CN101544871B - Efficient scratch-free glass polishing solution and manufacturing method thereof - Google Patents
Efficient scratch-free glass polishing solution and manufacturing method thereof Download PDFInfo
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- CN101544871B CN101544871B CN 200910031539 CN200910031539A CN101544871B CN 101544871 B CN101544871 B CN 101544871B CN 200910031539 CN200910031539 CN 200910031539 CN 200910031539 A CN200910031539 A CN 200910031539A CN 101544871 B CN101544871 B CN 101544871B
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- 238000005498 polishing Methods 0.000 title claims abstract description 102
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 28
- 239000011521 glass Substances 0.000 title claims abstract description 19
- 229910001404 rare earth metal oxide Inorganic materials 0.000 claims abstract description 35
- 239000000725 suspension Substances 0.000 claims abstract description 31
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims abstract description 22
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 11
- 239000012530 fluid Substances 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 13
- 230000008569 process Effects 0.000 claims description 12
- 238000003756 stirring Methods 0.000 claims description 11
- 238000002156 mixing Methods 0.000 claims description 9
- 239000002270 dispersing agent Substances 0.000 claims description 8
- 229920002521 macromolecule Polymers 0.000 claims description 8
- 239000002994 raw material Substances 0.000 claims description 8
- 238000000227 grinding Methods 0.000 claims description 7
- 239000004094 surface-active agent Substances 0.000 claims description 7
- 230000002776 aggregation Effects 0.000 claims description 4
- 238000004220 aggregation Methods 0.000 claims description 3
- 239000008365 aqueous carrier Substances 0.000 claims description 3
- 239000000203 mixture Substances 0.000 abstract description 4
- 239000002131 composite material Substances 0.000 abstract description 3
- 238000005516 engineering process Methods 0.000 abstract description 3
- 230000003993 interaction Effects 0.000 abstract description 2
- 230000007812 deficiency Effects 0.000 abstract 1
- 238000010129 solution processing Methods 0.000 abstract 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 8
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 6
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 150000002148 esters Chemical class 0.000 description 4
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 4
- 239000004576 sand Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000005303 weighing Methods 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 239000006185 dispersion Substances 0.000 description 3
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000003801 milling Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- -1 polyacid Chemical class 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- 101000598921 Homo sapiens Orexin Proteins 0.000 description 2
- 101001123245 Homo sapiens Protoporphyrinogen oxidase Proteins 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- 102100029028 Protoporphyrinogen oxidase Human genes 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- 239000010452 phosphate Substances 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920000151 polyglycol Polymers 0.000 description 2
- 239000010695 polyglycol Substances 0.000 description 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- JBGVCAMENODHEH-UHFFFAOYSA-N [Cl-].[NH4+].CC(CCCCCCCCCCC)(C)C Chemical compound [Cl-].[NH4+].CC(CCCCCCCCCCC)(C)C JBGVCAMENODHEH-UHFFFAOYSA-N 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 150000008052 alkyl sulfonates Chemical class 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000004033 diameter control Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- BTCSSZJGUNDROE-UHFFFAOYSA-N gamma-aminobutyric acid Chemical compound NCCCC(O)=O BTCSSZJGUNDROE-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
Abstract
The invention discloses efficient scratch-free glass polishing solution and a manufacturing method thereof, which relate to the technical field of glass polishing solution processing. The manufacturing method comprises the following steps: rare earth oxide baked at high temperature is mixed with water to prepare rare earth oxide suspension, amorphous silicate is added to the suspension and stirred into the same, the pH value of the mixture is adjusted to 4-11 to prepare mixed suspension, and the mixed suspension is ground in a water carrier in a high-intensity mechanical way, wherein the rare earth oxide baked at high temperature and the amorphous silicate respectively account for 0.1-50 percent and 0.5-30 percent of the gross weight of the polishing solution. The invention has simple technology, easy operation, convenient production, high production efficiency and stable product quality, strengthens the close contact and the interaction of various composite components by high-intensity mechanical friction, fully plays the role of synergy of the composite components and has stable polishing solution, low surface deficiency and no scratch.
