CN105215865A - A kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll and preparation method thereof - Google Patents
A kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll and preparation method thereof Download PDFInfo
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Abstract
The invention discloses a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll and preparation method thereof, drip irrigation device of the present invention is: the both sides of concretion abrasive polishing roll are respectively equipped with polishing roll left end support mechanism and polishing roll right-hand member supporting mechanism, concretion abrasive polishing roll is provided with concretion abrasive polishing roll base layer, the outside of concretion abrasive polishing roll base layer is provided with elastic layer, and the outside of elastic layer is provided with rigid layer.Polishing roll surface of the present invention not easily produces plastic deformation, and surface pore not easily blocks, and its ability holding polishing fluid and eliminating scrap can not reduce in time, material removing rate uniformity; Separately, do not need trimming polished pad, improve polishing efficiency.
Description
Technical field
The present invention the present invention relates to Ultraprecision Machining, particularly a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll and preparation method thereof in microelectronics, photoelectron, the manufacture of flexible display substrate.
Background technology
Microelectronics, photoelectron, IC manufacturing are one of important symbols of measurement statehood and overall national strength, that the world today is most hotly competitive, development field the most rapidly, the advanced microelectronics of grasp and optoelectronic fabrication techniques is only had effectively to control cost and to expand the scale of production, could survival and development in the market competition of fierceness.Microelectronics and photoelectron advanced person manufacture as the basic industry of national economy, guiding industry, pillar industry and strategic industry, are playing more and more important effect to Chinese national economy, national security, people's lives and social progress.
The flexible display technologies life that improves people just gradually with exchange, and significantly advance information visualization.In recent years, the advantage of Flexible Displays becomes increasingly conspicuous, flexible electronic and the LCD as FPD, OLED compares with plasma display, have ultra-thin, quality is light, durable, storage capacity is large, design freely, deflection, can rolling and the performance such as shock-resistant, be widely used in mobile phone, personal digital assistant PDA, notebook computer, trade mark, secure identity file, e-book, electronic poster, fascia, RF recognition system, sensor, environment shows, medical treatment, general lighting, the industry such as robot sense skin, civilian and military industry, flexible display can also allow display screen more easily become ornament materials, the bendability characteristics of Flexible Displays is utilized to make engineering design be not limited to complanation, the display mode of diversification external form can be realized.
Due to the market prospects that Flexible Displays is huge, research institution and the production firm of many countries and regions put in the research and apply of flexible display technologies, and achieve significant achievement.Current, flexible electronic is also in the eve by industrialization, still also there is a lot of technical bottlenecks, for the stage that material, technique, design etc. are also in research and explore.Flexible display technologies integrates large scale integrated circuit, precision processing technology, photoelectron technology new high-tech industry, relates to the high-tech area that semiconductor, optics, microelectronics, chemical material, precision optical machinery and processing etc. are numerous.
Flexible Displays substrate is the basis of flexibility of research and development display.Flat-panel monitor is all that substrate makes with glass substrate, flexible display is then be substrate with flexible material, it is the same with glass substrate to the surface quality requirements of flexible substrate, surface smoothness and thickness requirement are very strict, realize surface quality and the machining accuracy of flexible substrate, method the most frequently used is at present chemical Mechanical Polishing Technique.
Chemical Mechanical Polishing Technique is considered to the best process taking into account surface roughness and surface smoothness requirement, become hard brittle crystal material, metal material and other material and realized one of most practical technique of surperficial ultra-smooth not damaged processing, and be widely used in the fields such as the photoelectrons such as super large-scale integration, semiconductor lighting, optical glass, FPD, microelectronics, Aero-Space and mechanical engineering.By analysis with research, that chemical Mechanical Polishing Technique may be best suited for and can be used for, in the efficient Ultra-precision Turning of Roll-to-Roll of large-size ultra-thin Flexible Displays substrate surface, obtaining the undamaged finished surface of ultra-smooth completely.
Exploitation flexible display another key factor be its technique may by Sheet-fedbatchprocessing(individual batch production) convert to Roll-to-Rollmanufacturing(volume to volume produce), efficiency improves greatly, means that the cost of display may reduce greatly.Therefore, the task of top priority is that the Roll-to-Roll high benefit installation of research large-size ultra-thin Flexible Displays substrate, equipment and technology and Ultra-precision Turning are theoretical.
Polishing roll is the critical piece in the Roll-to-Roll chemical-mechanical polishing mathing of large-size ultra-thin Flexible Displays substrate, because free abrasive chemical Mechanical Polishing Technique exists a lot of insurmountable problem, in recent years, concretion abrasive chemical Mechanical Polishing Technique, due to its huge superiority, is expected to replace free abrasive chemically mechanical polishing; And the manufacture of concretion abrasive chemically mechanical polishing roller is a difficult problem, and the elastic layer of polishing roll, for rigid layer provides certain resiliency supported effect, operationally, can cushioning effect be played, ensure the quality of surface of the work and the uniformity etc. of material removal, but at present, also there is no the bibliographical information of the manufacture view about concretion abrasive Roll-to-Roll chemically mechanical polishing roller, more not about the report of concretion abrasive Roll-to-Roll chemically mechanical polishing roller elastic layer manufacture view.
