CN105278254A - Surface-shape drift compensation method for long strip mirror of worktable - Google Patents
Surface-shape drift compensation method for long strip mirror of worktable Download PDFInfo
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- CN105278254A CN105278254A CN201410332073.0A CN201410332073A CN105278254A CN 105278254 A CN105278254 A CN 105278254A CN 201410332073 A CN201410332073 A CN 201410332073A CN 105278254 A CN105278254 A CN 105278254A
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Abstract
The invention discloses a surface-shape drift compensation method for a long strip mirror of a worktable. The surface-shape drift compensation method comprises the steps of step 1, calibrating the surface-shape error of the long strip mirror under a reference temperature and pressure; step 2, testing the surface-shape errors of the long strip mirror under different reference temperatures and pressures, and fitting coefficients of the surface-shape error variable quantity of the long strip mirror along with the changes of the temperatures and pressures according to the surface-shape errors of the long strip mirror under different reference temperatures and pressures; step 3, calculating the surface-shape error compensation amount in real time according to actually measured temperature and pressure values, and the coefficients of the surface-shape error variable quantity of the long strip mirror along with the changes of the temperatures and pressures; and step 4, realizing the surface-shape drift compensation according to the surface-shape error compensation amount.
Description
Technical field
The present invention relates to a kind of integrated circuit equipment manufacturing field, particularly relate to a kind of drift-compensated method of work stage surface shape of elongated lens.
Background technology
In current lithographic equipment, the workpiece table system with precision positioning performance is one of its crucial subsystem be equipped with.Can the pattern that the positioning performance of work stage determines on mask be imaged on exposed substrate quickly and accurately.
Be a kind of double-deck work stage as shown in Figure 1.The universal stage 2 bearing silicon chip 3 is installed above tangential movement platform 1.The laser that laser interferometer measurement module 6 sends is radiated at level to the rectangular side's mirror 5 on sports platform 1, for measuring the horizontal level of tangential movement platform 1.This tangential movement platform 1 has two laser interferometer measurement axles (not drawing in the drawings) at X respectively to Y-direction, from both direction measure position from level to sports platform 1 (
x, y, Rz).
Respectively measuring axle in laser interferometer all measures under correct prerequisite, when the measuring system of above-mentioned laser interferometer composition measures level to the position of sports platform 1, is also subject to the impact of rectangular side's mirror 5 face shape error; If not through special correction, by make position from level to sports platform (
x, y, Rz) locate and forbidden.
US5790253 and CN201210181489.8 proposes a kind of side of measurement mirror surface-shaped and the method compensated error respectively, square mirror surface-shaped is all used as constant systematic error and is measured and compensation calibration by these two kinds of methods, but in practice, due to the temperature fluctuation of square mirror surrounding housing and High acceleration motion platform, the motor feels hot and square mirror ambient air pressure fluctuation etc. causes work stage recurring structure to be out of shape, directly the side's of being presented as mirror surface-shaped drifts about, the aviation constructed of aluminium very large to thermal expansivity, below the temperature (the motor feels hot containing sports platform) and pressure range of the cavity of litho machine, mirror surface-shaped drift can reach 200nm, random overlay error is directly caused to reach 200nm.Therefore, a kind of method proposing the square mirror surface-shaped drift that the environmental change of a kind of energy real-Time Compensation causes is necessary.
Summary of the invention
In order to overcome the defect existed in prior art, the invention provides the method that a kind of side of elimination mirror surface-shaped drifts about with temperature and pressure change.
In order to realize foregoing invention object, the present invention discloses the mirror surface-shaped error drift compensation method of a kind of work stage side for lithographic equipment, comprising: the face shape error of this rectangular mirror under step one, calibration reference temperature and pressure; The face shape error of this rectangular mirror when step 2, test different temperatures and pressure, according to the coefficient that this surface shape of elongated lens error change amount of this surface shape of elongated lens error fit of different temperatures and pressure changes with temperature and pressure; Step 3, calculate face shape error compensation rate in real time according to the temperature and pressure value of actual measurement and the coefficient that changes with temperature and pressure of face shape error variable quantity; Step 4, realize face shape drift compensation according to this face shape error compensation rate.
