CN105144336B - 电子枪、带电粒子枪及利用该电子枪、带电粒子枪的带电粒子束装置 - Google Patents

电子枪、带电粒子枪及利用该电子枪、带电粒子枪的带电粒子束装置 Download PDF

Info

Publication number
CN105144336B
CN105144336B CN201480023185.6A CN201480023185A CN105144336B CN 105144336 B CN105144336 B CN 105144336B CN 201480023185 A CN201480023185 A CN 201480023185A CN 105144336 B CN105144336 B CN 105144336B
Authority
CN
China
Prior art keywords
mentioned
electron
electrode
charged particle
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN201480023185.6A
Other languages
English (en)
Chinese (zh)
Other versions
CN105144336A (zh
Inventor
今井悠太
大岛卓
森下英郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Publication of CN105144336A publication Critical patent/CN105144336A/zh
Application granted granted Critical
Publication of CN105144336B publication Critical patent/CN105144336B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/26—Ion sources; Ion guns using surface ionisation, e.g. field effect ion sources, thermionic ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48—Electron guns
    • H01J29/481—Electron guns using field-emission, photo-emission, or secondary-emission electron source
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10—Lenses
    • H01J37/145—Combinations of electrostatic and magnetic lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/061—Construction
    • H01J2237/062—Reducing size of gun
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06325—Cold-cathode sources
    • H01J2237/06341—Field emission
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/063—Electron sources
    • H01J2237/06375—Arrangement of electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H01J2237/0802—Field ionization sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/15—Means for deflecting or directing discharge
    • H01J2237/1508—Combined electrostatic-electromagnetic means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2007—Holding mechanisms
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2801—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
CN201480023185.6A 2013-04-25 2014-04-14 电子枪、带电粒子枪及利用该电子枪、带电粒子枪的带电粒子束装置 Active CN105144336B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013092484A JP6340165B2 (ja) 2013-04-25 2013-04-25 電子銃、荷電粒子銃およびそれらを用いた荷電粒子線装置
JP2013-092484 2013-04-25
PCT/JP2014/060575 WO2014175087A1 (ja) 2013-04-25 2014-04-14 電子銃、荷電粒子銃およびそれらを用いた荷電粒子線装置

Publications (2)

Publication Number Publication Date
CN105144336A CN105144336A (zh) 2015-12-09
CN105144336B true CN105144336B (zh) 2017-05-03

Family

ID=51791666

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480023185.6A Active CN105144336B (zh) 2013-04-25 2014-04-14 电子枪、带电粒子枪及利用该电子枪、带电粒子枪的带电粒子束装置

Country Status (5)

Country Link
US (1) US9570268B2 (enExample)
JP (1) JP6340165B2 (enExample)
CN (1) CN105144336B (enExample)
DE (1) DE112014002139B4 (enExample)
WO (1) WO2014175087A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108554632A (zh) * 2018-01-08 2018-09-21 合肥工业大学 一种利用电荷施加法对样品颗粒进行静电收集的装置

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9805909B1 (en) * 2016-09-20 2017-10-31 Applied Materials Israel Ltd. Method for detecting voids in interconnects and an inspection system
DE102016015829B4 (de) 2016-12-16 2025-02-20 Ketek Gmbh Vorrichtung zur Erzeugung eines Quellenstroms von Ladungsträgern mittels Feldemission und Verfahren zur Stabilisierung eines mittels eines Feldemissionselements emittierten Quellenstroms von Ladungsträgern
DE102016124673B3 (de) 2016-12-16 2018-05-30 Ketek Gmbh Vorrichtung zur Erzeugung eines Quellenstroms von Ladungsträgern mittels Feldemission und Verfahren zur Stabilisierung eines mittels eines Feldemissionselements emittierten Quellenstroms von Ladungsträgern
US9934933B1 (en) * 2017-01-19 2018-04-03 Kla-Tencor Corporation Extractor electrode for electron source
JP2019003863A (ja) * 2017-06-16 2019-01-10 株式会社島津製作所 電子ビーム装置、ならびに、これを備えるｘ線発生装置および走査電子顕微鏡
CN107768218A (zh) * 2017-09-15 2018-03-06 华中科技大学 一种低能强流栅控电子枪
JP6943701B2 (ja) * 2017-09-15 2021-10-06 日本電子株式会社 冷陰極電界放出型電子銃の調整方法
JP7029933B2 (ja) * 2017-11-02 2022-03-04 日本電子株式会社 電子顕微鏡および電子顕微鏡の制御方法
US10573481B1 (en) * 2018-11-28 2020-02-25 Nuflare Technology, Inc. Electron guns for electron beam tools
WO2020235003A1 (ja) * 2019-05-21 2020-11-26 株式会社日立ハイテク 電子銃および電子銃を備えた荷電粒子線装置
CN110416043B (zh) * 2019-07-15 2021-08-27 中国电子科技集团公司第三十八研究所 一种用于电子源系统的真空结构
US12266500B2 (en) * 2019-12-13 2025-04-01 Hitachi High-Tech Corporation Charged particle gun and charged particle beam device
DE112020006608B4 (de) * 2020-04-07 2025-04-17 Hitachi High-Tech Corporation Ladungsteilchenkanone, ladungsteilchenstrahlsystem und arretierungsmutter
WO2023201580A1 (zh) * 2022-04-20 2023-10-26 华为技术有限公司 电源系统、电子光学镜组和扫描电子显微镜

