CN105369348A - 一种用于mocvd反应系统的晶圆载盘 - Google Patents
一种用于mocvd反应系统的晶圆载盘 Download PDFInfo
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- CN105369348A CN105369348A CN201410438531.9A CN201410438531A CN105369348A CN 105369348 A CN105369348 A CN 105369348A CN 201410438531 A CN201410438531 A CN 201410438531A CN 105369348 A CN105369348 A CN 105369348A
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- wafer carrier
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Abstract
Description
a | r | d | r-d | s | ratio |
3 | 0 | 0 | 0 | 7.79 | 1.00 |
3 | 0.5 | 0.5 | 0 | 9.36 | 1.20 |
3 | 0.4 | 0.4 | 0 | 8.78 | 1.13 |
3 | 0.3 | 0.3 | 0 | 8.33 | 1.07 |
3 | 1 | 0.3 | 0.7 | 9.53 | 1.22 |
3 | 1 | 0.2 | 0.8 | 8.98 | 1.15 |
3 | 1 | 0.1 | 0.9 | 8.40 | 1.08 |
6 | 0 | 0 | 0 | 31.14 | 1.00 |
6 | 1 | 1 | 0 | 35.85 | 1.15 |
6 | 1 | 0.8 | 0.2 | 35.16 | 1.13 |
6 | 1 | 0.7 | 0.3 | 34.77 | 1.12 |
6 | 1 | 0.6 | 0.4 | 34.34 | 1.10 |
7 | 0 | 0 | 0 | 42.39 | 1.00 |
7 | 1 | 1 | 0 | 47.10 | 1.11 |
7 | 1 | 0.9 | 0.1 | 46.77 | 1.10 |
7 | 1 | 0.8 | 0.2 | 46.41 | 1.09 |
Claims (12)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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CN201410438531.9A CN105369348B (zh) | 2014-08-29 | 2014-08-29 | 一种用于mocvd反应系统的晶圆载盘 |
TW104128059A TWI590300B (zh) | 2014-08-29 | 2015-08-27 | Wafer tray for MOCVD reaction system |
Applications Claiming Priority (1)
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CN201410438531.9A CN105369348B (zh) | 2014-08-29 | 2014-08-29 | 一种用于mocvd反应系统的晶圆载盘 |
Publications (2)
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CN105369348A true CN105369348A (zh) | 2016-03-02 |
CN105369348B CN105369348B (zh) | 2017-12-12 |
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CN201410438531.9A Active CN105369348B (zh) | 2014-08-29 | 2014-08-29 | 一种用于mocvd反应系统的晶圆载盘 |
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CN (1) | CN105369348B (zh) |
TW (1) | TWI590300B (zh) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105632984A (zh) * | 2014-11-24 | 2016-06-01 | 中微半导体设备(上海)有限公司 | 一种晶圆载盘 |
USD854506S1 (en) | 2018-03-26 | 2019-07-23 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
USD858469S1 (en) | 2018-03-26 | 2019-09-03 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
USD860147S1 (en) | 2018-03-26 | 2019-09-17 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
USD860146S1 (en) | 2017-11-30 | 2019-09-17 | Veeco Instruments Inc. | Wafer carrier with a 33-pocket configuration |
USD863239S1 (en) | 2018-03-26 | 2019-10-15 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
USD866491S1 (en) | 2018-03-26 | 2019-11-12 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
WO2021120189A1 (zh) * | 2019-12-20 | 2021-06-24 | 苏州晶湛半导体有限公司 | 一种晶圆承载盘及化学气相淀积设备 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI643973B (zh) * | 2017-11-16 | 2018-12-11 | 錼創顯示科技股份有限公司 | 晶圓載盤以及金屬有機化學氣相沈積設備 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040040632A1 (en) * | 2002-08-30 | 2004-03-04 | Oosterlaken Theodorus Gerardus Maria | Susceptor plate for high temperature heat treatment |
JP2005256137A (ja) * | 2004-03-15 | 2005-09-22 | Fuji Electric Holdings Co Ltd | 化学的気相成長装置 |
US20080069951A1 (en) * | 2006-09-15 | 2008-03-20 | Juan Chacin | Wafer processing hardware for epitaxial deposition with reduced auto-doping and backside defects |
CN101487138A (zh) * | 2008-01-17 | 2009-07-22 | 矽延电子实业有限公司 | 用于外延制程的晶圆承载盘 |
US20100144147A1 (en) * | 2005-07-28 | 2010-06-10 | Kyocera Corporation | Sample holding tool, sample suction device using the same and sample processing method using the same |
CN102242352A (zh) * | 2010-05-14 | 2011-11-16 | 佛山市奇明光电有限公司 | 有机金属化学气相沉积机台 |
CN102691052A (zh) * | 2011-03-22 | 2012-09-26 | 奇力光电科技股份有限公司 | 晶圆承载盘与化学气相沉积机台 |