Description
Technical field
The present invention relates to a kind of production process of chemical product, especially for the production technical field of the polishing fluid of processed glass.
Background technology
Employed glass polishing solution is mainly done the polishing rubbing agent with the large particle rare-earth oxide powder in the current glass processing enterprise production, and overall polishing speed is low, and dispersion stabilization is poor, causes serious surface tear easily, also has defectives such as the graduation polishing efficiency is low.Long-time polishing often reduces polishing efficiency greatly, causes the rapid wearing of polishing machine, and production efficiency is low, and the consumption of a large amount of consumptive materials.The particle diameter control of polishing powder is normally accomplished through multistage pneumatic separation.Because micron and sub-micron agent solid particle have very high specific surface activation energy, agglomeration causes granularity and the distribution that selection by winnowing can't strict control polishing powder grinding agent, causes the performance of polishing powder aspect scuffing to be difficult to stable control.
Summary of the invention
The present invention's first purpose is to invent that a kind of dispersion stabilization is good, the graduation polishing efficiency is high, the efficient scratch-free glass polishing solution of damage polish machine not.
The present invention is mainly by water, 0.1～50% form through the rare earth oxide of high-temperature roasting and 0.5～30% the amorphous silicate that accounts for the polishing fluid gross weight of accounting for the polishing fluid gross weight.
Product of the present invention strengthens the close contact and the interaction of various compounding ingredients through the high-strength mechanical friction, gives full play to the Synergistic function of various compounding ingredients, and polishing effect is stable, and blemish is low, no marking.
Amorphous silicate according to the invention is preferably the little molecule aggregation body of silicate.The little molecule aggregation body of this amorphous silicate has been accelerated the stock removal rate of polishing fluid.
In addition, the present invention also can have 0.5～10% the macromolecule dispersing agent that accounts for the polishing fluid gross weight.With guarantee the polishing fluid product suspension of being produced strong, should not deposit, dispersion stabilization is good.
The present invention also can have 0.1～10% the polyfunctional group accelerator that accounts for the polishing fluid gross weight.Can effectively improve the graduation polishing efficiency, and be difficult for causing damage polishing machine.
The present invention also can have 0.005～10% the surfactant that accounts for the polishing fluid gross weight.Improving the flow of liquid sex change of polishing fluid, and with the cleaning that is beneficial to after the polishing.
Second purpose of the present invention also is for above-mentioned efficient scratch-free glass polishing solution a kind of feasible production method to be provided.
The present invention's method is: will mix through the rare earth oxide and the water of high-temperature roasting earlier, process rare earth oxide suspension, add amorphous silicate again; Stir; Mixing suspension is processed in adjustment pH value to 4～11, this mixing suspension is processed through the high-strength mechanical grinding in aqueous carrier again; Said rare earth oxide and amorphous silicate through high-temperature roasting accounts for 0.1～50% and 0.5～30% of polishing fluid gross weight respectively.
The medium temperature of raw material is 5～60 ℃ in the production process.Purpose is effectively to control the micromolecular degree of polymerization of amorphous silicate, more effectively combines to produce the most effectively composite polishing material simultaneously with rare earth oxide.
In addition, in rare earth oxide suspension, also add 0.5～10% the macromolecule dispersing agent account for the polishing fluid gross weight.Add 0.1～10% the polyfunctional group accelerator account for the polishing fluid gross weight.Add 0.005～10% the surfactant account for the polishing fluid gross weight.
Technology of the present invention is simple, easy operating, convenient production, and production efficiency is high, constant product quality.
The specific embodiment
Example one:
One, preparation polishing fluid:
Take by weighing the rare earth oxide of 250 grams, add in the 4417 gram water, stir under the room temperature, process rare earth oxide suspension through high-temperature roasting.Add 333 grams, 30% amorphous silicate to rare earth oxide suspension; 30 gram volumetric concentrations are 50% dodecyl polyalkylene oxide phosphate (macromolecule dispersing agent); The 5 careless polyglycol ethers of gram (surfactant) further stir, and pH is transferred to 8, form mixing suspension.
