CN105278254B - A kind of method of work stage surface shape of elongated lens drift compensation - Google Patents
A kind of method of work stage surface shape of elongated lens drift compensation Download PDFInfo
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- CN105278254B CN105278254B CN201410332073.0A CN201410332073A CN105278254B CN 105278254 B CN105278254 B CN 105278254B CN 201410332073 A CN201410332073 A CN 201410332073A CN 105278254 B CN105278254 B CN 105278254B
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Abstract
The present invention discloses a kind of work stage side's mirror surface-shaped error drift compensation method for lithographic equipment, including:Step 1: the face shape error of calibration reference temperature and the strip mirror under pressure;Step 2: test different temperatures and during pressure the strip mirror face shape error, the coefficient changed according to this of different temperatures and pressure surface shape of elongated lens error fit surface shape of elongated lens error change amount with temperature and pressure;Step 3: the coefficient changed according to the temperature and pressure value of actual measurement and face shape error variable quantity with temperature and pressure calculates face shape error compensation rate in real time;Step 4: face shape drift compensation is realized according to the face shape error compensation rate.
Description
Technical field
The present invention relates to a kind of integrated circuit equipment manufacturing field, more particularly to a kind of drift of work stage surface shape of elongated lens to mend
The method repaid.
Background technology
In current lithographic equipment, have precision positioning performance workpiece table system be its be equipped with crucial subsystem it
One.The positioning performance of work stage determines that can the pattern on mask be quickly and accurately imaged on exposed substrate.
It is a kind of work stage of double-decker as shown in Figure 1.In the top of horizontal movement platform 1, installation bears silicon chip 3
Turntable 2.The laser that laser interferometer measurement module 6 is sent is radiated at level to strip side's mirror 5 on sports platform 1, is used for
Measure the horizontal level of horizontal movement platform 1.The horizontal movement platform 1 is in X to there is two laser interferometer measurement axles respectively with Y-direction
(not drawn in figure), it is horizontal to the position (x, y, Rz) of sports platform 1 from both direction measurement.
Axle is respectively measured in laser interferometer all to measure under correct premise, the measuring system of above-mentioned laser interferometer composition
During the horizontal position to sports platform 1 of measurement, also influenceed by the face shape error of strip side's mirror 5;If do not pass through special school
Just, will position the horizontal position (x, y, Rz) to sports platform to be forbidden.
US5790253 and CN201210181489.8 proposes a kind of measurement side's mirror surface-shaped and error is compensated respectively
Method, this both of which measured square mirror surface-shaped and compensation calibration as constant systematic error, but in reality
In, due to square mirror surrounding housing temperature fluctuation and High acceleration motion platform, the motor feels hot and square mirror ambient air pressure fluctuation etc.
Work stage recurring structure is caused to deform, the side's of being embodied directly in mirror surface-shaped drifts about, the aviation aluminium knot very big to thermal coefficient of expansion
Structure, mirror surface-shaped drifts about and can reached below the temperature (the motor feels hot containing sports platform) and pressure range of the cavity of litho machine
200nm, directly result in random overlay error and reach 200nm.Therefore, it is necessary to propose that a kind of energy real-Time Compensation environmental change causes
Square mirror surface-shaped drift a kind of method.
The content of the invention
In order to overcome defect present in prior art, the present invention provides a kind of elimination side mirror surface-shaped and become with temperature and pressure
The method changed and drifted about.
In order to realize foregoing invention purpose, the present invention discloses a kind of work stage side's mirror surface-shaped error drift for lithographic equipment
Compensation method is moved, including:Step 1: the face shape error of calibration reference temperature and the strip mirror under pressure;Step 2: test is not
The face shape error of strip mirror during synthermal and pressure, according to this of different temperatures and pressure surface shape of elongated lens error fit length
The coefficient that bar mirror surface-shaped error change amount changes with temperature and pressure;Step 3: according to the temperature and pressure value of actual measurement and face
The coefficient that shape error change amount changes with temperature and pressure calculates face shape error compensation rate in real time;Step 4: missed according to the face shape
Poor compensation rate realizes face shape drift compensation.
