CN1658075A - Exposure device - Google Patents
Exposure device Download PDFInfo
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- CN1658075A CN1658075A CN 200510024642 CN200510024642A CN1658075A CN 1658075 A CN1658075 A CN 1658075A CN 200510024642 CN200510024642 CN 200510024642 CN 200510024642 A CN200510024642 A CN 200510024642A CN 1658075 A CN1658075 A CN 1658075A
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- exposure
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Abstract
This invention relates to an exposure exposal device, is applied to put the figures that need to be exposed to the sensitive components on the exposure platform and the get large area of figures with the nanometer line width and accuracy. It is composed of the complete appliance frame, the damping system, the accurate movement system, the precision measure system, the alignment system, the precision exposure system and driving electrical system. The complete appliance frame is divided by the damper into the internal frame and the external frame, the driving electrical device is fixed on the external frame. This invention mainly solves the problem of bad damping performance of present technology, and can improve the exposal precision of the device to the level of nanometer exposure.
Description
Technical field
The present invention relates to a kind of exposure device, it be used for the figure of needs exposures according to certain ratio project on the exposure desk by photo-sensitive cell, obtain large tracts of land and have the nano-scale linewidth of certain steepness and the figure of precision.
Background technology
In the VLSI (very large scale integrated circuit) optical lithography, the wide principal element of decision Micropicture extra fine wire is the photoetching work resolving power of lithographic equipment, and the vibration of complete machine is one of key factor that influences photolithography resolution.Raising along with large scale integrated circuit device integrated level, photoetching work resolving power requires more and more high, the precision that promptly requires the accuracy of stability, measuring system of exposure system of photo-etching machine and motion platform also more and more high (bearing accuracy is higher than 10nm at present), operation wavelength is also more and more lacked (wavelength X has been short to 248nm, 193nm or littler) simultaneously.After entering nano-precision, photoetching resolution is quite responsive to the influence of vibration.
Guarantee photoetching resolution, just must reduce vibration, add stiff stability, improve kinematic accuracy.In order to reduce vibration, at first must stop vibration transfer to exposure desk, hold bed and exposure system; The inner vibration that produces of its less important effective cancellation element, this is very important, inner vibration is very responsive to the influence of measuring system and exposure system.The reacting force of precision movement platform also can not be ignored, and it can make parts produce distortion and vibration, can draw reacting force by complete machine structure to this.Can reduce the measuring error of measuring system generations such as interferometer by effective vibration control, improve the kinematic accuracy of kinematic system, increase the exposure quality of exposure system.
Fig. 1 is the structure of the present exposure device that uses in commercial production, it comprises by passive vibration damping air bag 111 and the vibration insulating system formed in conjunction with air-bearing 127, silicon chip transmission system 155, the prealignment system that forms by mask prealignment platform 152 and silicon chip prealignment platform 154, last slice hand 153, by Y to guide rail 121, X is to guide rail 122, hemisphere 125, the exposure desk that drive motor 126 is formed, by marble 112, main substrate 113, the frame system that mask platform support 114 is formed, measuring system 124, by marble 131, hold the mask platform that bed 133 is formed, mask transmission 151, by projection objective 141, exposure system, mask 132 and silicon chip 123 that illuminator 142 is formed.In above-mentioned exposure device, general frame is suspended in passive vibration damping air bag 111, in conjunction with air-bearing 127 common vibration dampings.Silicon chip platform among Fig. 1 is a H type guide rail 121, and guide rail 121 and exposure desk are to be rigidly connected, on the mask platform hold bed 133 and drive motor 134,135 also is directly to be rigidly connected, motor 134,135 all directly is fixed on the marble 131.What silicon chip 123 and mask 132 alignment systems adopted is the coaxial alignment mode, and silicon chip is aimed at and mask registration all is to finish under the situation of vibration damping in not having machine; Leveling and focusing measuring system, exposure system and laser measurement system mainly still are in the aspect of passive vibration damping.Above-mentioned exposure device has following deficiency:
(1) silicon chip mask alignment system, exposure system, measuring system etc. all are in non-vibration damping or passive vibration damping aspect, and this makes vibration be easy to be delivered to internal system, influences measuring accuracy and exposure accuracy.In addition, mask transmission, drive motor and shutter are placed directly on the passive vibration damping air bag, and this makes device inside produce a large amount of vibrations, so unreasonable structure.
