CN103454862A - Workpiece table position error compensation method for photoetching equipment - Google Patents
Workpiece table position error compensation method for photoetching equipment Download PDFInfo
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Abstract
The invention discloses a workpiece table position error compensation method for photoetching equipment. The workpiece table position error compensation method is characterized by comprising the following steps: firstly, setting a rotation angle of a turn table to be zero, keeping a fixed position relationship with a horizontal motion table, performing exposure on a silicon slice, reading an exposure marking deviation, and accounting the rotation angle in each exposure field; secondly, according to the rotation angle in each exposure field, matching the rotation angle twisted and introduced by a motion rail; thirdly, moving the workpiece table along a first direction and a second direction vertical to the first direction in sequence, and measuring the rotation angle of the workpiece table; fourthly, according to the rotation angle of the workpiece table, matching so as to obtain the rotation angle introduced by a scaling effect; fifthly, according to the rotation angle of the workpiece table, the rotation angle twisted and introduced by the motion rail and the rotation angle caused by the scaling effect, accounting a rotation angle caused by a square mirror shape, so as to obtain a square mirror morphology after compensation.
Description
?
Technical field
The present invention relates to a kind of integrated circuit equipment manufacture field, relate in particular to a kind of positional error compensation of the work stage for lithographic equipment method.
Background technology
Photoetching technique or title photoetching art, be widely used in integrated circuit fabrication process.This technology is exposed by optical projection apparatus, and the mask graph of design is transferred on photoresist.The concept of " mask " and " photoresist " is known in photoetching process: mask also claims photomask, be to be carved with a kind of masterplate of pinpoint various functional graphic in the substrate of the materials such as film, plastics or glass, expose for the selectivity to photoresist layer; Photoresist is the colloidal liquid mixed by light-sensitive compound, matrix resin and organic solvent etc., and after being subject to the effect of specific wavelength light, its chemical constitution changes, and makes the dissolution characteristics in certain solution change.
In current lithographic equipment, the workpiece table system with precision positioning performance is one of crucial subsystem of its outfit.The positioning performance of work stage has determined that can the pattern on the mask be imaged on exposed substrate quickly and accurately.
Be a kind of double-deck work stage as shown in Figure 1.The motion guide rail 7 of its directions X is superimposed together on vertical with the motion guide rail 8 of Y-direction, and driving can be in level to the tangential movement platform 1 moved.The universal stage 4 that bears silicon chip 5 is installed above tangential movement platform 1 again.Laser interferometer 2a, the 2b of measuring workpieces platform 3 positions are radiated at level on sports platform, for measuring its horizontal level, as shown in Figure 1.This work stage 3 has respectively two laser interferometer measurement axle 2a and 2b in X-direction and Y-direction, the position from both direction measurement level to sports platform 1 (
x, y, Rz).Because exposed substrate is positioned on universal stage 4, but not the level that is placed directly in is on sports platform 1, so laser interferometer can't be measured the anglec of rotation of exposure silicon chip
rz.
1), square mirror surface-shaped error respectively measure axle in laser interferometer and all measure under correct prerequisite, when the measuring system that above-mentioned laser interferometer forms is measured level to the position of sports platform, also be subject to the impact of three aspects: error:; 2), equidirectional upper diaxon laser interferometer is not parallel, therefore causes the anglec of rotation recorded to have the convergent-divergent of horizontal direction; 3), level is while moving on to sports platform along guide rail, due to the rotation of the undesirable sports platform caused of the linearity of guide rail.If this three aspects: error is not passed through special correction, by position from level to sports platform that make (
x, y, Rz) locate and forbidden.
