CN105296949A - Nano-structure coating with ultra-high hardness and manufacturing method thereof - Google Patents

Nano-structure coating with ultra-high hardness and manufacturing method thereof Download PDF

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CN105296949A
CN105296949A CN201510813725.7A CN201510813725A CN105296949A CN 105296949 A CN105296949 A CN 105296949A CN 201510813725 A CN201510813725 A CN 201510813725A CN 105296949 A CN105296949 A CN 105296949A
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nano
target
coating
matrix
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CN105296949B (en
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李伟
刘平
张柯
马凤仓
刘新宽
陈小红
何代华
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University of Shanghai for Science and Technology
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Abstract

The invention provides a nano-structure coating with the ultra-high hardness. The coating is composed of at least one TiSiN layer and at least one CrAlN layer. The TiSiN layers and the CrAlN layers are alternately deposited on a substrate. The invention further provides a manufacturing method of the nano-structure coating with the ultra-high hardness. The method includes the steps that the substrate which is polished is conveyed into an ultrasonic washing machine so as to be ultrasonically washed in anhydrous alcohol and acetone; then ion washing is performed; and after ion washing is performed, the substrate is placed in a multi-target magnetron sputtering instrument and stays in front of a TiSi composite target and a CrAl target alternately, and the nano-structure coating with the TiSiN layers and the CrAlN layers alternately superposed is obtained through sputtering. The nano-structure coating has the ultrahigh hardness and the excellent mechanical performance and high-temperature and oxidation resistance and can be used as a protective coating of a high-speed cutter and service anti-abrasion workpieces under other high-temperature conditions.

Description

A kind of nano-structured coating with ultrahigh hardness and preparation method thereof
Technical field
The invention belongs to materialogy field, relate to a kind of protective coating, particularly a kind of nano-structured coating with ultrahigh hardness and preparation method thereof.
Background technology
Along with the development of advanced manufacturing industry, more and more higher requirement is proposed to the surface property of material, require that material surface has higher hardness, wear-resisting, corrosion-resistant and resistance to elevated temperatures.Applying one deck superhard coating at material surface is a kind of effective way improving material surface performance, its development has adapted to the hi-tech requirement of modern manufacturing industry to metal cutting tool, can be widely used in the fields such as machinofacture, automotive industry, geological drilling, mould industry.Along with the development of the advanced cutting technology such as high speed cutting, DRY CUTTING, higher requirement be it is also proposed to the performance of cutter coat, traditional cutter coat, as TiN, TiCN, CrN, TiAlN coating can not meet the demands gradually.
Nano laminated coating is the laminated coating formed with nanometer scale alternating deposit by bi-material, pays close attention to widely because it obtains at the Novel presentation of physicals and mechanical property.Especially in mechanical property, be less than the nano laminated coating of 100nm some modulation periods, present the abnormal super model effect that raises of Young's modulus and hardness and super-hardness effect.1987, Barnet etc. found that the hardness of TiN/NbN and TiN/VN nano-multilayer film significantly brings up to the super-hardness effect of 50GPa, demonstrate good application prospect.Research in recent years finds, also exists " template effect " of the growth of two-layer alternating deposit when super-hardness effect appears in nano laminated coating.Under this effect, one deck (being called modulating layer) in the composition layer of two kinds of different crystal structures can be transformed into the metastable phase identical with its crystalline structure under " template effect " of another layer (being called template layer), thus realizing two-layer coherent strengthening, nano laminated coating presents super-hardness effect simultaneously.
Learn by reading up the literature, nano laminated coating is successfully obtained by multiple method at present, also also obtain super-hardness effect in all many body systems, also achieves much useful achievement to the research of this type coating.By inquiry, retrieve as follows about the Chinese patent of nano laminated coating:
Application number is that the patent of CN201310082498 relate to a kind of titanium carbide/titanium nitride nano laminated coating impeller and preparation technology thereof, impeller body material is 25 steel, impeller matrix surface is titanium nitride coating, containing one deck stickiness titanium carbide transition layer between impeller matrix and surfaces nitrided titanium coating.Concrete technology comprises pre-treatment, Ion Cleaning, deposition stickiness titanium carbide transition layer, deposition surface titanium nitride high rigidity layer.Improve while titanium carbide/titanium nitride nano laminated coating impeller can keep higher hardness coating toughness and and matrix between bonding strength, thus improve the shock-resistance of coating and wear resistance, extend the work-ing life of impeller.
