JP2016070800A - Observation support device, observation support method and program - Google Patents

Abstract

PROBLEM TO BE SOLVED: To appropriately support an observation of a pattern image by workers.SOLUTION: In an observation support device, prepared are many electrodes periodically arrayed, and a pattern image indicative of a pattern on a substrate having much wiring connecting among the electrodes. The pattern image includes: a metal electrode region 821; a metal wiring region 822; a transparent electrode region 811; and a transparent wiring region 812. Then, in a pattern region 80 indicative of the pattern of the pattern image, an input specifying one location as a specification location is received, and in the pattern region 80, a region continuous to the specification location is identified as a specific region. Then, the specific region is made identifiable with a guide line G1 overlapped on one edge in the specific region, and the pattern image is displayed on a display unit. Accordingly, workers can be caused to easily recognize the region continuous to the specification location in the pattern region 80, which in turn an observation of the pattern image by the worker can be appropriately supported.SELECTED DRAWING: Figure 8

Description

  The present invention relates to a technique for supporting observation of an image showing a pattern having periodicity.

  In manufacturing a touch panel, a continuity test is performed using a metal electrode connected to a transparent electrode through a transparent wiring. When continuity check confirms continuity failure, in order to identify the failure location, the operator uses a laser microscope or optical microscope along the wiring that continues to the metal electrode where continuity failure is confirmed. The wiring and the transparent electrode are observed.

  In Patent Document 1, among a plurality of electrode terminal portions arranged at a specified pitch in the wiring pattern, an electrode terminal portion having a specific shape or length that serves as an index when specifying the wiring position of the wiring pattern is provided. Thus, a technique for easily specifying the wiring position is disclosed. Patent Document 2 proposes an apparatus that acquires an inspection image of a transparent electrode pattern formed on a substrate. In the apparatus of Patent Document 2, the setting angle of the irradiation angle formed by the optical axis from the light irradiation unit to the imaging region and the normal of the base material is obtained, the irradiation angle is set to the setting angle, and the imaging sensor reaches the line sensor. By setting the detection angle between the optical axis and the normal to the set angle, an inspection image with high contrast is acquired.

International Publication No. 2007/013528 JP 2012-251808 A

  By the way, when a laser microscope or an optical microscope is used, the observation field is very narrow at the magnification when observing the wiring and the transparent electrode. It is very difficult to determine whether the defect has been confirmed). Even when the method of Patent Document 1 is adopted, the same problem occurs in a region away from the electrode terminal portion. By acquiring an image showing a transparent electrode pattern with the apparatus of Patent Document 2, it is also conceivable to observe the wiring while grasping the entire image in the image. However, even in such an image, it is easy to mistake the object to be observed in a region where wiring and transparent electrodes are dense.

  The present invention has been made in view of the above problems, and an object thereof is to appropriately support observation of a pattern image by an operator.

  The invention according to claim 1 is an observation support apparatus that supports observation of an image showing a pattern having periodicity, and includes a large number of elements arranged periodically and a large number of wirings connecting the elements. An input that accepts an input that designates one position as a designated position in a storage unit that stores a pattern image indicating a pattern on a substrate, a display unit that displays an image, and a pattern region that indicates the pattern of the pattern image A receiving unit; a region specifying unit that specifies a region continuing to the specified position in the pattern region as a specific region; and a display control unit that displays the pattern image on the display unit while allowing the specific region to be identified. .

  A second aspect of the present invention is the observation support apparatus according to the first aspect, wherein the plurality of elements are a plurality of electrodes, and the plurality of electrodes have a plurality of second brightnesses different from each other in the pattern image. One electrode and a plurality of second electrodes are included, and the specific region includes a region indicating the first electrode and a region indicating the second electrode.

  A third aspect of the present invention is the observation support apparatus according to the first or second aspect, wherein the designated position indicates a position of a defect in the pattern or a position of an electrode associated with the defect.

