CN105308209B - 碳涂层部件及其制造方法 - Google Patents

碳涂层部件及其制造方法 Download PDF

Info

Publication number
CN105308209B
CN105308209B CN201480025288.6A CN201480025288A CN105308209B CN 105308209 B CN105308209 B CN 105308209B CN 201480025288 A CN201480025288 A CN 201480025288A CN 105308209 B CN105308209 B CN 105308209B
Authority
CN
China
Prior art keywords
carbon coating
diamond
main body
less
hardness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201480025288.6A
Other languages
English (en)
Other versions
CN105308209A (zh
Inventor
小林幸司
神志那薰
吉本信彦
船津纯矢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honda Motor Co Ltd
Original Assignee
Honda Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honda Motor Co Ltd filed Critical Honda Motor Co Ltd
Publication of CN105308209A publication Critical patent/CN105308209A/zh
Application granted granted Critical
Publication of CN105308209B publication Critical patent/CN105308209B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C10—PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10M—LUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M103/00—Lubricating compositions characterised by the base-material being an inorganic material
    • C10M103/02—Carbon; Graphite
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C23C16/27—Diamond only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/515—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using pulsed discharges
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16J—PISTONS; CYLINDERS; SEALINGS
    • F16J10/00—Engine or like cylinders; Features of hollow, e.g. cylindrical, bodies in general
    • F16J10/02—Cylinders designed to receive moving pistons or plungers
    • F16J10/04—Running faces; Liners
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F02—COMBUSTION ENGINES; HOT-GAS OR COMBUSTION-PRODUCT ENGINE PLANTS
    • F02F—CYLINDERS, PISTONS OR CASINGS, FOR COMBUSTION ENGINES; ARRANGEMENTS OF SEALINGS IN COMBUSTION ENGINES
    • F02F1/00—Cylinders; Cylinder heads 
    • F02F1/18—Other cylinders
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
    • F05C—INDEXING SCHEME RELATING TO MATERIALS, MATERIAL PROPERTIES OR MATERIAL CHARACTERISTICS FOR MACHINES, ENGINES OR PUMPS OTHER THAN NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES
    • F05C2253/00—Other material characteristics; Treatment of material
    • F05C2253/12—Coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Chemical Vapour Deposition (AREA)
  • Sliding-Contact Bearings (AREA)
  • Physical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Cylinder Crankcases Of Internal Combustion Engines (AREA)

Abstract

本发明提供一种只需在内部表面包覆DLC涂层即能够实现充分的低摩擦化的碳涂层部件。碳涂层部件的筒状部件内部滑动部受DLC涂层包覆。DLC涂层的硬度范围为3.0～10.0GPa，峰度Rku是27.0以下。

