CN105624706A - Aluminum substrate stripping concentrated liquor as well as preparation method thereof and using method thereof - Google Patents

Aluminum substrate stripping concentrated liquor as well as preparation method thereof and using method thereof Download PDF

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Publication number
CN105624706A
CN105624706A CN201610145844.4A CN201610145844A CN105624706A CN 105624706 A CN105624706 A CN 105624706A CN 201610145844 A CN201610145844 A CN 201610145844A CN 105624706 A CN105624706 A CN 105624706A
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China
Prior art keywords
aluminium base
membrane concentration
concentration liquid
removes
liquid
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CN201610145844.4A
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Chinese (zh)
Inventor
饶猛
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Shenzhen Cypress Industrial Development Co Ltd
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Shenzhen Cypress Industrial Development Co Ltd
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Priority to CN201610145844.4A priority Critical patent/CN105624706A/en
Publication of CN105624706A publication Critical patent/CN105624706A/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/14Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
    • C23G1/22Light metals

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

The invention discloses aluminum substrate stripping concentrated liquor and a preparation method thereof. The aluminum substrate stripping concentrated liquor comprises a plurality of active ingredients such as organic alkali, a chelating agent, a preservative, a brightening agent, a surfactant and the like; the various ingredients cooperate with each other, so that the defects of the conventional stripping liquor are overcome while the stripping efficiency is guaranteed, and therefore, the problem that the stripped substrate turns black is avoided, the texture of the substrate is guaranteed, and the qualified rate of the product is increased. Meanwhile, the preparation method for the stripping concentrated liquor is simple, the preparation processes for the stripping concentrated liquor are simple and convenient, and the manufacturing cost is saved. After the stripping concentrated liquor disclosed by the invention is adopted for stripping, waste liquor does not container difficult-to-treat chemical substances, so that the operation processes for waste liquor treatment are reduced, and the pollution of the waste liquor to the environment is also avoided.