At present, the particular problem of Roll-to-Roll chemical Mechanical Polishing Technique existence is as follows:
(1) when Roll-to-Roll polishing machine adopts traditional free abrasive chemical Mechanical Polishing Technique to carry out polishing to ultrathin flexible backing material, cause the inhomogeneities that free abrasive distributes between polishing roll and workpiece, make the material removing rate of workpiece each several part inconsistent, affect surface smoothness.(2) owing to containing abrasive material in polishing fluid, polishing rear portion abrasive particle can be embedded in surface of the work, not easy cleaning.(3) due to polishing fluid complicated component, after polishing, the removing of surface of the work remaining slurry is a difficult problem of cleaning after CMP.(4) free abrasive polishing roll easily produces plastic deformation in surface when polishing, and its surface becomes smooth or blockage of the micro orifice gradually, its ability holding polishing fluid and eliminating scrap is reduced, causes material removing rate to decline in time.To need constantly to repair with moistening polishing pad to recover its surface roughness and porous, cause efficiency low.(5) during the chemically mechanical polishing of Roll-to-Roll polishing machine concretion abrasive, if only have rigid layer there is no elastic layer, then processing work surface tear serious, damage high, surface quality is low.
At present, the particular problem of Roll-to-Roll free abrasive chemical Mechanical Polishing Technique existence is as follows:
(1) when Roll-to-Roll polishing machine adopts traditional free abrasive chemical Mechanical Polishing Technique to carry out polishing to ultrathin flexible backing material, cause the inhomogeneities that free abrasive distributes between polishing roll and workpiece, make the material removing rate of workpiece each several part inconsistent, affect surface smoothness.(2) owing to containing abrasive material in polishing fluid, polishing rear portion abrasive particle can be embedded in surface of the work, not easy cleaning.(3) due to polishing fluid complicated component, after polishing, the removing of surface of the work remaining slurry is a difficult problem of cleaning after CMP.(4) free abrasive polishing roll easily produces plastic deformation in surface when polishing, and its surface becomes smooth or blockage of the micro orifice gradually, its ability holding polishing fluid and eliminating scrap is reduced, causes material removing rate to decline in time.To need constantly to repair with moistening polishing pad to recover its surface roughness and porous, cause efficiency low.
Summary of the invention
The object of this invention is to provide a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll and preparation method thereof.
Technical scheme of the present invention is:
A kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, it is characterized in that: the both sides of free abrasive polishing roll are respectively equipped with polishing roll left end support mechanism and polishing roll right-hand member supporting mechanism, the outside of free abrasive polishing roll is provided with free abrasive polishing roll base layer, the outside of free abrasive polishing roll base layer is provided with elastic layer, and the outside of elastic layer is provided with rigid layer.
The component of its rigid layer and the ratio of percentage by weight as follows: abrasive material 0.5% ~ 10%, light-cured resin 5% ~ 45%, reactive diluent 5% ~ 41%, light trigger 4% ~ 7%, promoter 0.05% ~ 5%, surface property conditioning agent 0.05% ~ 3%, adjuvant 0.05% ~ 5%, filler 1% ~ 4%, pigment 0.02%.
Described abrasive material is one in white fused alumina micro mist, silicon carbide micro-powder, ceria micro mist or diadust or two kinds of mixtures, and the particle diameter of these micro mists is 50nm ~ 56 μm; Described light-cured resin is modified epoxy acrylate, degree of functionality is greater than 3 urethane acrylate, degree of functionality are greater than one or both the mixture in the polyester acrylate of 3; Described reactive diluent is one or both the mixture in pentaerythritol triacrylate, tetramethylol methane tetraacrylate, two contracting trimethylolpropane tetra-acrylate, Dipentaerythritol Pentaacrylate, dipentaerythritol acrylate; Described light trigger is one or both the mixture in 2-hydroxy-2-methyl-1-phenylacetone, 2,4,6-trimethylbenzoy-dipheny phosphine oxides; Described promoter is one or both the mixture in polydimethyl siloxane fluid, modified polyorganosiloxane; Described surface property conditioning agent is one or both the mixture in aluminum stearate, tung oil, Tissuemat E, polypropylene wax; Described adjuvant is 2,6-toluene di-tert-butyl phenol; Described filler is one or both the mixture in white carbon, kaolin, talcum powder, diatomite.
Component and the percentage by weight of its elastic layer are as follows: light-cured resin 20% ~ 60%, adhesive agent 2% ~ 10%, reactive diluent 20% ~ 50%, light trigger 5% ~ 15%, promoter 0.5% ~ 7%, adjuvant 0.5% ~ 4%, filler 0.5% ~ 5%.
Described light-cured resin is one or both the mixture that urethane acrylate, degree of functionality that degree of functionality is less than 4 are less than in the polyester acrylate of 4; Described adhesive agent is one or both the mixture in linear macromolecule polyacrylate, UV metal bottom inorganic agent; Described reactive diluent is one or both the mixture in polyethyleneglycol diacrylate, diethylene glycol diacrylate, 1,6-hexanediyl ester, two diacrylates of Poly-propylene glycols, tripropylene glycol diacrylate; One or both mixture in described light trigger 1-hydroxycyclohexyl phenyl ketone, 2,4,6-trimethylbenzoyl phenyl phosphinic acid ethyl esters; Described promoter is one or both the mixture in tributyl phosphate, polyethers; Described adjuvant is MEHQ; Described filler is walnut shell powder, and diameter is 75 μm ~ 125 μm.