Description

碳涂层部件及其制造方法
技术领域
碳涂层部件及其制造方法
技术领域
本发明涉及碳涂层部件及其制造方法。
背景技术
例如像内燃机的气缸体那样，为了降低能量消耗等，具有其他部件相对其发生滑动的部分的部件需要减少滑动部分的机械损失，因此该部件的低摩擦化为人们所研究。为了实现其低摩擦化，已知有一种表面上设置了类金刚石碳涂层(以下有时会简称为DLC涂层)等碳涂层的碳涂层部件(例如参照专利文献1,2)。
现有技术文献
专利文献
专利文献1：日本专利第3555844号公报
专利文献2：日本专利第4973971号公报
发明内容
发明要解决的课题
然而，在现有的碳涂层部件中，仅仅在其表面包覆DLC涂层等碳涂层无法实现足够的低摩擦化，存在必须对该DLC涂层中含有的氢、氮或氧的含量进行规定、或者对所使用的润滑油进行规定的问题。
本发明的目的在于解决上述问题，从而提供一种能够仅通过在其表面上包覆DLC涂层就能够充分实现低摩擦化的碳涂层部件。
用于解决课题的方式
为了达到上述目的，本发明的碳涂层部件的特征在于由筒状的主体和类金刚石碳涂层构成，该类金刚石碳涂层在所述主体的内部表面至少包覆其他部件滑动的部分，该类金刚石碳涂层的硬度范围为3.0～10.0GPa，该类金刚石碳涂层的峰度Rku为27.0以下，所述峰度Rku表示所述类金刚石碳涂层的表面上的每规定面积的表面粗糙度的分布。
根据本发明的碳涂层部件,所述DLC涂层的硬度范围为3.0～10.0GPa，且所述峰度Rku为27.0以下，由此能够充分降低摩擦系数从而实现低摩擦化。
所述DLC涂层的硬度不足3.0Gpa时，所述碳涂层部件的表面无法满足所需的耐摩耗性，超过10.0Gpa时则无法实现所述碳涂层部件的低摩擦化。另外，所述峰度Rku超过27.0时，则无法实现所述碳涂层部件的低摩擦化。
此外，为了进一步降低本发明的碳涂层部件的摩擦系数实现低摩擦化，所述DLC涂层的硬度范围优选为8.0～10.0GPa。同时，为了进一步降低本发明的碳涂层部件的摩擦系数实现低摩擦化，所述DLC涂层的峰度Rku优选是20.0以下，更优选是8.0以下。
另外，本发明的碳涂层部件的所述DLC涂层的表面粗糙度Rz优选为2.7μm以下。由于本发明的碳涂层部件的所述DLC涂层具备所述范围内的表面粗糙度，在该DLC涂层表面上形成的凹凸的凹部内能够保持润滑油。
此外，在本发明的碳涂层部件中，所述润滑油在高温时会燃烧。因此，本发明的碳涂层部件的所述DLC涂层的表面粗糙度Rz更优选是2.0μm以下。本发明的碳涂层部件的所述DLC涂层具备所述范围内的表面粗糙度，因此能够降低所述润滑油的消耗量。
本发明的碳涂层部件例如能够适用于内燃机的气缸体。
所述本发明的碳涂层部件的制造方法是由筒状的主体和类金刚石碳涂层构成的碳涂层部件的制造方法，该制造方法的特征在于，该类金刚石碳涂层在所述主体的内部表面至少包覆其他部件滑动的部分，该类金刚石碳涂层的硬度范围为8.0～10.0GPa，该类金刚石碳涂层的峰度Rku为27.0以下，所述峰度Rku表示所述类金刚石碳涂层的表面上的每规定面积的表面粗糙度的分布，所述制造方法具备以下步骤：
密封所述主体的两端部，并将其内部减压到1～100Pa范围的真空度的步骤；
去除所述主体的内部表面上存在的异物的步骤；以及，
将所述主体的内部维持在1～30Pa范围的真空度，同时以500～4000sccm范围的流量向所述主体内部供应乙炔气，使该乙炔气等离子化，从而在所述主体的内部表面上堆积所述类金刚石碳涂层的步骤。
根据本发明的碳涂层部件的制造方法，首先，两端部被密封的所述主体的内部被减压到1～100Pa范围的真空度。然后，在该真空度的条件下，去除所述主体的内部表面上存在的异物。
将所述主体内部减压到不足1Pa的真空度则需要昂贵的设备，而当所述真空度超过100Pa时，则无法去除所述异物。
接着，将经去除了所述异物的所述主体的内部维持在1～30Pa范围的真空度，同时以500～4000sccm范围的流量向所述主体内部供应乙炔气，使该乙炔气等离子化，从而在所述主体的内部表面上堆积所述类金刚石碳涂层。通过这种方式，能够形成硬度范围是8.0～10.0GPa、峰度Rku范围是27.0以下的所述DLC涂层。
将所述主体内部减压到不足1Pa的真空度则需要昂贵的设备，而当所述真空度超过30Pa时，则无法让所述乙炔气等离子体化。
另外，所述乙炔气的流量是上述范围之外时，无法形成具有所述硬度范围以及所述峰度Rku范围的所述DLC涂层。
此外，在本发明的碳涂层部件的制造方法中优选具备下述步骤：在5～200秒的时间范围内对所述主体施加2～100A范围的脉冲电流，由此对该主体施加偏置电压，将乙炔气等离子体化的步骤。