Description

Aluminium base goes membrane concentration liquid and its preparation method and using method
Technical field
The present invention relates to aluminium base manufacturing technology field, it is specifically related to that a kind of aluminium base is special goes membrane concentration liquid and its preparation method and using method.
Background technology
Within 1969, aluminium base copper-clad plate (hereinafter referred to as aluminium base) manufacturing technology has been invented by SANYO GS company, and amplifies hybrid integrated circuit in 1974 for STK series high-power. Aluminium base is a kind of metal-based copper-clad plate with good heat radiating function, and general single sided board is made up of three-decker, is circuit layer (Copper Foil), insulation layer and metal-based layer respectively. Being designed to dual platen for also having of high-end use, structure is circuit layer, insulation layer, aluminium base, insulation layer, circuit layer. Only a few is applied as multi-ply wood, it is possible to by common multi-ply wood and insulation layer, aluminium base laminating and become.
There is the performances such as excellent electric property, thermal diffusivity, electromagnetic wave shielding, high withstand voltage and bending machining due to aluminium base, thus the relevant industries such as high-power LED illumination, power supply, automobile, computer, aviation electronics, medical treatment it are widely used in, the upsurge that aluminium base copper-clad plate (i.e. aluminium base) has worldwide started research and development and produced, large quantities of representational metal substrate producer occurs, such as Japan Sumitomo, Japan Panasonic electrician, Bei Gesi company of the U.S. etc.
In the making processes of aluminium base, the transfer of line pattern is necessary step. Realizing line pattern transfer, the use of photo-resist plays a part most important. Along with the development of technology, light actuating resisting corrosion dry film has the performance of good processing performance, excellent imaging and chemical-resistant resistance due to it, and then progressively instead of photo-resist, is applied in line transitions. Light actuating resisting corrosion dry film is primarily of protective membrane, photoresist film, Carrier polyester film composition. But after " imaging " completes, can photoresist film be removed smoothly completely, can directly affect again the rear operations such as etching.
In routine techniques, general use inorganic alkali solution is as moving back film agent, as: the aqueous solution etc. of the 3-4% of NaOH, KOH, but there is following shortcoming in it: one is to attack tin, copper coating, makes it variable color, stains gold face etc.; Two is move back at fine-line to cause tin to move in membrane process, has residual copper during etching, causes short circuit between circuit, and product qualified rate is low; Three is that the film slag that sodium hydroxid produces when moving back film is excessive, it is difficult to filters, is not suitable for machine and moves back, move back membrane efficiency lower; Four is that in dry film, photo-resist polymkeric substance dissolves in because using sodium hydroxide and useless moves back film liquid, causes waste liquid to be difficult to process, the problems such as contaminate environment; Five need to add the auxiliary agents such as butyl Cellosolve (ButylCellusolove, BCS) or trolamine when being move back film separately, and to improve it to the solubility property of dry film, it is to increase move back film effect, and butyl Cellosolve class is toxicity higher building matter.
Thus produce a kind of can efficiently peel off photoresist film on aluminium base and can not affect move back film after base material quality remove film liquid, become the active demand of aluminium base manufacturing.
Summary of the invention
It is an object of the invention to provide a kind of aluminium base and go membrane concentration liquid and its preparation method and using method, move back base material variable color blackening after film to solve aluminium base of the prior art, affect the problem of base material quality.
In order to solve the problems of the technologies described above, the technical solution adopted in the present invention is:
The present invention provides a kind of aluminium base to remove membrane concentration liquid, comprises following component by weight: organic bases 30-50 part; Sequestrant 5-10 part; Sanitas 0.1-2.0 part; Brightening agent 0.1-0.5 part; Tensio-active agent 0.1-0.5 part; Deionized water 36-65 part.
Preferably, described organic bases is at least one having in the organic amine of chemical general formula R-NH2, and R is alkyl, hydroxyalkyl or aminoalkyl group.
Preferably, described organic bases is selected from: at least one in Monoethanolamine MEA BASF, diethylamine, Tri N-Propyl Amine, 1,4-butanediamine.
Preferably, described sequestrant is selected from: at least one in Trisodium Citrate, Seignette salt, EDTA-4Na.
Preferably, described sanitas is selected from: methyl benzotriazazole, Sodium Nitrite, phenol, 2-dredge at least one in base benzothiazole, 5-methyl benzotriazazole, 5-carboxyl benzotriazole, imidazoles, aminotriazole, Methylimidazole, benzoglyoxaline, naphthenic acid imidazoline.
Preferably, described brightening agent is selected from: at least one in Sodium orthomolybdate, urea, thiocarbamide.
Preferably, described tensio-active agent is selected from: at least one in tetramethylolmethane, trihydroxy ethylamine oleate soap, Triton, department's dish, tween.
The present invention also provides a kind of above-mentioned aluminium base to go the compound method of membrane concentration liquid, comprises the following steps:
S1, takes above-mentioned organic bases, sequestrant, sanitas, brightening agent, tensio-active agent, deionized water respectively;
S2, the organic bases taken above-mentioned, sequestrant, brightening agent mix at ambient temperature with deionized water, stir and evenly obtain mixed solution;
