CN105466948A - Observation support device, observation support method and observation support system - Google Patents
Observation support device, observation support method and observation support system Download PDFInfo
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Abstract
The invention provides an observation support device, an observation support method and an observation support system. The observation support method comprises: preparing a pattern image representing the pattern on a base material, the base material comprising a plurality of assemblies arranged periodically, and a plurality of wirings connected among the assemblies; accepting to assign a position in the pattern region representing the pattern in the pattern image as input of an assigned position; specifying the region connected with the assigned position in the pattern region as a specific region; and identifying the specific region and displaying the pattern image on a display portion. Thus, operating personnel can easily identify the regions connected with the assigned position in the pattern region, so as to properly support observation of the operating personnel on the pattern image.
Description
Technical field
The present invention relates to a kind of support representing the technology that the image with periodic pattern is observed.
Background technology
In the manufacture of touch-screen, utilize the metal electrode being connected to transparency electrode via transparent distribution to carry out checking.When confirming poor flow when utilizing checking, in order to specific bad position, operating personnel uses laser microscope or optical microscope, along the distribution be connected with the metal electrode being identified poor flow, observes this distribution and transparency electrode.
In addition, following method is disclosed: by arranging in Wiring pattern with the following electrode terminal section in multiple electrode terminal section of prescribed distance arrangement in patent documentation 1, and easy specific distribution position, the special shape of index when described electrode terminal section has a distribution position becoming specific Wiring pattern or length.And, in patent documentation 2, propose to have the device of the check image of the pattern obtaining the transparency electrode be formed on base material.In the device of patent documentation 2, the set angle of illumination angle formed by the normal obtaining optical axis from illumination part to shooting area and base material, illumination angle is set as set angle, detection angle formed by optical axis from shooting area to line sensor and normal is also set as this set angle, obtains the high check image of contrast thus.
[prior art document]
[patent documentation]
No. 2007/013528th, [patent documentation 1] International Publication
[patent documentation 2] Japanese Patent Laid-Open 2012-251808 publication
Summary of the invention
[inventing problem to be solved]
And say, when using laser microscope or optical microscope, under multiplying power when carrying out the observation of distribution and transparency electrode, field of view is very little, thus in distribution or the intensive region of transparency electrode, be very difficult to judge which is the object of observation (that is, confirms as poor flow person).Even if when adopting the method for patent documentation 1, also identical problem can be produced in the region leaving electrode terminal section.Also consider to utilize the device of patent documentation 2 to obtain the image representing transparent electrode pattern, grasp general image in the images thus and observe distribution.But, even if in described image, in distribution or the intensive region of transparency electrode, still easily mistake the object of observation.
The present invention completes in view of described problem, and object is the observation suitably supporting operating personnel to pattern image.
[technological means of dealing with problems]
Invention described in technical scheme 1 is support representing the observation supportive device that the image with periodic pattern is observed, comprise: storage part, store the pattern image of the pattern represented on base material, described base material has the multiple element periodically arranged and the multiple distributions connected by interelement; Display part, display image; Input receiving unit, accepts an input position in the area of the pattern of described for the expression of described pattern image pattern being appointed as assigned address; Region particular portion, by the region that is connected with described assigned address in described area of the pattern specifically for specific region; And display control unit, described specific region can be identified and make described pattern image be shown in described display part.
Invention described in technical scheme 2 is the observation supportive device described in technical scheme 1, described multiple element is multiple electrode, described multiple electrode is included in different multiple first electrode of brightness in described pattern image and multiple second electrode, and described specific region comprises the region of expression first electrode and represents the region of the second electrode.
The observation supportive device of invention described in technical scheme 3 according to technical scheme 1 or 2, described assigned address represents the position of the defect in described pattern or the position of the electrode relevant with described defect.
The observation supportive device of invention described in technical scheme 4 according to any one of technical scheme 1 to 3, in described input receiving unit, accept the amplification display of the described pattern image shown in the described display part of instruction or reduce the input of display, described display control unit can identify described specific region, and makes the described pattern image through zooming in or out again be shown in described display part.
