CN105118891A - 一种抗氧化正面电极太阳能电池及其制备方法 - Google Patents

一种抗氧化正面电极太阳能电池及其制备方法 Download PDF

Info

Publication number
CN105118891A
CN105118891A CN201510507896.7A CN201510507896A CN105118891A CN 105118891 A CN105118891 A CN 105118891A CN 201510507896 A CN201510507896 A CN 201510507896A CN 105118891 A CN105118891 A CN 105118891A
Authority
CN
China
Prior art keywords
solar cell
secondary grid
front electrode
preparation
silicon chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201510507896.7A
Other languages
English (en)
Inventor
石强
秦崇德
方结彬
黄玉平
何达能
陈刚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Guangdong Aiko Solar Energy Technology Co Ltd
Original Assignee
Guangdong Aiko Solar Energy Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Guangdong Aiko Solar Energy Technology Co Ltd filed Critical Guangdong Aiko Solar Energy Technology Co Ltd
Priority to CN201510507896.7A priority Critical patent/CN105118891A/zh
Publication of CN105118891A publication Critical patent/CN105118891A/zh
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0216Coatings
    • H01L31/02161Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02167Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0216Coatings
    • H01L31/02161Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02167Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H01L31/02168Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
    • H01L31/068Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/186Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
    • H01L31/1868Passivation
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Sustainable Development (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Energy (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Photovoltaic Devices (AREA)

Abstract

本发明公开了一种抗氧化正面电极太阳能电池的制备方法,包括如下步骤:a)对硅片依次进行制绒、热扩散制p-n结和去磷硅玻璃;b)在硅片正面的N+层表面丝网印刷若干条副栅线并烧结;c)用PECVD设备在硅片正面沉积SiNx减反膜,SiNx减反膜覆盖硅片正面100%的面积,将若干条副栅线和N+层表面完全覆盖;d)在硅片背面的P型硅表面丝网印刷Al背场和Ag背电极;e)在SiNx减反膜表面丝网印刷若干条主栅线;f)对硅片进行高温烧结。本发明具有副栅线隔绝外界的氧气,有效保护正面电极,同时提高了SiNx减反膜的有效面积,提高表面钝化效果的优点。本发明还提供一种低反射率晶体硅太阳能电池。

