CN105612437A - Anti-glare film - Google Patents

Abstract

Provided is an anti-glare film which exhibits excellent anti-glare properties at a wide observation angle even when the haze is low, and which can sufficiently inhibit glare and color fading from occurring when disposed on an image display device. Provided is the anti-glare film having a transparent support body, and an anti-glare layer formed thereon and having minute irregularities, wherein: the total haze is between 0.1% and 3%, inclusive; the surface haze is between 0.1% and 2%, inclusive; the root-mean-square roughness is within a predetermined range when measured at a predetermined cut-off length, for example, the root-mean-square roughness (Rq) (0.08) is between 0.01 and 0.05 mum, inclusive, when measured at a cut-off length of 0.08 mm; the shape of the surface irregularities on the aforementioned anti-glare layer has an average tilt angle value of 0.2 degree to 1.2 degrees, inclusive; and the standard deviation of the tilt angle is between 0.1 degree and 0.8 degree, inclusive.

Description

Antiglare film

Technical field

The present invention relates to anti-dazzle (antiglare) film of anti-glare excellence.

Background technology

For liquid crystal display, plasm display panel, Braun tube (cathode-ray tube: CRT)The image display devices such as display, organic field luminescence (EL) display, for fear of because of outsideLight mirror its display surface and cause visual deteriorated, dispose antiglare film at this display surface.

As antiglare film, mainly investigate the hyaline membrane that possesses concave-convex surface shape. Such antiglare filmBy utilizing concave-convex surface shape that extraneous light generation scattered reflection (extraneous light scattered light) is subtractedMirror less, thereby show anti-glare. But, in the situation that outside light scattering light intensity is strong, mayCan cause the what is called that display surface entirety is turned white or display color muddiness is such of image display device " generalGeneration in vain ". In addition, also may there is the concave-convex surface of pixel and the antiglare film of image display deviceInterfere, produce Luminance Distribution and cause the what is called " dazzle (ギ ラ Star キ) " of almost illegible. Based onAbove background, for antiglare film, requires in guaranteeing excellent anti-glare, fully prevents that this is " generalIn vain " and the generation of " dazzling ".

For example, as such antiglare film, in patent documentation 1, as being disposed at the figure of fineDuring as display unit, also can not dazzle and can fully prevent the antiglare film of generation of whiting, openFollowing antiglare film: it is formed with fine concave-convex surface shape on transparent base, and this surface is recessedThe average length PSm of the arbitrary section curve of convex form is below 12 μ m, the calculation of this section curveArt average height Pa and the ratio Pa/PSm of average length PSm are more than 0.005 and below 0.012,The inclination angle of this concave-convex surface shape is that the ratio of 2 ° of following faces is below 50%, this inclination angle be 6 ° withUnder the ratio of face be more than 90%.

In patent documentation 1, disclosed antiglare film is by making the average length PSm of arbitrary section curve non-Often little, eliminate and easily cause the concave-convex surface shape with the cycle that approaches 50 μ m of generation of dazzlingShape, dazzles thereby can effectively suppress this. But, for disclosed antiglare film in patent documentation 1, if further reduce mist degree (low haze), may cause from oblique observation configurationAnti-glare while having the image display device display surface of this antiglare film reduces. Therefore, patent documentation 1In disclosed antiglare film aspect the anti-glare of wide viewing angle, remain improvement leeway.

Prior art document

Patent documentation

Patent documentation 1: TOHKEMY 2007-187952 communique

Summary of the invention

The problem that invention will solve

The object of the present invention is to provide a kind of antiglare film, although it is that low haze is in wide viewing angleInside there is sufficient anti-glare, and in the time being disposed at image display device, can suppress whiting simultaneously and dazzleGeneration.

For the means of dealing with problems

The inventor conducts in-depth research in order to solve above-mentioned problem, and result has completed the present invention., the present invention includes the invention shown in following (1), (2) and (3).

(1) antiglare film, it possesses transparent supporting mass and is formed at the tool on this transparent supporting massThe antiglare layer that has micro concavo-convex surface, is characterized in that,

Total mist degree of described antiglare film is more than 0.1% and below 3%,

Surface mist degree is more than 0.1% and below 2%,

R.m.s. roughness Rq (0.08) while mensuration with dead length (カ ッ ト オ フ Long) 0.08mmBe more than 0.01 μ m and below 0.05 μ m,

R.m.s. roughness Rq (0.25) while mensuration taking dead length 0.25mm is more than 0.05 μ mAnd below 0.1 μ m,

R.m.s. roughness Rq (0.8) while mensuration taking dead length 0.8mm more than 0.07 μ m andBelow 0.12 μ m,

R.m.s. roughness Rq (2.5) while mensuration taking dead length 2.5mm more than 0.08 μ m andBelow 0.15 μ m,

More than the mean value at the inclination angle of the concave-convex surface shape of above-mentioned antiglare layer is 0.2 ° and below 1.2 °,More than the standard deviation at inclination angle is 0.1 ° and below 0.8 °.

(2) antiglare film as described in above-mentioned (1), average length when it is measured with dead length 0.25mmDegree Sm (0.25) is more than 90 μ m and below 160 μ m,

Average length Sm (0.8) while mensuration taking dead length 0.8mm is more than 100 μ m and 300 μ mBelow,

Average length Sm (2.5) while mensuration taking dead length 2.5mm is more than 200 μ m and 400 μ mBelow.

(3) antiglare film as described in above-mentioned (1) or (2), it uses the width of dark portion and bright portion to be respectivelyThe transmission that five kinds of light combs of 0.125mm, 0.25mm, 0.5mm, 1.0mm and 2.0mm are measured is clearClear degree sum Tc is more than 375%,

Use the width of dark portion and bright portion to be respectively 0.25mm, 0.5mm, 1.0mm and 2.0mmFour kinds of light comb is taking the reflection definition sum Rc (45) of 45 ° of mensuration of incidence angle of light as below 180%,

Use the width of dark portion and bright portion to be respectively 0.25mm, 0.5mm, 1.0mm and 2.0mmFour kinds of light comb is taking the reflection definition sum Rc (60) of 60 ° of mensuration of incidence angle of light as below 240%.

The effect of invention

Based on the present invention, can provide a kind of antiglare film, although it is that low haze is in wide viewing angleInside there is excellent anti-glare, and in the time being disposed at image display device, can fully suppress whiting and dazzleGeneration.

Brief description of the drawings

Fig. 1: for the schematic diagram at inclination angle of surperficial concaveconvex shape is described.

Fig. 2: for the schematic diagram of assay method at inclination angle of surperficial concaveconvex shape is described.

Fig. 3: the figure that schematically shows a preferred example of the manufacture method (first half) of mould.

Fig. 4: the figure that schematically shows a preferred example of the manufacture method (latter half) of mould.

Fig. 5: be shown schematically in the manufacturing installation using in the manufacture method of antiglare film of the present inventionThe figure of a preferred example.

Fig. 6: be shown schematically in preferred precuring work in the manufacture method of antiglare film of the present inventionThe figure of order.

Fig. 7: the figure that schematically shows the unit cell (unitcell) of evaluating for dazzling.

Fig. 8: the figure that schematically shows the evaluating apparatus that dazzles.

Fig. 9: the figure that is illustrated in a part of the pattern A using in embodiment 1～3 and comparative example 1.

Figure 10: the figure that is illustrated in a part of the pattern B using in comparative example 2.

Figure 11: represent pattern A and B to carry out discrete Fourier transform and the power spectrum Γ (f) that obtainsFigure.

Detailed description of the invention

Below, by reference to the accompanying drawings the preferred embodiment of the present invention is described as required, but this is attachedSizes shown in figure etc. are set arbitrarily for the ease of observation.

Antiglare film of the present invention is characterised in that, the r.m.s. roughness when specifying that dead length is measuredRq respectively in above-mentioned scope, the mean value at the inclination angle of concave-convex surface shape be 0.2 ° above and 1.2 °Below, more than the standard deviation at inclination angle is 0.1 ° and below 0.8 °.

First, for antiglare film of the present invention, average to r.m.s. roughness Rq and inclination angleThe method for solving of value and standard deviation describes.

[r.m.s. roughness Rq]

In antiglare film of the present invention, for the micro concavo-convex surface of the antiglare layer possessing in this antiglare filmRoot mean square while mensuration with dead length 0.08mm, 0.25mm, 0.8mm and 2.5mm is thickRugosity Rq (0.08), Rq (0.25), Rq (0.8) and Rq (2.5) are respectively 0.01 μ m above and 0.05 μ mBelow, 0.05 μ m above and 0.1 μ m is following, 0.07 μ m is above and 0.12 μ m is following and 0.08 μ mAbove and below 0.15 μ m. These Rq (0.08), Rq (0.25), Rq (0.8) and Rq (2.5) can lead toCross the following condition determination of setting, utilize and measure according to the method for JISB0601.

Rq (0.08): dead length 0.08mm, evaluation length 0.4mm

Rq (0.25): dead length 0.25mm, evaluation length 1.25mm

Rq (0.8): dead length 0.8mm, evaluation length 4mm

Rq (2.5): dead length 2.5mm, evaluation length 12.5mm

R.m.s. roughness while mensuration with regulation dead length refers to, is specified by above-mentioned JIS from utilizingThe assay method section curve obtained in by more than high-pass filter mask specification dead lengthLong wavelength's component, the surface roughness that uses the roughness curve so obtaining to obtain. Therefore, to cutR.m.s. roughness when only length 0.08mm measures refers to, according to removing from above-mentioned section curveIt is thick that roughness curve while having the concave-convex surface shape of wavelength more than 0.08mm solves root mean squareRugosity, mainly to having the concave-convex surface as the wavelength below 1/2 0.04mm of dead lengthShape is evaluated. While similarly, mensuration with dead length 0.25mm, 0.8mm or 2.5mmR.m.s. roughness refers to, use from above-mentioned section curve, remove there is 0.25mm more than, 0.8mmRoughness curve when the concave-convex surface shape of the wavelength above or more than 2.5mm and the surface that solvesRoughness, mainly following as 1/2 0.125mm of dead length to having, below 0.4mmOr the concave-convex surface shape of wavelength below 1.25mm is evaluated.

Rq (0.08) means greatly the concave-convex surface shape of the antiglare layer that antiglare film of the present invention hasThere is a large amount of concave-convex surface shapes with the wavelength below 0.04mm. Similarly, Rq (0.25)Mean that greatly antiglare layer has the table in a large number with the wavelength of 0.04mm above and below 0.125mmFace concaveconvex shape, Rq (0.8) means greatly to have that to have in a large number 0.125mm above and below 0.4mmThe concave-convex surface shape of wavelength, Rq (2.5) mean greatly have have in a large number 0.4mm above andThe concave-convex surface shape of the wavelength below 1.25mm. If Rq (0.08) is lower than 0.01 μ m, wavelengthShort-period concave-convex surface shape below 0.04mm is considerably less, that is, form and have only by long periodThe antiglare film of antiglare layer that forms of concave-convex surface shape, therefore its surperficial texture roughening. IfRq (0.08) is greater than 0.05 μ m, forms and has strong generation by the short period below wavelength 0.04mmThe antiglare film of antiglare layer of the scattering that causes of concave-convex surface shape, therefore possess such antiglare filmImage display device easily produces whiting. Although the Rq of antiglare film of the present invention (0.08) is above-mentioned modelEnclose, but more than being preferably 0.02 μ m and below 0.04 μ m.

If Rq (0.25) is less than 0.05 μ m, forms and there is wavelength 0.04mm above and 0.125mmThe antiglare film of the antiglare layer that following concave-convex surface shape is few, thereby to the image that possesses this antiglare filmWhen display unit is observed from positive (0～10 ° of left and right), its anti-glare is insufficient. If Rq (0.25)Be greater than 0.1 μ m, wavelength 0.04mm concave-convex surface shape above and below 0.125mm increases.The concave-convex surface shape of such wave band especially with twinkling generation strong correlation, therefore possess this antiglare filmImage display device easily produce and dazzle. Although the Rq of antiglare film of the present invention (0.25) is above-mentionedScope, but more than being preferably 0.06 μ m and below 0.08 μ m.

If Rq (0.8) is less than 0.07 μ m, more than forming wavelength 0.125mm and below 0.4mmThe antiglare layer that concaveconvex shape is few, thereby show dress at the image to possessing the antiglare film with this antiglare layerThe anti-glare of putting while observation from oblique (10～30 ° of left and right) becomes insufficient. If Rq (0.8) is greater than0.12 μ m, wavelength 0.125mm concave-convex surface shape above and below 0.4mm is too much, obtainsEasily produce the image display device of whiting. Although the Rq of antiglare film of the present invention (0.8) is above-mentioned modelEnclose, but more than being preferably 0.08 μ m and below 0.10 μ m.

