CN105208798A - 双面电路板导电膜施镀工艺 - Google Patents

双面电路板导电膜施镀工艺 Download PDF

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CN105208798A
CN105208798A CN201510506670.5A CN201510506670A CN105208798A CN 105208798 A CN105208798 A CN 105208798A CN 201510506670 A CN201510506670 A CN 201510506670A CN 105208798 A CN105208798 A CN 105208798A
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周顺建
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SICHUAN HAIYING ELECTRONIC TECHNOLOGY Co Ltd
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/40Forming printed elements for providing electric connections to or between printed circuits
    • H05K3/42Plated through-holes or plated via connections
    • H05K3/423Plated through-holes or plated via connections characterised by electroplating method
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703Plating
    • H05K2203/0723Electroplating, e.g. finish plating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786Using an aqueous solution, e.g. for cleaning or during drilling of holes

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  • Microelectronics & Electronic Packaging (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

本发明涉及双面电路板导电膜施镀工艺,包括以下步骤:S1、整孔;S2、一次水洗;S3、微蚀:控制微蚀槽内微蚀剂浓度为50~70g/L,15~25s后出板;S4、浸酸:控制浸酸槽内硫酸浓度在5~10%之间,温度在20~25℃之间,10~15s后出板;S5、施镀:控制镀槽内的每升镀液中所含各组分的含量为:硫酸:180g~240g、硫酸铜:70g~80g,余量为去离子水,温度在20℃~30℃之间,电镀电流为1.2A/dm2~3A/dm2之间,电镀时间为20min~30min;S6、二次水洗;S7、烘干。本发明的优点在于:本发明依次通过整孔、水洗、微蚀、预浸,可彻底解决电路板孔壁镀铜出现空洞现象。