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5431784B2 (enExample) * 1973-05-31 1979-10-09
JPH0465054A (ja) * 1990-07-04 1992-03-02 Jeol Ltd 電界放射形電子銃
US6288401B1 (en) * 1999-07-30 2001-09-11 Etec Systems, Inc. Electrostatic alignment of a charged particle beam
JP2005235697A (ja) * 2004-02-23 2005-09-02 Hitachi Ltd 荷電粒子ビーム輸送装置及びこれを備えた線形加速器システム
JP2006324119A (ja) * 2005-05-19 2006-11-30 Hitachi Ltd 電子銃
CN1937165A (zh) * 2005-09-21 2007-03-28 株式会社日立高新技术 场致发射型电子枪及使用了该电子枪的电子束装置
CN102668013A (zh) * 2009-11-26 2012-09-12 株式会社日立高新技术 扫描电子显微镜
WO2013027448A1 (ja) * 2011-08-22 2013-02-28 株式会社日立ハイテクノロジーズ 電子銃および荷電粒子線装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5531986B2 (enExample) * 1973-01-19 1980-08-22
JPS5431784A (en) * 1977-08-15 1979-03-08 Tdk Corp Magnetism detecting element
JPS57180059A (en) * 1981-04-17 1982-11-05 Perkin Elmer Corp Field discharge type electron gun for improving converging stability
JPS58146344U (ja) * 1982-03-26 1983-10-01 日本電子株式会社 荷電粒子源
JPS63175323A (ja) * 1987-01-16 1988-07-19 Jeol Ltd 電界放射型電子銃
JPH01187749A (ja) * 1988-01-21 1989-07-27 Jeol Ltd フィールド・エミッション電子銃
JPH071681B2 (ja) * 1990-04-19 1995-01-11 株式会社日立製作所 荷電粒子線装置
JP4538441B2 (ja) * 2003-09-10 2010-09-08 株式会社日立ハイテクノロジーズ 電子線応用装置
JP2005085666A (ja) * 2003-09-10 2005-03-31 Hitachi Displays Ltd フィールドエミッション表示装置
WO2007055154A1 (ja) * 2005-11-08 2007-05-18 Advantest Corporation 電子銃、電子ビーム露光装置及び露光方法
JP5386229B2 (ja) * 2009-05-22 2014-01-15 株式会社日立ハイテクノロジーズ 電子銃
EP2264738B1 (en) * 2009-06-18 2017-12-06 Carl Zeiss NTS Ltd. Electron gun used in a particle beam device
JP5290238B2 (ja) * 2010-05-21 2013-09-18 株式会社日立ハイテクノロジーズ 電子顕微鏡

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5431784B2 (enExample) * 1973-05-31 1979-10-09
JPH0465054A (ja) * 1990-07-04 1992-03-02 Jeol Ltd 電界放射形電子銃
US6288401B1 (en) * 1999-07-30 2001-09-11 Etec Systems, Inc. Electrostatic alignment of a charged particle beam
JP2005235697A (ja) * 2004-02-23 2005-09-02 Hitachi Ltd 荷電粒子ビーム輸送装置及びこれを備えた線形加速器システム
JP2006324119A (ja) * 2005-05-19 2006-11-30 Hitachi Ltd 電子銃
CN1937165A (zh) * 2005-09-21 2007-03-28 株式会社日立高新技术 场致发射型电子枪及使用了该电子枪的电子束装置
CN102668013A (zh) * 2009-11-26 2012-09-12 株式会社日立高新技术 扫描电子显微镜
WO2013027448A1 (ja) * 2011-08-22 2013-02-28 株式会社日立ハイテクノロジーズ 電子銃および荷電粒子線装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108554632A (zh) * 2018-01-08 2018-09-21 合肥工业大学 一种利用电荷施加法对样品颗粒进行静电收集的装置

Also Published As

Publication number Publication date
US20160104597A1 (en) 2016-04-14
DE112014002139T5 (de) 2016-01-14
US9570268B2 (en) 2017-02-14
DE112014002139B4 (de) 2017-05-04
JP6340165B2 (ja) 2018-06-06
WO2014175087A1 (ja) 2014-10-30
JP2014216182A (ja) 2014-11-17
CN105144336A (zh) 2015-12-09

Similar Documents

Publication Publication Date Title
CN105144336B (zh) 电子枪、带电粒子枪及利用该电子枪、带电粒子枪的带电粒子束装置
JP5702552B2 (ja) デュアルビームシステムの制御方法
US12027342B2 (en) Charged particle beam device and axis adjustment method thereof
JP4685115B2 (ja) 電子ビーム露光方法
US8785879B1 (en) Electron beam wafer inspection system and method of operation thereof
CN102315066B (zh) 带电粒子束装置以及试样加工方法
US8933414B2 (en) Focused ion beam low kV enhancement
EP2896062B1 (en) Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
JP6404736B2 (ja) 複合荷電粒子線装置
JP6389569B2 (ja) モノクロメーターおよびこれを備えた荷電粒子線装置
JP2006324119A (ja) 電子銃
US7557346B2 (en) Scanning electron microscope
JP6261228B2 (ja) 集束イオンビーム装置、集束イオン／電子ビーム加工観察装置、及び試料加工方法
JP2007287495A (ja) ２レンズ光学系走査型収差補正集束イオンビーム装置及び３レンズ光学系走査型収差補正集束イオンビーム装置及び２レンズ光学系投影型収差補正イオン・リソグラフィー装置並びに３レンズ光学系投影型収差補正イオン・リソグラフィー装置
JP4128487B2 (ja) 荷電粒子線装置
JP7604603B1 (ja) 対物レンズ及びそれを含む荷電粒子線装置
WO2007040098A1 (ja) 荷電粒子ビーム装置及び荷電粒子ビームの照射方法
JPH0864163A (ja) 荷電粒子ビーム装置
JP2011192456A (ja) 荷電粒子線装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant