CN105105779B - 高深宽比x射线标靶及其用途 - Google Patents

高深宽比x射线标靶及其用途 Download PDF

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Publication number
CN105105779B
CN105105779B CN201510398704.3A CN201510398704A CN105105779B CN 105105779 B CN105105779 B CN 105105779B CN 201510398704 A CN201510398704 A CN 201510398704A CN 105105779 B CN105105779 B CN 105105779B
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China
Prior art keywords
ray
structures
hadamard matrix
aspect ratio
hadamard
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Chinese (zh)
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CN105105779A (zh
Inventor
N·W·帕克
M·W·乌特劳特
L·F·T·夸曼
T·G·米勒
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FEI Co
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FEI Co
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
    • G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
    • G01N23/046—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material using tomography, e.g. computed tomography [CT]
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—HANDLING OF PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/04—Electrodes ; Mutual position thereof; Constructional adaptations therefor
    • H01J35/08—Anodes; Anti cathodes
    • H01J35/112—Non-rotating anodes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/20—Sources of radiation
    • G01N2223/204—Sources of radiation source created from radiated target
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/419—Imaging computed tomograph
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/081—Target material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2235/00—X-ray tubes
    • H01J2235/08—Targets (anodes) and X-ray converters
    • H01J2235/086—Target geometry
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J35/00—X-ray tubes
    • H01J35/02—Details
    • H01J35/14—Arrangements for concentrating, focusing, or directing the cathode ray
    • H01J35/147—Spot size control

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  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Pulmonology (AREA)
  • Radiology & Medical Imaging (AREA)
  • Pathology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Immunology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • X-Ray Techniques (AREA)
CN201510398704.3A 2014-04-18 2015-04-17 高深宽比x射线标靶及其用途 Expired - Fee Related CN105105779B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201461981330P 2014-04-18 2014-04-18
US61/981330 2014-04-18
US14/645,689 US9934930B2 (en) 2014-04-18 2015-03-12 High aspect ratio x-ray targets and uses of same
US14/645689 2015-03-12

Publications (2)

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CN105105779A CN105105779A (zh) 2015-12-02
CN105105779B true CN105105779B (zh) 2020-02-14

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Family Applications (1)

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CN201510398704.3A Expired - Fee Related CN105105779B (zh) 2014-04-18 2015-04-17 高深宽比x射线标靶及其用途

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US (2) US9934930B2 (cg-RX-API-DMAC10.html)
JP (1) JP6499498B2 (cg-RX-API-DMAC10.html)
CN (1) CN105105779B (cg-RX-API-DMAC10.html)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20150117599A1 (en) * 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
US10295485B2 (en) 2013-12-05 2019-05-21 Sigray, Inc. X-ray transmission spectrometer system
USRE48612E1 (en) 2013-10-31 2021-06-29 Sigray, Inc. X-ray interferometric imaging system
CN107209944B (zh) 2014-08-16 2021-08-10 Fei公司 在容器中成像的样品微层析成像中的射束硬化伪像的校正
US10520454B2 (en) 2017-05-02 2019-12-31 Fei Company Innovative X-ray source for use in tomographic imaging
EP3413691A1 (en) * 2017-06-08 2018-12-12 Koninklijke Philips N.V. Apparatus for generating x-rays
JP7046746B2 (ja) * 2017-07-11 2022-04-04 エフ イー アイ カンパニ X線生成のための薄片成形されたターゲット
US10566170B2 (en) * 2017-09-08 2020-02-18 Electronics And Telecommunications Research Institute X-ray imaging device and driving method thereof
JP2021082374A (ja) * 2018-03-09 2021-05-27 国立大学法人東北大学 位相イメージング用x線発生装置
US10468230B2 (en) * 2018-04-10 2019-11-05 Bae Systems Information And Electronic Systems Integration Inc. Nondestructive sample imaging
WO2019236384A1 (en) 2018-06-04 2019-12-12 Sigray, Inc. Wavelength dispersive x-ray spectrometer
DE112019003777B4 (de) 2018-07-26 2025-09-11 Sigray, Inc. Röntgenreflexionsquelle mit hoher helligkeit
US10656105B2 (en) * 2018-08-06 2020-05-19 Sigray, Inc. Talbot-lau x-ray source and interferometric system
CN109255818B (zh) * 2018-08-12 2021-05-28 浙江农林大学 一种新型标靶及其亚像素级角点的提取方法
CN112638261B (zh) 2018-09-04 2025-06-27 斯格瑞公司 利用滤波的x射线荧光的系统和方法
US11056308B2 (en) 2018-09-07 2021-07-06 Sigray, Inc. System and method for depth-selectable x-ray analysis
US11152183B2 (en) 2019-07-15 2021-10-19 Sigray, Inc. X-ray source with rotating anode at atmospheric pressure
US11340179B2 (en) 2019-10-21 2022-05-24 Bae Systems Information And Electronic System Integration Inc. Nanofabricated structures for sub-beam resolution and spectral enhancement in tomographic imaging
US11996259B2 (en) * 2019-10-24 2024-05-28 Nova Measuring Instruments Inc. Patterned x-ray emitting target
US12046442B2 (en) 2020-12-31 2024-07-23 VEC Imaging GmbH & Co. KG Hybrid multi-source x-ray source and imaging system
WO2023137334A1 (en) 2022-01-13 2023-07-20 Sigray, Inc. Microfocus x-ray source for generating high flux low energy x-rays
US12360067B2 (en) 2022-03-02 2025-07-15 Sigray, Inc. X-ray fluorescence system and x-ray source with electrically insulative target material
US12181423B1 (en) 2023-09-07 2024-12-31 Sigray, Inc. Secondary image removal using high resolution x-ray transmission sources

