transparent supporting mass 81, in main curing process thereafter, immediately operation thereafter, under a part of exfoliation of cured resin can be prevented, pollute the situation of operation.End regions 82b can be set to the region of such as more than 5mm and below 50mm from the end of coating layer 82.

Can with reference to Fig. 6 and Fig. 7 to the irradiation of the active energy beam of the end regions of coating layer, such as by from applying area 83 (when carrying out drying, also have dry section 84) the transparent supporting mass 81 with coating layer 82 that passes through, use the ultraviolet lamp isoreactivity energy-ray irradiation unit 85 near the both ends being located at coating layer 82 side respectively to irradiate active energy beam to carry out.As long as active energy beam irradiation unit 85 can irradiate the device of active energy beam to the end regions 82b of coating layer 82, transparent supporting mass 81 side also can be located at.

For kind and the light source of active energy beam, identical with main curing process described later.Under active energy beam is ultraviolet situation, the accumulative light quantity of ultraviolet UVA (wavelength 400 ~ 315nm) is preferably 10mJ/cm ²above and 400mJ/cm ²below, 50mJ/cm is more preferably ²above and 400mJ/cm ²below.If to make accumulative light quantity for 50mJ/cm ²above mode is irradiated, then more effectively can prevent the distortion in ensuing main curing process.On the other hand, if this accumulative light quantity is greater than 400mJ/cm ², then curing reaction exceedingly carries out, and consequently, has and produces at the boundary of cured portion and uncured portion the situation that the resin that caused by the strain of film thickness difference, internal stress peels off.

(P3) main curing process

Main curing process is following operation, namely, under the state of die surface (forming face) with required surface unevenness profile is pushed to the surface of coating layer, active energy beam is irradiated from transparent supporting side, coating layer is solidified, thus on transparent supporting mass, forms the resin bed that have cured.Thus, coating layer is just cured, and the concaveconvex shape of die surface is transferred to painting layer surface.For mould used herein, when manufacturing antiglare film continuously as long size shape object, being the mould of roll shape, is the mould manufactured by using the mould base material of roll shape in the mould manufacturing method illustrated.

This operation such as can be as shown in Figure 6, by (also having dry section 84 when carrying out drying process to from applying area 83, in addition, carry out in addition utilizing the precuring district of the irradiation of active energy beam irradiation unit 85 when precuring operation illustrated above carrying out) pass through after the duplexer with coating layer, use the ultraviolet lamp isoreactivity energy-ray irradiation unit 86 being configured at transparent supporting mass 81 side irradiate active energy beam and carry out.

First, to the surface of coating layer of duplexer being formed with coating layer, use the mould 87 of roll shape such as pushing such as compression joint mechanism such as nip rolls 88 grade, in this condition, irradiate active energy beam from the active energy beam irradiation unit 86 being configured at transparent supporting mass 81 side, coating layer is solidified.Herein, so-called " coating layer is solidified ", refers to that active energy ray-curable resin contained in coating layer accepts the energy of active energy beam and produces curing reaction.From the viewpoint of preventing bubble to be mixed between the coating layer of duplexer and mould, effectively use nip rolls 88.Active energy beam irradiation unit 86 can use 1 or multiple stage.

After the irradiation of active energy beam, duplexer by with the nip rolls 89 of outlet side for fulcrum, peel off from mould 87.Comprise transparent supporting mass and the duplexer of coating layer that have cured of gained become antiglare film using this coating layer that have cured as antiglare layer.The antiglare film of gained utilizes film collecting device 90 to reel usually.Now, also for the object of protection antiglare layer, the adhesive phase across having releasable can being pressed from both sides, reeling while anti-glare layer surface attaching comprises the diaphragm of polyethylene terephthalate, tygon etc.Herein, although be illustrated the situation that mould used is roll shape, but also the mould beyond roll shape can be used.In addition, after peeling off from mould, the active energy beam that also can carry out adding irradiates.