A preparation method for Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, is characterized in that it comprises the following steps:
(1) some glasswares and agitator is prepared,
(2) choose respectively by the raw materials described in the claims 2,3, stand-by;
(3) elastic layer photocuring mould is arranged on the polishing roll matrix not having to solidify;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 60r/min, mould upper surface is 60r/min, set timer 5 minutes apart from light source 30mm, rotary table motor speed;
(5) first the light-cured resin described in ready claim 3 is poured in agitator, then the reactive diluent described in claim 3, light trigger, promoter, adhesive agent, filler, adjuvant is poured into, fully be uniformly mixed, become mixture;
(6) mixture that step (5) is made is poured in the mounted elastic layer photocuring mould of step (3) institute, and be fully full of the space between mould inner surface and matrix;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll that photocuring is good;
(10) rigid layer photocuring mould is arranged on the polishing roll of the good elastic layer of photocuring;
(11) first the light-cured resin described in load weighted claim 2 is poured in agitator, then the abrasive material described in claim 2 is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(12) mixture that step (11) is made is poured in the mounted rigid layer photocuring mould of step (10) institute, and be fully full of the space between mould inner surface and elastic layer;
(13) mould of step (12) and polishing roll are installed on concretion abrasive photo solidification machine together;
(14) start is according to the cure parameter of following photo solidification machine: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed, carries out photocuring;
(15) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll that photocuring is good, can use.
Beneficial effect of the present invention:
Roll-to-Roll chemical-mechanical polishing mathing polishing roll of the present invention, can realize:
(1) this concretion abrasive polishing roll, concretion abrasive polishing roll outermost layer is the rigid layer (2) containing abrasive material, and centre is that nexine is polishing roll matrix (4) not containing the elastic layer (3) of abrasive material; Rigid layer ensure that the surface smoothness of processing object, and elastic layer is for ensureing the surface quality on processing object surface.
(2) surface of this concretion abrasive polishing roll rigid layer (2), different shapes can be become by mold cured, as cylinder boss array configuration, square net array configuration etc., different boss sizes, size of mesh opening can be realized by mould, realize high-efficient high performance processing.
(3) when carrying out the Roll-to-Roll chemically mechanical polishing of ultrathin flexible backing material with concretion abrasive polishing roll, not containing abrasive material in polishing fluid, polishing fluid composition becomes simple, after polishing, surface of the work cleaning is simple, in addition, owing to not having abrasive material in polishing fluid, make the material removing rate of workpiece each several part consistent, surface smoothness is high.
(4) when carrying out the Roll-to-Roll chemically mechanical polishing of ultrathin flexible backing material with concretion abrasive polishing roll, pad interface not easily produces plastic deformation, surface pore not easily blocks, and its ability holding polishing fluid and eliminating scrap can not reduce in time, material removing rate uniformity.In addition, do not need trimming polished pad, improve polishing efficiency;
The present invention also can be used for the even photocuring of the flat polishing pad of concretion abrasive.
Accompanying drawing explanation
Fig. 1 is the structure chart of concretion abrasive polishing roll of the present invention.
Fig. 2 is the elastic layer photocuring mould structure schematic diagram of concretion abrasive polishing roll of the present invention.
Specific embodiment
embodiment 1,
Foundation structure of the present invention is:
Polishing roll left end support mechanism 1 and polishing roll right-hand member supporting mechanism 5 is respectively equipped with in the both sides of concretion abrasive polishing roll, the outside of concretion abrasive polishing roll 6 is provided with concretion abrasive polishing roll base layer 4, the outside of concretion abrasive polishing roll base layer is provided with elastic layer 3, and the outside of elastic layer is provided with rigid layer 2.
A preparation method for Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, comprises the following steps:
(1) some glasswares and agitator is prepared,
(2) choose respectively according to rigid layer formula: abrasive material, light-cured resin, reactive diluent, light trigger, promoter, surface property conditioning agent, adjuvant, filler, pigment;
Choose respectively according to elastic layer formula: light-cured resin, adhesive agent, reactive diluent, light trigger, promoter, adjuvant, filler, these raw materials are chosen respectively, stand-by;
(3) elastic layer photocuring mould is arranged on the polishing roll matrix not having to solidify;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 60r/min, mould upper surface is 60r/min, set timer 5 minutes apart from light source 30mm, rotary table motor speed;
(5) first the light-cured resin described in ready claim 3 is poured in agitator, then the reactive diluent described in claim 3, light trigger, promoter, adhesive agent, filler, adjuvant is poured into, fully be uniformly mixed, become mixture;
(6) mixture that step (5) is made is poured in the mounted elastic layer photocuring mould 7 of step (3) institute, and be fully full of the space between mould inner surface and matrix;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll that photocuring is good;
(10) rigid layer photocuring mould is arranged on the polishing roll of the good elastic layer of photocuring;
(11) first the light-cured resin described in load weighted claim 2 is poured in agitator, then the abrasive material described in claim 2 is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(12) mixture that step (11) is made is poured in the mounted rigid layer photocuring mould of step (10) institute, and be fully full of the space between mould inner surface and elastic layer;
(13) mould of step (12) and polishing roll are installed on concretion abrasive photo solidification machine together;
(14) start is according to the cure parameter of following photo solidification machine: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed, carries out photocuring;
(15) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll that photocuring is good, can use.