US20130014896A1 (en) * | 2011-07-15 | 2013-01-17 | Asm Japan K.K. | Wafer-Supporting Device and Method for Producing Same |
-
2014
- 2014-08-29 CN CN201410438531.9A patent/CN105369348B/zh active Active
-
2015
- 2015-08-27 TW TW104128059A patent/TWI590300B/zh active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040040632A1 (en) * | 2002-08-30 | 2004-03-04 | Oosterlaken Theodorus Gerardus Maria | Susceptor plate for high temperature heat treatment |
JP2005256137A (ja) * | 2004-03-15 | 2005-09-22 | Fuji Electric Holdings Co Ltd | 化学的気相成長装置 |
US20100144147A1 (en) * | 2005-07-28 | 2010-06-10 | Kyocera Corporation | Sample holding tool, sample suction device using the same and sample processing method using the same |
US20080069951A1 (en) * | 2006-09-15 | 2008-03-20 | Juan Chacin | Wafer processing hardware for epitaxial deposition with reduced auto-doping and backside defects |
CN101487138A (zh) * | 2008-01-17 | 2009-07-22 | 矽延电子实业有限公司 | 用于外延制程的晶圆承载盘 |
CN102242352A (zh) * | 2010-05-14 | 2011-11-16 | 佛山市奇明光电有限公司 | 有机金属化学气相沉积机台 |
CN102691052A (zh) * | 2011-03-22 | 2012-09-26 | 奇力光电科技股份有限公司 | 晶圆承载盘与化学气相沉积机台 |
US20130014896A1 (en) * | 2011-07-15 | 2013-01-17 | Asm Japan K.K. | Wafer-Supporting Device and Method for Producing Same |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105632984A (zh) * | 2014-11-24 | 2016-06-01 | 中微半导体设备(上海)有限公司 | 一种晶圆载盘 |
CN105632984B (zh) * | 2014-11-24 | 2018-10-16 | 中微半导体设备(上海)有限公司 | 一种晶圆载盘 |
USD860146S1 (en) | 2017-11-30 | 2019-09-17 | Veeco Instruments Inc. | Wafer carrier with a 33-pocket configuration |
USD854506S1 (en) | 2018-03-26 | 2019-07-23 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
USD858469S1 (en) | 2018-03-26 | 2019-09-03 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
USD860147S1 (en) | 2018-03-26 | 2019-09-17 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
USD863239S1 (en) | 2018-03-26 | 2019-10-15 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
USD866491S1 (en) | 2018-03-26 | 2019-11-12 | Veeco Instruments Inc. | Chemical vapor deposition wafer carrier with thermal cover |
WO2021120189A1 (zh) * | 2019-12-20 | 2021-06-24 | 苏州晶湛半导体有限公司 | 一种晶圆承载盘及化学气相淀积设备 |
CN114761615A (zh) * | 2019-12-20 | 2022-07-15 | 苏州晶湛半导体有限公司 | 一种晶圆承载盘及化学气相淀积设备 |
Also Published As
Publication number | Publication date |
---|---|
CN105369348B (zh) | 2017-12-12 |
TW201621979A (zh) | 2016-06-16 |
TWI590300B (zh) | 2017-07-01 |
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Application publication date: 20160302 Assignee: Nanchang Medium and Micro Semiconductor Equipment Co., Ltd. Assignor: Advanced Micro-Fabrication Equipment (Shanghai) Inc. Contract record no.: 2018990000345 Denomination of invention: Wafer carrier plate for MOCVD reaction system Granted publication date: 20171212 License type: Exclusive License Record date: 20181217 |
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Address after: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee after: Medium and Micro Semiconductor Equipment (Shanghai) Co., Ltd. Address before: 201201 No. 188 Taihua Road, Jinqiao Export Processing Zone, Pudong New Area, Shanghai Patentee before: Advanced Micro-Fabrication Equipment (Shanghai) Inc. |
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Effective date of registration: 20190725 Address after: 201201 Shanghai City Jingqiao export processing zone of Pudong New Area (South) Taihua Road No. 188 Co-patentee after: Nanchang Medium and Micro Semiconductor Equipment Co., Ltd. Patentee after: Medium and Micro Semiconductor Equipment (Shanghai) Co., Ltd. Address before: 201201 Shanghai City Jingqiao export processing zone of Pudong New Area (South) Taihua Road No. 188 Patentee before: Medium and Micro Semiconductor Equipment (Shanghai) Co., Ltd. |