If Rq (2.5) is less than 0.08 μ m, form above and recessed below 1.25mm of wavelength 0.4mmThe antiglare layer that convex form is few, thereby to the image display device that possesses the antiglare film with this antiglare layerAnti-glare while observation from oblique (more than 30 °) becomes insufficient. If Rq (2.5) is greater than 0.15 μ m,Wavelength 0.4mm macrocyclic concaveconvex shape above and below 1.25mm is too much, the table of antiglare filmThe roughening of face texture. Although the Rq of antiglare film of the present invention (2.5) is above-mentioned scope, be preferablyMore than 0.09 μ m and below 0.11 μ m.

[mean value at inclination angle and standard deviation]

Then, the method for solving of the mean value to inclination angle and standard deviation describes.

The inventor finds, makes the concave-convex surface shape of antiglare film show specific tilt profiles, forObtain having excellent anti-dazzle performance and can effectively prevent the image display device of whiting and Yan ShijiFor effectively. , the mean value at the inclination angle of the concave-convex surface shape of antiglare film of the present invention is 0.2 °Above and 1.2 ° of standard deviations following, inclination angle be 0.1 ° above and below 0.8 °. This inclination angleMean value is lower than in the situation of 0.2 °, and micro concavo-convex surface becomes the face of general planar, and existence cannot showShow the hidden danger of sufficient anti-dazzle performance. The mean value at the inclination angle of concave-convex surface shape exceedes the situation of 1.2 °Under, its inclination angle steepening, easily, by from light optically focused around, causes possessing the figure of such antiglare filmEasily whiten as display unit. In addition, the standard deviation at inclination angle, lower than in the situation of 0.1 °, is shownFace concaveconvex shape becomes evenly, may not can demonstrate sufficient anti-dazzle performance. The standard deviation at inclination angleExceed in the situation of 0.8 °, even if mean value also can cause concave-convex surface shape to be deposited within the limits prescribedThe precipitous region at inclination angle, causes the image display device that possesses such antiglare film easily to occur generalIn vain.

Described " inclination angle of concave-convex surface shape " in the present invention refers to, in the antiglare film 1 shown in Fig. 1The arbitrfary point P on surface, local normal 6 is with respect to the principal normal direction 5 angulation ψ of film.These local normal 6 angulation ψ will consider a concavo-convex impact in P place. Concave-convex surface shapeInclination angle can be according to utilizing Laser Scanning Confocal Microscope, interference microscope, AFM (AFM)The three-dimensional information of the surface configuration of measuring in device is obtained.

Fig. 2 is the schematic diagram that the assay method at the inclination angle of surperficial concaveconvex shape is described. Concrete inclinesAngle determines that method can be described as follows: as shown in Figure 2, determine the imaginary plane FGHI being represented by dotted linesOn starting point A, basic with respect to an A near of the starting point A by the x axle of this pointGet symmetrically a B and D, in addition, near of the starting point A on the y axle by some A is relativeIn an A almost symmetry get a C and E, and determine and these B, C, film that D, E are correspondingPoint Q on face, R, S, T. It should be noted that, in Fig. 2, represent face with (x, y)In orthogonal coordinates, represent the coordinate of film thickness direction with z. Plane FGHI is by passing through on y axlePoint C the straight line parallel with x axle and similarly by the some E on y axle parallel with x axleStraight line and some B by x axle the straight line parallel with y axle and similarly pass through xThe face that each intersection point F of the some D on axle the straight line parallel with y axle, G, H, I form. SeparatelyOutward, in Fig. 2, with respect to plane FGHI, the mode that is positioned at top with the position of actual face is enteredGo and described, but the position difference of getting according to starting point A, both can certainly in the position of actual faceCan be positioned at the top of plane FGHI, also may be positioned at the below of plane FGHI.

And then the inclination angle of gained surface configuration data (the surface configuration data of concave-convex surface shape) canTo obtain by obtaining following polar angle: to the point on the actual face by corresponding with starting point AP and Q, R on the actual face corresponding with 4 B, the C, D, the E that got in its vicinity,S, T this amount to 5 polygon strutting 4 planes, four triangle PQR, PRS, PST,Each normal vector 6a of PTQ, 6b, 6c, 6d are averaged and the utmost point of the method for average line vector 6 that obtainsAngle. After in this wise each measuring point being obtained to inclination angle, can calculate mean value and the standard deviation at inclination angle.

For make the mean value at inclination angle of concave-convex surface shape be 0.2 ° above and 1.2 ° following, make inclination angleStandard deviation be 0.1 ° above and below 0.8 °, if by disperseing fine-grained resin solutionCoat on transparent supporting mass, particulate exposed on coated film surface, thus on transparent supporting mass shapeBecome random concavo-convex method, the thickness of the particle diameter to particulate and dispersity and coated film is adjusted. Generally speaking, in the constant situation of the particle diameter of particulate, by increasing the thickness of coated film, canReduce the mean value at inclination angle. In addition, the dispersity of particulate well, particulate configures equablyOn transparent supporting mass, the standard deviation at inclination angle is less.

In addition, at the method for optimizing for obtaining antiglare film of the present invention described later, by adjustingThe etch quantity of 2 etching work procedures, can be met the antiglare film of important document of the present invention. By increasing byThe etch quantity of 2 etching work procedures, can reduce mean value and the standard deviation at inclination angle.

[total mist degree, surperficial mist degree]

In order to show anti-glare, to prevent whiting, antiglare film of the present invention is with respect to vertical incidence lightTotal mist degree is that the scope more than 0.1% and below 3%, surperficial mist degree are more than 0.1% and below 2%The film of scope. Total mist degree of antiglare film can be measured according to the method shown in JISK7136. ConfigurationThere are total mist degree or surperficial mist degree cannot demonstrate fully lower than the image display device of 0.1% antiglare filmAnti-glare, therefore not preferred. In addition, total mist degree exceedes in 3% situation or surperficial mist degree is superCross in 2% situation, the image display device that disposes this antiglare film can whiten, therefore unexcellentChoosing. Also can there is also not enough such unfavorable condition of its contrast in such image display device.

Deduct surperficial mist degree and the internal haze obtained is more low more preferred with total mist degree. Dispose this insideThe tendency that mist degree exists contrast to decline higher than the image display device of 2.5% antiglare film.

[with specify dead length measure time average length Sm]

In antiglare film of the present invention, the concave-convex surface shape of this antiglare layer is to survey with regulation dead lengthThe concave-convex surface shape that the r.m.s. roughness of timing is above-mentioned scope, preferably with this regulation dead lengthAverage length when mensuration is respectively scope shown below. Specifically, preferably with dead lengthAverage length Sm (0.25) when 0.25mm measures is more than 90 μ m and below 160 μ m, to endAverage length Sm (0.8) when length 0.8mm measures is more than 100 μ m and below 300 μ m, withAverage length Sm (2.5) when dead length 2.5mm measures is more than 200 μ m and below 400 μ m.

The antiglare film that Sm (0.25) is less than 90 μ m has many preventing of concave-convex surface shape that approaches 50 μ mDizzy layer, the image display device that has configured this antiglare film sometimes easily produces and dazzles. Sm (0.25) is greater thanThe antiglare film of 160 μ m has the too much antiglare layer of macrocyclic concave-convex surface shape, this antiglare filmThe roughening sometimes of surface texture. The antiglare film that Sm (0.8) is less than 100 μ m has and contributes to from obliqueThe concave-convex surface shape in the cycle with 100～200 μ m of anti-glare when (10～30 ° of left and right) observedThe antiglare layer that shape is few, configured this antiglare film image display device from oblique observe time anti-glareSometimes decline. It is too much that the antiglare film that Sm (0.8) is greater than 300 μ m has macrocyclic concave-convex surface shapeAntiglare layer, the surperficial texture roughening sometimes of this antiglare film. Sm (2.5) is less than the anti-dazzle of 200 μ mFilm have contribute to observe anti-glare when antiglare film from oblique (more than 30 °) have 200～The few antiglare layer of concave-convex surface shape in the cycle of 300 μ m, the image that possesses this antiglare film shows dressThe anti-glare of observing when antiglare film from oblique (more than 30 °) of putting declines sometimes. Sm (2.5) is greater thanThe antiglare film of 400 μ m has the too much antiglare layer of macrocyclic concave-convex surface shape, this antiglare filmThe roughening sometimes of surface texture.

[transmission definition (Fresh lightness) Tc, reflection definition Rc (45) and reflection definition Rc (65)]

The transmission definition sum Tc obtaining under following condition determination of antiglare film of the present invention is preferredBe more than 375%. Transmission definition sum Tc can obtain as follows: utilize based on JISK7105Method, use the light comb of Rack to measure respectively image definition, then obtain its adduction. Specifically, the ratio that uses the width of dark portion and bright portion be 1: 1 and its width be 0.125mm, 0.25mm,Five kinds of light combs of 0.5mm, 1.0mm and 2.0mm, measure respectively image definition, then obtain itAdduction, is made as Tc. Tc is being disposed to the more image demonstration of fine lower than 375% antiglare filmIn the situation of device, sometimes easily occur to dazzle. With regard to the upper limit of Tc, can be as itIn the scope below 500% of large value, select, if but this Tc is too high, can obtain from anterior viewThe image display device that anti-glare while examining easily reduces, therefore this Tc is preferably for example below 450%.

The reflection definition Rc (45) that the incident light that utilizes 45 ° of incidence angles of antiglare film of the present invention is measuredBe preferably below 180%. Reflection definition Rc (45) is same with above-mentioned Tc, can utilize based on JISK7105 method is measured, and using width in above-mentioned five kinds of light comb is 0.25mm, 0.5mm, 1.0mmAnd four kinds of light of 2.0mm comb measures respectively image definition, and obtain its adduction, be made as Rc (45).Rc (45) is below 180% time, dispose such antiglare film image display device from positive andAnti-glare when oblique observation becomes more good, therefore preferred. The lower limit of Rc (45) does not have special limitSystem, but in order to suppress well whiting and twinkling generation, be preferably for example more than 80%.

The reflection definition Rc (60) that the incident light that utilizes 60 ° of incidence angles of antiglare film of the present invention is measuredBe preferably below 240%. Except changing incidence angle, with the same land productivity of reflection definition Rc (45)Use the method based on JISK7105 to measure reflection definition Rc (60). Rc (60) is below 240%Time, dispose this antiglare film image display device from oblique observe time anti-glare become more goodGood, therefore preferred. The lower limit of Rc (60) is not particularly limited, but for more well suppress whiting andTwinkling generation, is preferably for example more than 150%.

[manufacture method of antiglare film of the present invention]

Antiglare film of the present invention for example can be manufactured as described below. The 1st method comprises: prepare becomingType surface is formed with the micro concavo-convex shape die for forming of the concave-convex surface shape based on predetermined pattern, shouldThe shape transferred thereon of the male and fomale(M&F) of mould after transparent supporting mass, transfer printing is had male and fomale(M&F) shape thoroughlyBright supporting mass is peeled off from mould. The 2nd method comprises: prepare to comprise particulate, resin (binding agent) and moltenAgent and the composition of described microparticulate in resin solution, coat transparent supporting by said compositionOn body, and be dried as required, the coated film (coated film that comprises particulate) forming is thus consolidatedChange. In the 2nd method, adjust according to the drying condition of the composition of above-mentioned composition, above-mentioned coated film etc.The state of aggregation of whole coating film thickness, particulate, makes particulate expose on the surface of coated film thus, therebyOn transparent supporting mass, form random concavo-convex. From the production stability of antiglare film, the sight of production repeatabilityPoint sets out, and preferably utilizes the 1st method to manufacture antiglare film of the present invention.

Here carry out in detail for preferred the 1st method of the manufacture method as antiglare film of the present invention,Explanation.

In order to form accurately the antiglare layer of the concave-convex surface shape with characteristic described above, accurateStandby micro concavo-convex shape die for forming (below also referred to as " mould ") is important. More specifically,The figure of the concave-convex surface shape (below also referred to as " mould convex-concave surface ") that mould has based on regulationCase and forming, and this predetermined pattern is preferably with the form of the intensity with respect to spatial frequency and represents oneThe curve map of obtaining when dimension power spectrum is at spatial frequency 0.015 μ m^-1Above and 0.05 μ m^-1BelowThere is a minimizing pattern. Here, described " pattern " refers to, has in order to form antiglare filmAntiglare layer micro concavo-convex surface view data or there is transmittance section and the mask of light shielding part etc.,Be designated hereinafter simply as " pattern ".

