CN105629669A - Photoetching equipment - Google Patents
Photoetching equipment Download PDFInfo
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- CN105629669A CN105629669A CN201410604047.9A CN201410604047A CN105629669A CN 105629669 A CN105629669 A CN 105629669A CN 201410604047 A CN201410604047 A CN 201410604047A CN 105629669 A CN105629669 A CN 105629669A
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- balance mass
- driving device
- mass block
- work stage
- mask platform
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Abstract
The invention discloses photoetching equipment, characterized by comprising a foundation platform, a wafer stage, a reticle stage, a wafer stage driving device, a reticle stage driving device and a balance mass, wherein the wafer stage, the reticle stage, the wafer stage driving device, the reticle stage driving device and the balance mass are placed on the foundation platform; the balance mass is respectively connected with the wafer stage platform driving device and the reticle stage driving device, so as to realize synchronous reverse motion of the wafer stage driving device and the wafer stage driving device in the scanning exposure process of the photoetching equipment.
Description
Technical field
The present invention relates to a kind of integrated circuit equipment manufacturing field, particularly relate to a kind of lithographic equipment.
Background technology
In super large-scale integration optical lithography, determine that the wide principal element of Micropicture extra fine wire is the photoetching resolution of lithographic equipment, and the synchronous scanning campaign of mask and substrate is one of key factor affecting photolithography resolution. Along with the raising of LSI devices integrated level, litho machine working resolution requires more and more high, it is ensured that photoetching resolution, is necessary for raising and holds bed (mask platform) and be synchronized with the movement precision and the scanning speed of wafer-supporting platform (base station/work stage). In order to improve litho machine resolving power, can pass through on the one hand to reduce two platform synchronized movement errors; On the other hand to reduce platform as far as possible and be synchronized with the movement in process, particularly accelerate, impact on complete machine framework in moderating process.
At present, work stage and reticle stage system generally all adopt balance weight technology to solve in platform motor process, particularly accelerate, impact on complete machine framework in moderating process. So-called balance weight technology utilizes principle of conservation of momentum exactly: be arranged on the balance weight that quality is bigger by the stator of motor, and mover and balance weight support with air-bearing respectively; Under the mover interaction with stator, they just move respectively in the opposite direction.
Prior art proposes and will hold bed and wafer-supporting platform is integrally forming, thus can move simultaneously, effectively reduce synchronous motion error. Changing method relatively simple but be integrated by two sports platforms, work stage is carrying out substrate measurement, and in alignment flow process, mask also to move simultaneously, can increase the relative sliding of mask, and the realization of the method and to control difficulty higher.
Prior art also proposed a kind of litho machine, by equal to work stage, mask platform and optical projection system 90-degree rotation, it is achieved that work stage and mask platform, in the motion of vertical plane, reduce the platform motion impact on complete machine framework. The method realizes significantly improving realizing difficulty and controlling difficulty of work stage and mask platform, relatively costly.
Summary of the invention
In order to overcome the defect existed in prior art, the present invention provides a kind of lithographic equipment, it is possible to simplify current scanline photo-etching machine work-piece platform and mask platform structure, and is effectively improved in scan exposure process the net synchronization capability of alignment system.
In order to realize foregoing invention purpose, disclosure one lithographic equipment, it is characterized in that, including: a basic platform, and it is positioned at the work stage on described basic platform, mask platform, work stage driving device, mask platform driving device and balance mass, described balance mass connects described work stage driving device and mask platform driving device respectively, and the synchronous backward in order to realize work stage and mask platform described in described lithographic equipment scan exposure process moves.
Further, described balance mass includes the first balance mass block and the second balance mass block, described first balance mass block is connected with the motor stator of described work stage driving device, described second balance mass block is connected with the motor stator of described mask platform driving device, when the electric mover of described work stage driving device drives work stage positive movement, the motor stator making described work stage driving device drives described first balance mass block adverse movement, described second balance mass block is made to drive the motor stator positive movement of described mask platform driving device, the electric mover making described mask platform driving device drives described mask platform adverse movement.