Description

双面电路板导电膜施镀工艺
技术领域
本发明涉及电路板孔铜施镀工艺,特别是双面电路板导电膜施镀工艺。
背景技术
电路板中使用的聚酰亚胺、聚酯等基材,都是绝缘性能好的高分子材料,要使其表面成为导体,化学镀是应用广泛的技术之一。导体化(金属化)的孔洞是不同层间线路连接的通道,优质的孔金属化质量是产品电气性能的基本保证。经过多年的研究与开发,化学镀技术已经相当成熟(无论是化学镀铜、化学镀镍、还是化学镀金属合金),掌握了影响化学镀质量的基本因素,即镀层与基材的化学特性、与之对应的化学镀液配方和工艺控制参数等。由于高阶高密度电路板使用了如聚酰亚胺薄膜这类材料,同时又是在微孔中进行化学镀,因此必须调整化学镀的工艺参数,才有可能获得优质的镀层。
化学沉铜是印制电路板孔金属化过程中一个非常重要的步骤,其目的是在孔壁及铜面上形成导电铜层,为后面的电镀做准备,而孔壁镀层的空洞是印制电路板孔金属化常见的缺陷之一,也是引起印制电路板批量报废的项目之一,因此解决印制电路板镀层空洞问题是印制板厂家重点控制的一项内容。
发明内容
本发明的目的在于克服现有技术的缺点,提供一种可彻底解决电路板孔壁镀铜出现空洞现象的双面电路板导电膜施镀工艺。
本发明的目的通过以下技术方案来实现:双面电路板导电膜施镀工艺,包括以下步骤:
S1、整孔:将钻孔后的电路板前后间隔30~50mm依次放在传送辊组上,并将电路板送入整孔槽内,控制整孔槽内温度在20~25℃之间,整孔槽内的整孔剂对电路板进行整孔,4~6min后出板;
S2、一次水洗:将整孔后的电路板送入水洗槽内,用去离子水将电路板板面和孔壁上的杂质去除,3~5min后出板;
S3、微蚀:将一次水洗后的电路板送入微蚀槽内,控制微蚀槽内微蚀剂浓度为50~70g/L,15~25s后出板;
S4、浸酸:将微蚀后的电路板送入浸酸槽内,控制浸酸槽内硫酸浓度在5~10%之间,温度在20~25℃之间,10~15s后出板;
S5、施镀:将浸酸后的电路板送入镀槽内,控制镀槽内的每升镀液中所含各组分的含量为:硫酸:180g~240g、硫酸铜:70g~80g,余量为去离子水,温度在20℃~30℃之间,电镀电流为1.2A/dm2~3A/dm2之间,电镀时间为20min~30min;
S6、二次水洗:将施镀后的电路板再次送入水洗槽内,用去离子水对电路板板面和孔壁进行清洗,3~5min后出板;
S7、烘干:通过传送辊组将电路板送入烘干柜中,将温度控制在65~75℃之间,2~4min后出板,再用自动收板机进行收板。
步骤S1中的整孔剂为浓度为8~12g/L的NaOH溶液,其具体配制方法是先向整孔槽内加入33L去离子水,再向整孔槽内加入0.8~1.2Kg的NaOH,搅拌溶解,最后向整孔槽内添加去离子水,补至100L。
步骤S3中的微蚀剂为Na2(SO42溶液。
本发明具有以下优点:
本发明依次通过整孔、水洗、微蚀、预浸,可彻底解决电路板孔壁镀铜出现空洞现象,首先,通过整孔剂对电路板上的孔壁进行整孔,去除孔壁油污和毛刺,然后将电路板表面的杂质通过水洗冲刷掉,通过微蚀粗化孔壁确保镀铜与孔壁之间的结合力,浸酸可去除孔壁氧化物,对板面进行活化,同时防止水分带入镀槽,影响施镀效果,并对浸酸槽内温度进行控制,为施镀进行预热,使得电路板在进入镀槽后板面温度已经预热到施镀最佳温度,从而达到最佳的施镀效果,最终得到的导电膜镀铜不出现空洞现象。
具体实施方式
下面结合实施例对本发明做进一步的描述,但本发明的保护范围不局限于以下所述。
【实施例1】:
双面电路板导电膜施镀工艺,包括以下步骤:
S1、整孔:将钻孔后的电路板前后间隔50mm依次放在传送辊组上,并将电路板送入整孔槽内,控制整孔槽内温度在20℃,整孔槽内的整孔剂对电路板进行整孔,整孔剂为浓度为12g/L的NaOH溶液,其具体配制方法是先向整孔槽内加入33L去离子水,再向整孔槽内加入1.2Kg的NaOH,搅拌溶解,最后向整孔槽内添加去离子水,补至100L,6min后出板;
S2、一次水洗:将整孔后的电路板送入水洗槽内,用去离子水将电路板板面和孔壁上的杂质去除,5min后出板;
S3、微蚀:将一次水洗后的电路板送入微蚀槽内,微蚀剂为Na2(SO42溶液,控制微蚀槽内微蚀剂浓度为70g/L,15s后出板;
S4、浸酸:将微蚀后的电路板送入浸酸槽内,控制浸酸槽内硫酸浓度为5%,温度为25℃之间,15s后出板;
S5、施镀:将浸酸后的电路板送入镀槽内,控制镀槽内的每升镀液中所含各组分的含量为:硫酸:240g、硫酸铜:70g,余量为去离子水,温度为30℃,电镀电流为3A/dm2,电镀时间为20min;
S6、二次水洗:将施镀后的电路板再次送入水洗槽内,用去离子水对电路板板面和孔壁进行清洗,3min后出板;
S7、烘干:通过传送辊组将电路板送入烘干柜中,将温度控制为75℃,2min后出板,再用自动收板机进行收板。
【实施例2】:
双面电路板导电膜施镀工艺,包括以下步骤:
S1、整孔:将钻孔后的电路板前后间隔40mm依次放在传送辊组上,并将电路板送入整孔槽内,控制整孔槽内温度为22℃之间,整孔槽内的整孔剂对电路板进行整孔,整孔剂为浓度为10g/L的NaOH溶液,其具体配制方法是先向整孔槽内加入33L去离子水,再向整孔槽内加入1.0Kg的NaOH,搅拌溶解,最后向整孔槽内添加去离子水,补至100L,5min后出板;
S2、一次水洗:将整孔后的电路板送入水洗槽内,用去离子水将电路板板面和孔壁上的杂质去除,4min后出板;
S3、微蚀:将一次水洗后的电路板送入微蚀槽内,微蚀剂为Na2(SO42溶液,控制微蚀槽内微蚀剂浓度为60g/L,20s后出板;
S4、浸酸:将微蚀后的电路板送入浸酸槽内,控制浸酸槽内硫酸浓度为8%之间,温度为22℃,12s后出板;
S5、施镀:将浸酸后的电路板送入镀槽内,控制镀槽内的每升镀液中所含各组分的含量为:硫酸:210g、硫酸铜:75g,余量为去离子水,温度为25℃,电镀电流为2.1A/dm2之间,电镀时间为25min;
S6、二次水洗:将施镀后的电路板再次送入水洗槽内,用去离子水对电路板板面和孔壁进行清洗,4min后出板;
S7、烘干:通过传送辊组将电路板送入烘干柜中,将温度控制为70℃之间,3min后出板,再用自动收板机进行收板。
【实施例3】:
双面电路板导电膜施镀工艺,包括以下步骤:
S1、整孔:将钻孔后的电路板前后间隔30mm依次放在传送辊组上,并将电路板送入整孔槽内,控制整孔槽内温度为25℃,整孔槽内的整孔剂对电路板进行整孔,整孔剂为浓度为8g/L的NaOH溶液,其具体配制方法是先向整孔槽内加入33L去离子水,再向整孔槽内加入0.8Kg的NaOH,搅拌溶解,最后向整孔槽内添加去离子水,补至100L,4min后出板;
S2、一次水洗:将整孔后的电路板送入水洗槽内,用去离子水将电路板板面和孔壁上的杂质去除,3min后出板;
S3、微蚀:将一次水洗后的电路板送入微蚀槽内,微蚀剂为Na2(SO42溶液,控制微蚀槽内微蚀剂浓度为50g/L,25s后出板;
S4、浸酸:将微蚀后的电路板送入浸酸槽内,控制浸酸槽内硫酸浓度为10%,温度为20℃,10s后出板;
S5、施镀:将浸酸后的电路板送入镀槽内,控制镀槽内的每升镀液中所含各组分的含量为:硫酸:180g、硫酸铜:80g,余量为去离子水,温度为20℃,电镀电流为1.2A/dm2,电镀时间为30min;
S6、二次水洗:将施镀后的电路板再次送入水洗槽内,用去离子水对电路板板面和孔壁进行清洗,5min后出板;
S7、烘干:通过传送辊组将电路板送入烘干柜中,将温度控制为65℃,4min后出板,再用自动收板机进行收板。

