CN101957565B - Organic film removing agent - Google Patents
Organic film removing agent Download PDFInfo
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- CN101957565B CN101957565B CN 201010270265 CN201010270265A CN101957565B CN 101957565 B CN101957565 B CN 101957565B CN 201010270265 CN201010270265 CN 201010270265 CN 201010270265 A CN201010270265 A CN 201010270265A CN 101957565 B CN101957565 B CN 101957565B
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Abstract
The invention relates to an organic film removing agent, which is characterized by consisting of the following components in percentage by weight: 20 to 50 percent of organic alkali, 0.1 to 1.0 percent of chloride, 1.0 to 5.0 percent of sorbitol, 0.1 to 1.0 percent of copper corrosion inhibitor and 45 to 74 percent of deionized water. The organic film removing agent is suitable for a negative dry film used for alkali solution development, and the main component of the dry film is polymer with carboxyl. In the organic film removing agent of the invention, the organic alkali can react with the polymer with the carboxyl in the dry film to ensure that a large dry film is broken into small blocks; the chloride can promote the quick separation of an interface between the dry film and a copper plated layer; the sorbitol enables the organic film removing agent to reach the inner part of the dry film quickly; and the organic alkali, the chloride and the sorbitol are cooperated with one another to ensure that the organic film removing agent has high performance of quickly removing a 'clamped film'-shaped dry film from a copper substrate, high film removing efficiency and good film removing effect. The organic film removing agent has the advantages of low toxicity, safe use and easy treatment of waste solution.
Description
Technical field
The present invention relates to a kind of in the line pattern transfer process of printed circuit board, being used for from organic film that moves back of substrate stripping dry film.
Background technology
At present, make printed circuit board when (being called for short PCB), in the circuit figure transfer, dry film is one of important " imaging " technology." imaging " dry film afterwards need be with moving back film with its removal (promptly moving back film), to carry out next step etch process.In graphic plating technology because graphical distribution is inhomogeneous, the plate subregion after plating, the thickness that copper coating can occur near or exceed the situation of the thickness of dry film, make dry film clamped by copper coating, be commonly called as " folder film ".Nipped dry film moves back film exchange difficulty with to move back the film surface of contact little, and it is unclean to cause moving back film, and short circuit appears in circuit easily after the etching.
To the situation of " folder film ", it is to prolong to move back the time of membrane operations that routine is moved back membrane technology, or repeatedly does over again and move back membrane operations again, moves back membrane efficiency but do so seriously to reduce.Move back membrane efficiency in order to improve; The another kind of existing membrane technology that moves back is when moving back film, in moving back film, to add auxiliary agent such as butyl cellosolve in addition, moves back the solubility property of film to dry film with improvement, but the butyl cellosolve higher material that is toxicity; Use dangerously, and the useless film liquid intractability that moves back is big.
Summary of the invention
Technical matters to be solved by this invention provides a kind of organic film that moves back that is used to strip dry film, and this organic film that moves back has premium properties that can peel off " folder film " shape dry film from the copper base material, move back the membrane efficiency height, and toxicity is low, and is safe in utilization.The technical scheme that adopts is following:
A kind of organic film that moves back is characterized in that being made up of the component of following weight number percent:
Organic base 20-50%;
Villaumite 0.1-1.0%;
Sorbierite 1.0-5.0%;
Copper inhibitor 0.1-1.0%;
Deionized water 45-74%.
Above-mentioned organic base is to have chemical general formula R-NH
2Organic amine in a kind of or wherein multiple combination; R can be alkyl, hydroxy alkyl or aminoalkyl; For example: isopropylamine, monoethyl amine, diethylamine, triethylamine, a n-propylamine, a n-butylamine, di-n-butylamine, tri-n-butylamine, sec-butylamine, monoethanolamine, diethanolamine, triethanolamine, diglycolamine, tert-butylamine, 1; 4-butanediamine, 1,2-propane diamine, 1,3-propane diamine etc.
