CN105400491B - Lapping liquid abrasive material and preparation method thereof - Google Patents
Lapping liquid abrasive material and preparation method thereof Download PDFInfo
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- CN105400491B CN105400491B CN201510739817.5A CN201510739817A CN105400491B CN 105400491 B CN105400491 B CN 105400491B CN 201510739817 A CN201510739817 A CN 201510739817A CN 105400491 B CN105400491 B CN 105400491B
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- abrasive material
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- ultrasonic disperse
- abrasive
- mixture
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1436—Composite particles, e.g. coated particles
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1409—Abrasive particles per se
Abstract
The invention discloses a kind of lapping liquid abrasive material and preparation method thereof, belongs to accurate ultra grinding technology field.The abrasive material is made up of the raw material of following mass fraction：0.5~3 part of diamond abrasive, 0.5~5 part of modifier A, 0.5~5 part of nano material, 1~10 part of modifying agent B, 77~97.5 parts of decentralized medium；The modifier A is isomery alcohol and the one or more in ethylene oxide condensate, aliphatic acid and ethylene oxide condensate, polyoxyethylene sorbitan fatty acid ester；The nano material is the one or more in nanoscale silicon, aluminum oxide, cerium oxide；The modifying agent B is cithrol, castor oil/one or both of rilanit special and ethylene oxide condensate.During attrition process, the coarseness in abrasive material can play ablation simultaneously with fine-grained particles, improve the processing efficiency of lapping liquid；In addition can also avoid conventional PCD abrasive material because adsorption bridging effect and caused by workpiece surface scratch problem.
Description
Technical field
The present invention relates to a kind of attrition process abrasive material, also relates to the preparation method of the abrasive material, belongs to accurate superfinishing
Close grinding technology field.
Background technology
At present, when preparing lapping liquid from micron order diamond, diamond abrasive easily produces adsorption bridging effect
A kind of soft-agglomerated condensate is formed between problem, i.e. diamond abrasive grains.Its reason one is the specified particle size in selection
In diamond abrasive composition, fine grained abrasive material size differs larger with coarse granule abrasive material size, and this is that fine grained abrasive material enters slightly
The passage that gap between abrasive material particles is provided convenience；Reason two be diamond abrasive grains in itself between electrostatic be present and draw
Power and van der Waals interaction, these active forces cause gap filling of the fine-grained abrasive material between coarseness abrasive material jointly, most
End form is into adsorption bridging effect problem.
A considerable amount of fine graineds in lapping liquid are not only resulted in after diamond abrasive adsorption bridging can not participate in effectively grinding
Mill, lapping efficiency reduces, and is also easy to that workpiece surface is caused slightly to scratch.For improve lapping liquid processing efficiency and
Workpiece surface crudy, a kind of new solution is proposed for diamond abrasive adsorption bridging effect problem.
The content of the invention
It is an object of the invention to provide a kind of lapping liquid abrasive material, is produced with solving conventional PCD abrasive material in lapping liquid
The problem of adsorption bridging effect.
Meanwhile the present invention also provides a kind of preparation method of above-mentioned abrasive material.
In order to realize the above object the technical solution adopted in the present invention is：
Lapping liquid abrasive material, it is made up of the raw material of following mass fraction：0.5~3 part of diamond abrasive, modifier A 0.5
~5 parts, 0.5~5 part of nano material, 1~10 part of modifying agent B, 77~97.5 parts of decentralized medium；The modifier A is isomery alcohol
With one kind in ethylene oxide condensate, aliphatic acid and ethylene oxide condensate, polyoxyethylene sorbitan fatty acid ester or
It is a variety of；The nano material is the one or more in nanoscale silicon, aluminum oxide, cerium oxide；The modifying agent B is poly- second
Diol fatty acid ester, castor oil/one or both of rilanit special and ethylene oxide condensate.
The granularity of the diamond abrasive is M0/0.25~M30/40, purity more than 99.5%.
The isomery alcohol is also known as isomery alcohol ether with ethylene oxide condensate, can use commercial goods, and preferably E-1300 is serial,
Such as E-1303, E-1306, E-1310, top grade product.
