CN105441945B - A kind of nano coating of high rigidity low-friction coefficient and preparation method thereof - Google Patents

A kind of nano coating of high rigidity low-friction coefficient and preparation method thereof Download PDF

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CN105441945B
CN105441945B CN201510820391.6A CN201510820391A CN105441945B CN 105441945 B CN105441945 B CN 105441945B CN 201510820391 A CN201510820391 A CN 201510820391A CN 105441945 B CN105441945 B CN 105441945B
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coating
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CN105441945A (en
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李伟
刘平
张柯
马凤仓
刘新宽
陈小红
何代华
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University of Shanghai for Science and Technology
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0635—Carbides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
    • C23C28/40—Coatings including alternating layers following a pattern, a periodic or defined repetition

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cutting Tools, Boring Holders, And Turrets (AREA)

Abstract

A kind of nano coating of high rigidity low-friction coefficient of the present invention, is made up of, HfC layers and SiC layer alternating deposit are on matrix at least one layer of HfC layers and at least one layer of SiC layer.Additionally provide the preparation method of above-mentioned nano coating, matrix surface is made into mirror finish processing first, then the ultrasonic cleaning of acetone, alcohol is passed through, after vacuum ionic cleaning, using direct current or RF-reactively sputtered titanium method alternating deposit HfC layers and SiC layer, HfC layers are made by pure Hf targets under argon gas and acetylene atmosphere, and SiC is prepared using directly sputtering SiC compounds target.The HfC/SiC nano laminated coatings of the present invention not only have high rigidity and wearability, and for its maximum hardness up to 36.2 GPa, and because higher C content makes coating have relatively low coefficient of friction, the coefficient of friction between bearing steel is about 0.3.The coating can be on active service under the occasions such as high rigidity, high abrasion, low friction.

