CN105092187A - Measurement apparatus and method for minimum vacuum leak rate - Google Patents
Measurement apparatus and method for minimum vacuum leak rate Download PDFInfo
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- CN105092187A CN105092187A CN201510410380.0A CN201510410380A CN105092187A CN 105092187 A CN105092187 A CN 105092187A CN 201510410380 A CN201510410380 A CN 201510410380A CN 105092187 A CN105092187 A CN 105092187A
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Abstract
The invention discloses a measurement apparatus and method for a minimum vacuum leak rate. According to the method, a calibration chamber pressure is maintained to a background pressure and measurement and calculation are carried out to obtain a rise rate R0 of a background ion current of the calibration chamber; a calibrated vacuum standard leak hole flow is introduced into the calibration chamber to carry out static accumulation, and measurement and calculation are carried out to obtain a rise rate RL of an ion current containing the calibrated vacuum standard leak hole flow and the background; a standard flow of a known floe QS is led into the calibration chamber to carry out static accumulation, and measurement and calculation are carried out to obtain a rise rate RS of an ion current containing the standard flow and the background; and then a leak rate QL of the calibrated vacuum standard leak hole is calculated based on a formula: QL/QS=(RL-R0)/(RS-R0). With the method, flow conductance ratio measurement can be avoided. The method and apparatus are suitable for measurement and calibration of a minimum vacuum leak rate; and thus the measurement and calibration lower limits of the minimum vacuum leak rate are extended and a foundation is provided for precise measurement and calibration of a minimum vacuum leak rate less than 1*10<9>Pa.m<3>/s.
Description
Technical field
The invention belongs to fields of measurement, relate to minimum vacuum leakage rate measurement technology, particularly relate to and adopt static cumulative method to realize the device and method accurately measured minimum vacuum leak rate.
Background technology
In Measurement Laboratory, high-precision gas micro-flowmeter is mostly adopted to measure and provide known gas flow.High-precision gas micro-flowmeter multiselect Constant Pressure Flowmeter and constant conductance method gas micro-flowmeter, its measurement range is (1 × 10
-9~ 1 × 10
-4) Pam
3/ s.When adopting dynamic flow method calibration, due to the impact by gas micro-flowmeter inner-walls of duct venting effect, the measurement lower limit of flow is only 1 × 10
-9pam
3/ s, therefore cannot realize the calibration to minimum vacuum leak rate with existing gas micro-flowmeter.
Document " Li get Tian, Li Zhenghai, Guo Meiru, etc. the development of superelevation/extra-high vacuum calibrating installation. vacuum science and technology journal 26 (2), 2007. " describe a kind of new method-shunting calibrated extreme high vacuum gauge at present and adopt.Shunting is that the known mass flow gas inject that Constant Pressure Flowmeter or constant conductance method gas micro-flowmeter provided is to diffluence room, gas flow is diverted to extra-high vacuum calibration chamber and ultrahigh vacuum calibration chamber by the aperture differed greatly by two conductances in diffluence room again, so little partial discharge flows into extra-high vacuum calibration chamber, overwhelming majority traffic flow enters ultrahigh vacuum calibration chamber, thus extends calibration lower limit.
No matter be shunting or dynamic flow method, all need the conductance ratio measuring two apertures in diffluence room, the measurement of conductance ratio can cause larger uncertainty of measurement.And when vacuum leak rate is minimum, mass spectrograph cannot be distinguished and be calibrated ion current from background ions stream, uncertainty of measurement also can be caused comparatively large, even cannot complete measurement.
Summary of the invention
In view of this, the invention provides a kind of minimum vacuum leakage rate measurement device and method, avoid measuring conductance ratio, be applicable to the testing and calibration to minimum vacuum leak rate, thus extend minimum vacuum leakage rate measurement and calibration lower limit, for realizing being less than 1 × 10
-9pam
3the accurate testing and calibration of/s minimum vacuum leak rate provides the foundation.