Described elastic layer photocuring mould is identical with the structure of rigid layer photocuring mould, just according to use needs, and difference to some extent dimensionally.
Embodiment 1 specifically select materials into:
Rigid layer: the mixture intending preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) the white fused alumina abrasive material of 70g particle diameter 14 μm is weighed respectively; the urethane acrylate (aromatic series) that the urethane acrylate (aliphatic) that 150g degree of functionality is 4,150g degree of functionality are 4,120g degree of functionality are the polyester acrylate of 4; 360g pentaerythritol triacrylate; 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2; 4; 6-trimethylbenzoy-dipheny phosphine oxide; 5g polydimethyl siloxane fluid, 20g modified polyorganosiloxane; 25g Tissuemat E; 30g2; 6-toluene di-tert-butyl phenol, 18g talcum powder, 2g pigment yellow (PY129).
Elastic layer: the mixture intending preparation 1000g:
(1) some glasswares and agitator is prepared,
(2) polyester acrylate 200g, polyethyleneglycol diacrylate 200g, diethylene glycol diacrylate 300g, 1-hydroxycyclohexyl phenyl ketone 100g, 2 that degree of functionality is 3 is weighed respectively; walnut shell powder 50g, UV metal bottom inorganic agent 20g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 50g, tributyl phosphate 50g, polyethers 20g, MEHQ 10g, diameter 125 μm.
embodiment 2,
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: the white fused alumina abrasive material weighing 70g particle diameter 14 μm respectively; the urethane acrylate (aromatic series) that the urethane acrylate (aliphatic) that 150g degree of functionality is 4,150g degree of functionality are 4,120g degree of functionality are the polyester acrylate of 4; 360g pentaerythritol triacrylate; 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2; 4; 6-trimethylbenzoy-dipheny phosphine oxide; 5g polydimethyl siloxane fluid, 20g modified polyorganosiloxane; 25g Tissuemat E; 30g2; 6-toluene di-tert-butyl phenol, 18g talcum powder, 2g pigment yellow (PY129).
Elastic layer: weigh respectively degree of functionality be 3 urethane acrylate (aliphatic) 300g, degree of functionality be 3 urethane acrylate (aromatic series) 200g, 1,6-hexanediyl ester 200g, 1-hydroxycyclohexyl phenyl ketone 50g, tributyl phosphate 5g, MEHQ 40g, the walnut shell powder 5g of diameter 75 μm, linear macromolecule polyacrylate 50g, UV metal bottom inorganic agent 50g.
embodiment 3,
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: the white fused alumina abrasive material weighing 60g particle diameter 7 μm respectively, 150g degree of functionality is the urethane acrylate (aliphatic) of 4, 150g degree of functionality is the urethane acrylate (aromatic series) of 4, 120g modified epoxy acrylate, 200g pentaerythritol triacrylate, 170g tetramethylol methane tetraacrylate, 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2, 4, 6-trimethylbenzoy-dipheny phosphine oxide, 10g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 15g aluminum stearate, 5g tung oil, 20g2, 6-toluene di-tert-butyl phenol, 18g talcum powder, 10g kaolin, 2g phthalocyanine blue (PB15).
Elastic layer: weigh respectively degree of functionality be 3 polyester acrylate 100g, degree of functionality be 3 urethane acrylate (aliphatic) 300g, diethylene glycol diacrylate 400g, 1-hydroxycyclohexyl phenyl ketone 40g, 2; the walnut shell powder 50g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 40g, polyethers 20g, MEHQ 20g, diameter 75 μm, linear macromolecule polyacrylate 30g.
embodiment 4,
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: the CeO2 abrasive material weighing 50g particle diameter 3.5 μm respectively, urethane acrylate (aromatic series), 220g modified epoxy acrylate that the urethane acrylate (aliphatic) that 100g degree of functionality is 4,100g degree of functionality are 4,200g dipentaerythritol acrylate, 170g tetramethylol methane tetraacrylate, 60g2-hydroxy-2-methyl-1-phenylacetone, 20g polydimethyl siloxane fluid, 10g modified polyorganosiloxane, 5g white carbon, 5g tung oil, 20g2,6-toluene di-tert-butyl phenol, 28g talcum powder, 2g chrome oxide green.
