CN105541293B - 一种负离子内墙砖 - Google Patents

一种负离子内墙砖 Download PDF

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CN105541293B
CN105541293B CN201610043174.5A CN201610043174A CN105541293B CN 105541293 B CN105541293 B CN 105541293B CN 201610043174 A CN201610043174 A CN 201610043174A CN 105541293 B CN105541293 B CN 105541293B
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侯晓涛
马胜昔
刘智永
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Shandong Yongqian Ceramic Technology Co.,Ltd.
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Abstract

一种负离子内墙砖,属于内墙砖技术领域。一种负离子内墙砖,其特征在于:包括坯体、化妆土层、负离子面釉层,所述的化妆土层的釉浆重量份组成为:化妆土成釉100份、纤维素0.8~1.1份、水分保持剂0.33~0.35份、水33~37份,所述负离子面釉层的釉浆重量份组成为:面釉熔块95份、高岭土5~5.5份、纤维素0.18~0.22份、三聚磷酸钠0.28~0.32份、负氧离子材料4~7份。本发明通过化妆涂层的成分调节,阻断负离子进入坯体的通道,成功的在密度小、气孔率高的墙面装上实现了负离子的高效释放。

Description

一种负离子内墙砖
技术领域
一种负离子内墙砖,属于内墙砖技术领域。
背景技术
内墙砖是一种重要的建筑装饰装修材料,由于多是用于竖直贴附环境。所以要求内墙砖具有更小的比重和膨胀比。现有技术将锂电气石、镁电气石材料与纳米TiO2用作负离子发生剂,制成具有负离子释放功能的纳米复合负离子粉体,引入到陶瓷砖中,并与陶瓷基体良好结合起来,从而获得具有释放负离子能力的陶瓷釉面砖。但是在负离子材料应用于内墙砖时存在以下问题。内墙砖由于比重小,坯体的气孔率更高,在外部釉层或全抛层气孔率相对更小的情况下,有相当一部分负离子会进入坯体而浪费,降低负离子的有效释放量,缩短负离子材料的有效激发时间。
发明内容
克服现有技术的不足,提供了一种负离子产生速率快、利用率高的负离子内墙砖。
本发明解决其技术问题所采用的技术方案是:该负离子内墙砖,其特征在于:包括坯体、化妆土层、负离子面釉层,所述的化妆土层的釉浆重量份组成为:化妆土成釉100份、纤维素0.8~1.1份、水分保持剂 0.33~0.35份、水33~37份,所述负离子面釉层的釉浆重量份组成为:面釉熔块95份、高岭土5~5.5份、纤维素0.18~0.22份、三聚磷酸钠 0.28~0.32份、负氧离子材料4~7份。
本发明通过改变化妆土层和负离子面釉层的组成,调节两个秞层的气孔率、气孔大小和吸水能力,通过气孔率、气孔大小配合使得负离子能够充分释放。最主要的,本发明在传统常用的化妆土成油和面釉熔块的基础上添加调节成份,调控秞层达到特定的吸潮能力,能够一定的吸附所在空间的水分供负氧离子材料激发为负氧离子,提高负氧离子材料的有效利用率,同时吸湿能力配合气孔率、气孔大小达到一种既有充足水分被激发为负离子,又不会在釉面形成细密水珠。大大提高负氧离子单位时间的释放速率的同时,保持釉面清爽。
本发明选择使用面釉熔块与调节成份配合,而不是直接将调节成份加入的面釉的原料组成中,主要是为了调节在烧结的时候由于烧失量产生的釉料膨胀系数和针孔,以达到上述气孔率、气孔大小。同时防止原料溶于水或带有碱性,保证釉浆性能。并尽量把二氧化碳等提前排出从而不影响釉面平整度。提前制成熔块后还容易控制研磨时间和细度,更易于控制釉浆性能。
优选的,所述的化妆土层的釉浆重量份组成为:化妆土成釉100份、纤维素1.0份、水分保持剂 0.35份、水35份,所述负离子面釉层的釉浆重量份组成为:面釉熔块95份、高岭土5份、纤维素0.2份、三聚磷酸钠 0.3份、负氧离子材料5份,水分保持剂为三聚磷酸钠。本优选配方形成釉面的微型结构达到最佳的配合效果,尤其适合中国北方干燥地区,空气中的水分不足的环境。