Description

一种抗氧化正面电极太阳能电池及其制备方法
技术领域
本发明涉及太阳能电池技术领域,尤其涉及一种抗氧化正面电极太阳能电池及其制备方法。
背景技术
晶硅太阳能电池占据太阳能电池90%以上的市场份额,其在光伏产业中具有举足轻重的地位。在晶硅太阳能电池的生产过程中,金属电极的制备对电池的转换效率和制造成本的影响特别大,是晶硅太阳能电池制备中最关键的工序。如图1所示的现有技术的太阳能电池的结构示意图,太阳能电池结构从下往上依次为Ag背电极1′、Al背电场2′、P型硅3′、N+层4′、SiNx减反膜5′和Ag正电极6′;Ag正电极6′分为主栅线和副栅线,且垂直交叉,其都会烧穿SiNx减反膜和N+层实现欧姆接触,Ag正电极6′的主栅线和副栅线全部裸露在空气中,极容易被氧化,导致电池转换效率和组件的实际发电量下降。不仅影响电池片的外观,对电池的转换效率,组件的可靠性都有不利的影响。
太阳能电池的正面电极为Ag金属,采用主栅线和副栅线垂直分布的形式。Ag栅线在空气容易氧化,电池片的制备、电池片运输、电池片储存、组件的封装及组件在户外发电过程中,Ag栅线都不可避免的和氧气接触,Ag的氧化会不断加剧,会直接导致太阳能电池组件的发电量下降。因此,如何开发一种太阳能电池,能够避免正面电极的氧化,且能提升电池的转换效率,成为研究者重点关注的领域。
发明内容
本发明所要解决的技术问题在于,提供一种够避免正面电极的氧化的抗氧化正面电极太阳能电池及其制备方法。
为了解决上述技术问题,本发明提供了一种抗氧化正面电极太阳能电池的制备方法,包括如下步骤:
a)对硅片依次进行制绒、热扩散制p-n结和去磷硅玻璃;
b)在硅片正面的N+层表面丝网印刷若干条副栅线并烧结;
c)用PECVD设备在硅片正面沉积SiNx减反膜,SiNx减反膜覆盖硅片正面100%的面积,将若干条副栅线和N+层表面完全覆盖;
d)在硅片背面的P型硅表面丝网印刷Al背场和Ag背电极;
e)在SiNx减反膜表面丝网印刷若干条主栅线;
f)对硅片进行高温烧结。
与现有技术相比,本发明具有如下有益效果:由于先制备副栅线,然后用SiNx减反膜覆盖硅片正面100%的面积,将若干条副栅线和N+层表面完全覆盖,对副栅线进行保护,具有副栅线隔绝外界的氧气,有效保护正面电极,同时提高了SiNx减反膜的有效面积,提高表面钝化效果的优点。
所述副栅线材质为Ag。
所述副栅线中Ag质量分数为96-100%。
由于副栅线中Ag质量分数为96-100%,其Ag质量分数高,不含有破坏N+层的成分,具有在高温烧结过程中不会破坏所述N+层的优点。
所述主栅线材质为Ag。
所述主栅线中Ag质量分数为90-95%,高温烧结后所述主栅线会烧穿所述SiNx减反膜与所述硅片正面的N+层形成欧姆接触。
由于主栅线中Ag质量分数为90-95%,其Ag质量分数高,不含有破坏N+层的成分,具有在高温烧结过程中不会破坏所述N+层的优点。
在步骤c)中,在硅片正面沉积SiNx减反膜前有预放电过程,该过程如下:往PECVD设备充入NH3/N2,流量分别为3-10L/Min和1-5L/Min,开启射频电源,射频电源功率3500-5000W,预放电时间120-300s。
所述主栅线数量为3条,副栅线97条。
所述主栅线数量为4条,副栅线103条。
相应地,本发明还提供一种低反射率晶体硅太阳能电池,其由上述的制备方法制得,抗氧化正面电极太阳能电池包括从下往上依次连接的Ag背电极、Al背电场、P型硅、N+层、SiNx减反膜和Ag正电极,Ag正电极包括若干条主栅线和若干条副栅线,SiNx减反膜覆盖硅片正面100%的面积,将若干条副栅线和N+层表面完全覆盖。
附图说明
图1是现有技术的太阳能电池的结构示意图;
图2是本发明的一种抗氧化正面电极太阳能电池的制备方法流程图;
图3是本发明的一种抗氧化正面电极太阳能电池的结构示意图;
图4是图3沿A-A向结构示意图。
具体实施方式
为使本发明的目的、技术方案和优点更加清楚,下面将结合附图对本发明作进一步地详细描述。
如图2所示,本发明的一种抗氧化正面电极太阳能电池的制备方法,包括如下步骤:
步骤11:对硅片依次进行制绒、热扩散制p-n结和去磷硅玻璃;
步骤12:在硅片正面的N+层表面丝网印刷多条副栅线并烧结;
步骤13:用PECVD设备在硅片正面沉积SiNx减反膜,SiNx减反膜覆盖硅片正面100%的面积,将若干条副栅线和N+层表面完全覆盖;
步骤14:在硅片背面的P型硅表面丝网印刷Al背场和Ag背电极;
步骤15:在SiNx减反膜表面丝网印刷多条主栅线;
步骤16:对硅片进行高温烧结。
与现有技术相比,本发明具有如下有益效果:由于先制备副栅线,然后用SiNx减反膜覆盖硅片正面100%的面积,将若干条副栅线和N+层表面完全覆盖,对副栅线进行保护,具有副栅线隔绝外界的氧气,有效保护正面电极,同时提高了SiNx减反膜的有效面积,提高表面钝化效果的优点。
在步骤c)中,在硅片正面沉积SiNx减反膜前有预放电过程,该过程如下:往PECVD设备中充入NH3/N2,NH3流量为3-10L/Min和N2流量为1-5L/Min,开启射频电源,射频电源功率3500-5000W,预放电时间120-300s。
副栅线材质为Ag,所述副栅线中Ag质量分数为96-100%,具体的副栅线中Ag质量分数为96%、97%、98%、99%、100%,但不限于此。Ag质量分数高,不含有破坏N+层的成分,具有在高温烧结过程中不会破坏所述N+层的优点。而现有技术的Ag正电极的副栅线通过穿透SiNx减反膜和N+层接触,副栅线和N+层的接触电阻偏大;本实施例的副栅线是和N+层直接接触,可以大大降低接触电阻,提高电池转换效率。
主栅线材质为Ag,所述主栅线中Ag质量分数为90-95%,高温烧结后所述主栅线会烧穿所述SiNx减反膜与所述N+层结形成欧姆接触,具体的主栅线中Ag质量分数为90%、91%、92%、93%、94%、95%,但不限于此。Ag质量分数高,不含有破坏N+层的成分,具有在高温烧结过程中不会破坏所述N+层的优点。
不同的主栅线和副栅线数量搭配得到的电池的外观和电学性能不同,可设置主栅线数量为3条,副栅线97条;也可设置主栅线数量为4条,副栅线数量为103条,电池转换效率相对主栅线数量为3条,副栅线数量为97条时有0.2-0.3%的提升。
本发明的一种抗氧化正面电极太阳能电池,是由上述的制备方法制得。如图3、图4所示,抗氧化正面电极太阳能电池包括从下往上依次连接的Ag背电极1、Al背电场2、P型硅3、N+层4、SiNx减反膜5和Ag正电极6,Ag正电极6包括多条主栅线61和多条副栅线62,SiNx减反膜5覆盖硅片正面100%的面积,将多条副栅线62和N+层4表面完全覆盖,SiNx减反膜5对多条副栅线62进行保护,具有副栅线62隔绝外界的氧气,有效保护正面电极,同时提高了SiNx减反膜5的有效面积,提高表面钝化效果的优点。主栅线61暴露在外,是为了太阳能电池组件的焊接。
以上所述是本发明的优选实施方式,应当指出,对于本技术领域的普通技术人员来说,在不脱离本发明原理的前提下,还可以做出若干改进和润饰,这些改进和润饰也视为本发明的保护范围。

