CN105612435A - Anti-glare film - Google Patents

Abstract

Provided is an anti-glare film which exhibits excellent anti-glare properties at a wide observation angle even when the haze is low, and which can sufficiently inhibit glare and color fading from occurring when disposed on an image display device. Provided is the anti-glare film having a transparent support body, and an anti-glare layer formed thereon and having minute irregularities, wherein: the total haze is between 0.1% and 3%, inclusive; the surface haze is between 1.1% and 2%, inclusive; the root-mean-square roughness is within a predetermined range when measured at a predetermined cut-off length, for example, the root-mean-square roughness (Rq) (0.08) is between 0.01 and 0.05 mum, inclusive, when measured at a cut-off length of 0.08 mm; and the ratio between the reflectance R(30) of a 30 degrees reflection angle and the reflectance R(40) of a 40 degrees reflection angle with regard to light that entered at a 30 degrees incident angle is between 0.00001 and 0.0025, inclusive, when R(40)/R(30).

Description

Antiglare film

Technical field

The present invention relates to anti-dazzle (antiglare) film of anti-glare excellence.

Background technology

For liquid crystal display, plasm display panel, Braun tube (cathode-ray tube: CRT) display, organicThe image display devices such as electroluminescent (EL) display, for fear of mirror the sight that its display surface causes because of extraneous lightThe property examined (Visual Recognize) deteriorated, dispose antiglare film at this display surface.

As antiglare film, mainly investigate the hyaline membrane that possesses concave-convex surface shape. Such antiglare film is shown by utilizationFace concaveconvex shape makes extraneous light generation scattered reflection (extraneous light scattered light) reduce and mirror, thereby shows anti-glare. SoAnd, in the situation that outside light scattering light intensity is strong, may cause the display surface entirety of image display device to turn white, show lookThe generation of color not distinct such what is called " whiting (white Chi ゃ け) ". The pixel that in addition, image display device also may occur withThe concave-convex surface of antiglare film interferes, produce Luminance Distribution and cause the what is called " (ギ ラ Star キ) dazzles " of almost illegible. BaseIn above background, for antiglare film, require in guaranteeing excellent anti-glare, fully to prevent this " whiting " and " dazzling "Occur.

For example, as such antiglare film, in patent documentation 1, as in the time being disposed at the image display device of fineAlso can not dazzle and also fully prevent from the antiglare film of generation of whiting from disclosing following antiglare film: it is on transparent baseBe formed with fine concave-convex surface shape, and the average length PSm of the arbitrary section curve of this concave-convex surface shape be 12 μ m withUnder, the arithmetic average height Pa of this section curve and the ratio Pa/PSm of average length PSm are more than 0.005 and below 0.012, shouldThe inclination angle of concave-convex surface shape is that the ratio that the ratio of 2 ° of following faces is, this inclination angle is 6 ° of faces is below 90% 50% belowAbove.

In patent documentation 1, disclosed antiglare film, by making the average length PSm of arbitrary section curve very little, is eliminated appearanceEasily cause the concave-convex surface shape with the cycle that approaches 50 μ m of dazzling and occurring, dazzle thereby can effectively suppress this. ButBe, for disclosed antiglare film in patent documentation 1, if further reduce mist degree (if reaching low haze),Anti-glare may cause disposing the image display device display surface of this antiglare film from oblique observation time reduces. Therefore, specialIn profit document 1, disclosed antiglare film, aspect the anti-glare of wide viewing angle, remains the leeway in improvement.

Prior art document

Patent documentation

Patent documentation 1: TOHKEMY 2007-187952 communique

Summary of the invention

The problem that invention will solve

The object of the present invention is to provide a kind of antiglare film, although it has excellence for low haze in wide viewing angleAnti-glare, and in the time being disposed at image display device, can fully suppress whiting and twinkling generation.

For the means of dealing with problems

The inventor conducts in-depth research in order to solve above-mentioned problem, and result has completed the present invention. , the present invention relates toAnd:

(1) antiglare film, described antiglare film possess transparent supporting mass and be formed on this transparent supporting mass have micro-Thin concavo-convex antiglare layer, is characterized in that,

Total mist degree of described antiglare film is more than 0.1% and below 3%,

Surface mist degree is more than 0.1% and below 2%,

R.m.s. roughness Rq (0.08) while mensuration taking intercepted length (カ ッ ト オ フ Long) 0.08mm is more than 0.01 μ mAnd below 0.05 μ m,

R.m.s. roughness Rq (0.25) while mensuration taking intercepted length 0.25mm is more than 0.05 μ m and below 0.1 μ m,

R.m.s. roughness Rq (0.8) while mensuration taking intercepted length 0.8mm is more than 0.07 μ m and below 0.12 μ m,

R.m.s. roughness Rq (2.5) while mensuration taking intercepted length 2.5mm is more than 0.08 μ m and below 0.15 μ m,

For the light with incidence angle 30 ゜ incidents, the reflectivity R that the reflectivity R (30) of angle of reflection 30 ゜ and angle of reflection are 40 °(40) ratio R (40)/R (30) is more than 0.00001 and below 0.0025.

In addition, in the present invention, the preferably antiglare film of following (2) and (3).

(2) antiglare film as described in above-mentioned (1), the average length Sm (0.25) when it is measured taking intercepted length 0.25mm asMore than 90 μ m and below 160 μ m,

Average length Sm (0.8) while mensuration taking intercepted length 0.8mm is more than 100 μ m and below 300 μ m,

Average length Sm (2.5) while mensuration taking intercepted length 2.5mm is more than 200 μ m and below 400 μ m.

(3) antiglare film as described in above-mentioned (1) or (2), its use the width of dark portion and bright portion be respectively 0.125mm,The transmission definition sum Tc that five kinds of light combs of 0.25mm, 0.5mm, 1.0mm and 2.0mm are measured is more than 375%,

Use the width of dark portion and bright portion to be respectively four kinds of light comb entering with light of 0.25mm, 0.5mm, 1.0mm and 2.0mmThe reflection definition sum Rc (45) of 45 ° of mensuration of firing angle is below 180%,

Use the width of dark portion and bright portion to be respectively four kinds of light comb entering with light of 0.25mm, 0.5mm, 1.0mm and 2.0mmThe reflection definition sum Rc (60) of 60 ° of mensuration of firing angle is below 240%.

The effect of invention

Based on the present invention, can provide a kind of antiglare film, although it has fully for low haze in wide viewing angleAnti-glare, and in the time being disposed at image display device whiting and twinkling being fully suppressed.

Brief description of the drawings

Fig. 1: in order to the reflectivity of simple declaration antiglare film of the each angle during with 30 ° of incident lights of incidence angle from antiglare layer sideFigure.

Fig. 2: the figure that schematically shows a preferred example of the manufacture method (first half) of mould.

Fig. 3: the figure that schematically shows a preferred example of the manufacture method (latter half) of mould.

Fig. 4: be shown schematically in preferred one of the manufacturing installation that uses in the manufacture method of antiglare film of the present inventionThe figure of example.

Fig. 5: the figure that is shown schematically in preferred precuring operation in the manufacture method of antiglare film of the present invention.

Fig. 6: the figure that schematically shows the unit cell (unitcell) of evaluating for dazzling.

Fig. 7: the figure that schematically shows the evaluating apparatus that dazzles.

Fig. 8: the figure that is illustrated in a part of the pattern A using in embodiment 1～3 and comparative example 1.

Fig. 9: the figure that is illustrated in a part of the pattern B using in comparative example 2.

Figure 10: represent pattern A and B to carry out discrete Fourier transform and the figure of the power spectrum Γ (f) that obtains.

Detailed description of the invention

Below, by reference to the accompanying drawings the preferred embodiment of the present invention is described as required, but this chi shown in the drawingsVery little grade is set arbitrarily for the ease of observation.

Antiglare film of the present invention is characterised in that, the r.m.s. roughness Rq when specifying intercepted length to measure is respectively upperIn the scope of stating, for the light with incidence angle 30 ゜ incidents, the reflectivity R that the reflectivity R (30) of angle of reflection 30 ゜ and angle of reflection are 40 °(40) ratio R (40)/R (30) is more than 0.00001 and below 0.0025.

First, for antiglare film of the present invention, to the side of solving of r.m.s. roughness Rq and luminance factor R (40)/R (30)Method describes.

[r.m.s. roughness Rq]

In antiglare film of the present invention, for the micro concavo-convex surface of the antiglare layer possessing in this antiglare film with intercepted lengthR.m.s. roughness Rq (0.08), Rq (0.25) when 0.08mm, 0.25mm, 0.8mm and 2.5mm measure, Rq (0.8) andRq (2.5) is respectively that 0.01 μ m is above and 0.05 μ m following, 0.05 μ m above and 0.1 μ m is following, 0.07 μ m is above and 0.12 μ mMore than below with 0.08 μ m and below 0.15 μ m. These Rq (0.08), Rq (0.25), Rq (0.8) and Rq (2.5) can by asDivide into location survey fixed condition, utilize and measure according to the method for JISB0601.

Rq (0.08): intercepted length 0.08mm, evaluation length 0.4mm

Rq (0.25): intercepted length 0.25mm, evaluation length 1.25mm

Rq (0.8): intercepted length 0.8mm, evaluation length 4mm

Rq (2.5): intercepted length 2.5mm, evaluation length 12.5mm

R.m.s. roughness while mensuration with appointment intercepted length refers to, from utilizing the assay method being specified by above-mentioned JISIn the section curve of obtaining, shield long wavelength's component of specifying more than intercepted length by high-pass filter, use so obtainsThe surface roughness that roughness curve is obtained. Therefore, the r.m.s. roughness while mensuration with intercepted length 0.08mm refers to, according toFrom above-mentioned section curve, remove the wavelength having more than 0.08mm concave-convex surface shape time roughness curve solve all sideRoot roughness, mainly evaluates having as the concave-convex surface shape of the wavelength below the 0.04mm of intercepted length 1/2. WithSample ground, the r.m.s. roughness while mensuration with intercepted length 0.25mm, 0.8mm or 2.5mm refers to, uses from above-mentioned section curveIn remove have that 0.25mm is above, 0.8mm above or roughness curve when the concave-convex surface shape of more than 2.5mm wavelength andThe surface roughness solving, mainly to having below the 0.125mm as intercepted length 1/2, below 0.4mm or below 1.25mmThe concave-convex surface shape of wavelength evaluate.

Rq (0.08) means that greatly the concave-convex surface shape of the antiglare layer that antiglare film of the present invention has has a large amount ofThere is the concave-convex surface shape of the wavelength below 0.04mm. Similarly, Rq (0.25) means that greatly antiglare layer has in a large number and hasThe concave-convex surface shape of the wavelength more than 0.04mm and below 0.125mm, Rq (0.8) means greatly to have in a large number to haveThe concave-convex surface shape of the above and wavelength below 0.4mm of 0.125mm, Rq (2.5) mean greatly have have in a large number 0.4mm withThe concave-convex surface shape of the wavelength above and below 1.25mm. If Rq (0.08) is lower than 0.01 μ m, short below wavelength 0.04mmThe concave-convex surface shape in cycle is considerably less, that is, form and have preventing of the antiglare layer that only formed by macrocyclic concave-convex surface shapeDizzy film, therefore its surperficial texture roughening. If Rq (0.08) is greater than 0.05 μ m, forms and there is strong generation by wavelength 0.04mmThe antiglare film of the antiglare layer of the scattering that following short-period concave-convex surface shape causes, therefore possesses the figure of such antiglare filmEasily produce whiting as display unit. Although the Rq of antiglare film of the present invention (0.08) is above-mentioned scope, be preferably 0.02 μMore than m and below 0.04 μ m.

If Rq (0.25) is less than 0.05 μ m, form the concave-convex surface more than thering is wavelength 0.04mm and below 0.125mmThe antiglare film of the antiglare layer that shape is few, thereby the image display device that possesses this antiglare film is being entered from positive (0～10 ° of left and right)When row is observed, its anti-glare is insufficient. If Rq (0.25) is greater than 0.1 μ m, the table more than wavelength 0.04mm and below 0.125mmFace concaveconvex shape increases. The concave-convex surface shape of such wave band especially with twinkling generation strong correlation, therefore possess that this is anti-dazzleThe image display device of film easily produces and dazzles. Although the Rq of antiglare film of the present invention (0.25) is above-mentioned scope, preferablyBe more than 0.06 μ m and below 0.08 μ m.