Further, this step one specifically comprises: utilize the temperature and pressure of this work stage of temperature and pressure sensor measurement of this work stage X-direction and Y-direction as with reference to temperature and pressure, using this surface shape of elongated lens error as a constant systematic error to this reference temperature and pressure survey and compensation calibration.
Further, when this step 2 test different temperatures and pressure, the face shape error of this rectangular mirror comprises: according to multiple Preset Time, utilize the face shape error of this rectangular mirror under the temperature and pressure of the temperature and pressure sensor test different time of this work stage X-direction and Y-direction.
Further, in described step 2 according to the described surface shape of elongated lens error under the temperature and pressure of different time and formula
, simulate the coefficient in formula
, wherein
,
represent original pressure and temperature respectively,
,
represent the pressure and temperature that different time records respectively, e is constant.
Compared with prior art, the invention has the advantages that can temperature and pressure in real time around measuring workpieces platform; Can alignment surface shape drift compensation parameter; Can the mirror surface-shaped drift of closed loop compensation side.Compared with prior art, the present invention is by the temperature and pressure around the real-time measuring workpieces platform of temperature and pressure sensor of work stage inside, and by shape drift compensation formulae discovery side, face mirror surface-shaped drift value, real-Time Compensation is in work stage motion control.The present invention can the Random Drift Error of the side's of elimination mirror surface-shaped.
Accompanying drawing explanation
Can be further understood by following detailed Description Of The Invention and institute's accompanying drawings about the advantages and spirit of the present invention.
Fig. 1 is the structural representation of the double-deck work stage used in prior art;
Fig. 2 is the process flow diagram of the drift-compensated method of work stage surface shape of elongated lens that the present invention relates to;
Fig. 3 is the square mirror surface-shaped error measuring point distribution plan of work stage.
Embodiment
The drift-compensated method of work stage surface shape of elongated lens of a kind of specific embodiment of the present invention is described in detail below in conjunction with accompanying drawing.But, the present invention should be understood as and be not limited to this embodiment described below, and technical concept of the present invention can combine with other known technologies or function other technologies identical with those known technologies and implements.
In the following description, in order to clear displaying structure of the present invention and working method, to be described by many Directional words, but should by "front", "rear", "left", "right", " outward ", " interior ", " outwards ", " inwardly ", " on ", the Word Understanding such as D score for convenience of term, and not should be understood to word of limitation.In addition, used " X to " word mainly refers to level to parallel direction in the following description; " Y-direction " one word mainly refer to level to parallel, and with X to vertical direction; " Z-direction " one word mainly refer to level to vertical, and the direction all vertical with X, Y-direction.
In order to overcome the defect existed in prior art, the invention provides the method that a kind of side of elimination mirror surface-shaped drifts about with temperature and pressure change.
In order to realize foregoing invention object, the present invention discloses the mirror surface-shaped error drift compensation method of a kind of work stage side for lithographic equipment, it is characterized in that, comprising: the face shape error of the Fang Jing of step one, calibration reference temperature and pressure (temperature and pressure such as during initial calibration); Step 2, test different temperatures and the face shape error of pressure time side mirror, according to the coefficient that the square mirror surface-shaped error fit side mirror surface-shaped error change amount of different temperatures and pressure changes with temperature and pressure; Step 3, calculate face shape error compensation rate in real time according to the temperature and pressure value of actual measurement and the coefficient that changes with temperature and pressure of face shape error variable quantity; Step 4, send to motion controller to realize face shape drift compensation the surface shape compensation amount calculated in real time, usually compensate between exposure field.
The structure of work stage involved in the present invention as shown in fig. 1.Above tangential movement platform 1, install the universal stage 2 bearing silicon chip 3, the laser that laser interferometer measurement module 6 sends is radiated at level to the rectangular side's mirror 5 on sports platform 1, for measuring the horizontal level of tangential movement platform 1.This tangential movement platform 1 has two laser interferometer measurement axles (not drawing in the drawings) at X respectively to Y-direction, position (the x of level to sports platform 1 is measured from both direction, y, Rz), the temperature and pressure of the environment of temperature and pressure sensor 4 in real time residing for measuring workpieces platform of work stage X-direction and Y-direction, temperature and pressure sensor is arranged on the base in the middle part of Fang Jing; Work stage motion controller 7 real-Time Compensation side mirror surface-shaped error.