  A fourth aspect of the present invention is the observation support apparatus according to any one of the first to third aspects, wherein the input receiving unit instructs to enlarge or reduce the pattern image displayed on the display unit. The display control unit redisplays the enlarged or reduced pattern image on the display unit while allowing the specific region to be identified.

  The invention according to claim 5 is an observation support method for supporting observation of an image showing a pattern having periodicity, and a) a large number of elements arranged periodically, and a large number of elements connected between the elements. Preparing a pattern image showing a pattern on a substrate having wiring; b) receiving an input designating one position as a designated position in a pattern region showing the pattern of the pattern image; c) A step of specifying a region continuing to the specified position in the pattern region as a specific region; and d) displaying the pattern image on a display unit while making the specific region identifiable.

  A sixth aspect of the present invention is the observation support method according to the fifth aspect, wherein the plurality of elements are a plurality of electrodes, and the plurality of electrodes have a plurality of different brightnesses in the pattern image. One electrode and a plurality of second electrodes are included, and the specific region includes a region indicating the first electrode and a region indicating the second electrode.

  A seventh aspect of the present invention is the observation support method according to the fifth or sixth aspect, wherein the designated position indicates a position of a defect in the pattern or a position of an electrode associated with the defect.

  The invention according to claim 8 is the observation support method according to any one of claims 5 to 7, wherein the step of receiving an input for instructing enlargement display or reduction display of the pattern image displayed on the display unit. And re-displaying the enlarged or reduced pattern image on the display unit while making the specific region identifiable.

  The invention according to claim 9 is a program that causes a computer to support observation of an image showing a pattern having periodicity, and the execution of the program by the computer is a) periodically arranged in the computer. A step of preparing a pattern image showing a pattern on a substrate having a large number of elements and a large number of wirings connecting the elements; and b) one position in a pattern region indicating the pattern of the pattern image. A step of receiving an input to be designated as a designated position; c) a step of identifying an area continuing to the designated position in the pattern area as a specific area; and d) the pattern image being displayed on the display unit while allowing the specific area to be identified. And a step of displaying.

  According to the present invention, it is possible for a worker to easily recognize a region that continues to a specified position in a pattern region, and it is possible to appropriately support observation of a pattern image by the worker.

It is a figure which shows the structure of an image acquisition apparatus. It is a figure which shows the structure of a computer. It is a block diagram which shows the function structure which a computer implement | achieves. It is a figure which shows the pattern on a base material. It is a figure which shows the flow of the operation | movement which acquires the image of the pattern on a base material. It is a figure which shows a pattern image. It is a figure which shows the flow of the operation | movement which supports observation of an image. It is a figure which shows the pattern image displayed on the display. It is a figure which shows the pattern image displayed on the display. It is a figure which shows the pattern image displayed on the display.

  FIG. 1 is a diagram showing a configuration of an image acquisition apparatus 1 according to an embodiment of the present invention. The image acquisition apparatus 1 is an apparatus that acquires an image of a thin film pattern formed on the base material 9 and assists an operator to observe the image. In the present embodiment, the base material 9 is a glass substrate or a transparent film. The thin film pattern is, for example, a transparent conductive film or a metal film. Another film such as an antireflection film may be provided on the substrate 9. In the following description, the thin film pattern is simply referred to as “pattern”. The base material 9 is used for manufacturing, for example, a capacitive touch panel.

  The image acquisition device 1 includes a moving mechanism 11 that moves the base material 9, an imaging unit 13, and a computer 3. The moving mechanism 11 includes a stage 21 that holds the base material 9 on the upper surface, an X-direction moving unit 22 that moves the stage 21 in the X direction in FIG. 1 parallel to the main surface of the base material 9, and the base material 9. A Y-direction moving unit 23 that moves the X-direction moving unit 22 in a Y direction that is parallel to the main surface of the X-axis and perpendicular to the X direction. The moving mechanism 11 is a mechanism that moves the base material 9 relative to an imaging region 90 described later. In addition, a mechanism for moving the stage 21 in the Z direction in FIG. 1 perpendicular to the X direction and the Y direction, and a mechanism for rotating the stage 21 around an axis parallel to the Z direction are added to the moving mechanism 11. Also good. In the image acquisition device 1, the computer 3 serves as an overall control unit that performs overall control of the image acquisition device 1.