If Rq (0.8) is less than 0.07 μ m, form wavelength 0.125mm concave-convex surface shape above and below 0.4mm fewAntiglare layer, thereby from oblique (10～30 ° of left and right), the image display device that possesses the antiglare film with this antiglare layer is being enteredAnti-glare when row is observed becomes insufficient. If Rq (0.8) is greater than 0.12 μ m, wavelength 0.125mm is above and below 0.4mmConcaveconvex shape is too much, obtains easily producing the image display device of whiting. Although the Rq of antiglare film of the present invention (0.8) is above-mentionedScope, but more than being preferably 0.08 μ m and below 0.10 μ m.

If Rq (2.5) is less than 0.08 μ m, form few anti-dazzle of wavelength 0.4mm concaveconvex shape above and below 1.25mmLayer, thereby in the time observing possessing the image display device of the antiglare film with this antiglare layer from oblique (more than 30 °)It is insufficient that anti-glare becomes. If Rq (2.5) is greater than 0.15 μ m, above and macrocyclic recessed below 1.25mm of wavelength 0.4mmConvex form is too much, the surperficial texture roughening of antiglare film. Although the Rq of antiglare film of the present invention (2.5) is above-mentioned scope, excellentMore than electing 0.09 μ m as and below 0.11 μ m.

[luminance factor]

Then, describe for the method for solving of ratio R (the 40)/R (30) of reflectivity.

Fig. 1 is that the antiglare layer side that has from antiglare film of the present invention in order to simple declaration is during with 30 ° of incident lights of incidence angleThe accompanying drawing (stereogram) of reflectivity of each angle, schematically show from the light of antiglare layer side with respect to antiglare film 10Incident direction and reflection direction. In the figure, for the antiglare layer side in antiglare film 10 taking the angle incident apart from 20 as 30 ° of normalsIncident light 11, using the catoptrical reflectivity of the direction along 30 ° of angles of reflection, i.e. normal reflection direction 12 (being normal reflection rate) asR (30). In addition, the reverberation during by any angle of reflection θ represents with symbol 15, catoptrical direction 12 while measuring reflectivity,15 are located at and comprise incident direction of light 11 and normal 20 in interior face 30. And, establish along the reflectivity of the direction of 40 ° of angles of reflectionFor R (40).

In the time measuring the reflectivity of antiglare film, need precision to measure the reflectivity below 0.001% goodly. Therefore, makeBe effective with the wide detector of dynamic range, can preferably use so commercially available light power meter etc. At this light power meterLight hole is set before detector, uses the subtended angle of antiglare film is set as to the goniophotometer of 2 ° measures. As nowIncident light, can use the luminous ray of 380～780nm. As mensuration light source, can be by from the light sources such as halogen lamp light outAfter collimation, use, also can use laser etc. for monochromatic source and the high light source of the depth of parallelism. Level and smooth and transparent for the back sideWhen antiglare film solves reflectivity, sometimes measured value is impacted from the reflection at the antiglare film back side, need to avoid this impact.Therefore, measuring when reflectivity, preferably: will utilize adhesive to be sealed at black as the even surface of the antiglare film of determination objectAcrylic resin plate or make the liquid such as water, glycerine make it optics to be sealed at the acrylic resin plate of black, makes thusObtain the reflectivity that only can measure antiglare film outmost surface.

With regard to antiglare film of the present invention, for the incident light of 30 ° of incidence angles, the reflectivity of the direction that angle of reflection is 30 °,Ratio R (40)/R (30) of the reflectivity R (40) of the direction that normal reflection rate R (30) and angle of reflection are 40 ° be more than 0.00001 andBelow 0.0025. Having configured the anti-glare that is less than the image display device of 0.00001 antiglare film than R (40)/R (30) does not fillPoint. On the other hand, configure the image display device that is greater than 0.0025 antiglare film than R (40)/R (30) and easily produced whiting.In order to obtain having excellent anti-glare, fully to prevent the image display device that whiting produces, ratio R (the 40)/R (30) of antiglare film moreBe preferably more than 0.00005 and below 0.001.

[total mist degree, surperficial mist degree]

In order to show anti-glare, to prevent whiting, antiglare film of the present invention is to be with respect to total mist degree of vertical incidence lightScope more than 0.1% and below 3%, surperficial mist degree are the film of the scope more than 0.1% and below 2%. Total mist of antiglare filmDegree can be measured by the method based on method shown in JISK7136. Dispose total mist degree or surperficial mist degree lower than 0.1%The image display device of antiglare film cannot demonstrate sufficient anti-glare, therefore not preferred. In addition, total mist degree exceedes 3% feelingsUnder condition or surperficial mist degree exceed in 2% situation, the image display device that disposes this antiglare film can not whiten, therefore notPreferably. Also can there is also not enough such unfavorable condition of its contrast in such image display device.

Deduct surperficial mist degree and the internal haze obtained is more low more preferred with total mist degree. Dispose this internal haze higher thanThe tendency that the image display device of 2.5% antiglare film exists contrast to decline.

[with specify intercepted length measure time average length Sm]

In antiglare film of the present invention, the concave-convex surface shape of this antiglare layer is all sides while specifying intercepted length to measureRoot roughness is the concave-convex surface shape of above-mentioned scope, the average length while preferably mensuration with this appointment intercepted length be respectively withScope shown in lower. Specifically, the average length Sm (0.25) while preferably mensuration taking intercepted length 0.25mm more than 90 μ m andBelow 160 μ m, the average length Sm (0.8) while mensuration taking intercepted length 0.8mm is more than 100 μ m and below 300 μ m, to interceptAverage length Sm (2.5) when length 2.5mm measures is more than 200 μ m and below 400 μ m.

The antiglare film that Sm (0.25) is less than 90 μ m has the many antiglare layer of concave-convex surface shape that approach 50 μ m, has configured thisThe image display device of antiglare film sometimes easily produces and dazzles. The antiglare film that Sm (0.25) is greater than 160 μ m has macrocyclic tableThe antiglare layer that face concaveconvex shape is too much, the surperficial texture roughening sometimes of this antiglare film. Sm (0.8) is less than the antiglare film of 100 μ mThere is the concave-convex surface shape in the cycle with 100～200 μ m of the anti-glare while contributing to observe from oblique (10～30 ° of left and right)The antiglare layer that shape is few, configured this antiglare film image display device from oblique observe time anti-glare sometimes decline. Sm(0.8) antiglare film that is greater than 300 μ m has the too much antiglare layer of macrocyclic concave-convex surface shape, the surperficial texture of this antiglare filmSometimes roughening. The antiglare film that Sm (2.5) is less than 200 μ m has preventing while contributing to observe antiglare film from oblique (more than 30 °)The few antiglare layer of concave-convex surface shape in the cycle with 200～300 μ m of dizzy property, possesses the image display device of this antiglare filmThe anti-glare of observing when antiglare film from oblique (more than 30 °) sometimes decline. The antiglare film that Sm (2.5) is greater than 400 μ m has lengthThe too much antiglare layer of concave-convex surface shape in cycle, the surperficial texture roughening sometimes of this antiglare film.

[transmission definition (Fresh lightness) Tc, reflection definition Rc (45) and reflection definition Rc (60)]

The transmission definition sum Tc obtaining under following condition determination of antiglare film of the present invention be preferably 375% withOn. Transmission definition sum Tc can obtain as follows: utilize the method based on JISK7105, the light comb point of use specified width, which widthDo not measure image definition, then obtain its adduction. Particularly, using the ratio of the width of dark portion and bright portion is 1:1 and its widthFor five kinds of light comb of 0.125mm, 0.25mm, 0.5mm, 1.0mm and 2.0mm, measure respectively image definition, then obtain it and addClose, be made as Tc. In the case of Tc is disposed at lower than 375% antiglare film the image display device of fine more, sometimes holdEasily occur to dazzle. With regard to the upper limit of Tc, can be selecting in peaked scope below 500% as it, if but shouldTc is too high, the image display device that the anti-glare can obtain observing from front time easily reduces, and therefore this Tc is for example preferablyBelow 450%.

The reflection definition Rc (45) that the incident light that utilizes 45 ° of incidence angles of antiglare film of the present invention is measured is preferablyBelow 180%. Reflection definition Rc (45) is same with above-mentioned Tc, can utilize the method based on JISK7105 to measure, and uses above-mentionedIn five kinds of light comb, width is that four kinds of light combs of 0.25mm, 0.5mm, 1.0mm and 2.0mm are measured respectively image definition, and obtainsIts adduction, is made as Rc (45). Rc (45) is below 180% time, dispose such antiglare film image display device from justIt is more good that anti-glare when face and oblique observation becomes, therefore preferred. The lower limit of Rc (45) is not particularly limited, but for goodSuppress well whiting and twinkling generation, be preferably for example more than 80%.

The reflection definition Rc (60) that the incident light that utilizes 60 ° of incidence angles of antiglare film of the present invention is measured is preferablyBelow 240%. Except changing incidence angle, similarly utilize the method based on JISK7105 with reflection definition Rc (45)Measure reflection definition Rc (60). Rc (60) is below 240% time, dispose this antiglare film image display device from tiltedlyAnti-glare during to observation becomes more good, therefore preferred. The lower limit of Rc (60) is not particularly limited, but for more goodGround suppresses whiting and twinkling generation, is preferably for example more than 150%.

[manufacture method of antiglare film of the present invention]

Antiglare film of the present invention for example can be manufactured as described below. The 1st method comprises: prepare to be formed with at molded surfaceThe micro concavo-convex shape die for forming of the concave-convex surface shape based on given pattern, by the shape transferred thereon of the male and fomale(M&F) of this mould in thoroughlyAfter bright supporting mass, transfer printing there is is the transparent supporting mass of the shape of male and fomale(M&F) peel off from mould. The 2nd method comprises: prepare to compriseParticulate, resin (binding agent) and solvent and the composition of described microparticulate in resin solution, coat said compositionOn bright supporting mass, and be dried as required, the coated film (coated film that comprises particulate) forming is thus solidified. The 2nd sideIn method, adjust the cohesion shape of coating film thickness, particulate according to the drying condition of the composition of above-mentioned composition, above-mentioned coated film etc.State, makes particulate expose on the surface of coated film thus, thereby on transparent supporting mass, forms random concavo-convex. From the life of antiglare filmProduce the viewpoint of stability, production repeatability and set out, preferably utilize the 1st method to manufacture antiglare film of the present invention.

Here be elaborated for preferred the 1st method of the manufacture method as antiglare film of the present invention.

In order to form accurately the antiglare layer of the concave-convex surface shape with characteristic described above, that prepare is fine recessedConvex die for forming (below also referred to as " mould ") is important. More specifically, the concave-convex surface shape that mould has(below also referred to as " mould convex-concave surface ") pattern based on specifying and forming, and this given pattern is preferably with respect to spaceThe curve map of obtaining when the form of the intensity of frequency represents its one dimension power spectrum is at spatial frequency 0.015 μ m^－1Above and 0.05μm^－1Below there is a minimizing pattern. Here, described " pattern " refers to, the antiglare layer having in order to form antiglare filmMicro concavo-convex surface view data or there is transmittance section and the mask of light shielding part etc., be designated hereinafter simply as " pattern ".

First, for the pattern of determining the concave-convex surface shape in order to form the antiglare layer that antiglare film of the present invention hasMethod describe.

For example, the situation that is view data for this pattern illustrates the method for solving of the two-dimensional power spectrum of pattern. First,After this view data being converted to the binary image data of 2 tonal gradations, use binary function g (x, y) to represent this gray scale etc.Level. The binary function g (x, y) obtaining is carried out as shown in following formula (1) to Fourier transformation and calculate binary function G (f_x，f_y), for another example shown in following formula (2), to gained binary function G (f_x，f_y) absolute value get quadratic power, ask thus calculate twoDimension power spectrum Γ (f_x，f_y). Here, x and y presentation graphs are as the orthogonal coordinates in data surface. In addition, f_xAnd f_yRepresent respectively x directionAnd the frequency of y direction, there is the dimension of length inverse.

π in formula (1) is that pi, i are imaginary unit.

