CN104924189A - Polishing machine for chemically-mechanically polishing ultrathin flexible display substrate - Google Patents
Polishing machine for chemically-mechanically polishing ultrathin flexible display substrate Download PDFInfo
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- CN104924189A CN104924189A CN201510322326.0A CN201510322326A CN104924189A CN 104924189 A CN104924189 A CN 104924189A CN 201510322326 A CN201510322326 A CN 201510322326A CN 104924189 A CN104924189 A CN 104924189A
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- polishing
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- flexible display
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a polishing machine for chemically-mechanically polishing an ultrathin flexible display substrate. The technical scheme mainly includes that a horizontal roller is arranged behind an unwinding roller, a rear driving wheel device is arranged behind the horizontal roller, a polishing roller mechanism is arranged behind the rear driving wheel device, a cleaning liquid collecting device is arranged below the polishing roller mechanism, polishing liquid spraying devices are arranged in the front of a polishing roller and between rollers of the polishing roller mechanism, a front driving wheel device is arranged behind the polishing roller mechanism, s guide wheel is arranged behind the front driving wheel device, a cleaning mechanism is arranged behind the guide wheel, an air spraying device is arranged behind the cleaning mechanism, the cleaning liquid collecting device is arranged below the air spraying device, and a winding roller is arranged behind the air spraying device. The polishing machine has the advantages of simple structure and low cost.
Description
Technical field:
The present invention relates to the Ultraprecision Machining, particularly a kind of polishing machine showing substrate for polishing ultrathin flexible relating to ultrathin flexible metal and nonmetallic materials in microelectronics, photoelectron, the manufacture of flexible display substrate.
Background technology:
Microelectronics, photoelectron, IC manufacturing are the basic and strategic industries integrating national interests, the wisdom of humanity and up-to-date science and technology, it is one of important symbol of measurement statehood and overall national strength, that the world today is most hotly competitive, development field the most rapidly, the advanced microelectronics of grasp and optoelectronic fabrication techniques is only had effectively to control cost and to expand the scale of production, could survival and development in the market competition of fierceness.Microelectronics and photoelectron advanced person manufacture as the basic industry of national economy, guiding industry, pillar industry and strategic industry, are playing more and more important effect to Chinese national economy, national security, people's lives and social progress.
Along with progress and the development of science and technology, the flexible display technologies life that improves people just gradually with exchange, and significantly advance information visualization.In recent years, the advantage of Flexible Displays becomes increasingly conspicuous, flexible electronic and the LCD as FPD, OLED compares with plasma display, have ultra-thin, quality is light, durable, storage capacity is large, design freely, deflection, can rolling and the performance such as shock-resistant, be widely used in mobile phone, personal digital assistant PDA, notebook computer, trade mark, secure identity file, e-book, electronic poster, fascia, RF recognition system, sensor, environment shows, medical treatment, general lighting, the industry such as robot sense skin, civilian and military industry, flexible display can also allow display screen more easily become ornament materials, the bendability characteristics of Flexible Displays is utilized to make engineering design be not limited to complanation, the display mode of diversification external form can be realized.
The market prospects that Flexible Displays is huge, make the research institution of many countries and regions and production firm put in the research and apply of flexible display technologies, and achieve significant achievement.Current, flexible electronic is also in the eve by industrialization, still also there is a lot of technical bottlenecks, for the stage that material, technique, design etc. are also in research and explore.Flexible display technologies integrates large scale integrated circuit, precision processing technology, photoelectron technology new high-tech industry, relates to the high-tech area that semiconductor, optics, microelectronics, chemical material, precision optical machinery and processing etc. are numerous.
In flexible display device, flexible substrate is the basis of flexibility of research and development display.Flat-panel monitor is all that substrate makes with glass substrate, flexible display is then be substrate with flexible material, it is the same with glass substrate to the surface quality requirements of flexible substrate, surface smoothness and thickness requirement are very strict, realize surface quality and the machining accuracy of flexible substrate, method the most frequently used is at present surface polishing technique.
Chemical Mechanical Polishing Technique is considered to the best process taking into account surface roughness and surface smoothness requirement, become hard brittle crystal material, metal material and other material and realized one of most practical technique of surperficial ultra-smooth not damaged processing, and be widely used in the fields such as the photoelectrons such as super large-scale integration, semiconductor lighting, optical glass, FPD, microelectronics, Aero-Space and mechanical engineering.By analysis with research, that chemical Mechanical Polishing Technique may be best suited for and can be used for, in the efficient Ultra-precision Turning of Roll-to-Roll of large-size ultra-thin Flexible Displays substrate surface, obtaining the undamaged finished surface of ultra-smooth completely.