  The imaging unit 13 includes a light irradiation unit 131 that emits light toward the imaging region 90 on the substrate 9, a line sensor 132 that receives reflected light from the imaging region 90, and a light irradiation angle by the light irradiation unit 131. And an angle changing mechanism 133 that changes a detection angle by the line sensor 132. Here, the irradiation angle is an angle θ <b> 1 formed by the optical axis J <b> 1 from the light irradiation unit 131 to the imaging region 90 and the normal line N of the base material 9. The detection angle is an angle θ2 formed by the optical axis J2 extending from the imaging region 90 to the line sensor 132 and the normal N.

  The light irradiation unit 131 emits light having a wavelength that is transparent to the transparent conductive film. Light is applied to at least the linear imaging region 90. The light irradiation unit 131 includes a plurality of LEDs arranged in the X direction, and an optical system that equalizes light from the LEDs and guides the light to the imaging region 90 extending in the X direction. The line sensor 132 includes a one-dimensional imaging device and an optical system that optically conjugates the imaging region 90 and the light receiving surface of the imaging device. Note that an autofocus mechanism that integrally moves the light irradiation unit 131, the line sensor 132, and the angle changing mechanism 133 in the direction of the normal line N of the substrate 9 may be provided in the imaging unit 13.

  When acquiring a captured image, which will be described later, the base material 9 is moved in a direction intersecting the imaging region 90 by the moving mechanism 11. That is, the moving mechanism 11 is a mechanism that moves the base material 9 relative to the imaging region 90. In parallel with the movement of the base material 9, the line sensor 132 repeatedly acquires a line image of the linear imaging region 90 at a high speed, and acquires a two-dimensional captured image. In the present embodiment, the base material 9 moves in the Y direction perpendicular to the imaging region 90, but the imaging region 90 may be inclined with respect to the movement direction.

  The angle changing mechanism 133 changes the irradiation angle θ1 and the detection angle θ2 while maintaining the irradiation angle θ1 and the detection angle θ2 equal. Therefore, the size of the detection angle in the following description is also the size of the irradiation angle, and the size of the irradiation angle is also the size of the detection angle. The light irradiation unit 131 and the line sensor 132 are supported by the base wall 134 via the angle changing mechanism 133. The base wall 134 is a plate member parallel to the Y direction and the Z direction.

  The base wall 134 is provided with an arc-shaped first opening 201 and second opening 202 centered on the imaging region 90. The angle changing mechanism 133 includes a motor 135 for moving the light irradiation unit 131 along the first opening 201, a guide unit, a rack, and a pinion (not shown), and a line sensor along the second opening 202. It further has a motor 136 for moving 132, and a guide part, a rack and a pinion (not shown).

  FIG. 2 is a diagram illustrating the configuration of the computer 3. The computer 3 has a general computer system configuration including a CPU 31 that performs various arithmetic processes, a ROM 32 that stores basic programs, and a RAM 33 that stores various information. The computer 3 includes a fixed disk 34 that stores information, a display 35 that is a display unit that displays various types of information such as images, a keyboard 36a and a mouse 36b that accept input from an operator (hereinafter collectively referred to as "input unit 36"). Communication between the reading device 37 that reads information from the computer-readable recording medium 30 such as an optical disk, a magnetic disk, and a magneto-optical disk, and other configurations of the image acquisition device 1 A portion 38 is further included.

  In the computer 3, the program 300 is read from the recording medium 30 via the reading device 37 in advance and stored in the fixed disk 34. The CPU 31 executes arithmetic processing while using the RAM 33 and the fixed disk 34 in accordance with the program 300, and realizes functions to be described later.