Claims (3)

1.双面电路板导电膜施镀工艺,其特征在于:包括以下步骤:
S1、整孔:将钻孔后的电路板前后间隔30~50mm依次放在传送辊组上,并将电路板送入整孔槽内,控制整孔槽内温度在20~25℃之间,整孔槽内的整孔剂对电路板进行整孔,4~6min后出板;
S2、一次水洗:将整孔后的电路板送入水洗槽内,用去离子水将电路板板面和孔壁上的杂质去除,3~5min后出板;
S3、微蚀:将一次水洗后的电路板送入微蚀槽内,控制微蚀槽内微蚀剂浓度为50~70g/L,15~25s后出板;
S4、浸酸:将微蚀后的电路板送入浸酸槽内,控制浸酸槽内硫酸浓度在5~10%之间,温度在20~25℃之间,10~15s后出板;
S5、施镀:将浸酸后的电路板送入镀槽内,控制镀槽内的每升镀液中所含各组分的含量为:硫酸:180g~240g、硫酸铜:70g~80g,余量为去离子水,温度在20℃~30℃之间,电镀电流为1.2A/dm2~3A/dm2之间,电镀时间为20min~30min;
S6、二次水洗:将施镀后的电路板再次送入水洗槽内,用去离子水对电路板板面和孔壁进行清洗,3~5min后出板;
S7、烘干:通过传送辊组将电路板送入烘干柜中,将温度控制在65~75℃之间,2~4min后出板,再用自动收板机进行收板。
2.根据权利要求1所述的双面电路板导电膜施镀工艺,其特征在于:步骤S1中的整孔剂为浓度为8~12g/L的NaOH溶液,其具体配制方法是先向整孔槽内加入33L去离子水,再向整孔槽内加入0.8~1.2Kg的NaOH,搅拌溶解,最后向整孔槽内添加去离子水,补至100L。
3.根据权利要求1所述的双面电路板导电膜施镀工艺,其特征在于:步骤S3中的微蚀剂为Na2(SO42溶液。
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CN106304693A (zh) * 2016-08-31 2017-01-04 河源西普电子有限公司 一种用于柔性电路板的镀金工艺
CN107635361A (zh) * 2017-09-13 2018-01-26 东莞联桥电子有限公司 一种铁氟龙pcb板的电镀加工方法
CN108712832A (zh) * 2018-08-10 2018-10-26 四川海英电子科技有限公司 一种电路板导电膜施镀工艺
CN108822974A (zh) * 2018-05-23 2018-11-16 昆山市线路板厂 一种挠性电路板整孔剂

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CN101631427A (zh) * 2008-07-14 2010-01-20 深圳市九和咏精密电路有限公司 电路板制作过程中的镀厚金方法
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Publication number Priority date Publication date Assignee Title
CN106304693A (zh) * 2016-08-31 2017-01-04 河源西普电子有限公司 一种用于柔性电路板的镀金工艺
CN107635361A (zh) * 2017-09-13 2018-01-26 东莞联桥电子有限公司 一种铁氟龙pcb板的电镀加工方法
CN108822974A (zh) * 2018-05-23 2018-11-16 昆山市线路板厂 一种挠性电路板整孔剂
CN108712832A (zh) * 2018-08-10 2018-10-26 四川海英电子科技有限公司 一种电路板导电膜施镀工艺

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