当所述脉冲电流不足2A、供应时间不足5秒时，有可能无法让所述乙炔气等离子体化。另外，当所述脉冲电流超过100A、供应时间超过200秒时，有可能无法形成具有上述硬度范围及峰度Rku范围的所述DLC涂层。
附图的简单说明
图1是表示本发明的碳涂层部件的制造方法中使用的等离子体CVD装置的一构成例的系统构成图。
图2是表示本发明的碳涂层部件的制造方法的流程图。
图3是表示根据挖掘摩擦理论算出摩擦系数(COF)的计算方法的示意图。
图4是表示DLC涂层的硬度及峰度(Rku)与摩擦系数(COF)之间关系的图表(graph)。
具体实施方式
接着，参照附图进一步详细说明本发明的实施方式。
在本实施方式中，以碳涂层部件是图1中用长度方向的截面所示的气缸体1(cylinder block)为例进行说明。
如图1所示，气缸体1为筒状，内部具有让活塞(未图示)滑动的空洞部2。气缸体1在润滑油下使用，并在空洞部2的表面上包覆DLC涂层(未图示)。
所述DLC涂层的硬度范围为3.0～10.0GPa，其作为统计性数值的峰度(Rku)为27.0以下。所述峰度(Rku)表示所述表面的每规定微小面积的表面粗糙度的分布。另外，所述DLC涂层优选其硬度范围为8.0～10.GPa。所述峰度(Rku)优选是20.0以下，更优选是8.0以下。
利用涂层硬度测定装置(纳米硬度计(nano indenter))，在最大荷重5mN的测定条件下测定压痕硬度(indentation hardness)作为所述硬度。
所述峰度(Rku)是如下所述通过下式(1)表述的数值：针对所述DLC涂层表面上的规定的微小面积(例如0.4mm×0.1mm的范围)，由方程式Z(x)的四次方的平均值除以均方根(Rq)的四次方后的数值。在JIS(日本工业标准)B0601中对所述峰度(Rku)有所规定。所述方程式Z(x)表示利用原子力显微镜(AFM)测定的基准长度的粗糙度曲线。
另外，所述DLC涂层优选其表面粗糙度Rz是2.7μm以下，更优选是2.0μm以下。
在空洞部2的表面上具备所述DLC涂层的气缸体1可以通过如图1所示的等离体子CVD装置3来制造。等离子体CVD装置3具备密封气缸体1的空洞部2两端的密封件4a，4b、分别装设在密封件4a，4b上的阳极5a，5b、气体供应分系统6及工艺控制分系统7。
密封件4a，4b还兼用作绝缘部件，将气缸体1与阳极5a，5b分离。阳极5a，5b是棒状电极，通过密封件4a，4b上设置的孔部(未图示)插入于密封件4a，4b内部。
气体供应分系统6具备乙炔气(acetylene gas)供应罐8和氩气(argon gas)供应罐9。乙炔气供应罐8通过导管10经由压力计11、流量控制装置一次侧阀12、流量控制装置13、流量控制装置二次侧阀14、开关阀15以及密封件4a与气缸体1的空洞部2连接。另一方面，氩气供应罐9通过导管16经由压力计17、流量控制装置一侧侧阀18、流量控制装置19、流量控制二次侧阀20，在开关阀15的上游侧与导管10连接。
工艺控制分系统7具备：由个人电脑等构成的控制装置21、受控制装置21控制的真空泵22、脉冲直流电源23、压力控制器24。真空泵22通过导管25经由开关阀26、密封件4b与气缸体1的空洞部2连接。脉冲直流电源23具备直流电缆27，直流电缆27与气缸体1的外表面连接。另外，压力控制器24与设置在导管25上的开关阀26电连接。
另外，控制装置21经由接口电缆(interface cable)28与气体供应分系统6连接。控制装置21能够控制导管10上设置的流量控制装置一次侧阀12、流量控制装置13、流量控制装置二次侧阀14及开关阀15、导管16上设置的流量控制装置一次侧阀18、流量控制装置19及流量控制装置二次侧阀20。
通过等离子体CVD装置3在气缸体1的空洞部2的表面上形成所述DLC涂层时，如图2所示，首先在步骤(STEP)1中，利用密封件4a，4b密封气缸体1的两端。接着，在步骤2中，将气缸体1的空洞部2的内部减压到规定的真空度。控制装置21控制经由压力控制器24将开关阀26打开到规定的开度，并让真空泵26工作，由此进行所述减压。其结果，将空洞部2的内部减压到例如1～100Pa的真空度。
在空洞部2的内部通过上述方式被减压后，接着在步骤3中除去空洞部2表面的异物实施清洗。除去所述异物可以通过上述方式进行：首先由控制装置21控制打开气体供应分系统6的导管12上设置的开关阀15、导管16上设置的流量控制装置一次侧阀18及流量控制装置二次侧阀20，从氩气供应罐9向空洞部2供应氩气。所述氩气的流量通过流量控制装置19被调整在例如是超过0sccm且2000sccm以下的范围。