First, for the concave-convex surface of determining in order to form the antiglare layer that antiglare film of the present invention hasThe method of the pattern of shape describes.

For example, the situation that is view data for this pattern illustrates the solving of two-dimensional power spectrum of patternMethod. First,, after this view data being converted to the binary image data of 2 gray scales, use binaryFunction g (x, y) represents this gray scale. By the binary function g (x, y) obtaining as shown in following formula (1) thatSample carries out Fourier transformation and calculates binary function G (f_x，f_y), for another example shown in following formula (2),To gained binary function G (f_x，f_y) absolute value get quadratic power, ask thus and calculate two-dimensional power spectrum Γ (f_x，f_y). Here, x and y presentation graphs are as the orthogonal coordinates in data surface. In addition, f_xAnd f_yRepresent respectivelyThe frequency of x direction and y direction, has the dimension of length inverse.

π in formula (1) is that pi, i are imaginary unit.

Γ(f_x，f_y)＝|G(f_x，f_y)²Formula (2)

This two-dimensional power spectrum Γ (f_x，f_y) represent the spatial frequency distribution of pattern. Conventionally, require anti-dazzleFilm is isotropism, and therefore, antiglare film manufacture of the present invention is also isotropism with pattern. Thus,Represent the binary function Γ (f of the two-dimensional power spectrum of pattern_x，f_y) can by only depend on apart from initial point (0,0) the function of a single variable Γ (f) of distance f represents. This function of a single variable Γ (f) represents the One-dimensional power spectrum of pattern.Next, for by binary function Γ (f_x，f_y) ask the method for calculating function of a single variable Γ (f) to describe.First, suc as formula (3) like that, utilize the binary function of polar coordinate representation as the two-dimensional power spectrum of absolute altitudeΓ(f_x，f_y)。

Γ(f_x，f_y)=Γ (fcos θ, fsin θ) ... formula (3)

Here, θ is the drift angle in Fourier space. Function of a single variable Γ (f) can be by such suc as formula (4)Calculating the rotation of the binary function Γ (fcos θ, fsin θ) of polar coordinate representation on average obtains.

For precision good obtain antiglare film of the present invention, the One-dimensional power spectrum Γ (f) of preferred patternAt spatial frequency 0.015 μ m^-1Above and 0.05 μ m^-1Below there is minimum.

Ask in the situation of two-dimensional power spectrum of pattern, the binary function g (x, y) of tonal gradation is commonForm with discrete function obtains. Now, calculate two-dimensional power spectrum by discrete Fourier transformCan. The One-dimensional power spectrum of pattern can similarly be obtained according to the two-dimensional power spectrum of pattern.

In addition, in order to make gained concave-convex surface be shaped as homogeneous and continuous curved surface, preferably make binary letterThe mean value of number g (x, y) is maximum and the binary function g (x, y) of binary function g (x, y)Minimum of a value difference 30～70%. By photoetching process mfg. moulding die convex-concave surface in the situation that,This binary function g (x, y) is the aperture opening ratio of pattern. For passing through photoetching process mfg. moulding die convex-concave surfaceSituation, the aperture opening ratio of the pre-defined described pattern here. For photolithographic photoresist (レ ジス ト) be in the situation of positive photoresist, its aperture opening ratio refers to: in the coating to this positive photoresistWhen film delineate, with respect to the whole surf zone of this coated film, the region of exposure is sharedRatio. On the other hand, in the situation that is negative photoresist for photolithographic photoresist, its aperture opening ratioRefer to: in the time of the coated film delineate to this negative photoresist, whole with respect to this coated filmIndividual surf zone, does not have the shared ratio in region of exposing. Photoetching process is in the situation of disposable exposure,Its aperture opening ratio refers to the transmittance section proportion of the mask with transmittance section and light shielding part.

Antiglare film of the present invention can obtain as follows: the One-dimensional power of pattern is composed in spatial frequency0.015μm^-1Above and 0.05 μ m^-1Below there is a minimum, manufacture desired mould, andWith this mould, utilize so above-mentioned the 1st method to manufacture antiglare film of the present invention.

In order to be produced on spatial frequency 0.015 μ m^-1Above and 0.05 μ m^-1Below have minimizingThe pattern of One-dimensional power spectrum, makes collocation point forms randomly pattern or in advance by random number or profitThe pseudo random number generating with computer determines deep or light pattern (the preparation figure that random lightness distributes that hasCase), from this preparation pattern, remove the component of specific spatial frequency range. Specific in order to remove thisThe component of spatial frequency range, above-mentioned preparation pattern can be passed through from bandpass filter.

There is in order to manufacture antiglare layer anti-dazzle that is formed with the shape of the concave-convex surface based on predetermined patternFilm, manufacture in order to by the concave-convex surface shape transferred thereon forming based on this predetermined pattern in transparent supportingThe mould with mould convex-concave surface of body. Above-mentioned the 1st method that uses such mould is with thoroughlyOn bright supporting mass, make the embossing that antiglare layer is feature.

As above-mentioned embossing, can enumerate the photo-embossing method, the use thermoplasticity that use light-cured resinThe heat embossing method of resin etc. Wherein, from productive viewpoint, preferred light embossing.

Photo-embossing method is by (surface of transparent supporting mass) formation photo-curable on transparent supporting massResin bed makes it solid in the mould convex-concave surface that this light-cured resin layer is urged to mouldChange, thus by the shape transferred thereon of the mould convex-concave surface of mould in the method for light-cured resin layer. ToolBody is as follows: the light-cured resin layer forming making to be coated with light-cured resin on transparent supporting massBe sealed under the state of mould convex-concave surface, from transparent supporting side light irradiation, (what this light used is canMake the curing light of light-cured resin), (the contained light of light-cured resin layer is consolidated to make light-cured resinVoltinism resin) solidify, then, will be formed with the transparent supporting mass of the light-cured resin layer after solidifyingPeel off from mould. With regard to the antiglare film obtaining by such manufacture method, the photocuring after solidifyingProperty resin bed becomes antiglare layer. It should be noted that, from the viewpoint of the easy degree of manufacturing, asLight-cured resin, preferably uv curing resin, uses the situation of this uv curing resinUnder, the light of irradiation uses ultraviolet ray (below, will use uv curing resin as photo-curableThe embossing of resin is called " UV embossing "). For manufacture with polarizing coating integrated antiglare film,Use polarizing coating as transparent supporting mass, in the embossing being illustrated, by transparent supporting hereBody is replaced into polarizing coating and implements.

The kind that is used for the uv curing resin of UV embossing is not particularly limited, can basisKind, ultraviolet kind choice for use from commercial resins of the transparent supporting mass using are suitableResin. Such uv curing resin is to comprise by irradiation ultraviolet radiation photopolymerisable list occursThe concept of body (polyfunctional monomer), oligomer and polymer and their mixture. In addition, logicalCross the light trigger being used in combination according to the kind of uv curing resin and suitably select, also canUse also can be curing by the visible ray of wavelength ratio ultraviolet line length resin. This ultra-violet solidified treeThe preferences of fat etc. are in aftermentioned explanation.

As the transparent supporting mass for UV embossing, can use such as glass, plastic foil etc. DoFor plastic foil, as long as there is the suitable transparency, mechanical strength can be used. Specifically for example can enumerate:By cellulose acetate esters resins such as TAC (triacetyl cellulose); Acrylic resin; MerlonResinoid; The polyester resins such as PETG; The polyolefin such as polyethylene, polypropyleneThe transparent resin film that resinoid etc. form. These transparent resin films can be solvent cast films, also canIt is extruded film.

The thickness of transparent supporting mass is for example 10～500 μ m, be preferably 10～100 μ m, more preferablyBe 10～60 μ m. The thickness of transparent supporting mass, in the time of this scope, exists acquisition to have abundant machinery strongThe tendency of the antiglare film of degree, the image display device that possesses this antiglare film is difficult for occurring to dazzle more.

On the other hand, heat embossing method be by the transparent resin film being formed by thermoplastic resin through heating andUnder softening state, be pushed on mould convex-concave surface, the concave-convex surface shape of this mould convex-concave surface is turnedBe printed on the method for transparent resin film. For the transparent resin film of heat embossing method also as long as optics in factTransparent film can be any film, particularly, can enumerate transparent as for UV embossingResin molding and the material enumerated.

Below, describe for the method for manufacturing the mould that is used for embossing.

About the manufacture method of mould, can be by above-mentioned based on rule as long as can manufacture the forming face of this mouldThe concave-convex surface shape transferred thereon of determining pattern and form (can form based on predetermined pattern on transparent supporting massAnd the antiglare layer of concave-convex surface shape forming) the scope of mould, be not particularly limited, but beManufacture well the antiglare layer of this concave-convex surface shape with high accuracy, repeatability, preferably photoetching process.Further, this photoetching process preferably includes following operation: [1] the 1st plating operation, [2] grinding step,[3] photosensitive resin film form operation, [4] exposure process, [5] developing procedure, [6] the 1st etching work procedures,[7] photosensitive resin film stripping process, [8] the 2nd etching work procedures, [9] the 2nd plating operations.

Fig. 3 is a preferred example that schematically shows the first half of mould manufacturing method. Fig. 3Schematically show the section of the mould in each operation. Below, in conjunction with Fig. 3 to of the present invention anti-dazzleEach operation of the manufacture method of film die for manufacturing is elaborated.

[1] the 1st plating operation

First, prepare the base material (mould base material) for mould manufacture, the table at this mould with base materialFace is implemented copper facing. By implementing copper facing at mould with the surface of base material in this wise, can make aftermentioned the 2ndAdaptation, the glossiness of the chromium plating in plating operation improve. With regard to copper facing, because its covering property is high,And smoothing effect is strong, therefore can landfill mould with the fine concavo-convex, empty etc. of base material and formThe glossiness surface of smooth and tool. Thus, by implementing copper facing at mould with substrate surface in this wise,Even if implement chromium plating in the 2nd plating operation described later, also can eliminate and be considered to be existed by base materialMicro concavo-convex, chrome-plated surface that cavity causes coarse. In addition, because copper-plated covering property is high,Reduce the generation of tiny crackle. Therefore, even form based on regulation figure by base material forming face at mouldThe concave-convex surface shape (micro concavo-convex surface configuration) of case, also can fully prevent because of fine concavo-convex,The deviation that the impact on substrate (mould base material) surfaces such as cavity, crackle causes.

As the copper using in the copper facing of the 1st plating operation, can use the simple metal of copper, also canSo that the alloy that is principal component in order to copper (copper alloy). Therefore, for copper-plated " copper " be comprise copper andThe concept of copper alloy. Copper facing can be electroplate, also can be electroless plating, but the plating of the 1st plating operationCopper preferably adopts plating. Further, the preferred coating in the 1st plating operation is not only for comprising copper platingThe coating of layer can be also the plating that the coating that forms by copper coating with by the metal beyond copper is laminatedLayer.

The coating forming if implement copper facing on the surface at mould with base material is excessively thin, cannot be thoroughGet rid of the impact (fine concavo-convex, empty, crackle etc.) of substrate surface, therefore its thickness is preferablyMore than 50 μ m. The upper limit of thickness of coating does not exist critical, but from the viewpoint of cost etc., preferablyBe below 500 μ m left and right.

Mould is preferably the base material of being made up of metal material with base material. Further, go out from the viewpoint of costSend out, as the material of this metal material, preferably aluminium, iron etc. Further, the behaviour with base material from mouldThe convenience aspect of doing is considered, particularly preferably using the base material of being made up of the aluminium of lightweight as mould baseMaterial. It should be noted that, the described aluminium here, iron is also respectively without being simple metal, can be also withAluminium or iron are the alloy of principal component.

Mould by the shape of base material as long as suitable for the manufacture method of antiglare film of the present inventionWhen shape. Particularly, can be from tabular base material, cylindric base material or cylindric (cylinderShape) select in base material etc. Manufacture in the situation of antiglare film of the present invention continuously, preferred mold is tubular,Thereby such mould can be manufactured with base material by the mould of tubular.

[2] grinding step

In ensuing grinding step, to implemented copper-plated mould in above-mentioned the 1st plating operationWith grinding on the surface (coating) of base material. The mould adopting in the manufacture method of antiglare film of the present inventionIn the manufacture method of tool, preferably through this grinding step, mould is ground to close to mirror with substrate surfaceThe state of face. For the tabular base material using with base material as mould, the commercially available product of tubular base material,In order to make it reach desired precision, implement the machinings such as cuttings, grinding more, and thus can beThe residual fine cutter trade of substrate surface for mould. So, even by the 1st plating operationAnd formed plating (being preferably copper facing) layer, sometimes also can residual above-mentioned cutter trade. In addition, evenImplement the plating in the 1st plating operation, may not necessarily make the surface of mould base material reach completely flatSliding. , even real to thering is so surperficial mould base material that remains deep processing vestige etc.Execute the operation of [3] described later～[9], the concave-convex surface shape of gained die surface also may with based on ruleThe concave-convex surface shape of determining pattern there are differences, or, may comprise and be caused by cutter trade etc.Concavo-convex. Manufacture in the situation of antiglare film with the mould of the impact that remains cutter trade etc., mayCannot fully demonstrate the optical characteristics such as the anti-glare of target, cause the impact that cannot expect.