Above-mentioned villaumite can be a kind of or wherein multiple combination in sodium chloride, potassium chloride and the magnesium chloride.
Above-mentioned copper inhibitor can be protected copper face (comprising the surface of copper base material and the surface of copper coating), reduces the corrosion of the organic base of high concentration to copper.Above-mentioned copper inhibitor can be a kind of or wherein multiple potpourri in the derivant (like 5-methylbenzotrazole, 5-carboxyl benzotriazole, 4-carboxyl benzotriazole, I-hydroxybenzotriazole), imidazolines (like 2-oleic imidazolinone, naphthenic acid imidazoline), thiazole compound (like thiazolamine, 2-mercaptobenzothiazole), quaternary ammonium salt (like hexadecyltrimethylammonium chloride, cetyl trimethyl ammonium bromide) of benzotriazole, benzotriazole.Preferred above-mentioned copper inhibitor is the derivant of benzotriazole or benzotriazole.
Above-mentioned organic film that moves back can adopt following method manufacturing: be equipped with earlier organic base, villaumite, sorbierite, copper inhibitor and deionized water in proportion; Then organic base, villaumite, sorbierite and deionized water are mixed under room temperature (being generally 20-25 ℃), obtain mixed solution; Again copper inhibitor is joined in the above-mentioned mixed solution, and mix, obtain organic film that moves back.
Above-mentioned organic film that moves back can be according to moving back the film needs when using, and water dilutes, and water consumption is generally organic 4-9 that moves back film weight doubly.
Organic film that moves back of the present invention is suitable for the negativity dry film that alkalies develops, and the principal ingredient of dry film is the polymkeric substance of band carboxyl.Organic moving back in the film of the present invention, organic base can with dry film in the band carboxyl polymer reaction, form water miscible polymkeric substance, make the dry film of bulk be fragmented into fritter; Villaumite can impel dry film to separate fast with the interface between the copper coating; Sorbierite has good effect of impregnation may to dry film, makes organic film that moves back can arrive dry film inside fast; Organic base, villaumite and sorbierite three cooperate, and make organic film that moves back of the present invention have the premium properties of peeling off " folder film " shape dry film from the copper base material fast, move back the membrane efficiency height, and it is effective to move back film.Organic film that moves back of the present invention does not contain the higher material of toxicity, and toxicity is low, and is safe in utilization, and waste liquid is handled easily.
Embodiment
Embodiment 1
At first, by the organic film that moves back of every manufacturing double centner (kg), be equipped with following raw material: 45 kilograms of organic bases (being monoethanolamine); 0.1 kilogram of villaumite (being sodium chloride); 1 kilogram of sorbierite, 0.1 kilogram of copper inhibitor (being benzotriazole), 53.8 kilograms of deionized waters.
Make organic film that moves back by following step then: organic base, villaumite, sorbierite and deionized water are mixed, obtain mixed solution under room temperature (being generally 20-25 ℃); Again copper inhibitor is joined in the above-mentioned mixed solution, and mix, obtain organic film that moves back.
The organic film that moves back of the double centner that makes contains: 45 kilograms of organic bases (being monoethanolamine), 0.1 kilogram of villaumite (being sodium chloride), 1 kilogram of sorbierite, 0.1 kilogram of copper inhibitor (being benzotriazole), 53.8 kilograms of deionized waters.
Embodiment 2
At first, by the organic film that moves back of every manufacturing double centner (kg), be equipped with following raw material: organic base (is 1 for 23 kilograms; The 2-propane diamine), 0.5 kilogram of villaumite (being potassium chloride), 2.5 kilograms of sorbierites; 0.5 kilogram of copper inhibitor (being benzotriazole), 73.5 kilograms of deionized waters.
Make organic film that moves back by following step then: organic base, villaumite, sorbierite and deionized water are mixed, obtain mixed solution under room temperature (being generally 20-25 ℃); Again copper inhibitor is joined in the above-mentioned mixed solution, and mix, obtain organic film that moves back.