Elastic layer: weigh respectively degree of functionality be 3 polyester acrylate 150g, degree of functionality be 3 urethane acrylate (aromatic series) 200g, diethylene glycol diacrylate 200g, two diacrylates of Poly-propylene glycol 250g, 2; walnut shell powder 20g, UV metal bottom inorganic agent 40g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 80g, tributyl phosphate 30g, MEHQ 30g, diameter 100 μm.
embodiment 5,
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: the silicon carbide abrasive weighing 40g particle diameter 0.5 μm respectively, 240g degree of functionality is polyester acrylate, the 200g modified epoxy acrylate of 4,200g dipentaerythritol acrylate, 180g bis-contracting trimethylolpropane tetra-acrylate, 60g2-hydroxy-2-methyl-1-phenylacetone, 10g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 5g aluminum stearate, 5g tung oil, 15g2,6-toluene di-tert-butyl phenol, 15g talcum powder, 8g diatomite, 2g is solid orange G(PO13 forever).
Elastic layer: weigh respectively degree of functionality be 3 polyester acrylate 250g, degree of functionality be 3 urethane acrylate (aromatic series) 200g, polyethyleneglycol diacrylate 200g, two diacrylates of Poly-propylene glycol 150g, 2; walnut shell powder 60g, UV metal bottom inorganic agent 40g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 40g, 1-hydroxycyclohexyl phenyl ketone 10g, tributyl phosphate 30g, MEHQ 20g, diameter 75 μm.
embodiment 6,
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: the diamond abrasive weighing 5g particle diameter 0.05 μm respectively; 410g modified epoxy acrylate, 210g dipentaerythritol acrylate, 200g Dipentaerythritol Pentaacrylate, 50g2-hydroxy-2-methyl-1-phenylacetone, 20g2; 4; 6-trimethylbenzoy-dipheny phosphine oxide, 20g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 5g polypropylene wax; 25g2; 6-toluene di-tert-butyl phenol, 15g talcum powder, 18g white carbon, 2g permanent violet RL(PV23).
Elastic layer: weigh respectively degree of functionality be 3 urethane acrylate (aliphatic) 150g, degree of functionality be 3 urethane acrylate (aromatic series) 150g, tripropylene glycol diacrylate 200g, two diacrylates of Poly-propylene glycol 250g, 2; the walnut shell powder 50g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 25g, 1-hydroxycyclohexyl phenyl ketone 25g, tributyl phosphate 30g, polyethers 20g, MEHQ 30g, diameter 125 μm, linear macromolecule polyacrylate 30g, UV metal bottom inorganic agent 40g.
embodiment 7,
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: weigh the white fused alumina abrasive material of 50g particle diameter 36 μm, the Ceria abrasive of 50g particle diameter 36 μm respectively, the urethane acrylate (aromatic series) that the urethane acrylate (aliphatic) that 200g degree of functionality is 6,200g degree of functionality are 6,200g pentaerythritol triacrylate, 150g bis-contracting trimethylolpropane tetra-acrylate, 40g2-hydroxy-2-methyl-1-phenylacetone, 20g modified polyorganosiloxane, 15g aluminum stearate, 15g polypropylene wax, 40g2,6-toluene di-tert-butyl phenol, 8g white carbon, 10g diatomite, 2g iron oxide red.
Elastic layer: weigh polyester acrylate 200g, polyethyleneglycol diacrylate 200g, 1 that degree of functionality is 3 respectively; 6-hexanediyl ester 300g, 1-hydroxycyclohexyl phenyl ketone 100g, 2; walnut shell powder 50g, UV metal bottom inorganic agent 20g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 50g, tributyl phosphate 50g, polyethers 20g, MEHQ 10g, diameter 125 μm.
embodiment 8,
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: weigh the white fused alumina abrasive material of 35g particle diameter 14 μm, the silicon carbide abrasive of 35g particle diameter 14 μm respectively; 420g degree of functionality is the polyester acrylate of 4; 200g pentaerythritol triacrylate, 160g Dipentaerythritol Pentaacrylate; 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2; 4; 6-trimethylbenzoy-dipheny phosphine oxide; 5g polydimethyl siloxane fluid, 20g modified polyorganosiloxane; 15g tung oil, 10g Tissuemat E; 30g2; 6-toluene di-tert-butyl phenol, 10g white carbon, 8g kaolin, 2g pigment yellow (PY129).
Elastic layer: weigh respectively degree of functionality be 3 urethane acrylate (aliphatic) 300g, degree of functionality be 3 urethane acrylate (aromatic series) 200g, polyethyleneglycol diacrylate 200g, 1-hydroxycyclohexyl phenyl ketone 50g, tributyl phosphate 5g, MEHQ 40g, the walnut shell powder 5g of diameter 75 μm, linear macromolecule polyacrylate 50g, UV metal bottom inorganic agent 50g.
embodiment 9,
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: the white fused alumina abrasive material weighing 50g particle diameter 7 μm respectively, the diamond abrasive that 10g particle diameter is 7 μm, 150g degree of functionality is the urethane acrylate (aliphatic) of 4, 150g degree of functionality is the urethane acrylate (aromatic series) of 4, 120g modified epoxy acrylate, 200g pentaerythritol triacrylate, 170g Dipentaerythritol Pentaacrylate, 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2, 4, 6-trimethylbenzoy-dipheny phosphine oxide, 10g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 15g polypropylene wax, 5g tung oil, 20g2, 6-toluene di-tert-butyl phenol, 18g talcum powder, 10g kaolin, 2g phthalocyanine blue (PB15).