In order to solve the problems of the technologies described above, the present invention is achieved in that
A kind of minimum vacuum leakage rate measurement method, comprising:
Step one, maintain calibration chamber pressure to background pressure, the background ions stream of Measurement and calibration room, and then calculate the escalating rate R obtaining background ions stream
0;
Step 2, calibration chamber will be introduced by school vacuum standard small opening flow, carry out static buildup, the current ion current in Measurement and calibration room in accumulation, namely containing by the ion current of school vacuum standard small opening and background; The ion current data utilizing this step to measure to obtain calculate and obtain containing by the escalating rate R of the ion current of school vacuum standard small opening and background
l;
Step 3, pass into known mass flow Q to calibration chamber
snormal flow, carry out static buildup, the current ion current in Measurement and calibration room in accumulation, namely containing the ion current of normal flow and background; The ion current data utilizing this step to measure to obtain calculate the escalating rate R of the ion current obtained containing normal flow and background
s;
Step 4, by (1) formula calculate by the leak rate Q of school vacuum standard small opening
l:
In the pick-up unit that the method adopts, flowmeter is connected with calibration chamber by the first valve, extra-high vacuum unit of bleeding is connected with calibration chamber by the 4th valve, be connected with calibration chamber by the second valve by school vacuum standard small opening, nonevaporable getter pump is connected with calibration chamber by the 3rd valve, mass spectrograph is connected with calibration chamber, and pressure gauge is connected with calibration chamber;
Described step one specifically comprises sub-step 11 ~ 14:
Sub-step 11, open the 4th valve, other valve closings; Start extra-high vacuum to bleed unit, start to bleed to calibration chamber, in pumping process, bakeout degassing is carried out to this pick-up unit entirety; Carry out vacuum measurement with pressure gauge, make calibration chamber reach background pressure until bleed, stop baking;
Sub-step 12, open mass spectrograph, adjust its parameter and make it be in stable duty;
Sub-step 13, open the 3rd valve, utilize nonevaporable getter pump to bleed to calibrating installation, maintain the background pressure of calibration chamber; Now, the 4th valve is not closed, and extra-high vacuum unit associating nonevaporable getter pump of bleeding realizes the maintenance of background pressure together;
Sub-step 14, closedown the 3rd valve and the 4th valve, with the current ion current of mass spectrograph Measurement and calibration room, be the ion current that background pressure is corresponding, and the ion current data utilizing background pressure corresponding calculate the escalating rate R of background pressure ion current
0;
Described step 2 is specially: open the second valve and the 4th valve, will be introduced in calibration chamber by school vacuum standard small opening effluent air; After the indicating value of mass spectrograph is stable, close the 4th valve and carry out static buildup, with the current ion current of mass spectrograph Measurement and calibration room in accumulation, namely the ion current by school vacuum standard small opening and background is contained, through a period of time, calculate obtain containing by the escalating rate R of the ion current of school vacuum standard small opening and background with measuring the ion current data that obtain
l;
Described step 3 is specially: close the second valve, opens the 4th valve and the first valve, flows into known mass flow Q in calibration chamber through flowmeter
snormal flow, the minimum gas flow that flowmeter provides is less than 10
-10m
3/ s the order of magnitude, close the 4th valve after stability of flow and carry out static buildup, with the current ion current of mass spectrograph Measurement and calibration room in accumulation, namely the ion current of normal flow and background is contained, through a period of time, calculate with measuring the ion current data obtained the escalating rate R obtaining the ion current containing normal flow and background
s.
Present invention also offers a kind of minimum vacuum leakage rate measurement device, comprise flowmeter, the first valve, mass spectrograph, pressure gauge, calibration chamber, the second valve, unit of being bled by school vacuum standard small opening, the 3rd valve, nonevaporable getter pump, the 4th valve and extra-high vacuum;
Flowmeter is connected with calibration chamber, for providing known gas flow in calibration chamber by the first valve; Extra-high vacuum unit of bleeding is connected with calibration chamber by the 4th valve, for from calibration chamber gas bleeding; Be connected with calibration chamber by the second valve by school vacuum standard small opening; Nonevaporable getter pump is connected with calibration chamber by the 3rd valve, for carrying out continuing to bleed when maintaining background pressure; Mass spectrograph is connected with calibration chamber and carries out ion current measurement; Pressure gauge is connected with calibration chamber and carries out vacuum-degree monitoring.
Beneficial effect:
(1) the present invention does not need the conductance ratio measuring two apertures in diffluence room, the relation of the ratio of flow is equaled by the ratio of ion current escalating rate, and then pass through the measurements and calculations of ion current escalating rate, the use of combined standard flow, realize by the leakage rate measurement of school vacuum standard small opening and calibration, avoid measuring the conductance problem larger than the uncertainty of measurement brought, thus extend minimum vacuum leakage rate measurement and calibration lower limit, be applicable to the testing and calibration to minimum vacuum leak rate, for realizing being less than 1 × 10
-9pam
3in/s flow rate zone, the accurate testing and calibration of minimum vacuum leak rate is provided the foundation.