The medium temperature of raw material is controlled at 5～60 ℃ in the whole process of production of the present invention.
The ball mill that above-mentioned mixing suspension injection stainless steel inner lining is equipped with 5kg titanium master alloy grinding bead ground respectively 5,10,30,60 minutes, processed sample A, B, C, D respectively.
Two, polishing instance:
Made each sample is polished on Logitech CDP single side polishing machine respectively.Polishing machine presses down: 1psi, lower wall and load plate rotating speed 50RPM, polishing fluid flow velocity: 100ml/ minute.
| The ball milling time | Polishing speed (nm/min) | Surface tear |
| 5 | 803 | Few |
| 10 | 739 | Do not have |
| 30 | 581 | Do not have |
| 60 | 368 | Do not have |
Sum up: under the identical condition of each raw material composition, increase with milling time, polishing efficiency reduces, and surface tear is reduced to fast and can not surveys.
Example two:
One, preparation polishing fluid:
Take by weighing the rare earth oxide of inequality through high-temperature roasting, adding waits in the water gaging respectively, stirs under the room temperature, processes different rare earth oxide suspension respectively.The medium temperature of raw material is 5～60 ℃ in the production process.
Add the amorphous silicate of inequality respectively to each rare earth oxide suspension, further stir.Ground 10 minutes at ceramic-lined sand mill.
Two, polishing instance:
Made each polishing fluid is polished on Logitech CDP single side polishing machine respectively.Polishing machine presses down: 1psi, lower wall and load plate rotating speed 50RPM, polishing fluid flow velocity: 100ml/ minute.
| Rare earth oxide (%) | Amorphous silicate (%) | Polishing speed (nm/min) | |
| A | 10 | 0 | 359 |
| B | 10 | 1 | 432 |
| C | 10 | 3 | 776 |
| D | 10 | 5 | 513 |
| E | 10 | 7 | 551 |
Sum up: under the identical condition of pH value, each different proportioning raw materials can obtain different polishing efficiencies, reaches as high as 776 nm/min.
Example three:
One, preparation polishing fluid:
Take by weighing the rare earth oxide of 250 grams, add in the 4417 gram water, stir under the room temperature, process rare earth oxide suspension through high-temperature roasting.
Add 333 to rare earth oxide suspension and restrain 30% amorphous silicate, further stir.
Add KOH, the pH value is transferred to 10 respectively, process the polishing fluid first product.Add the inequality pyridine to the polishing fluid first product, process polishing fluid A, B, C, D respectively.Sand mill at the superhard alloy liner ground 10 minutes.
Two, polishing instance:
Made each polishing fluid is polished on Logitech CDP single side polishing machine respectively.Polishing machine presses down: 1psi, lower wall and load plate rotating speed 50RPM, polishing fluid flow velocity: 100ml/ minute.
| Pyridine (gram) | Polishing speed (nm/min) |
| 0 | 356 |
| 2 | 520 |
| 8 | 779 |
| 20 | 617 |
Sum up: the pyridine that adds debita spissitudo can make the polishing efficiency of polishing fluid be improved.
Example four:
One, preparation polishing fluid:
Take by weighing the rare earth oxide of 250 grams, add in the 4417 gram water, stir under the room temperature, process rare earth oxide suspension through high-temperature roasting.Add 333 grams, 30% amorphous silicate to rare earth oxide suspension, 30 grams, 50% dodecyl polyalkylene oxide phosphate (macromolecule dispersing agent), the careless polyglycol ether of 5 grams further stirs, and pH is transferred to 8.At the sand mill of superhard alloy liner, grinding bead is 1: 5 with the suspension solid content ratio, 1: 3, and 1: 1 and 1: 0.5, milling time ten minutes.
