CN105203503B - A kind of Laser Films element ultra-smooth optical substrate surface inspecting method - Google Patents
A kind of Laser Films element ultra-smooth optical substrate surface inspecting method Download PDFInfo
- Publication number
- CN105203503B CN105203503B CN201510585072.1A CN201510585072A CN105203503B CN 105203503 B CN105203503 B CN 105203503B CN 201510585072 A CN201510585072 A CN 201510585072A CN 105203503 B CN105203503 B CN 105203503B
- Authority
- CN
- China
- Prior art keywords
- laser
- substrate surface
- optical substrate
- light scattering
- laser light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Abstract
The present invention relates to a kind of Laser Films element ultra-smooth optical substrate surface inspecting method, using 532nm wavelength laser oblique incidence optical substrates surface, with the dark field mode observation laser of differential interference microscope in the scattering optical information of substrate surface, the high-sensitivity detection to optical substrate surface defect and minimal residual particle is realized；It is observed by the way that the sample that laser light scattering and differential interference microscope modes there are 300 ~ 3 μm of artificial oxidation's silicon beads to institute's spin coating under details in a play not acted out on stage, but told through dialogues microscope modes is respectively adopted, particulate laser light scattering area and particulate entity yardstick corresponding relation are established in contrast, realize that the quantization of the laser light scattering detection for particulate is calibrated；By contrasting laser light scattering under details in a play not acted out on stage, but told through dialogues microscope modes and differential interference microscope modes to being carved with the observed result of the artificial cut substrate of 600nm ~ 5 μm width, cut laser light scattering area and entity width corresponding relation are established, completes to quantify calibration to the laser light scattering of scratch defects.Present invention greatly enhances the precision and efficiency of substrate surface defects detection.
Description
Technical field
A kind of surface inspecting method after being cleaned the present invention relates to optical substrate, particularly a kind of Laser Films member
Part ultra-smooth optical substrate surface inspecting method.
Background technology
Optical thin film element is the key componentses in laser system, be realize system optics performance key factor it
One.With laser system being continuously increased using power, people also constantly carry to the antibody Monoclonal Capability Requirement of laser film element
It is high.Influence that the factor of thin film damage threshold value is numerous, from the polishing of substrate and clean to the design and preparation and follow-up of membrane system
The polishing process of laser pre-treated etc., wherein substrate determines the finish of substrate surface, and polishing process control will be improper to be caused
There are a large amount of scratch defects in substrate surface, and matting directly determines the surface cleanliness before element plated film, cleans improper meeting
Cause the residual of substrate surface particulate.These cuts and particulate irradiate after thin-film component loads laser system in high power laser light
Under easily induce the damage of film, so as to greatly reduce the resisting laser damage performance of element.
So how to judge whether the substrate surface cut situation after polishing is qualified, the substrate surface contaminant particles after cleaning
Whether clean up, then need our scratch defects to substrate surface and surface cleanliness situation to possess objective and accurate inspection
Survey method and judgement.The method commonly used at present in optical substrate Surface testing is to be detected in 100W white light surfaces under light irradiation
With the naked eye observe, but this method is without standard measure granularity size, and the degree of accuracy examined is very dependent on bulb-shaped
State, and the brightness of bulb is influenceed by many extraneous factors in actual use, such as available machine time, the total usage time of bulb
Deng, therefore in use it is difficult to ensure that the accuracy and uniformity examined, particularly critical is that this detection method is only capable of observing
Cut and particulate more than to tens micro-meter scales, and the observation for the particle and cut of smaller yardstick then needs to use optics
Microscope, micron, the cut of submicron-scale and defect can be observed by using higher multiplication factor light microscope,
And can be by the quantitative expression of the yardstick of defect.But surface is carried out to substrate using light microscope known at present
Subject matter present in detection process is that the multiplication factor of camera lens gets over the defects of high energy observes yardstick with regard to smaller, and corresponding
Field of detection also becomes smaller, and such detection speed will be slack-off.So system of the laser film component in high damage threshold
And the quantification detection method of high sensitivity fast there is an urgent need to a kind of detection speed during standby.
Therefore, the present invention is in view of the above-mentioned problems, propose that a kind of substrate surface based on the scattering observation of 532nm wavelength lasers lacks
Fall into the quantitative and Fast Detection Technique with contaminant particles yardstick and spatial distribution.Because human eye is extremely sensitive to green glow, using 532nm
Laser light scattering observation has higher sensitivity, the signal intensity obtained far above general major light, can obtain smaller szie and lack
Sunken scattered signal, contaminant particle detection accuracy drastically increase the essence that substrate surface defects detect up to tens nanometer
Degree and efficiency, polishing and cleaning research and development for optical substrate provide feedback and technical support.