Γ(f_x,f_y)＝|G(f_x,f_y)|²Formula (2)

This two-dimensional power spectrum Γ (f_x，f_y) represent the spatial frequency distribution of pattern. Conventionally, requiring antiglare film is isotropism,Therefore, antiglare film manufacture of the present invention is also isotropism with pattern. Thus, represent the binary function of the two-dimensional power spectrum of patternΓ(f_x，f_y) can be by function of a single variable Γ (f) expression only depending on apart from the distance f of initial point (0,0). This function of a single variable Γ (f)Represent the One-dimensional power spectrum of pattern. Next, for by binary function Γ (f_x，f_y) ask the method for calculating function of a single variable Γ (f) to carry outExplanation. First, suc as formula (3) like that, utilize the binary function Γ (f of polar coordinate representation as the two-dimensional power spectrum of absolute altitude_x，f_y)。

Γ(f_x,f_y)=Γ (fcos θ, fsin θ) ... formula (3)

Here, θ is the drift angle in Fourier space. Function of a single variable Γ (f) can be by calculating polar coordinates suc as formula (4) like thatThe rotation of the binary function Γ (fcos θ, fsin θ) representing is on average obtained.

For precision good obtain antiglare film of the present invention, the One-dimensional power spectrum Γ (f) of preferred pattern is in spatial frequency0.015μm^－1Above and 0.05 μ m^－1Below there is minimum.

Ask in the situation of two-dimensional power spectrum of pattern, the binary function g (x, y) of tonal gradation is conventionally with discrete functionForm obtains. Now, calculate two-dimensional power spectrum by discrete Fourier transform. The One-dimensional power spectrum of pattern can be according to figureThe two-dimensional power spectrum of case is similarly obtained.

In addition, in order to make gained concave-convex surface be shaped as homogeneous and continuous curved surface, preferably make binary function g's (x, y)Mean value be the maximum of binary function g (x, y) and the minimum of a value of binary function g (x, y) difference 30～70%. Passing through lightQuarter method mfg. moulding die convex-concave surface situation under, the aperture opening ratio that this binary function g (x, y) is pattern. For by photoetching legal systemThe situation of modeling tool convex-concave surface, the aperture opening ratio of the pre-defined described pattern here. For photolithographic photoresist (レ ジ スBe ト) in the situation of positive photoresist, its aperture opening ratio refers to: in the time of the coated film delineate to this positive photoresist, and phaseFor the whole surf zone of this coated film, the shared ratio in region of exposure. On the other hand, for photolithographic photoresist beIn the situation of negative photoresist, its aperture opening ratio refers to: in the time of the coated film delineate to this negative photoresist, with respect toThe whole surf zone of this coated film, the shared ratio in region of exposure. Photoetching process is in the situation of disposable exposure, its openingRate refers to the transmittance section proportion of the mask with transmittance section and light shielding part.

Antiglare film of the present invention can obtain as follows: the One-dimensional power of pattern is composed at spatial frequency 0.015 μ m^－1WithGo up and 0.05 μ m^－1Below there is a minimum, manufacture desired mould, and use this mould, utilize above-mentioned the 1st methodManufacture antiglare film of the present invention.

In order to be produced on spatial frequency 0.015 μ m^－1Above and 0.05 μ m^－1Below there is minimizing One-dimensional power spectrumPattern, makes in advance collocation point forms randomly pattern or is determined by random number or the pseudo random number of utilizing computer to generateThe deep or light pattern (preparation pattern) with random lightness distribution is removed specific spatial frequency range from this preparation patternComponent. In order to remove the component of this specific spatial frequency range, make above-mentioned preparation pattern by bandpass filter.

In order to manufacture the antiglare film with the antiglare layer that is formed with the shape of the concave-convex surface based on given pattern, manufacture useWith by the concave-convex surface shape transferred thereon forming based on this given pattern in the mould with mould convex-concave surface of transparent supporting massTool. Above-mentioned the 1st method that uses such mould is to make the embossing of antiglare layer as feature on transparent supporting mass.

As above-mentioned embossing, can enumerate and use the photo-embossing method of light-cured resin, the hot pressing of use thermoplastic resinHua Fa etc. Wherein, from productive viewpoint, preferred light embossing.

Photo-embossing method is by (surface of transparent supporting mass) formation light-cured resin layer on transparent supporting mass, is inciting somebody to actionThis light-cured resin layer makes it solidify when being urged to the mould convex-concave surface of mould, thus by concavo-convex the mould of mould tableThe shape transferred thereon of face is in the method for light-cured resin layer. Specific as follows: to make on transparent supporting mass, to be coated with photo-curable treeFat and the light-cured resin layer that forms are sealed under the state of mould convex-concave surface, from transparent supporting side light irradiation (this lightWhat use is the light that can make light-cured resin curing) so that the light-cured resin (photocuring that light-cured resin layer is containedProperty resin) solidify, then, the transparent supporting mass of light-cured resin layer being formed with after solidifying is peeled off from mould. Just pass throughThe antiglare film that such manufacture method obtains, the light-cured resin layer after solidifying becomes antiglare layer. It should be noted that,From the viewpoint of the easy degree of manufacturing, as light-cured resin, preferably uv curing resin, uses this ultraviolet ray solidIn the situation of voltinism resin, the light of irradiation uses ultraviolet ray (below, will use uv curing resin to set as photo-curableThe embossing of fat is called " UV embossing "). For manufacture with polarizing coating integrated antiglare film, use polarizing coating as transparentSupporting mass, in the embossing being here illustrated, is replaced into polarizing coating by transparent supporting mass and implements.

Kind for the uv curing resin of UV embossing is not particularly limited, can be according to used transparentThe kind of supporting mass, the suitable resin of ultraviolet kind choice for use from commercial resins. Ultra-violet solidified tree like thisFat is to comprise by irradiation ultraviolet radiation photopolymerisable monomer (polyfunctional monomer), oligomer and polymer and they occurThe concept of mixture. That suitably selects by being used in combination according to the kind of uv curing resin in addition, is light-initiatedAgent, also can use also can be curing by the visible ray of wavelength ratio ultraviolet line length resin. This uv curing resinPreferences etc. are in aftermentioned explanation.

As the transparent supporting mass for UV embossing, can use such as glass, plastic foil etc. As plastic foil, as long asThere is the suitable transparency, mechanical strength can be used. Specifically for example can enumerate: by celluloses such as TAC (cellulose triacetate)Acetate esters resin; Acrylic resin; Polycarbonate resin; The polyester resins such as PETG; Poly-The transparent resin film that the polyolefin resin such as ethene, polypropylene etc. form. These transparent resin films can be solvent cast films, alsoIt can be extruded film.

The thickness of transparent supporting mass is for example 10～500 μ m, be preferably 10～100 μ m, 10～60 μ m more preferably. TransparentThe thickness of supporting mass, in the time of this scope, exists and obtains the tendency of antiglare film with abundant mechanical strength, possesses this antiglare filmImage display device is difficult for occurring to dazzle more.

On the other hand, heat embossing method is through heating and softening state by the transparent resin film being formed by thermoplastic resinUnder be pushed on mould convex-concave surface, by the concave-convex surface shape transferred thereon of this mould convex-concave surface in the method for transparent resin film. With, particularly, can be listed as also as long as optically transparent in fact film can be any film in the transparent resin film of heat embossing methodLift the material of enumerating as the transparent resin film for UV embossing.

Below, describe for the method for manufacturing the mould that is used for embossing.

About the manufacture method of mould, if the forming surface that makes this mould become can by above-mentioned based on given pattern andThe concave-convex surface shape transferred thereon that forms (can form the concave-convex surface shape that forms based on given pattern on transparent supporting massAntiglare layer) the scope of mould convex-concave surface, be not particularly limited, but in order to manufacture well this with high accuracy, repeatabilityThe antiglare layer of concave-convex surface shape, preferably photoetching process. Further, this photoetching process preferably includes following operation: [1] the 1st plating workOrder, [2] grinding step, [3] photosensitive resin film form operation, [4] exposure process, [5] developing procedure, [6] the 1st etching worksOrder, [7] photosensitive resin film stripping process, [8] the 2nd etching work procedures, [9] the 2nd plating operations.

Fig. 2 is a preferred example that schematically shows the first half of mould manufacturing method. Fig. 2 is schematically illustratedThe section of the mould in each operation. Below, each work of the manufacture method to antiglare film die for manufacturing of the present invention in conjunction with Fig. 2Order is elaborated.

[1] the 1st plating operation

First, prepare the base material (mould base material) for mould manufacture, implement copper facing at this mould with the surface of base material.By implementing copper facing at mould with the surface of base material in this wise, can make adaptation, the gloss of the chromium plating in aftermentioned the 2nd plating operationProperty improves. With regard to copper facing, because its covering property is high and smoothing effect is strong, therefore can use the small of base material by landfill mouldConcavo-convex, empty etc. and form the smooth and glossiness surface of tool. Thus, by implementing plating at mould with substrate surface in this wiseCopper, even implement chromium plating in the 2nd plating operation described later, also can eliminate the micro concavo-convex that is considered to be existed by base material,The chrome-plated surface that cavity causes coarse. In addition, because copper-plated covering property is high, reduce the generation of tiny crackle. Therefore,Make to form the concave-convex surface shape (micro concavo-convex surface configuration) based on given pattern at mould substrate forming face, also can fillPoint prevent the deviation causing because of surperficial impacts of substrate (mould base material) such as small concavo-convex, empty, crackles.

As the copper using in the copper facing of the 1st plating operation, can use the simple metal of copper, also can use taking copper asThe alloy (copper alloy) of principal component. Therefore be, the concept that comprises copper and copper alloy for copper-plated " copper ". Copper facing can be electricityPlating, also can be electroless plating, but the copper facing of the 1st plating operation preferably adopt plating. Further, in the 1st plating operation preferablyCoating be not only the coating that formed by copper coating, can be also that the coating that forms by copper coating with by the metal beyond copper is stackedThe coating forming.

The coating forming if implement copper facing on the surface at mould with base material is excessively thin, cannot thoroughly get rid of substrate tableThe impact of face (small concavo-convex, empty, crackle etc.), more than therefore its thickness is preferably 50 μ m. The upper limit of thickness of coating is notExist critically, but from the viewpoint of cost etc., be preferably below 500 μ m left and right.

Mould is preferably the base material of being made up of metal material with base material. Further, from the viewpoint of cost, as this goldBelong to the material of material, preferably aluminium, iron etc. Further, the convenience from the viewpoint of mould with the operation of base material, particularly preferably willThe base material of being made up of the aluminium of lightweight is as mould base material. It should be noted that, the described aluminium here, iron are also respectively without being pureMetal can be also the alloy taking aluminium or iron as principal component.

Mould with the shape of base material as long as shape suitable for the manufacture method of antiglare film of the present inventionCan. Particularly, can from tabular base material, cylindric base material or cylindric (tubular) base material etc., select. Manufacture continuously thisIn the situation of the antiglare film of invention, preferred mold is tubular. Such mould can be manufactured with base material by the mould of tubular.

[2] grinding step

In ensuing grinding step, to implemented the table of copper-plated mould base material in above-mentioned the 1st plating operationFace (coating) grinds. In the manufacture method of the mould adopting in the manufacture method of antiglare film of the present invention, preferably pass throughThis grinding step is ground to the state close to minute surface by mould with substrate surface. For the flat board using with base material as mouldThe commercially available product of shape base material, tubular base material, in order to make it reach desired precision, the machinings such as cutting, grinding of implementing more, andThus can be at the residual fine cutter trade of substrate surface for mould. So, even formed by the 1st plating operationPlating (being preferably copper facing) layer, sometimes also can residual above-mentioned cutter trade. In addition, even if implemented the plating in the 1st plating operationApply, also may not necessarily make the surface of mould base material reach completely level and smooth. , even to thering is such deep processing trace that remainsThe surperficial mould of mark etc. is implemented the operation of [3] described later～[9] with base material, the concave-convex surface shape of gained die surface also canCan there are differences with the concave-convex surface shape based on given pattern, or, caused by cutter trade etc. concavo-convex may be comprised.Manufacture in the situation of antiglare film with the mould of the impact that remains cutter trade etc., possibly cannot fully demonstrate targetThe optical characteristics such as anti-glare, cause the impact that cannot expect.