优选的,所述的化妆土成釉的原料的成份质量百分比为SiO2 55.4%~56%,Al2O3 4%~5%,CaO 23%~24%,MgO 2%~3%,LOI (烧失量)5%~6%,TiO2 8.0%~8.6%。化妆土层的基本作用是将面釉层和坯体层隔离,减少水分渗透,同时形成底色并保持釉面凭证。本化妆土成釉的组成能够与本发明化妆土层的调节成份达到最佳的配合效果,使本发明水分吸附和面釉层的负离子激发达到最佳配合。同时本化妆土成釉的组成能够更好的阻断负氧离子移动到坯体中形成的浪费。
优选的,所述的面釉熔块的原料的成份质量百分比为SiO2 56.45%~58.87%,Al2O38%~9%,K2O 5%~6%,Na2O 0.2%~0.7%,Fe2O3 0.05%~0.13%,CaO 12%~13%,MgO 0.3%~0.4%,BaO3%~4%,ZnO 7.0%~7.4%,B 4%~4.5%。本面釉熔块的组成能够与面釉层的调节成份达到最佳的配合效果,使本发明水分吸附和负离子激发达到最佳配合,同时烧成釉面的气孔率既保证水分的进入和负氧离子的释放,又能大大减少灰尘的挂附。
优选的,所述的纤维素为羧甲基纤维素和羟丙基甲基纤维素按质量比20:1.5~3.5的混合物。纤维素的搭配使用是本发明调节秞层吸水率的重要手段,在本优选条件下,吸水率和释放速率达到稳定的平衡状态,保持负离子的较高释放速率。本发明中也可以单独使用羧甲基纤维素。
优选的,所述坯体的原料重量份组成为:透辉石40份,莱阳土30份,焦宝石20份、滑石3份、黏土7份、水60份、助磨剂1份。坯体的成份主要是调节坯体的密度,减轻内墙砖的自量,便于内墙砖的使用。
优选的,所述的负氧离子材料为硅藻土、氧化钛、奇冰石按质量比5:1~1.2:1.3~1.4的混合物。本发明提供的负氧离子材料能够配合釉面的吸水速率,更快速的激发负离子,充分保证釉面的清爽干洁。
优选的,所述的坯体厚度为6 mm ~8mm,所述的化妆土层的厚度为2 mm ~4mm,所述的负离子面釉层厚度为2mm ~4mm。
本发明实施例提供的一种负离子生态陶瓷砖,通过将耐高温稀土复合材料粉体与其他釉料进行合理地调配,提供了一种绿色安全的,并能高效释放负离子的负离子内墙砖,其负离子释放速率达370个/s·cm2~500个/s·cm2,主要解决了现有技术负离子释放速率低的问题。所用原料廉价易得,能大大提高负离子的释放速率。
本发明的制备方法可使用传统内墙砖的烧制工艺,简单易行,适合大规模工业化应用。
与现有技术相比,本发明的一种负离子内墙砖具有如下优点或有益效果:本发明通过化妆涂层的成分调节,阻断负离子进入坯体的通道,成功的在密度小、气孔率高的墙面装上实现了负离子的高效释放。通过改变化妆土层和负离子面釉层的组成,调节两个秞层的气孔率、气孔大小和吸水能力,通过气孔率、气孔大小配合使得负离子能够充分释放。最主要的,本发明在传统常用的化妆土成油和面釉熔块的基础上添加调节成份,调控秞层达到特定的吸潮能力,能够一定的吸附所在空间的水分供负氧离子材料激发为负氧离子,提高负氧离子材料的有效利用率,同时吸湿能力配合气孔率、气孔大小达到一种既有充足水分被激发为负离子,又不会在釉面形成细密水珠。大大提高负氧离子单位时间的释放速率的同时,保持釉面清爽干洁。
具体实施方式
下面通过具体实施例对本发明做进一步说明,其中实施例1为最佳实施例。
实施例1
对坯体按原料重量份组成:透辉石40份,莱阳土30份,焦宝石20份、滑石3份、黏土7份、水60份、助磨剂1份配料后,进行球磨;经陈腐后压制成型,按下表升温曲线进行干燥素烧:
坯体厚度为7mm;
化妆土层的釉浆按重量份组成:化妆土成釉100份、纤维素0.9份、三聚磷酸钠0.34份、水35份配料后,进行球磨,陈腐;负离子面釉层的釉浆按重量份组成:面釉熔块95份、高岭土5份、纤维素0.2份、三聚磷酸钠 0.3份、负氧离子材料5份配料后,进行球磨,陈腐;化妆土成釉的原料的成份质量百分比为SiO2 55.46%,Al2O3 4.62%,CaO 23.86%,MgO2.76%,LOI 5.3%,TiO2 8.0%;面釉熔块的原料的成份质量百分比为SiO2 58.64%,Al2O3 8.03%,K2O 5.2%,Na2O 0.5%,Fe2O3 0.1%,CaO 12.5%,MgO 0.33%,BaO 3.5%,ZnO 7.0%,B4.2%;化妆土层和负离子面釉层的纤维素均为羧甲基纤维素和羟丙基甲基纤维素按质量比20:2.5的混合物,负氧离子材料:硅藻土、氧化钛、奇冰石按质量比5:1.1:1.3的混合物;