Further, described balance mass includes the first balance mass block and the second balance mass block, described first balance mass block is connected with the motor stator of described work stage driving device, described second balance mass block is connected with the motor stator of described mask platform driving device, when the electric mover of described mask platform driving device drives mask platform positive movement, the motor stator making described mask platform driving device drives described second balance mass block adverse movement, described first balance mass block is made to drive the motor stator positive movement of described work stage driving device, the electric mover making described work stage driving device drives described work stage adverse movement.
Further, the first balance mass block of described balance mass and the second balance mass block are connected by a balance mass connector and relative motion occur.
Further, described balance mass connector includes being positioned at the first firmware of the first balance mass block, being positioned at the second firmware of described second balance mass block and connect the linking arm of described first firmware and the second firmware, described first firmware motion is driven by described first balance mass block, described linking arm is made to drive described second firmware to move in the opposite direction, thus driving described second balance mass block motion.
Further, described first firmware and the second firmware all include slide block and slide rail, described linking arm is connected with the first balance mass block and the second balance mass block respectively by described slide block, described slide rail is arranged along the direction vertical with the balance mass direction of motion, described slide block can slide on described slide rail, thus driving described linking arm to realize the first balance mass block and the relative motion of the second balance mass block.
Further, described balance mass connector includes the first connector, the second connector and connects the gear of described first connector and the second connector, the other end of described first connector is connected with described first balance mass block, and the other end of described second connector is connected with described second balance mass block.
Further, described balance mass also includes an air supporting module, and described air supporting module is used for making formation air film between described balance mass and described basic platform.
Further, described work stage, mask platform are connected with described basic platform respectively through guide rail.
Further, described lithographic equipment also includes lighting unit, projection objective, reflecting mirror group one and reflecting mirror group two; In scan exposure process, lighting unit sends light beam below mask and irradiates the exposure figure mask so that it is be imaged on reflecting mirror group one place, and then light beam enters projection objective, then through reflecting mirror group two, final exposure figure is imaged in the substrate of work stage.
Scan orientation system in conventional lithography machine, including the work stage of the carrying mask platform of mask and bearing basement, is respectively adopted design balance block technology and solves in platform motor process the impact on complete machine framework. This patent is characterized in that change conventional lithography machine layout, by being originally only used for reducing the balance mass unit of work stage impulsive force, simultaneously as mask platform Long travel driver element, it is achieved the Scan orientation function in litho machine.
Compared with prior art, the present invention, by effectively utilizing balance mass principle, improves mask platform, the net synchronization capability of work stage; Simplifying work stage in tradition scanning litho machine, mask platform separately designs driver element, the structure of balance mass unit; By realizing work stage, mask platform synchronous scanning from driving force aspect, reduce the control difficulty of Scan orientation system in conventional lithography machine.
Accompanying drawing explanation
Can be described in detail by invention below about the advantages and spirit of the present invention and institute's accompanying drawings is further understood.
Fig. 1 is the structural representation of lithographic equipment involved in the present invention;
Fig. 2 is the connected mode schematic diagram of work stage driving device, balance mass unit and mask platform driving device;
Fig. 3 is one of structural representation of balance mass unit;
Fig. 4 is the two of the structural representation of balance mass unit.
Detailed description of the invention
Specific embodiments of the invention are described in detail below in conjunction with accompanying drawing.
The present invention relates to a kind of lithographic equipment, including a basic platform, and it is positioned at the work stage on described basic platform, mask platform, work stage driving device, mask platform driving device and balance mass, described balance mass connects described work stage driving device and mask platform driving device respectively, and the synchronous backward in order to realize work stage and mask platform described in described lithographic equipment scan exposure process moves.
Alternatively, described balance mass includes the first balance mass block and the second balance mass block, described first balance mass block is connected with the motor stator of described work stage driving device, described second balance mass block is connected with the motor stator of described mask platform driving device, when the electric mover of described work stage driving device drives work stage positive movement, the motor stator making described work stage driving device drives described first balance mass block adverse movement, described second balance mass block is made to drive the motor stator positive movement of described mask platform driving device, the electric mover making described mask platform driving device drives described mask platform adverse movement.