然后，控制装置21控制脉冲直流电源23经由直流电缆27向气缸体1施加高频脉冲的偏置电压，由此在空洞部2的内部产生氩等离子体。这时，由于气缸体1起到阴极的作用，所述等离子体会攻击空洞部2的表面，通过该等离子体能够除去空洞部2的表面，从而能够实施清洗。
另外，空洞部2的表面异物的去除也可以通过供应氧气来取代所述氩气、并通过产生氧等离子体来取代所述氩等离子体的方式来进行。此外，空洞部2的表面异物的去除也可以采用通过利用氟进行化学性气化(C+2F2→CF4)的方法。
在对空洞部2的表面进行清洗后，接着，在步骤4中由流量控制装置21控制打开气体供应分系统6的导管10上设置的流量控制装置一次侧阀12及流量控制装置二次侧阀14，在供应所述氩气的同时，通过乙炔气供应罐8向空洞部2供应乙炔气。这时，通过流量控制装饰13将所述乙炔气的流量调整成例如500～4000sccm的范围。并通过流量控制装置19将所述氩气的流量调整成例如100～1000sccm的范围。
并且，控制装置21控制经由压力控制器24将开关阀26打开到规定的开度，从而将空洞部2的内部维持在例如5～30Pa的真空度。
然后，在步骤5中，控制装置21控制脉冲直流电源23经由直流电缆27例如在5～200秒范围内对气缸体1施加例如2～100A的脉冲电流。这样，能够对气缸体1施加偏置电压，由于气缸体1如上所述起到阴极的作用，乙炔气在气缸体1和阳极5a，5b之间发生等离子化，主要生成碳等离子体。
这样，在步骤6中，所述碳等离子体被吸引到作为阴极的气缸体1的空洞部2的表面，并在该表面上堆积，从而形成所述DLC涂层。另外，通过由控制装置21调节所述脉冲电流的负载率(duty cycle)，当负载率为0(OFF)时，则补充所述乙炔气和氩气。其结果，能够在空洞部2的表面上形成具有均匀厚度的所述DLC涂层。
通过上述方式，能够在气缸体1的空洞部2的表面上形成所述DLC涂层。所述DLC涂层的硬度范围为3.0～10.0GPa，同时，峰度(Rku)为27.0以下。由此能够降低空洞部2的表面的摩擦系数(COF)，能够实现低摩擦化。为了实现上述低摩擦化，所述DLC涂层的硬度范围优选是8.0～10.0GPa，且所述峰度(Rku)是20.0以下，更优选是8.0以下。
在等离子体CVD装置3中，所述乙炔气的流量相对施加在气缸体1上的偏置电压越多，所述峰度(Rku)越大。同时，所述乙炔气的流量相对所述偏置电压越少，所述DLC涂层的层厚则越变得不均匀。因此，通过把所述乙炔气的流量控制在所述范围内，能够在维持所述DLC涂层的层厚的均匀性的同时，将所述峰度(Rku)控制在所述范围内。
利用图3所示的挖掘摩擦理论(digging friction theory)说明所述摩擦系数(COF)。在挖掘摩擦理论中，气缸体1的所述DLC涂层的突起32沿活塞31的表面滑动时，突起32的直径为d，突起32的侧面33与突起32的轴所成的角度为θ。这时，将活塞侧的硬度设定成Pf，将突起32的垂直投影面积设定成A1，并将突起32的个数为n，垂直荷重W可以通过下式(2)表述。
W＝A1×Pf＝1/8×n×πd2Pf···(2)
另外，把突起32的移动方向上的投影面积设定成A2时，摩擦力F可以通过下式(3)表述。
F＝A2×Pf＝1/4×πd2Pf×cotθ···(3)
这里，摩擦系数COF通过下式(4)表述。
COF＝F/W＝2cotθ/n···(4)
根据式(4)明显可知摩擦系数COF与cotθ成正比，θ可以认为是表示突起32的锐利程度的参数。为了实现低摩擦化，有必要将气缸体1的摩擦系数控制在0.07以下，更优选将其控制在0.05以下，而将其控制在0.04以下则较为理想。
接着，在图4中表示所述DLC涂层的硬度及峰度(Rku)与摩擦系数CO之间的关系。
根据图4明显可知，在采用硬度范围是3.0～10.0GPa内例如是9.0GPa的所述DLC涂层的情况下，当峰度(Rku)为27.0以下时，摩擦系数COF是0.07以下；当峰度(Rku)是20.0以下时，摩擦系数COF是0.06以下；当峰度(Rku)是8.0以下时，摩擦系数COF是0.04以下。
另外明显可知，在采用硬度是9.5GPa的所述DLC涂层的情况下，当峰度(Rku)是7.7以下时，摩擦系数COF是0.04以下。
此外，本实施例的气缸体1在所述DLC涂层的表面粗糙度Rz是2.7μm以下时，能够在该DLC涂层表面上形成的凹凸的凹部中保持润滑油，因此是合适的。由于所述润滑油在高温下会燃烧，气缸体1在所述DLC涂层的表面粗糙度Rz是2.0μm以下时，能够减少该润滑油的消耗量，因而更为合适。
另外，在本实施例中以气缸体1为例进行了说明。但是本发明能够适用于下述部件：只要是在筒状的部件内部的滑动部上包覆DLC涂层的碳涂层部件的任意部件。
符号说明
1 气缸体
2 空洞部
3 等离子体CVD装置
6 气体供应分系统
7 工艺控制分系统