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3610984A (en) * 1967-12-28 1971-10-05 Tokyo Shibaura Electric Co Rotating-anode x-ray tube with multiple focal areas
US6545790B2 (en) * 1999-11-08 2003-04-08 Ralph W. Gerchberg System and method for recovering phase information of a wave front
JP3847134B2 (ja) * 2001-10-19 2006-11-15 三井造船株式会社 放射線検出装置
US6793039B2 (en) * 2002-03-13 2004-09-21 Jerome R. Schmid, Jr. Submerged water activity platform
US6947522B2 (en) * 2002-12-20 2005-09-20 General Electric Company Rotating notched transmission x-ray for multiple focal spots
US6950495B2 (en) * 2003-12-01 2005-09-27 The Boeing Company Backscatter imaging using Hadamard transform masking
WO2007033060A1 (en) * 2005-09-12 2007-03-22 Board Of Regents Of The Nevada System Of Higher Education, On Behalf Of The University Of Nevada, Reno Targets and processes for fabricating same
CN101467071B (zh) * 2006-04-21 2012-06-13 美国科技工程公司 使用分立源阵列和多个准直束的对于行李和人员的x射线成像
EP2076793B1 (en) * 2006-10-24 2016-01-06 Thermo Scientific Portable Analytical Instruments Inc. Apparatus for inspecting objects using coded beam
KR20100071564A (ko) * 2008-12-19 2010-06-29 삼성전기주식회사 엑스선 튜브
EP2411997A1 (en) * 2009-03-27 2012-02-01 Koninklijke Philips Electronics N.V. Structured electron emitter for coded source imaging with an x-ray tube
US20150117599A1 (en) 2013-10-31 2015-04-30 Sigray, Inc. X-ray interferometric imaging system
JP6202484B2 (ja) * 2012-08-10 2017-09-27 国立研究開発法人物質・材料研究機構 中性子撮像装置及びその使用方法
JP2014038742A (ja) * 2012-08-13 2014-02-27 Tokyo Electron Ltd X線発生用ターゲットの製造方法、及びx線発生用ターゲット
US20150092924A1 (en) 2013-09-04 2015-04-02 Wenbing Yun Structured targets for x-ray generation
US9874531B2 (en) 2013-10-31 2018-01-23 Sigray, Inc. X-ray method for the measurement, characterization, and analysis of periodic structures
EP3171163B1 (en) * 2015-11-18 2022-05-04 FEI Company X-ray imaging technique

Also Published As

Publication number Publication date
JP6499498B2 (ja) 2019-04-10
CN105105779A (zh) 2015-12-02
US20180190467A1 (en) 2018-07-05
JP2015207559A (ja) 2015-11-19
US20150303021A1 (en) 2015-10-22
US10366860B2 (en) 2019-07-30
US9934930B2 (en) 2018-04-03

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