Invention described in technical scheme 5 is support representing the observation support method that the image with periodic pattern is observed, comprise the steps: pattern image a) preparing the pattern represented on base material, described base material has the multiple element periodically arranged and the multiple distributions connected by interelement, b) accepts an input position in the area of the pattern of described for the expression of described pattern image pattern being appointed as assigned address; C) by the region that is connected with described assigned address in described area of the pattern specifically for specific region; And d) described specific region can be identified and make described pattern image be shown in display part.
The observation support method of invention described in technical scheme 6 according to technical scheme 5, described multiple element is multiple electrode, described multiple electrode is included in different multiple first electrode of brightness in described pattern image and multiple second electrode, and described specific region comprises the region of expression first electrode and represents the region of the second electrode.
The observation support method of invention described in technical scheme 7 according to technical scheme 5 or 6, described assigned address represents the position of the defect in described pattern or the position of the electrode relevant with described defect.
The observation support method of invention described in technical scheme 8 according to any one of technical scheme 5 to 7, also comprises the steps: accept the amplification display of the described pattern image shown in the described display part of instruction or reduce the input of display; Described specific region can be identified, and the described pattern image through zooming in or out can be made again to be shown in described display part.
Invention described in technical scheme 9 is for supporting representing the observation back-up system with the observation of the image of periodic pattern, described observation back-up system comprises: the pattern image preparing the pattern represented on base material, described base material has the module of the multiple element periodically arranged and the multiple distributions connected by interelement, accepts a module position in the area of the pattern of described for the expression of described pattern image pattern being appointed as the input of assigned address; By the region that is connected with described assigned address in the described area of the pattern module specifically for specific region; And described specific region can be identified and make described pattern image be shown in the module of display part.
[effect of invention]
According to the present invention, the region be connected with assigned address in the easy identification icon region of operating personnel can be made, thus suitably can support that operating personnel is to the observation of pattern image.
Accompanying drawing explanation
Fig. 1 is the figure of the formation representing image acquiring device.
Fig. 2 is the figure of the formation representing computing machine.
Fig. 3 is the calcspar representing that the function that computing machine realizes is formed.
Fig. 4 is the figure of the pattern represented on base material.
Fig. 5 is the figure of the flow process of the action of the image representing the pattern obtained on base material.
Fig. 6 is the figure representing pattern image.
Fig. 7 is the figure of the flow process of the action of the observation expressing support for image.
Fig. 8 is the figure representing the pattern image shown in display.
Fig. 9 is the figure representing the pattern image shown in display.
Figure 10 is the figure representing the pattern image shown in display.
Reference numeral:
1: image acquiring device
3: computing machine
4: observe supportive device
9: base material
11: travel mechanism
13: shooting unit
21: platform
22:X direction moving part
23:Y direction moving part
30: recording medium
31：CPU
32：ROM
33：RAM
34: fixed disk
35: display
36: input part
36a: keyboard
36b: mouse
37: reading device
38: Department of Communication Force
40: operational part
41: input receiving unit
42: region particular portion
43: display control unit
49: storage part
80: area of the pattern
90: shooting area
131: illumination part
132: line sensor
133: angle change mechanism
134: diapire
135,136: motor
201: the first openings
202: the second openings
300: program
491: pictorial image data
811: transparency electrode region
812: transparent distribution region
821,821a: metal electrode region
822: metal wiring region
911: transparency electrode
912: transparent distribution
921: metal electrode
922: metal wiring
A1: dotted line
G1: guide line
G2: double dot dash line
J1, J2: optical axis
K1: defect
N: normal
S11 ~ S13, S20 ~ S26: step
X, Y, Z: direction
θ 1: illumination angle
θ 2: detection angle
Embodiment
Fig. 1 is the figure of the formation of the image acquiring device 1 representing one embodiment of the present invention.Image acquiring device 1 is as lower device, that is, obtain the image of the Thinfilm pattern be formed on base material 9, and support that operating personnel is to the observation of this image.In present embodiment, base material 9 is glass substrate or hyaline membrane.Thinfilm pattern is such as nesa coating or metal film.Also other films such as anti-reflective film can be set on base material 9.In the following description, by Thinfilm pattern referred to as " pattern ".In the manufacture of base material 9 for the touch-screen of such as capacitance type.