The Ginding process adopting in grinding step is not particularly limited, can be according to the mould as grinding object with base materialShape, proterties and select Ginding process. As the concrete example of Ginding process that can be applicable to grinding step, can enumerate mechanical lappingMethod, electrolytic polishing method and chemical grinding method etc. Wherein, as mechanical milling method, can use microstoning method, polishing, fluid to grindAny means in mill method, polishing wheel polishing etc. In addition, also can be by using cutting element to carry out mirror in grinding stepFace cutting, thus make the surface of mould base material become minute surface. With regard to the material of cutting element now, shape, can basisMould uses superhard cutter, CBN cutter, sintex, diamond cutter etc. by the kind of the material (metal material) of base material,But from the viewpoint of machining accuracy, preferably use diamond cutter. Surface roughness after grinding is with based on JISB0601The center line average roughness Ra of standard represents, is preferably below 0.1 μ m, more preferably below 0.05 μ m. Grind Hou centerWhen line average roughness Ra is greater than 0.1 μ m, may be at residual this rough surface of the mould convex-concave surface of the mould finally obtainingThe impact of degree. In addition, the lower limit of center line average roughness Ra is not particularly limited. Therefore, from grinding step, add man-hourBetween the viewpoint of (milling time), processing cost go out to send to determine lower limit.

[3] photosensitive resin film forms operation

Below, in conjunction with Fig. 2, photosensitive resin film being formed to operation describes.

Form in operation at photosensitive resin film, in the above-mentioned mirror ultrafinish of having passed through enforcement that grinding step obtainsMould is coated with photoresist is dissolved in to the solution (photoresist solution) that solvent forms with the surface 41 of base material 40, goes forward side by sideRow heating, dry, forms photosensitive resin film (photoresist film) thus. In Fig. 2, schematically show at base material 40 for mouldSurface 41 be formed with the state (Fig. 2 (b)) of photosensitive resin film 50.

As photoresist, can use the photoresist of conventional known, also can be using as photoresist and commercially availableResin directly or as required through filtration etc. refine after use. For example, divide generation to solidify as thering is photographic departmentThe photoresist of minus of character, can use (methyl) acrylic acid in molecule with acryloyl group or methacrylThe monomer of ester or prepolymer, two-fold nitride (bisazide) and the mixture of diene rubber, poly-vinyl cinnamate class chemical combinationThing etc. In addition, there is the stripping of sensitization part, the eurymeric of the character of residual not sensitization part only by developing as havingPhotoresist, can use phenolic resins class, line style phenolic resin class etc. Such eurymeric or the photoresist of minus are alsoCan be used as positive photoresist or negative photoresist and easily obtain from the market. In addition, in photoresist solution, also canTo coordinate the various additives such as sensitizer, development accelerant, adaptation improver, coating modifying agent as required, also canAfter being mixed with commercially available photoresist, such additive uses as photoresist solution.

For these photoresist solution coat are used to the surface 41 of base material 40 in mould, from forming more level and smooth sensitizationThe viewpoint of resin film is considered, preferably selects optimal solvent, uses photoresist is dissolved in such solvent alsoThe photoresist solution diluting and obtain. Such solvent also can come according to the kind of photoresist and dissolubility thereofSelect. Particularly, can from cellosolve kind solvent for example, propandiols solvent, esters solvent, alcohols solvent, ketones solvent,In high polar solvent etc., select. Use in the situation of commercially available photoresist, can be according to the kind of solvent contained in this photoresistClass or carry out suitable preliminary experiment and select optimal photoresist, and set it as photoresist solution and use.

As at mould with passing through of base material the method for surface-coated photoresist solution of mirror ultrafinish, Ke YigenFrom following known method, select by shape of base material etc. according to this mould: meniscus coating, jetting type coating, dip-coating, spin coating,Roller coat, the excellent coating that winds the line, airblade coating, blade coating, curtain coating, ring are coated with method (ringcoat) etc. Photoresist after coatingThe thickness of film is preferably the scope of 1～10 μ m, the scope of 6～9 μ m more preferably with dried thickness gauge.

[4] exposure process

Ensuing exposure process is by forming at photosensitive resin film the photoresist forming in operation to above-mentionedFilm 50 exposes, thus by the pattern transfer of target the operation to this photosensitive resin film 50. For the light source of exposure processSuitably select according to wavelength photoreceptor, the sensitivity etc. of photoresist contained in photosensitive resin film, for example, canUse: g line (wavelength: 436nm), h line (wavelength: 405nm) or the i line (wavelength: 365nm) of high-pressure mercury-vapor lamp, semiconductor laser(wavelength: 830nm, 532nm, 488nm, 405nm etc.), YAG laser (wavelength: 1064nm), KrF PRK (wavelength:248nm), ArF PRK (wavelength: 193nm), F2 PRK (wavelength: 157nm) etc. Exposure mode can be to makeCarrying out the mode of disposable exposure with the mask corresponding with the pattern of target, can be also to describe mode. It should be noted that,Pattern as target is, as what described, while representing One-dimensional power spectrum with the form of the intensity with respect to spatial frequencyCurve map at spatial frequency 0.015 μ m^－1Above and 0.05 μ m^－1Below there is a minimizing pattern.

In the manufacture method of mould, in order to form the concave-convex surface shape of this mould with high accuracy more, be preferably senseOn photosensitiveness resin molding, critically control under the state of target pattern and expose. In order to expose under such state, excellentChoosing is made view data by the pattern of target on computers, utilizes and is existed by the laser being sent by computer-controlled laser headOn photosensitive resin film, describe (laser is described) pattern based on this view data. Carry out laser while describing, for example can useGeneral laser drawing apparatus in galley making etc. As the commercially available product of such laser drawing apparatus, for example can enumerateLaserStreamFX ((strain) ThinkLaboratory system) etc.

Fig. 2 (c) schematically shows the state to photosensitive resin film 50 exposing patterns. Photosensitive resin film 50 comprisesIn the situation of the photoresist of minus, (for example, use in the situation of negative photoresist as photoresist solution), through exposing to the sunThe region 51 of light is accepted exposure energy and the cross-linking reaction of photoresist is occurred, thereby dissolubility in aftermentioned developer solution is fallenLow. Thus, in developing procedure, be dissolved by the developing without the region 52 of exposure, only residue in base material through the region 51 of exposureOn surface, become mask 60. In the situation of the photoresist that on the other hand, photosensitive resin film 50 comprises eurymeric, (for example, makeIn situation with positive photoresist as photoresist solution), accept exposure energy and sensitization occurs through the region 51 of exposureScission of link of property resin etc., becomes thus and is easily dissolved in developer solution described later. Thus, in developing procedure, through the region of exposure51 are dissolved by the developing, and only residue on substrate surface without the region 52 of exposure, become mask 60.

[5] developing procedure

In developing procedure, the photoresist that comprises minus at photosensitive resin film 50, without what exposeRegion 52 is dissolved by the developing, and remains in mould with on base material through the region 51 of exposure, becomes mask 60. On the other hand, sensitizationIn the situation of the photoresist that resin film 50 comprises eurymeric, be only dissolved by the developing through the region 51 of exposure, without exposureRegion 52 remain in mould with on base material, become mask 60. Form given pattern for the form with photosensitive resin filmBase material for mould, in the 1st etching work procedure, remain in the photosensitive resin film of mould on base material as aftermentioned the 1stMask in etching work procedure plays a role.

For the developer solution for developing procedure, can be according to the kind of used photoresist from conventional knownIn developer solution, select suitable developer solution. For example, this developer solution can be enumerated: NaOH, potassium hydroxide, sodium carbonate, sodium metasilicate,Secondary amine, triethylamine, the first such as primary amine class, diethylamine, di-n-butyl amine such as the inorganic base such as sodium metasilicate, ammoniacal liquor, ethamine, n-propylamineAlcamines, TMAH, the tetraethyl hydroxides such as the tertiary amines such as base diethylamide, dimethylethanolamine, triethanolamineThe alkaline aqueous solution of the cyclic amines such as the quaternary ammonium compound such as ammonium, trimethyl hydroxyethylammoniumhydroxide hydroxide, pyrroles, piperidines etc.; Dimethylbenzene,The organic solvents such as toluene etc.

Developing method in developing procedure is not particularly limited, and can adopt immersion development, spray developing, brush development, superSound wave development etc.

Fig. 2 (d) schematically shows and uses the resin of minus to carry out as photoresist after developing procedureState. In Fig. 2 (d), be dissolved by the developing without the region 52 of exposure, only residue on substrate surface through the region 51 of exposure,The photosensitive resin film in this region becomes mask 60. Fig. 2 (e) schematically shows and uses the resin of eurymeric to set as photonastyFat and carry out the state after developing procedure. In Fig. 2 (e), be dissolved by the developing through the region 51 of exposure, only without the district exposingTerritory 52 residues on substrate surface, and the photosensitive resin film in this region becomes mask 60.

[6] the 1st etching work procedures

The 1st etching work procedure is to use the above-mentioned photosensitive resin film on substrate surface for mould that remains in after developing procedureAs mask, mould is carried out to etched operation with the main coating in maskless region in substrate surface.

Fig. 3 schematically shows a preferred example of the latter half of mould manufacturing method. Fig. 3 (a) schematically showsGo out by the 1st etching work procedure mainly by the state after the coating etching in maskless region. Due to photosensitive resin film conductMask 60 plays a role, and therefore the coating of the bottom of mask 60 is not etched, but carries out along with etched, from maskless region45 etchings that start are carried out. Thus, existing near the region of mask 60 and the border in maskless region 45, be positioned at and coverThe coating of the bottom of mould 60 also can be etched. Like this, will exist the region of mask 60 and the border in maskless region 45 attachedThe coating of nearly mask 60 bottoms also etched situation is called lateral erosion.

Etch processes (the 1st etch processes) in the 1st etching work procedure is undertaken by following operation conventionally: use iron chloride(FeCl₃) liquid, copper chloride (CuCl₂) liquid, alkali etching liquid (Cu (NH₃)₄Cl₂) etc. etching solution, make mould with main in substrate surfaceBe positioned at coating (metal surface) corrosion in the region of maskless 60. As this etch processes, can use the strong acid such as hydrochloric acid, sulfuric acidAs etching solution, in the time forming this coating by plating, also can apply the anti-of current potential contrary when electroplating by employingEtch processes is carried out in electrolytic etching. Implement when etch processes at mould by the concave-convex surface shape forming on base material according to mouldWith etching in the kind of the constituent material (metal material) of base material or the kind of coating, photosensitive resin film and the 1st etching work procedureThe kind etc. of processing and different, cannot treat different things as the same, but is below 10 μ m in the situation that at etch quantity, from the mould contacting with etching solutionTool rises substantially isotropically etched with substrate surface. The described etch quantity here refers to, the coating of being cut down because of etchingThickness.

Etch quantity in the 1st etching work procedure is preferably 1～50 μ m, more preferably 2～10 μ m, 5～8 μ more preferablyM. In the situation of etch quantity lower than 1 μ m, substantially can not form concave-convex surface shape on mould, having of obtaining is almost smoothThe mould on surface, even if therefore manufacture antiglare film with this mould, gained antiglare film can not have concave-convex surface shape substantially yetShape. And with regard to having configured the image display device of such antiglare film, cannot demonstrate sufficient anti-glare. In addition, in erosionMeasure quarter in excessive situation, easily cause the concavo-convex difference of height of the mould convex-concave surface finally obtaining larger. Even if use this mouldTool is manufactured antiglare film, with regard to having configured the image display device of this antiglare film, also possibly cannot fully prevent sending out of whitingRaw. The 1st etch processes in the 1st etching work procedure can only be undertaken by the etch processes of 1 time, also can divide and carry out above for 2 timesEtch processes. Wherein, etch processes is being divided carry out above for 2 times in the situation that, preferably the etching in 2 above etch processesThe summation of amount is 1～50 μ m.

[7] photosensitive resin film stripping process

Ensuing photosensitive resin film stripping process is also residual using playing a role as mask 60 in the 1st etching work procedureBe stored in the operation that mould is removed with the photosensitive resin film on base material, preferably will remain in mould with on base material by this operationPhotosensitive resin film is removed completely. In photosensitive resin film stripping process, preferably use stripper that photosensitive resin film is moltenSeparate. As stripper, can use by concentration, the pH etc. of the material of enumerating as developer solution are changed to prepare moltenLiquid. Or, also can use the solution identical with the developer solution using in developing procedure, by changing with respect to developing procedureTemperature, dip time etc. are peeled off photosensitive resin film. In photosensitive resin film stripping process, for stripper and mouldBe not particularly limited with the contact method (stripping means) of base material, can adopt dipping peel off, spray peel off, brushly peel off, ultrasonicRipple is peeled off etc.