The organic film that moves back of the double centner that makes contains: 23 kilograms of organic bases (being 1, the 2-propane diamine), 0.5 kilogram of villaumite (being potassium chloride), 2.5 kilograms of sorbierites, 0.5 kilogram of copper inhibitor (being benzotriazole), 73.5 kilograms of deionized waters.
Embodiment 3
At first, by the organic film that moves back of every manufacturing double centner (kg), be equipped with following raw material: 30 kilograms of organic bases (being triethylamine); 1 kilogram of villaumite (being magnesium chloride); 5 kilograms of sorbierites, 1.0 kilograms of copper inhibitors (being the 5-methylbenzotrazole), 63 kilograms of deionized waters.
Make organic film that moves back by following step then: organic base, villaumite, sorbierite and deionized water are mixed, obtain mixed solution under room temperature (being generally 20-25 ℃); Again copper inhibitor is joined in the above-mentioned mixed solution, and mix, obtain organic film that moves back.
The organic film that moves back of the double centner that makes contains: 30 kilograms of organic bases (being triethylamine), 1 kilogram of villaumite (being magnesium chloride), 5 kilograms of sorbierites, 1.0 kilograms of copper inhibitors (being the 5-methylbenzotrazole), 63 kilograms of deionized waters.
Embodiment 4
At first; By the organic film that moves back of every manufacturing double centner (kg); Be equipped with following raw material: 50 kilograms of organic bases (wherein 25 kilograms of isopropylamines, 25 kilograms of diglycolamines), 0.6 kilogram of villaumite (wherein 0.2 kilogram in sodium chloride, 0.4 kilogram in potassium chloride), 4 kilograms of sorbierites; 0.4 kilogram of copper inhibitor (being thiazolamine), 45 kilograms of deionized waters.
Make organic film that moves back by following step then: organic base, villaumite, sorbierite and deionized water are mixed, obtain mixed solution under room temperature (being generally 20-25 ℃); Again copper inhibitor is joined in the above-mentioned mixed solution, and mix, obtain organic film that moves back.
The organic film that moves back of the double centner that makes contains: 50 kilograms of organic bases (wherein 25 kilograms of isopropylamines, 25 kilograms of diglycolamines); 0.6 kilogram of villaumite (wherein 0.2 kilogram in sodium chloride, 0.4 kilogram in potassium chloride); 4 kilograms of sorbierites; 0.4 kilogram of copper inhibitor (being thiazolamine), 45 kilograms of deionized waters.
Embodiment 5
At first; By the organic film that moves back of every manufacturing double centner (kg), be equipped with following raw material: 20 kilograms of organic bases (wherein 15 kilograms of triethanolamines, 1,5 kilograms of 4-butanediamine); 0.2 kilogram of villaumite (being magnesium chloride); 5 kilograms of sorbierites, 0.8 kilogram of copper inhibitor (being cetyl trimethyl ammonium bromide), 74 kilograms of deionized waters.
Make organic film that moves back by following step then: organic base, villaumite, sorbierite and deionized water are mixed, obtain mixed solution under room temperature (being generally 20-25 ℃); Again copper inhibitor is joined in the above-mentioned mixed solution, and mix, obtain organic film that moves back.
The organic film that moves back of the double centner that makes contains: 20 kilograms of organic bases (15 kilograms of triethanolamines, 1 wherein; 5 kilograms of 4-butanediamine), 0.2 kilogram of villaumite (being magnesium chloride), 5 kilograms of sorbierites; 0.8 kilogram of copper inhibitor (being cetyl trimethyl ammonium bromide), 74 kilograms of deionized waters.
Embodiment 6
At first, by the organic film that moves back of every manufacturing double centner (kg), be equipped with following raw material: 25 kilograms of organic bases (being diethanolamine); 0.5 kilogram of villaumite (being potassium chloride); 5 kilograms of sorbierites, 1.0 kilograms of copper inhibitors (being I-hydroxybenzotriazole), 68.5 kilograms of deionized waters.