Claims (9)

1.一种抗氧化正面电极太阳能电池的制备方法,其特征在于,包括如下步骤:
a)对硅片依次进行制绒、热扩散制p-n结和去磷硅玻璃;
b)在硅片正面的N+层表面丝网印刷若干条副栅线并烧结;
c)用PECVD设备在硅片正面沉积SiNx减反膜,SiNx减反膜覆盖硅片正面100%的面积,将若干条副栅线和N+层表面完全覆盖;
d)在硅片背面的P型硅表面丝网印刷Al背场和Ag背电极;
e)在SiNx减反膜表面丝网印刷若干条主栅线;
f)对硅片进行高温烧结。
2.如权利要求1所述的一种抗氧化正面电极太阳能电池的制备方法,其特征在于,所述副栅线材质为Ag。
3.如权利要求2所述的一种抗氧化正面电极太阳能电池的制备方法,其特征在于,所述副栅线中Ag质量分数为96-100%。
4.如权利要求1所述的一种抗氧化正面电极太阳能电池的制备方法,其特征在于,所述主栅线材质为Ag。
5.如权利要求4所述的一种抗氧化正面电极太阳能电池的制备方法,其特征在于,所述主栅线中Ag质量分数为90-95%,高温烧结后所述主栅线会烧穿所述SiNx减反膜与所述硅片正面的N+层形成欧姆接触。
6.如权利要求1所述的一种抗氧化正面电极太阳能电池的制备方法,其特征在于,在步骤c)中,在硅片正面的N+层表面沉积SiNx减反膜前有预放电过程,该过程如下:往PECVD设备充入NH3/N2,流量分别为3-10L/Min和1-5L/Min,开启射频电源,射频电源功率3500-5000W,预放电时间120-300s。
7.如权利要求1所述的一种抗氧化正面电极太阳能电池的制备方法,其特征在于,所述主栅线数量为3条,副栅线97条。
8.如权利要求1所述的一种抗氧化正面电极太阳能电池的制备方法,其特征在于,所述主栅线数量为4条,副栅线103条。
9.一种抗氧化正面电极太阳能电池,其特征在于,其由权利要求1-8任一项所述的制备方法制得,抗氧化正面电极太阳能电池包括从下往上依次连接的Ag背电极、Al背电场、P型硅、N+层、SiNx减反膜和Ag正电极,Ag正电极包括若干条主栅线和若干条副栅线,SiNx减反膜覆盖硅片正面100%的面积,将若干条副栅线和N+层表面完全覆盖。
CN201510507896.7A 2015-08-18 2015-08-18 一种抗氧化正面电极太阳能电池及其制备方法 Pending CN105118891A (zh)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201510507896.7A CN105118891A (zh) 2015-08-18 2015-08-18 一种抗氧化正面电极太阳能电池及其制备方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201510507896.7A CN105118891A (zh) 2015-08-18 2015-08-18 一种抗氧化正面电极太阳能电池及其制备方法

Publications (1)

Publication Number Publication Date
CN105118891A true CN105118891A (zh) 2015-12-02

