CN105174828B - 高亮防污的人造石英石及其制备方法 - Google Patents
高亮防污的人造石英石及其制备方法 Download PDFInfo
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- CN105174828B CN105174828B CN201510644541.2A CN201510644541A CN105174828B CN 105174828 B CN105174828 B CN 105174828B CN 201510644541 A CN201510644541 A CN 201510644541A CN 105174828 B CN105174828 B CN 105174828B
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- Prior art keywords
- lump
- artificial quartz
- highlighted
- quartz
- compressing
- Prior art date
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 84
- 239000010453 quartz Substances 0.000 title claims abstract description 64
- 230000003373 anti-fouling effect Effects 0.000 title claims abstract description 19
- 238000002360 preparation method Methods 0.000 title claims abstract description 16
- 229920005989 resin Polymers 0.000 claims abstract description 16
- 239000011347 resin Substances 0.000 claims abstract description 16
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 16
- 239000006004 Quartz sand Substances 0.000 claims abstract description 15
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 15
- 239000004372 Polyvinyl alcohol Substances 0.000 claims abstract description 14
- 239000002253 acid Substances 0.000 claims abstract description 14
- 229920002451 polyvinyl alcohol Polymers 0.000 claims abstract description 14
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 13
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 13
- 239000011737 fluorine Substances 0.000 claims abstract description 13
- 229920001567 vinyl ester resin Polymers 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 11
- KOMNUTZXSVSERR-UHFFFAOYSA-N 1,3,5-tris(prop-2-enyl)-1,3,5-triazinane-2,4,6-trione Chemical compound C=CCN1C(=O)N(CC=C)C(=O)N(CC=C)C1=O KOMNUTZXSVSERR-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 claims abstract description 10
- 238000007761 roller coating Methods 0.000 claims abstract description 10
- 238000010438 heat treatment Methods 0.000 claims abstract description 9
- UQMGAWUIVYDWBP-UHFFFAOYSA-N silyl acetate Chemical compound CC(=O)O[SiH3] UQMGAWUIVYDWBP-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000002161 passivation Methods 0.000 claims abstract description 7
- 238000012545 processing Methods 0.000 claims abstract description 3
- 238000000034 method Methods 0.000 claims description 11
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 10
- 239000000203 mixture Substances 0.000 claims description 7
- 239000004593 Epoxy Substances 0.000 claims description 6
- NOZAQBYNLKNDRT-UHFFFAOYSA-N [diacetyloxy(ethenyl)silyl] acetate Chemical compound CC(=O)O[Si](OC(C)=O)(OC(C)=O)C=C NOZAQBYNLKNDRT-UHFFFAOYSA-N 0.000 claims description 5
- -1 diisoamyl diene Chemical class 0.000 claims description 5
- TVJPBVNWVPUZBM-UHFFFAOYSA-N [diacetyloxy(methyl)silyl] acetate Chemical compound CC(=O)O[Si](C)(OC(C)=O)OC(C)=O TVJPBVNWVPUZBM-UHFFFAOYSA-N 0.000 claims description 4
- KXJLGCBCRCSXQF-UHFFFAOYSA-N [diacetyloxy(ethyl)silyl] acetate Chemical compound CC(=O)O[Si](CC)(OC(C)=O)OC(C)=O KXJLGCBCRCSXQF-UHFFFAOYSA-N 0.000 claims description 3
- KEVMYFLMMDUPJE-UHFFFAOYSA-N diisoamyl Natural products CC(C)CCCCC(C)C KEVMYFLMMDUPJE-UHFFFAOYSA-N 0.000 claims description 3
- 238000005260 corrosion Methods 0.000 abstract description 4
- 239000004035 construction material Substances 0.000 abstract description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 46
- 230000000052 comparative effect Effects 0.000 description 15
- 150000001875 compounds Chemical class 0.000 description 15
- 239000002994 raw material Substances 0.000 description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 229930185605 Bisphenol Natural products 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 239000008367 deionised water Substances 0.000 description 5
- 229910021641 deionized water Inorganic materials 0.000 description 5
- 238000012423 maintenance Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000004575 stone Substances 0.000 description 4
- 229910001413 alkali metal ion Inorganic materials 0.000 description 3
