CN105094051A - 运动平台系统的平面定位补偿方法 - Google Patents
运动平台系统的平面定位补偿方法 Download PDFInfo
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- CN105094051A CN105094051A CN201410150200.5A CN201410150200A CN105094051A CN 105094051 A CN105094051 A CN 105094051A CN 201410150200 A CN201410150200 A CN 201410150200A CN 105094051 A CN105094051 A CN 105094051A
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- motion platform
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- 238000000034 method Methods 0.000 title claims abstract description 21
- 238000005259 measurement Methods 0.000 claims abstract description 14
- 238000003909 pattern recognition Methods 0.000 claims abstract description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000007812 deficiency Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
Classifications
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/404—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for compensation, e.g. for backlash, overshoot, tool offset, tool wear, temperature, machine construction errors, load, inertia
Abstract
Description
Claims (7)
Priority Applications (1)
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CN201410150200.5A CN105094051B (zh) | 2014-04-15 | 2014-04-15 | 运动平台系统的平面定位补偿方法 |
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CN201410150200.5A CN105094051B (zh) | 2014-04-15 | 2014-04-15 | 运动平台系统的平面定位补偿方法 |
Publications (2)
Publication Number | Publication Date |
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CN105094051A true CN105094051A (zh) | 2015-11-25 |
CN105094051B CN105094051B (zh) | 2018-03-09 |
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CN201410150200.5A Active CN105094051B (zh) | 2014-04-15 | 2014-04-15 | 运动平台系统的平面定位补偿方法 |
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CN (1) | CN105094051B (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107993958A (zh) * | 2017-12-06 | 2018-05-04 | 江苏维普光电科技有限公司 | 半导体缺陷检测/光刻中的正交性补偿方法及补偿系统 |
CN108303023A (zh) * | 2018-01-22 | 2018-07-20 | 合肥芯碁微电子装备有限公司 | 一种超精密二维运动平台系统位置精度补偿的方法 |
CN109813214A (zh) * | 2017-11-20 | 2019-05-28 | 大族激光科技产业集团股份有限公司 | 一种快速测量十字运动平台二维定位误差的方法及装置 |
CN111661589A (zh) * | 2019-03-05 | 2020-09-15 | 大族激光科技产业集团股份有限公司 | 一种基于图像定位的运动平台校正方法及装置 |
CN112486093A (zh) * | 2020-10-29 | 2021-03-12 | 钧迪智能装备科技(苏州)有限公司 | 平台精度的补偿方法、装置、设备和介质 |
Citations (4)
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WO1992009021A1 (en) * | 1990-11-08 | 1992-05-29 | Fanuc Ltd | Method of evaluating operating accuracy in numerically controlled machine |
US5523663A (en) * | 1992-05-15 | 1996-06-04 | Tsubakimoto Chain Co. | Method for controlling a manipulator relative to a moving workpiece |
CN101561638A (zh) * | 2008-04-18 | 2009-10-21 | Asml荷兰有限公司 | 台系统校准方法、台系统和包括这样的台系统的光刻设备 |
CN103197599A (zh) * | 2013-03-25 | 2013-07-10 | 东华大学 | 基于机器视觉的数控工作台误差自校正系统及方法 |
-
2014
- 2014-04-15 CN CN201410150200.5A patent/CN105094051B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1992009021A1 (en) * | 1990-11-08 | 1992-05-29 | Fanuc Ltd | Method of evaluating operating accuracy in numerically controlled machine |
US5523663A (en) * | 1992-05-15 | 1996-06-04 | Tsubakimoto Chain Co. | Method for controlling a manipulator relative to a moving workpiece |
CN101561638A (zh) * | 2008-04-18 | 2009-10-21 | Asml荷兰有限公司 | 台系统校准方法、台系统和包括这样的台系统的光刻设备 |
CN103197599A (zh) * | 2013-03-25 | 2013-07-10 | 东华大学 | 基于机器视觉的数控工作台误差自校正系统及方法 |
Non-Patent Citations (3)
Title |
---|
兰弼: "基于激光干涉仪的影像测量仪定位误差和补偿的研究", 《煤矿机械》 * |
董永谦: "高速精密运动平台研制", 《电子工艺技术》 * |
赵耀: "影像处理刀具测量仪标定", 《大连工业大学学报》 * |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109813214A (zh) * | 2017-11-20 | 2019-05-28 | 大族激光科技产业集团股份有限公司 | 一种快速测量十字运动平台二维定位误差的方法及装置 |
CN109813214B (zh) * | 2017-11-20 | 2021-09-03 | 大族激光科技产业集团股份有限公司 | 一种快速测量十字运动平台二维定位误差的方法及装置 |
CN107993958A (zh) * | 2017-12-06 | 2018-05-04 | 江苏维普光电科技有限公司 | 半导体缺陷检测/光刻中的正交性补偿方法及补偿系统 |
CN107993958B (zh) * | 2017-12-06 | 2021-04-02 | 江苏维普光电科技有限公司 | 半导体缺陷检测/光刻中的正交性补偿方法及补偿系统 |
CN108303023A (zh) * | 2018-01-22 | 2018-07-20 | 合肥芯碁微电子装备有限公司 | 一种超精密二维运动平台系统位置精度补偿的方法 |
CN111661589A (zh) * | 2019-03-05 | 2020-09-15 | 大族激光科技产业集团股份有限公司 | 一种基于图像定位的运动平台校正方法及装置 |
CN112486093A (zh) * | 2020-10-29 | 2021-03-12 | 钧迪智能装备科技(苏州)有限公司 | 平台精度的补偿方法、装置、设备和介质 |
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Publication number | Publication date |
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CN105094051B (zh) | 2018-03-09 |
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Denomination of invention: Planar positioning compensation method for motion platform system Effective date of registration: 20190121 Granted publication date: 20180309 Pledgee: Shanghai Xingcheng Investment Management Co.,Ltd. Pledgor: RAINTREE SCIENTIFIC INSTRUMENTS (SHANGHAI) Corp. Registration number: 2019310000002 |
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Date of cancellation: 20190701 Granted publication date: 20180309 Pledgee: Shanghai Xingcheng Investment Management Co.,Ltd. Pledgor: RAINTREE SCIENTIFIC INSTRUMENTS (SHANGHAI) Corp. Registration number: 2019310000002 |
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Denomination of invention: Planar positioning compensation method for motion platform system Effective date of registration: 20190710 Granted publication date: 20180309 Pledgee: Shanghai Pudong Emerging Industry Investment Co.,Ltd. Pledgor: RAINTREE SCIENTIFIC INSTRUMENTS (SHANGHAI) Corp. Registration number: 2019310000040 |
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Date of cancellation: 20230724 Granted publication date: 20180309 Pledgee: Shanghai Pudong Emerging Industry Investment Co.,Ltd. Pledgor: RAINTREE SCIENTIFIC INSTRUMENTS (SHANGHAI) Corp. Registration number: 2019310000040 |
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