For the side's of elimination mirror surface-shaped is introduced error to position measurements, measurement that need to the side's of carrying out mirror surface-shaped.The method that US5790253 has proposed a kind of side of measurement mirror surface-shaped and error is compensated.During the method hypothesis laser interferometer measurement tangential movement platform anglec of rotation, measurement result does not have error, so the position measurement model must be through hardware or software calibration mistake.For the Workpiece platform structure shown in Fig. 1, the uncontrollable level of interferometer measuring system, to the anglec of rotation of sports platform, therefore can't utilize the redundancy of X-direction and two interferometer measurement sports platform anglecs of rotation of Y-direction directly to calibrate the rotation angle measurement result.During the side of measurement mirror surface-shaped, the rotation of the sports platform that side's mirror surface-shaped error, the not parallel anglec of rotation convergent-divergent effect caused of interferometer optical axis and guide rail directly do not cause itself, this three exerts an influence to measurement result, hindered effective measurement of square mirror surface-shaped, thereby can't carry out effective compensation by the other side's mirror surface-shaped, cause the sports platform positioning precision not high, the complete machine alignment precision descends.
In sum, need a kind of new method that the work stage site error is compensated in prior art.
Summary of the invention
In order to overcome the defect existed in prior art, the invention provides a kind of method that the work stage site error is compensated, can effectively eliminate track face shape error and convergent-divergent angular error.
In order to realize the foregoing invention purpose, the present invention discloses a kind of positional error compensation of the work stage for lithographic equipment method, it is characterized in that, comprise: step 1, the anglec of rotation that universal stage is set are zero, and keep fixing position relationship with level to sports platform, alignment exposure on silicon chip, read exposure mark deviation, calculates the anglec of rotation of each exposure field; Step 2, according to the anglec of rotation of described each exposure field, the anglec of rotation of introducing is reversed in matching by described tracks; Step 3, described work stage is successively moved with the second direction vertical with first direction along first direction, the anglec of rotation of measuring workpieces platform; Step 4, according to the anglec of rotation of described work stage, matching obtains the anglec of rotation of being introduced by the convergent-divergent effect; Step 5, according to the anglec of rotation of described work stage, described tracks, reverse the anglec of rotation that the anglec of rotation introduced and convergent-divergent effect cause, the anglec of rotation that the side's of calculating mirror surface-shaped causes, obtain the square mirror pattern after a compensation.
Further, in described step 2, according to the anglec of rotation of described exposure field, the specific formula for calculation that matching reverses because of described tracks the anglec of rotation of introducing is:
Wherein,
rzx rm ,
rzy rm for described tracks reverse introduce the anglec of rotation,
a r ,
b r ,
c r ,
d r for fitting coefficient.
The specific formula for calculation of the anglec of rotation that further, convergent-divergent effect described in described step 4 is introduced is:
Wherein,
rzx scale ,
rzy scale for the anglec of rotation of being introduced by the convergent-divergent effect,
a s ,
b s ,
c s ,
d s for fitting coefficient.
The specific formula for calculation of the anglec of rotation that wherein, described calculating side mirror surface-shaped causes is:
Wherein,
rzx meas ,
rzy meas for the anglec of rotation by described work stage,
rzx mm ,
rzy mm for the anglec of rotation of square mirror surface-shaped introducing,
rzx scale ,
rzy scale for the anglec of rotation of being introduced by the convergent-divergent effect.
Closer, also comprise step 6: repeated execution of steps one to five, until the measurement result convergence.
Compared with prior art, the invention provides a kind of method that the work stage site error is compensated, can effectively eliminate track face shape error and convergent-divergent angular error, make the error that is included in the three aspects: in measurement result effectively to separate.The present invention is by the mode of carrying out specific setting on the silicon chip overlay mark that exposed, and calculates the anglec of rotation of work stage from the tropometer in the alignment field, effectively obtains the torsion of track.Adopt normal side's mirror surface-shaped test, but, the processing stage of data, the anglec of rotation at first square mirror surface-shaped caused is carried out after separating with the convergent-divergent rotation error, then carries out the calculating of face shape.The present invention is by the data processing of calculating the track face shape error, calculating three steps such as convergent-divergent angular error, the side's of calculating mirror surface-shaped anglec of rotation error on model calculates, and the anglec of rotation of the side's of making mirror surface-shaped is effectively separated from other two kinds of rotation amounts that are entrained in.Finally mirror surface-shaped error in the side's of making is effectively measured and is compensated, and then improves the positioning precision of sports platform, improves the complete machine alignment precision.
The accompanying drawing explanation
Can be by following detailed Description Of The Invention and appended graphic being further understood about the advantages and spirit of the present invention.
Fig. 1 is the structural representation of double-deck work stage common in prior art;
Fig. 2 is the schematic diagram of each overlay mark deviation of measuring according to exposing patterns;
Fig. 3 is the principle schematic of work stage because of angle rotation generation convergent-divergent effect;
Fig. 4 is the process flow diagram of the work stage positional error compensation method gone out shown in the present.
Embodiment
Describe the positional error compensation of the work stage for the lithographic equipment method of a kind of specific embodiment of the present invention in detail below in conjunction with accompanying drawing.Yet, the present invention should be understood as and be not limited to this embodiment described below, and technical concept of the present invention can be implemented with other known technologies or the combination of function other technologies identical with those known technologies.
In the following description, for clear structure of the present invention and the working method of showing, to be described by all multidirectional words, but should by 'fornt', 'back', " left side ", " right side ", " outward ", " interior ", " outwards ", " inwardly ", " on ", the Word Understanding such as D score is for convenience of term, and not should be understood to word of limitation.In addition, " X-direction " word of using in the following description mainly refers to level to parallel direction; " Y-direction " word mainly refers to level to parallel, and the direction vertical with X-direction; " Z-direction " word mainly refers to level to vertical, and with the equal vertical direction of X, Y-direction.
Be illustrated in figure 1 a kind of double-deck work stage 3, comprise sports platform 1 and universal stage 4.The motion guide rail 7 of its directions X is superimposed together on vertical with the motion guide rail 8 of Y-direction, and driving can be in level to the tangential movement platform 1 moved.The universal stage 4 that bears silicon chip 5 is installed above tangential movement platform 1 again.Laser interferometer 2a, the 2b of measuring workpieces platform 3 positions are radiated at level on sports platform, for measuring its horizontal level, as shown in Figure 1.This work stage 3 has respectively two laser interferometer measurement axle 2a and 2b in X-direction and Y-direction, the position from both direction measurement level to sports platform 1 (
x, y, Rz).Because exposed substrate is positioned on universal stage 4, but not the level that is placed directly in is on sports platform 1, so laser interferometer can't be measured the anglec of rotation of exposure silicon chip
rz.
1), square mirror surface-shaped error respectively measure axle in laser interferometer and all measure under correct prerequisite, when the measuring system that above-mentioned laser interferometer forms is measured level to the position of sports platform 1, also be subject to the impact of three aspects: error:; 2), equidirectional upper diaxon laser interferometer is not parallel, therefore causes the anglec of rotation recorded to have the convergent-divergent of horizontal direction; 3), level is while moving on to sports platform along guide rail, due to the rotation of the undesirable sports platform caused of the linearity of guide rail.If this three aspects: error is not passed through special correction, by position from level to sports platform that make (
x, y, Rz) locate and forbidden.
For the side's of elimination mirror surface-shaped is introduced error to position measurements, measurement that need to the side's of carrying out mirror surface-shaped.In order to measure the square mirror surface-shaped with work stage of structure shown in Fig. 13, and it is carried out to error compensation.Need to be divided into following step: 1, on silicon chip 5, carry out the alignment exposure, according to exposing patterns, calculate work stage 3 rotations that tracks 7,8 causes; 2, allow work stage 3 respectively along X-direction and Y-direction motion measurement side mirror surface-shaped; 3, the side's of calculating mirror surface-shaped error it is compensated.
What the present embodiment was described is the enforcement scene of the present invention on a step photo-etching machine.