Elastic layer: weigh respectively degree of functionality be 3 polyester acrylate 100g, degree of functionality be 3 urethane acrylate (aliphatic) 300g, polyethyleneglycol diacrylate 200g, tripropylene glycol diacrylate 200g, 1-hydroxycyclohexyl phenyl ketone 40g, 2; the walnut shell powder 50g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 40g, polyethers 20g, MEHQ 20g, diameter 75 μm, linear macromolecule polyacrylate 30g.
embodiment 10,
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: weigh the silicon carbide abrasive of 40g particle diameter 3.5 μm, the diamond abrasive of 10g particle diameter 3.5 μm respectively, 420g modified epoxy acrylate, 200g bis-contracting trimethylolpropane tetra-acrylate, 170g tetramethylol methane tetraacrylate, 60g2-hydroxy-2-methyl-1-phenylacetone, 20g polydimethyl siloxane fluid, 10g modified polyorganosiloxane, 5g white carbon, 5g tung oil, 20g2,6-toluene di-tert-butyl phenol, 28g talcum powder, 2g chrome oxide green.
Elastic layer: weigh respectively degree of functionality be 3 polyester acrylate 150g, degree of functionality be 3 urethane acrylate (aromatic series) 200g, diethylene glycol diacrylate 200g, 1; 6-hexanediyl ester 250g, 2; walnut shell powder 20g, UV metal bottom inorganic agent 40g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 80g, tributyl phosphate 30g, MEHQ 30g, diameter 100 μm.
embodiment 11,
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: weigh the Ceria abrasive of 30g particle diameter 0.5 μm, the diamond abrasive of 10g particle diameter 0.5 μm respectively, 440g degree of functionality is the urethane acrylate of 4,200g dipentaerythritol acrylate, 180g tetramethylol methane tetraacrylate, 60g2-hydroxy-2-methyl-1-phenylacetone, 10g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 5g Tissuemat E, 5g polypropylene wax, 15g2,6-toluene di-tert-butyl phenol, 15g talcum powder, 8g diatomite, 2g is solid orange G(PO13 forever).
Elastic layer: weigh respectively degree of functionality be 3 polyester acrylate 250g, degree of functionality be 3 urethane acrylate (aromatic series) 200g, two diacrylates of Poly-propylene glycol 350g, 2; walnut shell powder 60g, UV metal bottom inorganic agent 40g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 40g, 1-hydroxycyclohexyl phenyl ketone 10g, tributyl phosphate 30g, MEHQ 20g, diameter 75 μm.
embodiment 12,
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: weigh the Ceria abrasive of 35g particle diameter 14 μm, the silicon carbide abrasive of 35g particle diameter 14 μm respectively; 420g degree of functionality is the polyester acrylate of 4; 360g dipentaerythritol acrylate; 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2; 4; 6-trimethylbenzoy-dipheny phosphine oxide; 5g polydimethyl siloxane fluid, 20g modified polyorganosiloxane; 15g tung oil, 10g Tissuemat E; 30g2; 6-toluene di-tert-butyl phenol, 10g white carbon, 8g kaolin, 2g pigment yellow (PY129).
Elastic layer: weigh respectively degree of functionality be 3 urethane acrylate (aliphatic) 150g, degree of functionality be 3 urethane acrylate (aromatic series) 150g, tripropylene glycol diacrylate 200g, diethylene glycol diacrylate 250g, 2; the walnut shell powder 50g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 25g, 1-hydroxycyclohexyl phenyl ketone 25g, tributyl phosphate 30g, polyethers 20g, MEHQ 30g, diameter 125 μm, linear macromolecule polyacrylate 30g, UV metal bottom inorganic agent 40g.
embodiment 13,
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: the white fused alumina abrasive material weighing 50g particle diameter 7 μm respectively, the diamond abrasive that 10g particle diameter is 7 μm, 150g degree of functionality is the urethane acrylate (aliphatic) of 4, 150g degree of functionality is the urethane acrylate (aromatic series) of 4, 120g modified epoxy acrylate, 370g tetramethylol methane tetraacrylate, 40g2-hydroxy-2-methyl-1-phenylacetone, 10g2, 4, 6-trimethylbenzoy-dipheny phosphine oxide, 10g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 15g polypropylene wax, 5g tung oil, 20g2, 6-toluene di-tert-butyl phenol, 18g talcum powder, 10g kaolin, 2g phthalocyanine blue (PB15).
Elastic layer: weigh respectively degree of functionality be 3 polyester acrylate 100g, degree of functionality be 3 urethane acrylate (aliphatic) 300g, tripropylene glycol diacrylate 400g, 1-hydroxycyclohexyl phenyl ketone 40g, 2; the walnut shell powder 50g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 40g, polyethers 20g, MEHQ 20g, diameter 75 μm, linear macromolecule polyacrylate 30g.
embodiment 14
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: weigh the silicon carbide abrasive of 40g particle diameter 3.5 μm, the diamond abrasive of 10g particle diameter 3.5 μm respectively, 420g modified epoxy acrylate, 370g bis-contracting trimethylolpropane tetra-acrylate, 60g2-hydroxy-2-methyl-1-phenylacetone, 20g polydimethyl siloxane fluid, 10g modified polyorganosiloxane, 5g white carbon, 5g tung oil, 20g2,6-toluene di-tert-butyl phenol, 28g talcum powder, 2g chrome oxide green.