Application number is that the patent of CN200610029133 relate to a kind of ZrO 2/ TiN hard nanometer laminated coating, belongs to field of ceramic coatings.The present invention is by ZrO 2layer and TiN layer alternating deposit are formed in Wimet, pottery or metal base, ZrO 2the thickness of/TiN layer is 2 ~ 8nm, and TiN layer is thick is 0.4 ~ 1.2nm, and total coating thickness is 2 ~ 5 μm.ZrO of the present invention 2/ TiN nano laminated coating adopts dual-target sputtering technology in argon atmospher at the metal of polishing or ceramic matrix surface alternating deposit ZrO 2layer and TiN layer obtain.The ZrO of gained of the present invention 2/ TiN nano laminated coating not only has excellent high-temperature oxidation resistance, and has the hardness of 19.1GPa to 23GPa.
Application number is that the patent of CN200610116289 relate to a kind of TiN/AlON nano multilayer coating reaction magnetron sputtering preparation method for cutting tool technical field.The Ti target adopting DC cathode to control respectively and the Al of radio frequency cathodic control 2o 3target, by Ar gas and N 2reactive sputtering in the mixed atmosphere of gas obtains TiN and AlON settled layer respectively, and by changing the sputtering power of each target and the residence time of substrate in turn before each target obtains the TiN/AlON nano laminated coating with component period change.The reactive sputtering technology of preparing of TiN/AlON nano laminated coating provided by the invention has very high production efficiency, can meet there is high rigidity and superior oxidation resistance energy, needs that the industrial scale that is applicable to high speed cutting and DRY CUTTING coating is produced.
Application number is that the patent of CN201010237724 relate to titanium boride/silicon nitride nano multi-layer coating of a kind of cutting tool technical field and preparation method thereof, and nano laminated coating is by TiB 2and Si 3n 4bi-material alternating deposit forms the multilayered structure of nanometer scale, each bilayer structure in multilayered structure, TiB 2the thickness of layer is 2 ~ 8nm, Si 3n 4thickness is 0.2 ~ 0.8nm.The TiB of gained of the present invention 2/ Si 3n 4nano laminated coating not only has excellent high-temperature oxidation resistance, and has the hardness higher than 37GPa, can be used as the high speed cutting tool especially milling cutter of high speed cutting and the top coat of chasing tool.
Application number is that the patent of CN201010597430 relate to a kind of high rigidity high elastic coefficient CrAlN/AlON nano laminated coating material, it is made up of multiple CrAlN layer and AlON layer, each CrAlN layer and AlON layer alternating deposit form nanometer scale multilayered structure on matrix, its total thickness is 1.9 ~ 2.5 μm, each CrAlN layer thickness is 5nm, and each AlON layer thickness is 0.3-1.8nm; The invention also discloses the preparation method of this nano laminated coating material, first matrix is done surface finish process by it, after ultrasonic cleaning and Ion Cleaning, then adopts reactive sputtering to replace sputter CrAlN layer and AlON layer on matrix.The present invention not only has the hardness higher than 30GPa and the Young's modulus higher than 300GPa, but also has high oxidation-resistance property and excellent corrosion resistance, the supercoat of wear-resisting workpiece of being on active service under can be used as high speed cutting tool and other hot conditions.
But, the shortcoming that above-mentioned existing coating still also exists hardness, high temperature oxidation resistance can not meet the performance requriements of high speed cutting and DRY CUTTING, and the problem that coating performance, mode of deposition and sedimentation effect cannot be taken into account.
Summary of the invention
For above-mentioned technical problem of the prior art, the invention provides a kind of nano-structured coating with ultrahigh hardness and preparation method thereof, the technical problem that described this nano-structured coating with ultrahigh hardness and preparation method thereof solves coating hardness of the prior art, high temperature oxidation resistance can not meet high speed cutting and DRY CUTTING, will solve the technical problem that coating performance, mode of deposition and sedimentation effect cannot be taken into account simultaneously.
The invention provides a kind of nano-structured coating with ultrahigh hardness, be made up of at least one TiSiN layer and at least one CrAlN layer, described TiSiN layer and CrAlN layer alternating deposit are on matrix, and described matrix is metal, Wimet or pottery.
Further, described nano coating total thickness is between 1.5-3.0 μm.
Further, the thickness of described TiSiN is 8.0nm, and the thickness of described CrAlN is 1.5 ~ 3.0nm.