As active energy beam used in this operation, can according to the kind of active energy ray-curable resin contained in coating fluid, suitably select from ultraviolet, electron beam, near ultraviolet ray, visible ray, near infrared ray, infrared ray, X ray etc., but preferred ultraviolet and electron beam in the middle of them, owing to disposing easy and can high-energy be obtained, therefore particularly preferably ultraviolet.Thus described above, as the preferred UV Decal of light Decal.

As ultraviolet light source, such as, can use low pressure mercury lamp, medium pressure mercury lamp, high-pressure sodium lamp, ultrahigh pressure mercury lamp, carbon arc lamp, electrodeless lamp, metal halide lamp, xenon arc lamp etc.In addition, ArF excimer laser, KrF excimer laser, Excimer lamp or synchrotron radiation light etc. can also be used.In the middle of them, preferably use ultrahigh pressure mercury lamp, high-pressure sodium lamp, low pressure mercury lamp, electrodeless lamp, xenon arc lamp, metal halide lamp.

In addition, as electron beam, the electron beam that there is 50 ~ 1000keV, preferably there is the energy of 100 ~ 300keV of releasing from the various electron-beam accelerator such as Cockcroft-Walton type, VandeGraaff type, resonance variable-pressure, insulating core variable-pressure, linear pattern, Dynamitron type, high-frequency type can be enumerated.

Under active energy beam is ultraviolet situation, the accumulative light quantity of ultraviolet UVA (wavelength 400 ~ 315nm) is preferably 100mJ/cm ²above and 3000mJ/cm ²below, 200mJ/cm is more preferably ²above and 2000mJ/cm ²below.In addition, due to the ultraviolet situation also having transparent supporting mass to absorb short wavelength side, therefore for suppressing the object of this absorption, sometimes also to make the accumulative light quantity of the ultraviolet (UV) V of the wavelength region may comprising visible ray (wavelength 395 ~ 445nm) be that the mode of preferred value adjusts exposure.The accumulative light quantity of the UVV in this situation is preferably 100mJ/cm ²above and 3000mJ/cm ²below, 200mJ/cm is more preferably ²above and 2000mJ/cm ²below.If accumulative light quantity is less than 100mJ/cm ², then the solidification of coating layer is abundant not, thus can the hardness step-down of rewarding antiglare layer or uncured resin to be attached to deflector roll etc. upper and become the trend of the reason that operation is polluted.In addition, if accumulative light quantity is greater than 3000mJ/cm ², then have and cause the contraction of transparent supporting mass from the thermal conductance of ultraviolet lamp radiation and become the situation of the reason of fold.

[purposes of antiglare film]

The antiglare film of the present invention obtained as described above, in image display device etc., is usually fitted on polarizing coating by the viewable side diaphragm as viewable side polaroid and uses.That is, the polaroid being fitted with this antiglare film is configured in the surface of image display device.In addition, as already described, when employing polarizing coating as transparent supporting mass, the antiglare film that polarizing coating is one-piece type can be obtained, therefore also antiglare film one-piece type for this polarizing coating can be applied to image display device.The image display device possessing antiglare film of the present invention has enough anti-glares under large viewing angle, side by side can also prevent the generation whitened and dazzle the eyes well.

[embodiment]

Below enumerate embodiment, the present invention is described in more detail.In example, the % of expression content or use amount and part, as long as no particularly pointing out, are exactly weight basis.Mould in following example or the evaluation method of antiglare film as follows.And, utilize the method evaluation of the present invention antiglare film identical with following evaluation method.

(1) mensuration of the surface configuration of antiglare film

(mean value of the area of Voronoi polygon and the coefficient of variation)

Use three-dimensional microscope " PL μ 2300 " (Sensofar Inc.), determine the surface configuration of antiglare film.In order to prevent the warpage of sample, fit on the glass substrate afterwards for measuring to make the mode that male and fomale(M&F) is surface using optically transparent bonding agent.During mensuration, the multiplying power of object lens is set to 50 times.Horizontal resolution Δ x and Δ y is 0.332 μm, and measuring area is 255 μm × 191 μm.The fertile Luo Nuoyi using aforesaid algorithm to carry out using the protuberance on micro concavo-convex surface as summit by the determination data of gained is split, obtain mean value and the standard deviation of the area of Voronoi polygon, obtain the coefficient of variation=(standard deviation/mean value) × 100 (%) according to them.