  FIG. 3 is a block diagram illustrating a functional configuration realized by the computer 3. 3 has a functional configuration realized by the CPU 31, ROM 32, RAM 33, fixed disk 34, and the like of the computer 3. The computing unit 40 includes an input receiving unit 41, a region specifying unit 42, and a display control unit 43. The storage unit 49 stores pattern image data 491 acquired by processing to be described later. In the image acquisition apparatus 1, the input support unit 41, the region specifying unit 42, the display control unit 43, the storage unit 49, the display 35, and the input unit 36 implement the observation support device 4 that supports image observation. Details of the observation support apparatus 4 will be described later. In addition, the function of the calculating part 40 may be constructed | assembled by a dedicated electrical circuit, and a dedicated electrical circuit may be utilized partially.

  FIG. 4 is a diagram showing a pattern on the main surface of the substrate 9. The base material 9 is used for manufacturing a capacitive touch panel, and a large number of electrodes 911 having the same shape (hereinafter referred to as “transparent electrode 911”) formed of a transparent conductive film on the main surface. .) Are periodically arranged in two dimensions. The transparent electrodes 911 are formed of a transparent conductive film and connected by a thin wire 912 (hereinafter referred to as “transparent wire 912”) as compared with the transparent electrode 911. In the example of FIG. 4, four transparent electrodes 911 are connected by one transparent wiring 912. The transparent electrode 911 is an element for detecting a change in capacitance in the touch panel.

  In addition, a large number of electrodes 921 having the same shape (hereinafter, referred to as “metal electrodes 921”) formed of a metal film are arranged, for example, in a row outside a region where a large number of transparent electrodes 911 are arranged on the main surface. Periodically arranged. Each metal electrode 921 is formed of a metal film and is connected to one end of a wiring 922 that is thinner than the metal electrode 921 (hereinafter referred to as “metal wiring 922”). The other end of the metal wiring 922 is connected to the transparent wiring 912. Actually, a plurality of transparent electrodes 911 are electrically connected between the pair of metal electrodes 921 through the metal wiring 922 and the transparent wiring 912. Thus, the metal electrode 921 is an element for supplying electricity to the plurality of transparent electrodes 911 via the metal wiring 922 and the transparent wiring 912. A film made of a material that does not transmit visible light is formed around a region where a large number of transparent electrodes 911 are arranged (a broken-line rectangular region denoted by reference numeral A1 in FIG. 4) as necessary. The film makes the metal electrode 921 and the metal wiring 922 invisible from one main surface side of the substrate 9. In FIG. 4, the pattern on the substrate 9 is shown in a simplified manner, but actually, a large number of electrodes and a large number of wirings are provided (the same applies hereinafter).

  As described above, the image acquisition device 1 acquires an image of the pattern on the base material 9, and then, when the operator observes the image, the observation of the image is supported. Hereinafter, acquisition of an image of a pattern will be described, and then support for image observation will be described.

  FIG. 5 is a diagram illustrating a flow of an operation of acquiring a pattern image on the base material 9. First, the base material 9 from which an image is to be acquired is prepared and placed on the stage 21 in FIG. 1 (step S11). The base material 9 from which an image is to be acquired includes, for example, a pair of metal electrodes 921 (a pair of metal electrodes whose resistance value is higher than a predetermined threshold value) for which a conduction failure has been confirmed in the conduction test.

  In the image acquisition device 1, an irradiation angle capable of increasing the contrast of a region (hereinafter referred to as “transparent pattern region”) indicating a pattern of a transparent conductive film (that is, a transparent electrode 911 and a transparent wiring 912) in a captured image. The angle of the detection angle is obtained in advance for each film structure (combination of film type and thickness) on the substrate 9. The contrast between the transparent pattern area and the background area in the captured image is the difference in brightness between the transparent pattern area and the background area, excluding the transparent pattern area and the area indicating the metal film pattern. Absolute value). In the computer 3, an angle to be set for the irradiation angle and the detection angle (hereinafter referred to as “set angle”) is specified in accordance with the film structure of the base material 9 on the stage 21, and the angle changing mechanism 133 is controlled. Thus, the irradiation angle and the detection angle become the set angles (step S12).