Image acquiring device 1 comprise make base material 9 movement travel mechanism 11, shooting unit 13 and computing machine 3.Travel mechanism 11 comprises: platform 21, is held on upper surface by base material 9; X-direction moving part 22, makes platform 21 move towards the X-direction in Fig. 1 of the main surface parallel with base material 9; And Y-direction moving part 23, make X-direction moving part 22 towards the main surface parallel with base material 9 and the Y-direction vertical with X-direction moves.Travel mechanism 11 is for making base material 9 relative to the mechanism of shooting area 90 described later relatively movement.In addition, make platform 21 to the mechanism of the Z-direction movement in X-direction and the vertical Fig. 1 of Y-direction or make platform 21 centered by the axle parallel with Z-direction and the mechanism rotated, also can be appended in travel mechanism 11.In image acquiring device 1, computing machine 3 as bear image acquiring device 1 entirety control overall control part and play a role.
Shooting unit 13 comprises: towards the illumination part 131 of shooting area 90 emergent light on base material 9, receive the line sensor 132 from the reflected light of shooting area 90, and change the illumination angle of light of illumination part 131 and the angle change mechanism 133 of the detection angle of line sensor 132.Herein, illumination angle be optical axis J1 from illumination part 131 to shooting area 90 and base material 9 normal N formed by angle θ 1.Detection angle is angle θ 2 formed by optical axis J2 from shooting area 90 to line sensor 132 and normal N.
Illumination part 131 outgoing has the light of the wavelength of permeability for nesa coating.Light is at least irradiated to the shooting area 90 of wire.Illumination part 131 comprises the multiple light emitting diode (Lightemittingdiode, LED) arranged in X direction and the optical system light uniformization from LED also being led the shooting area 90 extended in X direction.Line sensor 132 comprises one dimension capturing element and by shooting area 90 optical system with the sensitive surface optical conjugate of capturing element.In addition, autofocus mechanism also can be arranged at shooting unit 13, and described autofocus mechanism makes illumination part 131, line sensor 132 and angle change mechanism 133 one on the direction of the normal N of base material 9 mobile.
During the shooting image stated after the acquisition, base material 9 utilize travel mechanism 11 and along and the direction that intersects of shooting area 90 move.That is, travel mechanism 11 is for making base material 9 relative to the mechanism of shooting area 90 relatively movement.With the movement of base material 9 concurrently, utilize line sensor 132 and repeatedly obtain the line image of the shooting area 90 of wire at high speed, thus obtaining two dimension shooting image.In present embodiment, base material 9 moves in the Y-direction vertical with shooting area 90, but shooting area 90 also can tilt relative to moving direction.
Angle change mechanism 133, while illumination angle theta 1 is maintained equal with detection angle θ 2, changes illumination angle theta 1 and detection angle θ 2.Therefore, the size of the detection angle in the following description is also the size of illumination angle, and the size of illumination angle is also the size of detection angle.Illumination part 131 and line sensor 132 are supported in diapire 134 via angle change mechanism 133.Diapire 134 is the board member parallel with Y-direction and Z-direction.
Diapire 134 is arranged the first opening 201 and the second opening 202 of the arc-shaped centered by shooting area 90.Angle change mechanism 133 comprises making illumination part 131 along the motor 135 of the first opening 201 movement and guide portion, tooth bar and gear (omitting diagram), also has to make line sensor 132 along the motor 136 of the second opening 202 movement and guide portion, tooth bar and gear (diagram is omitted).
Fig. 2 is the figure of the formation representing computing machine 3.Computing machine 3 is the formation of common computer system, this computing machine comprises the central processing unit (Centralprocessingunit carrying out various calculation process, CPU) ROM (read-only memory) (read-onlymemory of base program 31, is stored, ROM) 32 and store the random access memory (RandomAccessMemory, RAM) 33 of various information.Computing machine 3 also comprises the fixed disk 34 of the information of carrying out storage, carry out display part and the display 35 of the display of the various information such as image, accept the keyboard 36a from the input of operating personnel and mouse 36b (being referred to as below " input part 36 "), carry out the reading device 37 of the reading of information from the recording medium 30 of the embodied on computer readable such as CD, disk, photomagneto disk, and and other of image acquiring device 1 form between the Department of Communication Force 38 of receiving and transmitting signal.
In computing machine 3, read program 300 via reading device 37 from recording medium 30 in advance and be stored in fixed disk 34.CPU31 utilizes RAM33 or fixed disk 34 according to program 300 and performs calculation process, and realizes function described later.