The aliphatic acid is also known as polyoxyethylene carboxylate with ethylene oxide condensate, can use commercial goods, preferably SG
Series, such as SG-40, SG-50, SG-100, top grade product.
The polyoxyethylene sorbitan fatty acid ester is also known as polysorbate, can use commercial goods, preferably tween system
Row, such as T-20, T-40, T-60, top grade product.
The granularity of the nano material is 10~100nm, purity more than 99%.
The cithrol can use commercial goods, preferably PEG400MS
(PEG400MS), the double stearates (PEG400DS) of polyethylene glycol 400, the double stearates (PEG6000DS) of Macrogol 6000
Deng top grade product.
Castor oil/the rilanit special is also known as castor oil polyoxyethylene alcohol with ethylene oxide condensate, can use commercially available
Commodity, such as EL, HEL series, preferably EL series, such as EL-30, EL-40, EL-80, top grade product.
The decentralized medium is water, such as deionized water.
The preparation method of lapping liquid abrasive material, comprises the following steps：First modifier A is added in diamond abrasive, mixed,
It is added into again in decentralized medium, it is standby that ultrasonic disperse obtains mixture A；Modifying agent B is added in nano material, ultrasonic disperse obtains
Mixture B is standby；Mixture B is added in mixture A, ultrasonic disperse produces.
The technological parameter of the ultrasonic disperse is：500~1500W of power, frequency 40KHz, time are 10~30min.It is super
The scattered dispersion effect with reference to stirring operation of sound is more preferably.
Beneficial effects of the present invention：
The method that the present invention is modified using surface so that two distinct types of solid particle (nano material, Buddha's warrior attendant stone mill
Material particle) between produce strong physical absorption, realize the mediate contact form of diamond-nano-oxide particles-diamond,
The problem of avoiding conventional PCD abrasive material from producing adsorption bridging effect because directly contacting, improves the processing efficiency of lapping liquid, changes
Kind workpiece surface crudy.
Brief description of the drawings
Fig. 1 is that embodiment 1 and comparative example prepare diamond abrasive adsorption bridging effect contrast in lapping liquid in test example.
Embodiment
Following embodiments are only described in further detail to the present invention, but do not form any limitation of the invention.
Embodiment 1
Lapping liquid abrasive material in the present embodiment, is made up of the raw material of following mass fraction：Conventional PCD abrasive material (granularity
M0.5/1, purity more than 99.5%) 0.5 part, 0.5 part of E-1303 (top grade product), nano oxidized silicon powder (10~100nm of granularity,
Purity more than 99%) 0.5 part, 1 part of PEG400MS (top grade product), 97.5 parts of water；Preparation method comprises the following steps：
1) according to the accurate each raw material of mass fraction, PEG400MS is added in nano oxidized silicon powder, stirred and ultrasound point
20min, ultrasonic power 500W, frequency 40KHz are dissipated, is fully soaked to silicon oxide surface, it is standby to obtain mixture B；
2) first E-1303 is added in conventional PCD abrasive material, mixed, then be added into water, ultrasonic disperse (power, frequency
Rate is same as above) 10min, it is standby to obtain mixture A；
3) mixture B is added in mixture A, stirs simultaneously ultrasonic disperse (power, frequency are same as above) 15min, produce.
Embodiment 2
Lapping liquid abrasive material in the present embodiment, is made up of the raw material of following mass fraction：Conventional PCD abrasive material (granularity
M1/1.5, purity more than 99.5%) 1 part, 3 parts of SG-40 (top grade product), nano aluminium oxide micro mist (10~100nm of granularity, purity
More than 99%) 1.5 parts, 1 part of PEG400DS (top grade product), 1 part of EL-30 (top grade product), 92.5 parts of water；Preparation method includes following
Step：
1) according to the accurate each raw material of mass fraction, PEG400DS, EL-30 are added in nano aluminium oxide micro mist, stirring is simultaneously
Ultrasonic disperse 25min, ultrasonic power 600W, frequency 40KHz, fully soaked to aluminium surface is aoxidized, it is standby to obtain mixture B；
2) SG-40 is added in conventional PCD abrasive material, mixed, then be added into water, ultrasonic disperse (power, frequency
Ibid) 15min, it is standby to obtain mixture A；
3) mixture B is added in mixture A, stirs simultaneously ultrasonic disperse (power, frequency are same as above) 20min, produce.