S3, adds in mixed solution described in step S2 by the sanitas taken in step S1 and tensio-active agent successively, namely obtains described aluminium base and remove membrane concentration liquid after stirring evenly.
The present invention also provides a kind of above-mentioned aluminium base to go the using method of membrane concentration liquid, it may also be useful to described aluminium base is gone membrane concentration liquid to dilute by front water, and described aluminium base goes the mass ratio of membrane concentration liquid and water to be 1:5-10.
Compared with prior art, the present invention has following useful effect:
1, go membrane concentration fluid component analysis from aluminium base of the present invention: organic bases as moving back film host, its free OH contained-Few relative to highly basic content, be there is controlled space in the reaction of aluminium base; Sequestrant not only can calcium ions and magnesium ions in chelatropic reaction liquid, and aluminium base can be protected; Brightening agent can solve aluminium base surface and send out mist phenomenon, keeps the normal glossiness of aluminium; Tensio-active agent can promote that film liquid arrives at etchant resist inside fast, accelerates it and comes off;
2, after utilizing the present invention to go membrane concentration liquid that aluminium base moves back film process, aluminium base and copper is surperficial without obvious corrosion phenomenon, efficiently solve the puzzlement moving back base material variable color blackening after film, ensure that the quality of other base materials such as aluminium, copper, it is to increase the qualification rate of product;
3, after the present invention goes membrane concentration liquid that aluminium base moves back film process, containing difficult chemical substances such as highly basic in waste liquid, simplify the handling procedure of waste liquid, the pollution level of environment also can be reduced;
4, the present invention is utilized to go membrane concentration liquid that aluminium base moves back film process, it is not necessary to add the auxiliary agent such as butyl Cellosolve or trolamine, avoid the generation of toxic substance.
Embodiment
Below in conjunction with specific embodiment, the invention will be further described.
[embodiment 1]
Configuration 100kg aluminium base removes membrane concentration liquid, and in the present embodiment 1, each component and content are as follows:
Configuration aluminium base goes the method for membrane concentration liquid, comprises the steps: S1, removes each component of membrane concentration liquid and content according to above-mentioned aluminium base, take organic bases, sequestrant, sanitas, brightening agent, tensio-active agent, deionized water respectively; S2, mixes with deionized water at ambient temperature by the organic bases taken in step S1, sequestrant, brightening agent, stirs and evenly obtains mixed solution; S3, adds in mixed solution described in step S2 by the sanitas taken in step S1 and tensio-active agent successively, namely obtains described aluminium base and remove membrane concentration liquid after stirring evenly.
[embodiment 2]
Configuration 100kg aluminium base removes membrane concentration liquid, and in the present embodiment 2, each component and content are as follows:
The aluminium base of the present embodiment 2 goes the compound method of membrane concentration liquid with embodiment 1, does not repeat them here.
[embodiment 3]
Configuration 100kg aluminium base removes membrane concentration liquid, and in the present embodiment 3, each component and content are as follows:
The aluminium base of the present embodiment 3 goes the compound method of membrane concentration liquid with embodiment 1, does not repeat them here.
[embodiment 4]
Configuration 100kg aluminium base removes membrane concentration liquid, and in the present embodiment 4, each component and content are as follows:
The aluminium base of the present embodiment 4 goes the compound method of membrane concentration liquid with embodiment 1, does not repeat them here.
[embodiment 5]
Configuration 100kg aluminium base removes membrane concentration liquid, and in the present embodiment 5, each component and content are as follows:
The aluminium base of the present embodiment 5 goes the compound method of membrane concentration liquid with embodiment 1, does not repeat them here.
[embodiment 6]
Configuration 100kg aluminium base removes membrane concentration liquid, and in the present embodiment 6, each component and content are as follows:
The aluminium base of the present embodiment 6 goes the compound method of membrane concentration liquid with embodiment 1, does not repeat them here.
[embodiment 7]
Configuration 100kg aluminium base removes membrane concentration liquid, and in the present embodiment 7, each component and content are as follows:
The aluminium base of the present embodiment 7 goes the compound method of membrane concentration liquid with embodiment 1, does not repeat them here.
[embodiment 8]
Configuration 100kg aluminium base removes membrane concentration liquid, and in the present embodiment 8, each component and content are as follows:
The aluminium base of the present embodiment 8 goes the compound method of membrane concentration liquid with embodiment 1, does not repeat them here.
[embodiment 9]
Configuration 100kg aluminium base removes membrane concentration liquid, and in the present embodiment 9, each component and content are as follows:
The aluminium base of the present embodiment 2 goes the compound method of membrane concentration liquid with embodiment 1, does not repeat them here.
Divided by outside the embodiment above enumerated, other embodiments that the present invention is also included in right each component and content and combines.
Comparative example
[comparative example 1]
Configuration 100kg removes film liquid, and in this comparative example 1, each component and content are as follows:
Highly basic sodium hydroxide 4kg
Deionized water 96kg
This comparative example 1 removes film liquid making method: according to above-mentioned each component and content, weighing sodium hydroxide is dissolved in deionized water, and what namely obtain this comparative example 1 after stirring evenly removes film liquid.