Description

A kind of nano coating of high rigidity low-friction coefficient and preparation method thereof
Technical field
The invention belongs to material surface engineering technolog field, is related to a kind of coating, and specifically a kind of high rigidity is low rubs Wipe nano coating of coefficient and preparation method thereof.
Background technology
With the development of advanced manufacturing industry, the cutting to material develops toward high speed and dry type both direction, therefore to cutter The surface property of material proposes higher and higher requirement, it is desirable to which cutter material surface has higher hardness, wear-resisting, corrosion-resistant With relatively low coefficient of friction.Coating technology is to improve cutting performance and the important channel in life-span.With high-speed cutting, DRY CUTTING Etc. the continuous development of advanced cutting technology, higher requirement it is also proposed to the performance of cutter coat, not only to possess high rigidity, The mechanical performances such as high elastic modulus, wearability and toughness, also to possess high temperature oxidation resistance, corrosion resistance and relatively low friction Coefficient.Traditional cutter coat, as TiN, CrN even TiAlN coatings can not gradually meet the performance requirement of harshness.
Nano laminated coating is the plural layers formed by two kinds of materials with nanometer scale alternating deposit, because it is physical Extensive concern can have been obtained with the Novel presentation of mechanical property.Especially in terms of mechanical property, some modulation periods are less than 100nm nano-multilayer film, show modulus of elasticity and the extremely elevated super model effect of hardness and super-hardness effect.1987, Barnett etc. has found that the hardness of TiN/NbN and TiN/VN nano-multilayer films greatly improves 50GPa super-hardness effect, shows Good application prospect.At present, as superhard protective coating, research of the people to nano laminated coating is at home and abroad Carry out extensively, nano laminated coating also achieves many progress on the engineer applied of reality.
Learnt by reading up the literature, nano laminated coating has successfully been made by a variety of methods at present, in all many body systems Super-hardness effect is also obtain, the research to the type coating also achieves many beneficial achievements.By inquiry, retrieve has as follows Close the Chinese patent of nano laminated coating：
Application No. CN200610029133 patent relate to a kind of ZrO2/ TiN hard nanometer laminated coatings, belong to pottery Porcelain coatings art.The present invention is by ZrO2Layer and TiN layer alternating deposit are formed in hard alloy, ceramics or metallic substrates, ZrO2/ The thickness of TiN layer is 2~8nm, and TiN layer thickness is 0.4~1.2nm, and total coating thickness is 2~5 μm.The ZrO of the present invention2/TiN Nano laminated coating uses the dual-target sputtering technology in argon atmospher in the metal or ceramic matrix surface alternating deposit of polishing ZrO2Layer and TiN layer obtain.The ZrO of gained of the invention2/ TiN nano laminated coatings not only have excellent high-temperature oxidation resistance, And the hardness with 19.1GPa to 23GPa.
The patent of Application No. 200910055596.4 is related to a kind of VC/Si3N4Nano laminated coating and preparation method thereof, Belong to field of ceramic coatings.VC/Si3N4High hardness nanocomposite laminated coating is by VC layers and Si3N4Layer alternating deposit is in metal, hard Formed in alloy or ceramic bases, the thickness of VC layers is 2~8nm, Si3N4Thickness is 0.2~0.9nm.Coating of the present invention is prepared such as Under：Metal or ceramic matrix surface are made into mirror finish processing first, it is then double by being used on the matrix of metal or ceramics Target RF-reactively sputtered titanium method alternating deposit VC layers and Si3N4Layer, produces VC/Si3N4Nano laminated coating, wherein VC use VC Target directly sputtering obtains, and Si3N4Using directly sputtering Si3N4Compound target provides.The VC/Si of gained of the invention3N4Nanometer Laminated coating not only has excellent high-temperature oxidation resistance, and with the hardness higher than 40GPa.The present invention is used as high-speed cutting The milling cutter of cutter especially high-speed cutting and the face coat of screw tool.
Application No. CN201110082001 patent relate to a kind of Ti-Zr/ZrN nano laminated coatings cutter and its system Standby technique, tool matrix material be hard alloy or high-speed steel, and tool matrix surface is ZrN high hardness spray coatings, tool matrix and There are Ti transition zones between ZrN high hardness spray coatings, it is alternate for Zr and ZrN between Ti transition zones and surface ZrN high hardness spray coatings Sandwich construction.Concrete technology includes pre-treatment, Ion Cleaning, repeatedly depositing Ti transition zone, deposition Zr layers and ZrN layers, deposition table The step of face ZrN layers.Ti-Zr/ZrN nano laminated coating cutters contain high rigidity ZrN coatings and ductile metal Zr, can keep The toughness of coating and the bond strength between matrix are improved while higher hardness, so as to improve the wearability of coating.However, should The high temperature oxidation resistance of nano laminated coating prepared by technique still needs to further improve.
Application No. CN201010237724 patent relate to a kind of titanium boride/silicon nitride of cutting element technical field Nano laminated coating and preparation method thereof, nano laminated coating is by TiB2And Si3N4Two kinds of material alternating deposits form nanometer scale Sandwich construction, each double-decker in sandwich construction, TiB2The thickness of layer is 2~8nm, Si3N4Thickness be 0.2~ 0.8nm.Preparation method is as follows：Metal or ceramic matrix surface are made into mirror finish processing first, then by metal or pottery Using double-target radio frequency sputtering method alternating deposit TiB in an ar atmosphere on the matrix of porcelain2Layer and Si3N4Layer, produces TiB2/Si3N4 Nano laminated coating, wherein TiB2 use TiB2Target directly sputtering obtains, and Si3N4Using directly sputtering Si3N4Compound target There is provided.The TiB of gained of the invention2/Si3N4Nano laminated coating not only has excellent high-temperature oxidation resistance, and has and be higher than 37GPa hardness.
