CN105355531A - Filament clamping device for ion sources - Google Patents
Filament clamping device for ion sources Download PDFInfo
- Publication number
- CN105355531A CN105355531A CN201510725747.8A CN201510725747A CN105355531A CN 105355531 A CN105355531 A CN 105355531A CN 201510725747 A CN201510725747 A CN 201510725747A CN 105355531 A CN105355531 A CN 105355531A
- Authority
- CN
- China
- Prior art keywords
- filament
- insulating base
- stalk
- arc chamber
- taper surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001681 protective effect Effects 0.000 claims abstract description 29
- 238000009413 insulation Methods 0.000 claims abstract description 7
- 230000001105 regulatory effect Effects 0.000 claims description 9
- 238000009434 installation Methods 0.000 claims description 7
- 230000009286 beneficial effect Effects 0.000 claims description 6
- 230000006835 compression Effects 0.000 claims description 4
- 238000007906 compression Methods 0.000 claims description 4
- 238000012423 maintenance Methods 0.000 abstract description 5
- 238000005516 engineering process Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000010884 ion-beam technique Methods 0.000 description 2
- 235000010627 Phaseolus vulgaris Nutrition 0.000 description 1
- 244000046052 Phaseolus vulgaris Species 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
- H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention discloses a filament clamping device for ion sources, comprising a discharge chamber, a filament rod and an insulating base. The insulating base sleeves the filament rod, fixedly installs the filament rod on the discharge chamber, and extends into the discharge chamber along with the filament rod. The filament rod passes through the discharge chamber and is equipped with a filament at one end. An end, near the filament, of the filament rod is sleeved with an insulating protective cover which can help fasten and clamp the filament. The protective cover abuts on the end face of the insulating base, and the periphery of the protective cover extending into the discharge chamber blocks the front of the insulating base. According to the filament clamping device of the invention, the protective cover sleeves the filament, so that the protective cover can help fasten and clamp the filament and can abut on the insulating base; the filament rod and the discharge chamber are insulated and isolated, so that the filament and the discharge chamber are insulated when voltage is introduced into the filament rod; and the periphery of the protective cover extending into the discharge chamber blocks the front of the insulating base, so that the insulating base is prevented from being directly exposed in the discharge chamber, insulation pollution is reduced, and the maintenance period of ion sources is reduced.
Description
Technical field
The present invention relates to ion beam etching technical field, particularly relate to a kind of for ionogenic filament clamping device.
Background technology
Ion beam etching is pure physical etchings technique, has the feature that the highest, the steep property of resolution is best, and can etch majority of material in conventional lithographic method, applies increasingly extensive in microelectronic technique.Normally, the filament that discharges in ion bean etcher ion source adopts nut to be fixed on stalk by filament, stalk is fixed on arc chamber by insulating part, insulating part is directly exposed in arc chamber, and this structure exists following not enough: (1) insulating ceramics part easily pollutes thus causes short circuit between filament and arc chamber; (2) filament adopts the mode of nut clamping to fixedly mount inconvenience, and position malleable, the filament of installation changes, and finally changes the consistency of Ion source characteristics.
Summary of the invention
The technical problem to be solved in the present invention overcomes the deficiencies in the prior art, provides a kind of good insulating, can reduce insulation and pollute, and reduce ion source maintenance period for ionogenic filament clamping device.
For solving the problems of the technologies described above, the present invention by the following technical solutions:
A kind of for ionogenic filament clamping device, comprise arc chamber, stalk and insulating base, described insulating base is sheathed on stalk, stalk is fixedly installed on arc chamber by described insulating base, and stretch in arc chamber with stalk, described stalk is through arc chamber, and filament is installed in one end, near the sheathed insulating sheath being beneficial to filament fastening clamp in one end of filament on described stalk, described protective jacket abuts with the end face of insulating base, and the front in insulating base is blocked in the periphery stretching into arc chamber.
Further improvement as technique scheme:
The periphery that described insulating base stretches into arc chamber is offered at least one maze trough polluted for reducing insulation, described protective jacket blocks the front in maze trough.
Described maze trough is cannelure or spiral slot, and the axis of described maze trough is identical with the axis of stalk.
The clamping hole of an installation filament radially offered by described stalk, and offer a groove be divided into two by clamping hole vertically, described groove extends in arc chamber, and it is outer to be clamped in clamping hole by filament that described protective jacket is sheathed on groove.
Described protective jacket is provided with large end the first taper surface outwardly away from the inside, one end of insulating base, and the periphery of described stalk is provided with the second taper surface coordinated with the first taper surface, and the tapering of described first taper surface is less than the tapering of the second taper surface.
Described stalk stretches out through insulating base away from the other end of filament, and external part is provided with screw thread, on external part sheathed be beneficial to the second taper surface away from or near the regulating part of the first taper surface.