Claims (9)

1.一种碳涂层部件，其特征在于，
由筒状的主体和类金刚石碳涂层构成，所述类金刚石碳涂层在所述主体的内部表面至少包覆其他部件滑动的部分，
所述类金刚石碳涂层利用涂层硬度测定装置在最大荷重5mN的测定条件下作为压痕硬度测定的硬度在3.0GPa～10.0GPa的范围，所述类金刚石碳涂层的峰度Rku为27.0以下，所述峰度Rku表示所述类金刚石碳涂层的表面的每规定面积的表面粗糙度的分布。
2.根据权利要求1所述的碳涂层部件，其特征在于，所述类金刚石碳涂层的硬度范围为8.0GPa～10.0GPa。
3.根据权利要求1或2所述的碳涂层部件，其特征在于，所述类金刚石碳涂层的峰度Rku为20.0以下。
4.根据权利要求1或2所述的碳涂层部件，其特征在于，所述类金刚石碳涂层的峰度Rku为8.0以下。
5.根据权利要求1所述的碳涂层部件，其特征在于，所述类金刚石碳涂层的表面粗糙度Rz为2.7μm以下。
6.根据权利要求1所述的碳涂层部件，其特征在于，所述类金刚石碳涂层的表面粗糙度Rz为2.0μm以下。
7.根据权利要求1所述的碳涂层部件，其特征在于，所述主体为内燃机的气缸体。
8.一种碳涂层部件的制造方法，其特征在于，
所述碳涂层部件由筒状的主体和类金刚石碳涂层构成，所述类金刚石碳涂层在所述主体的内部表面至少包覆其他部件滑动的部分，所述类金刚石碳涂层利用涂层硬度测定装置在最大荷重5mN的测定条件下作为压痕硬度测定的硬度在8.0GPa～10.0GPa的范围，所述类金刚石碳涂层的峰度Rku为27.0以下，所述峰度Rku表示所述类金刚石碳涂层的表面的每规定面积的表面粗糙度的分布，
所述碳涂层部件的制造方法包括以下步骤：
密封所述主体的两端部，并将其内部减压到1Pa～100Pa范围的真空度的步骤；
去除所述主体的内部表面上存在的异物的步骤；以及，
将所述主体的内部维持在1Pa～30Pa范围的真空度，同时以500sccm～4000sccm范围的流量向所述主体的内部供应乙炔气并使该乙炔气等离子体化，从而在所述主体的内部表面堆积所述类金刚石碳涂层的步骤。
9.根据权利要求8所述的碳涂层部件的制造方法，其特征在于，还包括：以5秒～200秒范围的时间对所述主体施加2A～100A范围的脉冲电流，由此对该主体施加偏置电压，使乙炔气等离子体化的步骤。
CN201480025288.6A 2013-05-31 2014-05-30 碳涂层部件及其制造方法 Expired - Fee Related CN105308209B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013-116034 2013-05-31
JP2013116034 2013-05-31
PCT/JP2014/064400 WO2014192916A1 (ja) 2013-05-31 2014-05-30 炭素被覆部材及びその製造方法