[comparative example 2]
Configuration 100kg removes film liquid, and in this comparative example 2, each component and content are as follows:
This comparative example 2 removes film liquid making method: according to above-mentioned each component and content, weighing sodium hydroxide, Seignette salt are dissolved in deionized water, stirring after evenly and obtain mixing solutions, take thiazolamine and add in above-mentioned mixing solutions, what namely obtain this comparative example 2 after evenly stirring removes film liquid.
[comparative example 3]
Configuration 100kg removes film liquid, and in this comparative example 3, each component and content are as follows:
This comparative example 3 removes film liquid making method: according to above-mentioned each component and content, taking diethylamine is dissolved in deionized water, stir after evenly and obtain mixing solutions, take methyl benzotriazazole, Triton add in above-mentioned mixing solutions, what namely obtain this comparative example 3 after evenly stirring removes film liquid.
[comparative example 4]
Configuration 100kg removes film liquid, and in this comparative example 4, each component and content are as follows:
This comparative example 4 removes film liquid making method: according to above-mentioned each component and content, take Tri N-Propyl Amine, EDTA-4Na be dissolved in deionized water, stir after evenly and obtain mixing solutions, take Methylimidazole, tween add in above-mentioned mixing solutions, what namely obtain this comparative example 4 after evenly stirring removes film liquid.
[comparative example 5]
Configuration 100kg removes film liquid, and in this comparative example 5, each component and content are as follows:
This comparative example 5 removes film liquid making method: according to above-mentioned each component and content, take 1,4-butanediamine, Seignette salt are dissolved in deionized water, stir after evenly and obtain mixing solutions, take Methylimidazole, thiocarbamide add in above-mentioned mixing solutions, what namely obtain this comparative example 5 after evenly stirring removes film liquid.
Experimental example
[experimental example 1]
The aluminium base of Application Example 1-9 goes the film liquid that goes of membrane concentration liquid and comparative example 1-5 to peel off photoresist on aluminium base, stripping means is: (1) goes membrane concentration liquid and comparative example to remove each 100kg of film liquid according to the component in each embodiment and comparative example and content configuration aluminium base, with water, aluminium base going membrane concentration liquid and contrast 3-5 go film liquid to dilute, the mass ratio of itself and water is 1:5-10; (2) tearing the protective membrane on aluminium base off, the embodiment after aluminium base is immersed in above-mentioned dilution respectively, the comparative example of film liquid and not diluted of going of comparative example are gone in film liquid; (3) temperature of reaction is 50 DEG C, and soak time is 1.5 minutes, in immersion process, observes the response situation of aluminium face and copper face, and records the splitting time of photoresist.
Various embodiments of the present invention and comparative example go film liquid to peel off the response situation of photoresist on aluminium base and splitting time such as table 1.
Table 1 embodiment 1-9 and comparative example 1-5 goes film liquid to peel off response situation and the time of photoresist
Can learn from table 1:
1, from comparative example 1,2 and embodiment 1-9 it may be seen that highly basic and aluminium exist violent chemical reaction, reaction produces a large amount of bubble and heat release, and process is uncontrollable, even if adding highly effective chelating agent and anticorrosive agent, aluminium still cannot be stoped to be encroached on; And the present invention removes the OH that in film liquid, organic bases is free-Few, relative highly basic content is little, and the reaction of base material is existed controlled space;
2, from embodiment 1-9 and comparative example 3 it may be seen that the present invention removes the calcium ions and magnesium ions that the sequestrant of film liquid is possible not only to chelatropic reaction liquid, it is also possible to the base material after removing film with going other components synergy protection in film liquid;
3, from embodiment 1-9 and comparative example 4 it may be seen that the present invention goes the brightening agent of film liquid with going other components synergy film liquid, it is possible to solve aluminium face and send out mist phenomenon, keep the normal glossiness of aluminium;
4, from embodiment 1-9 and comparative example 5 it may be seen that remove film liquid adds appropriate tensio-active agent in the present invention, it is possible to other component actings in conjunction, promote to go film liquid to arrive at etchant resist inside fast, accelerate it and come off;
5, from embodiment 1-9 result, it is selected from one or more organic basess to moving back film speed no significant difference, aluminium face is not had detrimentally affect.
The film liquid that moves back of visible the present invention is peeled off on aluminium base while photoresist film efficient, can not affect the quality moving back base material after film, ensure that the quality of aluminium base, it is to increase the qualification rate of product.
The above, it is only the better embodiment of the present invention, comparative example and experimental example, being not the restriction that the present invention does other form, any those skilled in the art may utilize the technology contents of above-mentioned announcement to be changed or be modified as the equivalent embodiment of equivalent variations. In every case being do not depart from technical solution of the present invention content, any simple modification, equivalent variations and the remodeling above embodiment done according to the technical spirit of the present invention, still belongs to the protection domain of technical solution of the present invention.