Described regulating part comprises elastic component and locking nut, described elastic component is located between insulating base and locking nut, when locking nut compression elastic piece is closely against on insulating base, the second taper surface is near the first taper surface and closely cooperate to realize filament with the first taper surface and clamp.
Described insulating base is inverted T-shaped structure, and the outer wall that the large end face of inverted T-shaped is positioned at arc chamber is coordinated on fastening arc chamber by installing hole and bolt, and small end face stretches in arc chamber.
Described protective jacket is the stairstepping sleeve all coaxially arranged with stalk, insulating base, the large end of described stairstepping sleeve down, the ladder endoporus of described stairstepping sleeve abuts with the end face of insulating base, and the barrel of large end blocks the front in insulating base, and the barrel of small end is near filament.
Compared with prior art, the invention has the advantages that:
The present invention is used for ionogenic filament clamping device, its protective jacket is sheathed on filament, has both been conducive to filament fastening clamp, has abutted again with insulating base, stalk and arc chamber are insulated and separates, when making stalk introduce voltage, insulate between filament and arc chamber, moreover, the front in insulating base is blocked in the periphery that protective jacket stretches into arc chamber, avoid insulating base to be directly exposed in arc chamber, reduce insulation and pollute, reduce ionogenic maintenance period.
Accompanying drawing explanation
Fig. 1 is the structural representation of the present invention for ionogenic filament clamping device.
Fig. 2 is the structural representation of insulating base of the present invention.
Fig. 3 is the structural representation of stalk of the present invention.
In figure, each label represents:
1, arc chamber; 2, stalk; 3, insulating base; 4, protective jacket; 5, clamping hole; 6, regulating part; 10, filament; 21, the second taper surface; 30, maze trough; 41, the first taper surface; 50, groove; 61, elastic component; 62, locking nut.
Embodiment
Below in conjunction with Figure of description and specific embodiment, the present invention is described in further detail.
Fig. 1 to Fig. 3 shows a kind of embodiment of the present invention for ionogenic filament clamping device, comprise arc chamber 1, stalk 2 and insulating base 3, insulating base 3 is sheathed on stalk 2, stalk 2 is fixedly installed on arc chamber 1 by insulating base 3, and stretch in arc chamber 1 with stalk 2, stalk 2 is through arc chamber 1, and filament 10 is installed in one end, near the sheathed insulating sheath 4 being beneficial to filament 10 fastening clamp in one end of filament 10 on stalk 2, protective jacket 4 abuts with the end face of insulating base 3, and the front in insulating base 3 is blocked in the periphery stretching into arc chamber 1.Filament clamping device of the present invention, this protective jacket 4 is sheathed on filament 10, has both been conducive to filament 10 fastening clamp, and has abutted again with insulating base 3, stalk 2 and arc chamber 1 are insulated and separates, when making stalk 2 introduce voltage, insulate between filament 10 and arc chamber 1, moreover, the front in insulating base 3 is blocked in the periphery that protective jacket 4 stretches into arc chamber 1, avoid insulating base 3 to be directly exposed in arc chamber 1, reduce insulation and pollute, reduce ionogenic maintenance period.
In the present embodiment, the periphery that insulating base 3 stretches into arc chamber 1 is offered at least one maze trough 30 polluted for reducing insulation, protective jacket 4 blocks the front in maze trough 30.This maze trough 30 can realize the protection to insulating base 3, reduces the pollution of insulating base 3 in arc chamber 1, extends the service time of insulating base 3, reduces ionogenic maintenance.
In the present embodiment, maze trough 30 is cannelure or spiral slot, and the axis of maze trough 30 is identical with the axis of stalk 2, and the maze trough 30 of multiple annular is arranged along axis at intervals.The maze trough 30 of this structure can reduce the pollution of insulating base 3 better, equably.
In the present embodiment, the clamping hole 5 of an installation filament 10 radially offered by stalk 2, offer a groove 50 be divided into two by clamping hole 5 vertically, this groove 50 extends in arc chamber 1, and it is outer to be clamped in clamping hole 5 by filament 10 that protective jacket 4 is sheathed on groove 50.Adopt clamping hole 5 to install filament 10, position is malleable not, maintains the consistency of Ion source characteristics.
When installing or removing filament 10 in clamping hole 5, this groove 50 plays the effect that space buffer regulates, easy disassembly.
In the present embodiment, protective jacket 4 is provided with large end the first taper surface 41 outwardly away from the inside, one end of insulating base 3, the tapering that the periphery of stalk 2 is provided with the second taper surface 21, first taper surface 41 coordinated with the first taper surface 41 is less than the tapering of the second taper surface 21, is convenient to self-locking.When protective jacket 4 is installed on stalk 2 by cone match is fastening, the clamping hole 5 be divided into two also is made to be close to clamping with filament 10.