Elastic layer: weigh respectively degree of functionality be 3 polyester acrylate 150g, degree of functionality be 3 urethane acrylate (aromatic series) 200g, two diacrylates of Poly-propylene glycol 200g, 1; 6-hexanediyl ester 250g, 2; walnut shell powder 20g, UV metal bottom inorganic agent 40g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 80g, tributyl phosphate 30g, MEHQ 30g, diameter 100 μm.
embodiment 15
Preparation method with embodiment 1, concrete rigid layer and elastic layer select materials for:
Rigid layer: the diamond abrasive weighing 5g particle diameter 0.05 μm respectively; 410g modified epoxy acrylate, 410g Dipentaerythritol Pentaacrylate, 70g2; 4; 6-trimethylbenzoy-dipheny phosphine oxide, 20g polydimethyl siloxane fluid, 20g modified polyorganosiloxane, 5g polypropylene wax; 25g2; 6-toluene di-tert-butyl phenol, 15g talcum powder, 18g white carbon, 2g permanent violet RL(PV23).
Elastic layer: weigh respectively degree of functionality be 3 polyester acrylate 250g, degree of functionality be 3 urethane acrylate (aromatic series) 200g, 1; 6-hexanediyl ester 150g, tripropylene glycol diacrylate 200g, 2; walnut shell powder 60g, UV metal bottom inorganic agent 40g of 4,6-trimethylbenzoyl phenyl phosphinic acid ethyl ester 40g, 1-hydroxycyclohexyl phenyl ketone 10g, tributyl phosphate 30g, MEHQ 20g, diameter 75 μm.
Should be understood that, for those of ordinary skills, can be improved according to the above description or convert, and all these improve and convert the protection domain that all should belong to claims of the present invention.
Claims (6)
1. a Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll, it is characterized in that: the both sides of concretion abrasive polishing roll are respectively equipped with polishing roll left end support mechanism and polishing roll right-hand member supporting mechanism, concretion abrasive polishing roll is provided with concretion abrasive polishing roll base layer, the outside of concretion abrasive polishing roll base layer is provided with elastic layer, and the outside of elastic layer is provided with rigid layer.
2. a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll as claimed in claim 1, it is characterized in that: the component of its rigid layer and the ratio of percentage by weight as follows: abrasive material 0.5% ~ 10%, light-cured resin 5% ~ 45%, reactive diluent 5% ~ 41%, light trigger 4% ~ 7%, promoter 0.05% ~ 5%, surface property conditioning agent 0.05% ~ 3%, adjuvant 0.05% ~ 5%, filler 1% ~ 4%, pigment 0.02%.
3. a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll as claimed in claim 1, it is characterized in that: component and the percentage by weight of its elastic layer are as follows: light-cured resin 20% ~ 60%, adhesive agent 2% ~ 10%, reactive diluent 20% ~ 50%, light trigger 5% ~ 15%, promoter 0.5% ~ 7%, adjuvant 0.5% ~ 4%, filler 0.5% ~ 5%.
4. the rigid layer of a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll as claimed in claim 2, it is characterized in that: described abrasive material is one in white fused alumina micro mist, silicon carbide micro-powder, ceria micro mist or diadust or two kinds of mixtures, and the particle diameter of these micro mists is 50nm ~ 56 μm; Described light-cured resin is modified epoxy acrylate, degree of functionality is greater than 3 urethane acrylate, degree of functionality are greater than one or both the mixture in the polyester acrylate of 3; Described reactive diluent is one or both the mixture in pentaerythritol triacrylate, tetramethylol methane tetraacrylate, two contracting trimethylolpropane tetra-acrylate, Dipentaerythritol Pentaacrylate, dipentaerythritol acrylate; Described light trigger is one or both the mixture in 2-hydroxy-2-methyl-1-phenylacetone, 2,4,6-trimethylbenzoy-dipheny phosphine oxides; Described promoter is one or both the mixture in polydimethyl siloxane fluid, modified polyorganosiloxane; Described surface property conditioning agent is one or both the mixture in aluminum stearate, tung oil, Tissuemat E, polypropylene wax; Described adjuvant is 2,6-toluene di-tert-butyl phenol; Described filler is one or both the mixture in white carbon, kaolin, talcum powder, diatomite.
5. the elastic layer of a kind of Roll-to-Roll chemical-mechanical polishing mathing concretion abrasive polishing roll as claimed in claim 3, is characterized in that: described light-cured resin is one or both the mixture that urethane acrylate, degree of functionality that degree of functionality is less than 4 are less than in the polyester acrylate of 4; Described adhesive agent is one or both the mixture in linear macromolecule polyacrylate, UV metal bottom inorganic agent; Described reactive diluent is one or both the mixture in polyethyleneglycol diacrylate, diethylene glycol diacrylate, 1,6-hexanediyl ester, two diacrylates of Poly-propylene glycols, tripropylene glycol diacrylate; One or both mixture in described light trigger 1-hydroxycyclohexyl phenyl ketone, 2,4,6-trimethylbenzoyl phenyl phosphinic acid ethyl esters; Described promoter is one or both the mixture in tributyl phosphate, polyethers; Described adjuvant is MEHQ; Described filler is walnut shell powder, and diameter is 75 μm ~ 125 μm.