Claims (9)

1. an aluminium base removes membrane concentration liquid, it is characterised in that, comprise following component by weight: organic bases 30-50 part; Sequestrant 5-10 part; Sanitas 0.1-2.0 part; Brightening agent 0.1-0.5 part; Tensio-active agent 0.1-0.5 part; Deionized water 36-65 part.
2. aluminium base as claimed in claim 1 removes membrane concentration liquid, it is characterised in that, described organic bases has chemical general formula R-NH2Organic amine at least one, R is alkyl, hydroxyalkyl or aminoalkyl group.
3. aluminium base as claimed in claim 2 removes membrane concentration liquid, it is characterised in that, described organic bases is selected from: at least one in Monoethanolamine MEA BASF, diethylamine, Tri N-Propyl Amine, 1,4-butanediamine.
4. aluminium base as claimed in claim 1 removes membrane concentration liquid, it is characterised in that, described sequestrant is selected from: at least one in Trisodium Citrate, Seignette salt, EDTA-4Na.
5. aluminium base as claimed in claim 1 removes membrane concentration liquid, it is characterized in that, described sanitas is selected from: methyl benzotriazazole, Sodium Nitrite, phenol, 2-dredge at least one in base benzothiazole, 5-methyl benzotriazazole, 5-carboxyl benzotriazole, imidazoles, aminotriazole, Methylimidazole, benzoglyoxaline, naphthenic acid imidazoline.
6. aluminium base as claimed in claim 1 removes membrane concentration liquid, it is characterised in that, described brightening agent is selected from: at least one in Sodium orthomolybdate, urea, thiocarbamide.
7. aluminium base as claimed in claim 1 removes membrane concentration liquid, it is characterised in that, described tensio-active agent is selected from: at least one in tetramethylolmethane, trihydroxy ethylamine oleate soap, Triton, department's dish, tween.
8. aluminium base as described in item as arbitrary in claim 1-7 goes the compound method of membrane concentration liquid, it is characterised in that, comprise the following steps:
S1, takes described organic bases, sequestrant, sanitas, brightening agent, tensio-active agent, deionized water respectively;
S2, the organic bases taken above-mentioned, sequestrant, brightening agent mix at ambient temperature with deionized water, stir and evenly obtain mixed solution;
S3, adds in mixed solution described in step S2 by the sanitas taken in step S1 and tensio-active agent successively, namely obtains described aluminium base and remove membrane concentration liquid after stirring evenly.
9. aluminium base as described in item as arbitrary in claim 1-7 goes the using method of membrane concentration liquid, it is characterised in that, it may also be useful to described aluminium base is gone membrane concentration liquid to dilute by front water, and described aluminium base goes the mass ratio of membrane concentration liquid and water to be 1:5-10.
CN201610145844.4A 2016-03-15 2016-03-15 Aluminum substrate stripping concentrated liquor as well as preparation method thereof and using method thereof Pending CN105624706A (en)