In the present embodiment, stalk 2 stretches out through insulating base 3 away from the other end of filament 10, and external part is provided with screw thread, on external part sheathed be beneficial to the second taper surface 21 away from or near the regulating part 6 of the first taper surface 41.The second taper surface 21 of stalk 2 and the cone match of the first taper surface 41 of protective jacket 4 is regulated by regulating part 6, further regulate the fastening installation of filament 10 in clamping hole 5, improve the position installation accuracy of filament 10, maintain the consistency of Ion source characteristics.
In the present embodiment, regulating part 6 comprises elastic component 61 and locking nut 62, elastic component 61 is located between insulating base 3 and locking nut 62, when locking nut 62 compression elastic piece 61 is closely against on insulating base 3, the second taper surface 21 is near the first taper surface 41 and closely cooperate to realize filament 10 with the first taper surface 41 and clamp.In the present embodiment, this elastic component 61 is spring.During installation, tighten locking nut 62, compression elastic piece 61, stalk 2 moves downward, make the second taper surface 21 of stalk 2 near and tight note in the first taper surface 41 of protective jacket 4, thus clamping filament 10.When changing filament 10, unscrew locking nut 62, stalk 2 is upwards mentioned until the second taper surface 21 and the first taper surface 41 depart from, unclamp the filament 10 in clamping hole 5.
In the present embodiment, insulating base 3 is inverted T-shaped structure, and the outer wall that the large end face of inverted T-shaped is positioned at arc chamber 1 is coordinated by installing hole and bolt and is anchored on arc chamber 1, and small end face stretches in arc chamber 1.
In the present embodiment, protective jacket 4 is and stalk 2, all coaxial stairstepping sleeve arranged of insulating base 3, and down, the ladder endoporus of stairstepping sleeve abuts with the end face of insulating base 3 the large end of stairstepping sleeve, the barrel of large end blocks the front in insulating base 3, and the barrel of small end is near filament 10.
Although the present invention discloses as above with preferred embodiment, but and be not used to limit the present invention.Any those of ordinary skill in the art, when not departing from technical solution of the present invention scope, can utilize the technology contents of above-mentioned announcement to make many possible variations and modification to technical solution of the present invention, or being revised as the Equivalent embodiments of equivalent variations.Therefore, every content not departing from technical solution of the present invention, according to the technology of the present invention essence to any simple modification made for any of the above embodiments, equivalent variations and modification, all should drop in the scope of technical solution of the present invention protection.
Claims (9)
1. one kind for ionogenic filament clamping device, comprise arc chamber (1), stalk (2) and insulating base (3), described insulating base (3) is sheathed on stalk (2), it is characterized in that: stalk (2) is fixedly installed on arc chamber (1) by described insulating base (3), and stretch in arc chamber (1) with stalk (2), described stalk (2) is through arc chamber (1), and filament (10) is installed in one end, the upper sheathed insulating sheath (4) being beneficial to filament (10) fastening clamp in one end near filament (10) of described stalk (2), described protective jacket (4) abuts with the end face of insulating base (3), and the front in insulating base (3) is blocked in the periphery stretching into arc chamber (1).
2. according to claim 1 for ionogenic filament clamping device, it is characterized in that: the periphery that described insulating base (3) stretches into arc chamber (1) is offered at least one maze trough (30) polluted for reducing insulation, described protective jacket (4) blocks the front in maze trough (30).
3. according to claim 2 for ionogenic filament clamping device, it is characterized in that: described maze trough (30) is cannelure or spiral slot, the axis of described maze trough (30) is identical with the axis of stalk (2).
4. as claimed in any of claims 1 to 3 for ionogenic filament clamping device, it is characterized in that: the clamping hole (5) of an installation filament (10) radially offered by described stalk (2), offer a groove (50) be divided into two by clamping hole (5) vertically, described groove (50) extends in arc chamber (1), and described protective jacket (4) is sheathed on groove (50) outward to be clamped in clamping hole (5) by filament (10).
5. according to claim 4 for ionogenic filament clamping device, it is characterized in that: described protective jacket (4) is provided with large end the first taper surface (41) outwardly away from the inside, one end of insulating base (3), the periphery of described stalk (2) is provided with the second taper surface (21) coordinated with the first taper surface (41), and the tapering of described first taper surface (41) is less than the tapering of the second taper surface (21).
6. according to claim 5 for ionogenic filament clamping device, it is characterized in that: described stalk (2) stretches out through insulating base (3) away from the other end of filament (10), external part is provided with screw thread, on external part sheathed be beneficial to the second taper surface (21) away from or near the regulating part (6) of the first taper surface (41).