Two, polishing instance:
Made each polishing fluid is polished on Logitech CDP single side polishing machine respectively.Polishing machine presses down: 1psi, lower wall and load plate rotating speed 50RPM, polishing fluid flow velocity: 100ml/ minute.
| Grinding bead and suspension solid ratio | Polishing speed (nm/min) |
| 1∶5 | 529 |
| 1∶3 | 729 |
| 1∶1 | 613 |
| 1∶0.5 | 617 |
Sum up: suitable abrasive media suspension solid is than the polishing efficiency of polishing fluid is improved.
Example five:
One, preparation polishing fluid:
According to the table following table, the preparation polishing fluid.The sand mill milling time of superhard alloy liner ten minutes.And the medium temperature of raw material is controlled at 5～60 ℃ in the whole process of production.
Two, polishing instance:
Made each polishing fluid is polished on Logitech CDP single side polishing machine respectively.Polishing machine presses down: 1psi, lower wall and load plate rotating speed 50RPM, polishing fluid flow velocity: 100ml/ minute.
| Rare earth oxide (%) | Silicate polymer (%) | Macromolecule dispersing agent (as, polyamide, or dodecyl PEO alcohol, or polymethylacrylic acid polyalkylene oxide ester, etc.) (%) | The polyfunctional group accelerator (as, oxalic acid, pyridine, acetate, succinic acid, reanal, etc.) (10%) | Surfactant (as, the trimethyldodecane ammonium chloride, or mix PEO PPOX ether, or alkylphosphonic, etc.) | Polishing speed (nm/min) |
| 0.1 | 30 | ?1 | 0.5 | 0.1 | 159 |
| 50 | 2 | ?5 | 0.8 | 0.008 | 1037 |
| 30 | 0.5 | ?3 | 1.5 | 0.05 | 892 |
| 0.5 | 30 | ?6 | 3 | 0.02 | 273 |
| 1 | 10 | ?0.5 | 3 | 0.1 | 333 |
| 0.1 | 0.5 | ?10 | 0.5 | 0.05 | 131 |
| 5 | 0 | ?0.5 | 0.1 | 1 | 269 |
| 10 | 5 | ?2 | 10 | 0.00 | 674 |
| 40 | 0.5 | ?3 | 1.5 | 0.005 | 983 |
| 5 | 1 | ?0.5 | 0.1 | 10 | 585 |
In addition, the macromolecule dispersing agent that production process of the present invention adopts comprises but does not get rid of other macromolecular materials, can adopt polyurethane, polyalkylene oxide ether, alkyl to gather the epoxy acid esters, or the like.
The polyfunctional group accelerator that production process of the present invention adopts comprises but does not get rid of other compounds, can adopt various organic acids, polyacid, nitrogen-containing compound etc.
The surfactant that production process of the present invention adopts comprises but does not get rid of other compounds, can adopt polyethylene glycol, PPOX ether, siliceous polyethylene glycol, alkyl quaternary ammonium salts, alkylsulfonate (ester), alkylphosphonic (ester), etc.
The rare earth oxide that production process of the present invention adopts comprises but does not get rid of other oxides, can adopt aluminium oxide, zirconia, carborundum, etc.
Claims (10)
1. efficient scratch-free glass polishing solution comprises water, through the rare earth oxide and the amorphous silicate of high-temperature roasting, it is characterized in that will mixing through the rare earth oxide and the water of high-temperature roasting earlier; Process rare earth oxide suspension; Add amorphous silicate again, stir, adjustment pH value to 4～11; Process mixing suspension, again this mixing suspension is processed through the high-strength mechanical grinding in aqueous carrier; Said rare earth oxide and amorphous silicate through high-temperature roasting accounts for 0.1～50% and 0.5～30% of polishing fluid gross weight respectively, and the medium temperature of raw material is 5～60 ℃ in the production process.
2. according to the said efficient scratch-free glass polishing solution of claim 1, it is characterized in that said amorphous silicate is the little molecule aggregation body of silicate.