The Ginding process adopting in grinding step is not particularly limited, can be according to the mould as grinding objectThe shape of base material for tool, proterties and select Ginding process. As the grinding side that can be applicable to grinding stepThe concrete example of method, can enumerate mechanical milling method, electrolytic polishing method and chemical grinding method etc. Wherein, doFor mechanical milling method, can use microstoning method, polishing, fluid polishing, polishing wheel polishing etc.In any means. In addition, also can cut by using cutting element to carry out minute surface in grinding stepCut, thereby make the surface of mould base material become minute surface. With regard to material, the shape of cutting element now, can use superhard cutter, CBN by the kind of the material (metal material) of base material according to mouldCutter, sintex, diamond cutter etc., but from the viewpoint of machining accuracy, preferably use goldDiamond cutter. Surface roughness after grinding is with the center line average roughness based on JISB0601 standardDegree Ra represents, is preferably below 0.1 μ m, more preferably below 0.05 μ m. Grind Hou centerWhen line average roughness Ra is greater than 0.1 μ m, may be the concave-convex surface shape of the mould finally obtainingThe impact of residual this surface roughness of shape. In addition, the lower limit of center line average roughness Ra does not have spyDifferent restriction. Therefore, the viewpoint of the process time from grinding step (milling time), processing cost goes outSend and determine lower limit.

[3] photosensitive resin film forms operation

Below, in conjunction with Fig. 3, photosensitive resin film being formed to operation describes.

Form in operation at photosensitive resin film, passed through above-mentioned enforcement that grinding step obtainsThe mould of mirror ultrafinish is coated with and photoresist is dissolved in to solvent forms with the surface 41 of base material 40Solution (photoresist solution), and heat, be dried, photosensitive resin film (photoetching formed thusGlued membrane). In Fig. 3, schematically show on the surface 41 of mould base material 40 and be formed with photonastyThe state (Fig. 3 (b)) of resin molding 50.

As photoresist, can use the photoresist of conventional known, also can be using as lightCarve glue and commercially available resin directly or as required through filtration etc. refine after use. For example,As the photoresist that there is photographic department and divide the minus that curing character occurs, can use tool in moleculeThere are the monomer of (methyl) acrylate of acryloyl group or methacryl or prepolymer, two-fold nitrogenizeMixture, the poly-vinyl cinnamate compounds etc. of thing (bisazide) and diene rubber. In addition, doThere is the stripping of sensitization part, the eurymeric of the character of residual not sensitization part only by developing for havingPhotoresist, can use phenolic resins class, line style phenolic resin class etc. Such eurymeric orThe photoresist of minus also can be used as positive photoresist or negative photoresist and is easy from the marketObtain. In addition, in photoresist solution, can also coordinate sensitizer as required, develop and urgeEnter the various additives such as agent, adaptation improver, coating modifying agent, also can be by such interpolationAfter mixing with commercially available photoresist, agent uses as photoresist solution.

For these photoresist solution coat are used to the surface 41 of base material 40 in mould, from formingThe viewpoint of more level and smooth photosensitive resin film is considered, preferably selects optimal solvent, uses sensitizationProperty resin dissolves is in such solvent and dilute and the photoresist solution that obtains. Like thisSolvent also can be selected according to the kind of photoresist and dissolubility thereof. Particularly, can be from exampleAs cellosolve kind solvent, propandiols solvent, esters solvent, alcohols solvent, ketones solvent, Gao JiProperty is selected in solvent etc. Use in the situation of commercially available photoresist, can be according to contained in this photoresistSolvent kind or carry out suitable preliminary experiment and select optimal photoresist, and by its workFor photoresist solution uses.

As at mould with passing through of base material the surface-coated photoresist solution of mirror ultrafinishMethod, can select from following known method by shape of base material etc. according to this mould: meniscusCoating, jetting type coating, dip-coating, spin coating, roller coat, the coating of coiling rod, airblade coating, blade coating,Curtain coating, ring painting method (ringcoat) etc. The thickness of the photosensitive resin film after coating is with after being driedThickness gauge be preferably the scope of 1～10 μ m, the scope of 6～9 μ m more preferably.

[4] exposure process

Ensuing exposure process is by forming in operation and form at photosensitive resin film above-mentionedPhotosensitive resin film 50 exposes, thus by the pattern transfer of target to this photosensitive resin film 50Operation. Be used for the light source of exposure process according to the sense of the contained photoresist of photosensitive resin filmOptical wavelength, sensitivity etc. and suitably select, for example, can be used: the g line (ripple of high-pressure sodium lampLong: 436nm), h line (wavelength: 405nm) or i line (wavelength: 365nm), semiconductor laser (rippleLong: 830nm, 532nm, 488nm, 405nm etc.), YAG laser (wavelength: 1064nm),KrF PRK (wavelength: 248nm), ArF PRK (wavelength: 193nm), F2 standard pointSub-laser (wavelength: 157nm) etc. Exposure mode can be to use and corresponding the covering of pattern of targetMould carries out the mode of disposable exposure, can be also to describe mode. It should be noted that, as targetPattern be, as what described, to represent one dimension merit with the form of the intensity with respect to spatial frequencyCurve map when rate spectrum is at spatial frequency 0.015 μ m^-1Above and 0.05 μ m^-1Below there is a utmost pointThe pattern of little value.

In the manufacture method of mould, in order to form the concave-convex surface shape of this mould with high accuracy more,Under the state of preferably critically controlling on photosensitive resin film, target pattern is exposed. For like thisState under expose, preferably on computers the pattern of target is made to view data, utilize byThe laser being sent by computer-controlled laser head is described (laser is described) on photosensitive resin filmBased on the pattern of this view data. Carry out laser while describing, can use for example in galley making etc.In general laser drawing apparatus. As the commercially available product of such laser drawing apparatus, for example can enumerateLaserStreamFX ((strain) ThinkLaboratory system) etc.

Fig. 3 (c) schematically shows the state to photosensitive resin film 50 exposing patterns. PhotonastyIn the situation of the photoresist that resin molding 50 comprises minus, (for example, use negative photoresist as senseIn the situation of photosensitiveness resin solution), accept exposure energy and photonasty tree occurs through the region 51 of exposureThe cross-linking reaction of fat, thereby dissolubility in aftermentioned developer solution reduces. Thus, in developing procedure,Region 52 without exposure is dissolved by the developing, only residues on substrate surface through the region 51 of exposure,Become mask 60. The situation of the photoresist that on the other hand, photosensitive resin film 50 comprises eurymericUnder (for example, using in the situation of positive photoresist as photoresist solution), through the region of exposure51 accept exposure energy and scission of link of photoresist etc. occur, and become thus and are easily dissolved in aftermentionedDeveloper solution. Thus, in developing procedure, be dissolved by the developing through the region 51 of exposure, only notRegion 52 through exposure residues on substrate surface, becomes mask 60.

[5] developing procedure

In developing procedure, the photoresist that comprises minus at photosensitive resin film 50,Region 52 without exposure is dissolved by the developing, and remains in mould with on base material through the region 51 of exposure,Become mask 60. The situation of the photoresist that on the other hand, photosensitive resin film 50 comprises eurymericUnder, be only dissolved by the developing through the region 51 of exposure, remain in mould without the region 52 of exposure and useOn base material, become mask 60. For the mould that has formed predetermined pattern with the form of photosensitive resin filmBase material for tool, in the 1st etching work procedure, remains in the photosensitive resin film on base material for mouldPlay a role as the mask in aftermentioned the 1st etching work procedure.

For the developer solution for developing procedure, can according to the kind of used photoresist fromIn the developer solution of conventional known, select suitable developer solution. For example, this developer solution can be enumerated: hydroxideThe inorganic bases such as sodium, potassium hydroxide, sodium carbonate, sodium metasilicate, sodium metasilicate, ammoniacal liquor, ethamine, justThe uncles such as the secondary amine such as primary amine class, diethylamine, di-n-butyl amine such as propylamine, triethylamine, methyl diethylamideAlcamines, TMAH, the tetraethyl hydrogen-oxygens such as amine, dimethylethanolamine, triethanolamineThe cyclic amines such as quaternary ammonium compound, pyrroles, piperidines such as change ammonium, trimethyl hydroxyethylammoniumhydroxide hydroxide etc.Alkaline aqueous solution; The organic solvent such as dimethylbenzene, toluene etc.

Developing method in developing procedure is not particularly limited, can adopt immersion development, spray development,Brush development, ultrasonic wave development etc.

Fig. 3 (d) schematically shows and uses the resin of minus to develop as photoresistState after operation. In Fig. 3 (d), be dissolved by the developing without the region 52 of exposure, only through exposing to the sunThe region 51 of light residues on substrate surface, and the photosensitive resin film in this region becomes mask 60. Figure3 (e) schematically show use the resin of eurymeric carry out as photoresist developing procedure itAfter state. In Fig. 3 (e), be dissolved by the developing through the region 51 of exposure, only without the district exposingTerritory 52 residues on substrate surface, and the photosensitive resin film in this region becomes mask 60.

[6] the 1st etching work procedures

The 1st etching work procedure is to use the above-mentioned mould that remains in after developing procedure with on substrate surfacePhotosensitive resin film is as mask, to the main plating in maskless region in substrate surface for mouldLayer carries out etched operation.

Fig. 4 schematically shows a preferred example of the latter half of mould manufacturing method. Fig. 4 (a)Schematically show by the 1st etching work procedure mainly by after the coating etching in maskless regionState. Because photosensitive resin film plays a role as mask 60, the therefore plating of the bottom of mask 60Layer is not etched, but carries out along with etched, and the etching starting from maskless region 45 is enteredOK. Thus, existing near the region of mask 60 and the border in maskless region 45, be positioned at and coverThe coating of the bottom of mould 60 also can be etched. Like this, region and the maskless of mask 60 will be there isThe border in region 45 near mask 60 bottoms coating also etched situation be called lateral erosion.

Etch processes (the 1st etch processes) in the 1st etching work procedure is undertaken by following operation conventionally:Use iron chloride (FeCl₃) liquid, copper chloride (CuCl₂) liquid, alkali etching liquid (Cu (NH₃)₄Cl₂) etc. etching solution,Make coating (metal surface) corrosion that is mainly positioned at the region of maskless 60 in substrate surface for mould.As this etch processes, can use the strong acid such as hydrochloric acid, sulfuric acid as etching solution, next by electroplatingWhile forming this coating, the back-electrolysis etching that also can apply current potential contrary when electroplating by employing comesCarry out etch processes. Implement when etch processes in the concave-convex surface shape basis forming on base material for mouldThe kind of the constituent material (metal material) of base material or the kind of coating, photosensitive resin film for mould,And the kind of the 1st etch processes in etching work procedure etc. and different, cannot treat different things as the same, but at etch quantity beIn situation below 10 μ m, basic isotropism from the mould substrate surface contacting with etching solutionGround is etched. The described etch quantity here refers to, the thickness of the coating of being cut down because of etching.

Etch quantity in the 1st etching work procedure be preferably 1～50 μ m, more preferably 2～10 μ m, enterOne step is preferably 5～8 μ m. Etch quantity is less than in the situation of 1 μ m, forms hardly surface on mouldConcaveconvex shape, forms and has the surperficial mould of general planar, even if therefore use this mould manufacture anti-Dizzy film, this antiglare film does not almost have concave-convex surface shape yet. The image that has configured this kind of antiglare film showsDevice can not show sufficient anti-glare. In addition, in the excessive situation of etch quantity, finally obtainThe concavo-convex difference of height of mould convex-concave surface easily increases. Even if use this mould to manufacture antiglare film,Possesses the generation that sometimes can not fully prevent whiting in the image display device of this antiglare film. The 1stEtch processes in etching work procedure also can be undertaken by an etch processes, also can be divided into twiceMore than carry out etch processes. At this, be divided into above carrying out in the situation of etch processes twice, twice withOn etch processes in the total of etch quantity be preferably 1～50 μ m.