  Subsequently, emission of light from the light irradiation unit 131 is started, and the substrate 9 is continuously moved in the Y direction by the moving mechanism 11 so that the position to be imaged on the substrate 9 passes through the imaging region 90. To do. In parallel with the movement of the base material 9, the line sensor 132 repeatedly acquires the line image of the linear imaging region 90 at a high speed. Thereby, a two-dimensional captured image (hereinafter referred to as “pattern image”) indicating the pattern on the substrate 9 is acquired and stored as pattern image data 491 in the storage unit 49 of FIG. 3 (step S13). . As described above, a pattern image to be observed by the operator is prepared by the processing in steps S11 to S13 in FIG.

  FIG. 6 is a diagram showing a pattern image. In FIG. 6, the narrower the width of the parallel diagonal lines attached to each region, the lower the brightness (average luminance value) of the region. In the pattern image, the brightness of the region 821 indicating the metal electrode 921 (hereinafter referred to as “metal electrode region 821”) and the region 822 indicating the metal wiring 922 (hereinafter referred to as “metal wiring region 822”) is the highest. high. The brightness of the region 811 indicating the transparent electrode 911 (hereinafter referred to as “transparent electrode region 811”) and the region 812 indicating the transparent wiring 912 (hereinafter referred to as “transparent wiring region 812”) is the metal electrode region 821. Also, the brightness is lower than the brightness of the metal wiring area 822 and higher than the brightness of the background area which is a non-pattern area. In the following description, a region indicating the metal electrode region 821, the metal wiring region 822, the transparent electrode region 811 and the transparent wiring region 812 in the pattern image, that is, a region indicating a pattern is collectively referred to as a “pattern region 80”.

  FIG. 7 is a diagram illustrating a flow of an operation in which the observation support device 4 supports the observation of an image. First, in the observation support apparatus 4, a pattern image for the operator to observe is prepared (step S20). In the present embodiment, a pattern image is acquired in advance by the operation of FIG. 5 and stored in the storage unit 49 as pattern image data 491. The pattern image is displayed on the display 35 by the display control unit 43 (step S21).

  As described above, in the continuity test, the pair of metal electrodes 921 with poor continuity is specified, and one position (metal electrode region 821) of the pair of metal electrodes 921 in the pattern image displayed on the display 35 is determined. For example, it is designated by clicking the mouse 36b by the operator. The input receiving unit 41 receives an input for designating the position as a designated position in the pattern area 80 (step S22).

  On the other hand, the region specifying unit 42 performs predetermined edge detection processing (for example, edge detection processing using a primary differential filter or a secondary differential filter) on the pattern image. Thereby, a plurality of partial regions each constituted by a metal electrode region 821 and a metal wiring region 822 that are continuous with each other, and a plurality of partial regions each constituted by a plurality of transparent electrode regions 811 and a transparent wiring region 812 that are respectively continuous with each other. A partial region is extracted. In addition, when the partial region including the metal electrode region 821 and the metal wiring region 822 and the partial region including the transparent electrode region 811 and the transparent wiring region 812 are continuous, these partial regions are combined to form one part. It becomes an area. Through the above processing, a plurality of partial areas are acquired in the pattern area 80. Then, the partial area including the designated position is specified as the specific area (step S23). The specific area is an area that continues to the designated position in the pattern area 80.

  The display control unit 43 redisplays the pattern image on the display 35 while making it possible to identify the specific area (step S24). In the example of FIG. 8, the metal electrode region denoted by reference numeral 821a is specified as the specified position, and the partial region including the metal electrode region 821a is specified as the specific region. In addition, the specific area can be identified by overlapping a thick broken line G1 (hereinafter referred to as “guide line G1”) on one edge (one edge along the direction in which the specific area extends) in the specific area. The operator can observe the metal wiring region 822, the transparent wiring region 812, and the transparent electrode region 811 included in the specific region along the guide line G1 without making a mistake with other partial regions. A preferable guide line is a line of a predetermined color that is not included in the pattern image displayed on the display 35. That is, it is preferable that the guide line is displayed by being color-coded from the pattern image.