(2) the present invention is after calibration chamber increases nonevaporable getter pump, when adopting inert gas as calibration gas, nonevaporable getter pump can effectively eliminate the impact of vacuum pipe and calibration chamber inwall venting effect, low pressure is maintained in calibration chamber, making background ions stream escalating rate be stabilized in smaller value, providing the foundation for carrying out flow rate calculation by above-mentioned ratio.
Accompanying drawing explanation
Fig. 1 is the structural drawing of the present invention's minimum vacuum leakage rate measurement device.
In figure: 1-flowmeter, 2-first valve, 3-mass spectrograph, 4-pressure gauge, 5-calibration chamber, 6-second valve, 7-to be bled unit by school vacuum standard small opening, 8-the 3rd valve, 9-nonevaporable getter pump, 10-the 4th valve, 11-extra-high vacuum.
Embodiment
To develop simultaneously embodiment below in conjunction with accompanying drawing, describe the present invention.
Thinking of the present invention is: consider and be difficult to identify from background by the ion current of school small opening, the present invention looks for another way, then utilizes ion current escalating rate to process.Specifically, by toasting and continuing maintenance background pressure of bleeding, make the escalating rate of background ions stream very little, and be a definite value substantially, be convenient to measure.And consider and to be differed greatly by the order of magnitude of the ion current escalating rate of school small opening and background, therefore can obtain containing background and by the ion current escalating rate of school small opening by measuring, these data are deducted known this definite value of background ions stream escalating rate, just can obtain by the ion current escalating rate of school small opening.
Further, recycling normal flow is measured accordingly and reduces operation, can obtain the ion current escalating rate of normal flow;
Finally utilize the principle being equaled flow ratio by the ion current escalating rate ratio of school small opening and normal flow, can calculate by the flow of school small opening, final thus achieve the testing and calibration of minimum vacuum leak rate.
Based on above-mentioned thinking, minimum vacuum leakage rate measurement method provided by the invention comprises following four steps:
Step one, maintain calibration chamber pressure to background pressure, the background ions stream of Measurement and calibration room, and then calculate the escalating rate R obtaining background ions stream
0;
Step 2, calibration chamber will be introduced by school vacuum standard small opening flow, carry out static buildup, the current ion current in Measurement and calibration room in accumulation, namely containing by the ion current of school vacuum standard small opening and background; The ion current data utilizing this step to measure to obtain calculate and obtain containing by the escalating rate R of the ion current of school vacuum standard small opening and background
l;
Step 3, pass into known mass flow Q to calibration chamber
snormal flow, carry out static buildup, the current ion current in Measurement and calibration room in accumulation, namely containing the ion current of normal flow and background; The ion current data utilizing this step to measure to obtain calculate the escalating rate R of the ion current obtained containing normal flow and background
s;
Step 4, by (1) formula calculate by the leak rate Q of school vacuum standard small opening
l:
Present invention also offers a kind of implement device of said method, as shown in Figure 1, this device comprises flowmeter 1, first valve 2, mass spectrograph 3, pressure gauge 4, calibration chamber 5, second valve 6, unit 11 of being bled by school vacuum standard small opening the 7, the 3rd valve 8, nonevaporable getter pump 9, the 4th valve 10 and extra-high vacuum.Flowmeter 1 is connected in calibration chamber by the first valve 2 and calibration chamber 5 and provides known gas flow; Extra-high vacuum unit 11 of bleeding to be connected for from calibration chamber 5 gas bleeding by the 4th valve 10 with calibration chamber 5; Be connected with calibration chamber 5 by the second valve 6 by school vacuum standard small opening 7; Nonevaporable getter pump 9 is connected for continuing to bleed to calibration chamber 5 by the 3rd valve 8 with calibration chamber 5, utilize nonevaporable getter pump 9 pairs of active gases pumping speed larger, and under extra-high vacuum state, affect the mainly active gases of vacuum tightness, therefore adopt nonevaporable getter pump 9 to bleed as holding pump, comparatively Low background ion current can be maintained; Mass spectrograph 3 is connected with calibration chamber 5 and carries out ion current measurement; Pressure gauge 4 is connected with calibration chamber 5 and carries out vacuum-degree monitoring.