[7] photosensitive resin film stripping process

Ensuing photosensitive resin film stripping process be using in the 1st etching work procedure as mask 60Play a role and remain in the operation that mould is removed with the photosensitive resin film on base material, preferably by being somebody's turn to doOperation is removed completely by remaining in the photosensitive resin film of mould on base material. Shell at photosensitive resin filmIn operation, preferably use stripper that photosensitive resin film is dissolved. As stripper, can use logicalCross concentration, the pH etc. of the material of enumerating as developer solution are changed and the solution prepared. OrPerson, also can use the solution identical with the developer solution using in developing procedure, by with respect to aobviousShadow operation changes temperature, dip time etc. photosensitive resin film is peeled off. Shell at photosensitive resin filmIn operation, there is no special limit for stripper and mould with the contact method (stripping means) of base materialSystem, can adopt dipping peel off, spray peel off, brushly peel off, ultrasonic wave is peeled off etc.

Fig. 4 (b) schematically shows will be in the 1st etching work by photosensitive resin film stripping processThe photosensitive resin film using as mask 60 in order dissolves and the state removed completely. By conductMask 60 and the etch processes of photosensitive resin film, formed the 1st table at mould with substrate surfaceFace concaveconvex shape 46.

[8] the 2nd etching work procedures

The 2nd etching work procedure is for making through the 1st by further etch processes (the 2nd etch processes)Etching work procedure and the operation of the 1st concave-convex surface shape 46 passivation that form. By the 2nd etching placeReason, at the 1st concave-convex surface shape 46 places that form through the 1st etch processes, surface tilt is precipitousPart disappear (following, by so precipitous part passivation of surface tilt in concave-convex surface shape that makesSituation be called " shape passivation "). Fig. 4 (c) shows following state: by utilizing the 2nd etching placeReason makes the 1st concave-convex surface shape 46 of mould base material 40 that shape passivation occur, thereby inclines in surfaceTiltedly precipitous part passivation, has formed the 2nd concave-convex surface shape 47 with mild surface tilt.The mould that carries out as described above the 2nd etch processes and obtain has and uses this mould to manufactureThe optical characteristics of antiglare film of the present invention becomes more preferably effect.

The 2nd etch processes of the 2nd etching work procedure also can adopt use same with the 1st etching work procedureThe etch processes of etching solution and back-electrolysis etching. The degree (of the shape passivation after the 2nd etch processesThe disappearance degree of the precipitous part of surface tilt in concave-convex surface shape after 1 etching work procedure) according to mouldThe material of base material, the method for the 2nd etch processes and the table obtaining through the 1st etching work procedure for toolConcavo-convex size and the degree of depth etc. in face concaveconvex shape and different, therefore cannot treat different things as the same, but control bluntThe most important factor in situation (degree of shape passivation) aspect of changing is the etching in the 2nd etch processesAmount. The described etch quantity here also with the situation of the 1st etching work procedure similarly, with because of the 2nd etching placeThe thickness of the base material of managing and cut down represents. If the etch quantity of the 2nd etch processes is little, for logicalThe effect of the shape passivation of the concave-convex surface shape of crossing the 1st etching work procedure and obtain becomes insufficient. CauseThis, use inclination angle flat of the concave-convex surface shape of the antiglare film that the inadequate mould of shape passivation manufacturesAverage and standard deviation are easily higher than technical characterictic of the present invention, and result easily produces whiting sometimes. SeparatelyOn the one hand, if the etch quantity in the 2nd etch processes is excessive, form through the 1st etching work procedureThe concavo-convex basic disappearance of concave-convex surface shape, obtains having the surperficial mould of general planar sometimes.Use the concave-convex surface shape of the antiglare film that so surperficial mould with general planar manufacturesThe mean value at inclination angle and standard deviation are easily lower than technical characterictic of the present invention, and result sometimes anti-glare becomesObtain insufficient. Therefore, the etch quantity of the 2nd etch processes preferably in the scope of 5～30 μ m, morePreferably in the scope of 10～20 μ m, further preferably in the scope of 11～16 μ m. About2 etch processes, also with the 1st etching work procedure similarly, can be undertaken by the etch processes of 1 time, alsoCan divide and carry out above etch processes 2 times. Wherein, etch processes is being divided to the feelings of carrying out above for 2 timesUnder condition, preferably the summation of the etch quantity in 2 above etch processes is 5～30 μ m.

[9] the 2nd plating operations

The final stage of mould manufacture is, to passed through above-mentioned [6] and [7] operation base material for mould,Be preferably and implement plating through the surface of the mould base material of the operation of above-mentioned [6]～[8] and (be preferablyChromium plating described later) the 2nd plating operation. By carrying out the 2nd plating operation, make mould base materialThe 47 further passivation of concave-convex surface shape time, can protect die surface by this plating.Fig. 4 (d) shows the 2nd concave-convex surface shape by forming through the 2nd etch processes as described aboveOn shape 47, forming chromium coating 71, there is shape passivation (mould convex-concave surface 70) in concave-convex surface shapeState.

As the coating forming by the 2nd plating operation, from having, gloss, hardness are high, friction systemNumber aspect little, that can obtain good release property is considered, preferably chromium plating. In chromium plating, particularly preferably byBe called the chromium plating of the demonstration good gloss of so-called gloss chromium plating, decoration chromium plating etc. Chromium plating is conventionally logicalCross electrolysis and carry out, bathe as its plating, can use and comprise chromic anhybride (CrO₃) and a small amount of sulfuric acidThe aqueous solution is as plating solution. By regulating current density and electrolysis time, can control the thickness of chromium coating.

By the plating in enforcement like this 2nd plating operation, preferably chromium plating, can obtain of the present invention anti-The mould of dizzy film manufacture use. Concave-convex surface by the mould to after the 2nd etch processes with substrate surfaceShape is implemented chromium plating, can obtain there is shape passivation, its case hardness is improved simultaneouslyMould. The thickness of chromium coating in most important factor aspect the degree of control shape passivation now.If this thin thickness, the degree of shape passivation is insufficient, if the thickness of chromium coating is blocked up, and productivity ratioVariation, and produce the plating defect of overshooting shape that is known as dross, be therefore not suitable as the present inventionThe mould of antiglare film manufacture use. The thickness of chromium coating is preferably in the scope of 1～20 μ m, more excellentElect as in the scope of 3～15 μ m, more preferably in the scope of 5～10 μ m.

For the chromium coating forming through the 2nd plating operation, preferably so that Vickers hardness reachMore than 800 modes forms, more preferably so that the mode that Vickers hardness reaches more than 1000 form.The Vickers hardness of chromium coating is lower than in 800 situation, and while manufacturing antiglare film with mould, existence is ledCause the tendency of the durability reduction of this mould.

Below, for the method as in order to manufacture antiglare film of the present invention and preferred above-mentioned photo-embossingMethod describes. As mentioned above, as photo-embossing method, particularly preferably UV embossing, here, pinThe embossing that uses active energy ray-curable resin is specifically described.

Manufacture of the present invention anti-dazzle in order to manufacture continuously antiglare film of the present invention by photo-embossing methodIn the situation of film, preferably include following operation:

[P1] working procedure of coating: coating contains active-energy and penetrates on by the transparent supporting mass of continuous transportThe coating liquid of line curable resin, thus overlay formed;

[P2] main curing process: die surface is being pushed under the state on overlay surface, from thoroughlyActive energy beam is irradiated on bright supporting side.

In addition, in the situation that manufacturing antiglare film of the present invention by photo-embossing method, under more preferably comprisingState operation:

[P3] precuring operation: working procedure of coating [P1] afterwards, curing process [P2] before, to coatingThe end regions of the both sides of the width of layer irradiates active energy beam.

Below, by reference to the accompanying drawings each operation is elaborated. Fig. 5 schematically shows for thisA preferred example of the manufacturing installation of the manufacture method of the antiglare film of invention. Arrow in Fig. 5 represents filmCarrying direction or the direction of rotation of roller.

[P1] working procedure of coating

In working procedure of coating, the painting that coating contains active energy ray-curable resin on transparent supporting massApply liquid, thereby form overlay. Working procedure of coating as shown in Figure 5, with respect to from outlet roller 80The transparent supporting mass 81 being exported, contains active energy ray-curable resin in coating region 83 coatingsThe coating liquid of composition.

The coating of coating liquid on transparent supporting mass 81 can be coated with by for example intaglio plate rubbing method, nick versionCloth method, excellent painting method, scraper for coating method, airblade coating method, lick painting method, mould Tu Fa etc. and carry out.

(transparent supporting mass)

Transparent supporting mass 81 is as long as having the supporting mass of light transmission, for example can use glass,Plastic foil etc. As plastic foil, as long as there is the appropriate transparency, mechanical strength. Concrete andSpeech, can use appointing of supporting mass that above-mentioned conduct enumerates for the transparent supporting mass of UV embossingMeaning supporting mass, further, in order to manufacture continuously antiglare film of the present invention by photo-embossing method, optionalSelect the flexible material with appropriateness.

For the screening characteristics of improvement coating liquid, improve the order of the cementability of transparent supporting mass and overlay, can implement various surface treatments to the surface of transparent supporting mass 81 (overlay side surface). DoFor surface treatment, can enumerate: Corona discharge Treatment, glow discharge processing, acid surfaces processing, alkali tableFace processing, ultraviolet treatment with irradiation etc. In addition, also can on transparent supporting mass 81, for example formPriming coat etc. other layer, and this other layer on coating liquid coating.

In addition, as antiglare film of the present invention, manufacture and polarizing coating are integrated in the situation of antiglare film,In order to improve the cementability between transparent supporting mass and polarizing coating, preferably in advance by various surface treatmentsHydrophiling is carried out on surface (surface of a side contrary to overlay) to transparent supporting mass. This surface treatmentAlso can after the manufacture of antiglare film, carry out.

(coating liquid)

Coating liquid contains active energy ray-curable resin, conventionally further comprises Photoepolymerizationinitiater initiater(radical polymerization initiator). Also light transmission particulate, organic solvent etc. can be comprised as required moltenThe various additives such as agent, levelling agent, dispersant, antistatic additive, anti-fouling agent, surfactant.

(1) active energy ray-curable resin

As active energy ray-curable resin, can preferably use and for example contain multifunctional (methyl) thirdThe resin of enoic acid ester compounds. Described multifunctional (methyl) acrylate compounds is to have in moleculeThe compound of at least 2 (methyl) acryloxies. As multifunctional (methyl) acrylate compoundsConcrete example, for example can enumerate: ester compounds, amino first that polyalcohol and (methyl) acrylic acid formAcid esters (methyl) acrylate compounds, polyester (methyl) acrylate compounds, epoxy (methyl) propyleneThe multifunctional polymerization compound that ester compound etc. comprise 2 above (methyl) acryloyl groups etc.

As polyalcohol, for example can enumerate: ethylene glycol, diethylene glycol, triethylene glycol, TEG,Polyethylene glycol, propane diols (プ ロ ピ レ Application グ リ コ mono-Le), DPG, tripropylene glycol, 4 thirdGlycol, polypropylene glycol, propane diols (プ ロ パ Application ジ オ mono-Le), butanediol, pentanediol, hexylene glycol,Neopentyl glycol, 2-ethyl-1,3-hexylene glycol, 2,2 '-dihydroxyethylsulfide, 1,4-CHDM2 yuan of alcohol like this; Trimethylolpropane, glycerine, pentaerythrite, two glycerine, two seasons penta 4Alcohol, 3 yuan of so above alcohol of double trimethylolpropane.

As polyalcohol and the carboxylate that (methyl) acrylic acid forms, specifically can enumerate: ethylene glycol bisthioglycolate (firstBase) acrylate, diethylene glycol two (methyl) acrylate, 1,6-hexylene glycol two (methyl) acrylate,Neopentyl glycol two (methyl) acrylate, trimethylolpropane tris (methyl) acrylate, trihydroxy methylEthane three (methyl) acrylate, tetramethylol methane three (methyl) acrylate, 1,6-hexylene glycol two(methyl) acrylate, tetramethylol methane four (methyl) acrylate, five polyglycereol three (methyl) propyleneAcid esters, pentaerythrite three (methyl) acrylate, pentaerythrite four (methyl) acrylate, glycerine three (firstBase) acrylate, dipentaerythritol three (methyl) acrylate, dipentaerythritol four (methyl) acrylic acidEster, dipentaerythritol five (methyl) acrylate, dipentaerythritol six (methyl) acrylate.