Fig. 3 (b) schematically shows will be as mask in the 1st etching work procedure by photosensitive resin film stripping process60 photosensitive resin films that use dissolve and the state removed completely. By the mask 60 and the erosion that are formed by photosensitive resin filmCarve and process, formed the 1st concave-convex surface shape 46 at mould with substrate surface.

[8] the 2nd etching work procedures

The 2nd etching work procedure is for making through the 1st etching work procedure and shape by further etch processes (the 2nd etch processes)The operation of the 1st concave-convex surface shape 46 passivation that become. By the 2nd etch processes, form through the 1st etch processes the 1stConcave-convex surface shape 46 places, the precipitous part of surface tilt disappears (below, by such surface tilt in concave-convex surface shape that makesThe situation of precipitous part passivation is called " shape passivation "). Fig. 3 (c) shows following state: by utilizing the 2nd etch processesMake the 1st concave-convex surface shape 46 of mould base material 40 that shape passivation occur, thereby, the part passivation that surface tilt is precipitous, shapeBecome to have the 2nd concave-convex surface shape 47 of mild surface tilt. The mould that carries out as described above the 2nd etch processes and obtainThe optical characteristics that tool has the antiglare film of the present invention that uses this mould and manufacture becomes more preferably effect.

The 2nd etch processes of the 2nd etching work procedure also can adopt the etching that uses the etching solution same with the 1st etching work procedureProcess and back-electrolysis etching. The degree of the shape passivation after the 2nd etch processes is (in the concave-convex surface shape after the 1st etching work procedureThe disappearance degree of the precipitous part of surface tilt) according to the method for the material of base material, the 2nd etch processes for mould and through the 1stEtching work procedure and therefore concavo-convex size and the degree of depth etc. and different in the concave-convex surface shape that obtains cannot treat different things as the same, but in controlThe most important factor in situation (degree of shape passivation) aspect of passivation processed is the etch quantity in the 2nd etch processes. The institute hereState etch quantity also with the situation of the 1st etching work procedure similarly, represent with the thickness of the base material cut down because of the 2nd etch processes.If the etch quantity of the 2nd etch processes is little, for the shape passivation of the concave-convex surface shape obtaining by the 1st etching work procedureEffect become insufficient. Therefore, use the antiglare film of the inadequate mould manufacture of shape passivation to whiten sometimes. AnotherAspect, if the etch quantity in the 2nd etch processes is excessive, the concave-convex surface shape forming through the 1st etching work procedure concavo-convexBasic disappearance, may obtain having almost smooth surperficial mould. Use so almost smooth surperficial mould that hasThe antiglare film that tool is manufactured, its anti-glare may be insufficient. Therefore, the etch quantity of the 2nd etch processes is preferably in the scope of 1～50 μ mIn, more preferably in the scope of 4～20 μ m, further preferably in the scope of 13～18 μ m. About the 2nd etch processes, also withThe 1st etching work procedure similarly, can be undertaken by the etch processes of 1 time, also can divide and carry out above etch processes 2 times. Wherein, existEtch processes is divided in the situation of carrying out above for 2 times, preferably the summation of the etch quantity in 2 above etch processes is 1～50 μm。

[9] the 2nd plating operations

The final stage of mould manufacture is, to passed through above-mentioned [6] and [7] operation base material for mould, be preferably throughThe 2nd plating work of plating (being preferably chromium plating described later) is implemented on the surface of having crossed the mould base material of the operation of above-mentioned [6]～[8]Order. By carrying out the 2nd plating operation, in making the mould further passivation of concave-convex surface shape 47 of base material, can pass throughThis plating is protected die surface. Fig. 3 (d) shows the 2nd surface by forming through the 2nd etch processes as described aboveOn concaveconvex shape 47, forming chromium coating 71, there is the state of shape passivation (mould convex-concave surface 70) in concave-convex surface shape.

As the coating forming by the 2nd plating operation, from thering is gloss, hardness is high, coefficient of friction is little, it is good to obtainThe aspect of good release property is considered, preferably chromium plating. In chromium plating, be particularly preferably called as so-called gloss chromium plating, decoration chromium platingDeng the chromium plating of demonstration good gloss. Chromium plating is undertaken by electrolysis conventionally, bathes as its plating, can use and comprise anhydrous chromic acid(CrO₃) and a small amount of sulphur aqueous acid as plating solution. By regulating current density and electrolysis time, can control chromium coatingThickness.

By the plating in enforcement like this 2nd plating operation, preferably chromium plating, can obtain antiglare film manufacture use of the present inventionMould. Implement chromium plating by the mould to after the 2nd etch processes by the concave-convex surface shape of substrate surface, can obtain and occurShape passivation, the mould that its case hardness is improved simultaneously. Most important aspect the degree of control shape passivation nowFactor be the thickness of chromium coating. If this thin thickness, the degree of shape passivation is insufficient, uses the anti-of such mould acquisitionIts reflectivity of dizzy film R (30) and ratio R (40)/R (30) of reflectivity R (40) are greater than 0.0025 sometimes. On the other hand, if chromium coatingThickness blocked up, be sometimes less than 0.00001 than R (40)/R (30). The discoveries such as the inventor, in order to obtain can be fully anti-The generation of only whitening, the antiglare film with the image display device of excellent anti-glare, so that the thickness of chromium coating reaches fingerThe mode mfg. moulding die of determining scope is effective. , the thickness of chromium coating preferably in the scope of 1～10 μ m, more preferably 3～In the scope of 6 μ m.

For the chromium coating forming through the 2nd plating operation, preferably so that Vickers hardness reaches more than 800 modesForm, more preferably so that the mode that Vickers hardness reaches more than 1000 form. The Vickers hardness of chromium coating is lower than 800 situationUnder, while manufacturing antiglare film with mould, the tendency that exists the durability that causes this mould to reduce.

Below, for the method as in order to manufacture antiglare film of the present invention and preferred above-mentioned photo-embossing method is saidBright. As mentioned above, as photo-embossing method, particularly preferably UV embossing, here, for using active energy ray-curable resinEmbossing be specifically described.

Manufacture by photo-embossing method in the situation of antiglare film of the present invention in order to manufacture continuously antiglare film of the present invention,Preferably include following operation:

[P1] working procedure of coating: coating contains active energy ray-curable resin on by the transparent supporting mass of continuous transportCoating liquid, thereby form overlay;

[P2] main curing process: die surface is being pushed under the state on overlay surface, is shining from transparent supporting sidePenetrate active energy beam.

In addition, in the situation that manufacturing antiglare film of the present invention by photo-embossing method, more preferably comprise following operation:

[P3] precuring operation: working procedure of coating [P1] afterwards, curing process [P2] before, to the width of overlayBoth sides end regions irradiate active energy beam.

Below, by reference to the accompanying drawings each operation is elaborated. Fig. 4 schematically shows for antiglare film of the present inventionThe preferred example of manufacturing installation of manufacture method. Arrow in Fig. 4 represents the carrying direction of film or the direction of rotation of roller.

[P1] working procedure of coating

In working procedure of coating, the coating liquid that coating contains active energy ray-curable resin on transparent supporting mass, therebyForm overlay. Working procedure of coating as shown in Figure 4, with respect to the transparent supporting mass 81 being exported from outlet roller 80, is applyingDistrict 83 is coated with the coating liquid that contains actinic energy ray curable resion composition.

The coating of coating liquid on transparent supporting mass 81 can by intaglio plate rubbing method for example, nick version rubbing method, excellent painting method,Scraper for coating method, airblade coating method, lick painting method, mould Tu Fa etc. and carry out.

(transparent supporting mass)

Transparent supporting mass 81, as long as having the supporting mass of light transmission, can use such as glass, plastic foil etc. AsPlastic foil, as long as have the appropriate transparency, mechanical strength. Particularly, can use above-mentioned conduct for UV embossingTransparent supporting mass and any supporting mass in the supporting mass enumerated, further, in order to manufacture continuously this by photo-embossing methodThe antiglare film of invention, can select to have appropriate flexible material.

For the screening characteristics of improvement coating liquid, improve the object of the cementability of transparent supporting mass and overlay, can be to thoroughlyVarious surface treatments are implemented on the surface (overlay side surface) of bright supporting mass 81. As surface treatment, can enumerate: corona discharge placeReason, glow discharge processing, acid surfaces processing, alkali surface treatment, ultraviolet treatment with irradiation etc. In addition, also can be in transparent supportingOn body 81, form other layer such as such as priming coat, and on this other layer coating liquid coating.

In addition, as antiglare film of the present invention, manufacture and polarizing coating are integrated in the situation of antiglare film, in order to improveCementability between bright supporting mass and polarizing coating, preferably in advance by various surface treatments the surface to transparent supporting mass (with paintingThe surface of the contrary side of coating) carry out hydrophiling. This surface treatment also can be carried out after the manufacture of antiglare film.

(coating liquid)

Coating liquid contains active energy ray-curable resin, conventionally further comprises Photoepolymerizationinitiater initiater (radical polymerizationClose initator). Also can comprise as required light transmission particulate, organic solvent equal solvent, levelling agent, dispersant, antistaticThe various additives such as agent, anti-fouling agent, surfactant.

(1) active energy ray-curable resin

As active energy ray-curable resin, can preferably use and for example contain multifunctional (methyl) acrylate chemical combinationThe resin of thing. Described multifunctional (methyl) acrylate compounds is in molecule, to have at least 2 (methyl) acryloxiesCompound. As the concrete example of multifunctional (methyl) acrylate compounds, for example can enumerate: polyalcohol and (methyl) acrylic acidThe ester compounds, carbamate (methyl) acrylate compounds, polyester (methyl) acrylate compounds, the epoxy that formThe multifunctional polymerization compound that (methyl) acrylate compounds etc. comprises 2 above (methyl) acryloyl groups etc.

As polyalcohol, for example can enumerate: ethylene glycol, diethylene glycol, triethylene glycol, TEG, polyethylene glycol, the third twoAlcohol (プ ロ ピ レ Application グ リ コ ー Le), DPG, tripropylene glycol, four propane diols, polypropylene glycol, propane diols (プ ロ パ Application ジオ ー Le), butanediol, pentanediol, hexylene glycol, neopentyl glycol, 2-ethyl-1,3-hexylene glycol, 2,2 '-dihydroxyethylsulfide, Isosorbide-5-Nitrae-2 yuan of alcohol that cyclohexanedimethanol is such; Trimethylolpropane, glycerine, pentaerythrite, two glycerine, dipentaerythritol, two three3 yuan of above alcohol that hydroxymethyl-propane is such.

As polyalcohol and the carboxylate that (methyl) acrylic acid forms, specifically can enumerate: ethylene glycol bisthioglycolate (methyl) acrylic acidEster, diethylene glycol two (methyl) acrylate, 1,6-hexylene glycol two (methyl) acrylate, neopentyl glycol two (methyl) acrylic acidEster, trimethylolpropane tris (methyl) acrylate, trimethylolethane trimethacrylate (methyl) acrylate, tetramethylol methane three(methyl) acrylate, 1,6-hexylene glycol two (methyl) acrylate, tetramethylol methane four (methyl) acrylate, five gather sweetOil three (methyl) acrylate, pentaerythrite three (methyl) acrylate, pentaerythrite four (methyl) acrylate, glycerine three(methyl) acrylate, dipentaerythritol three (methyl) acrylate, dipentaerythritol four (methyl) acrylate, two seasons penta 4Alcohol five (methyl) acrylate, dipentaerythritol six (methyl) acrylate.

As carbamate (methyl) acrylate compounds, can enumerate and in 1 molecule, there are multiple NCOsOrganic isocyanate and the ammonia reactant of esterification of (methyl) acrylic acid derivative with hydroxyl. Multiple as having in 1 moleculeThe organic isocyanate of NCO, can enumerate: hexamethylene diisocyanate, IPDI, toluene twoIsocyanates, naphthalene diisocyanate, methyl diphenylene diisocyanate, XDI, dicyclohexyl methyl hydrideIn 1 molecule such as vulcabond, there is the organic isocyanate, these organic isocyanates of 2 NCOs through isocyanuric acidIn ester modified, adduct modification, biuret modified 1 molecule forming, there is organic isocyanate of 3 NCOs etc. DoFor thering is (methyl) acrylic acid derivative of hydroxyl, can enumerate: (methyl) acrylic acid 2-hydroxy methacrylate, (methyl) acrylic acid 2-hydroxylBase propyl ester, (methyl) acrylic acid 4-hydroxyl butyl ester, (methyl) acrylic acid 2-hydroxyl butyl ester, (methyl) acrylic acid 2-hydroxyl-3-benzeneOxygen base propyl ester, pentaerythritol triacrylate.