The content of the invention
The purpose of the present invention is to propose to a kind of Laser Films element optics substrate surface detection method.
A kind of Laser Films element ultra-smooth optical substrate surface inspecting method proposed by the present invention, specific step
It is rapid as follows：
(1) with details in a play not acted out on stage, but told through dialogues, differential interference function microscopie unit beside device optical maser wavelength be 532nm lasers,
The micro objective focal zone on laser beam oblique incidence irradiating sample surface, adjusts laser positions and microscope focus causes
Sample surfaces laser light scattering light can clearly be observed by eyepiece；
（2）Before formal detection, it is necessary first to Particle Scattering light quantization is calibrated, by the artificial oxygen of the μ m diameter of 300nm ~ 3
SiClx bead is spin-coated on clean optical substrate surface, is shown respectively using laser light scattering under details in a play not acted out on stage, but told through dialogues microscope modes and differential interference
The artificial particulate of tiny model comparative observation, the particle size observed under both of which is recorded respectively, is fitted and established by data with this
The yardstick of particulate scatters the quantity corresponding relation of light area with it, realizes that the quantization to particle defects scattering light is calibrated；
（3）Then need to calibrate substrate surface scratch defects scattering light, using nano-hardness tester in optical substrate table
Face prepares the artificial cut of 600nm ~ 4 μm width, and it is micro- that laser light scattering and differential interference under details in a play not acted out on stage, but told through dialogues microscope modes is respectively adopted
The artificial cut of pattern comparative observation, the cut size observed under both of which is recorded respectively, established and drawn by data fitting with this
The width of trace scatters the quantity corresponding relation of optical width with it, realizes that the quantization to scratch defects scattering light is calibrated；
(4) by above-mentioned to proceeding by the table after optical substrate cleans after cut and the calibration of Particle Scattering light quantification
Face is detected, and for specific detection method using fixed micro- lens head, the full surface scan mode for first laterally vertically moving substrate again is real
Now to the detection of the spatial distribution and yardstick of surface scratch defect and particulate.
The present invention especially realizes the quantification of optical substrate surface high-sensitivity detection, is carried for the improvement of base-plate cleaning technique
For data supporting, avoid inside substrate and surface produces defect due to overclean, ensure that substrate has high damage threshold
Value, while have the advantages that detection speed is fast, testing result is directly perceived, accuracy of detection is high.
Brief description of the drawings
Fig. 1 is that 1 μm of artificial particle (a) differential interference micro-image contrasts with (b) 532nm laser light scatterings darkfield image；
Fig. 2 is that 2 μm of artificial cut (a) differential interference micro-images contrast with (b) 532nm laser light scatterings darkfield image；
Fig. 3 is (a) differential interference image and (b) 532nm laser light scattering darkfield images pair of optical substrate after preliminary cleaning
Than.
Embodiment
The present invention is elaborated with example below in conjunction with the accompanying drawings.
Embodiment 1：Detection after being cleaned with BK7 optical substrates：
Clean 1 μm of uniform SiO of yardstick of Φ 30mm optical substrates surface spin coating after cleaning2Artificial bead, by bead
Substrate is placed on Leica differential interference microscope objective tables, is lowered using 20 times of multiplication factor object lens in differential interference pattern
Microscope focus is saved, microscope is focused on upper surface of base plate, 1 μm of substrate surface is can observe in 10 times of multiplication factor eyepieces
SiO2Bead, as shown in Fig. 1 (a).Then, microscope is adjusted to dark field mode, laser wave is placed beside microscopie unit
A length of 532nm lasers, laser beam cause laser beam in sample with 45 degree of oblique incidence irradiating sample surfaces, regulation laser positions
Surface hot spot is overlapped with micro objective focal zone, and dissipating for substrate surface silica bead can be clearly observed by eyepiece
Light is penetrated, as shown in Fig. 1 (b).It is similar, our the comparative observations differential interference image of the artificial bead of 300nm ~ 3 μm silica and
Details in a play not acted out on stage, but told through dialogues laser scattering imaging, the corresponding relation of bead yardstick and corresponding scattering light area are shown in Table 1, light are scattered to particle so as to realize
The calibration of size and particle full-size(d).
Table 1：
| Silica the small ball's diameter（µm） | 0.3 | 0.6 | 1.0 | 2.0 | 3.0 |
| Scatter equivalent diameter（µm） | 0.7 | 1.5 | 2.3 | 3.8 | 5.5 |
Then, the Φ 30mmBK7 substrates for being carved with 2 μm of artificial cuts of width are placed into microscope inspection scaffold tower, done in differential
Relate to and adjust microscope focus under pattern, the artificial cut of substrate surface is can observe in eyepiece, as shown in Fig. 2 (a).Then, will
Microscope is adjusted to dark field mode, opens the 532nm long wavelength lasers adjusted in above-mentioned steps, can be clear by eyepiece
The scattering light of the artificial cut of substrate surface is observed, as shown in Fig. 2 (b).Similar, our comparative observations 600nm ~ 4 μm are artificial
The differential interference image and details in a play not acted out on stage, but told through dialogues laser scattering imaging of cut, the corresponding relation of scratch width and corresponding scattering light area are shown in Table 2,
Realized according to the corresponding relation to the scattering optical width of substrate surface scratch defects and the calibration of actual width.