Fig. 3 is the calcspar representing that the function that computing machine 3 realizes is formed.The operational part 40 of Fig. 3 and storage part 49 are that the function realized by the CPU31 of computing machine 3, ROM32, RAM33, fixed disk 34 etc. is formed.Operational part 40 has input receiving unit 41, region particular portion 42 and display control unit 43.The process described later of storage part 49 memory and the pictorial image data 491 obtained.Utilize input receiving unit 41, region particular portion 42, display control unit 43, storage part 49, display 35 and input part 36 in image acquiring device 1 and realize observation supportive device 4 that the observation of image is supported.To carry out describing in later about the details of observing supportive device 4.In addition, the function of operational part 40 can be constructed by special electronic circuit, also can utilize special electronic circuit partly.
Fig. 4 is the figure of the pattern represented on the interarea of base material 9.Base material 9, for the manufacture of the touch-screen of capacitance type, interarea periodically arranges the electrode 911 (hereinafter referred to as " transparency electrode 911 ") of the multiple same shapes formed by nesa coating two-dimensionally.Utilize distribution 912 (hereinafter referred to as " transparent distribution 912 ") to connect between transparency electrode 911, described distribution 912 is formed by nesa coating and thinner than transparency electrode 911.In the example of Fig. 4,4 transparency electrodes 911 utilize 1 transparent distribution 912 and connect.Transparency electrode 911 is the element in order to detect the change of the electrostatic capacitance on touch-screen.
And arrange the outside in the region of multiple transparency electrode 911 on interarea, the electrode 921 (hereinafter referred to as " metal electrode 921 ") of the multiple same shapes formed by metal film is such as periodically arranged in a row.Each metal electrode 921 is connected to and is formed and one end of the distribution 922 (hereinafter referred to as " metal wiring 922 ") thinner than metal electrode 921 by metal film.The other end of metal wiring 922 is connected to transparent distribution 912.In fact, between pair of metal electrodes 921, multiple transparency electrode 911 is electrically connected via metal wiring 922 and transparent distribution 912.Like this, metal electrode 921 is in order to supply electric element via metal wiring 922 and transparent distribution 912 to multiple transparency electrode 911.Around the region configuring multiple transparency electrode 911 rectangular area of the dotted line of appending symbols A1 (in the Fig. 4), optionally form the film not making the material of visible light-transmissive.Utilize this film, make visuognosis to go out metal electrode 921 and metal wiring 922 from an interarea side of base material 9.In Fig. 4, the pattern on base material 9 is simplified and represents, but multiple electrode and multiple distribution (following identical) are in fact set.
As already described, utilize image acquiring device 1 to obtain the image of the pattern on base material 9, then, when operating personnel observes this image, the observation of image is supported.Below, the acquisition of the image of pattern is described, then the support of the observation of image is described.
Fig. 5 is the figure of the flow process of the action of the image representing the pattern obtained on base material 9.First, prepare the base material 9 that should obtain image, and be placed in (step S11) on the platform 21 of Fig. 1.The base material 9 that should obtain image comprises the pair of metal electrodes 921 (pair of metal electrodes that resistance value is higher than the threshold value of regulation) such as confirming poor flow in checking.
In image acquiring device 1, the angle of illumination angle and detection angle is obtained in advance for the often kind of membrane structure (kind of film and the combination of thickness) on base material 9, the angle of described illumination angle and detection angle can improve the contrast representing the region (hereinafter referred to as " transparent pattern region ") of the pattern (that is, transparency electrode 911 and transparent distribution 912) of nesa coating in shooting image.Will except transparent pattern region and the region as a setting, extra-regional region of pattern representing metal film, the contrast in transparent pattern region is the difference (absolute value of the difference of gray-scale value) of transparent pattern region in shooting image and the brightness between background area.In computing machine 3, according to the membrane structure of the base material 9 on platform 21, carry out the angle (hereinafter referred to as " set angle ") that specific shot angle and detection angle should set, and angle change mechanism 133 is controlled, illumination angle and detection angle become this set angle (step S12) thus.