As polyester (methyl) acrylate compounds, be preferably and make hydroxyl polyester react and obtain with (methyl) acrylic acidPolyester (methyl) acrylate arriving. The hydroxyl polyester preferably using is by polyalcohol and carboxylic acid or have multiple carboxylsThe hydroxyl polyester that compound and/or its acid anhydrides obtain through esterification. As polyalcohol, can enumerate and aforesaid compound phaseSame polyalcohol. In addition, except polyalcohol, also can enumerate bisphenol-A as phenols etc. As carboxylic acid, can enumerate formic acid, secondAcid, butyl carboxylic acid, benzoic acid etc. As compound and/or its acid anhydrides with multiple carboxyls, can enumerate: maleic acid, adjacent benzene twoFormic acid, fumaric acid, itaconic acid, adipic acid, terephthalic acid (TPA), maleic anhydride, phthalic anhydride, trimellitic acid, cyclohexaneDicarboxylic acid anhydride etc.

In multifunctional (methyl) as above acrylate compounds, improve and obtain from the intensity of its solidfied materialEasiness aspect is considered, preferably hexylene glycol two (methyl) acrylate, neopentyl glycol two (methyl) acrylate, diethylene glycol two(methyl) acrylate, tripropylene glycol two (methyl) acrylate, trimethylolpropane tris (methyl) acrylate, pentaerythriteThe ester compounds such as three (methyl) acrylate, dipentaerythritol six (methyl) acrylate; Hexamethylene diisocyanate and (firstBase) addition product of acrylic acid 2-hydroxy methacrylate; The addition of IPDI and (methyl) acrylic acid 2-hydroxy methacrylateThing; The addition product of toluene di-isocyanate(TDI) and (methyl) acrylic acid 2-hydroxy methacrylate; Adduct modification isophorone two isocyanic acidsThe addition product of ester and (methyl) acrylic acid 2-hydroxy methacrylate; And biuret modified IPDI and (methyl) thirdThe addition product of olefin(e) acid 2-hydroxy methacrylate. Further, these multifunctional (methyl) acrylate compounds can be distinguished use separately,Or two or more is used in combination.

In active energy ray-curable resin, except above-mentioned multifunctional (methyl) acrylate compounds, also canTo contain simple function (methyl) acrylate compounds. As simple function (methyl) acrylate compounds, for example can enumerate:(methyl) methyl acrylate, (methyl) ethyl acrylate, (methyl) butyl acrylate, (methyl) isobutyl acrylate, (methyl)Tert-butyl acrylate, (methyl) acrylic acid 2-hydroxy methacrylate, (methyl) acrylic acid 2-hydroxy propyl ester, (methyl) acrylic acid hydroxyl fourthEster, (methyl) acrylic acid 2-hydroxyl butyl ester, (methyl) acrylic acid 2-hydroxyl-3-phenoxy group propyl ester, (methyl) acrylic acid shrink sweetGrease, acryloyl morpholine, NVP, (methyl) tetrahydrofurfuryl acrylate, (methyl) cyclohexyl acrylate, (firstBase) 2-EHA, (methyl) isobornyl acrylate, acetyl group (methyl) acrylate, (methyl) acrylic acid benzylEster, (methyl) acrylic acid 2-ethoxy ethyl ester, (methyl) acrylic acid 3-methoxyl group butyl ester, ethyl carbitol (methyl) acrylic acidEster, phenoxy group (methyl) acrylate, oxirane modification phenoxy group (methyl) acrylate, epoxy pronane modification (methyl) thirdOlefin(e) acid ester, nonyl phenol (methyl) acrylate, oxirane modification (methyl) acrylate, epoxy pronane modification nonyl phenol (firstBase) acrylate, methoxyl group diethylene glycol (methyl) acrylate, 2-(methyl) acryloxy ethyl-2-hydroxypropyl neighbour(methyl) third such as phthalic acid ester, (methyl) acrylic acid dimethylamino ethyl ester, methoxyl group triethylene glycol (methyl) acrylateAlkene esters of gallic acid. These compounds can be distinguished use separately, or two or more is used in combination.

In addition, active energy ray-curable resin also can contain polyreactive oligomers. Oligomeric by containing polymerismThing, can adjust the hardness of solidfied material. Polyreactive oligomers can be for example above-mentioned multifunctional (methyl) acrylate compounds,Be ester compounds, carbamate (methyl) acrylate compounds, the polyester (first that polyalcohol and (methyl) acrylic acid formBase) such oligomer such as dimer, trimer of acrylate compounds or epoxy (methyl) acrylate etc.

As other polyreactive oligomers, can enumerate: by the polyisocyanic acid in molecule with at least 2 NCOsEster and there is carbamate (methyl) acrylate that the polyalcohol of at least 1 (methyl) acryloxy obtains through reactionOligomer. As polyisocyanates, can enumerate: hexamethylene diisocyanate, IPDI, toluene two isocyanidesThe polymer of acid esters, methyl diphenylene diisocyanate, XDI etc., as having at least 1 (firstBase) polyalcohol of acryloxy, can enumerate the hydroxyl (first being obtained through esterification by polyalcohol and (methyl) acrylic acidBase) acrylate, and polyalcohol is for example 1,3-BDO, BDO, 1,6-hexylene glycol, diethylene glycol, triethylene glycol,Neopentyl glycol, polyethylene glycol, polypropylene glycol, trimethylolpropane, glycerine, pentaerythrite, dipentaerythritol etc. This has at leastThe polyalcohol of 1 (methyl) acryloxy is that a part and (methyl) acrylic acid generation esterification of alcohol hydroxyl group of polyalcohol is anti-Should and there is alcohol hydroxyl group to remain in the polyalcohol in molecule.

In addition, as other the example of polyreactive oligomers, can enumerate by thering is the compound of multiple carboxyls and/or itsPolyester (methyl) acrylate that acid anhydrides obtains through reacting with the polyalcohol with at least 1 (methyl) acryloxy is oligomericThing. As compound and/or its acid anhydrides with multiple carboxyls, can enumerate with at above-mentioned multifunctional (methyl) acrylate chemical combinationIdentical compound and/or its acid anhydrides in polyester (methyl) acrylate of thing, recorded. In addition, as thering is at least 1 (firstBase) polyalcohol of acryloxy, can enumerate and the phase of recording in above-mentioned carbamate (methyl) acrylate oligomerSame polyalcohol.

Except polyreactive oligomers as above, as the example of carbamate (methyl) acrylate oligomerSon, can further enumerate: make isocyanates and hydroxyl polyester, hydroxyl polyethers or hydroxyl (methyl) acrylateHydroxyl reaction and the compound that obtains. The hydroxyl polyester preferably using is by polyalcohol and carboxylic acid or has the change of multiple carboxylsThe hydroxyl polyester that compound and/or its acid anhydrides obtain through esterification. As polyalcohol, there is the compound of multiple carboxylsAnd/or its acid anhydrides, can enumerate respectively and polyester (methyl) acrylate chemical combination at multifunctional (methyl) acrylate compoundsThe identical compound of recording in thing. The hydroxyl polyethers preferably using is one kind or two or more by addition on polyalcoholAlkylene oxide and/or 6-caprolactone and the hydroxyl polyethers that obtains. Polyalcohol can be with to can be used for above-mentioned hydroxyl polyester manyThe identical polyalcohol of unit's alcohol. As hydroxyl (methyl) acrylate of preferred use, can enumerate with at polyreactive oligomersIdentical hydroxyl (methyl) acrylate of record in carbamate (methyl) acrylate oligomer. As isocyanatesClass, preferably has the compound of more than 1 NCO, particularly preferably toluene di-isocyanate(TDI), hexa-methylene two in moleculeThe divalent such as isocyanates, IPDI isocyanate compound.

These polyreactive oligomers compounds can use separately respectively or and use two or more.

(2) Photoepolymerizationinitiater initiater

Photoepolymerizationinitiater initiater can according to be applicable to the active energy beam that antiglare film of the present invention manufactures kind and suitablySelect. In addition, use in the situation of electron beam as active energy beam, sometimes also will not contain the coating of Photoepolymerizationinitiater initiaterLiquid is for antiglare film manufacture of the present invention.

As Photoepolymerizationinitiater initiater, for example can use: acetophenone is that Photoepolymerizationinitiater initiater, benzoin are that photopolymerization causesAgent, benzophenone series Photoepolymerizationinitiater initiater, thioxanthones are that Photoepolymerizationinitiater initiater, triazine are that Photoepolymerizationinitiater initiater, oxadiazole is lightPolymerization initiator etc. In addition, as Photoepolymerizationinitiater initiater, for example can also use: 2,4,6-trimethylbenzoyl diphenylPhosphine oxide, 2,2 '-bis-(Chloro-O-Phenyl)-4,4 ', 5,5 '-tetraphenyl-1,2 '-bis-imidazoles, 10-butyl-2-chloro-acridine ketone, 2-secondBase anthraquinone, benzil, 9,10-phenanthrenequione, camphorquinone, methyl benzoylformate, two cyclopentadiene titanium compounds etc. Penetrate with respect to active-energyLine curable resin 100 weight portions, the use amount of Photoepolymerizationinitiater initiater is generally 0.5～20 weight portion, is preferably 1～5 weightPart.

In order to improve the screening characteristics of coating liquid with respect to transparent supporting mass, in coating liquid, sometimes also comprise organic solvent etc. moltenAgent. As organic solvent, can consider viscosity etc. and from following solvents choice for use: the fat such as hexane, cyclohexane, octaneFamily's hydrocarbon; The aromatic hydrocarbon such as toluene, dimethylbenzene; The alcohols such as ethanol, 1-propyl alcohol, isopropyl alcohol, n-butyl alcohol, cyclohexanol; Methyl ethyl ketone,The ketone such as methyl iso-butyl ketone (MIBK), cyclohexanone; The ester classes such as ethyl acetate, butyl acetate, isobutyl acetate; Ethylene glycol monomethyl ether,The glycol ethers such as ethylene glycol monomethyl ether, TC, propylene glycol monomethyl ether, propane diols list ethylether; Second twoThe esterification glycol ethers such as alcohol monomethyl ether acetate, propylene glycol monomethyl ether; 2-methyl cellosolve, 2-ethyoxyl secondThe cellosolve such as alcohol, butoxy ethanol class; 2-(2-methoxy ethoxy) ethanol, 2-(2-ethoxy ethoxy) ethanol, 2-(2-Butoxy ethyoxyl) the carbitol class such as ethanol etc. These solvents can use separately, also can be as required and by multiple mixingUse. After coating, need to make above-mentioned organic solvent evaporation. For this reason, preferably boiling point the scope of 60 DEG C～160 DEG C. In addition, preferredSaturated vapor at 20 DEG C is pressed in the scope of 0.1kPa～20kPa.

In the solvent-laden situation of coating liquid bag, preferably after above-mentioned working procedure of coating, arrange before the 1st curing process make moltenAgent evaporation and carry out dry drying process. Dry example that can be is as shown in Figure 4 such, by making to possess the transparent of overlaySupporting mass 81 in dry section 84 by carrying out. Baking temperature can be according to the kind of used solvent, transparent supporting mass andSuitably select. Conventionally the scope of 20 DEG C～120 DEG C, but be not limited thereto. In addition, drying oven has in multiple situations,Can change temperature for each drying oven. The thickness of dried overlay is preferably 1～30 μ m.

Thus, form the duplexer that transparent supporting mass and overlay are laminated.

[P2] curing process

This operation is by the mould convex-concave surface (forming surface) with desired concave-convex surface shape is being pushed onUnder the state on overlay surface, irradiate active energy beam from transparent supporting side, overlay is solidified, thereby in transparent supportingOn body, form the operation of curing resin bed. Thus, can be in making overlay curing, by the surface of mould convex-concave surfaceConcaveconvex shape is needed on overlay surface. Mould used herein is the mould of tubular, is the mould manufacture in above-mentioned explanationThe mould that uses the mould base material of tubular to manufacture in method.