Table 2：
| Scratch width（µm） | 0.6 | 1.0 | 2.0 | 3.0 | 4.0 |
| Scatter equivalent width（µm） | 1.3 | 2.4 | 3.5 | 4.8 | 9.5 |
After the quantization calibration to scattering light is completed, we can start that optical substrate is detected and analyzed, such as Fig. 3
(a) shown in, one piece of BK7 substrate after preliminary cleaning is placed into monitor station, the observing samples table under differential interference pattern
Face, surface, which only has visual field intermediate region, several particles, entirely seems still cleaner, but when we are using the present invention
Laser scattering method observation after, it is corresponding according to the yardstick of above-mentioned calibration as Fig. 3 (b) surfaces show very more particulates
Relation, it is mainly the range scale less than 1 μm of sub-micron to illustrate these particle scales, so as to illustrate the sample also need to do into
The high accuracy cleaning of one step.As can be seen here, the detection method invented by us can carry out high to optical substrate with sensitivity
Effect detection, strong technical guarantee is provided to obtain the optical thin film element of high damage threshold.
The above-mentioned description to embodiment is technological thought and feature to illustrate the invention, it is therefore intended that the technical field
Those of ordinary skill be understood that and using the present invention.Person skilled in the art obviously easily can implement to these
Example makes various modifications, and General Principle described herein is applied in other embodiment without by creative labor
It is dynamic.Therefore, the invention is not restricted to embodiment here, those skilled in the art to do according to the announcement of the present invention for the present invention
The improvement and modification gone out is all included within the scope of the present invention.
Claims (6)
1. a kind of Laser Films element ultra-smooth optical substrate surface inspecting method, its feature comprise the following steps that：
(1) beside the differential interference microscope with dark field mode set 532nm long wavelength lasers, by laser beam tilt into
The microscope focal zone of sample surfaces is penetrated, sample surfaces laser light scattering light can observe by eyepiece；
（2）Artificial oxidation's silicon particle of the μ m diameter of 300nm ~ 3 is spin-coated on clean optical substrate surface, shown respectively using details in a play not acted out on stage, but told through dialogues
Laser light scattering and differential interference microscope modes observe artificial particulate under tiny model, record the particulate observed under both of which respectively
Size, the yardstick for being established particulate by data fitting with this are scattered the quantity corresponding relation of light area with it, realize and particulate is lacked
Fall into the quantization calibration of scattering light；
（3）The artificial cut of 600nm ~ 4 μm width is prepared on optical substrate surface using nano-hardness tester, details in a play not acted out on stage, but told through dialogues is respectively adopted and shows
Laser light scattering and the artificial cut of differential interference microscope modes comparative observation under tiny model, record what is observed under both of which respectively
Cut size, the width for being established cut by data fitting with this are scattered the quantity corresponding relation of optical width with it, realized to drawing
The quantization calibration of trace defect scattering light；
(4) carry out the surface after being cleaned to optical substrate with the detection method after above-mentioned calibration and carry out scratch defects and micro-
The full Surface testing of spatial distribution of grain.
2. Laser Films element according to claim 1 ultra-smooth optical substrate surface inspecting method, it is special
Sign is：The step（1）Middle laser wavelength is 532nm.
3. Laser Films element according to claim 1 ultra-smooth optical substrate surface inspecting method, it is special
Sign is：The step（1）The vertical spot diameter of middle laser is 2mm.
4. Laser Films element according to claim 1 ultra-smooth optical substrate surface inspecting method, it is special
Sign is：The step（1）Middle laser deflection angle is 30 ° ~ 60 °.
5. Laser Films element according to claim 1 ultra-smooth optical substrate surface inspecting method, it is special
Sign is：The step（2）Middle silica bead size is any in 0.3 μm, 0.6 μm, 1.0 μm, 2.0 μm or 3.0 μm.