Alternatively, described balance mass includes the first balance mass block and the second balance mass block, described first balance mass block is connected with the motor stator of described work stage driving device, described second balance mass block is connected with the motor stator of described mask platform driving device, when the electric mover of described mask platform driving device drives mask platform positive movement, the motor stator making described mask platform driving device drives described second balance mass block adverse movement, described first balance mass block is made to drive the motor stator positive movement of described work stage driving device, the electric mover making described work stage driving device drives described work stage adverse movement.
Fig. 1 is the structural representation of lithographic equipment involved in the present invention. As it is shown in figure 1, litho machine of the present invention includes with lower part: projection objective 11, reflecting mirror group 10, reflecting mirror group 12, work stage, work stage driving device 13, balance mass 14, mask platform, mask platform driving device 17, lighting unit 18, vibration absorption unit 15, basic platform 16. In scan exposure process, first exposure figure on mask is imaged on reflecting mirror group 10 place through lighting unit 18, effect by reflecting mirror group 10, image is made to enter projection objective 11, exposure figure after imaging is ultimately imaged in work stage the basal surface of carrying through reflecting mirror group 12, it is achieved exposure. In this scan exposure process, mainly formed scan exposure by work stage and mask platform synchronous backward motion in the Y direction.
Wherein, balance mass 14 includes balance mass unit 14a, 14b and 14c, and balance mass unit 14c is used for connecting balance mass unit 14a, 14b.
As shown in Figure 2, work stage driving device 13, the part that balance mass 14(balance mass 14 extends to both sides is not shown) and the on-link mode (OLM) of mask platform driving device 17 as follows: illustrate for work stage driving device Y1 to layout, the Y1 of work stage driving device 13 connects balance mass unit 14a to motor stator 22, the Y1 of work stage driving device 13 is connected to electric mover 21 with work stage Chuck20, realize work stage Chuck20 motion on work stage Y1 direction guiding rail 23, simultaneously, mass balance mass unit 14b is connected to motor stator 32 with the Y1 of mask platform driving device 17, the Y1 of mask platform driving device 17 is connected to electric mover 31 with mask platform Chuck30, realize mask platform Chuck30 motion on mask platform Y1 direction guiding rail 33. according to this catenation principle and mass conservation law, when the Y1 in work stage driving device 13 moves to electric mover 21, Y1 is subject to equal in magnitude to electric mover 21 with the Y1 in work stage driving device 13 to motor stator 22, active force in opposite direction, drive balance mass unit 14a motion, simultaneously, balance mass unit 14b is subject to equal in magnitude with balance mass unit 14a, active force in opposite direction, the Y1 driving mask platform driving device 17 moves to motor stator 32, in like manner, the Y1 of mask platform driving device 17 is subject to equal in magnitude to motor stator 32 with the Y1 of mask platform driving device 17 to electric mover 31, active force in opposite direction, drive mask platform Chuck30 motion on mask platform Y1 direction guiding rail 33, realize the reverse sync motion of work stage Chuck20 and mask platform Chuck30.
In addition, owing to mask platform Chuck30 is not required to realize at any time and being synchronized with the movement of work stage Chuck20, only need to be synchronized with the movement in exposure process, therefore, as shown in Figure 2, air supporting 14d and air supporting 14e is also included in mass balance 14, air film is formed between basic platform 16 and mass balance unit 14, realize the motion of mass balance unit 14a and mass balance unit 14b, when needs synchronous scanning, then open air supporting, realize being synchronized with the movement of mask platform Chuck30 and work stage Chuck20, when carrying out substrate measurement and exposure field switching when work stage, then close air supporting, balance mass unit 14a and 14b is made to be fixed on basic platform, mask platform is by fine motion motor closed loop control.