At first allow litho machine carry out the alignment exposure on silicon chip 5.While exposing each, the anglec of rotation that universal stage 4 is set is zero, allows universal stage 4 and level keep fixing position relationship to sports platform.Fig. 1 has provided each overlay mark deviation measured according to exposing patterns, the distribution of exposure field 6 on silicon chip as can be seen from this figure.As shown in the drawing, each exposure field 6 is comprised of 6*8=48 overlay mark, according to these 48 overlay marks, can calculate the anglec of rotation in appearing on the scene.In above exposure scene, work stage 3 does not additionally arrange the anglec of rotation, thus the anglec of rotation actual response of exposure field the anglec of rotation of work stage 3, this anglec of rotation is introduced by the torsion of track just.The position of each exposure field on silicon chip is corresponding with the position of work stage 3, therefore this anglec of rotation can be carried out to the rotation pattern RM that matching obtains track in the position based on field.Consider the linear characteristic of guide rail, generally carry out three rank and can react its impact on the anglec of rotation, carry out as shown in the formula matching
···················································?(
)
Obtain thus the surfaces of revolution shape of track.In above formula
x,
ythe position of sports platform,
rzx rm ,
rzy rm for the surfaces of revolution shape angular error of track (by
xthe anglec of rotation recorded to interferometer is
rzx, by
ythe anglec of rotation recorded to interferometer is
rzy), all the other are fitting coefficient.
The then side's of measurement mirror surface-shaped.Allow work stage successively along X-direction and Y-direction step motion, when work stage moves to each position, the interferometer of both direction is the anglec of rotation the preservation of measuring workpieces platform respectively.The above analyzed, and the quantity of information that the anglec of rotation more than measured has comprised three aspects, shown in (2)
In above formula
rzx meas ,
rzy meas the anglec of rotation for the sports platform that recorded by laser interferometer;
rzx mm ,
rzy mm anglec of rotation error for square mirror surface-shaped introducing;
rzx scale ,
rzy scale for the anglec of rotation error of being introduced by the convergent-divergent effect.
In the model calculation stages, the anglec of rotation that need to obtain according to measuring phases is processed, and by the wherein not parallel angle amount of zoom caused of light beam and the removal of orbital plane shape, only adopts the angle caused by square mirror out-of-flatness to change the side's of carrying out mirror surface-shaped calculating.The fluctuating of the square mirror surface-shaped ability actual response Fang Jing so obtained.At first the Rzx these measured and Rzy are according to the orbital plane shape of measuring the position of work stage constantly and correspondingly deduct this position that (1) formula provides, now just obtained only comprising the angle that the anglec of rotation that caused by square mirror surface-shaped and convergent-divergent effect cause, following step is proceeded based on this result of calculation.
Fig. 1 has meaned reason and the effect that anglec of rotation convergent-divergent produces.When work stage 3, along this direction, move, when two of the interferometer light paths of measuring axles are changed, the convergent-divergent effect just manifests, otherwise the convergent-divergent angle that convergent-divergent produces is a fixed value.
When work stage is moved along X-direction, Rzx is along with work stage is moved and produced the convergent-divergent variation along X-direction.In this process, the X-direction interferometer is radiated at the same place of X-direction Fang Jing all the time, and face shape amount is fixed value in this process.In addition, because Y-direction in this process is not moved,
rzyangle be scaled a fixed value.Therefore will in this measuring process, obtain
rzxlinear fit is carried out in X-direction position based on work stage, can obtain the angular error that convergent-divergent causes.
Rzy while in like manner moving for Y-direction, also can carry out similar matching
In formula (3) (4)
a s ,
b s ,
c s ,
d s for fitting coefficient.
So, can calculate by formula (5) anglec of rotation purely caused by square mirror surface-shaped
By
rzx mm ,
rzy mm carry out the mirror surface-shaped calculating of the described method of the similar US5790253 side of carrying out, just can the side's of obtaining mirror pattern.
Below with reference to Fig. 4, describe the concrete implementation step of work stage positional error compensation method disclosed in this invention in detail.