在干燥素烧后的坯体上施釉,化妆土层的厚度为3mm,负离子面釉层厚度为3mm;
釉上印花;
按下表升温曲线在釉烧窑煅烧:
煅烧后,磨边倒角即得;
本例所得的负离子内墙砖,在25℃、相对湿度是45%的室内,负离子释放速率达467个/s•cm2
实施例2
对坯体按原料重量份组成:透辉石40份,莱阳土30份,焦宝石20份、滑石3份、黏土7份、水60份、助磨剂1份配料后,进行球磨;经陈腐后压制成型,按下表升温曲线进行干燥素烧:
坯体厚度为6 mm
化妆土层的釉浆按重量份组成:化妆土成釉100份、纤维素1.1份、水分保持剂0.33份、水33份配料后,进行球磨,陈腐;负离子面釉层的釉浆按重量份组成:面釉熔块95份、高岭土5.2份、纤维素0.18份、三聚磷酸钠 0.28份、负氧离子材料4份配料后,进行球磨,陈腐;化妆土成釉的原料的成份质量百分比为SiO2 55.4%,Al2O35%,CaO 23%,MgO 3%,LOI5%,TiO2 8.6%;面釉熔块的原料的成份质量百分比为SiO2 56.45%,Al2O3 9%,K2O 5%,Na2O0.7%,Fe2O3 0.05%,CaO 13%,MgO 0.3%,BaO 4%,ZnO 7.0%,B 4.5%。;化妆土层和负离子面釉层的纤维素均为羧甲基纤维素和羟丙基甲基纤维素按质量比20: 3.5的混合物,负氧离子材料:硅藻土、氧化钛、奇冰石按质量比5: 1.2: 1.4的混合物;
在干燥素烧后的坯体上施釉,化妆土层的厚度为2 mm,负离子面釉层厚度为2 mm;
釉上印花;
按下表升温曲线在釉烧窑煅烧:
煅烧后,磨边倒角即得;
本例所得的负离子内墙砖,在25℃、相对湿度是45%的室内,负离子释放速率达370个/s•cm2
实施例3
对坯体按原料重量份组成:透辉石40份,莱阳土30份,焦宝石20份、滑石3份、黏土7份、水60份、助磨剂1份配料后,进行球磨;经陈腐后压制成型,按下表升温曲线进行干燥素烧:
坯体厚度为8mm;
化妆土层的釉浆按重量份组成:化妆土成釉100份、纤维素0.8份、水分保持剂0.35份、水37份配料后,进行球磨,陈腐;负离子面釉层的釉浆按重量份组成:面釉熔块95份、高岭土5.5份、纤维素0.22份、三聚磷酸钠 0.28份、负氧离子材料7份配料后,进行球磨,陈腐;化妆土成釉的原料的成份质量百分比为SiO2 56%,Al2O3 4%,CaO 24%,MgO 2%,LOI6%,TiO2 8.0%;面釉熔块的原料的成份质量百分比为SiO2 58.87%,Al2O3 8%,K2O 6%,Na2O0.2%,Fe2O3 0.13%,CaO 12%,MgO 0.4%,BaO 3%,ZnO 7.4%,B 4%;化妆土层和负离子面釉层的纤维素均为羧甲基纤维素和羟丙基甲基纤维素按质量比20:1.5的混合物,负氧离子材料:硅藻土、氧化钛、奇冰石按质量比5:1:1.3的混合物;
在干燥素烧后的坯体上施釉,化妆土层的厚度为4mm,负离子面釉层厚度为4mm;
釉上印花;
按下表升温曲线在釉烧窑煅烧:
煅烧后,磨边倒角即得;
本例所得的负离子内墙砖,在25℃、相对湿度是45%的室内,负离子释放速率达500个/s•cm2
作为医学界的“空气维生素”,负离子具有显著的杀菌、消毒、除臭防腐、降尘等功能,目前已被当作评价环境和空气质量的一个重要标准。相关数据表明,楼宇房间内负离子浓度多在100个/cm3以下,易诱发人类各种疾病。采用人工方法增加空气中负离子浓度,是改善人类居住环境,保护人类健康的有益措施。从各实施例可以看出本发明的负离子内墙砖能够快速在室内释放出负离子。
以上所述,仅是本发明的较佳实施例而已,并非是对本发明作其它形式的限制,任何熟悉本专业的技术人员可能利用上述揭示的技术内容加以变更或改型为等同变化的等效实施例。但是凡是未脱离本发明技术方案内容,依据本发明的技术实质对以上实施例所作的任何简单修改、等同变化与改型,仍属于本发明技术方案的保护范围。