The Flexible Displays substrate with super-smooth surface has inestimable application prospect.But at present, also do not have Roll-to-Roll high-efficiency soft to show the Ultraprecision Machining of substrate both at home and abroad, be not also applicable to specific purpose tool, the equipment and technology of Roll-to-Roll High-efficient Production Flexible Displays substrate.Therefore, the task of top priority is Roll-to-Roll high benefit installation, the equipment of research large-size ultra-thin Flexible Displays substrate.
Summary of the invention:
The object of the invention is the surface quality for ultrathin flexible display substrate in microelectronics, photoelectron, integrated circuit and flexible display technologies and processing request, provide a kind of polishing machine for chemically mechanical polishing ultrathin flexible display substrate.
Technical scheme of the present invention is, a kind of polishing machine for chemically mechanical polishing ultrathin flexible display substrate, it comprises let off roll, wind-up roll, horizontal roller, rough polishing roller mechanism, finishing polish roller mechanism, wiper mechanism, polishing fluid spray equipment, cleaning fluid gathering-device, it is characterized in that: the rear of let off roll is provided with horizontal roller, the rear of horizontal roller is provided with rear drive sprocket device, the rear of rear drive sprocket device is provided with polishing roll mechanism, the below of polishing roll mechanism is provided with cleaning fluid gathering-device, before polishing roll, polishing fluid spray equipment is provided with between the roller of polishing roll mechanism and roller, the rear of polishing roll mechanism is provided with front driving wheel device, the rear of front driving wheel device is provided with guide wheel, the rear of guide wheel is provided with wiper mechanism, the rear of wiper mechanism is provided with wind shower device, the below of wind shower device is provided with cleaning fluid gathering-device, the rear of wind shower device is provided with wind-up roll.Described cleaning fluid gathering-device is pallet.Described polishing roll mechanism can carry out one side setting or two-sided setting.Sandwich construction can be set to, finishing polish roller mechanism layer is on the upper strata of rough polishing roller mechanism layer, have wiper mechanism and wind shower device after rough polishing roller mechanism, also have wiper mechanism and wind shower device after finishing polish roller mechanism, wiper mechanism and wind shower device layer are on the upper strata of polishing roll mechanism layer.
The present invention can overcome well when existing traditional mechanical polishing technology carries out polishing to ultrathin flexible backing material there is easy fold, the uniformity is difficult to control, the size of ultrathin flexible backing material by the restriction of rotary table size, can only be individual batch production, clamping difficulty, ultrathin flexible backing material be carried out to sized divisions, rolling can not carry out the problems such as polishing.The present invention does not need to split ultrathin flexible display backing material, and directly rolling can carry out continuous polishing, can integrate with mutually with subsequent conditioning circuit processing procedure, polishing efficiency is high; Overcome individual and produce inefficient problem in batches, the length of ultrathin flexible backing material is unrestricted; Be applicable to polishing to rectangle ultrathin flexible backing material entire volume, consistent with current display shape, and one side can be realized also can realize twin polishing, entire volume handling simply, shorten the lay day of workpiece, improve polishing efficiency; Ultrathin flexible display substrate rough polishing and essence throwing can be realized, once reach the final demand of surface quality, and be designed with wiper mechanism, surface clean can be carried out after a polish, after entire volume polishing, directly can put in storage, enter next processing procedure; It is simple, with low cost that the present invention has structure, is easy to industrialization and applies, and has wide market prospects, economic benefit and social benefit remarkable.
Accompanying drawing illustrates:
Fig. 1 is structural representation of the present invention.