S101 carries out the alignment exposure on silicon chip.
S102, read exposure mark deviation.
S103, the rotation of calculating each exposure field.Because work stage in the exposure scene does not additionally arrange the anglec of rotation, thus the anglec of rotation actual response of exposure field the anglec of rotation of work stage, this anglec of rotation is introduced by the torsion of track just.
S104, matching obtains the rotation pattern of track, and the fitting formula used is referring to formula mentioned above 1.
S105, the square mirror surface-shaped of measuring workpieces platform, allow work stage successively along X-direction and Y-direction step motion, and when work stage moves to each position, the interferometer of both direction is the anglec of rotation the preservation of measuring workpieces platform respectively.
S106 deducts the rotation pattern of track from take measurement of an angle.The Rzx that these are measured and Rzy be according to the orbital plane shape of measuring the position of work stage constantly and correspondingly deduct this position that formula 1 provides, and now just obtained only comprising the angle that the anglec of rotation that caused by square mirror surface-shaped and convergent-divergent effect cause.
S107 deducts the convergent-divergent of the anglec of rotation from take measurement of an angle.When work stage is moved along X-direction, Rzx is along with work stage is moved and produced the convergent-divergent variation along X-direction.In this process, the X-direction interferometer is radiated at the same place of X-direction Fang Jing all the time, and face shape amount is fixed value in this process.In addition, because Y-direction in this process is not moved,
rzyangle be scaled a fixed value.Therefore will in this measuring process, obtain
rzxlinear fit is carried out in X-direction position based on work stage, can obtain the angular error that convergent-divergent causes.
S108, the side's of calculating mirror surface-shaped.
Compared with prior art, the invention provides a kind of method that the work stage site error is compensated, can effectively eliminate track face shape error and convergent-divergent angular error, make the error that is included in the three aspects: in measurement result effectively to separate.The present invention is by the mode of carrying out specific setting on the silicon chip overlay mark that exposed, and calculates the anglec of rotation of work stage from the tropometer in the alignment field, effectively obtains the torsion of track.Adopt normal side's mirror surface-shaped test, but, the processing stage of data, the anglec of rotation at first square mirror surface-shaped caused is carried out after separating with the convergent-divergent rotation error, then carries out the calculating of face shape.The present invention is by the data processing of calculating the track face shape error, calculating three steps such as convergent-divergent angular error, the side's of calculating mirror surface-shaped anglec of rotation error on model calculates, and the anglec of rotation of the side's of making mirror surface-shaped is effectively separated from other two kinds of rotation amounts that are entrained in.Finally mirror surface-shaped error in the side's of making is effectively measured and is compensated, and then improves the positioning precision of sports platform, improves the complete machine alignment precision.
Described in this instructions is preferred embodiment of the present invention, and above embodiment is only in order to illustrate technical scheme of the present invention but not limitation of the present invention.All those skilled in the art, all should be within the scope of the present invention under this invention's idea by the available technical scheme of logical analysis, reasoning, or a limited experiment.
Claims (5)
1. the positional error compensation of the work stage for a lithographic equipment method, is characterized in that, comprising:
Step 1, the anglec of rotation that universal stage is set are zero, and keep fixing position relationship with level to sports platform, and level is moved along tracks to sports platform, and exposure mark deviation is read in alignment exposure on silicon chip, calculates the anglec of rotation of each exposure field;
Step 2, according to the anglec of rotation of described each exposure field, the anglec of rotation of introducing is reversed in matching by described tracks;
Step 3, described work stage is successively moved with the second direction vertical with first direction along first direction, the anglec of rotation of measuring workpieces platform;
Step 4, according to the anglec of rotation of described work stage, matching obtains the anglec of rotation of being introduced by the convergent-divergent effect;
The anglec of rotation that step 5, the anglec of rotation of introducing according to the anglec of rotation of described work stage, the torsion of described tracks and convergent-divergent effect cause, the anglec of rotation that the side's of calculating mirror surface-shaped causes, thus the work stage site error is compensated.