Wherein, the first valve 2, second valve 6, the 3rd valve 8, the 4th valve 10 are all-metal ultrahigh vacuum valve, and flowmeter 1 provides minimum gas flow to be less than 10
-10m
3/ s the order of magnitude.
Fine pumping unit 11 can adopt the scheme of bleeding of molecular pump and mechanical pump combination, and its main pump is molecular pump, forepump is mechanical pump.
Based on said apparatus, the minimum vacuum leakage rate measurement that the inventive method provides and the detailed process of calibration steps as follows:
Step one, open the 4th valve 10, other valves 2,6,8 are closed; Start extra-high vacuum to bleed unit 11, start to bleed to calibration chamber 5, in pumping process, bakeout degassing is carried out to this pick-up unit entirety; Vacuum measurement is carried out, until be pumped to calibration chamber 5 pressure to be less than 1.0 × 10 with pressure gauge 4
-8pa, thus reach background pressure, now stop baking.
Step 2, open mass spectrograph 3, adjust its parameter and make it be in stable duty;
Step 3, open the 3rd valve 8, utilize nonevaporable getter pump 9 pairs of calibrating installations to bleed, maintain the background pressure of vacuum chamber (5).Now, the 4th valve 10 is not closed, and is to realize the maintenance of background pressure together, to extend serviceable life and the serviceability of nonevaporable getter pump 9 to combine bleed unit (11) and nonevaporable getter pump 9 of extra-high vacuum.
Step 4, closedown the 3rd valve 8 and the 4th valve 10, with the current ion current of mass spectrograph 3 Measurement and calibration room 5, be the ion current that background pressure is corresponding, and the ion current data utilizing background pressure corresponding calculate the escalating rate R of background pressure ion current
0.The baking provided by abovementioned steps and background pressure are maintained, make the escalating rate of background ions stream very little, and be a definite value substantially, this step, without the need to by static buildup, only needs the several ion current data of continuous acquisition just can calculate the escalating rate of background pressure ion current.
Step 5, open the second valve 6 and the 4th valve 10, will be introduced in calibration chamber 5, if be Q by the leak rate of school vacuum standard small opening by school vacuum standard small opening 7 effluent air
l, be unknown quantity.After the indicating value of mass spectrograph 3 is stable, determine that leak rate is stablized, then close the 4th valve 10 and carry out static buildup, with the current ion current of mass spectrograph 3 Measurement and calibration room 5 in accumulation, namely containing by the ion current of school vacuum standard small opening and background, through a period of time Δ t
1, calculate obtain containing by the escalating rate R of the ion current of school vacuum standard small opening and background with measuring the ion current data that obtain
l.Wherein, static buildup time Δ t
1can determine by experiment as long as accumulated time can guarantee to find out to be changed by the ion current of school vacuum standard small opening 7.
Step 6, close the second valve 6, open the 4th valve 10 and the first valve 2, flow into known mass flow Q in calibration chamber 5 through flowmeter 1
snormal flow, the minimum gas flow that flowmeter 1 provides is less than 10
-10m
3/ s the order of magnitude, closes the 4th valve 10 and carries out static buildup, with the current ion current of mass spectrograph 3 Measurement and calibration room 5 in accumulation, namely contain the ion current of normal flow and background, through a period of time Δ t after stability of flow
2, calculate with measuring the ion current data obtained the escalating rate R obtaining the ion current containing normal flow and background
s.Wherein, static buildup time Δ t
2can determine by experiment, as long as accumulated time can guarantee to find out that the ion current of normal flow changes.
Step 7, by (1) formula calculate by the leak rate Q of school vacuum standard small opening
l:
Q
l/ Q
sratio ion current escalating rate ratio can be adopted to express, and due to R
land R
sinside all containing background, therefore need to carry out background rejection, therefore utilize the ratio of difference to express, then by Q
sbe put on the right of equation, thus obtain the form of formula (1).
In certain is measured, obtain Q
s, R
0, R
l, R
sbe respectively 3.34 × 10
-12pam
3/ s, 3.93 × 10
-15a/s, 8.99 × 10
-12a/s, 4.39 × 10
-12a/s, is substituted into formula (1), calculates by the leak rate Q of school vacuum standard small opening
lbe 6.83 × 10
-12pam
3/ s.