6. Laser Films element according to claim 1 ultra-smooth optical substrate surface inspecting method, it is special
Sign is：The step（3）In artificial scratch width size be 0.6 μm, 1 μm, 2 μm, 3 μm or 4 μm in it is any.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510585072.1A CN105203503B (en) | 2015-09-16 | 2015-09-16 | A kind of Laser Films element ultra-smooth optical substrate surface inspecting method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510585072.1A CN105203503B (en) | 2015-09-16 | 2015-09-16 | A kind of Laser Films element ultra-smooth optical substrate surface inspecting method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN105203503A CN105203503A (en) | 2015-12-30 |
| CN105203503B true CN105203503B (en) | 2017-12-26 |
Family
ID=54951298
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510585072.1A Expired - Fee Related CN105203503B (en) | 2015-09-16 | 2015-09-16 | A kind of Laser Films element ultra-smooth optical substrate surface inspecting method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN105203503B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106645197B (en) * | 2016-12-29 | 2024-01-30 | 中国工程物理研究院激光聚变研究中心 | Online detection system for detecting particles on surface of precision optical element and application method |
| WO2020191967A1 (en) * | 2019-03-27 | 2020-10-01 | 爱丁堡（南京）光电设备有限公司 | Detection method for smooth surface defects and detection device therefor |
| CN110006924B (en) * | 2019-04-18 | 2021-06-29 | 西安工业大学 | Method for detecting two-dimensional profile of micro defect on surface of optical element |
| CN112347527B (en) * | 2020-11-09 | 2022-06-03 | 武汉科技大学 | Photomask mask plate graph design method for dark field defect detection |
| CN114324360A (en) * | 2021-12-31 | 2022-04-12 | 深圳鼎晶科技有限公司 | AOI indentation detection system and method |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8072597B2 (en) * | 2000-09-21 | 2011-12-06 | Hitachi, Ltd. | Method and its apparatus for inspecting particles or defects of a semiconductor device |
| JP4755054B2 (en) * | 2006-09-01 | 2011-08-24 | 株式会社日立ハイテクノロジーズ | Surface inspection method and surface inspection apparatus |
| CN102980844B (en) * | 2012-12-10 | 2014-09-17 | 同济大学 | Method for detecting washed surface of optical substrate used for laser thin film element |
| CN103042008B (en) * | 2012-12-25 | 2015-06-03 | 同济大学 | Cleaning method of optical substrate for laser thin-film element |
| CN103175886B (en) * | 2013-03-20 | 2015-01-14 | 同济大学 | Detection method of depth distribution of nanometer absorbing center in optical substrate subsurface |
-
2015
- 2015-09-16 CN CN201510585072.1A patent/CN105203503B/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN105203503A (en) | 2015-12-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105203503B (en) | A kind of Laser Films element ultra-smooth optical substrate surface inspecting method | |
| CN106770128B (en) | Detection device and detection method for rapidly detecting subsurface defects of optical element in three dimensions | |
| JP7373527B2 (en) | Workpiece defect detection device and method | |
| CN111203805B (en) | Full-automatic glass scratch repairing method | |
| CN107063641B (en) | A kind of method of Nondestructive Evaluation optic element damage performance | |
| TWI440844B (en) | Inspection system for inspecting the surface defects of the specimen and the method thereof | |
| TWI713638B (en) | Method for detecting defects and associated device | |
| CN111208064A (en) | Rapid detection device and detection method for subsurface defects of optical element | |
| CN102495078B (en) | Method for detecting welding seam on basis of quantum dot infrared fluorescence display technology | |
| US11175220B2 (en) | Surface defect measuring apparatus and method by microscopic scattering polarization imaging | |
| WO1999004249A1 (en) | Method of checking unevenness of light-transmitting substance, apparatus therefor, and method of sorting transparent substrates | |
| WO2023010617A1 (en) | Apparatus and method for detecting subsurface defect of optical element | |
| TWI695164B (en) | Broadband wafer defect detection system and broadband wafer defect detection method | |
| CN105842248B (en) | Optical element surface damage threshold testing system and testing method thereof | |
| CN105651189A (en) | Non-destructive online testing equipment used for measuring thickness of ink layer in mobile phone cover plate | |
| CN110686614B (en) | Detection device and detection method for depth information of subsurface defect of optical element | |
| US20230408805A1 (en) | Dark-field mid-infrared photothermal microscopy | |
| Li et al. | 3D defect distribution detection by coaxial transmission dark-field microscopy | |
| Yang et al. | Surface defects evaluation system based on electromagnetic model simulation and inverse-recognition calibration method | |
| US20230044124A1 (en) | Device and method for detecting subsurface defect of optical component | |
| CN102980844B (en) | Method for detecting washed surface of optical substrate used for laser thin film element | |
| Takahashi et al. | In-process measurement method for detection and discrimination of silicon wafer surface defects by laser scattered defect pattern | |
| CN111239155B (en) | Axial differential dark field confocal microscopic measuring device and method thereof | |
| Xu et al. | Enhanced internal reflection microscopy for subsurface damage inspection | |
| Wang et al. | Optical subsurface damage evaluation using LSCT |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20171226 Termination date: 20200916 |