Fig. 2 is the process flow diagram of the drift-compensated method of work stage surface shape of elongated lens that the present invention relates to.The concrete steps of the drift-compensated method of this face shape comprise:
S101, calibrates for error with reference to square mirror surface-shaped;
S102, tests each point alteration of form amount on different temperatures and pressure time side mirror;
S103, the coefficient that on the Fitting Calculation Fang Jing, each point alteration of form amount changes with temperature and pressure;
S104, calculates the square mirror surface-shaped variable quantity of work stage motion bit in real time according to the temperature and pressure of fit coefficient and actual measurement;
S105, work stage motion control real-Time Compensation side mirror surface-shaped variable quantity.
Fig. 3 is the square mirror surface-shaped error measuring point distribution plan of work stage
Below will illustrate, the embodiment of the drift-compensated method of work stage surface shape of elongated lens involved in the present invention.When calibrating for error with reference to square mirror surface-shaped, using temperature and pressure (temperature and pressure as during initial calibration) current for the temperature and pressure sensor measurement work stage of work stage X-direction and Y-direction as with reference to temperature and pressure, square mirror surface-shaped is used as constant systematic error simultaneously and is measured and compensation calibration.
When testing each point alteration of form amount on different temperatures and pressure time side mirror, there is slowly change in the temperature and pressure of the cavity of the litho machine residing for work stage, as the temperature and pressure sensor distance certain hour of work stage 4X direction and Y-direction in Fig. 1, as 4 hours or 2 days, the temperature and pressure of measuring workpieces platform, and the face shape error of X and Y side's mirror under temperature and pressure corresponding to test, the measuring point distribution of face shape error for X side's mirror, as shown in Figure 3.To X side mirror measuring point i, deduct with reference to the square mirror surface-shaped side's of obtaining mirror surface-shaped error change amount by mistake, according to square mirror surface-shaped error change amount and corresponding temperature and pressure formula according to the face shape error of different time
, simulate face shape error variable quantity coefficient
, wherein
,
represent original pressure and temperature respectively,
,
represent the pressure and temperature that different time records respectively, e is constant 2.71828.
Correspondingly simulate the face shape error variable quantity coefficient of X side's mirror and all measuring points of Y side's mirror.
In stage control, the temperature and pressure that the temperature and pressure sensor real-time measuring workpieces platform of work stage X-direction and Y-direction is current, calculates the square mirror surface-shaped variable quantity needing to compensate in real time according to the movement position of work stage, corresponding error change coefficient of discharge and current temperature and pressure.
The variable quantity of work stage motion controller module real-Time Compensation side mirror surface-shaped, there is slowly change in the temperature and pressure due to the cavity of litho machine, compensate or compensate between exposure field between compensation between can criticizing according to the amplitude of slow change and the selection of square mirror distortion drift error size in the application of reality, silicon chip, usually compensate between exposure field.
Just preferred embodiment of the present invention described in this instructions, above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (4)
1. the drift-compensated method of work stage surface shape of elongated lens, is characterized in that, comprising: the face shape error of the described rectangular mirror under step one, calibration reference temperature and pressure; The face shape error of described rectangular mirror when step 2, test different temperatures and pressure, the coefficient that surface shape of elongated lens error change amount changes with temperature and pressure according to the described surface shape of elongated lens error fit of different temperatures and pressure; Step 3, calculate face shape error compensation rate in real time according to the temperature and pressure value of actual measurement and the coefficient that changes with temperature and pressure of face shape error variable quantity; Step 4, realize face shape drift compensation according to described face shape error compensation rate.
2. the drift-compensated method of face shape as claimed in claim 1, it is characterized in that, described step one specifically comprises: the temperature and pressure of work stage described in the temperature and pressure sensor measurement utilizing described work stage X-direction and Y-direction as with reference to temperature and pressure, using described surface shape of elongated lens error as a constant systematic error to described reference temperature and pressure survey compensation calibration.
3. the drift-compensated method of face shape as claimed in claim 1, it is characterized in that, when described step 2 test different temperatures and pressure, the face shape error of described rectangular mirror comprises: according to multiple Preset Time, utilize the face shape error of the described rectangular mirror under the temperature and pressure of the temperature and pressure sensor test different time of described work stage X-direction and Y-direction.