(2) mensuration of the optical characteristics of antiglare film

(mist degree)

Total mist degree of antiglare film measures as follows, namely, use optically transparent bonding agent, fitting working sample on the glass substrate with the face of antiglare layer opposition side, to this laminating antiglare film on the glass substrate, from glass substrate side incident light, according to above-mentioned JISK7136:2000, haze meter " HM-150 " type of color technical institute in (strain) village is used to measure.Surface haze is the internal haze obtaining antiglare film, according to following formula: Surface haze=total mist degree-internal haze, obtains by deducting internal haze from total mist degree.Internal haze is in the anti-dazzle aspect of working sample after determining total mist degree, attaches after mist degree is approximately the tri acetyl cellulose membrane of 0, measure identically with total mist degree with glycerine.

(transmission sharpness)

According to above-mentioned JISK7374:2007, the reflection analyzer " ICM-1DP " using Suga testing machine (strain) to make, determines the transmission sharpness of antiglare film.In this case also, in order to prevent the warpage of sample, at use optically transparent bonding agent, fitting with the face of antiglare layer opposition side of working sample is used for measuring on the glass substrate afterwards.In this condition from glass substrate side incident light, measure.Measured value is herein the aggregate value that the 5 kinds of light using the width of shading light part and transmissive portion to be respectively 0.125mm, 0.25mm, 0.5mm, 1.0mm and 2.0mm comb the value measured respectively.

(the reflection sharpness measured with the incident angle 45 ° of light)

According to above-mentioned JISK7374:2007, the reflection analyzer " ICM-1DP " using Suga testing machine (strain) to make, determines the reflection sharpness of antiglare film.In this case also, in order to prevent the warpage of sample, preventing the reflection from the back side simultaneously, using optically transparent bonding agent, being fitted in after on black acrylic resin substrate with the face of antiglare layer opposition side of working sample is used for measuring.In this condition from anti-dazzle aspect side with 45 ° of incident lights, measure.Measured value is herein the aggregate value that the 4 kinds of light using the width of shading light part and transmissive portion to be respectively 0.25mm, 0.5mm, 1.0mm and 2.0mm comb the value measured respectively.

(the reflection sharpness measured with the incident angle 60 ° of light)

Except changing to except 60 ° by the incident angle of light, the method identical with the reflection sharpness measured with the incident angle 45 ° of light is above utilized to measure.

(luminance factor R (40)/R (30))

To the antiglare layer of antiglare film, the directional light using the He-Ne laser instrument of wavelength 543.5nm as light source is irradiated from the direction relative to its normal slope 30 °, measure the reflectivity in reflection angle 30 ° of directions and the 40 ° of directions comprised in the plane of embrane method line and direction of illumination, obtain ratio R (the 40)/R (30) of the reflectivity R (40) of reflection angle 40 ° and the reflectivity R (30) of reflection angle 30 °.In the mensuration of reflectivity, all employ " 329203OPTICALPOWERSENSOR " and " 3292OPTICALPOWERMETER " that Yokogawa Motor (strain) is made.In this case also, in order to prevent the warpage of sample, preventing the reflection from the back side simultaneously, using optically transparent bonding agent, being fitted in after on black acrylic resin substrate with the face of antiglare layer opposition side of working sample is used for measuring.