Publications (2)

Publication Number Publication Date
CN105308209A CN105308209A (zh) 2016-02-03
CN105308209B true CN105308209B (zh) 2017-06-16

Family

ID=51988937

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480025288.6A Expired - Fee Related CN105308209B (zh) 2013-05-31 2014-05-30 碳涂层部件及其制造方法

Country Status (8)

Country Link
US (1) US20160115589A1 (zh)
JP (1) JP6063042B2 (zh)
CN (1) CN105308209B (zh)
BR (1) BR112015026529A2 (zh)
CA (1) CA2909512C (zh)
DE (1) DE112014002649T5 (zh)
MX (1) MX2015015990A (zh)
WO (1) WO2014192916A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102016007727A1 (de) * 2016-06-23 2017-12-28 Man Truck & Bus Ag Brennkraftmaschine, insbesondere Hubkolben-Brennkraftmaschine
JP6348941B2 (ja) * 2016-09-27 2018-06-27 本田技研工業株式会社 被膜形成装置
CN113582172B (zh) * 2021-07-16 2022-07-29 东莞市华升真空镀膜科技有限公司 类金刚石碳结构及其制备方法与应用

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5737229A (en) * 1995-11-07 1998-04-07 The Ohio State University Method of texturing a magnetic recording medium for optimum skewness and kurtosis to reduce friction with a magnetic head
CN1497147A (zh) * 2002-10-16 2004-05-19 日产自动车株式会社 用于汽车发动机的滑动结构
US7300684B2 (en) * 2004-07-15 2007-11-27 Sub-One Technology, Inc. Method and system for coating internal surfaces of prefabricated process piping in the field
JP4437426B2 (ja) * 2004-08-13 2010-03-24 日本碍子株式会社 薄膜の製造方法
US7608151B2 (en) * 2005-03-07 2009-10-27 Sub-One Technology, Inc. Method and system for coating sections of internal surfaces
JP4876464B2 (ja) * 2005-07-19 2012-02-15 株式会社豊田中央研究所 低摩擦摺動部材
US8105660B2 (en) * 2007-06-28 2012-01-31 Andrew W Tudhope Method for producing diamond-like carbon coatings using PECVD and diamondoid precursors on internal surfaces of a hollow component
JP2009167512A (ja) * 2008-01-21 2009-07-30 Kobe Steel Ltd 摺動部品用ダイヤモンドライクカーボン皮膜およびその製造方法
JP4503097B2 (ja) * 2008-02-06 2010-07-14 神奈川県 Ｄｌｃ被覆摺動部材及びその製造方法
JP2013091811A (ja) * 2010-02-23 2013-05-16 Taiyo Kagaku Kogyo Kk アルミニウム又はアルミニウム合金を基板とする多層膜積層体及びその積層方法
BRPI1100176A2 (pt) * 2011-02-10 2013-04-24 Mahle Metal Leve Sa componente de motor
JP5896463B2 (ja) * 2011-07-21 2016-03-30 国立大学法人電気通信大学 ダイヤモンドライクカーボン膜の形成方法

