CN105190776B - 用于极紫外光源的标靶 - Google Patents

用于极紫外光源的标靶 Download PDF

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Publication number
CN105190776B
CN105190776B CN201480014220.8A CN201480014220A CN105190776B CN 105190776 B CN105190776 B CN 105190776B CN 201480014220 A CN201480014220 A CN 201480014220A CN 105190776 B CN105190776 B CN 105190776B
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China
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target
target material
light beam
block part
amplification
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Chinese (zh)
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CN105190776A (zh
Inventor
陶业争
R·J·拉法克
I·V·弗梅科夫
D·J·W·布朗
D·J·戈利驰
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ASML Holding NV
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ASML Holding NV
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    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K5/00—Irradiation devices
    • G21K5/02—Irradiation devices having no beam-forming means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0088—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam for preconditioning the plasma generating material

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Plasma Technology (AREA)
CN201480014220.8A 2013-03-14 2014-02-20 用于极紫外光源的标靶 Active CN105190776B (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910265448.9A CN110232982B (zh) 2013-03-14 2014-02-20 用于极紫外光源的标靶

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/830,380 2013-03-14
US13/830,380 US8791440B1 (en) 2013-03-14 2013-03-14 Target for extreme ultraviolet light source
PCT/US2014/017496 WO2014143522A1 (en) 2013-03-14 2014-02-20 Target for extreme ultraviolet light source

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN201910265448.9A Division CN110232982B (zh) 2013-03-14 2014-02-20 用于极紫外光源的标靶

Publications (2)

Publication Number Publication Date
CN105190776A CN105190776A (zh) 2015-12-23
CN105190776B true CN105190776B (zh) 2019-05-03

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CN201480014220.8A Active CN105190776B (zh) 2013-03-14 2014-02-20 用于极紫外光源的标靶
CN201910265448.9A Active CN110232982B (zh) 2013-03-14 2014-02-20 用于极紫外光源的标靶

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US (4) US8791440B1 (enExample)
JP (3) JP6471142B2 (enExample)
KR (2) KR102216594B1 (enExample)
CN (2) CN105190776B (enExample)
TW (2) TWI603162B (enExample)
WO (1) WO2014143522A1 (enExample)

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WO2015041260A1 (ja) * 2013-09-17 2015-03-26 ギガフォトン株式会社 極端紫外光生成装置
US9338870B2 (en) * 2013-12-30 2016-05-10 Asml Netherlands B.V. Extreme ultraviolet light source
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US9451683B1 (en) 2015-07-14 2016-09-20 Taiwan Semiconductor Manufacturing Co., Ltd. Solution for EUV power increment at wafer level
US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
US9713240B2 (en) 2015-08-12 2017-07-18 Asml Netherlands B.V. Stabilizing EUV light power in an extreme ultraviolet light source
US20170311429A1 (en) * 2016-04-25 2017-10-26 Asml Netherlands B.V. Reducing the effect of plasma on an object in an extreme ultraviolet light source
WO2018029759A1 (ja) * 2016-08-08 2018-02-15 ギガフォトン株式会社 極端紫外光生成方法
US10401704B2 (en) * 2016-11-11 2019-09-03 Asml Netherlands B.V. Compensating for a physical effect in an optical system
CN106885632B (zh) * 2017-03-03 2019-01-29 北京振兴计量测试研究所 一种真空紫外光谱辐射计校准方法及装置
US10299361B2 (en) * 2017-03-24 2019-05-21 Asml Netherlands B.V. Optical pulse generation for an extreme ultraviolet light source
US11153959B2 (en) * 2018-08-17 2021-10-19 Taiwan Semiconductor Manufacturing Co., Ltd. Apparatus and method for generating extreme ultraviolet radiation
JP6822693B2 (ja) 2019-03-27 2021-01-27 日本電気株式会社 音声出力装置、音声出力方法および音声出力プログラム
TWI892982B (zh) * 2019-04-01 2025-08-11 荷蘭商Ａｓｍｌ荷蘭公司 極紫外（ｅｕｖ）光源、目標供應系統、及控制ｅｕｖ光源中轉換效率的方法
CN111490437A (zh) * 2019-04-15 2020-08-04 中国科学院物理研究所 利用激光与天线靶作用诱导频率可控微波辐射的装置和方法
JP7261683B2 (ja) 2019-07-23 2023-04-20 ギガフォトン株式会社 極端紫外光生成システム及び電子デバイスの製造方法
KR102447685B1 (ko) * 2020-07-22 2022-09-27 포항공과대학교 산학협력단 특정 파장대의 광원을 발생시키기 위한 장치 및 방법
JP7561043B2 (ja) * 2021-01-20 2024-10-03 ギガフォトン株式会社 極端紫外光生成システム、及び電子デバイスの製造方法
KR102829791B1 (ko) * 2022-08-29 2025-07-07 주식회사 에프에스티 Euv 빔 최적화 장치
CN116184770B (zh) * 2023-02-01 2025-09-23 广东省智能机器人研究院 极紫外光生成系统、方法、控制装置、控制器和存储介质

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Also Published As

Publication number Publication date
JP2016518674A (ja) 2016-06-23
TW201802618A (zh) 2018-01-16
US8912514B2 (en) 2014-12-16
US8791440B1 (en) 2014-07-29
TW201441770A (zh) 2014-11-01
KR102341104B1 (ko) 2021-12-20
KR20150129750A (ko) 2015-11-20
KR20210018977A (ko) 2021-02-18
JP6471142B2 (ja) 2019-02-13
US9462668B2 (en) 2016-10-04
US20150076374A1 (en) 2015-03-19
US9155179B2 (en) 2015-10-06
JP2019061289A (ja) 2019-04-18
KR102216594B1 (ko) 2021-02-17
CN110232982B (zh) 2023-10-17
CN110232982A (zh) 2019-09-13
US20140299791A1 (en) 2014-10-09
JP2020106866A (ja) 2020-07-09
JP6944010B2 (ja) 2021-10-06
TWI636342B (zh) 2018-09-21
WO2014143522A1 (en) 2014-09-18
US20160029471A1 (en) 2016-01-28
JP6685438B2 (ja) 2020-04-22
TWI603162B (zh) 2017-10-21
CN105190776A (zh) 2015-12-23

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