Further, TiSiN layer and CrAlN layer are coherent strengthening, and film occurs running through the good column crystal of multi-layer nano layer, degree of crystallinity continuously.
Present invention also offers above-mentioned a kind of preparation method with the nano-structured coating of ultrahigh hardness, comprise the steps:
1) step of a cleaning matrix:
First the matrix after polished finish is sent into Ultrasonic Cleaners, utilize 15 ~ 30kHz ultrasonic wave to carry out cleaning 5 ~ 10min in organic solvent; Then carry out Ion Cleaning, in the process of carrying out Ion Cleaning, matrix is put into vacuum chamber, be evacuated down to 4 × 10 -4~ 8 × 10 -4pass into Ar gas after Pa, maintain vacuum tightness at 2-4Pa, with the radio frequency of 13.56MHz to matrix carry out for time 20 ~ 50min ion bombardment, power is 80-100W;
2) step of an alternating sputtering TiSiN layer and CrAlN layer;
Matrix is inserted multi-target magnetic control sputtering instrument and before alternately resting on TiSi composition target and CrAl target, the nanoscale coating alternately superposed by least one TiSiN layer and at least one CrAlN layer is obtained by sputtering, by adjustment target power output and depositing time with the thickness of control TiSiN layer and CrAlN layer, finally obtain a kind of nano-structured coating with ultrahigh hardness.
Concrete, utilize 15 ~ 30kHz ultrasonic wave to carry out cleaning in organic solvent and refer to that employing acetone and raw spirit successively carry out ultrasonic cleaning successively.
Concrete, described in step (2) by the process control parameter of multi-target magnetic control sputtering instrument sputter procedure be:
Adopt TiSi composition target and CrAl target, wherein in TiSi composition target, Ti and Si ratio is that in 84atom%:16atom%, CrAl target, Cr and Al ratio is 50atom%:50atom%, and diameter is 75mm; Ar airshed: 20-50sccm, N 2airshed: 2-10sccm; TiSiN layer is controlled by radio-frequency power supply, sputtering power 350W, time 20s; CrAlN layer by DC power control, sputtering power 150W, time 3-7s; Target-substrate distance 3-7cm; Total gas pressure scope 0.2-0.6Pa; Substrate temperature is 300 DEG C.
A kind of TiSiN/CrAlN nano-multilayered structures coating with ultrahigh hardness of the present invention, employing has the TiSiN layer of nano composite structure and has excellent mechanical, the CrAlN layer alternating deposit of high temperature oxidation resistance forms, under the thickness of 1.5-3.0 μm, can be formed between TiSiN layer and CrAlN layer coherent strengthening structure with reduce two-layer between interfacial energy, coherent interface place between TiSiN layer and CrAlN layer, dislocation motion can effectively be limited, therefore this coating is strengthened significantly, its highest hardness can reach 53.9GPa, the excellent mechanical property simultaneously had due to TiSiN and CrAlN and high temperature oxidation resistance, TiSiN/CrAlN nano-multilayered structures coating is made to can be used as at a high speed, the supercoat of matrix in the cutter coat of DRY CUTTING and other field, and this coating adopts the preparation of reaction magnetocontrol sputtering technique, it is high that preparation process has production efficiency, energy consumption is low, to advantages such as equipment requirements are lower, and technique is simple, sedimentation velocity is fast, cost is low, bonding strength is high.
The present invention compares with prior art, and its technical progress is significant.Coating of the present invention adopt the TiSiN layer with nano composite structure and there is excellent mechanical, the CrAlN layer alternating deposit of high temperature oxidation resistance form; utilize the coherent interface formed between TiSiN layer and CrAlN layer that dislocation motion is effectively limited; therefore this coating is strengthened significantly, can be used as at a high speed, the supercoat of matrix in the cutter coat of DRY CUTTING and other field.
Accompanying drawing explanation
Fig. 1 is a kind of structural representation with the nano-structured coating of ultrahigh hardness of the present invention.
Fig. 2 is a kind of transmission electron microscope photo (embodiment 3 sample) with the nano-structured coating of ultrahigh hardness of the present invention.
Embodiment
Below by specific embodiments and the drawings, the present invention is described in further detail, but do not limit the present invention.
The present invention's preparation used, sign and surveying instrument:
JGP-450 type magnetic control sputtering system, Chinese Academy of Sciences Shenyang scientific instrument development center company limited
D8Advance type X-ray diffractometer, German Bruker company
NANOIndenterG200 type nano-hardness tester, Agilent Technologies of the U.S.