A kind of high rigidity ZrN/Al of technical field of ceramic material of Application No. CN200510111216.62(O1-xNx)3Receive Rice laminated coating.By Al2(O1-xNx)3Layer and ZrN layers alternating deposit form on the matrix of metal, hard alloy or ceramics, have There is excellent high-temperature oxidation resistance, and with the hardness higher than 30GPa and the oxidation resistance temperature more than 1000 DEG C.As at a high speed The coating of cutting tool and other wear-resisting workpieces of military service under the high temperature conditions.
However, there are still hardness, coefficient of friction can not meet high-speed cutting and DRY CUTTING for above-mentioned existing coating The shortcomings that performance requirement, and the problem of coating performance, sedimentary condition and deposition efficiency can not be taken into account.
The content of the invention
For above-mentioned technical problem of the prior art, the invention provides a kind of painting of the nanometer of high rigidity low-friction coefficient Layer and preparation method thereof, described nano coating of this high rigidity low-friction coefficient and preparation method thereof solves prior art In coating can not meet there are still hardness, coefficient of friction high-speed cutting and DRY CUTTING performance requirement technical problem, The technical problem that coating performance, sedimentary condition and deposition efficiency can not be taken into account simultaneously.
The invention provides a kind of nano coating of high rigidity low-friction coefficient, by least one layer of HfC layers and at least one layer SiC layer forms, and on matrix, described matrix is metal, hard alloy or ceramics for described HfC layers and SiC layer alternating deposit.
Further, the thickness of described HfC layers is between 4-8nm, the thickness of described SiC layer 0.3-1.2nm it Between, the gross thickness of described nano coating is between 2~4 μm.
Include present invention also offers a kind of preparation method of the nano coating of above-mentioned high rigidity low-friction coefficient as follows Preparation process：
1) cleaned to matrix the step of, by the matrix after polishing mirror finish processing in organic solvent, 5~10min is cleaned using 15~30kHz ultrasonic waves；Then Ion Cleaning is carried out, during Ion Cleaning is carried out, by base Body puts into Sample Room after installing, and is evacuated down to 5*10-3Open Ar gas after Pa, vacuum is maintained in 2-4Pa, with 13.56Hz radio frequency Ions Bombardment, power 80-100W are carried out to matrix；
2) an alternating sputtering HfC layer and the step of SiC layer；By the way of direct current or RF-reactively sputtered titanium, pass through friendship Before pure Hf targets and SiC target is rested on, the nano coating being alternately superimposed by least one layer of HfC layers and at least one layer of SiC layer is obtained, The argon flow amount sputtered during pure Hf targets is 30-50sccm, acetylene flow is 2-5sccm；Deposition HfC layers power be 150W, time 10-20s；The power of deposition of SiC layer is 80W, time 3-12s；Target-substrate distance is 3-7cm；Total gas pressure scope 0.2-0.6Pa；200-400 DEG C of substrate temperature range.
Further, in the step of being cleaned to matrix for one, by through polishing mirror finish processing after matrix according to It is secondary that ultrasonic wave cleaning is carried out in analytically pure alcohol and acetone.
Further, described HfC layers by pure Hf targets in (Ar+C2H4) be made under atmosphere, described SiC is using direct Sputtering SiC compound targets are made.
Specifically, by HfC institutes crystallization when SiC layer thickness is less than 1.2nm, the feature with coherent strengthening, coating tool There is face-centered cubic crystal structure.
The HfC/SiC nano laminated coatings of the present invention not only have high rigidity and wearability, and its maximum hardness is up to 36.2 GPa, and because higher C content makes coating have relatively low coefficient of friction, the coefficient of friction between bearing steel is about For 0.3.
The present invention compares with prior art, and its technological progress is significant.HfC/SiC nano laminated coatings of the present invention can be It is on active service under the occasions such as high rigidity, high abrasion, low-friction coefficient, such as the protective coating of cutter, mould；In addition, HfC/SiC receives Rice laminated coating preparation technology also has the characteristics that technique is simple, deposition velocity is fast, cost is low, environmentally safe.
Brief description of the drawings
The cross section high-resolution-ration transmission electric-lens pattern of Fig. 1 HfC/SiC nano laminated coatings.
Embodiment
Below by specific embodiments and the drawings, the present invention is described in further detail, but is not intended to limit the present invention.
Preparation, sign and measuring instrument used in the present invention：
JGP-450 type magnetic control sputtering systems, Chinese Academy of Sciences Shenyang scientific instrument development center Co., Ltd
D8 Advance type X-ray diffractometers, German Bruker companies
NANO Indenter G200 type nano-hardness testers, Agilent Technologies of the U.S.
Tecnai G2 20 type high resolution transmission electron microscopies, FEI Co. of the U.S.
Quanta FEG450 type SEM, FEI Co. of the U.S.
Embodiment 1
A kind of preparation method of the nano coating of high rigidity low-friction coefficient, including following preparation process：
1) cleaned to matrix the step of, by the matrix after polishing mirror finish processing in organic solvent, 5~10min is cleaned using 15~30kHz ultrasonic waves；Then Ion Cleaning is carried out, during Ion Cleaning is carried out, by base Body puts into Sample Room after installing, and is evacuated down to 5*10-3Open Ar gas after Pa, vacuum is maintained in 2-4Pa, with 13.56Hz radio frequency Ions Bombardment, power 80-100W are carried out to matrix；Described matrix is manganese steel.