Embodiment 3
Lapping liquid abrasive material in the present embodiment, is made up of the raw material of following mass fraction：Conventional PCD abrasive material (granularity
M2/4, purity more than 99.5%) 1.5 parts, 4 parts of T-20 (top grade product), nano oxidized silicon powder (10~100nm of granularity, purity
More than 99%) 2 parts, 2 parts of PEG6000DS (top grade product), 3 parts of EL-80 (top grade product), 87.5 parts of deionized water；Preparation method bag
Include following steps：
1) according to the accurate each raw material of mass fraction, PEG6000DS, EL-80 are added in nano oxidized silicon powder, stirring is simultaneously
Ultrasonic disperse 25min, ultrasonic power 800W, frequency 40KHz, fully soaked to silicon oxide surface, it is standby to obtain mixture B；
2) T-20 is added in conventional PCD abrasive material, mixed, then be added into deionized water, ultrasonic disperse (power,
Frequency is same as above) 15min, it is standby to obtain mixture A；
3) mixture B is added in mixture A, stirs simultaneously ultrasonic disperse (power, frequency are same as above) 25min, produce.
Embodiment 4
Lapping liquid abrasive material in the present embodiment, is made up of the raw material of following mass fraction：Conventional PCD abrasive material (granularity
M4/8, purity more than 99.5%) 2 parts, 5 parts of SG-100 (top grade product), nano oxidized silicon powder (10~100nm of granularity, purity
More than 99%) 2.5 parts, 2.5 parts of nano aluminium oxide micro mist (10~100nm of granularity, purity more than 99%), EL-40 (top grade product) 7
Part, 81 parts of deionized water；Preparation method comprises the following steps：
1) according to the accurate each raw material of mass fraction, EL-40 is added in nano silicon oxide, alumina powder, stirs and surpasses
Sound disperses 25min, ultrasonic power 1200W, frequency 40KHz, is fully soaked to silica, oxidation aluminium surface, it is standby to obtain mixture B
With；
2) SG-100 is added in conventional PCD abrasive material, mixed, then be added into deionized water, ultrasonic disperse (work(
Rate, frequency are same as above) 15min, it is standby to obtain mixture A；
3) mixture B is added in mixture A, stirs simultaneously ultrasonic disperse (power, frequency are same as above) 30min, produce.
Embodiment 5
Lapping liquid abrasive material in the present embodiment, is made up of the raw material of following mass fraction：Conventional PCD abrasive material (granularity
M10/20, purity more than 99.5%) 2 parts, 5 parts of T-40 (top grade product), nano oxidized silicon powder (10~100nm of granularity, purity
More than 99%) 2.5 parts, 2.5 parts of nano-cerium oxide micro mist (10~100nm of granularity, purity more than 99%), PEG400DS (top grades
Product) 5 parts, 5 parts of EL-80 (top grade product), 78 parts of water；Preparation method comprises the following steps：
1) according to the accurate each raw material of mass fraction, PEG400DS, EL-80 are added in nano silicon oxide, cerium oxide micro mist,
Simultaneously ultrasonic disperse 30min, ultrasonic power 1500W, frequency 40KHz are stirred, fully soaks, obtains mixed to silica, cerium oxide surface
Compound B is standby；
2) T-40 is added in conventional PCD abrasive material, mixed, then be added into water, (power, frequency are same for ultrasonic disperse
On) 10min, it is standby to obtain mixture A；
3) mixture B is added in mixture A, stirs simultaneously ultrasonic disperse (power, frequency are same as above) 30min, produce.