(2) owing to adopt passive air bag and air-bearing vibration damping, can only weaken the vibration that the outside causes, not have too many effect, so internal vibration has very big influence to the precision of work stage, mask platform, exposure system and alignment system for internal vibration.
(3) motor is fixed on the marble, makes the motion reacting force act directly on framework inside by rigid connection, and silicon chip platform motor directly is connected with exposure desk, and the internal system many places produce distortion like this, cause the morpheme error, also can evoke vibration.
(4) mask prealignment platform and silicon chip prealignment platform be in the vibration insulating system outside, and mask and silicon chip be fully by mechanical positioning, so bearing accuracy is not high, mask behind the aligning and silicon chip also have than mistake when holding bed and exposure desk being delivered to.
Summary of the invention
The objective of the invention is to provide a kind of exposure device, mainly solves above-mentioned problems of the prior art, the exposure accuracy of this device can be brought up to the level of nanometer exposure.
For solving the problems of the technologies described above, the present invention is achieved in that
A kind of exposure device, form by complete machine framework, vibration insulating system, precise motion system, accurate real-time measurement system, alignment system, accurate exposure system and drive motor, it is characterized in that: this complete machine framework is divided into inner frame and external frame by a cover active damper, and drive motor is fixed on the external frame.
The fast student of the exposure of this exposure system installs a cover active damper, and the active damper of resonance that a cover suppresses to be used to install the measurement substrate of interferometer is installed on the main substrate of this inner frame.
Have the exposure desk air-bearing in the vibration insulating system and hold the bed air-bearing with the exposure desk of precise motion system with hold bed and be suspended in the inner frame.
The noncontact connecting structure of the air-float guide rail of linear electric motors, electromagnetic coupled and electromagnetic coupled.
Make the present invention have following technique effect by said structure:
1, complete machine framework of the present invention is divided into inner frame and external frame by a cover active damper, have precise motion system, accurate real-time measurement system, alignment system, the accurate exposure system of part on the inner frame, and drive motor is fixed on the external frame.During device work, the reaction force acts of motor movement is framework externally, thereby has reduced the distortion and the vibration of inner frame, has improved the stability of inner frame.
2, the fast student of the exposure of exposure system of the present invention installs a cover active damper, mainly is to reduce because the vibration that the motion of exposure shutter produces reduces the vibration that is delivered to object lens significantly; And the main substrate of this inner frame is installed down the active damper of resonance that a cover suppresses to be used to install the measurement substrate of interferometer, mainly is the resonance that suppresses to be used to install the measurement substrate of interferometer.
3, exposure desk air-bearing of the present invention and hold the bed air-bearing with exposure desk with hold bed and be suspended in the inner frame, this suspended state has further been isolated vibration.
4, the noncontact connecting structure of the air-float guide rail of linear electric motors of the present invention, electromagnetic coupled and electromagnetic coupled has stoped motor oscillating to be delivered to exposure desk and has held bed.
Description of drawings
Fig. 1 is known exposure device structural drawing.
Among the figure:
111 passive vibration damping air bag 131 marbles
112 marbles, 132 masks
113 main substrates 133 hold bed
114 mask platform supports, 134 drive motor
121 Y are to guide rail 135 drive motor
122 X are to guide rail 141 projection objectives
123 silicon chips, 142 illuminators
The transmission of 124 measuring systems, 151 masks
125 hemispheres, 152 mask prealignment platforms
126 drive motor 153 last slice hand
127 in conjunction with air-bearing 154 silicon chip prealignment platforms
155 silicon chip transmission systems
Fig. 2 is structural representation of the present invention (one).
Fig. 3 is structural representation of the present invention (two).