TecnaiG 220 type high resolution transmission electron microscopies, FEI Co. of the U.S.
QuantaFEG450 type scanning electronic microscope, FEI Co. of the U.S.
embodiment 1
There is a preparation method for the nano-structured coating of ultrahigh hardness, comprise the steps:
1)the step of a cleaning matrix:
First the matrix after polished finish is sent into Ultrasonic Cleaners, in raw spirit and acetone, utilize 15 ~ 30kHz ultrasonic wave to carry out cleaning 5 ~ 10min; Then carry out Ion Cleaning, put into vacuum chamber by matrix, be evacuated down to 6 × 10 -4pass into Ar gas after Pa, maintain vacuum tightness at 2-4Pa, with radio frequency (13.56MHz) to matrix carry out for time 20 ~ 50min ion bombardment, power is 80-100W; Described matrix is pottery.
2) step of an alternating sputtering TiSiN layer and CrAlN layer;
Adopt TiSi(84atom%:16atom%) composition target and CrAl target (50atom%:50atom%), diameter is 75mm; Ar airshed: 40sccm, N 2airshed: 5sccm;
TiSiN layer sputtering power 350W, time 20s; CrAl layer sputtering power 150W, time 3s;
Target-substrate distance 5cm; Total gas pressure scope 0.4Pa; Substrate temperature is 300 DEG C.
Gained has the structural representation of the TiSiN/CrAlN nano-multilayered structures coating of ultrahigh hardness as shown in Figure 1.After testing, the TiSiN layer thickness obtained is 8.0nm, CrAlN layer is thickness 1.5nm, and total thickness is 1.6 μm, and hardness is 40.5GPa.
embodiment 2
There is a preparation method for the nano-structured coating of ultrahigh hardness, comprise the steps:
1)the step of a cleaning matrix:
First the matrix after polished finish is sent into Ultrasonic Cleaners, in raw spirit and acetone, utilize 15 ~ 30kHz ultrasonic wave to carry out cleaning 5 ~ 10min; Then carry out Ion Cleaning, put into vacuum chamber by matrix, be evacuated down to 6 × 10 -4pass into Ar gas after Pa, maintain vacuum tightness at 2-4Pa, with radio frequency (13.56MHz) to matrix carry out for time 20 ~ 50min ion bombardment, power is 80-100W; Described matrix is nichrome.
2) step of an alternating sputtering TiSiN layer and CrAlN layer;
Adopt TiSi(84atom%:16atom%) composition target and CrAl target (50atom%:50atom%), diameter is 75mm; Ar airshed: 20sccm, N 2airshed: 2sccm;
TiSiN layer sputtering power 350W, time 20s; CrAl layer sputtering power 150W, time 4s;
Target-substrate distance 3cm; Total gas pressure scope 0.2Pa; Substrate temperature is 300 DEG C.
After testing, the TiSiN layer thickness obtained is 8.0nm, CrAlN layer is thickness 2.0nm, and total thickness is 2.3 μm, and hardness is 48.5GPa.
embodiment 3
There is a preparation method for the nano-structured coating of ultrahigh hardness, comprise the steps:
1)the step of a cleaning matrix:
First the matrix after polished finish is sent into Ultrasonic Cleaners, in raw spirit and acetone, utilize 15 ~ 30kHz ultrasonic wave to carry out cleaning 5 ~ 10min; Then carry out Ion Cleaning, put into vacuum chamber by matrix, be evacuated down to 6 × 10 -4pass into Ar gas after Pa, maintain vacuum tightness at 2-4Pa, with radio frequency (13.56MHz) to matrix carry out for time 20 ~ 50min ion bombardment, power is 80-100W; Described matrix is brass.
2) step of an alternating sputtering TiSiN layer and CrAlN layer;
Adopt TiSi(84atom%:16atom%) composition target and CrAl target (50atom%:50atom%), diameter is 75mm; Ar airshed: 50sccm, N 2airshed: 10sccm;
TiSiN layer sputtering power 350W, time 20s; CrAl layer sputtering power 150W, time 5s;
Target-substrate distance 5cm; Total gas pressure scope 0.4Pa; Substrate temperature is 300 DEG C.