Further, the step 1 specifically includes:Sensed using the temperature and pressure of the work stage X-direction and Y-direction
Device measures the temperature and pressure of the work stage as reference temperature and pressure, using the surface shape of elongated lens error it is constant as one be
Error of uniting is to the reference temperature and pressure measxurement and compensation calibration.
Further, the face shape error of the strip mirror includes when the step 2 tests different temperatures and pressure:According to more
Individual preset time, utilize the work stage X-direction and the temperature and pressure of the temperature and pressure sensor test different time of Y-direction
Under the strip mirror face shape error.
Further, according to the surface shape of elongated lens error under the temperature and pressure of different time in the step 2
And formulaFit the coefficient (a in formulai,bi;ci,di), wherein p0、
T0Represent that initial pressure and temperature, p, T represent the pressure and temperature that different time measures respectively respectively, e is constant.
Compared with prior art, the advantage of the invention is that the temperature and pressure around work stage can be measured in real time;
Can be with alignment surface shape drift compensation parameter;It can be drifted about with closed loop compensation side's mirror surface-shaped.Compared with prior art, the present invention passes through
Temperature and pressure sensor inside work stage measures the temperature and pressure around work stage in real time, and passes through face shape drift compensation
Formula calculating side mirror surface-shaped drift value, real-Time Compensation is in work stage motion control.The present invention can the side's of elimination mirror surface-shaped with
Machine drift error.
Brief description of the drawings
It can be obtained further by following detailed description of the invention and institute's accompanying drawings on the advantages and spirit of the present invention
Solution.
Fig. 1 is the structural representation of the work stage of used double-decker in the prior art;
Fig. 2 is the flow chart of the method for work stage surface shape of elongated lens drift compensation of the present invention;
Fig. 3 is the square mirror surface-shaped error measuring point distribution map of work stage.
Embodiment
A kind of work stage surface shape of elongated lens drift compensation for specific embodiment that the invention will now be described in detail with reference to the accompanying drawings
Method.However, the present invention should be understood as being not limited to this embodiment described below, and the skill of the present invention
Art theory can combine implementation with other known technologies or function with those known technology identical other technologies.
In the following description, will be by many Directional words in order to clearly show that the structure and working method of the present invention
It is described, but should be by the word such as "front", "rear", "left", "right", " outer ", " interior ", " outside ", " inside ", " on ", " under "
Language is understood for convenience of term, and is not construed as word of limitation." X to " word in addition, used in the following description
Refer mainly to horizontal to parallel direction;" Y-direction " one word is referred mainly to horizontal to parallel, and with X to vertical direction;" Z-direction "
One word is referred mainly to horizontal to vertical, and the direction vertical with X, Y-direction.
In order to overcome defect present in prior art, the present invention provides a kind of elimination side mirror surface-shaped and become with temperature and pressure
The method changed and drifted about.
In order to realize foregoing invention purpose, the present invention discloses a kind of work stage side's mirror surface-shaped error drift for lithographic equipment
Move compensation method, it is characterised in that including:Step 1: calibration reference temperature and pressure (such as temperature and pressure during initial calibration
Power) Fang Jing face shape error;Step 2: the face shape error of test different temperatures and pressure when side mirror, according to different temperatures and
The coefficient that the square mirror surface-shaped error fit side mirror surface-shaped error change amount of pressure changes with temperature and pressure;Step 3: according to reality
The coefficient that the temperature and pressure value and face shape error variable quantity of survey change with temperature and pressure calculates face shape error compensation in real time
Amount;Step 4: the surface shape compensation amount calculated in real time is sent into motion controller realizes face shape drift compensation, generally in exposure field
Between compensate.