As it is shown on figure 3, enumerate the design of a balance mass 14, balance mass 14 includes the linking arm 63 of the identical upper-part of mechanism 60, lower component 60 and centre, upper-part 60 and lower component 60 and jointly moves along Y-direction with balance mass 14. parts 60 indoor design guide rail 61, guide rail 61 chains slide block 62 and sliding block 62, and slide block 62 can realize the slip of Z-direction along guide rail 61, realizes link by linking arm 63 between two slide blocks 62. when mask platform Chuck30 and work stage Chuck20 does not have relative motion, balance mass 14 is in A, B1, B2 state, when mask platform Chuck30 is along Y positive movement, balance mass unit 14b is due to mask platform opposite force effect, along Y negative movement, now, lower component 60 and sliding block 62 are along Y negative movement to B2 ' position, owing to linking arm 63(moves to A ') effect, top shoe 62 stress by B1 along Y positive movement to B1 ' position, therefore balance mass unit 14a achieves along Y positive movement, work stage Chuck20 is along Y negative movement, namely the adverse movement of mask platform Chuck30 and work stage Chuck20 is achieved, in like manner, balance mass 14 is in A ' ', B1 ' ', the process of B2 ' ' state, mask platform Chuck30 and the work stage Chuck20 relative motion along Y another one direction can be realized.
As shown in Figure 4, enumerate the design of another balance mass 14, be made up of gear 74, conveyer belt 73, connector 71, connector 72 inside balance mass unit 14c. Balance mass unit 14a is connected with work stage Chuck20 by connector 71, balance mass unit 14b is linked with mask platform Chuck30 by connector 72, when mask platform Chuck30 is along Y positive movement, balance mass unit 14b is due to mask platform opposite force effect, along Y negative movement, now, connector 72 produces clockwise movement with gear 74, simultaneously, connector 71 band balance mass unit 14a on gear 74 is along Y positive movement, work stage Chuck20, along Y negative movement, namely achieves the adverse movement of mask platform Chuck30 and work stage Chuck20.
The preferred embodiment of the simply present invention described in this specification, above example is only in order to illustrate technical scheme but not limitation of the present invention. All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (10)
1. a lithographic equipment, it is characterized in that, including: a basic platform, and it is positioned at the work stage on described basic platform, mask platform, work stage driving device, mask platform driving device and balance mass, described balance mass connects described work stage driving device and mask platform driving device respectively, and the synchronous backward in order to realize work stage and mask platform described in described lithographic equipment scan exposure process moves.
2. lithographic equipment as claimed in claim 1, it is characterized in that, described balance mass includes the first balance mass block and the second balance mass block, described first balance mass block is connected with the motor stator of described work stage driving device, described second balance mass block is connected with the motor stator of described mask platform driving device, when the electric mover of described work stage driving device drives work stage positive movement, the motor stator making described work stage driving device drives described first balance mass block adverse movement, described second balance mass block is made to drive the motor stator positive movement of described mask platform driving device, the electric mover making described mask platform driving device drives described mask platform adverse movement.
3. lithographic equipment as claimed in claim 1, it is characterized in that, described balance mass includes the first balance mass block and the second balance mass block, described first balance mass block is connected with the motor stator of described work stage driving device, described second balance mass block is connected with the motor stator of described mask platform driving device, when the electric mover of described mask platform driving device drives mask platform positive movement, the motor stator making described mask platform driving device drives described second balance mass block adverse movement, described first balance mass block is made to drive the motor stator positive movement of described work stage driving device, the electric mover making described work stage driving device drives described work stage adverse movement.
4. lithographic equipment as claimed in claim 2 or claim 3, it is characterised in that the first balance mass block of described balance mass and the second balance mass block are connected by a balance mass connector and relative motion occurs.
5. lithographic equipment as claimed in claim 4, it is characterized in that, described balance mass connector includes being positioned at the first firmware of the first balance mass block, being positioned at the second firmware of described second balance mass block and connect the linking arm of described first firmware and the second firmware, described first firmware motion is driven by described first balance mass block, described linking arm is made to drive described second firmware to move in the opposite direction, thus driving described second balance mass block motion.