As carbamate (methyl) acrylate compounds, can enumerate in 1 molecule, have multiple differentCyanate ester based organic isocyanate is anti-with the ammonia esterification of (methyl) acrylic acid derivative with hydroxylAnswer thing. As the organic isocyanate in 1 molecule with multiple NCOs, can enumerate: six AsiasMethyl vulcabond, IPDI, toluene di-isocyanate(TDI), naphthalene diisocyanate,Methyl diphenylene diisocyanate, XDI, dicyclohexyl methyl hydride two isocyanic acidsIn 1 molecule such as ester, there are organic isocyanate, these organic isocyanate warps of 2 NCOsIn isocyanurate-modified, adduct modification, biuret modified 1 molecule forming, there are 3 isocyanidesThe organic isocyanate of perester radical etc. As (methyl) acrylic acid derivative with hydroxyl, can enumerate:(methyl) acrylic acid 2-hydroxy methacrylate, (methyl) acrylic acid 2-hydroxy propyl ester, (methyl) acrylic acid 4-hydroxylBase butyl ester, (methyl) acrylic acid 2-hydroxyl butyl ester, (methyl) acrylic acid 2-hydroxyl-3-phenoxy group propyl ester,Pentaerythritol triacrylate.

As polyester (methyl) acrylate compounds, be preferably and make hydroxyl polyester and (methyl) propyleneAcid reaction and polyester (methyl) acrylate that obtains. The hydroxyl polyester preferably using is by polyalcoholWith carboxylic acid or there is the compound of multiple carboxyls and/or its acid anhydrides obtains through esterification containing hydroxylBase polyester. As polyalcohol, can enumerate the polyalcohol identical with aforesaid compound. In addition, except polynaryBeyond alcohol, also can enumerate bisphenol-A as phenols etc. As carboxylic acid, can enumerate formic acid, acetic acid,Butyl carboxylic acid, benzoic acid etc. As compound and/or its acid anhydrides with multiple carboxyls, can enumerate:Maleic acid, phthalic acid, fumaric acid, itaconic acid, adipic acid, terephthalic acid (TPA), maleic anhydride,Phthalic anhydride, trimellitic acid, cyclohexane cyclohexanedimethanodibasic acid anhydride etc.

In multifunctional (methyl) as above acrylate compounds, carry from the intensity of its solidfied materialEasiness aspect high and that obtain is considered, preferably hexylene glycol two (methyl) acrylate, neopentyl glycol two(methyl) acrylate, diethylene glycol two (methyl) acrylate, tripropylene glycol two (methyl) acrylate,Trimethylolpropane tris (methyl) acrylate, pentaerythrite three (methyl) acrylate, two seasons penta 4The ester compounds such as alcohol six (methyl) acrylate; Hexamethylene diisocyanate and (methyl) acrylic acid 2-The addition product of hydroxy methacrylate; IPDI adds with (methyl) acrylic acid 2-hydroxy methacrylateBecome thing; The addition product of toluene di-isocyanate(TDI) and (methyl) acrylic acid 2-hydroxy methacrylate; Adduct modificationThe addition product of IPDI and (methyl) acrylic acid 2-hydroxy methacrylate; And biuret changesProperty IPDI and (methyl) acrylic acid 2-hydroxy methacrylate addition product. Further, thisMultifunctional (methyl) acrylate compounds can be distinguished use separately a bit, or two or more combination is madeWith.

In active energy ray-curable resin except above-mentioned multifunctional (methyl) acrylate chemical combinationBeyond thing, also can contain simple function (methyl) acrylate compounds. As simple function (methyl) thirdEnoic acid ester compounds, for example can enumerate: (methyl) methyl acrylate, (methyl) ethyl acrylate, (firstBase) butyl acrylate, (methyl) isobutyl acrylate, (methyl) tert-butyl acrylate, (methyl) propyleneAcid 2-hydroxy methacrylate, (methyl) acrylic acid 2-hydroxy propyl ester, (methyl) acrylic acid hydroxyl butyl ester, (methyl)Acrylic acid 2-hydroxyl butyl ester, (methyl) acrylic acid 2-hydroxyl-3-phenoxy group propyl ester, the contracting of (methyl) acrylic acidWater glyceride, acryloyl morpholine, NVP, (methyl) tetrahydrofurfuryl acrylate, (firstBase) cyclohexyl acrylate, (methyl) 2-EHA, (methyl) isobornyl acrylate, secondAcyl group (methyl) acrylate, (methyl) benzyl acrylate, (methyl) acrylic acid 2-ethoxy ethyl ester, (firstBase) acrylic acid 3-methoxyl group butyl ester, ethyl carbitol (methyl) acrylate, phenoxy group (methyl)Acrylate, oxirane modification phenoxy group (methyl) acrylate, epoxy pronane modification (methyl) thirdOlefin(e) acid ester, nonyl phenol (methyl) acrylate, oxirane modification (methyl) acrylate, epoxy thirdAlkane modification nonyl phenol (methyl) acrylate, methoxyl group diethylene glycol (methyl) acrylate, 2-(methyl)Acryloxy ethyl-2-hydroxypropyl phthalic acid ester, (methyl) acrylic acid dimethylaminoethyl(methyl) esters of acrylic acids such as ester, methoxyl group triethylene glycol (methyl) acrylate. These compounds canTo use separately respectively, or two or more is used in combination.

In addition, active energy ray-curable resin also can contain polyreactive oligomers. By containingPolyreactive oligomers, can adjust the hardness of solidfied material. Polyreactive oligomers can be for example above-mentioned manySense (methyl) acrylate compounds, ester compounds that polyalcohol and (methyl) acrylic acid form,Carbamate (methyl) acrylate compounds, polyester (methyl) acrylate compounds or epoxy (firstBase) such oligomer such as dimer, trimer of acrylate etc.

As other polyreactive oligomers, can enumerate: by by thering are at least 2 isocyanides in moleculeThe polyisocyanates of perester radical and have at least 1 (methyl) acryloxy polyalcohol reaction andCarbamate (methyl) acrylate oligomer obtaining. As polyisocyanates, can enumerate: sixMethylene diisocyanate, IPDI, toluene di-isocyanate(TDI), diphenyl methaneThe polymer of vulcabond, XDI etc., as having at least 1 (firstBase) polyalcohol of acryloxy, can enumerate by polyalcohol and (methyl) acrylic acid and obtain through esterificationHydroxyl (methyl) acrylate arriving, and polyalcohol for 1,3-BDO for example, BDO,1,6-hexylene glycol, diethylene glycol, triethylene glycol, neopentyl glycol, polyethylene glycol, polypropylene glycol,Trimethylolpropane, glycerine, pentaerythrite, dipentaerythritol etc. This has at least 1 (methyl)The polyalcohol of acryloxy is that a part for the alcohol hydroxyl group of polyalcohol occurs with (methyl) acrylic acidEsterification and have alcohol hydroxyl group to remain in the polyalcohol in molecule.

In addition, as other the example of polyreactive oligomers, can enumerate by the change with multiple carboxylsCompound and/or its acid anhydrides obtain through reacting with the polyalcohol with at least 1 (methyl) acryloxyPolyester (methyl) acrylate oligomer arriving. As compound and/or its acid with multiple carboxylsAcid anhydride, can enumerate and polyester (methyl) acrylate at above-mentioned multifunctional (methyl) acrylate compoundsThe identical compound of middle record and/or its acid anhydrides. In addition, as thering is at least 1 (methyl) propyleneThe polyalcohol of acyloxy, can enumerate and remember in above-mentioned carbamate (methyl) acrylate oligomerThe identical polyalcohol carrying.

Except polyreactive oligomers as above, as carbamate (methyl) acrylateThe example of oligomer, can further enumerate: isocyanates and hydroxyl polyester, hydroxyl are gatheredThe hydroxyl reaction of ether or hydroxyl (methyl) acrylate and the compound that obtains. Preferably use containing hydroxylBase polyester is by polyalcohol and carboxylic acid or to have compound and/or its acid anhydrides of multiple carboxyls anti-through esterificationThe hydroxyl polyester of answering and obtain. As polyalcohol, the compound with multiple carboxyls and/or its acidAcid anhydride, can enumerate respectively and polyester (methyl) acrylate at multifunctional (methyl) acrylate compoundsThe identical compound of recording in compound. The hydroxyl polyethers preferably using is by polyalcoholThe alkylene oxide that addition is one kind or two or more and/or 6-caprolactone and the hydroxyl polyethers that obtains. PolynaryAlcohol can be the polyalcohol same with the polyol phase that can be used for above-mentioned hydroxyl polyester. As preferred useHydroxyl (methyl) acrylate, can enumerate and carbamate (methyl) at polyreactive oligomersIdentical hydroxyl (methyl) acrylate of record in acrylate oligomer. As isocyanatesClass, preferably has the compound of more than 1 NCO, particularly preferably toluene two isocyanides in moleculeThe divalent isocyanate compounds such as acid esters, hexamethylene diisocyanate, IPDI.

These polyreactive oligomers compounds can use separately respectively or and use two or more.

(2) Photoepolymerizationinitiater initiater

Photoepolymerizationinitiater initiater can be according to being applicable to active energy beam that antiglare film of the present invention manufacturesKind and suitably select. In addition, use in the situation of electron beam as active energy beam, sometimes alsoBy the coating liquid that does not contain Photoepolymerizationinitiater initiater for antiglare film manufacture of the present invention.

As Photoepolymerizationinitiater initiater, for example can use: acetophenone is Photoepolymerizationinitiater initiater, benzoin systemPhotoepolymerizationinitiater initiater, benzophenone series Photoepolymerizationinitiater initiater, thioxanthones are Photoepolymerizationinitiater initiater, triazineBe that Photoepolymerizationinitiater initiater, oxadiazole is Photoepolymerizationinitiater initiater etc. In addition, as Photoepolymerizationinitiater initiater,For example can also use: TMDPO, 2,2 '-bis-(adjacent chlorinePhenyl)-4,4 ', 5,5 '-tetraphenyl-1,2 '-bis-imidazoles, 10-butyl-2-chloro-acridine ketone, 2-ethyl anthraceneQuinone, benzil, 9,10-phenanthrenequione, camphorquinone, methyl benzoylformate, two cyclopentadiene titanium compounds etc.With respect to active energy ray-curable resin 100 weight portions, the use amount of Photoepolymerizationinitiater initiater is commonBe 0.5～20 weight portion, be preferably 1～5 weight portion.

In order to improve the screening characteristics of coating liquid with respect to transparent supporting mass, in coating liquid, sometimes also includeMachine solvent equal solvent. As organic solvent, can consider viscosity etc. and from following solvents, select to makeWith: the aliphatic hydrocarbons such as hexane, cyclohexane, octane; The aromatic hydrocarbon such as toluene, dimethylbenzene; Ethanol,The alcohols such as 1-propyl alcohol, isopropyl alcohol, n-butyl alcohol, cyclohexanol; Methyl ethyl ketone, methyl iso-butyl ketone (MIBK),The ketones such as cyclohexanone; The ester classes such as ethyl acetate, butyl acetate, isobutyl acetate; Ethylene glycol monomethylEther, ethylene glycol monomethyl ether, TC, propylene glycol monomethyl ether, propane diols list secondThe glycol ethers such as base ether; The esterifications such as ethylene glycol monomethyl ether acetate, propylene glycol monomethyl etherGlycol ethers; The cellosolve classes such as 2-methyl cellosolve, cellosolvo, butoxy ethanol; 2-(2-Methoxy ethoxy) ethanol, 2-(2-ethoxy ethoxy) ethanol, 2-(2-butoxy ethyoxyl) ethanol etc.Carbitol class etc. These solvents can use separately, also can as required multiple mixing be used.After coating, need to make above-mentioned organic solvent evaporation. For this reason, preferably boiling point at the model of 60 DEG C～160 DEG CEnclose. In addition, preferably the saturated vapor at 20 DEG C is pressed in the scope of 0.1kPa～20kPa.

In the solvent-laden situation of coating liquid bag, preferably after above-mentioned working procedure of coating, the 1st curing processSetting before makes solvent evaporation and carries out dry drying process. Dry example that can be as shown in Figure 5Like that, the transparent supporting mass 81 by making to possess overlay in dry section 84 by carrying out. DryDry temperature can suitably be selected according to the kind of used solvent, transparent supporting mass. Conventionally existThe scope of 20 DEG C～120 DEG C, but be not limited thereto. In addition, drying oven has in multiple situations,Can change temperature for each drying oven. The bed thickness of dried overlay is preferably 1～30 μ m.

Thus, form the duplexer that transparent supporting mass and overlay are laminated.

[P2] curing process

This operation is by the mould convex-concave surface with desired concave-convex surface shape (is being shapedFace) be pushed under the state on overlay surface and irradiate active energy beam from transparent supporting side, make to be coated withCoating solidifies, thereby on transparent supporting mass, forms the operation of curing resin bed. Thus, Ke YiWhen making overlay curing, by the concave-convex surface shape transferred thereon of mould convex-concave surface in overlay tableFace. Mould used herein is the mould of tubular, is to make in the mould manufacturing method of above-mentioned explanationThe mould of manufacturing with the mould base material of tubular.