4. the drift-compensated method of face shape as claimed in claim 1, is characterized in that, according to the described surface shape of elongated lens error under the temperature and pressure of different time and formula in described step 2
, simulate the coefficient in formula
, wherein
,
represent original pressure and temperature respectively,
,
represent the pressure and temperature that different time records respectively, e is constant.
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| CN201410332073.0A CN105278254B (en) | 2014-07-11 | 2014-07-11 | A kind of method of work stage surface shape of elongated lens drift compensation |
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| CN201410332073.0A CN105278254B (en) | 2014-07-11 | 2014-07-11 | A kind of method of work stage surface shape of elongated lens drift compensation |
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| CN105278254B CN105278254B (en) | 2018-01-19 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113126442A (en) * | 2019-12-31 | 2021-07-16 | 上海微电子装备（集团）股份有限公司 | Error compensation method, device, equipment and medium of overlay equipment |
| CN114063400A (en) * | 2020-07-31 | 2022-02-18 | 上海微电子装备（集团）股份有限公司 | Measuring method and device for measuring component of photoetching machine equipment and photoetching machine |
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| US5790253A (en) * | 1996-04-05 | 1998-08-04 | Nikon Corporation | Method and apparatus for correcting linearity errors of a moving mirror and stage |
| JPH10332327A (en) * | 1997-06-03 | 1998-12-18 | Nikon Corp | Stage structure |
| WO2010004900A1 (en) * | 2008-07-09 | 2010-01-14 | 株式会社ニコン | Position measuring method, and exposure method and device |
| CN102445149A (en) * | 2010-10-14 | 2012-05-09 | 上海微电子装备有限公司 | Workpiece table position measuring device and measuring method |
| CN102707581A (en) * | 2012-05-31 | 2012-10-03 | 合肥芯硕半导体有限公司 | Distortion compensation method of lithography objective |
| CN103293865A (en) * | 2012-02-28 | 2013-09-11 | 上海微电子装备有限公司 | Workpiece platform position error measurement and pre-compensation method |
| CN103454862A (en) * | 2012-06-05 | 2013-12-18 | 上海微电子装备有限公司 | Workpiece table position error compensation method for photoetching equipment |
| CN103453847A (en) * | 2012-06-05 | 2013-12-18 | 上海微电子装备有限公司 | Method for positioning and correcting errors of motion platform |
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2014
- 2014-07-11 CN CN201410332073.0A patent/CN105278254B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5790253A (en) * | 1996-04-05 | 1998-08-04 | Nikon Corporation | Method and apparatus for correcting linearity errors of a moving mirror and stage |
| JPH10332327A (en) * | 1997-06-03 | 1998-12-18 | Nikon Corp | Stage structure |
| WO2010004900A1 (en) * | 2008-07-09 | 2010-01-14 | 株式会社ニコン | Position measuring method, and exposure method and device |
| CN102445149A (en) * | 2010-10-14 | 2012-05-09 | 上海微电子装备有限公司 | Workpiece table position measuring device and measuring method |
| CN103293865A (en) * | 2012-02-28 | 2013-09-11 | 上海微电子装备有限公司 | Workpiece platform position error measurement and pre-compensation method |
| CN102707581A (en) * | 2012-05-31 | 2012-10-03 | 合肥芯硕半导体有限公司 | Distortion compensation method of lithography objective |
| CN103454862A (en) * | 2012-06-05 | 2013-12-18 | 上海微电子装备有限公司 | Workpiece table position error compensation method for photoetching equipment |
| CN103453847A (en) * | 2012-06-05 | 2013-12-18 | 上海微电子装备有限公司 | Method for positioning and correcting errors of motion platform |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113126442A (en) * | 2019-12-31 | 2021-07-16 | 上海微电子装备（集团）股份有限公司 | Error compensation method, device, equipment and medium of overlay equipment |
| CN113126442B (en) * | 2019-12-31 | 2022-06-28 | 上海微电子装备（集团）股份有限公司 | Error compensation method, device, equipment and medium of overlay equipment |
| CN114063400A (en) * | 2020-07-31 | 2022-02-18 | 上海微电子装备（集团）股份有限公司 | Measuring method and device for measuring component of photoetching machine equipment and photoetching machine |
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