2) an alternating sputtering HfC layer and the step of SiC layer；By the way of direct current or RF-reactively sputtered titanium, pass through friendship Before pure Hf targets and SiC target is rested on, the nano coating being alternately superimposed by least one layer of HfC layers and at least one layer of SiC layer is obtained, Design parameter is：Ar throughputs 30sccm, C2H4Flow 2sccm, HfC sputtering power 150W, time 10s, SiC sputtering powers 80W, time 3s, 300 DEG C, deposition pressure 0.4Pa of substrate temperature, obtain HfC thickness degree about 4nm, SiC thickness about 0.3nm.
3) hardness 35.1GPa is obtained, the coefficient of friction with bearing steel is 0.30, total coating thickness：2.1μm.
Embodiment 2
A kind of preparation method of the nano coating of high rigidity low-friction coefficient, including following preparation process：
1) cleaned to matrix the step of, by the matrix after polishing mirror finish processing in organic solvent, 5~10min is cleaned using 15~30kHz ultrasonic waves；Then Ion Cleaning is carried out, during Ion Cleaning is carried out, by base Body puts into Sample Room after installing, and is evacuated down to 5*10-3Open Ar gas after Pa, vacuum is maintained in 2-4Pa, with 13.56Hz radio frequency Ions Bombardment, power 80-100W are carried out to matrix；Described matrix is brass.
2) an alternating sputtering HfC layer and the step of SiC layer；By the way of direct current or RF-reactively sputtered titanium, pass through friendship Before pure Hf targets and SiC target is rested on, the nano coating being alternately superimposed by least one layer of HfC layers and at least one layer of SiC layer is obtained, Design parameter is：Ar throughputs 40sccm, C2H4Flow 3sccm, HfC sputtering power 150W, time 15s, SiC sputtering powers 80W, time 6s, 400 DEG C, deposition pressure 0.2Pa of substrate temperature, obtain HfC thickness degree about 5nm, SiC thickness about 0.6nm.
3) hardness 37.1GPa is obtained, the coefficient of friction with bearing steel is 0.34, total coating thickness：2.8μm.
Embodiment 3
A kind of preparation method of the nano coating of high rigidity low-friction coefficient, including following preparation process：
1) cleaned to matrix the step of, by the matrix after polishing mirror finish processing in organic solvent, 5~10min is cleaned using 15~30kHz ultrasonic waves；Then Ion Cleaning is carried out, during Ion Cleaning is carried out, by base Body puts into Sample Room after installing, and is evacuated down to 5*10-3Open Ar gas after Pa, vacuum is maintained in 2-4Pa, with 13.56Hz radio frequency Ions Bombardment, power 80-100W are carried out to matrix；Described matrix is stainless steel.
2) an alternating sputtering HfC layer and the step of SiC layer；By the way of direct current or RF-reactively sputtered titanium, pass through friendship Before pure Hf targets and SiC target is rested on, the nano coating being alternately superimposed by least one layer of HfC layers and at least one layer of SiC layer is obtained, Design parameter is：Ar throughputs 50sccm, C2H4Flow 5sccm, HfC sputtering power 150W, time 20s, SiC sputtering powers 80W, time 9s, 300 DEG C, deposition pressure 0.6Pa of substrate temperature, obtain HfC thickness degree about 6nm, SiC thickness about 0.9nm.
3) hardness 38.4GPa is obtained, the coefficient of friction with bearing steel is 0.28, total coating thickness：3.1μm.
Embodiment 4
A kind of preparation method of the nano coating of high rigidity low-friction coefficient, including following preparation process：
1) cleaned to matrix the step of, by the matrix after polishing mirror finish processing in organic solvent, 5~10min is cleaned using 15~30kHz ultrasonic waves；Then Ion Cleaning is carried out, during Ion Cleaning is carried out, by base Body puts into Sample Room after installing, and is evacuated down to 5*10-3Open Ar gas after Pa, vacuum is maintained in 2-4Pa, with 13.56Hz radio frequency Ions Bombardment, power 80-100W are carried out to matrix；Described matrix is nichrome.
2) an alternating sputtering HfC layer and the step of SiC layer；By the way of direct current or RF-reactively sputtered titanium, pass through friendship Before pure Hf targets and SiC target is rested on, the nano coating being alternately superimposed by least one layer of HfC layers and at least one layer of SiC layer is obtained, Design parameter is：Ar throughputs 30sccm, C2H4Flow 4sccm, HfC sputtering power 150W, time 15s, SiC sputtering powers 80W, time 12s, 400 DEG C, deposition pressure 0.4Pa of substrate temperature, obtain HfC thickness degree about 5nm, SiC thickness about 1.2nm.
3) hardness 36.3GPa is obtained, the coefficient of friction with bearing steel is 0.34, total coating thickness：3.8μm.
Embodiment 5
A kind of preparation method of the nano coating of high rigidity low-friction coefficient, including following preparation process：
1) cleaned to matrix the step of, by the matrix after polishing mirror finish processing in organic solvent, 5~10min is cleaned using 15~30kHz ultrasonic waves；Then Ion Cleaning is carried out, during Ion Cleaning is carried out, by base Body puts into Sample Room after installing, and is evacuated down to 5*10-3Open Ar gas after Pa, vacuum is maintained in 2-4Pa, with 13.56Hz radio frequency Ions Bombardment, power 80-100W are carried out to matrix；Described matrix is ceramics.
2) an alternating sputtering HfC layer and the step of SiC layer；By the way of direct current or RF-reactively sputtered titanium, pass through friendship Before pure Hf targets and SiC target is rested on, the nano coating being alternately superimposed by least one layer of HfC layers and at least one layer of SiC layer is obtained, Design parameter is：Ar throughputs 40sccm, C2H4Flow 3sccm, HfC sputtering power 150W, time 10s, SiC sputtering powers 80W, time 6s, 200 DEG C, deposition pressure 0.2Pa of substrate temperature, obtain HfC thickness degree about 5nm, SiC thickness about 0.6nm.
3) hardness 35.3GPa is obtained, the coefficient of friction with bearing steel is 0.32, total coating thickness：2.6μm.