3. according to claim 1 or 2 said efficient scratch-free glass polishing solutions, it is characterized in that also comprising in the said polishing fluid 0.5～10% the macromolecule dispersing agent that accounts for the polishing fluid gross weight.
4. according to claim 1 or 2 said efficient scratch-free glass polishing solutions, it is characterized in that also comprising in the said polishing fluid 0.1～10% the polyfunctional group accelerator that accounts for the polishing fluid gross weight.
5. according to claim 1 or 2 said efficient scratch-free glass polishing solutions, it is characterized in that also comprising in the said polishing fluid 0.005～10% the surfactant that accounts for the polishing fluid gross weight.
6. production method of efficient scratch-free glass polishing solution according to claim 1; It is characterized in that to mix through the rare earth oxide and the water of high-temperature roasting earlier, process rare earth oxide suspension, add amorphous silicate again; Stir; Mixing suspension is processed in adjustment pH value to 4～11, this mixing suspension is processed through the high-strength mechanical grinding in aqueous carrier again; Said rare earth oxide and amorphous silicate through high-temperature roasting accounts for 0.1～50% and 0.5～30% of polishing fluid gross weight respectively.
7. according to the production method of the said efficient scratch-free glass polishing solution of claim 6, the medium temperature that it is characterized in that raw material in the production process is 5～60 ℃.
8. according to the production method of claim 6 or 7 said efficient scratch-free glass polishing solutions, it is characterized in that also adding in the rare earth oxide suspension 0.5～10% the macromolecule dispersing agent that accounts for the polishing fluid gross weight.
9. according to the production method of claim 6 or 7 said efficient scratch-free glass polishing solutions, it is characterized in that also adding in the rare earth oxide suspension 0.1～10% the polyfunctional group accelerator that accounts for the polishing fluid gross weight.
10. according to the production method of claim 6 or 7 said efficient scratch-free glass polishing solutions, it is characterized in that also adding in the rare earth oxide suspension 0.005～10% the surfactant that accounts for the polishing fluid gross weight.
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| CN 200910031539 CN101544871B (en) | 2009-04-22 | 2009-04-22 | Efficient scratch-free glass polishing solution and manufacturing method thereof |
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| CN101544871B true CN101544871B (en) | 2012-12-26 |
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Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN102358825B (en) * | 2011-08-05 | 2013-08-21 | 清华大学 | Polishing composition for sapphire wafer |
| CN102627917A (en) * | 2012-03-23 | 2012-08-08 | 江苏中晶科技有限公司 | Polishing accelerating agent for glass and silicon-containing compound and production method and application thereof |
| CN102627916B (en) * | 2012-03-23 | 2014-09-03 | 江苏中晶科技有限公司 | Glass polishing solution with reinforcement function |
| CN102634284A (en) * | 2012-03-27 | 2012-08-15 | 蓝思旺科技(深圳)有限公司 | Polishing solution and preparation method thereof |
| CN106883768A (en) * | 2017-04-20 | 2017-06-23 | 宁波日晟新材料有限公司 | Alkali glass polishing fluid and application under slightly acidic condition |
| CN107365560A (en) * | 2017-08-04 | 2017-11-21 | 安徽宽居电器有限公司 | A kind of efficient polishing fluid of glass processing |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN1919950A (en) * | 2006-08-23 | 2007-02-28 | 孙韬 | High precision polishing liquid, preparation method and use thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1919950A (en) * | 2006-08-23 | 2007-02-28 | 孙韬 | High precision polishing liquid, preparation method and use thereof |
Non-Patent Citations (1)
| Title |
|---|
| 刘光华.稀土玻璃陶瓷材料.《稀土材料与应用技术》.化学工业出版社,2005,第166-167页. * |
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Denomination of invention: Efficient scratch free glass polishing solution and its production method Effective date of registration: 20231229 Granted publication date: 20121226 Pledgee: Industrial and Commercial Bank of China Changzhou Wujin Branch Pledgor: Jiangsu Wujin High tech Investment Holding Co.,Ltd. Registration number: Y2023980075099 |
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