(3) evaluation of the anti-dazzle performance of antiglare film

(visual valuation mirror, whitened)

In order to prevent the reflection at the back side from antiglare film, bonding agent is used to be fitted on black acrylic resin substrate by working sample with the face of antiglare layer opposition side, in this condition, utilize visual observation in the bright indoor being provided with fluorescent light from antiglare layer side, have rated the degree mirrored of fluorescent light and the degree of whiting.For mirroring, have rated respectively from during the observation antiglare film of front and from mirroring during oblique 30 ° of observation antiglare film.Mirror and whiten and evaluate according to benchmark below with 3 grades of 1 to 3 respectively.

Mirror 1: do not observe and mirror.

2: observe a small amount of mirroring.

3: clearly observe and mirror.

Whiting 1: do not observe whiting.

2: observe a small amount of whiting.

3: clearly observe whiting.

(evaluation dazzle the eyes)

Utilize following step have rated to dazzle the eyes.That is, the photomask of the pattern of the assembly unit represented with vertical view in Fig. 8 has first been prepared to have.In this figure, assembly unit 100, on transparent substrate, forms live width 10 μm and is the chromium light-shielding pattern 101 of key shaped, and the part not forming this chromium light-shielding pattern 101 becomes peristome 102.Herein, employ assembly unit and be of a size of the material that 211 μm × 70 μm (in figure vertical × horizontal), thus peristome are of a size of 201 μm × 60 μm (vertical × horizontal in figure).Illustrated assembly unit is multiple along arranging in length and breadth, forms photomask.

After this, as in Fig. 9 with shown in schematic sectional view, what make photomask 113 is formed at chromium light-shielding pattern 111 on glass substrate 112 upward, be placed on the light diffusing sheet 120 of lamp box 115, by with bonding agent, antiglare film 110 be placed on photomask 113 to make the mode sample be fitted on glass plate 117 that its antiglare layer is surface.Light source 116 is configured with in lamp box 115.In this condition, by with sample at a distance of position 119 visualization of about 30cm, and with 7 grades, sensory evaluation has been carried out to the degree of dazzling the eyes.Rank 1 can't see the state of dazzling the eyes completely, and rank 7 is equivalent to observe the state of dazzling the eyes consumingly, and rank 4 is that pole observes the state of dazzling the eyes slightly.

(evaluation of contrast)

The polaroid on table back of the body two sides is peeled off from commercially available LCD TV (" KDL-32EX550 " that Sony (strain) makes).Replace these original polaroids, and side and display surface side overleaf, all to make the respective absorption axle mode consistent with the absorption axle of original polaroid fit the polaroid " SUMIKARANSRDB831E " that Sumitomo Chemical (strain) makes by bonding agent, again on the polaroid of display surface side, the mode being surface to make male and fomale(M&F) is by the antiglare film shown in each example below bonding agent laminating.In darkroom, start the LCD TV so obtained, use nitometer " BM5A " type of (strain) TOPCON, measure the brightness under black display state and white display state, calculate contrast.Contrast herein represents with the ratio of the brightness of black display state with the brightness showing state in vain.On the other hand, in the formation (state of antiglare film of not fitting on the polaroid of display surface side) removing antiglare film from formation above, similarly obtain contrast, result is represented with the ratio (%) of the contrast measured under the state of fitting antiglare film with the contrast measured under the state of antiglare film of not fitting.

(4) evaluation of the pattern of antiglare film manufacture

Made pattern data is become the binary image data of 2 gray scales, represent gray scale with the discrete function g (x, y) of two dimension.Horizontal resolution Δ x and the Δ y of discrete function g (x, y) are set to 2 μm.Discrete Fourier transform (DFT) is carried out to the two-dimensional function g (x, y) of gained and obtains two-dimensional function G (f _x, f _y).By two-dimensional function G (f _x, f _y) squared absolute value and calculate the two-dimensional function Γ (f of two-dimensional power spectrum _x, f _y), calculate one-dimensional functions Γ (f) composed as the One-dimensional power of the function of the distance f relative to initial point, calculate average frequency < f > and standard deviation _f.