This operation can be as shown in Figure 4, and for example, the ultraviolet ray that is disposed at transparent supporting mass 81 sides by utilization is irradiatedDevice isoreactivity energy-ray irradiation unit 86 is at coating region 83, (carrying out dry in the situation that, is dry section 84, carries out aftermentionedThe situation of precuring operation under, further comprise the precuring of carrying out the irradiation based on active energy beam irradiation unit 86District) pass through have overlay duplexer irradiate active energy beam carry out.

First, utilize niproll 88 press fit devices such as grade that the mould of tubular 87 is pushed on through stacked after curing processThe surface of the overlay of body, and under this state, use active energy beam irradiation unit 86 to irradiate from transparent supporting mass 81 sidesActive energy beam, thus overlay 82 is solidified. Here, described " overlay is solidified " refers to, makes in this overlay containedActive energy ray-curable resin accept the energy of active energy beam and curing reaction occur. Use niproll for anti-Only to sneak between the overlay of duplexer and mould be effective to bubble. Active energy beam irradiation unit can use 1Platform, also can use many.

Irradiate after active energy beam, duplexer is peeled off from mould 87 taking the niproll 89 of outlet side as fulcrum. With regard to instituteTransparent supporting mass and curing overlay, this curing overlay becomes antiglare layer, obtains antiglare film of the present invention. InstituteObtaining the common tunicle coiler device 90 of antiglare film reels. Now, for the object of protection antiglare layer, can peel off across having againProperty the diaphragm that formed by PETG, polyethylene etc. in antiglare layer surface laminating of adhesive phase inReel. It should be noted that, the mould that used is here illustrated for the situation of cylindrical die, but also canUse tubular mould in addition. In addition, also can irradiate at the active energy beam appending after mould is peeled off.

As the active energy beam using in this operation, can be according to the active energy ray-curable comprising in coating liquidThe kind of resin and from ultraviolet ray, electron beam, near ultraviolet ray, visible ray, near infrared ray, infrared ray, X ray etc. suitably choosingSelect, in these, preferably ultraviolet ray and electron beam, from the viewpoint of easy and simple to handle, can obtain high-energy, particularly preferably ultraviolet(as mentioned above, as photo-embossing method, preferably UV embossing).

As ultraviolet light source, for example can use: Cooper-Hewitt lamp, middle medium pressure mercury lamp, high-pressure mercury-vapor lamp, high-pressure waterSilver lamp, carbon arc lamp, Non-polarized lamp, metal halide lamp, xenon arc lamp etc. In addition, can also use accurate point of ArF PRK, KrFSub-laser, Excimer lamp or synchrotron radiation light etc. In these, preferably use extra-high-pressure mercury vapour lamp, high-pressure mercury-vapor lamp, low-pressure mercuryLamp, Non-polarized lamp, xenon arc lamp, metal halide lamp.

In addition, as electron beam, can enumerate by Cockcroft-Wal pause (CockcroftWalton) type, model DegePressgang (VandeGraaff) type, resonance variable-pressure, insulating core variable-pressure, linear pattern, that rice (Dynamitron) type, heightWhat frequently the various electron-beam accelerators of type etc. discharged have 50～1000keV, the preferred electron beam of the energy of 100～300keV.

Active energy beam is in ultraviolet situation, and the accumulative total light quantity under ultraviolet UVA is preferably 100mJ/cm²WithGo up and 3000mJ/cm²200mJ/cm more preferably below,²Above and 2000mJ/cm²Below. In addition, owing to also there being transparentThe ultraviolet situation of holding body absorption short wavelength side, therefore ultraviolet accumulative total light quantity in UVV (395～445nm) is preferredFor 100mJ/cm²Above and 3000mJ/cm²200mJ/cm more preferably below,²Above and 2000mJ/cm²Below. Accumulative total light quantityLower than 100mJ/cm²Situation under, overlay curing insufficient, exists and causes the lower hardness of gained antiglare layer or solidThe resin of changing is attached to deflector roll etc. and becomes the tendency of the reason that causes that operation pollutes. In addition, accumulative total light quantity exceedes 3000mJ/cm²Situation under, the heat of being radiated by ultraviolet lamp may become and causes transparent supporting mass to shrink and wrinkling reason.

[P3] precuring operation

This operation is the end to the both sides of the width of the transparent supporting mass of overlay before above-mentioned curing processArea illumination active energy beam, thus make the operation of this region, both ends precuring. Fig. 5 schematically shows precuringThe profile of operation. In Fig. 5, the end regions 82b of the width of overlay (direction vertical with carrying direction) is bagContain the end of overlay in region interior and specified width, which width from end.

In precuring operation, by making in advance end regions solidify, can make in end regions and transparent supporting mass 81Adaptation further improve, thereby in the operation after curing process, prevent under the part generation exfoliation because of cured resinAnd pollution operation. End regions 82b can be made as for example district more than 5mm and below 50mm from the end of overlay 82Territory.

The irradiation of the active energy beam that the end regions of overlay is carried out, referring to Fig. 4 and Fig. 5, for example, can be passed throughUtilize near the ultraviolet lamp isoreactivity energy-ray irradiation unit 85 in both ends that is arranged at respectively overlay 82 sidesTo coating region 83 (carry out dry in the situation that, be dry section 84) by after the transparent supporting mass 81 with overlay 82 shinePenetrate active energy beam and carry out. Active energy beam irradiation unit 85 is as long as can be to the end regions 82b of overlay 82The device that irradiates active energy beam, can be arranged at transparent supporting mass 81 sides.

About kind and the light source of active energy beam, same with main curing process. Active energy beam is ultravioletIn situation, the accumulative total light quantity under ultraviolet UVA is preferably 10mJ/cm²Above and 400mJ/cm²50mJ/ more preferably below,cm²Above and 400mJ/cm²Below. By with 50mJ/cm²Above accumulative total light quantity is irradiated, and can more effectively preventDistortion in main curing process. It should be noted that, accumulative total light quantity exceedes 400mJ/cm²Time, curing reaction excessively carries out, its knotReally, may cause on the border of cured portion and uncured portion, be caused resin stripping by the distortion of film thickness difference, internal stressFrom.

[purposes of antiglare film of the present invention]

The antiglare film of the present invention obtaining as described above can be used for image display device etc., conventionally can be used as and watches lateral deviationThe watching side diaphragm of vibration plate and fit in polarizing coating and use (surface that, is disposed at image display device). In addition, as aboveDescribed, using polarizing coating as transparent supporting mass in the situation that, in order to obtain the one-piece type antiglare film of polarizing coating, also can be byThe one-piece type antiglare film of such polarizing coating is used for image display device. The image display device that possesses antiglare film of the present invention existsIn wide viewing angle, there is sufficient anti-glare, and can prevent well whiting and twinkling generation.

Embodiment

Below, enumerating embodiment is described in more detail the present invention. In example, represent " % " of content or use amountAnd " part " is weight basis in the situation that there is no specified otherwise.

Mould in following example or the evaluation method of antiglare film are as described below.

[1] mensuration of the surface configuration of antiglare film

(surface roughness parameter of concave-convex surface shape)

By the method according to JISB0601, use the surfagauge Surftest of (strain) Mitutoyo systemSJ-301 has measured the surface roughness parameter of antiglare film. In order to prevent the warpage of working sample, use optically transparent bondingAgent, fits in the face with antiglare layer opposition side of working sample after glass substrate, for mensuration.

[2] mensuration of the optical characteristics of antiglare film

(mist degree)

Total mist degree of antiglare film is measured as follows: for antiglare film, use optically transparent adhesive, by working sampleThe face of a side contrary to antiglare layer fits in glass substrate, and to fitting in the antiglare film of this glass substrate, from glass substrate sideIncident light, utilizes the haze meter " HM-that in method based on JISK7136, use (strain) village, color technical research institute manufactures150 " type is measured. By obtaining the internal haze of antiglare film and deducting internal haze according to the total mist degree of following formula, thusCan obtain surperficial mist degree.

Surface mist degree=total mist degree-internal haze

Internal haze is measured as follows: utilize glycerine to paste in the anti-dazzle aspect of the working sample after the mensuration of total mist degreeClose mist degree and be substantially 0 tri cellulose acetate membrane, then utilize with the method that always mist degree is identical and measure.

(transmission definition)

Utilize the method based on JISK7105, the reflection mensuration that uses SugaTestInstruments (strain) to makeInstrument " ICM-1DP " has been measured the transmission definition of antiglare film. Now, in order to prevent the warpage of sample, also use optically transparentAdhesive fits in after glass substrate the face of a side contrary to antiglare layer of working sample for measuring. Under this state, make lightFrom the incident of glass substrate side, measure. The measured value here, be use the width of dark portion and bright portion be respectively 0.125mm,Five kinds of light combs of 0.25mm, 0.5mm, 1.0mm and 2.0mm are measured respectively the aggregate value of the value obtaining.

(the reflection definition of measuring under 45 ° of angles of light)

Utilize the method based on JISK7105, the reflection mensuration that uses SugaTestInstruments (strain) to makeInstrument " ICM-1DP " has been measured the reflection definition of antiglare film. Now, in order to prevent the warpage of sample, also use optically transparentAdhesive fits in after black acrylic resin substrate the face of a side contrary to antiglare layer of working sample for measuring. ShouldUnder state, make light from anti-dazzle aspect side with 45 ° of incidents, measure. The measured value is here use dark portion and bright portion wideDegree is respectively the aggregate value of four kinds of light comb values that mensuration obtains respectively of 0.25mm, 0.5mm, 1.0mm and 2.0mm.

(the reflection definition of measuring under 60 ° of angles of light)

Utilize the method based on JISK7105, the reflection mensuration that uses SugaTestInstruments (strain) to makeInstrument " ICM-1DP " has been measured the reflection definition of antiglare film. Now, in order to prevent the warpage of sample, also use optically transparentAdhesive fits in after black acrylic resin substrate the face of a side contrary to antiglare layer of working sample for measuring. ShouldUnder state, make light from anti-dazzle aspect side with 60 ° of incidents, measure. The measured value is here use dark portion and bright portion wideDegree is respectively the aggregate value of four kinds of light comb values that mensuration obtains respectively of 0.25mm, 0.5mm, 1.0mm and 2.0mm.

From the direction of 30 ° of the normal slopes with respect to this antiglare film, the antiglare layer of antiglare film is irradiated from wavelengthThe directional light of the He-Ne laser of 543.5nm, changes the angle of the reflectivity in the plane that comprises embrane method line and direction of illuminationMeasure. The mensuration of reflectivity has all been used " the 329203Opticalpower of Yokogawa Electric Corporation's systemSensor " and " 3292Opticalpowermeter ".

[3] evaluation of the anti-dazzle performance of antiglare film

(visual assessment of mirroring, whitening)

In order to prevent the reflection from the back side of antiglare film, the face of a side contrary to antiglare layer of working sample is fitted inBlack acrylic acid resin plate, with fluorescent lamp bright indoor, visually observe from antiglare layer side, to fluorescent lampThe degree mirroring, the degree of whiting have been carried out visual assessment. About mirroring, respectively for observing mirroring when antiglare film from frontDegree and evaluating from oblique 30 ° of degree that mirror of observing when antiglare film. Mirror and whiten respectively according to 1～3 threeGrade, evaluate based on following benchmark.

Mirror 1: do not observe and mirror.

2: observe and mirror a little.

3: observe and mirror clearly.

Whiting 1: do not observe whiting.

2: observe a little whiting.

3: observe clearly whiting.

(twinkling evaluation)

According to following program appraisal dazzle. , first, prepared having as illustrated with plane in Fig. 6The photomask of unit cell pattern. In this figure, unit cell 100 is on transparent substrate, be formed with hook-type with live width 10 μ mChromium light-shielding pattern 101, the part that does not form this chromium light-shielding pattern 101 becomes peristome 102. Here the unit cell adopting,Be of a size of: 211 μ m × 70 μ m (indulge × horizontal stroke of figure), therefore peristome is of a size of 201 μ m × 60 μ m (indulge × horizontal stroke of figure). ByMultiple illustrated unit cells, through arranging in length and breadth, form photomask.