Embodiment 6
Lapping liquid abrasive material in the present embodiment, is made up of the raw material of following mass fraction：Conventional PCD abrasive material (granularity
M20/30, purity more than 99.5%) 3 parts, 5 parts of E-1306 (top grade product), nano aluminium oxide micro mist (10~100nm of granularity, purity
More than 99%) 5 parts, 5 parts of PEG400MS (top grade product), 5 parts of EL-30 (top grade product), 77 parts of deionized water；Preparation method include with
Lower step：
1) according to the accurate each raw material of mass fraction, PEG400MS, EL-30 are added in nano aluminium oxide micro mist, stirring is simultaneously
Ultrasonic disperse 30min, ultrasonic power 600W, frequency 40KHz, fully soaked to aluminium surface is aoxidized, it is standby to obtain mixture B；
2) E-1306 is added in conventional PCD abrasive material, mixed, then be added into deionized water, ultrasonic disperse (work(
Rate, frequency are same as above) 15min, it is standby to obtain mixture A；
3) mixture B is added in mixture A, stirs simultaneously ultrasonic disperse (power, frequency are same as above) 30min, produce.
Embodiment 7
Lapping liquid in the present embodiment is made up with abrasive material of the raw material of following mass fraction：Conventional PCD abrasive material (granularity
M22/36, purity more than 99.5%) 3 parts, 5 parts of T-60 (top grade product), nano oxidized silicon powder (10~100nm of granularity, purity
More than 99%) 5 parts, 10 parts of EL-30 (top grade product), 77 parts of water；Preparation method comprises the following steps：
1) according to the accurate each raw material of mass fraction, EL-30 is added in nano oxidized silicon powder, stirred and ultrasonic disperse
30min, ultrasonic power 500W, frequency 40KHz, fully soaked to silicon oxide surface, it is standby to obtain mixture B；
2) T-60 is added in conventional PCD abrasive material, mixed, then be added into water, (power, frequency are same for ultrasonic disperse
On) 15min, it is standby to obtain mixture A；
3) mixture B is added in mixture A, stirs simultaneously ultrasonic disperse (power, frequency are same as above) 20min, produce.
Comparative example
0.5 mass parts conventional PCD abrasive material (granularity M0.5/1, purity more than 99.5%) is added into 0.5 mass parts alkyl
Phenol polyethenoxy ether (OP-10), ultrasonic disperse 10min, ultrasonic power 500W, frequency 40KHz, it is standby to obtain mixture A；Will mixing
Thing A adds ethylene glycol (1.5 mass parts), and (power, frequency are same with the mixed liquor of water (97.5 mass parts), continuing ultrasonic disperse
On) 20min, produce.
Test example
Diamond abrasive prepared by Example 1 and comparative example, detects the adsorption bridging effect between abrasive grain, as a result sees
Fig. 1, A represents the abrasive material of comparative example preparation in figure, as a result shows that abrasive grain has been reunited, generates adsorption bridging effect problem；
B represents the abrasive material prepared by embodiment 1 in figure, and as can be seen from the figure abrasive material is in individual particle dispersity, no adsorption bridging effect
Answer problem.
Claims (6)
1. abrasive material, it is characterised in that：It is made up of the raw material of following mass fraction：0.5 ~ 3 part of diamond abrasive, modifier A 0.5 ~
5 parts, 0.5 ~ 5 part of nano material, 1 ~ 10 part of modifying agent B, 77 ~ 97.5 parts of decentralized medium；The modifier A is isomery alcohol and ring
One or both of oxidative ethane condensation product, aliphatic acid and ethylene oxide condensate；The nano material be nanoscale silicon,
One or more in aluminum oxide, cerium oxide；The modifying agent B be cithrol, castor oil/rilanit special with
One or both of ethylene oxide condensate；
The granularity of the diamond abrasive is M0/0.25 ~ M30/40；
The decentralized medium is water；
The preparation method of abrasive material comprises the following steps：Modifier A is added in diamond abrasive, mixed, then be added into scattered
In medium, it is standby that ultrasonic disperse obtains mixture A；Modifying agent B is added in nano material, it is standby that ultrasonic disperse obtains mixture B；Will
Mixture B is added in mixture A, and ultrasonic disperse produces.
2. abrasive material according to claim 1, it is characterised in that：The isomery alcohol is selected from E-1300 with ethylene oxide condensate
It is any in series.
3. abrasive material according to claim 1, it is characterised in that：The aliphatic acid is selected from SG series with ethylene oxide condensate
In it is any.