Also Published As

Publication number Publication date
US20160115589A1 (en) 2016-04-28
DE112014002649T5 (de) 2016-03-10
BR112015026529A2 (pt) 2017-07-25
WO2014192916A1 (ja) 2014-12-04
CN105308209A (zh) 2016-02-03
JPWO2014192916A1 (ja) 2017-02-23
CA2909512C (en) 2017-05-23
JP6063042B2 (ja) 2017-01-18
MX2015015990A (es) 2017-01-11
CA2909512A1 (en) 2014-12-04

Similar Documents

Publication Publication Date Title
Tyagi et al. A critical review of diamond like carbon coating for wear resistance applications
US20100297440A1 (en) Method for the Application of a High-Strength-Coating to Workpieces and/or Materials
CN105308209B (zh) 碳涂层部件及其制造方法
Yang et al. Catalytic growth of diamond-like carbon on Fe3C-containing carburized layer through a single-step plasma-assisted carburizing process
Guo et al. Modulation of Si on microstructure and tribo-mechanical properties of hydrogen-free DLC films prepared by magnetron sputtering
Capote et al. Improvement of the properties and the adherence of DLC coatings deposited using a modified pulsed-DC PECVD technique and an additional cathode
Lugo et al. Characterization and tribologic study in high vacuum of hydrogenated DLC films deposited using pulsed DC PECVD system for space applications
Zhou et al. Microstructure and property evolution of diamond-like carbon films co-doped by Al and Ti with different ratios
JPWO2011152182A1 (ja) 被覆部材の製造方法
US20120094074A1 (en) Dlc film-forming method and dlc film
Koskinen et al. Friction reduction by texturing of DLC coatings sliding against steel under oil lubrication
JP5574165B2 (ja) 被覆部材の製造方法
CN111378927A (zh) 一种敷设在弹性基底上的硬质薄膜结构及制备方法
Cemin et al. On the hydrogenated silicon carbide (SiCx: H) interlayer properties prompting adhesion of hydrogenated amorphous carbon (aC: H) deposited on steel
JPWO2011152122A1 (ja) 被覆部材およびその製造方法
Huang et al. Effect of deposition temperature on the microstructure and tribological properties of Si-DLC coatings prepared by PECVD
Wang et al. The effect of acetylene flow rate on the uniform deposition of thick DLC coatings on the inner surface of pipes with different draw ratios
MY152195A (en) Coated oil and gas well production devices
Capote et al. Effect of low-pressure deposition on the mechanical and tribological properties of aC: H films deposited via modified pulsed-DC PECVD with active screen as an additional cathode
Xu et al. Role of dimple textured surface on tribological properties of Ti/Al-codoped diamond-like carbon films
Ghasemi et al. A comparative study of duty cycle and argon/methane flow ratio effect on the tribological behavior of DLC coatings over nitrided Astaloy Mo-based steel
Wei et al. Si and N incorporated hydrogenated diamond like carbon film with excellent performance for marine corrosion resistance
Yang et al. Characterization of microstructure and surface properties of GLC film deposited in plasma nitriding system
JP2009525397A (ja) 薄膜多層構造体、該構造体を含む構成要素、および該構造体の堆積方法
JP5557011B2 (ja) 被覆部材の製造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20170616

Termination date: 20210530

CF01 Termination of patent right due to non-payment of annual fee