< embodiment 1>

(making of the mould of antiglare film manufacture)

The surface having prepared the aluminium roller (A6063 based on JIS) to diameter 300mm implements the copper-plated material of Ba Lade.Ba Lade copper facing comprises the silvering/surface copper coating of copper coating/thin, and the thickness of whole coating is about 200 μm.Mirror ultrafinish is carried out to this copper coatings, to the copper coatings photosensitive resin coating be polished, dry and form photosensitive resin film.Then, the pattern obtained by the pattern shown in repeated arrangement Figure 10 utilizes laser to carry out exposing, developing on photosensitive resin film.The exposure of laser and development is utilized to use LaserStreamFX ((strain) ThinkLaboratory system) to carry out.The resin of eurymeric is employed as photoresist.Pattern shown in Figure 10 is from the pattern with random Luminance Distribution, make it to pass through from the bandpass filter of multiple Gaussian function type and the pattern made, aperture opening ratio is 45%, the average frequency < f > calculated according to the One-dimensional power spectrum of pattern and standard deviation _fbe respectively 0.090 μm ^-1with 0.104 μm ^-1.After this, to make the mode that the black part in figure is exposure portion, white part is non-exposed portion carry out laser explosure.Also identical in the relation in exposure portion and non-exposed portion Figure 11 ~ Figure 13 afterwards.

Thereafter, copper chloride solution is utilized to carry out the first etch processes.Etch quantity is now set as 4 μm.From the roller removing photosensitive resin film after the first etch processes, again carry out the second etch processes with copper chloride solution.Etch quantity is now set as 9 μm.Then, plated thickness is set as 7 μm, has carried out nickel plating processing.On the roller implementing nickel plating, utilize sputtering method to form DLC film as diaphragm, produce mould.The thickness of DLC film is now 0.5 μm.

(making of antiglare film)

Following each composition is dissolved in ethyl acetate with solid component concentration 60%, has prepared the ultra-violet solidified resin composition that can form the film of the refractive index demonstrating 1.53 after hardening.

Pentaerythritol triacrylate 60 parts

Polyfunctional carbamate acrylate 40 parts

(reaction product of hexamethylene diisocyanate and pentaerythritol triacrylate)

TMDPO 5 parts

Be that the mode of 5 μm is coated on triacetyl cellulose (TAC) film of thick 60 μm by this ultra-violet solidified resin composition to make the thickness of dried coating layer, be set as in the dryer of 60 DEG C dry 3 minutes.By dried film with the mode rubber rollers making dried coating layer be die side forwardly shown in mould forming face (there is the face of concaveconvex shape) pushing and make it closely sealed.200mJ/cm is counted according to the accumulative light quantity converted with h ray in this condition from TAC film side ²mode irradiate self-strength 20mW/cm ²the light of high-pressure sodium lamp, coating layer is solidified, forms antiglare layer.The film defining antiglare layer like this on TAC film is peeled off from mould, obtains transparent antiglare film.Be set to antiglare film A.

< embodiment 2>

Except the nickel plating thickness in nickel plating being processed is set as, except 5 μm, producing mould identically with the making of the mould of embodiment 1.Except using this mould, the method identical with the making of the antiglare film of embodiment 1 is utilized to produce antiglare film.The antiglare film of gained is set to antiglare film B.

< embodiment 3>

Except the nickel plating thickness in nickel plating being processed is set as, except 9 μm, producing mould identically with the making of the mould of embodiment 1.Except using this mould, the method identical with the making of the antiglare film of embodiment 1 is utilized to produce antiglare film.The antiglare film of gained is set to antiglare film C.

< embodiment 4>

Except the pattern obtained by the pattern shown in repeated arrangement Figure 11 utilizes except laser exposes on photosensitive resin film, produce mould identically with the making of the mould of embodiment 1.Except using this mould, the method identical with the making of the antiglare film of embodiment 1 is utilized to produce antiglare film.The antiglare film of gained is set to antiglare film D.Pattern shown in Figure 11 is from the pattern with random Luminance Distribution, make it to pass through from the bandpass filter of multiple Gaussian function type and the pattern made, aperture opening ratio is 45%, the average frequency < f > calculated according to the One-dimensional power spectrum of pattern and standard deviation _fbe respectively 0.091 μm ^-1with 0.106 μm ^-1.