- 238000005452 bending Methods 0.000 description 3
- 238000005034 decoration Methods 0.000 description 3
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000008119 colloidal silica Substances 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 2
- 238000005342 ion exchange Methods 0.000 description 2
- 239000003456 ion exchange resin Substances 0.000 description 2
- 229920003303 ion-exchange polymer Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 239000002969 artificial stone Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002085 enols Chemical class 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
Landscapes
- Paints Or Removers (AREA)
Abstract
Description
实施例1 | 实施例2 | 实施例3 | 比较例1 | 比较例2 | |
抗压强度 (MPa) | 255 | 240 | 260 | 210 | 258 |
抗弯强度(MPa) | 78 | 72 | 80 | 47 | 79 |
冲击强度 (kJm-2) | 15.8 | 14.6 | 15.5 | 9.6 | 15.6 |
吸水率 (%) | 0.01 | 0.01 | 0.01 | 0.01 | 0.01 |
实施例1 | 实施例2 | 实施例3 | 比较例1 | 比较例2 | |
5wt%的HCl溶液,1个月 | 78.1 | 71.1 | 79.9 | 45.0 | 73.0 |
5wt%的HCl溶液,2个月 | 73.0 | 66.9 | 78.3 | 39.2 | 51.5 |
10wt%的NaOH溶液,1个月 | 76.9 | 68.3 | 78.8 | 43.0 | 70.0 |
10wt%的NaOH溶液,2个月 | 72.5 | 63.5 | 75.1 | 32.5 | 44.7 |
Claims (9)
Priority Applications (1)
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CN201510644541.2A CN105174828B (zh) | 2015-10-09 | 2015-10-09 | 高亮防污的人造石英石及其制备方法 |
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CN201510644541.2A CN105174828B (zh) | 2015-10-09 | 2015-10-09 | 高亮防污的人造石英石及其制备方法 |
Publications (2)
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CN105174828A CN105174828A (zh) | 2015-12-23 |
CN105174828B true CN105174828B (zh) | 2016-12-14 |
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CN201510644541.2A Expired - Fee Related CN105174828B (zh) | 2015-10-09 | 2015-10-09 | 高亮防污的人造石英石及其制备方法 |
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Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
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CN107805002A (zh) * | 2017-11-06 | 2018-03-16 | 佛山市欧泊石业有限公司 | 一种耐污人造石英石板材的制备方法 |
CN107814508A (zh) * | 2017-11-06 | 2018-03-20 | 佛山市欧泊石业有限公司 | 一种耐污人造石英石板材 |
CN108587026A (zh) * | 2018-05-11 | 2018-09-28 | 佛山市欧铂利复合材料有限公司 | 一种弯曲性能优良的亚克力板及其制备方法 |
CN109485302A (zh) * | 2018-11-29 | 2019-03-19 | 临海市朵纳卫浴有限公司 | 一种石英石台盆的制造方法 |
CN109810442B (zh) * | 2019-01-24 | 2021-06-08 | 广州秀珀化工涂料有限公司 | Mma-乙烯基导盲砖材料及其制备方法 |
CN111793365B (zh) * | 2020-07-28 | 2021-12-07 | 新安天玉有机硅有限公司 | 硅橡胶组合物及其制备方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101480810A (zh) * | 2009-01-21 | 2009-07-15 | 上海贵雅橱柜有限公司 | 一种人造石英石的制备方法 |
CN102643052A (zh) * | 2012-04-24 | 2012-08-22 | 本益实业(福建)有限公司 | 一种耐污人造石英石的制造方法 |
CN102898070A (zh) * | 2011-11-03 | 2013-01-30 | 苏州拓博琳新材料科技有限公司 | 生物基人造石英石及其生产工艺 |
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2015
- 2015-10-09 CN CN201510644541.2A patent/CN105174828B/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101480810A (zh) * | 2009-01-21 | 2009-07-15 | 上海贵雅橱柜有限公司 | 一种人造石英石的制备方法 |
CN102898070A (zh) * | 2011-11-03 | 2013-01-30 | 苏州拓博琳新材料科技有限公司 | 生物基人造石英石及其生产工艺 |
CN102643052A (zh) * | 2012-04-24 | 2012-08-22 | 本益实业(福建)有限公司 | 一种耐污人造石英石的制造方法 |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder |
Address after: Pu Industrial Park of Quangang District of Quanzhou City, Fujian province 362800 Patentee after: BUNYEE NEW MATERIAL CO.,LTD. Address before: Pu Industrial Park of Quangang District of Quanzhou City, Fujian province 362800 Patentee before: BENYI TECHNOLOGY CO.,LTD. |
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CP01 | Change in the name or title of a patent holder | ||
PE01 | Entry into force of the registration of the contract for pledge of patent right |
Denomination of invention: High-light and anti-fouling artificial quartz stone and preparation method thereof Effective date of registration: 20180418 Granted publication date: 20161214 Pledgee: Bank of Quanzhou branch of the Bank of Quanzhou, Quangang branch Pledgor: BUNYEE NEW MATERIAL CO.,LTD. Registration number: 2018990000300 |
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