Then, start from illumination part 131 emergent light, in the mode of the position that should take on base material 9 by shooting area 90, utilize travel mechanism 11 that base material 9 is moved in the Y direction continuously.With the movement of base material 9 concurrently, in line sensor 132, the line image of the shooting area 90 of repeated obtain wire at high speed.Thus, obtain two dimension shooting image (hereinafter referred to as " pattern image ") of the pattern represented on base material 9, and stored (step S13) by the storage part 49 of Fig. 3 as pictorial image data 491.As above, utilize the process of the step S11 ~ step S13 of Fig. 5, prepare the pattern image observed by operating personnel.
Fig. 6 is the figure representing pattern image.In Fig. 6, the width of the parallel diagonal lines appended by each region is narrower, represents that the brightness (mean value of brightness values) in this region is lower.In pattern image, the brightness in the region 821 (hereinafter referred to as " metal electrode region 821 ") representing metal electrode 921 and the region 822 (hereinafter referred to as " metal wiring region 822 ") representing metal wiring 922 is the highest.The brightness in the region 811 (hereinafter referred to as " transparency electrode region 811 ") representing transparency electrode 911 and the brightness ratio metal electrode region 821 in region 812 (hereinafter referred to as " transparent distribution region 812 ") representing transparent distribution 912 and metal wiring region 822 is low, higher than the brightness of the background area as non-area of the pattern.In the following description, the region in metal electrode region 821, metal wiring region 822, transparency electrode region 811 and transparent distribution region 812 will be represented in pattern image, that is, represent that the region of pattern is referred to as " area of the pattern 80 ".
Fig. 7 is the figure of the flow process representing the action that the observation observing supportive device 4 pairs of images is supported.First, observe in supportive device 4, prepare in order to the pattern image (step S20) for operation personal observations.In present embodiment, utilize the action of Fig. 5 to obtain pattern image in advance, and be stored in storage part 49 as pictorial image data 491.Pattern image utilizes display control unit 43 and is shown in display 35 (step S21).
As already described, in checking, the specific pair of metal electrodes 921 of poor flow, such as, utilized the click of mouse 36b to specify the position (metal electrode region 821) of the one in this pair of metal electrodes 921 in the pattern image being shown in display 35 by operating personnel.In input receiving unit 41, accept the input (step S22) this position in area of the pattern 80 being appointed as assigned address.
On the other hand, in region particular portion 42, pattern image is implemented to the edge detection process (such as utilizing the edge detection process of once differentiation wave filter or second differential wave filter) of regulation.Thus, extract the multiple subregions comprising metal electrode the region 821 and metal wiring region 822 be connected with each other separately out, and comprise multiple subregions in multiple transparency electrode region 811 and transparent distribution region 812 be connected with each other separately.And, when comprise metal electrode region 821 and metal wiring region 822 subregion, be connected with the subregion comprising transparency electrode region 811 and transparent distribution region 812, these subregions combine, and become a subregion.Utilize above process, in area of the pattern 80, obtain multiple subregion.And, will the subregion of described assigned address be comprised specifically for specific region (step S23).Specific region is the region be connected with assigned address in area of the pattern 80.
Display control unit 43 identifiable design specific region and make pattern image again be shown in display 35 (step S24).In the example of Fig. 8, be assigned address by the metal electrode Region specification of appending symbols 821a, will the subregion of this metal electrode region 821a be comprised specifically for specific region.And, thick dashed line G1 (hereinafter referred to as " guide line G1 ") is overlapped in the edge (edge in the direction extended along specific region) in specific region, identifiable design specific region thus.Operating personnel can not mistake with other subregions, and can observe metal wiring region 822 contained in specific region, transparent distribution region 812 and transparency electrode region 811 along guide line G1.Preferred guide line is for being shown in the line of the specified color do not comprised in the pattern image of display 35.That is, guide line preferably shows with pattern image color separation.
As shown in Figure 9, when the broken string in metal wiring region 822 produces as defect K1, only guide line G1 is enclosed to the side being border with defect K1 in metal wiring region 822, guide line G1 is not enclosed to the opposing party.Therefore, operating personnel, and can easy specific broken position by referring to guide line G1.In region particular portion 42, also can show the data of the positional informations such as the coordinate values of the broken position on base material 9 or preservation positional information.In addition, also by the line of the color specified to surround around specific region, by the color specified to be coated with specific region, with fixing interval, the mark of regulation can be overlapped in specific region etc., specific region can be identified thus.