Among the figure:
211 external frame, 231 marbles
212 measure substrate 232 interferometers
213 main substrates 233 hold bed
214 illumination supports, 234 electromagnetic coupled
215 active damper, 235 drive motor
216 mask platform supports 236 hold the bed air-bearing
217 active damper, 237 sensors
218 hanging boxes, 238 drive motor
239 Z are to motor for 219 active damper
221 marbles, 241 projection objectives
222 drive motor, 242 exposure shutters
223 drive motor, 243 illuminators
224 movers, 251 silicon chip prealignment platforms
225 exposure desks 252 last slice hand
226 interferometers, 253 fine registration systems
227 Z are to motor 254 silicon chips
228 electromagnetic coupled, 255 masks are accurately aimed at
229 exposure desk air-bearings, 256 masks
257 silicon chip leveling measuring systems
258 mask transmission systems
259 silicon chip transmission systems
Embodiment
Fig. 2 and Fig. 3 are the structural representation according to exposure device one embodiment of the present invention.As shown in the figure: this exposure device is made up of complete machine framework, vibration insulating system, precise motion system, accurate real-time measurement system, alignment system, accurate exposure system and drive motor.
Wherein, general frame comprises: external frame 211, measure substrate 212, main substrate 213, illumination support 214, mask platform support 216, hanging box 218; Utilize active damper 219, the framework that we will be placed on the active damper 219 is called inner frame, and remaining is an external frame.Drive motor 222,223,235,238 are fixed on the external frame 211, and precise motion system, accurate real-time measurement system, alignment system, accurate exposure system are positioned on the inner frame.
This vibration insulating system comprises active damper 215,217,219, and active damper 215 mainly is to reduce because the vibration that the motion of exposure shutter 242 produces reduces the vibration that is delivered to object lens significantly; And active damper 217 mainly is to suppress to be used to install the resonance of the measurement substrate 212 of interferometer 226; Active damper 219 has the Lorentz motor, can carry out the 6DOF vibration damping, reduces from ground, drive motor and internal system vibration, for complete machine provides a static relatively working environment---inner frame by feedforward and FEEDBACK CONTROL.Also comprise exposure desk air-bearing 229 in this vibration insulating system and hold bed air-bearing 236 with them with exposure desk 225 with hold bed 233 and be suspended in the inner frame, this suspended state has further been isolated vibration.And the noncontact connecting structure of the air-float guide rail of linear electric motors, electromagnetic coupled 228 and electromagnetic coupled 234 has stoped motor oscillating to be delivered to exposure desk and has held bed.
This precise motion system is by marble 221, mover 224, and exposure desk 225, marble 231 holds bed 233, and Z forms to motor 239,227.
This precision real-time measurement system interferometer 232,226, sensor 237, silicon chip leveling measuring system 257 is formed.
This alignment system is by silicon chip prealignment platform 251, fine registration system 253, and mask accurately aims at 255.
This precision exposure system is by projection objective 241, exposure shutter 242, and illuminator 243 is formed.
During apparatus of the present invention work, drive motor 222,223, the reaction force acts of 235,238 motions is framework 211 externally, thereby has reduced the distortion and the vibration of inner frame, has improved the stability of inner frame.
See Fig. 3, mask transmission system 258 and silicon chip transmission system 259 have reduced to vibrate in prealignment process and the transmission course influence to precision by the prealignment platform is placed in the inner frame among the present invention, have improved the precision of prealignment.The measuring system of complete machine and exposure system also are placed in the inner frame, are subjected to active damping controls, make complete machine that more stabilised platform arranged, and kinematic system have had more high-precision movement velocity.
Structure that exposure device is special and active damping system can bring up to the exposure accuracy of this device the level that nanometer is exposed.
Being preferred embodiment of the present invention only in sum, is not to be used for limiting practical range of the present invention.Be that all equivalences of doing according to the content of the present patent application claim change and modification, all should be technology category of the present invention.
Claims (4)
1, a kind of exposure device, form by complete machine framework, vibration insulating system, precise motion system, accurate real-time measurement system, alignment system, accurate exposure system and drive motor, it is characterized in that: this complete machine framework is divided into inner frame (212,213,214 by a cover active damper (219), 216,218) and external frame (211), drive motor (222), (223), (235), (238) are fixed on the external frame (211).