< embodiment 5>

Except the pattern that the pattern shown in repeated arrangement Figure 12 is obtained on photosensitive resin film, utilized laser to carry out exposure except, produce mould identically with the making of the mould of embodiment 1.Except using this mould, the method identical with the making of the antiglare film of embodiment 1 is utilized to produce antiglare film.The antiglare film of gained is set to antiglare film E.Pattern shown in Figure 12 is from the pattern with random Luminance Distribution, make it to pass through from the bandpass filter of multiple Gaussian function type and the pattern made, aperture opening ratio is 45%, the average frequency < f > calculated according to the One-dimensional power spectrum of pattern and standard deviation _fbe respectively 0.090 μm ^-1with 0.103 μm ^-1.

< comparative example 1>

Except the nickel plating thickness in nickel plating being processed is set as, except 4 μm, producing mould identically with the making of the mould of embodiment 1.Except using this mould, the method identical with the making of the antiglare film of embodiment 1 is utilized to produce antiglare film.The antiglare film of gained is set to antiglare film F.

< comparative example 2>

The surface having prepared the aluminium roller (A6063 based on JIS) to diameter 200mm implements the copper-plated material of Ba Lade to make the mode that the thickness of whole coating is about 200 μm.Should with the copper-plated aluminium roller of Ba Lade except using, the pattern obtained by the pattern shown in repeated arrangement Figure 13 utilizes beyond laser exposes on photosensitive resin film, produces mould identically with the making of the mould of embodiment 1.Except using this mould, the method identical with the making of the antiglare film of embodiment 1 is utilized to produce antiglare film.The antiglare film of gained is set to antiglare film G.Pattern shown in Figure 13 is from the pattern with random Luminance Distribution, make it to pass through from the bandpass filter of multiple Gaussian function type and the pattern made, aperture opening ratio is 45%, the average frequency < f > calculated according to the One-dimensional power spectrum of pattern and standard deviation _fbe respectively 0.087 μm ^-1with 0.094 μm ^-1.

< comparative example 3>

After mirror ultrafinish is carried out on the surface of the aluminium roller (A5056 based on JIS) to diameter 300mm, sand blasting unit ((strain) only making is made) is used to this aluminium face be polished, with blasting pressure 0.1MPa (gauge pressure, identical below), pearl use amount 8g/cm ²(every 1cm ²the use amount of surface area of roller, identical below) jet paraffin oxidation zirconium pearl " TZ-SX-17 " (Tosoh (strain) system, mean grain size: 20 μm), define concavo-convex on aluminium roller surface.Process for electroless nickel plating processing is carried out to the irregular aluminium roller of the band of gained, produces mould.Now, process for electroless nickel plating thickness is set as 15 μm.Except using this mould, the method identical with the making of the antiglare film of embodiment 1 is utilized to produce antiglare film.The antiglare film of gained is set to antiglare film H.

< comparative example 4>

The surface having prepared the aluminium roller (A5056 based on JIS) to diameter 200mm implements the copper-plated material of Ba Lade in the mode making the thickness of whole coating and be about 200 μm.Mirror ultrafinish is carried out to this copper coatings, sand blasting unit ((strain) only making is made) is used, with blasting pressure 0.05MPa, pearl use amount 6g/cm to this abrasive surface ²spray the Zirconia beads " TZ-SX-17 " identical with pearl used in comparative example 3, define concavo-convex on aluminium roller surface.Chromium plating processing is carried out to the band of gained irregular bar rad copper facing aluminium roller, produces mould.Now, chromium plating thickness is set as 6 μm.Except using this mould, the method identical with the making of the antiglare film of embodiment 1 is utilized to produce antiglare film.The antiglare film of gained is set to antiglare film I.

[evaluation result]

To the antiglare film obtained in above embodiment and comparative example, evaluation result is shown in table 1.