And, the input of the amplification display of the rectangular area of the double dot dash line of appending symbols G2 in index map 8 is carried out by operating personnel, when this input is accepted by input receiving unit 41 (step S25), display control unit 43 as shown in Figure 10, makes the pattern image through amplifying again be shown in display 35 (step S26).Now, in shown pattern image, guide line G1 is overlapped in the edge of specific region, thus the state that maintenance specific region can be identified.Therefore, specific region and other subregions, in the pattern image through amplifying, also can not be mistaken by operating personnel.In step S25, also can accept instruction by input receiving unit 41 and be shown in the input reducing display of the pattern image of display 35, in this situation, identifiable design specific region and the pattern image again shown through reducing.
Optionally repeat described step S22 ~ step S26, and support that operating personnel is to the observation of pattern image.Now, the assigned address of being specified by step S22 is not limited to the position of the metal electrode 921 relevant with defect because of poor flow, also can be arbitrary position.Observe in supportive device 4, also can confirm whether arbitrary assigned address is connected to both sides' (conducting with or without on image) in pair of metal electrodes region 821.
As described above, observe in supportive device 4, if accept the input position of in area of the pattern 80 being appointed as assigned address, then by the region be connected with assigned address in this area of the pattern 80 specifically for specific region.And, identifiable design specific region and make pattern image be shown in display 35.Thus, the region be connected with assigned address in the easy identification icon region 80 of operating personnel can be made, thus suitably can support that operating personnel is to the observation of pattern image.
And, even if the pattern on base material 9 is included in the different multiple transparency electrodes of brightness in pattern image 911 and multiple metal electrode 921, in region particular portion 42, also can comprise the mode extraction area in the transparency electrode region 811 representing transparency electrode 911 and the metal electrode region 821 representing metal electrode 921 with specific region.Thus, the connection status of transparency electrode 911 and metal electrode 921 can easily be identified.
Such as, before checking, in image acquiring device 1, obtain pattern image, and (live width compare or differential comparison etc.) checks by being compared with design datas such as cad datas by this pattern image.When the defect of pattern being detected in the inspection based on described pattern image, observe pattern image by operating personnel.In the observation of pattern image, assigned address is appointed as in the position of this defect, identifiable design is connected with assigned address and comprises the specific region of defect, and makes pattern image be shown in display 35.Thus, operating personnel can be made easily to identify the specific region relevant to defect, thus the metal electrode 921 that in measurable checking, the possibility of poor flow is high.In this situation, also only can detect that the metal electrode 921 that the position of defect is connected carries out checking to utilization based on the inspection of pattern image.
Various distortion can be carried out in described image acquiring device 1 and observation supportive device 4.
The pattern inspection portion that also check result based on pattern image can be realized from inspection apparatus for pattern or the image acquiring device 1 of outside, is input to and observes supportive device 4.In this situation, represent that this check result of the position of defect is accepted by input receiving unit 41 as the input of assigned address.So, the input of assigned address is not also necessarily undertaken by operating personnel.
Observe supportive device 4 also to can be used for supporting that the image with periodic pattern to representing beyond electrode pattern is observed.Namely, observe supportive device 4 to can be used for supporting that the image to the pattern represented on base material is observed, described base material has the multiple various element (storage unit, photo detector etc.) periodically arranged and the multiple distributions connected by interelement.
The formation of described embodiment and each variation only otherwise conflicting, can be carried out appropriately combined.
Claims (9)
1. observing a supportive device, to representing the observation with the image of periodic pattern, it is characterized in that comprising for supporting:
Storage part, store the pattern image of the pattern represented on base material, described base material has the multiple element periodically arranged and the multiple distributions connected by interelement;
Display part, display image;
Input receiving unit, accepts an input position in the area of the pattern of described for the expression of described pattern image pattern being appointed as assigned address;
Region particular portion, by the region that is connected with described assigned address in described area of the pattern specifically for specific region; And
Display control unit, identifies described specific region and makes described pattern image be shown in described display part.
2. observation supportive device according to claim 1, is characterized in that:
Described multiple element is multiple electrode,
Described multiple electrode is included in different multiple first electrode of brightness in described pattern image and multiple second electrode,
Described specific region comprises the region of expression first electrode and represents the region of the second electrode.
3. observation supportive device according to claim 1 and 2, is characterized in that:
Described assigned address represents the position of the defect in described pattern or the position of the electrode relevant with described defect.