The structure of work stage involved in the present invention is as shown in fig. 1.In the top of horizontal movement platform 1, installation bears silicon chip
3 turntable 2, the laser that laser interferometer measurement module 6 is sent are radiated at level to strip side's mirror 5 on sports platform 1, are used for
Measure the horizontal level of horizontal movement platform 1.The horizontal movement platform 1 is in X to there is two laser interferometer measurement axles respectively with Y-direction
(not drawn in figure), it is horizontal to the position (x, y, Rz) of sports platform 1 from both direction measurement, work stage X-direction and Y-direction
Temperature and pressure sensor 4 measures the temperature and pressure of the environment residing for work stage in real time, and temperature and pressure sensor is arranged on
On the base in the middle part of Fang Jing;The real-Time Compensation side's mirror surface-shaped error of work stage motion controller 7.
Fig. 2 is the flow chart of the method for work stage surface shape of elongated lens drift compensation of the present invention.The face shape drift is mended
The specific steps for the method repaid include:
S101, calibrated for error with reference to square mirror surface-shaped;
S102, test each point alteration of form amount on different temperatures and pressure when side mirror;
The coefficient that each point alteration of form amount changes with temperature and pressure on S103, the Fitting Calculation Fang Jing;
S104, the square mirror surface-shaped for calculating work stage motion bit in real time according to the temperature and pressure for fitting coefficient and actual measurement change
Amount;
S105, work stage motion control real-Time Compensation side mirror surface-shaped variable quantity.
Fig. 3 is the square mirror surface-shaped error measuring point distribution map of work stage
It will be explained in detail below, the embodiment party of the method for work stage surface shape of elongated lens drift compensation involved in the present invention
Formula.When being calibrated for error with reference to square mirror surface-shaped, the temperature and pressure sensor of work stage X-direction and Y-direction measurement work stage is worked as
Preceding temperature and pressure (temperature and pressure during such as initial calibration) is used as reference temperature and pressure, at the same by square mirror surface-shaped as
Constant systematic error is measured and compensation calibration.
When testing each point alteration of form amount on different temperatures and pressure when side mirror, due to the chamber of the litho machine residing for work stage
The temperature and pressure of body exist it is slowly varying, such as work stage 4X directions in Fig. 1 and the temperature and pressure sensor distance one of Y-direction
Fix time, such as 4 hours or 2 days, measure the temperature and pressure of work stage, and X and Y side's mirror under temperature and pressure corresponding to testing
Face shape error, the measuring point of face shape error are distributed by taking X side's mirror as an example, as shown in Figure 3.To X side mirror measuring point i, according to different time
Face shape error subtract the reference side's mirror surface-shaped side's of obtaining mirror surface-shaped error change amount by mistake, according to square mirror surface-shaped error change amount with it is right
The temperature and pressure formula answeredFit face shape error change coefficient of discharge
(ai,bi;ci,di), wherein p0、T0Represent that initial pressure and temperature, p, T represent the pressure and temperature that different time measures respectively respectively
Degree, e is constant 2.71828.
Correspondingly fit the face shape error change coefficient of discharge of X side's mirror and all measuring points of Y side's mirror.
In stage control, it is current that the temperature and pressure sensor of work stage X-direction and Y-direction measures work stage in real time
Temperature and pressure, it is real-time according to the movement position of work stage, corresponding error change coefficient of discharge and current temperature and pressure
Calculate the square mirror surface-shaped variable quantity for needing to compensate.
The variable quantity of work stage motion controller module real-Time Compensation side mirror surface-shaped, due to litho machine cavity temperature and
Pressure exists slowly varying, can deform the choosing of drift error size according to slowly varying amplitude and square mirror in the application of reality
Select and compensated between criticizing between compensation, silicon chip between compensation or exposure field, generally compensated between exposure field.
The preferred embodiment of the simply present invention described in this specification, above example is only illustrating the present invention
Technical scheme rather than limitation of the present invention.All those skilled in the art pass through logic analysis, reasoning under this invention's idea
Or the limited available technical scheme of experiment, all should be within the scope of the present invention.