  As shown in FIG. 9, when the disconnection of the metal wiring region 822 occurs as the defect K1, the guide line G1 is attached only to one side of the metal wiring region 822 with the defect K1 as the boundary, and the other is the guide line. G1 is not attached. Therefore, the operator can easily specify the disconnection position by referring to the guide line G1. The area specifying unit 42 can display position information such as the coordinate value of the disconnection position on the base material 9 or store position information data. The specific area may be identified by surrounding the specific area with a line of a predetermined color, painting the specific area with a predetermined color, or overlapping a predetermined mark with a predetermined interval on the specific area.

  Further, when an input for instructing an enlarged display of a two-dot chain line rectangular region denoted by reference numeral G2 in FIG. 8 is performed by the operator, and the input is received by the input receiving unit 41 (step S25), display control is performed. As shown in FIG. 10, the unit 43 redisplays the enlarged pattern image on the display 35 (step S26). At this time, in the displayed pattern image, the guide line G1 is overlaid on the edge in the specific area, and the state where the specific area can be identified is maintained. Therefore, the operator does not mistake the specific area as another partial area even in the enlarged pattern image. In step S25, an input for instructing the reduced display of the pattern image displayed on the display 35 may be received by the input receiving unit 41. In this case, the reduced pattern image is redisplayed while the specific area can be identified. Is done.

  The above steps S22 to S26 are repeated as necessary to assist the operator in observing the pattern image. At this time, the designated position designated in step S22 is not limited to the position of the metal electrode 921 associated with the defect due to poor conduction, and may be an arbitrary position. In the observation support apparatus 4, it is also possible to confirm whether or not an arbitrary designated position is connected to both of the pair of metal electrode regions 821 (whether or not there is conduction on the image).

  As described above, in the observation support device 4, when an input designating one position in the pattern area 80 as the designated position is received, an area that continues to the designated position in the pattern area 80 is identified as the specific area. . Then, the pattern image is displayed on the display 35 while making it possible to identify the specific area. Thereby, the area | region which continues in the designated position in the pattern area | region 80 can be made to recognize an operator easily, and observation of the pattern image by an operator can be supported appropriately.

  Even if the pattern on the substrate 9 includes a plurality of transparent electrodes 911 and a plurality of metal electrodes 921 having different brightness in the pattern image, the region specifying unit 42 sets the specific region as the transparent electrode 911. The region is extracted so as to include a transparent electrode region 811 indicating the metal electrode region 821 and a metal electrode region 821 indicating the metal electrode 921. Thereby, the connection state of the transparent electrode 911 and the metal electrode 921 can be easily recognized.

  For example, even if a pattern image is acquired by the image acquisition device 1 before the continuity test and the pattern image is compared with design data such as CAD data (line width comparison, difference comparison, etc.) Good. When a defect in the pattern is detected in such an inspection based on the pattern image, the pattern image is observed by the operator. In the observation of the pattern image, the position of the defect is designated as the designated position, and the pattern image is displayed on the display 35 while being able to identify a specific area that is continuous with the designated position and includes the defect. As a result, the operator can easily recognize the specific area related to the defect, and it is possible to predict the metal electrode 921 that is highly likely to cause a continuity failure in the continuity inspection. In this case, it is also possible to perform a continuity test only on the metal electrode 921 connected to the position where the defect is detected by the inspection based on the pattern image.

  The image acquisition device 1 and the observation support device 4 can be variously modified.

  An inspection result based on the pattern image may be input to the observation support device 4 from an external pattern inspection device or a pattern inspection unit realized by the image acquisition device 1. In this case, the inspection result indicating the position of the defect is received by the input receiving unit 41 as an input of the designated position. Thus, the input of the designated position is not necessarily performed by the operator.