Claims (3)

1. a kind of preparation method of the nano coating of high rigidity low-friction coefficient, it is characterised in that including following preparation process：
1）One the step of being cleaned to matrix, described matrix is metal, hard alloy or ceramics；It will be mirror-finished through polishing Matrix after processing cleans 5~10min in organic solvent, using 15~30kHz ultrasonic waves；Then Ion Cleaning is carried out, During carrying out Ion Cleaning, Sample Room is put into after matrix is installed, is evacuated down to 5*10-3Ar gas is opened after Pa, maintains vacuum Spend in 2-4Pa, Ions Bombardment, power 80-100W are carried out to matrix with 13.56Hz radio frequency；
2）The step of one alternating sputtering HfC layer and SiC layer；Described HfC layers and SiC layer alternating deposit use on matrix The mode of direct current or RF-reactively sputtered titanium, by before alternately resting on pure Hf targets and SiC target, obtaining by least one layer of HfC layers and The nano coating of at least one layer of SiC layer alternately superposition, the argon flow amount sputtered during pure Hf targets is 30-50sccm, acetylene Flow is 2-5sccm；The power for depositing HfC layers is 150W, time 10-20s；The power of deposition of SiC layer is 80W, and the time is 3-12s；Target-substrate distance is 3-7cm；Total gas pressure scope 0.2-0.6Pa；200-400 DEG C of substrate temperature range, the thickness of described HfC layers Degree is between 4-8nm, and the thickness of described SiC layer is between 0.3-1.2nm, and the gross thickness of described nano coating is at 2~4 μm Between.
A kind of 2. preparation method of the nano coating of high rigidity low-friction coefficient according to claim 1, it is characterised in that： In the step of being cleaned to matrix for one, by the matrix after polishing mirror finish processing successively in analytically pure alcohol and Ultrasonic wave cleaning is carried out in acetone.
A kind of 3. preparation method of the nano coating of high rigidity low-friction coefficient according to claim 1, it is characterised in that： Described HfC layers are by pure Hf targets in (Ar+C2H4) be made under atmosphere, described SiC is using directly sputtering SiC compound targets It is made.
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CN108265272B (en) * 2016-12-30 2019-11-08 中国科学院宁波材料技术与工程研究所 Nanometer multilayer silicon nitride ceramics coating, preparation method and application
CN108728792A (en) * 2017-06-14 2018-11-02 南京佑天金属科技有限公司 The preparation method of hafnium carbide film and the mold for including the hafnium carbide film
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