7. according to claim 6 for ionogenic filament clamping device, it is characterized in that: described regulating part (6) comprises elastic component (61) and locking nut (62), described elastic component (61) is located between insulating base (3) and locking nut (62), when locking nut (62) compression elastic piece (61) be closely against insulating base (3) upper time, the second taper surface (21) is near the first taper surface (41) and closely cooperate to realize filament (10) with the first taper surface (41) and clamp.
8. according to claim 1 for ionogenic filament clamping device, it is characterized in that: described insulating base (3) is inverted T-shaped structure, the outer wall that the large end face of inverted T-shaped is positioned at arc chamber (1) coordinates on fastening arc chamber (1) by installing hole and bolt, and small end face stretches in arc chamber (1).
9. according to claim 8 for ionogenic filament clamping device, it is characterized in that: described protective jacket (4) is and stalk (2), all coaxial stairstepping sleeve arranged of insulating base (3), the large end of described stairstepping sleeve down, the ladder endoporus of described stairstepping sleeve abuts with the end face of insulating base (3), the barrel of large end blocks the front in insulating base (3), and the barrel of small end is near filament (10).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510725747.8A CN105355531B (en) | 2015-10-30 | 2015-10-30 | Filament clamping device for ion gun |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510725747.8A CN105355531B (en) | 2015-10-30 | 2015-10-30 | Filament clamping device for ion gun |
Publications (2)
Publication Number | Publication Date |
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CN105355531A true CN105355531A (en) | 2016-02-24 |
CN105355531B CN105355531B (en) | 2017-08-04 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201510725747.8A Active CN105355531B (en) | 2015-10-30 | 2015-10-30 | Filament clamping device for ion gun |
Country Status (1)
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CN (1) | CN105355531B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024050878A1 (en) * | 2022-09-05 | 2024-03-14 | 台湾积体电路制造股份有限公司 | Ion source filament structure, ion source device and ion implantation apparatus |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2112891U (en) * | 1991-09-14 | 1992-08-12 | 北京师范大学 | Long life metal vapouration vacuum arc ion source |
CN2287157Y (en) * | 1996-01-25 | 1998-08-05 | 核工业西南物理研究院 | Metallic vapor vacuum arc ion source |
US20060169915A1 (en) * | 2004-11-12 | 2006-08-03 | Varian Semiconductor Equipment Associates, Inc. | Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms |
CN1303246C (en) * | 2004-07-06 | 2007-03-07 | 西安交通大学 | Metal ion source |
CN201229915Y (en) * | 2008-06-18 | 2009-04-29 | 北京师范大学 | Pressure clamping type cathode construction for metal vapor vacuum arc ionic source |
CN201478252U (en) * | 2009-09-11 | 2010-05-19 | 北京师范大学 | Heating type cathode for metal steam vacuum arc ion source |
CN101582364B (en) * | 2009-06-22 | 2011-06-22 | 核工业西南物理研究院 | Double cup cover ion source filament seat structure for preventing metal spraying |
CN102956421A (en) * | 2011-08-22 | 2013-03-06 | 北京中科信电子装备有限公司 | Ion source filament and clamping device therefor |
-
2015
- 2015-10-30 CN CN201510725747.8A patent/CN105355531B/en active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN2112891U (en) * | 1991-09-14 | 1992-08-12 | 北京师范大学 | Long life metal vapouration vacuum arc ion source |
CN2287157Y (en) * | 1996-01-25 | 1998-08-05 | 核工业西南物理研究院 | Metallic vapor vacuum arc ion source |
CN1303246C (en) * | 2004-07-06 | 2007-03-07 | 西安交通大学 | Metal ion source |
US20060169915A1 (en) * | 2004-11-12 | 2006-08-03 | Varian Semiconductor Equipment Associates, Inc. | Ion source configuration for production of ionized clusters, ionized molecules and ionized mono-atoms |
CN201229915Y (en) * | 2008-06-18 | 2009-04-29 | 北京师范大学 | Pressure clamping type cathode construction for metal vapor vacuum arc ionic source |
CN101582364B (en) * | 2009-06-22 | 2011-06-22 | 核工业西南物理研究院 | Double cup cover ion source filament seat structure for preventing metal spraying |
CN201478252U (en) * | 2009-09-11 | 2010-05-19 | 北京师范大学 | Heating type cathode for metal steam vacuum arc ion source |
CN102956421A (en) * | 2011-08-22 | 2013-03-06 | 北京中科信电子装备有限公司 | Ion source filament and clamping device therefor |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2024050878A1 (en) * | 2022-09-05 | 2024-03-14 | 台湾积体电路制造股份有限公司 | Ion source filament structure, ion source device and ion implantation apparatus |
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CN105355531B (en) | 2017-08-04 |
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