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Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106835164A (en) * 2016-12-30 2017-06-13 广州市泓硕环保科技有限公司 It is a kind of for stripping moving back film liquid and moving back film method for aluminium and aluminium alloy non-chromium conversion film
CN109504977A (en) * 2018-12-28 2019-03-22 太仓市何氏电路板有限公司 Film liquid medicine is moved back in a kind of protection of LED aluminium face
CN109943849A (en) * 2019-04-14 2019-06-28 广州恒荣电子科技有限公司 One kind is organic to move back film liquid
CN110804754A (en) * 2019-11-23 2020-02-18 东莞市新东明科技有限公司 Aluminum highlight mobile phone middle frame surface anodic oxide film release agent and release method thereof
CN111020588A (en) * 2019-11-04 2020-04-17 博罗县东明化工有限公司 Stripping treatment method and stripping agent for anode oxide film on surface of seven-series aluminum alloy
CN111142341A (en) * 2019-12-31 2020-05-12 江苏中德电子材料科技有限公司 Environment-friendly high-stability aqueous photoresist stripping liquid for panels and preparation method thereof
CN112609183A (en) * 2020-12-07 2021-04-06 太仓市何氏电路板有限公司 LED aluminum surface etching liquid medicine with protection function and preparation method thereof
CN114276712A (en) * 2022-01-21 2022-04-05 深圳市松柏实业发展有限公司 Ink stripping liquid and stripping process of circuit board ink
CN116043235A (en) * 2022-09-02 2023-05-02 浙江瑞特良微电子材料有限公司 Environment-friendly film stripping agent and application thereof in film stripping process
CN116657148A (en) * 2023-07-27 2023-08-29 深圳市板明科技股份有限公司 Film stripping liquid and film stripping method for IC carrier plate

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CN102770524A (en) * 2010-01-29 2012-11-07 高级技术材料公司 Cleaning agent for semiconductor provided with metal wiring
WO2014176193A1 (en) * 2013-04-22 2014-10-30 Advanced Technology Materials, Inc. Copper cleaning and protection formulations
CN105164315A (en) * 2013-03-16 2015-12-16 Prc-迪索托国际公司 Azole compounds as corrosion inhibitors

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CN102770524A (en) * 2010-01-29 2012-11-07 高级技术材料公司 Cleaning agent for semiconductor provided with metal wiring
CN105164315A (en) * 2013-03-16 2015-12-16 Prc-迪索托国际公司 Azole compounds as corrosion inhibitors
WO2014176193A1 (en) * 2013-04-22 2014-10-30 Advanced Technology Materials, Inc. Copper cleaning and protection formulations

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106835164A (en) * 2016-12-30 2017-06-13 广州市泓硕环保科技有限公司 It is a kind of for stripping moving back film liquid and moving back film method for aluminium and aluminium alloy non-chromium conversion film
CN109504977A (en) * 2018-12-28 2019-03-22 太仓市何氏电路板有限公司 Film liquid medicine is moved back in a kind of protection of LED aluminium face
CN109943849A (en) * 2019-04-14 2019-06-28 广州恒荣电子科技有限公司 One kind is organic to move back film liquid
CN111020588A (en) * 2019-11-04 2020-04-17 博罗县东明化工有限公司 Stripping treatment method and stripping agent for anode oxide film on surface of seven-series aluminum alloy
CN110804754A (en) * 2019-11-23 2020-02-18 东莞市新东明科技有限公司 Aluminum highlight mobile phone middle frame surface anodic oxide film release agent and release method thereof
CN111142341A (en) * 2019-12-31 2020-05-12 江苏中德电子材料科技有限公司 Environment-friendly high-stability aqueous photoresist stripping liquid for panels and preparation method thereof
CN112609183A (en) * 2020-12-07 2021-04-06 太仓市何氏电路板有限公司 LED aluminum surface etching liquid medicine with protection function and preparation method thereof
CN114276712A (en) * 2022-01-21 2022-04-05 深圳市松柏实业发展有限公司 Ink stripping liquid and stripping process of circuit board ink
CN116043235A (en) * 2022-09-02 2023-05-02 浙江瑞特良微电子材料有限公司 Environment-friendly film stripping agent and application thereof in film stripping process
CN116657148A (en) * 2023-07-27 2023-08-29 深圳市板明科技股份有限公司 Film stripping liquid and film stripping method for IC carrier plate
CN116657148B (en) * 2023-07-27 2023-09-26 深圳市板明科技股份有限公司 Film stripping liquid and film stripping method for IC carrier plate

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