As can be seen from the above, the present invention is after calibration chamber increases nonevaporable getter pump, when adopting inert gas as calibration gas, nonevaporable getter pump can effectively eliminate the impact of vacuum pipe and calibration chamber inwall venting effect, low pressure is maintained in calibration chamber, on mass spectrograph measurement standard gas flow and the basis that compared by school small opening probe gas ion current, propose static buildup method and carry out minimum vacuum leakage rate measurement and calibration.Adopt gas micro-flowmeter to provide known gas flow, flowmeter effluent air is incorporated in calibration chamber, measure ion current escalating rate, compare with the ion current escalating rate being calibrated gas flow being calibrated device.Static buildup method achieves constant conductance method and shunting cannot to minimum vacuum leak rate 1 × 10
-9pam
3the testing and calibration of/below s magnitude, extends minimum vacuum leakage rate measurement and calibration lower limit.Under avoiding the minimum situation of minimum vacuum leak rate, mass spectrograph cannot be distinguished and be calibrated ion current and background ions stream.Utilize ion current escalating rate to measure simultaneously, avoid ion current and measure the uncertainty introduced, reduce the uncertainty of measurement of testing and calibration lower limit.Device and method of the present invention is applicable to the accurate testing and calibration of all kinds minimum vacuum leak rate.
In sum, these are only preferred embodiment of the present invention, be not intended to limit protection scope of the present invention.Within the spirit and principles in the present invention all, any amendment done, equivalent replacement, improvement etc., all should be included within protection scope of the present invention.
Claims (3)
1. a minimum vacuum leakage rate measurement method, is characterized in that, comprising:
Step one, maintain calibration chamber pressure to background pressure, the background ions stream of Measurement and calibration room, and then calculate the escalating rate R obtaining background ions stream
0;
Step 2, calibration chamber will be introduced by school vacuum standard small opening flow, carry out static buildup, the current ion current in Measurement and calibration room in accumulation, namely containing by the ion current of school vacuum standard small opening and background; The ion current data utilizing this step to measure to obtain calculate and obtain containing by the escalating rate R of the ion current of school vacuum standard small opening and background
l;
Step 3, pass into known mass flow Q to calibration chamber
snormal flow, carry out static buildup, the current ion current in Measurement and calibration room in accumulation, namely containing the ion current of normal flow and background; The ion current data utilizing this step to measure to obtain calculate the escalating rate R of the ion current obtained containing normal flow and background
s;
Step 4, by (1) formula calculate by the leak rate Q of school vacuum standard small opening
l:
2. the method for claim 1, it is characterized in that, in the pick-up unit that the method adopts, flowmeter (1) is connected with calibration chamber (5) by the first valve (2), extra-high vacuum unit (11) of bleeding is connected with calibration chamber (5) by the 4th valve (10), be connected with calibration chamber (5) by the second valve (6) by school vacuum standard small opening (7), nonevaporable getter pump (9) is connected with calibration chamber (5) by the 3rd valve (8), mass spectrograph (3) is connected with calibration chamber (5), and pressure gauge (4) is connected with calibration chamber (5);
Described step one specifically comprises sub-step 11 ~ 14:
Sub-step 11, open the 4th valve (10), other valves (2,6,8) are closed; Start extra-high vacuum to bleed unit (11), start to bleed to calibration chamber (5), in pumping process, bakeout degassing is carried out to this pick-up unit entirety; Carry out vacuum measurement with pressure gauge (4), make calibration chamber (5) reach background pressure until bleed, stop baking;
Sub-step 12, open mass spectrograph (3), adjust its parameter and make it be in stable duty;
Sub-step 13, open the 3rd valve (8), utilize nonevaporable getter pump (9) to bleed to calibrating installation, maintain the background pressure of calibration chamber (5); Now, the 4th valve (10) is not closed, and extra-high vacuum unit (11) associating nonevaporable getter pump (9) of bleeding realizes the maintenance of background pressure together;
Sub-step 14, closedown the 3rd valve (8) and the 4th valve (10), with the current ion current of mass spectrograph (3) Measurement and calibration room (5), be the ion current that background pressure is corresponding, the ion current data utilizing background pressure corresponding calculate the escalating rate R of background pressure ion current
0;
Described step 2 is specially: open the second valve (6) and the 4th valve (10), will be introduced in calibration chamber (5) by school vacuum standard small opening (7) effluent air; After the indicating value of mass spectrograph (3) is stable, close the 4th valve (10) and carry out static buildup, with the current ion current of mass spectrograph (3) Measurement and calibration room (5) in accumulation, namely the ion current by school vacuum standard small opening and background is contained, through a period of time, calculate obtain containing by the escalating rate R of the ion current of school vacuum standard small opening and background with measuring the ion current data that obtain
l;
Described step 3 is specially: close the second valve (6), opens the 4th valve (10) and the first valve (2), flows into known mass flow Q in calibration chamber (5) through flowmeter (1)
snormal flow, the minimum gas flow that flowmeter (1) provides is less than 10
-10m
3/ s the order of magnitude, close the 4th valve (10) after stability of flow and carry out static buildup, with the current ion current of mass spectrograph (3) Measurement and calibration room (5) in accumulation, namely the ion current of normal flow and background is contained, through a period of time, calculate with measuring the ion current data obtained the escalating rate R obtaining the ion current containing normal flow and background
s.