Family

ID=54666835

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201510507896.7A Pending CN105118891A (zh) 2015-08-18 2015-08-18 一种抗氧化正面电极太阳能电池及其制备方法

Country Status (1)

Country Link
CN (1) CN105118891A (zh)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105856807A (zh) * 2016-04-06 2016-08-17 广东爱康太阳能科技有限公司 一种晶体硅太阳能电池两次印刷设备、印刷工艺及其电池
CN106653949A (zh) * 2016-12-29 2017-05-10 浙江晶科能源有限公司 一种太阳能电池及其制备方法
CN109285895A (zh) * 2017-07-20 2019-01-29 奥特斯维能源(太仓)有限公司 一种测试标片制作方法及测试标片
CN110164985A (zh) * 2019-06-04 2019-08-23 苏州腾晖光伏技术有限公司 一种太阳能电池及其制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101834230A (zh) * 2010-04-30 2010-09-15 中山大学 一种采用掩模制备保护太阳电池细栅线金属电极的彩色薄膜的方法
CN103337553A (zh) * 2013-06-04 2013-10-02 南京日托光伏科技有限公司 一种薄膜覆盖正面电极的硅太阳能电池及其制造工艺
US20140272623A1 (en) * 2013-03-15 2014-09-18 Sunpower Technologies Llc System for increasing efficiency of semiconductor photocatalysts employing a high surface area substrate

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101834230A (zh) * 2010-04-30 2010-09-15 中山大学 一种采用掩模制备保护太阳电池细栅线金属电极的彩色薄膜的方法
US20140272623A1 (en) * 2013-03-15 2014-09-18 Sunpower Technologies Llc System for increasing efficiency of semiconductor photocatalysts employing a high surface area substrate
CN103337553A (zh) * 2013-06-04 2013-10-02 南京日托光伏科技有限公司 一种薄膜覆盖正面电极的硅太阳能电池及其制造工艺

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105856807A (zh) * 2016-04-06 2016-08-17 广东爱康太阳能科技有限公司 一种晶体硅太阳能电池两次印刷设备、印刷工艺及其电池
CN106653949A (zh) * 2016-12-29 2017-05-10 浙江晶科能源有限公司 一种太阳能电池及其制备方法
CN109285895A (zh) * 2017-07-20 2019-01-29 奥特斯维能源(太仓)有限公司 一种测试标片制作方法及测试标片
CN110164985A (zh) * 2019-06-04 2019-08-23 苏州腾晖光伏技术有限公司 一种太阳能电池及其制备方法

Similar Documents

Publication Publication Date Title
CN109728103A (zh) 太阳能电池
CN106601855A (zh) 一种双面发电异质结太阳能电池的制备方法
CN104091842B (zh) 分布式局域硼掺杂的双面感光晶体硅太阳电池及其制备方法
CN104157717B (zh) 一种全背电极n型晶硅异质结太阳电池的制备方法
CN105390555A (zh) 全背极太阳电池结构及其制备方法
TWI536597B (zh) A low cost, suitable for mass production of back contact with the battery production methods
CN105118891A (zh) 一种抗氧化正面电极太阳能电池及其制备方法
CN209056507U (zh) 一种mwt异质结硅太阳电池
CN103367540A (zh) 背钝化太阳能电池及其制作方法
CN102751371A (zh) 一种太阳能薄膜电池及其制造方法
CN109473493A (zh) 一种mwt异质结硅太阳电池及其制备方法
CN102201460A (zh) 一种新型的晶体硅太阳能电池及其制备方法
CN105449018A (zh) 一种太阳能电池及其制备方法
CN105390566B (zh) 一种倒装太阳能电池芯片制造方法
CN103022174B (zh) 一种基于n型硅片的金属贯穿式背发射极晶硅太阳电池及其制备方法
US20180294367A1 (en) Back contact solar cell substrate, method of manufacturing the same and back contact solar cell
CN105118874A (zh) 一种晶体硅太阳能电池及其制作方法
CN103009789B (zh) 一种太阳能电池片及其印刷丝网
CN103618029A (zh) 一种背钝化mwt光伏电池的制造方法
CN204102912U (zh) 一种石墨烯硅太阳电池
CN205231078U (zh) 全背极太阳电池结构
CN204857750U (zh) 一种新型太阳能电池板
CN103311367A (zh) 一种晶体硅太阳能电池的制备方法
CN206441744U (zh) 具有环形绝缘层结构的石墨烯硅基太阳能电池
CN204118083U (zh) 一种Cu电极太阳能电池

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20151202