Make organic film that moves back by following step then: organic base, villaumite, sorbierite and deionized water are mixed, obtain mixed solution under room temperature (being generally 20-25 ℃); Again copper inhibitor is joined in the above-mentioned mixed solution, and mix, obtain organic film that moves back.
The organic film that moves back of the double centner that makes contains: 25 kilograms of organic bases (being diethanolamine), 0.5 kilogram of villaumite (being potassium chloride), 5 kilograms of sorbierites, 1.0 kilograms of copper inhibitors (being I-hydroxybenzotriazole), 68.5 kilograms of deionized waters.
Embodiment 7
At first; By the organic film that moves back of every manufacturing double centner (kg); Be equipped with following raw material: 40 kilograms of organic bases (being triethylamine), 1 kilogram of villaumite (being sodium chloride), 2 kilograms of sorbierites; 1 kilogram of copper inhibitor (wherein 0.9 kilogram of 2-mercaptobenzothiazole, 0.1 kilogram of hexadecyltrimethylammonium chloride), 56 kilograms of deionized waters.
Make organic film that moves back by following step then: organic base, villaumite, sorbierite and deionized water are mixed, obtain mixed solution under room temperature (being generally 20-25 ℃); Again copper inhibitor is joined in the above-mentioned mixed solution, and mix, obtain organic film that moves back.
The organic film that moves back of the double centner that makes contains: 40 kilograms of organic bases (being triethylamine); 1 kilogram of villaumite (being sodium chloride); 2 kilograms of sorbierites, 1 kilogram of copper inhibitor (wherein 0.9 kilogram of 2-mercaptobenzothiazole, 0.1 kilogram of hexadecyltrimethylammonium chloride), 56 kilograms of deionized waters.
Embodiment 8
At first; By the organic film that moves back of every manufacturing double centner (kg); Be equipped with following raw material: 45 kilograms of organic bases (wherein 35 kilograms of monoethanolamines, 10 kilograms of diethylamine), 0.5 kilogram of villaumite (being potassium chloride), 3 kilograms of sorbierites; 1 kilogram of copper inhibitor (being the 2-oleic imidazolinone), 50.5 kilograms of deionized waters.
Make organic film that moves back by following step then: organic base, villaumite, sorbierite and deionized water are mixed, obtain mixed solution under room temperature (being generally 20-25 ℃); Again copper inhibitor is joined in the above-mentioned mixed solution, and mix, obtain organic film that moves back.
The organic film that moves back of the double centner that makes contains: 45 kilograms of organic bases (wherein 35 kilograms of monoethanolamines, 10 kilograms of diethylamine); 0.5 kilogram of villaumite (being potassium chloride); 3 kilograms of sorbierites, 1 kilogram of copper inhibitor (being the 2-oleic imidazolinone), 50.5 kilograms of deionized waters.
Claims (2)
1. organic film that moves back is characterized in that being made up of the component of following weight number percent: organic base 20-50%, villaumite 0.1-1.0%, sorbierite 1.0-5.0%, copper inhibitor 0.1-1.0%, deionized water 45-74%; Said organic base is isopropylamine, monoethyl amine, diethylamine, triethylamine, a n-propylamine, a n-butylamine, di-n-butylamine, tri-n-butylamine, sec-butylamine, monoethanolamine, diethanolamine, triethanolamine, diglycolamine, tert-butylamine, 1; 4-butanediamine, 1; 2-propane diamine and 1, a kind of or wherein multiple combination in the 3-propane diamine; Said villaumite is a kind of or wherein multiple combination in sodium chloride, potassium chloride and the magnesium chloride.