Detailed description of the invention:
Describe embodiment in detail by reference to the accompanying drawings,
A kind of polishing machine for chemically mechanical polishing ultrathin flexible display substrate, it comprises let off roll 1, wind-up roll 15, horizontal roller 2, polishing roll mechanism 5, 6, wiper mechanism 11, polishing fluid spray equipment 7, cleaning fluid gathering-device 4, the rear of let off roll is provided with horizontal roller, the rear of horizontal roller is provided with rear drive sprocket device 3, the rear of rear drive sprocket device is provided with polishing roll mechanism 5, the below of polishing roll mechanism is provided with cleaning fluid gathering-device, before polishing roll, polishing fluid spray equipment is provided with between the roller of polishing roll mechanism and roller, the rear of polishing roll mechanism is provided with front driving wheel device 8, the rear of front driving wheel device is provided with guide wheel 9, the rear of guide wheel is provided with wiper mechanism 11, the rear of wiper mechanism is provided with wind shower device 16, the rear of wiper mechanism can also arrange cleaning roller mechanism 12, the below of wind shower device is provided with cleaning fluid gathering-device 10, the rear of wind shower device is provided with wind-up roll, cleaning fluid gathering-device of the present invention is pallet, the present invention also can carry out one side setting or two-sided setting to described polishing roll mechanism, can meet different processing needs like this.The quantity of wind shower device can increase as required, and the position of cleaning fluid spray equipment can adjust as required, and the liquid spouting nozzle direction in cleaning fluid spray equipment can adjust as required, to meet cleaning requirement.The quantity of polishing fluid spray equipment can increase as required, and the position of polishing fluid spray equipment can adjust as required, and the liquid spouting nozzle direction in polishing fluid spray equipment can adjust as required, to meet polishing requirement; Polishing machine described in the present embodiment, sandwich construction can also be set to, finishing polish roller mechanism layer 6 is on the upper strata of rough polishing roller mechanism layer 5, wiper mechanism and wind shower device is had after rough polishing roller mechanism, also wiper mechanism and wind shower device is had after finishing polish roller mechanism, wiper mechanism and wind shower device layer, on the upper strata of polishing roll mechanism layer, can save the occupation of land space of equipment like this.
The present invention can also repeat to arrange to this production line, and the polishing precision of adjustment polishing roll mechanism, can realize continuous polishing, throw superfinishing polishing from rough polishing to essence, can meet.
The course of work of the present invention is:
(1) getting a volume stainless steel superthin section is fixed in let off roll mechanism, with guide thin slice is directed across the upper and lower driven roller on forward and backward drive unit, through rough polishing operation several groups of polishing rolls, throw through essence operation several groups of polishing rolls, through after matting, be fixed on wind-up roll, then wind-up roll is rotated, tensioning thin slice.
(2) according to the CMP process parameter optimized, the pressure in the polish pressure in the polish pressure in adjustment finishing polish operation mechanism between each finishing polish roller and workpiece and rotating speed, adjustment rough polishing operation mechanism between each rough polishing smooth roll and workpiece and rotating speed, adjustment drive unit between driven roller and rotating speed.
(3) according to the glossing parameter optimized, the polishing fluid flow in each polishing fluid spray equipment, polishing fluid flow velocity and polishing fluid spray direction is adjusted.
(4) according to the cleaning parameter optimized, the cleaning fluid flow in each cleaning fluid spray equipment, cleaning fluid flow velocity and cleaning fluid spray direction is adjusted.
(5) drench technological parameter according to the wind optimized, adjust the air quantity of hot and cold wind in each wind shower device, wind speed and wind direction, meet clean requirement.
(6) start polishing machine and carry out chemically mechanical polishing, after polishing, from wind-up roll mechanism, take off polished strip coil, carry out package encapsulation, be transported to next process.
Claims (4)
1. the polishing machine for chemically mechanical polishing ultrathin flexible display substrate, it comprises let off roll, wind-up roll, horizontal roller, rough polishing roller mechanism, finishing polish roller mechanism, wiper mechanism, polishing fluid spray equipment, cleaning fluid gathering-device, it is characterized in that: the rear of let off roll is provided with horizontal roller, the rear of horizontal roller is provided with rear drive sprocket device, the rear of rear drive sprocket device is provided with polishing roll mechanism, the below of polishing roll mechanism is provided with cleaning fluid gathering-device, before polishing roll, polishing fluid spray equipment is provided with between the roller of polishing roll mechanism and roller, the rear of polishing roll mechanism is provided with front driving wheel device, the rear of front driving wheel device is provided with guide wheel, the rear of guide wheel is provided with wiper mechanism, the rear of wiper mechanism is provided with wind shower device, the below of wind shower device is provided with cleaning fluid gathering-device, the rear of wind shower device is provided with wind-up roll.
2. as claimed in claim 1 a kind of for chemically mechanical polishing ultrathin flexible display substrate polishing machine, it is characterized in that: described cleaning fluid gathering-device is pallet.
3. as claimed in claim 1 a kind of for chemically mechanical polishing ultrathin flexible display substrate polishing machine, it is characterized in that: described polishing roll mechanism can carry out one side setting or two-sided setting.