6. a Roll-to-Roll chemical-mechanical polishing mathing preparation method for concretion abrasive polishing roll, is characterized in that it comprises the following steps:
(1) some glasswares and agitator is prepared,
(2) choose respectively by the raw materials described in the claims 2,3, stand-by;
(3) elastic layer photocuring mould is arranged on the polishing roll matrix not having to solidify;
(4) cure parameter of photo solidification machine is adjusted: adjustment polishing roll axis drive motor rotating speed is 60r/min, mould upper surface is 60r/min, set timer 5 minutes apart from light source 30mm, rotary table motor speed;
(5) first the light-cured resin described in ready claim 3 is poured in agitator, then the reactive diluent described in claim 3, light trigger, promoter, adhesive agent, filler, adjuvant is poured into, fully be uniformly mixed, become mixture;
(6) mixture that step (5) is made is poured in the mounted elastic layer photocuring mould of step (3) institute, and be fully full of the space between mould inner surface and matrix;
(7) mould of step (6) and polishing roll are installed on concretion abrasive photo solidification machine together;
(8) photocuring is carried out in start;
(9) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll that photocuring is good;
(10) rigid layer photocuring mould is arranged on the polishing roll of the good elastic layer of photocuring;
(11) first the light-cured resin described in load weighted claim 2 is poured in agitator, then the abrasive material described in claim 2 is poured into, stir, pour reactive diluent, light trigger, promoter, surface property conditioning agent, filler, adjuvant, pigment again into, fully be uniformly mixed, become the mixture containing abrasive particle;
(12) mixture that step (11) is made is poured in the mounted rigid layer photocuring mould of step (10) institute, and be fully full of the space between mould inner surface and elastic layer;
(13) mould of step (12) and polishing roll are installed on concretion abrasive photo solidification machine together;
(14) start is according to the cure parameter of following photo solidification machine: adjustment polishing roll axis drive motor rotating speed is 50r/min, mould upper surface is 50r/min, set timer 5 minutes apart from light source 20mm, rotary table motor speed, carries out photocuring;
(15) after photo solidification machine is out of service, wait for 5 minutes, take out the polishing roll that photocuring is good, can use.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106926446A (en) * | 2017-04-05 | 2017-07-07 | 广东奔朗新材料股份有限公司 | A kind of resin roll emery wheel based on 3D printing shaping |
| CN108673355A (en) * | 2018-05-22 | 2018-10-19 | 安徽全兆光学科技有限公司 | A kind of resin ground disk |
| CN109689293A (en) * | 2016-10-31 | 2019-04-26 | 霓达哈斯股份有限公司 | Mixing roll |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101428404A (en) * | 2008-12-22 | 2009-05-13 | 南京航空航天大学 | Fixed abrasive grinding polishing pad and method of manufacturing the same |
| CN202155814U (en) * | 2011-06-29 | 2012-03-07 | 常州市大明纸管机械有限公司 | Carborundum elastic sand polishing roll |
| JP2013039990A (en) * | 2011-08-12 | 2013-02-28 | Sumitomo Rubber Ind Ltd | Paper feeding roller |
| CN203317810U (en) * | 2013-05-08 | 2013-12-04 | 虞伯林 | Wear-resisting and pressure-resisting rubber roller |
| CN103862363A (en) * | 2014-03-24 | 2014-06-18 | 无锡宝顺不锈钢有限公司 | Polyurethane cold rolling grinding contact rubber converted roller |
-
2015
- 2015-09-01 CN CN201510554475.XA patent/CN105215865B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101428404A (en) * | 2008-12-22 | 2009-05-13 | 南京航空航天大学 | Fixed abrasive grinding polishing pad and method of manufacturing the same |
| CN202155814U (en) * | 2011-06-29 | 2012-03-07 | 常州市大明纸管机械有限公司 | Carborundum elastic sand polishing roll |
| JP2013039990A (en) * | 2011-08-12 | 2013-02-28 | Sumitomo Rubber Ind Ltd | Paper feeding roller |
| CN203317810U (en) * | 2013-05-08 | 2013-12-04 | 虞伯林 | Wear-resisting and pressure-resisting rubber roller |
| CN103862363A (en) * | 2014-03-24 | 2014-06-18 | 无锡宝顺不锈钢有限公司 | Polyurethane cold rolling grinding contact rubber converted roller |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109689293A (en) * | 2016-10-31 | 2019-04-26 | 霓达哈斯股份有限公司 | Mixing roll |
| CN106926446A (en) * | 2017-04-05 | 2017-07-07 | 广东奔朗新材料股份有限公司 | A kind of resin roll emery wheel based on 3D printing shaping |
| CN108673355A (en) * | 2018-05-22 | 2018-10-19 | 安徽全兆光学科技有限公司 | A kind of resin ground disk |
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