After testing, the TiSiN layer thickness obtained is 8.0nm, CrAlN layer is thickness 2.5nm, and total thickness is 2.7 μm, and hardness is 53.9GPa.
embodiment 4
There is a preparation method for the nano-structured coating of ultrahigh hardness, comprise the steps:
1)the step of a cleaning matrix:
First the matrix after polished finish is sent into Ultrasonic Cleaners, in raw spirit and acetone, utilize 15 ~ 30kHz ultrasonic wave to carry out cleaning 5 ~ 10min; Then carry out Ion Cleaning, put into vacuum chamber by matrix, be evacuated down to 6 × 10 -4pass into Ar gas after Pa, maintain vacuum tightness at 2-4Pa, with radio frequency (13.56MHz) to matrix carry out for time 20 ~ 50min ion bombardment, power is 80-100W; Described matrix is stainless steel.
2) step of an alternating sputtering TiSiN layer and CrAlN layer;
Adopt TiSi(84atom%:16atom%) composition target and CrAl target (50atom%:50atom%), diameter is 75mm; Ar airshed: 45sccm, N 2airshed: 6sccm;
TiSiN layer sputtering power 350W, time 20s; CrAl layer sputtering power 150W, time 6s;
Target-substrate distance 7cm; Total gas pressure scope 0.6Pa; Substrate temperature is 300 DEG C.
After testing, the TiSiN layer thickness obtained is 8.0nm, CrAlN layer is thickness 3.0nm, and total thickness is 3.0 μm, and hardness is 46.7GPa.
embodiment 5
There is a preparation method for the nano-structured coating of ultrahigh hardness, comprise the steps:
1)the step of a cleaning matrix:
First the matrix after polished finish is sent into Ultrasonic Cleaners, in raw spirit and acetone, utilize 15 ~ 30kHz ultrasonic wave to carry out cleaning 5 ~ 10min; Then carry out Ion Cleaning, put into vacuum chamber by matrix, be evacuated down to 6 × 10 -4pass into Ar gas after Pa, maintain vacuum tightness at 2-4Pa, with radio frequency (13.56MHz) to matrix carry out for time 20 ~ 50min ion bombardment, power is 80-100W; Described matrix is manganese steel.
2) step of an alternating sputtering TiSiN layer and CrAlN layer;
Adopt TiSi(84atom%:16atom%) composition target and CrAl target (50atom%:50atom%), diameter is 75mm; Ar airshed: 40sccm, N 2airshed: 5sccm;
TiSiN layer sputtering power 350W, time 20s; CrAl layer sputtering power 150W, time 7s;
Target-substrate distance 5cm; Total gas pressure scope 0.4Pa; Substrate temperature is 300 DEG C.
After testing, the TiSiN layer thickness obtained is 8.0nm, CrAlN layer is thickness 3.5nm, and total thickness is 2.4 μm, and hardness is 40.9GPa.

Claims (6)

1. there is a nano-structured coating for ultrahigh hardness, it is characterized in that: be made up of at least one TiSiN layer and at least one CrAlN layer, described TiSiN layer and CrAlN layer alternating deposit are on matrix, and described matrix is metal, Wimet or pottery.
2. a kind of nano-structured coating with ultrahigh hardness as claimed in claim 1, is characterized in that: the total thickness of described nano coating is between 1.5-3.0 μm.
3. a kind of nano-structured coating with ultrahigh hardness as claimed in claim 1, it is characterized in that: the thickness of described TiSiN is 8.0nm, the thickness of described CrAlN is 1.5 ~ 3.0nm.
4. a kind of preparation method with the nano-structured coating of ultrahigh hardness according to claim 1, is characterized in that comprising the steps:
1) step of a cleaning matrix:
First the matrix after polished finish is sent into Ultrasonic Cleaners, utilize 15 ~ 30kHz ultrasonic wave to carry out cleaning 5 ~ 10min in organic solvent; Then carry out Ion Cleaning, in the process of carrying out Ion Cleaning, matrix is put into vacuum chamber, be evacuated down to 4 × 10 -4~ 8 × 10 -4pass into Ar gas after Pa, maintain vacuum tightness at 2-4Pa, with the radio frequency of 13.56MHz to matrix carry out for time 20 ~ 50min ion bombardment, power is 80-100W;
2) step of an alternating sputtering TiSiN layer and CrAlN layer;
Matrix is inserted multi-target magnetic control sputtering instrument and before alternately resting on TiSi composition target and CrAl target, the nanoscale coating alternately superposed by least one TiSiN layer and at least one CrAlN layer is obtained by sputtering, by adjustment target power output and depositing time with the thickness of control TiSiN layer and CrAlN layer, finally obtain a kind of nano-structured coating with ultrahigh hardness.