4. as claimed in claim 1 a kind of for chemically mechanical polishing ultrathin flexible display substrate polishing machine, it is characterized in that: can sandwich construction be set to, finishing polish roller mechanism layer is on the upper strata of rough polishing roller mechanism layer, wiper mechanism and wind shower device is had after rough polishing roller mechanism, also have wiper mechanism and wind shower device after finishing polish roller mechanism, wiper mechanism and wind shower device layer are on the upper strata of polishing roll mechanism layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510322326.0A CN104924189B (en) | 2015-06-13 | 2015-06-13 | Polishing machine for chemically-mechanically polishing ultrathin flexible display substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510322326.0A CN104924189B (en) | 2015-06-13 | 2015-06-13 | Polishing machine for chemically-mechanically polishing ultrathin flexible display substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN104924189A true CN104924189A (en) | 2015-09-23 |
| CN104924189B CN104924189B (en) | 2017-01-25 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510322326.0A Expired - Fee Related CN104924189B (en) | 2015-06-13 | 2015-06-13 | Polishing machine for chemically-mechanically polishing ultrathin flexible display substrate |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107971917A (en) * | 2017-11-29 | 2018-05-01 | 北京鼎臣世纪超导科技有限公司 | A kind of band polissoir |
| CN108972305A (en) * | 2018-09-25 | 2018-12-11 | 河南科技学院 | A kind of reel-to-reel high-efficiency and continuous chemistry mechanical polisher |
| CN110052909A (en) * | 2019-03-25 | 2019-07-26 | 东阳市恒业钢带有限公司 | A kind of steel band dust-free environmental protection type burnishing device |
| CN112548799A (en) * | 2020-11-27 | 2021-03-26 | 昆山富天达精密金属材料有限公司 | Metal material belt surface water-based grinding machine |
| CN114918817A (en) * | 2022-05-27 | 2022-08-19 | 河南科技学院 | Roll-to-Roll chemical mechanical polishing device and method |
Citations (5)
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| US20040045505A1 (en) * | 1998-03-03 | 2004-03-11 | Makoto Higashikawa | Process for forming a microcrystalline silicon series thin film and apparatus suitable for practicing said process |
| JP2004250776A (en) * | 2002-12-27 | 2004-09-09 | Ebara Corp | Substrate treatment apparatus and method |
| US20110003536A1 (en) * | 2007-01-12 | 2011-01-06 | San Fang Chemical Industry Co., Ltd. | Polishing Pad and Method of Producing the Same |
| KR20130053115A (en) * | 2011-11-15 | 2013-05-23 | 주식회사 포스코 | Method and apparatus for manufacturing metal foil |
| CN204736066U (en) * | 2015-06-13 | 2015-11-04 | 河南科技学院 | A burnishing machine for ultra -thin flexible display substrate of chemically mechanical polishing |
-
2015
- 2015-06-13 CN CN201510322326.0A patent/CN104924189B/en not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040045505A1 (en) * | 1998-03-03 | 2004-03-11 | Makoto Higashikawa | Process for forming a microcrystalline silicon series thin film and apparatus suitable for practicing said process |
| JP2004250776A (en) * | 2002-12-27 | 2004-09-09 | Ebara Corp | Substrate treatment apparatus and method |
| US20110003536A1 (en) * | 2007-01-12 | 2011-01-06 | San Fang Chemical Industry Co., Ltd. | Polishing Pad and Method of Producing the Same |
| KR20130053115A (en) * | 2011-11-15 | 2013-05-23 | 주식회사 포스코 | Method and apparatus for manufacturing metal foil |
| CN204736066U (en) * | 2015-06-13 | 2015-11-04 | 河南科技学院 | A burnishing machine for ultra -thin flexible display substrate of chemically mechanical polishing |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107971917A (en) * | 2017-11-29 | 2018-05-01 | 北京鼎臣世纪超导科技有限公司 | A kind of band polissoir |
| CN108972305A (en) * | 2018-09-25 | 2018-12-11 | 河南科技学院 | A kind of reel-to-reel high-efficiency and continuous chemistry mechanical polisher |
| CN110052909A (en) * | 2019-03-25 | 2019-07-26 | 东阳市恒业钢带有限公司 | A kind of steel band dust-free environmental protection type burnishing device |
| CN110052909B (en) * | 2019-03-25 | 2020-08-04 | 东阳市恒业钢带有限公司 | Steel band dustless environment-friendly burnishing device |
| CN112548799A (en) * | 2020-11-27 | 2021-03-26 | 昆山富天达精密金属材料有限公司 | Metal material belt surface water-based grinding machine |
| US20210331225A1 (en) * | 2020-11-27 | 2021-10-28 | Kun Shan Futianda Metal Technology Co.,Ltd. | Water-based grinding machine for polishing surface of a metal strip |
| CN114918817A (en) * | 2022-05-27 | 2022-08-19 | 河南科技学院 | Roll-to-Roll chemical mechanical polishing device and method |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104924189B (en) | 2017-01-25 |
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Granted publication date: 20170125 Termination date: 20190613 |