CN105068346B - A kind of colorful filter array substrate and liquid crystal display panel - Google Patents
A kind of colorful filter array substrate and liquid crystal display panel Download PDFInfo
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- CN105068346B CN105068346B CN201510504676.9A CN201510504676A CN105068346B CN 105068346 B CN105068346 B CN 105068346B CN 201510504676 A CN201510504676 A CN 201510504676A CN 105068346 B CN105068346 B CN 105068346B
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- 239000000758 substrate Substances 0.000 title claims abstract description 52
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 17
- 230000000903 blocking effect Effects 0.000 claims abstract description 109
- 239000002184 metal Substances 0.000 claims abstract description 107
- 238000002161 passivation Methods 0.000 claims abstract description 36
- 230000004888 barrier function Effects 0.000 claims abstract description 18
- 239000011521 glass Substances 0.000 claims abstract description 15
- 230000005669 field effect Effects 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 6
- 238000005516 engineering process Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 5
- 239000010408 film Substances 0.000 description 4
- 230000005611 electricity Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000008859 change Effects 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000005034 decoration Methods 0.000 description 1
- 230000001795 light effect Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/201—Filters in the form of arrays
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136222—Colour filters incorporated in the active matrix substrate
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136286—Wiring, e.g. gate line, drain line
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1248—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/136209—Light shielding layers, e.g. black matrix, incorporated in the active matrix substrate, e.g. structurally associated with the switching element
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- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
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- Optics & Photonics (AREA)
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- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Optical Filters (AREA)
Abstract
The invention discloses a kind of colorful filter array substrate to include:Glass substrate, the first metal layer, insulating barrier, active layer, ohmic contact layer, second metal layer, the first passivation layer, chromatic filter layer, the second passivation layer and pixel electrode layer;Passage is opened up in the color blocking crossover position of chromatic filter layer, in Y direction, public electrode wire is set on the first metal layer of the corresponding passage, and in X-direction, metal wire is being set in the second metal layer of the corresponding passage, to realize shading;The present invention can not only effectively cover light leak, and can also increase the circulation of PI and liquid crystal.
Description
【Technical field】
The present invention relates to display technology field, more particularly to a kind of colorful filter array substrate and liquid crystal display panel.
【Background technology】
The application of BCS/BM less technologies can reduce one of BM use on the lcd panel, can be cost-effective.BCS
(black column space) technology uses the material of black.Effect using black material is in periphery, Ke Yizhi
Connect and BM is replaced by black material, play interception, the thick effect of supporting case is played in another effect Shi AA area.In AA areas pair
Just need to stack by color blocking in scan line (gate) and data wire (data) shading and metal interact to realize.Color blocking overlapping one
As use red and blueness to overlap because the place that the wave spectrum of this two colors does not intersect, this light effect is more preferable.
The product that BCS/BM less technologies have had in the market uses IPS technologies.IPS technologies can use one
Layer planarization layer (PFA), color blocking it is overlapping caused by raised flat melt.But use BCS/BM less skills for HVA patterns
Art, if using planarization layer, HVA cost can be increased, so HVA technologies are without using planarization layer.Under HVA patterns
BCS/BM less technologies can produce a problem of four sides is raised in the place that color blocking overlaps, carrying out PI coatings and dropping liquid
During brilliant processing procedure, because the raised barricade in four sides can produce PI and liquid crystal flows uneven phenomenon, so as to influence display effect.
Therefore, it is necessary to a kind of new technical scheme is proposed, to solve above-mentioned technical problem.
【The content of the invention】
It is an object of the invention to provide a kind of colorful filter array substrate and liquid crystal display panel, it is intended to solves existing skill
BCS/BM less technologies under HVA patterns existing for art can produce a problem of four sides is raised in the place that color blocking overlaps,
When carrying out PI coatings and the brilliant processing procedure of dropping liquid, because the raised barricade in four sides can produce PI and liquid crystal flows uneven phenomenon,
The problem of so as to influence display effect.
To solve the above problems, technical scheme is as follows:
Colorful filter array substrate, the colorful filter array substrate include:
One glass substrate;
One the first metal layer, is arranged above the glass substrate, and the first metal layer includes scan line and film
The grid of field-effect transistor;
One insulating barrier, it is arranged above the first metal layer;
One active layer, it is arranged on above the insulating barrier;
One ohmic contact layer, it is arranged at the top at the active layer both ends;
One second metal layer, it is arranged above the ohmic contact layer, the second metal layer includes data wire, thin
The source electrode of film field-effect transistor and drain electrode;
One first passivation layer, it is arranged above the second metal layer, for isolating the second metal layer and colored filter
Photosphere;
One chromatic filter layer, be arranged above first passivation layer, the chromatic filter layer include being arranged in order the
One color blocking, the second color blocking and the 3rd color blocking;
One second passivation layer, it is arranged above the chromatic filter layer, for isolating the chromatic filter layer and pixel electricity
Pole layer;
One pixel electrode layer, it is arranged above second passivation layer;
Wherein, passage is opened up in the color blocking crossover position of the chromatic filter layer, described the first of the corresponding passage
Public electrode wire is set on metal level, to realize shading;The color blocking crossover position is the overlapping region of adjacent color blocking.
Preferably, in described colorful filter array substrate, the color blocking that the passage is opened in Y direction respectively overlaps
Position.
Preferably, in described colorful filter array substrate, the color blocking that the passage is also opened in X-direction respectively is handed over
Folded position, metal wire is set in the second metal layer of the corresponding passage, to realize shading.