  The observation support device 4 may be used to support observation of an image showing a pattern having periodicity other than the electrode pattern. That is, the observation support device 4 observes an image showing a pattern on a substrate having a large number of various elements (memory cells, light receiving elements, etc.) periodically arranged and a large number of wirings connecting the elements. It can be used to support

  The configurations in the above-described embodiments and modifications may be combined as appropriate as long as they do not contradict each other.

DESCRIPTION OF SYMBOLS 3 Computer 4 Observation support apparatus 9 Base material 35 Display 41 Input reception part 42 Area specific part 43 Display control part 49 Memory | storage part 80 Pattern area 300 Program 491 Pattern image data 811 Transparent electrode area 821,821a Metal electrode area 911 Transparent electrode 912 Transparent Wiring 921 Metal electrode 922 Metal wiring G1 Guide line S11-S13, S20-S26 Step

Claims (9)

An observation support apparatus that supports observation of an image showing a pattern having periodicity,
A storage unit for storing a pattern image indicating a pattern on a substrate having a large number of elements arranged periodically and a large number of wirings connecting the elements;
A display for displaying an image;
An input receiving unit that receives an input specifying one position as a specified position in a pattern region indicating the pattern of the pattern image;
An area specifying unit that specifies an area continuing to the specified position in the pattern area as a specific area;
A display control unit that displays the pattern image on the display unit while allowing the specific region to be identified;
An observation support apparatus comprising: The observation support device according to claim 1,
The multiple elements are multiple electrodes;
The multiple electrodes include a plurality of first electrodes and a plurality of second electrodes having different brightness in the pattern image,
The observation support apparatus, wherein the specific region includes a region indicating the first electrode and a region indicating the second electrode. The observation support device according to claim 1 or 2,
The observation support apparatus, wherein the designated position indicates a position of a defect in the pattern or a position of an electrode associated with the defect. An observation support apparatus according to any one of claims 1 to 3,
An input for instructing enlarged display or reduced display of the pattern image displayed on the display unit is received in the input receiving unit,
The observation support apparatus, wherein the display control unit redisplays the enlarged or reduced pattern image on the display unit while making the specific region identifiable. An observation support method for supporting observation of an image showing a pattern having periodicity,
a) preparing a pattern image showing a pattern on a substrate having a large number of periodically arranged elements and a large number of wirings connecting the elements;
b) receiving an input designating one position as a designated position in a pattern region indicating the pattern of the pattern image;
c) specifying a region continuing to the specified position in the pattern region as a specific region;
d) displaying the pattern image on a display unit while making the specific region identifiable;
An observation support method comprising: The observation support method according to claim 5,
The multiple elements are multiple electrodes;
The multiple electrodes include a plurality of first electrodes and a plurality of second electrodes having different brightness in the pattern image,
The observation support method, wherein the specific region includes a region indicating the first electrode and a region indicating the second electrode. The observation support method according to claim 5 or 6,
The observation support method, wherein the specified position indicates a position of a defect in the pattern or a position of an electrode associated with the defect. An observation support method according to any one of claims 5 to 7,
Receiving an instruction to instruct enlarged display or reduced display of the pattern image displayed on the display unit;
Re-displaying the enlarged or reduced pattern image on the display unit while making the specific region identifiable;
An observation support method, further comprising: A program for causing a computer to support observation of an image showing a pattern having periodicity, wherein the execution of the program by the computer is performed by the computer,
a) preparing a pattern image showing a pattern on a substrate having a large number of periodically arranged elements and a large number of wirings connecting the elements;
b) receiving an input designating one position as a designated position in a pattern region indicating the pattern of the pattern image;
c) specifying a region continuing to the specified position in the pattern region as a specific region;
d) displaying the pattern image on a display unit while making the specific region identifiable;
A program characterized by having executed.

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