2, exposure device according to claim 1 is characterized in that: the exposure shutter (242) of this exposure system is installed a cover active damping (215), the main substrate of this inner frame (213) down
OnOne cover is installed is suppressed to be used to install the active damper (217) of resonance of the measurement substrate (212) of interferometer (226).
3, exposure device according to claim 1 is characterized in that: have exposure desk air-bearing (229) in the vibration insulating system and hold bed air-bearing (236) with the exposure desk (225) of precise motion system with hold bed (233) and be suspended in the inner frame.
4, exposure device according to claim 1 is characterized in that: the noncontact connecting structure of the air-float guide rail of linear electric motors, electromagnetic coupled (228) and electromagnetic coupled (234).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510024642 CN1658075A (en) | 2005-03-25 | 2005-03-25 | Exposure device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 200510024642 CN1658075A (en) | 2005-03-25 | 2005-03-25 | Exposure device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN1658075A true CN1658075A (en) | 2005-08-24 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 200510024642 Pending CN1658075A (en) | 2005-03-25 | 2005-03-25 | Exposure device |
Country Status (1)
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| CN (1) | CN1658075A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101114134B (en) * | 2007-07-24 | 2010-05-19 | 上海微电子装备有限公司 | Alignment method and micro-device manufacturing method used for shadow cast scan photo-etching machine |
| CN1955842B (en) * | 2005-10-27 | 2010-06-16 | 中华映管股份有限公司 | Photoetching equipment |
| CN101452222B (en) * | 2007-10-04 | 2011-04-13 | Asml荷兰有限公司 | Lithographic apparatus, projection assembly and combination device and active damping method |
| CN103901733A (en) * | 2012-12-28 | 2014-07-02 | 上海微电子装备有限公司 | Exposure device |
| CN103969957A (en) * | 2013-01-25 | 2014-08-06 | 上海微电子装备有限公司 | Measurement apparatus and measurement method for photolithography machine vertical distance |
| CN104181778A (en) * | 2011-05-31 | 2014-12-03 | 上海微电子装备有限公司 | Balance mass system of lithography machine |
| CN105319863A (en) * | 2014-06-17 | 2016-02-10 | 佳能株式会社 | Stage apparatus, lithography apparatus, method of manufacturing an article, and determination method |
-
2005
- 2005-03-25 CN CN 200510024642 patent/CN1658075A/en active Pending
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1955842B (en) * | 2005-10-27 | 2010-06-16 | 中华映管股份有限公司 | Photoetching equipment |
| CN101114134B (en) * | 2007-07-24 | 2010-05-19 | 上海微电子装备有限公司 | Alignment method and micro-device manufacturing method used for shadow cast scan photo-etching machine |
| CN101452222B (en) * | 2007-10-04 | 2011-04-13 | Asml荷兰有限公司 | Lithographic apparatus, projection assembly and combination device and active damping method |
| CN104181778A (en) * | 2011-05-31 | 2014-12-03 | 上海微电子装备有限公司 | Balance mass system of lithography machine |
| CN104181778B (en) * | 2011-05-31 | 2016-08-24 | 上海微电子装备有限公司 | A kind of litho machine balance mass system |
| CN103901733A (en) * | 2012-12-28 | 2014-07-02 | 上海微电子装备有限公司 | Exposure device |
| CN103901733B (en) * | 2012-12-28 | 2017-02-22 | 上海微电子装备有限公司 | Exposure device |
| CN103969957A (en) * | 2013-01-25 | 2014-08-06 | 上海微电子装备有限公司 | Measurement apparatus and measurement method for photolithography machine vertical distance |
| CN105319863A (en) * | 2014-06-17 | 2016-02-10 | 佳能株式会社 | Stage apparatus, lithography apparatus, method of manufacturing an article, and determination method |
| US9720334B2 (en) | 2014-06-17 | 2017-08-01 | Canon Kabushiki Kaisha | Stage apparatus, lithography apparatus, method of manufacturing an article, and determination method |
| CN105319863B (en) * | 2014-06-17 | 2018-05-29 | 佳能株式会社 | Bench frame apparatus, lithographic equipment, the manufacturing method of article and definite method |
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