3. one kind minimum vacuum leakage rate measurement device, it is characterized in that, comprise flowmeter (1), the first valve (2), mass spectrograph (3), pressure gauge (4), calibration chamber (5), the second valve (6), unit (11) of being bled by school vacuum standard small opening (7), the 3rd valve (8), nonevaporable getter pump (9), the 4th valve (10) and extra-high vacuum;
Flowmeter (1) is connected with calibration chamber (5) by the first valve (2), for providing known gas flow in calibration chamber; Extra-high vacuum unit (11) of bleeding is connected with calibration chamber (5) by the 4th valve (10), for from calibration chamber (5) gas bleeding; Be connected with calibration chamber (5) by the second valve (6) by school vacuum standard small opening (7); Nonevaporable getter pump (9) is connected with calibration chamber (5) by the 3rd valve (8), for carrying out continuing to bleed when maintaining background pressure; Mass spectrograph (3) is connected with calibration chamber (5) and carries out ion current measurement; Pressure gauge (4) is connected with calibration chamber (5) and carries out vacuum-degree monitoring.
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| CN106017819A (en) * | 2016-06-24 | 2016-10-12 | 中国科学院光电研究院 | Device and method for measuring partial pressure leakage rate |
| CN106226000A (en) * | 2016-07-07 | 2016-12-14 | 中国科学院光电研究院 | A kind of vacuum leakproofness energy measurement apparatus and method |
| CN106289666A (en) * | 2016-08-31 | 2017-01-04 | 兰州空间技术物理研究所 | The calibrating installation of a kind of vacuum leak under ambient temperature and method |
| CN106441731A (en) * | 2016-08-31 | 2017-02-22 | 兰州空间技术物理研究所 | High-low-temperature vacuum leak hole calibration device and method |
| CN107677329A (en) * | 2017-09-08 | 2018-02-09 | 兰州空间技术物理研究所 | The vacuum leak flow measurement device and method of a kind of more gas componants |
| CN109323817A (en) * | 2018-09-13 | 2019-02-12 | 北京东方计量测试研究所 | A kind of lower limit is 10-16Pam3The ultra-sensitivity leakage detection apparatus and method of/s |
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| CN105632963A (en) * | 2016-03-11 | 2016-06-01 | 上海华力微电子有限公司 | Method and system for monitoring leak rate of HDP chamber |
| CN106017819A (en) * | 2016-06-24 | 2016-10-12 | 中国科学院光电研究院 | Device and method for measuring partial pressure leakage rate |
| CN106226000A (en) * | 2016-07-07 | 2016-12-14 | 中国科学院光电研究院 | A kind of vacuum leakproofness energy measurement apparatus and method |
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| CN109323817A (en) * | 2018-09-13 | 2019-02-12 | 北京东方计量测试研究所 | A kind of lower limit is 10-16Pam3The ultra-sensitivity leakage detection apparatus and method of/s |
| CN112146818A (en) * | 2020-09-07 | 2020-12-29 | 兰州空间技术物理研究所 | Double-station ultrasensitive leak detection method and system applied to packaging of electronic components |
| CN114323421A (en) * | 2021-12-08 | 2022-04-12 | 兰州空间技术物理研究所 | Device and method for protecting IE514 separation rule from humidity |
| CN114323421B (en) * | 2021-12-08 | 2023-07-21 | 兰州空间技术物理研究所 | Device and method for protecting IE514 separating gauge from humidity |
| CN114674501A (en) * | 2021-12-25 | 2022-06-28 | 兰州空间技术物理研究所 | Static leak rate measuring device and method |
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Application publication date: 20151125 |