2. organic film that moves back according to claim 1 is characterized in that: said copper inhibitor is a kind of or wherein multiple potpourri in benzotriazole, 5-methylbenzotrazole, 5-carboxyl benzotriazole, 4-carboxyl benzotriazole, I-hydroxybenzotriazole, 2-oleic imidazolinone, naphthenic acid imidazoline, thiazolamine, 2-mercaptobenzothiazole, hexadecyltrimethylammonium chloride and the cetyl trimethyl ammonium bromide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010270265 CN101957565B (en) | 2010-08-28 | 2010-08-28 | Organic film removing agent |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201010270265 CN101957565B (en) | 2010-08-28 | 2010-08-28 | Organic film removing agent |
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| Publication Number | Publication Date |
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| CN101957565A CN101957565A (en) | 2011-01-26 |
| CN101957565B true CN101957565B (en) | 2012-05-23 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN 201010270265 Expired - Fee Related CN101957565B (en) | 2010-08-28 | 2010-08-28 | Organic film removing agent |
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Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103543619A (en) * | 2013-09-29 | 2014-01-29 | 杨桂望 | Anticorrosive agent composition comprising imidazoline |
| CN104503211B (en) * | 2014-11-05 | 2019-01-25 | 青岛华仁技术孵化器有限公司 | Corrosion inhibitor stripper |
| CN105676603A (en) * | 2016-04-13 | 2016-06-15 | 深圳市松柏实业发展有限公司 | Printed circuit board film removal liquid and preparation method and use method thereof |
| CN106211598B (en) * | 2016-08-31 | 2019-01-18 | 广东成德电子科技股份有限公司 | A kind of organic film removing agent of printed circuit board and preparation method thereof |
| CN108359525A (en) * | 2018-03-15 | 2018-08-03 | 东莞市庆海化工有限公司 | A kind of used in electronic industry remover and preparation method |
| CN109116689A (en) * | 2018-09-19 | 2019-01-01 | 珠海特普力高精细化工有限公司 | A kind of organic dry film stripper of environment-friendly type |
| CN112552917A (en) * | 2020-12-07 | 2021-03-26 | 太仓市何氏电路板有限公司 | Film removing agent for LED aluminum surface anodic oxide film and preparation method thereof |
| CN113201409A (en) * | 2021-05-08 | 2021-08-03 | 苏州凯瑞纳米科技有限公司 | Cleaning composition of motor PCB soldering flux, preparation method, use method and application thereof |
| CN113913187B (en) * | 2021-09-18 | 2022-08-12 | 深圳市艾希尔科技有限公司 | Film removing liquid, preparation method and use method thereof |
| CN115261879A (en) * | 2022-07-05 | 2022-11-01 | 南通群安电子材料有限公司 | Organic film removing liquid suitable for MSAP (multiple-site amplification process) |
Citations (2)
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| CN101295144A (en) * | 2008-06-19 | 2008-10-29 | 大连三达奥克化学股份有限公司 | Photoresist stripping liquid |
| CN101630127A (en) * | 2008-07-18 | 2010-01-20 | 株式会社东进世美肯 | Photoresist stripper composition in fabrication of color filter array of liquid crystal display |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009516360A (en) * | 2005-10-13 | 2009-04-16 | アドバンスド テクノロジー マテリアルズ，インコーポレイテッド | Metal-compatible photoresist and / or sacrificial antireflective coating removal composition |
| TWI338026B (en) * | 2007-01-05 | 2011-03-01 | Basf Electronic Materials Taiwan Ltd | Composition and method for stripping organic coatings |
| KR101488265B1 (en) * | 2007-09-28 | 2015-02-02 | 삼성디스플레이 주식회사 | Composition for stripping and stripping method |
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- 2010-08-28 CN CN 201010270265 patent/CN101957565B/en not_active Expired - Fee Related
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101295144A (en) * | 2008-06-19 | 2008-10-29 | 大连三达奥克化学股份有限公司 | Photoresist stripping liquid |
| CN101630127A (en) * | 2008-07-18 | 2010-01-20 | 株式会社东进世美肯 | Photoresist stripper composition in fabrication of color filter array of liquid crystal display |
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| CN101957565A (en) | 2011-01-26 |
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Granted publication date: 20120523 Termination date: 20120828 |