4. abrasive material according to claim 1, it is characterised in that：Castor oil/the rilanit special and ethylene oxide condensation
Thing is any in EL, HEL series.
5. the preparation method of abrasive material as any one of claim 1 ~ 4, it is characterised in that：Comprise the following steps：Will be modified
Agent A is added in diamond abrasive, is mixed, then is added into decentralized medium, and it is standby that ultrasonic disperse obtains mixture A；By modifying agent B
Add in nano material, it is standby that ultrasonic disperse obtains mixture B；Mixture B is added in mixture A, ultrasonic disperse produces.
6. preparation method according to claim 5, it is characterised in that：The technological parameter of the ultrasonic disperse is：Power 500
~ 1500W, frequency 40KHz, time are 10 ~ 30min.
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| CN201510739817.5A CN105400491B (en) | 2015-11-04 | 2015-11-04 | Lapping liquid abrasive material and preparation method thereof |
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| CN109536042B (en) * | 2018-12-28 | 2021-06-25 | 河南联合精密材料股份有限公司 | Oily polishing solution and preparation method and application thereof |
| CN114426809A (en) * | 2022-02-17 | 2022-05-03 | 上海映智研磨材料有限公司 | Silicon oxide modified nano diamond abrasive particles and preparation method and application thereof |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1251380A (en) * | 1998-10-05 | 2000-04-26 | Tdk株式会社 | Abrasive thick liquid and preparation method thereof |
| CN1488702A (en) * | 2002-08-28 | 2004-04-14 | ������������ʽ���� | Abrasive liquid composition |
| CN101134890A (en) * | 2007-09-18 | 2008-03-05 | 朱辰 | Wettable grinding powder |
| CN102337084A (en) * | 2011-07-25 | 2012-02-01 | 郑州磨料磨具磨削研究所 | Grinding fluid for processing LED (light-emitting diode) substrate and preparation method thereof |
| CN103254799A (en) * | 2013-05-29 | 2013-08-21 | 陈玉祥 | Hydrophilic diamond-suspended grinding and polishing solution and preparation method thereof |
| CN104250816A (en) * | 2013-06-27 | 2014-12-31 | 气体产品与化学公司 | Chemical mechanical polishing slurry compositions and method using same for copper and through-silicon via applications |
| CN104497972A (en) * | 2014-11-26 | 2015-04-08 | 河南晶锐超硬材料有限公司 | Grinding agent and preparation method thereof, and grinding method of polycrystalline diamond compact |
| CN104830235A (en) * | 2015-04-29 | 2015-08-12 | 清华大学 | Polishing solution for chemically and mechanically polishing cobalt barrier layer structure and applications thereof |
-
2015
- 2015-11-04 CN CN201510739817.5A patent/CN105400491B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1251380A (en) * | 1998-10-05 | 2000-04-26 | Tdk株式会社 | Abrasive thick liquid and preparation method thereof |
| CN1488702A (en) * | 2002-08-28 | 2004-04-14 | ������������ʽ���� | Abrasive liquid composition |
| CN101134890A (en) * | 2007-09-18 | 2008-03-05 | 朱辰 | Wettable grinding powder |
| CN102337084A (en) * | 2011-07-25 | 2012-02-01 | 郑州磨料磨具磨削研究所 | Grinding fluid for processing LED (light-emitting diode) substrate and preparation method thereof |
| CN103254799A (en) * | 2013-05-29 | 2013-08-21 | 陈玉祥 | Hydrophilic diamond-suspended grinding and polishing solution and preparation method thereof |
| CN104250816A (en) * | 2013-06-27 | 2014-12-31 | 气体产品与化学公司 | Chemical mechanical polishing slurry compositions and method using same for copper and through-silicon via applications |
| CN104497972A (en) * | 2014-11-26 | 2015-04-08 | 河南晶锐超硬材料有限公司 | Grinding agent and preparation method thereof, and grinding method of polycrystalline diamond compact |
| CN104830235A (en) * | 2015-04-29 | 2015-08-12 | 清华大学 | Polishing solution for chemically and mechanically polishing cobalt barrier layer structure and applications thereof |
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