5. a kind of preparation method with the nano-structured coating of ultrahigh hardness as claimed in claim 4, is characterized in that: utilize 15 ~ 30kHz ultrasonic wave to carry out cleaning in organic solvent and refer to and adopt acetone and raw spirit successively to carry out ultrasonic cleaning successively.
6. a kind of preparation method with the nano-structured coating of ultrahigh hardness as claimed in claim 4, is characterized in that: described in step (2) by the process control parameter of multi-target magnetic control sputtering instrument sputter procedure be:
Adopt TiSi composition target and CrAl target, wherein in TiSi composition target, Ti and Si ratio is that in 84atom%:16atom%, CrAl target, Cr and Al ratio is 50atom%:50atom%, and target diameter is 75mm; Ar airshed: 20-50sccm, N 2airshed: 2-10sccm; TiSiN layer is controlled by radio-frequency power supply, sputtering power 350W, time 20s; CrAlN layer by DC power control, sputtering power 150W, time 3-7s; Target-substrate distance 3-7cm; Total gas pressure scope 0.2-0.6Pa; Substrate temperature is 300 DEG C.
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CN107588699A (en) * 2017-08-31 2018-01-16 南京多特工具有限公司 A kind of coated thread feeler gauge
CN107604332A (en) * 2017-09-14 2018-01-19 艾瑞森表面技术(苏州)股份有限公司 A kind of nano-composite coating structure and preparation method thereof
CN107815643A (en) * 2017-09-14 2018-03-20 上海新弧源涂层技术有限公司 A kind of nano laminated coating for high-temperature service and preparation method thereof
EP3490745A4 (en) * 2016-08-01 2019-12-25 Mitsubishi Materials Corporation Multilayer hard film-coated cutting tool
JP2021070075A (en) * 2019-10-29 2021-05-06 日進工具株式会社 Cutting tool including hard coat
CN114990480A (en) * 2022-05-25 2022-09-02 宜昌永鑫精工科技股份有限公司 PCB milling cutter coating and processing method thereof
CN116695062A (en) * 2023-05-09 2023-09-05 东莞市普拉提纳米科技有限公司 High-entropy composite cutter coating for cutting stainless steel and preparation method thereof

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CN103334106A (en) * 2013-05-21 2013-10-02 中国船舶重工集团公司第七二五研究所 Surface-hardening treatment method of sealing pairs and friction pairs of titanium and titanium alloy ball valves

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EP3490745A4 (en) * 2016-08-01 2019-12-25 Mitsubishi Materials Corporation Multilayer hard film-coated cutting tool
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CN106756833A (en) * 2016-12-28 2017-05-31 上海理工大学 A kind of high rigidity TiCrN/TiSiN nano-multilayered structures coatings and preparation method thereof
CN106756833B (en) * 2016-12-28 2019-02-15 上海理工大学 A kind of high rigidity TiCrN/TiSiN nano-multilayered structures coating and preparation method thereof
CN107588699A (en) * 2017-08-31 2018-01-16 南京多特工具有限公司 A kind of coated thread feeler gauge
CN107588699B (en) * 2017-08-31 2019-12-13 南京多特工具有限公司 Coating thread plug gauge
CN107815643A (en) * 2017-09-14 2018-03-20 上海新弧源涂层技术有限公司 A kind of nano laminated coating for high-temperature service and preparation method thereof
CN107604332A (en) * 2017-09-14 2018-01-19 艾瑞森表面技术(苏州)股份有限公司 A kind of nano-composite coating structure and preparation method thereof
JP2021070075A (en) * 2019-10-29 2021-05-06 日進工具株式会社 Cutting tool including hard coat
JP7384620B2 (en) 2019-10-29 2023-11-21 日進工具株式会社 Cutting tools with hard coating
CN114990480A (en) * 2022-05-25 2022-09-02 宜昌永鑫精工科技股份有限公司 PCB milling cutter coating and processing method thereof
CN116695062A (en) * 2023-05-09 2023-09-05 东莞市普拉提纳米科技有限公司 High-entropy composite cutter coating for cutting stainless steel and preparation method thereof
CN116695062B (en) * 2023-05-09 2024-01-23 东莞市普拉提纳米科技有限公司 High-entropy composite cutter coating for cutting stainless steel and preparation method thereof

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