2. work stage positional error compensation method as claimed in claim 1, is characterized in that, in described step 2, according to the anglec of rotation of described exposure field, the specific formula for calculation that matching reverses because of described tracks the anglec of rotation of introducing is:
,
Wherein,
rzx rm ,
rzy rm for described tracks reverse introduce the anglec of rotation,
a r ,
b r ,
c r ,
d r for fitting coefficient.
3. work stage positional error compensation method as claimed in claim 1, is characterized in that, the specific formula for calculation of the anglec of rotation that convergent-divergent effect described in described step 4 is introduced is:
Wherein,
rzx scale ,
rzy scale for the anglec of rotation of being introduced by the convergent-divergent effect,
a s ,
b s ,
c s ,
d s for fitting coefficient.
4. work stage positional error compensation method as claimed in claim 1, is characterized in that, the specific formula for calculation of the anglec of rotation that described calculating side mirror surface-shaped causes is:
Wherein,
rzx meas ,
rzy meas for the anglec of rotation by described work stage,
rzx rm ,
rzy rm for described tracks reverse introduce the anglec of rotation,
rzx mm ,
rzy mm for the anglec of rotation of square mirror surface-shaped introducing,
rzx scale ,
rzy scale for the anglec of rotation of being introduced by the convergent-divergent effect.
5. work stage positional error compensation method as claimed in claim 1, is characterized in that, also comprises step 6: repeated execution of steps one to five, until the measurement result convergence.
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105278254A (en) * | 2014-07-11 | 2016-01-27 | 上海微电子装备有限公司 | Surface-shape drift compensation method for long strip mirror of worktable |
| CN109471458A (en) * | 2018-12-15 | 2019-03-15 | 东北林业大学 | A kind of drift angle compensation method of self-level(l)ing structural failure |
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| US5790253A (en) * | 1996-04-05 | 1998-08-04 | Nikon Corporation | Method and apparatus for correcting linearity errors of a moving mirror and stage |
| JPH10261570A (en) * | 1997-03-19 | 1998-09-29 | Nikon Corp | Stage device and aligner with the device |
| CN101071275A (en) * | 2007-06-08 | 2007-11-14 | 上海微电子装备有限公司 | Double platform system for rotary exchange |
| CN101344729A (en) * | 2008-07-31 | 2009-01-14 | 上海微电子装备有限公司 | Method for measuring rotation degree of mask bench relative to workpiece bench |
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| EP0727716A1 (en) * | 1995-02-20 | 1996-08-21 | Nikon Corporation | Method for measuring degree of curvature of moving mirror |
| US5790253A (en) * | 1996-04-05 | 1998-08-04 | Nikon Corporation | Method and apparatus for correcting linearity errors of a moving mirror and stage |
| JPH10261570A (en) * | 1997-03-19 | 1998-09-29 | Nikon Corp | Stage device and aligner with the device |
| CN101071275A (en) * | 2007-06-08 | 2007-11-14 | 上海微电子装备有限公司 | Double platform system for rotary exchange |
| CN101344729A (en) * | 2008-07-31 | 2009-01-14 | 上海微电子装备有限公司 | Method for measuring rotation degree of mask bench relative to workpiece bench |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105278254A (en) * | 2014-07-11 | 2016-01-27 | 上海微电子装备有限公司 | Surface-shape drift compensation method for long strip mirror of worktable |
| CN105278254B (en) * | 2014-07-11 | 2018-01-19 | 上海微电子装备（集团）股份有限公司 | A kind of method of work stage surface shape of elongated lens drift compensation |
| CN109471458A (en) * | 2018-12-15 | 2019-03-15 | 东北林业大学 | A kind of drift angle compensation method of self-level(l)ing structural failure |
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Address after: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Shanghai Zhangjiang High Tech Park of Pudong New Area Zhang Road No. 1525 Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |
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