Claims (6)

1.一种负离子内墙砖,其特征在于:包括坯体、化妆土层、负离子面釉层,所述的化妆土层的釉浆重量份组成为:化妆土成釉100份、纤维素0.8~1.1份、水分保持剂 0.33~0.35份、水33~37份,所述负离子面釉层的釉浆重量份组成为:面釉熔块95份、高岭土5~5.5份、纤维素0.18~0.22份、三聚磷酸钠 0.28~0.32份、负氧离子材料4~7份;
所述的化妆土成釉的原料的成份质量百分比为SiO2 55%~56%,Al2O3 4%~5%,CaO 23%~24%,MgO 2%~3%,LOI 5%~6%,TiO2 8.0%~8.6%。
2.根据权利要求1所述的一种负离子内墙砖,其特征在于,所述的化妆土层的釉浆重量份组成为:化妆土成釉100份、纤维素1.0份、水分保持剂 0.35份、水35份,所述负离子面釉层的釉浆重量份组成为:面釉熔块95份、高岭土5份、纤维素0.2份、三聚磷酸钠 0.3份、负氧离子材料5份,水分保持剂为三聚磷酸钠。
3.根据权利要求1所述的一种负离子内墙砖,其特征在于:所述的面釉熔块的原料的成份质量百分比含量为SiO2 56.45%~58.87%,Al2O3 8%~9%,K2O 5%~6%,Na2O 0.2%~0.7%,Fe2O30.05%~0.13%,CaO 12%~13%,MgO 0.3%~0.4%,BaO 3%~4%,ZnO 7.0%~7.4%,B 4%~4.5%。
4.根据权利要求1或2所述的一种负离子内墙砖,其特征在于:所述的纤维素为羧甲基纤维素和羟丙基甲基纤维素按质量比20:1.5~3.5的混合物。
5.根据权利要求1所述的一种负离子内墙砖,其特征在于,所述的负氧离子材料为硅藻土、氧化钛、奇冰石按质量比5:1~1.2:1.3~1.4的混合物。
6.根据权利要求1所述的一种负离子内墙砖,其特征在于,所述的坯体厚度为6 mm ~8mm,所述的化妆土层的厚度为2 mm ~4mm,所述的负离子面釉层厚度为2 mm ~4mm。
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