[table 1]

Meet the antiglare film A ~ E (embodiment 1 ~ 5) of important document of the present invention although for low haze, however viewing angle to be front oblique all has excellent anti-glare, whiten and the inhibition of dazzling the eyes also abundant.On the other hand, antiglare film F (comparative example 1) creates whiting.Antiglare film G (comparative example 2) is abundant not from anti-glare during oblique observation.Antiglare film H (comparative example 3) easily produces and dazzles the eyes.Antiglare film I (comparative example 4) is abundant not from anti-glare during oblique observation, also creates whiting.

The explanation of symbol

10... antiglare film,

11... the direction of the incident light of incident angle 30 °, 12... normal reflection direction (30 °),

15... arbitrary reflection direction, the normal of 20... antiglare film,

30... the direction of incident light and the face of embrane method line is comprised,

21... the arbitrary point on antiglare film surface, 22... antiglare film surface,

23... antiglare film reference field, 24... to put the projecting plane of the circle centered by 21 arbitrarily,

26... the generator of fertile Luo Nuoyi segmentation, 27... Voronoi polygon,

28... the Voronoi polygon in mean value is not count down to,

40... mould base material,

41... through the plating face that the first plating process and the first grinding step have ground,

45... the region not having mask of the first etch processes etching is utilized,

46... the first surface concaveconvex shape that the first etch processes is formed is utilized,

47... the second etch processes is utilized to carry out the second surface concaveconvex shape of shape passivation,

50... photosensitive resin film, the region that 51... has been exposed, the region that 52... is not exposed,

60... mask,

70... nickel plating is utilized to carry out the final mould convex-concave surface of shape passivation,

71... nickel coating,

80... outlet roller, the transparent supporting mass of 81...,

82... coating layer, the end regions of 82b... coating layer, 83... applying area,

84... dry section, 85... is used for the active energy beam irradiation unit of precuring,

86... active energy beam irradiation unit, the mould of 87... roll shape,

88,89... nip rolls, 90... film collecting device,

100... assembly unit, 101... light-shielding pattern, 102... peristome,

110... antiglare film, 111... light-shielding pattern, 112... glass substrate,

113... photomask, 115... lamp box, 116... light source,

117... glass plate, the observation place that 119... dazzles the eyes, 120... light diffusing sheet.

Utilizability in industry

Antiglare film of the present invention is useful for image display devices such as liquid crystal display.

Claims (2)

1. an antiglare film, is characterized in that, is to possess transparent supporting mass and the antiglare film with the antiglare layer of fine surface unevenness profile formed thereon, and total mist degree is more than 0.1% and less than 3%,

Surface haze is more than 0.1% and less than 2%,

For with the incident light of incident angle 30 °, the reflectivity R (30) of reflection angle 30 ° and ratio R (the 40)/R (30) of the reflectivity R (40) of reflection angle 40 ° are more than 0.00001 and less than 0.0025,

With the summit of the protuberance of described surface unevenness profile for the mean value of the polygonal area formed when generator carries out fertile Luo Nuoyi segmentation to this surface is 50 μm ²above and 150 μm ²below, and the coefficient of variation of described polygonal area is more than 40% and less than 80%.

2. antiglare film according to claim 1, wherein,

The transmission sharpness sum Tc that the 5 kinds of light combs using the width of shading light part and transmissive portion to be respectively 0.125mm, 0.25mm, 0.5mm, 1.0mm and 2.0mm measure is more than 375%,

The reflection sharpness sum Rc (45) that the 4 kinds of light combs using the width of shading light part and transmissive portion to be respectively 0.25mm, 0.5mm, 1.0mm and 2.0mm measure with the incident angle 45 ° of light for less than 180%,

The reflection sharpness sum Rc (60) that the 4 kinds of light combs using the width of shading light part and transmissive portion to be respectively 0.25mm, 0.5mm, 1.0mm and 2.0mm measure with the incident angle 60 ° of light is for less than 240%.