4. observation supportive device according to claim 1 and 2, is characterized in that:
In described input receiving unit, accept the amplification display of the described pattern image shown in the described display part of instruction or reduce the input of display,
Specific region described in described display control unit identification, and make the described pattern image through zooming in or out again be shown in described display part.
5. observing a support method, to representing the observation with the image of periodic pattern, it is characterized in that comprising the steps: for supporting
Prepare the pattern image of the pattern represented on base material, described base material has the multiple element periodically arranged and the multiple distributions connected by interelement;
Accept an input position in the area of the pattern of described for the expression of described pattern image pattern being appointed as assigned address;
By the region that is connected with described assigned address in described area of the pattern specifically for specific region; And
Identify described specific region and make described pattern image be shown in display part.
6. observation support method according to claim 5, is characterized in that:
Described multiple element is multiple electrode,
Described multiple electrode is included in different multiple first electrode of brightness in described pattern image and multiple second electrode,
Described specific region comprises the region of expression first electrode and represents the region of the second electrode.
7. the observation support method according to claim 5 or 6, is characterized in that:
Described assigned address represents the position of the defect in described pattern or the position of the electrode relevant with described defect.
8. the observation support method according to claim 5 or 6, characterized by further comprising following step:
Accept the amplification display of the described pattern image shown in the described display part of instruction or reduce the input of display;
Identify described specific region, and the described pattern image through zooming in or out can be made again to be shown in described display part.
9. observe a back-up system, for supporting that it is characterized in that, described observation back-up system comprises to representing the observation with the image of periodic pattern:
Prepare the pattern image of the pattern represented on base material, described base material has the module of the multiple element periodically arranged and the multiple distributions connected by interelement;
Accept a module position in the area of the pattern of described for the expression of described pattern image pattern being appointed as the input of assigned address;
By the region that is connected with described assigned address in the described area of the pattern module specifically for specific region; And
Identify described specific region and make described pattern image be shown in the module of display part.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014201025A JP2016070800A (en) | 2014-09-30 | 2014-09-30 | Observation support device, observation support method and program |
| JP2014-201025 | 2014-09-30 |
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| CN105466948A true CN105466948A (en) | 2016-04-06 |
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| JP (1) | JP2016070800A (en) |
| CN (1) | CN105466948A (en) |
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| CN108846399A (en) * | 2018-04-10 | 2018-11-20 | 阿里巴巴集团控股有限公司 | A kind of method and device of image procossing |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006058170A (en) * | 2004-08-20 | 2006-03-02 | Dainippon Screen Mfg Co Ltd | Visual confirmation device and inspection system |
| CN1752744A (en) * | 2004-09-21 | 2006-03-29 | 日本特殊陶业株式会社 | Check method, mfg. method and check device for distributed substrate |
| JP2012149905A (en) * | 2011-01-17 | 2012-08-09 | Omron Corp | Substrate inspection device, substrate inspection system, and screen display method for confirming substrate inspection results |
| CN102809567A (en) * | 2011-06-01 | 2012-12-05 | 大日本网屏制造株式会社 | Image acquisition apparatus, pattern inspection apparatus, and image acquisition method |
-
2014
- 2014-09-30 JP JP2014201025A patent/JP2016070800A/en active Pending
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2015
- 2015-07-22 CN CN201510434981.5A patent/CN105466948A/en active Pending
- 2015-08-05 TW TW104125341A patent/TW201612508A/en unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006058170A (en) * | 2004-08-20 | 2006-03-02 | Dainippon Screen Mfg Co Ltd | Visual confirmation device and inspection system |
| CN1752744A (en) * | 2004-09-21 | 2006-03-29 | 日本特殊陶业株式会社 | Check method, mfg. method and check device for distributed substrate |
| JP2012149905A (en) * | 2011-01-17 | 2012-08-09 | Omron Corp | Substrate inspection device, substrate inspection system, and screen display method for confirming substrate inspection results |
| CN102809567A (en) * | 2011-06-01 | 2012-12-05 | 大日本网屏制造株式会社 | Image acquisition apparatus, pattern inspection apparatus, and image acquisition method |
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| TW201612508A (en) | 2016-04-01 |
| JP2016070800A (en) | 2016-05-09 |
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