Then,, as shown in the schematic cross sectional view of Fig. 7, the chromium light-shielding pattern 111 of photomask 113 is placed in upwardOn lamp box 115, will utilize adhesive by antiglare film 110 so that its antiglare layer becomes that surperficial mode fits in glass plate 117The sample obtaining is placed on photomask 113. In lamp box 115, dispose light source 116. Under this state, in apart from the about 30cm of samplePosition 119 visually observe, divide thus 7 grades to carry out sensory evaluation to twinkling degree. Level 1 is corresponding to completelyUnconfirmed to twinkling state, level 7 corresponding to significantly observing twinkling state, level 4 is that the utmost point is faintly observed twinklingState.

(evaluation of contrast)

Peel off double-edged polarization plates from commercially available LCD TV [Sony's (strain) system " KDL-32EX550 "]. Replace thisA little original polarization plates, side and display surface side are all via adhesive laminating Sumitomo Chemical (strain) polarization plates " Sumikaran processed overleafSRDB831E " and make these polarization plates absorption axes separately consistent with the absorption axes of original polarization plates, then, via bondingAgent becomes surperficial mode by the antiglare film shown in following example with its male and fomale(M&F) and is fitted on display surface lateral deviation vibration plate. Will be thusThe LCD TV obtaining starts in darkroom, utilizes (strain) TOPCON luminance meter processed " BM5A " type to measure black show state and aobvious in vainShow the brightness under state, and calculate contrast. Here, contrast with the brightness of white show state with respect to black show stateThe ratio of brightness represents. As a result of, by the contrast of measuring under the state that is fitted with antiglare film with respect to do not fit anti-The ratio of the contrast of measuring under the state of dizzy film illustrates.

[4] evaluation of pattern for antiglare film manufacture

Making the pattern data of making is the binary image data of 2 tonal gradations, with discrete function g (x, the y) table of binaryShow tonal gradation. Make horizontal resolution Δ x and the Δ y of discrete function g (x, y) be 2 μ m. By the binary function g (x, y) obtainingCarry out discrete Fourier transform, obtain binary function G (f_x，f_y). By binary function G (f_x，f_y) absolute value squared, calculateGo out the binary function Γ (f of two-dimensional power spectrum_x，f_y), calculate the One-dimensional power spectrum as the function of the distance f with respect to initial pointFunction of a single variable Γ (f).

< embodiment 1 >

(making of antiglare film die for manufacturing)

Ba Lade copper facing (Copper バ ラ ー De is implemented on aluminium roller (based on the A6063 of the JIS) surface of having prepared diameter 300mmめ っ I) material that forms. Ba Lade copper facing is made up of copper coating/thin silvering/surface copper coating, the thickness of coating entiretyBe set as approximately 200 μ m. This copper coatings is carried out to mirror ultrafinish, at the copper coatings photosensitive resin coating after grinding alsoBe dried, formed photosensitive resin film. Then the pattern that, utilizes laser that pattern A repeated arrangement is as shown in Figure 8 formedOn photosensitive resin film, expose, and develop. Use LaserStreamFX ((strain) ThinkLaboratory system) carry out the exposure based on laser and developed. As photosensitive resin film, use the sense that comprises eurymericThe resin molding of photosensitiveness resin. At this, pattern A is logical by multiple Gaussian function type bands by the pattern with random lightness distributionWave filter is made, and is that aperture opening ratio is 45.0%, One-dimensional power is composed at frequency 0.0195 μ m^－1There is minimizing pattern.

Subsequently, utilize copper chloride liquid to carry out the 1st etch processes. Etch quantity is now set as 5 μ m. From the 1st etchingRoller after reason is removed photosensitive resin film, again utilizes copper chloride liquid to carry out the 2nd etch processes. Etch quantity is now set as13 μ m. Then, carry out chromium plating processing, made mould A. Now, chromium plating thickness is set as 4 μ m.

(making of antiglare film)

Following each composition is dissolved in ethyl acetate according to 60% solid component concentration, has prepared can form after solidifying aobviousShow the ultra-violet solidified resin composition A of the film of 1.53 refractive index.

60 parts of pentaerythritol triacrylates

40 parts of multifunctional ammonia esterification of acrylic esters

(product of hexamethylene diisocyanate and pentaerythritol triacrylate)

5 parts of diphenyl (2,4,6-trimethoxy benzoyl) phosphine oxides

By this ultra-violet solidified resin composition A so that the thickness of dried coating layer reaches the mode of 5 μ m is coated withOn cellulose triacetate (TAC) film of thickness 60 μ m, in the drier that is set in 60 DEG C, be dried 3 minutes. Utilize rubber rollersDried film so that becoming the mode of die side, dried overlay is pushed on to the forming surface of mould A obtained above(having the face of concave-convex surface shape) also makes it closely sealed. Under this state, from TAC film side exposure intensity 20mW/cm²From heightThe light of medium pressure mercury lamp also makes this light reach 200mJ/cm with h line conversion quantometer², overlay is solidified, manufacture thus anti-dazzleFilm. Then, gained antiglare film is peeled off from mould, made the transparent antiglare film A that possesses antiglare layer on TAC film.

< embodiment 2 >

Make similarly and make with the mould A of embodiment 13 μ m except the chromium plating thickness in chromium plating processing is set asMould B, and made similarly to Example 1 antiglare film except mould A is replaced into mould B. This antiglare film is doneFor antiglare film B.

< embodiment 3 >

Make similarly and make with the mould A of embodiment 15 μ m except the chromium plating thickness in chromium plating processing is set asMould C, and made similarly to Example 1 antiglare film except mould A is replaced into mould C. This antiglare film is doneFor antiglare film C.

< comparative example 1 >

Make similarly and make with the mould A of embodiment 12 μ m except the chromium plating thickness in chromium plating processing is set asMould D, and made similarly to Example 1 antiglare film except mould A is replaced into mould D. This antiglare film is doneFor antiglare film D.

< comparative example 2 >

Prepare the surface of the aluminium roller (based on the A6063 of JIS) to diameter 200mm and implement the material that Ba Lade copper facing forms,Expose to by laser on the photosensitive resin film pattern of the pattern B shown in repeated arrangement Fig. 9, in addition, with embodiment 1Mould A make similarly make mould E, except mould A being replaced into mould E, made similarly to Example 1 preventDizzy film. Using this antiglare film as antiglare film E. Herein, pattern B is by multiple Gausses by the pattern with random lightness distributionFunction type bandpass filter is made, and is that aperture opening ratio is 45.0%, the One-dimensional power of pattern is composed at frequency 0.015 μ m^－1AboveAnd 0.05 μ m^－1Below there is minimizing pattern.

< comparative example 3 >

Mirror ultrafinish is carried out on the surface of the aluminium roller (based on the A5056 of JIS) to diameter 300mm, uses sand blasting unit ((strain)Only making is made) to the aluminium face after grinding with blasting pressure 0.1MPa (gauge pressure, lower with), pearl use amount 8g/cm²(the list of rollerBit table area 1cm²Use amount, lower with) sandblast zirconium oxide bead TZ-SX-17 (eastern Cao (strain) system, average grain diameter: 20 μ m), are aluminiumRoller surface has been given concavo-convex. The aluminium roller with concavo-convex obtaining is carried out to electroless nickel plating processing, made mould F. Now, by nothingElectrolytic ni plating thickness is set as 15 μ m. Mould A is replaced with to mould F, in addition, made similarly to Example 1 anti-dazzleFilm. Using this antiglare film as antiglare film F.

< comparative example 4 >

Prepare the surface of the aluminium roller (based on the A5056 of JIS) to diameter 200mm and implemented the material that Ba Lade copper facing formsMaterial. Ba Lade copper facing is made up of copper coating/thin silvering/surface copper coating, and the thickness of coating entirety is approximately 200 μ m. To thisCopper coatings is carried out mirror ultrafinish, re-use sand blasting unit ((strain) only making is made) to this abradant surface with blasting pressure0.05MPa (gauge pressure, lower same), pearl use amount 6g/cm²Sandblast zirconium oxide bead " TZ-SX-17 " (eastern Cao (strain) system, average grain diameter:20 μ m), for having given concavo-convex in aluminium roller surface. The copper facing aluminium roller with concavo-convex obtaining is carried out to chromium plating processing, made mould G.Now, chromium plating thickness is set as to 6 μ m. Mould A is replaced with to mould G, in addition, made similarly to Example 1 anti-Dizzy film. Using this antiglare film as antiglare film G.

[for the manufacture of the One-dimensional power spectrum of the pattern of each mould]

Figure 10 is equivalent to represent the pattern using in the making of antiglare film A～E (embodiment 1～3, comparative example 1 and 2)A and B carry out discrete Fourier transform and the figure of power spectrum Γ (f).

[evaluation result]

About above embodiment and comparative example, in the result of shown in table 1, above-mentioned antiglare film being evaluated.

Table 1

Meet the antiglare film A～C (embodiment 1～3) of important document of the present invention although be low haze, no matter it is also positiveBe that oblique viewing angle all has excellent anti-glare, whiting and twinkling inhibition are also abundant. On the other hand, antiglare filmThere is whiting in D (comparative example 1). Antiglare film E (comparative example 2) from oblique observe time anti-glare deficiency. Antiglare film F (relativelyExample 3) easily occur to dazzle. Antiglare film G (comparative example 4) from oblique observe time anti-glare deficiency.

Symbol description

10 antiglare film,

The incidence angle (30 °) of 11 light, 12 reverberation along positive and negative firing angle (30 °),

40 mould base materials,

41 substrate surfaces for mould (plating layer) after the 1st plating operation and grinding step,

46 the 1st concave-convex surface shapes that form by the 1st etch processes,

The 47 concave-convex surface shapes of having carried out shape passivation by the 2nd etch processes,

50 photosensitive resin films, 60 masks,

There is the surface of shape passivation in the concave-convex surface shape after 70 chromium plating,

71 chromium coatings,

80 outlet rollers, 81 transparent supporting masses, 83 coating regions,

86 active energy beam irradiation units, the mould of 87 tubulars,

88,89 niprolls, 90 film coiler devices.

Industrial applicability

Antiglare film of the present invention is useful for image display devices such as liquid crystal displays.

Claims (3)

1. an antiglare film, it possesses transparent supporting mass and is formed at and has a micro concavo-convex surface on this transparent supporting massAntiglare layer, is characterized in that,

Total mist degree of this antiglare film is more than 0.1% and below 3%,

Surface mist degree is more than 0.1% and below 2%,

R.m.s. roughness Rq (0.08) while mensuration taking intercepted length 0.08mm is more than 0.01 μ m and below 0.05 μ m,

R.m.s. roughness Rq (0.25) while mensuration taking intercepted length 0.25mm is more than 0.05 μ m and below 0.1 μ m,

R.m.s. roughness Rq (0.8) while mensuration taking intercepted length 0.8mm is more than 0.07 μ m and below 0.12 μ m,

R.m.s. roughness Rq (2.5) while mensuration taking intercepted length 2.5mm is more than 0.08 μ m and below 0.15 μ m,

For the light with incidence angle 30 ゜ incidents, the reflectivity R (40) that the reflectivity R (30) of angle of reflection 30 ゜ and angle of reflection are 40 ° itBe more than 0.00001 and below 0.0025 than R (40)/R (30).

2. antiglare film as claimed in claim 1, is characterized in that,

Average length Sm (0.25) while mensuration taking intercepted length 0.25mm is more than 90 μ m and below 160 μ m,

Average length Sm (0.8) while mensuration taking intercepted length 0.8mm is more than 100 μ m and below 300 μ m,

Average length Sm (2.5) while mensuration taking intercepted length 2.5mm is more than 200 μ m and below 400 μ m.

3. antiglare film as claimed in claim 1 or 2, is characterized in that,

It is saturating that five kinds of light combs that the width that uses dark portion and bright portion is 0.125mm, 0.25mm, 0.5mm, 1.0mm and 2.0mm are measuredIt is more than 375% penetrating definition sum Tc,

The width that uses dark portion and bright portion is 0.25mm, 0.5mm, 1.0mm and 2.0mm four kinds of light combs are with 45 ° of the incidence angles of lightThe reflection definition sum Rc (45) measuring is below 180%,

The width that uses dark portion and bright portion is 0.25mm, 0.5mm, 1.0mm and 2.0mm four kinds of light combs are with 60 ° of the incidence angles of lightThe reflection definition sum Rc (60) measuring is below 240%.