Claims (4)
- A kind of 1. method of work stage surface shape of elongated lens drift compensation, it is characterised in that including:Step 1: calibration reference temperature With the face shape error of the strip mirror under pressure;Step 2: the face shape of the strip mirror is missed when test different temperatures and pressure Difference, according to the surface shape of elongated lens error fit of different temperatures and pressure surface shape of elongated lens error change amount with temperature and The coefficient of pressure change;Step 3: become according to the temperature and pressure value of actual measurement and face shape error variable quantity with temperature and pressure The coefficient of change calculates face shape error compensation rate in real time;Step 4: face shape drift compensation is realized according to the face shape error compensation rate.
- 2. the method for shape drift compensation in face as claimed in claim 1, it is characterised in that the step 1 specifically includes:Utilize The temperature and pressure that the temperature and pressure sensor of the work stage X-direction and Y-direction measures the work stage is used as with reference to temperature Degree and pressure, the surface shape of elongated lens error systematic error constant as one is compensated the reference temperature and pressure measxurement Calibration.
- 3. the method for shape drift compensation in face as claimed in claim 1, it is characterised in that step 2 test different temperatures and The face shape error of the strip mirror includes during pressure:According to multiple preset times, the work stage X-direction and Y-direction are utilized The face shape error of the strip mirror under the temperature and pressure of temperature and pressure sensor test different time.
- 4. the method for shape drift compensation in face as claimed in claim 1, it is characterised in that according to different time in the step 2 Temperature and pressure under the surface shape of elongated lens error and formula Fit the coefficient (a in formulai,bi;ci,di), wherein p0、T0Initial pressure and temperature are represented respectively, and p, T represent different respectively The pressure and temperature that time measures, e are constant.
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CN113126442B (en) * | 2019-12-31 | 2022-06-28 | 上海微电子装备(集团)股份有限公司 | Error compensation method, device, equipment and medium of overlay equipment |
CN114063400B (en) * | 2020-07-31 | 2022-12-09 | 上海微电子装备(集团)股份有限公司 | Measuring method and device for measuring component of photoetching machine equipment and photoetching machine |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5790253A (en) * | 1996-04-05 | 1998-08-04 | Nikon Corporation | Method and apparatus for correcting linearity errors of a moving mirror and stage |
CN102445149A (en) * | 2010-10-14 | 2012-05-09 | 上海微电子装备有限公司 | Workpiece table position measuring device and measuring method |
CN102707581A (en) * | 2012-05-31 | 2012-10-03 | 合肥芯硕半导体有限公司 | Distortion compensation method of lithography objective |
CN103293865A (en) * | 2012-02-28 | 2013-09-11 | 上海微电子装备有限公司 | Workpiece platform position error measurement and pre-compensation method |
CN103454862A (en) * | 2012-06-05 | 2013-12-18 | 上海微电子装备有限公司 | Workpiece table position error compensation method for photoetching equipment |
CN103453847A (en) * | 2012-06-05 | 2013-12-18 | 上海微电子装备有限公司 | Method for positioning and correcting errors of motion platform |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3790902B2 (en) * | 1997-06-03 | 2006-06-28 | 株式会社ニコン | Stage structure |
WO2010004900A1 (en) * | 2008-07-09 | 2010-01-14 | 株式会社ニコン | Position measuring method, and exposure method and device |
-
2014
- 2014-07-11 CN CN201410332073.0A patent/CN105278254B/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5790253A (en) * | 1996-04-05 | 1998-08-04 | Nikon Corporation | Method and apparatus for correcting linearity errors of a moving mirror and stage |
CN102445149A (en) * | 2010-10-14 | 2012-05-09 | 上海微电子装备有限公司 | Workpiece table position measuring device and measuring method |
CN103293865A (en) * | 2012-02-28 | 2013-09-11 | 上海微电子装备有限公司 | Workpiece platform position error measurement and pre-compensation method |
CN102707581A (en) * | 2012-05-31 | 2012-10-03 | 合肥芯硕半导体有限公司 | Distortion compensation method of lithography objective |
CN103454862A (en) * | 2012-06-05 | 2013-12-18 | 上海微电子装备有限公司 | Workpiece table position error compensation method for photoetching equipment |
CN103453847A (en) * | 2012-06-05 | 2013-12-18 | 上海微电子装备有限公司 | Method for positioning and correcting errors of motion platform |
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