This operation can as shown in Figure 5, for example, be disposed at transparent supporting mass 81 by utilizationThe ultraviolet lamp isoreactivity energy-ray irradiation unit 86 of side is to (doing at coating region 83In dry situation, be dry section 84, carry out in the situation of precuring operation described later, be furtherCarry out the precuring district of the irradiation based on active energy beam irradiation unit 86) by after there is paintingThe duplexer of coating irradiates active energy beam and carries out.

First, utilize niproll 88 press fit devices such as grade that the mould of tubular 87 is pushed on through solidifyingThe surface of the overlay of the duplexer after operation, and under this state, use active energy beam to irradiateDevice 86 irradiates active energy beam from transparent supporting mass 81 sides, thereby overlay 82 is solidified.Here, described " overlay is solidified " refers to, active energy beam contained in this overlay is solidifiedProperty resin is accepted the energy of active energy beam and curing reaction is occurred. Use niproll for preventing gasIt is effective that bubble is sneaked between the overlay of duplexer and mould. Active energy beam irradiation unit1 can be used, also many can be used.

Irradiate after active energy beam, duplexer is taking the niproll 89 of outlet side as fulcrum is from mould87 peel off. With regard to the transparent supporting mass of gained and curing overlay, this curing overlay becomesAntiglare layer, obtains antiglare film of the present invention. The common tunicle coiler device 90 of gained antiglare film is reeled.Now, for the object of protection antiglare layer, can be at the adhesive phase across thering is releasable anti-When fitting the diaphragm that comprises PETG, polyethylene etc., dizzy layer surface carry outReel. It should be noted that, the mould that used is here said for the situation of cylindrical dieBright, but also can use the mould beyond tubular. In addition, also can after peeling off, mould carry outThe active energy beam appending irradiates.

As the active energy beam using in this operation, can be according to the active-energy comprising in coating liquidThe kind of ray-curable resin and from ultraviolet ray, electron beam, near ultraviolet ray, visible ray, near-infraredIn line, infrared ray, X ray etc., suitably select, in these, preferably ultraviolet ray and electron beam, from behaviourDo easy, can obtain high-energy aspect and consider, particularly preferably ultraviolet ray is (as mentioned above, as optical pressureHua Fa, preferably UV embossing).

As ultraviolet light source, for example can use: low pressure mercury lamp, medium pressure mercury lamp, high-pressure sodium lamp,Ultrahigh pressure mercury lamp, carbon arc lamp, Non-polarized lamp, metal halide lamp, xenon arc lamp etc. In addition, all rightUse ArF PRK, KrF PRK, Excimer lamp or synchrotron radiation light etc. TheseIn, preferably use ultrahigh pressure mercury lamp, high-pressure sodium lamp, low pressure mercury lamp, Non-polarized lamp, xenon arc lamp, metalHalide lamp.

In addition, as electron beam, can enumerate by Cockcroft-Wal pause (CockcroftWalton)Type, model De Graff (VandeGraaff) type, resonance variable-pressure, insulating core variable-pressure, linear pattern,What the various electron-beam accelerators of ground those rice (Dynamitron) type, high-frequency type etc. discharged have 50～1000keV, the preferred electron beam of the energy of 100～300keV.

Active energy beam is in ultraviolet situation, and the accumulative total light quantity under ultraviolet UVA is preferredFor 100mJ/cm²Above and 3000mJ/cm²200mJ/cm more preferably below,²Above and2000mJ/cm²Below. In addition, owing to also existing transparent supporting mass to absorb the ultraviolet ray of short wavelength sideSituation, therefore ultraviolet accumulative total light quantity in UVV (395～445nm) is preferably100mJ/cm²Above and 3000mJ/cm²200mJ/cm more preferably below,²Above and2000mJ/cm²Below. Accumulative total light quantity is lower than 100mJ/cm²Situation under, overlay solidify notFully, exist cause the lower hardness of gained antiglare layer or uncured resin to be attached to deflector roll etc. andBecome the tendency of the reason that causes operation pollution. In addition, accumulative total light quantity exceedes 3000mJ/cm²FeelingsUnder condition, the heat of being radiated by ultraviolet lamp may become and causes transparent supporting mass to shrink and wrinklingReason.

[P3] precuring operation

This operation is to the width of the transparent supporting mass of overlay before above-mentioned curing processThe end regions of both sides irradiates active energy beam, thereby makes the operation of this region, both ends precuring.Fig. 6 is the profile that schematically shows precuring operation. In Fig. 6, the width side of overlayThe end that comprises overlay to the end regions 82b of (with the vertical direction of carrying direction) interior and fromThe region of Rack is played in end.

In precuring operation, by making in advance end regions solidify, can make in end regions with saturatingThe adaptation of bright supporting mass 81 further improves, thereby in the operation after curing process, prevents because of solidChange under the part generation exfoliation of resin and pollute operation. End regions 82b can be made as from coatingThe region more than for example 5mm that rise the end of layer 82 and below 50mm.

The irradiation of the active energy beam that the end regions of overlay is carried out is referring to Fig. 5 and Fig. 6, exampleAs, can be by utilizing near the ultraviolet ray both ends that are arranged at respectively overlay 82 sides to irradiate dressPut isoreactivity energy-ray irradiation unit 85 to (carrying out dry in the situation that, for dry at coating region 83Dry district 84) by after the transparent supporting mass 81 with overlay 82 irradiate active energy beam and enterOK. Active energy beam irradiation unit 85 is as long as can be to the end regions 82b of overlay 82The device that irradiates active energy beam, can be arranged at transparent supporting mass 81 sides.

About kind and the light source of active energy beam, same with main curing process. Active energy beamIn ultraviolet situation, the accumulative total light quantity under ultraviolet UVA is preferably 10mJ/cm²AboveAnd 400mJ/cm²50mJ/cm more preferably below,²Above and 400mJ/cm²Below. By with50mJ/cm²Above accumulative total light quantity is irradiated, and can more effectively prevent in main curing processDistortion. It should be noted that, accumulative total light quantity exceedes 400mJ/cm²Time, curing reaction excessively carries out,Its result, causes on the border of cured portion and uncured portion, sometimes by film thickness difference, internal stressStrain and cause resin and peel off.

[purposes of antiglare film of the present invention]

The antiglare film of the present invention obtaining as described above can be used for image display device etc., conventionally can doFor watch lateral deviation vibration plate watch side diaphragm to fit in polarizing coating using and (, be disposed at imageThe surface of display unit). In addition, as mentioned above, in the feelings that use polarizing coating as transparent supporting massUnder condition, in order to obtain the one-piece type antiglare film of polarizing coating, also can be by one-piece type such polarizing coatingAntiglare film is for image display device. Possesses the image display device of antiglare film of the present invention in wide observationIn angle, there is sufficient anti-glare, and can prevent well whiting and twinkling generation.

Embodiment

Below, enumerating embodiment is described in more detail the present invention. In example, represent content or" % " of use amount and " part " are weight basis in the situation that there is no specified otherwise.

Mould in following example or the evaluation method of antiglare film are as described below.

[1] mensuration of the surface configuration of antiglare film

(surface roughness parameter of concave-convex surface shape)

By the method according to JISB0601, use the surface roughness of (strain) Mitutoyo system to surveyAmount instrument SurftestSJ-301 has measured the surface roughness parameter of antiglare film. In order to prevent working sampleWarpage, use optically transparent adhesive, by face working sample and antiglare layer opposition side laminatingAfter glass substrate for measure.

(inclination angle on micro concavo-convex surface)

Use three-dimensional microscope PL μ 2300 (Sensofar company system), measured the surperficial of antiglare filmAbsolute altitude. In order to prevent the warpage of working sample, use optically transparent adhesive by working sample withThe face of the contrary side of antiglare layer fits in after glass substrate for measuring. The multiplying power of object lens when mensuration is establishedIt is 50 times. Horizontal resolution Δ x and Δ y are 0.332 μ m, and measuring area is 255 μ m × 191 μ m.According to obtained determination data, calculate based on above-mentioned algorithm, calculate concave-convex surface shapeMean value and the standard deviation at inclination angle.

[2] mensuration of the optical characteristics of antiglare film

(mist degree)

Total mist degree of antiglare film is measured as follows: for antiglare film, use optically transparent adhesive,The face of a side contrary to antiglare layer of working sample is fitted in to glass substrate, and to fitting in this glassThe antiglare film of substrate, from glass substrate side incident light, utilizes method, use based on JISK7136Haze meter " HM-150 " type that in (strain) village, color technical research institute manufactures is measured. By obtainingThe internal haze of antiglare film also deducts internal haze according to following formula with total mist degree, can obtain thus tableFace mist degree.

Surface mist degree=total mist degree-internal haze

Internal haze is measured as follows: utilize glycerine at the working sample after the mensuration of total mist degreeAnti-dazzle aspect laminating mist degree is 0 tri acetyl cellulose membrane substantially, then utilizes identical with total mist degreeMethod is measured.

(transmission definition)

Utilize the method based on JISK7105, the reflection that uses SugaTestInstruments (strain) to makeProperty analyzer " ICM-1DP " has been measured the transmission definition of antiglare film. Now, in order to prevent sampleWarpage, is also used optically transparent adhesive by the face laminating of a side contrary to antiglare layer of working sampleAfter glass substrate for measure. Under this state, make light from the incident of glass substrate side, measure.The measured value here, be use the width of dark portion and bright portion be respectively 0.125mm, 0.25mm,Five kinds of light combs of 0.5mm, 1.0mm and 2.0mm are measured respectively the aggregate value of the value obtaining.

(the reflection definition of measuring under 45 ° of angles of light)

Utilize the method based on JISK7105, the reflection that uses SugaTestInstruments (strain) to makeProperty analyzer " ICM-1DP " has been measured the reflection definition of antiglare film. Now, in order to prevent sampleWarpage, is also used optically transparent adhesive by the face laminating of a side contrary to antiglare layer of working sampleAfter black acrylic resin substrate for measure. Under this state, make light from anti-dazzle aspect side with45 ° of incidents, measure. The measured value is here to use the width of dark portion and bright portion to be respectivelyFour kinds of light combs of 0.25mm, 0.5mm, 1.0mm and 2.0mm are measured respectively the total of the value obtainingValue.

(the reflection definition of measuring under 60 ° of angles of light)

Utilize the method based on JISK7105, the reflection that uses SugaTestInstruments (strain) to makeProperty analyzer " ICM-1DP " has been measured the reflection definition of antiglare film. Now, in order to prevent sampleWarpage, is also used optically transparent adhesive by the face laminating of a side contrary to antiglare layer of working sampleAfter black acrylic resin substrate for measure. Under this state, make light from anti-dazzle aspect side with60 ° of incidents, measure. The measured value is here to use the width of dark portion and bright portion to be respectivelyFour kinds of light combs of 0.25mm, 0.5mm, 1.0mm and 2.0mm are measured respectively the total of the value obtainingValue.

From the direction of 30 ° of the normal slopes with respect to this antiglare film, the antiglare layer of antiglare film is irradiatedFrom the directional light of the He-Ne of wavelength 543.5nm laser, to comprising the flat of embrane method line and direction of illuminationThe angle of the reflectivity in face changes to be measured. The mensuration of reflectivity has all been used Yokogawa Motor strain" 329203Opticalpowersensor " of formula commercial firm system and " 3292Opticalpowermeter ".

[3] evaluation of the anti-dazzle performance of antiglare film

(visual valuation of mirroring, whitening)

In order to prevent the reflection from the back side of antiglare film, by a side contrary to antiglare layer of working sampleFace fit in black acrylic acid resin plate, with fluorescent lamp bright indoor, from antiglare layerSide is carried out visualization, and the degree mirroring to fluorescent lamp, the degree of whiting have been carried out visual valuation.About mirroring, respectively for observe mirroring degree and observing anti-from oblique 30 ° when antiglare film from frontThe degree that mirrors when dizzy film is evaluated. Mirror and whiten respectively according to 1～3 Three Estate,Evaluate based on following benchmark.

Mirror 1: do not observe and mirror.

2: observe and mirror a little.

3: observe and mirror clearly.

Whiting 1: do not observe whiting.

2: observe a little whiting.

3: observe clearly whiting.