6. lithographic equipment as claimed in claim 5, it is characterized in that, described first firmware and the second firmware all include slide block and slide rail, described linking arm is connected with the first balance mass block and the second balance mass block respectively by described slide block, described slide rail is arranged along the direction vertical with the balance mass direction of motion, described slide block can slide on described slide rail, thus driving described linking arm to realize the first balance mass block and the relative motion of the second balance mass block.
7. lithographic equipment as claimed in claim 4, it is characterized in that, described balance mass connector includes the first connector, the second connector and connects the gear of described first connector and the second connector, the other end of described first connector is connected with described first balance mass block, and the other end of described second connector is connected with described second balance mass block.
8. lithographic equipment as claimed in claim 2 or claim 3, it is characterised in that described balance mass also includes an air supporting module, described air supporting module is used for making formation air film between described balance mass and described basic platform.
9. lithographic equipment as claimed in claim 1, it is characterised in that described work stage, mask platform are connected with described basic platform respectively through guide rail.
10. lithographic equipment as claimed in claim 1, it is characterised in that described lithographic equipment also includes lighting unit, projection objective, reflecting mirror group one and reflecting mirror group two; In scan exposure process, lighting unit sends light beam below mask and irradiates the exposure figure mask so that it is be imaged on reflecting mirror group one place, and then light beam enters projection objective, then through reflecting mirror group two, final exposure figure is imaged in the substrate of work stage.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410604047.9A CN105629669B (en) | 2014-11-03 | 2014-11-03 | Lithographic equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410604047.9A CN105629669B (en) | 2014-11-03 | 2014-11-03 | Lithographic equipment |
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| Publication Number | Publication Date |
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| CN105629669A true CN105629669A (en) | 2016-06-01 |
| CN105629669B CN105629669B (en) | 2017-12-29 |
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| CN201410604047.9A Active CN105629669B (en) | 2014-11-03 | 2014-11-03 | Lithographic equipment |
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| US20030218730A1 (en) * | 1997-11-22 | 2003-11-27 | Nikon Corporation | Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same |
| US6894762B1 (en) * | 2002-09-17 | 2005-05-17 | Lsi Logic Corporation | Dual source lithography for direct write application |
| CN101526747A (en) * | 2009-01-07 | 2009-09-09 | 上海微电子装备有限公司 | Double workpiece platform device |
| CN102073219A (en) * | 2009-11-20 | 2011-05-25 | 上海微电子装备有限公司 | Balancing mass system and workbench |
| CN103765315A (en) * | 2011-07-01 | 2014-04-30 | 卡尔蔡司Smt有限责任公司 | Optical imaging arrangement with individually actively supported components |
| CN103809384A (en) * | 2012-11-12 | 2014-05-21 | 上海微电子装备有限公司 | Balance mass system shared by workpiece platform and mask platform, and photo-etching machine |
-
2014
- 2014-11-03 CN CN201410604047.9A patent/CN105629669B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030218730A1 (en) * | 1997-11-22 | 2003-11-27 | Nikon Corporation | Exposure apparatus and methods utilizing plural mask and object stages movable in opposite directions, and methods of producing devices using the same |
| US6894762B1 (en) * | 2002-09-17 | 2005-05-17 | Lsi Logic Corporation | Dual source lithography for direct write application |
| CN101526747A (en) * | 2009-01-07 | 2009-09-09 | 上海微电子装备有限公司 | Double workpiece platform device |
| CN102073219A (en) * | 2009-11-20 | 2011-05-25 | 上海微电子装备有限公司 | Balancing mass system and workbench |
| CN103765315A (en) * | 2011-07-01 | 2014-04-30 | 卡尔蔡司Smt有限责任公司 | Optical imaging arrangement with individually actively supported components |
| CN103809384A (en) * | 2012-11-12 | 2014-05-21 | 上海微电子装备有限公司 | Balance mass system shared by workpiece platform and mask platform, and photo-etching machine |
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| CN105629669B (en) | 2017-12-29 |
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Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Applicant after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Applicant before: Shanghai Micro Electronics Equipment Co., Ltd. |
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