(twinkling evaluation)

According to following program appraisal dazzle. , first, prepared as illustrated with plane in Fig. 7Such photomask with unit cell pattern. In this figure, unit cell 100 is at transparent baseThe chromium light-shielding pattern 101 that is formed with hook-type on plate, with live width 10 μ m, does not form this chromium light-shielding pattern101 part becomes peristome 102. Here the unit cell adopting, is of a size of:211 μ m × 70 μ m (figure vertical × horizontal stroke), therefore peristome be of a size of 201 μ m × 60 μ m (figure vertical ×Horizontal). Through arranging in length and breadth, form photomask by multiple illustrated unit cells.

Then,, as shown in the schematic cross sectional view of Fig. 8, make the chromium light-shielding pattern of photomask 113111 are placed on lamp box 115 upward, will utilize adhesive by antiglare film 110 so that its antiglare layer becomesFor fitting in the sample that glass plate 117 obtains, surperficial mode is placed on photomask 113. Lamp boxIn 115, dispose light source 116. Under this state, enter in the position 119 apart from the about 30cm of sampleRow visualization, divides 7 grades to carry out sensory evaluation to twinkling degree thus. Level 1 correspondenceIn completely unconfirmed to twinkling state, level 7 corresponding to significantly observing twinkling state, levelThe 4th, the utmost point is faintly observed twinkling state.

(evaluation of contrast)

Peel off double-edged polarization from commercially available LCD TV [Sony's (strain) system " KDL-32EX550 "]Plate. Replace these original polarization plates, side and display surface side are all via adhesive laminating Sumitomo overleafLearn (strain) polarization plates processed " SumikaranSRDB831E " and make these polarization plates absorption axes separatelyConsistent with the absorption axes of original polarization plates, then, anti-dazzle via adhesive by shown in following exampleFilm becomes surperficial mode with its male and fomale(M&F) and is fitted on display surface lateral deviation vibration plate. By the liquid obtaining thusBrilliant TV starts in darkroom, utilizes (strain) TOPCON luminance meter processed " BM5A " type to measure black demonstrationBrightness under state and white show state, and calculate contrast. Here, contrast is to show in vain shapeThe brightness of state represents with respect to the ratio of the brightness of black show state. As a result of, will be fitted with anti-dazzleThe contrast of measuring under the state of film is with the contrast with respect to measuring under the state of antiglare film of not fittingThe ratio of degree illustrates.

[4] evaluation of pattern for antiglare film manufacture

Making the pattern data of making is the binary image data of 2 gray scales, with the discrete function of binaryG (x, y) represents gray scale. Make horizontal resolution Δ x and the Δ y of discrete function g (x, y) be 2 μ m.The binary function g (x, y) obtaining is carried out to discrete Fourier transform, obtain binary function G (f_x，f_y)。By binary function G (f_x，f_y) absolute value squared, calculate the binary function Γ (f of two-dimensional power spectrum_x，f_y), calculate the function of a single variable Γ (f) as the One-dimensional power spectrum of the function of the distance f with respect to initial point.

<embodiment 1>

(making of antiglare film die for manufacturing)

Ba Lade copper facing is implemented on aluminium roller (based on the A6063 of the JIS) surface of having prepared diameter 200mmThe material forming. Ba Lade copper facing comprises copper coating/thin silvering/surface copper coating, coating entiretyThickness be set as approximately 200 μ m. This copper coatings is carried out to mirror ultrafinish, through grinding afterCopper coatings photosensitive resin coating is also dried, and has formed photosensitive resin film. Then, utilizeThe pattern that laser forms pattern A repeated arrangement as shown in Figure 9 carries out on photosensitive resin filmExposure, and develop. Use LaserStreamFX ((strain) ThinkLaboratory system) to carry outExposure based on laser and developing. As photosensitive resin film, use the sensitization that comprises eurymericThe resin molding of property resin. At this, pattern A is from multiple by the pattern with random lightness distributionGaussian function type bandpass filter is by what make, is that aperture opening ratio is 45.0%, One-dimensional power spectrum existsFrequency 0.0161 μ m^-1There is minimizing pattern.

Subsequently, utilize copper chloride liquid to carry out the 1st etch processes. Etch quantity is now set as 5 μ m.Roller from the 1st etch processes is removed photosensitive resin film, again utilizes copper chloride liquid to carry out the 2ndEtch processes. Etch quantity is now set as 11 μ m. Then, carry out chromium plating processing, made mouldTool A. Now, chromium plating thickness is set as 6 μ m.

(making of antiglare film)

Following each composition is dissolved in ethyl acetate according to 60% solid component concentration, has prepared solidAfter change, can form the ultra-violet solidified resin composition A of the film of the refractive index that shows 1.53.

60 parts of pentaerythritol triacrylates

40 parts of multifunctional ammonia esterification of acrylic esters

(product of hexamethylene diisocyanate and pentaerythritol triacrylate)

5 parts of diphenyl (2,4,6-trimethoxy benzoyl) phosphine oxides

By this ultra-violet solidified resin composition A so that the thickness of dried coating layer reachThe mode of 5 μ m is coated on triacetyl cellulose (TAC) film of thickness 60 μ m, is being set in 60 DEG CDrier in dry 3 minutes. Utilize rubber rollers by dried film so that dried overlay becomesThe forming face that is pushed on the above-mentioned mould A first obtaining for the mode of die side (has concave-convex surface shapeFace) and make it closely sealed. Under this state, from TAC film side exposure intensity 20mW/cm²FromThe light of high-pressure sodium lamp also makes this light reach 200mJ/cm with h line conversion quantometer², make overlay solidChange, manufactured thus antiglare film. Then, gained antiglare film is peeled off from mould, made at TACOn film, possesses the transparent antiglare film A of antiglare layer.

<embodiment 2>

Except the etch quantity in the 2nd etch processes being set as to 12 μ m with the mould of embodiment 1A make similarly make mould B, and except mould A being replaced into mould B with enforcementExample 1 has similarly been made antiglare film. Using this antiglare film as antiglare film B.

<embodiment 3>

Except the etch quantity in the 2nd etch processes being set as to 13 μ m with the mould of embodiment 1A make similarly make mould C, and except mould A being replaced into mould C with enforcementExample 1 has similarly been made antiglare film. Using this antiglare film as antiglare film C.

<comparative example 1>

Except the etch quantity in the 2nd etch processes being set as to 10 μ m with the mould of embodiment 1A make similarly make mould D, and except mould A being replaced into mould D with enforcementExample 1 has similarly been made antiglare film. Using this antiglare film as antiglare film D.

<comparative example 2>

Except utilize the expose figure of pattern B shown in repeated arrangement Figure 10 of laser on photosensitive resin filmBeyond case, make and similarly make mould E with the mould A of embodiment 1, except mould A is putBeyond being changed to mould E, make similarly to Example 1 antiglare film. Using this antiglare film as anti-dazzleFilm E. Herein, pattern B is from multiple Gaussian function types by the pattern with random lightness distributionBandpass filter is by what make, is that aperture opening ratio is 45.0%, the One-dimensional power of pattern is composed in frequency0.015μm^-1Above and 0.05 μ m^-1Below there is minimizing pattern.

<comparative example 3>

Mirror ultrafinish is carried out on the surface of the aluminium roller (based on the A5056 of JIS) to diameter 300mm, usesSand blasting unit ((strain) only making is made) to grind after aluminium face with blasting pressure 0.1MPa (gauge pressure,Pearl use amount 8g/cm down together),²(the per surface area 1cm of roller²Use amount, lower with) sandblast oxidationZirconium pearl TZ-SX-17 (eastern Cao (strain) system, average grain diameter: 20 μ m), have given concavo-convex to aluminium roller surface.The aluminium roller with concavo-convex obtaining is carried out to electroless nickel plating processing, made mould F. Now, by nothingElectrolytic ni plating thickness is set as 15 μ m. Mould A is replaced with to mould F, in addition, with enforcementExample 1 has similarly been made antiglare film. Using this antiglare film as antiglare film F.

<comparative example 4>

Prepare the surface of the aluminium roller (based on the A5056 of JIS) to diameter 200mm and implemented Ba Lade platingThe material that copper forms. Ba Lade copper facing comprises copper coating/thin silvering/surface copper coating, and coating is wholeThe thickness of body is approximately 200 μ m. This copper coatings is carried out to mirror ultrafinish, re-use sand blasting unit ((strain)Only making is made) to this abradant surface with blasting pressure 0.05MPa (gauge pressure, lower with), pearl use amount6g/cm²Sandblast zirconium oxide bead " TZ-SX-17 " (eastern Cao (strain) system, average grain diameter: 20 μ m), to aluminium rollerSurface has been given concavo-convex. The copper facing aluminium roller with concavo-convex obtaining is carried out to chromium plating processing, made mouldG. Now, chromium plating thickness is set as to 6 μ m. Mould A is replaced with to mould G, in addition,Make similarly to Example 1 antiglare film. Using this antiglare film as antiglare film G.

[for the manufacture of the One-dimensional power spectrum of the pattern of each mould]

Figure 11 is equivalent to represent will be in the system of antiglare film A～E (embodiment 1～3, comparative example 1 and 2)The pattern A using in work and B carry out discrete Fourier transform and the figure of power spectrum Γ (f).

[evaluation result]

About above embodiment and comparative example, shown in table 1, above-mentioned antiglare film is being evaluatedResult.

Table 1

Meet the antiglare film A～C (embodiment 1～3) of important document of the present invention although be low haze, itsNo matter positive or oblique viewing angle all has excellent anti-glare, whiting and twinkling inhibitionEffect is also abundant. On the other hand, there is whiting in antiglare film D (comparative example 1). Antiglare film E (relativelyExample 2) from oblique observe time anti-glare deficiency. Antiglare film F (comparative example 3) easily occurs to dazzle.Antiglare film G (comparative example 4) from oblique observe time anti-glare deficiency.

Symbol description

6a, 6b, 6c, 6d normal vector, 6 method of average line vectors,

40 mould base materials,

41 through the 1st plating operation and grinding step and substrate surface for mould (plating layer),

46 the 1st concave-convex surface shapes that form by the 1st etch processes,

The 47 concave-convex surface shapes of having carried out shape passivation by the 2nd etch processes,

50 photosensitive resin films, 60 masks,

There is the surface of shape passivation in the concave-convex surface shape after 70 chromium plating,

71 chromium coatings,

80 outlet rollers, 81 transparent supporting masses, 83 coating regions,

86 active energy beam irradiation units, the mould of 87 tubulars,

88,89 niprolls, 90 film coiler devices.

Industrial applicability

Antiglare film of the present invention is applicable to the image display devices such as liquid crystal display.

Claims (3)

1. an antiglare film, is characterized in that, it possesses transparent supporting mass and is formed at that this is transparentThe antiglare layer with micro concavo-convex surface on supporting mass,

Total mist degree of this antiglare film is more than 0.1% and below 3%,

Surface mist degree is more than 0.1% and below 2%,

R.m.s. roughness Rq (0.08) while mensuration taking dead length 0.08mm is more than 0.01 μ mAnd below 0.05 μ m,

R.m.s. roughness Rq (0.25) while mensuration taking dead length 0.25mm is more than 0.05 μ mAnd below 0.1 μ m,

R.m.s. roughness Rq (0.8) while mensuration taking dead length 0.8mm more than 0.07 μ m andBelow 0.12 μ m,

R.m.s. roughness Rq (2.5) while mensuration taking dead length 2.5mm more than 0.08 μ m andBelow 0.15 μ m,

More than the mean value at the inclination angle of the concave-convex surface shape of described antiglare layer is 0.2 ° and below 1.2 °,More than the standard deviation at inclination angle is 0.1 ° and below 0.8 °.

2. antiglare film as claimed in claim 1, is characterized in that,

Average length Sm (0.25) while mensuration taking dead length 0.25mm more than 90 μ m andBelow 160 μ m,

Average length Sm (0.8) while mensuration taking dead length 0.8mm is more than 100 μ m and 300 μ mBelow,

Average length Sm (2.5) while mensuration taking dead length 2.5mm is more than 200 μ m and 400 μ mBelow.

3. antiglare film as claimed in claim 1 or 2, is characterized in that,

Use the width of dark portion and bright portion to be respectively 0.125mm, 0.25mm, 0.5mm, 1.0mmAnd the transmission definition sum Tc that five kinds of light of 2.0mm comb is measured is more than 375%,

Use the width of dark portion and bright portion to be respectively 0.25mm, 0.5mm, 1.0mm and 2.0mmFour kinds of light comb is taking the reflection definition sum Rc (45) of 45 ° of mensuration of incidence angle of light as below 180%,

Use the width of dark portion and bright portion to be respectively 0.25mm, 0.5mm, 1.0mm and 2.0mmFour kinds of light comb is taking the reflection definition sum Rc (60) of 60 ° of mensuration of incidence angle of light as below 240%.