Preferably, in described colorful filter array substrate, the metal wire is the prolongation of electric leakage polar curve.
Preferably, in described colorful filter array substrate, the color blocking crossover position is red color resistance and blue color
Resistance is overlapping, and red color resistance and green color blocking overlap, and either, blue color blocking and green color blocking overlap.
A kind of colorful filter array substrate, the colorful filter array substrate include:
One glass substrate;
One the first metal layer, is arranged above the glass substrate, and the first metal layer includes scan line and film
The grid of field-effect transistor;
One insulating barrier, it is arranged above the first metal layer;
One active layer, it is arranged on above the insulating barrier;
One ohmic contact layer, it is arranged at the top at the active layer both ends;
One second metal layer, it is arranged above the ohmic contact layer, the second metal layer includes data wire, thin
The source electrode of film field-effect transistor and drain electrode;
One first passivation layer, it is arranged above the second metal layer, for isolating the second metal layer and colored filter
Photosphere;
One chromatic filter layer, be arranged above first passivation layer, the chromatic filter layer include being arranged in order the
One color blocking, the second color blocking and the 3rd color blocking;
One second passivation layer, it is arranged above the chromatic filter layer, for isolating the chromatic filter layer and pixel electricity
Pole layer;
One pixel electrode layer, it is arranged above second passivation layer;
Wherein, passage is opened up in the color blocking crossover position of the chromatic filter layer, described the second of the corresponding passage
Metal wire is set on metal level, to realize shading;The color blocking crossover position is the overlapping region of adjacent color blocking.
Preferably, in described colorful filter array substrate, the metal wire is the prolongation of electric leakage polar curve.
Preferably, in described colorful filter array substrate, the color blocking that the passage is opened in X-direction respectively overlaps
Position.
Preferably, in described colorful filter array substrate, the width of the metal wire is more than or equal to the passage
Width.
Preferably, in described colorful filter array substrate, the color blocking crossover position is red color resistance and blue color
Resistance is overlapping, and red color resistance and green color blocking overlap, and either, blue color blocking and green color blocking overlap.
A kind of liquid crystal display panel for including colorful filter array substrate recited above.
Compared with the prior art, in order to not increase cost, the present invention stacks on the basis of planarization layer is not increased to color blocking
Structure be changed, to increase PI and liquid crystal circulation.Passage is excavated in the overlapping place of the color blocking of chromatic filter layer,
Now due to there was only one layer of color blocking at passage, so can not play a part of shading, the risk for having light leak is now of the invention to exist
Y direction, sets public electrode wire on the first metal layer of the corresponding passage, and in X-direction, in corresponding institute
State and metal wire is set in the second metal layer of passage, to cover light leak herein.The embodiment of the present invention can not only be effective
Light leak is covered, and the circulation of PI and liquid crystal can also be increased.
For the above of the present invention can be become apparent, preferred embodiment cited below particularly, and coordinate institute's accompanying drawings, make
Describe in detail as follows.
【Brief description of the drawings】
Fig. 1 is the structural representation of colorful filter array substrate provided in an embodiment of the present invention;
Fig. 2 is the structural representation provided in an embodiment of the present invention that passage is blocked using public electrode wire;
Fig. 3 is provided in an embodiment of the present invention using the structural representation for a metal wire is set up at drain electrode blocking passage.
【Embodiment】
Word used in this specification " embodiment " means serving as example, example or illustration.In addition, this specification and institute
Article " one " used in attached claim can usually be interpreted to mean " one or more ", unless otherwise or
Understand guiding singulative from context.
In embodiments of the present invention, in order to not increase cost, the present invention is not on the basis of planarization layer is increased, to color blocking
The structure of stacking is changed, to increase PI and liquid crystal circulation.Excavated in the overlapping place of the color blocking of chromatic filter layer
Passage, now due to there was only one layer of color blocking at passage, so shading can not be played a part of, the risk for having light leak, now originally
Invention sets public electrode wire in Y direction on the first metal layer of the corresponding passage, and in X-direction,
Metal wire is set in the second metal layer of the corresponding passage, to cover light leak herein.
In order to illustrate technical solutions according to the invention, illustrated below by specific embodiment.
Referring to Fig. 1, the structural representation for colorful filter array substrate provided in an embodiment of the present invention;For the ease of saying
It is bright, it illustrate only the part related to the embodiment of the present invention.
The colorful filter array substrate includes:One glass substrate 101;One the first metal layer 102, an insulating barrier 103, one
Active layer 104, an ohmic contact layer 105, a second metal layer 106, one first passivation layer 107, a chromatic filter layer 108, one
Second passivation layer 109 and pixel electrode layer 110.Wherein, the first metal layer 102 is arranged at the top of glass substrate 101,
The first metal layer 102 includes the grid of scan line and TFT;The insulating barrier 103 is arranged at institute
State the top of the first metal layer 102;The active layer 104 is arranged on the top of insulating barrier 103, in the first metal layer
During 102 opening, the electric charge of source electrode can be made to be conducting to drain electrode;The ohmic contact layer 105 is arranged at the both ends of active layer 104
Top, for making the contact resistance of the second metal layer 106 and the active layer 104 smaller, it is easier to turn on;Described
Two metal levels 106 are arranged at the top of ohmic contact layer 105, and the second metal layer 106 includes data wire, thin film field-effect
The source electrode of transistor and drain electrode;First passivation layer 107 is arranged at the top of second metal layer 106, described for isolating
Second metal layer 106 and chromatic filter layer 108, the chromatic filter layer 108 are arranged at the top of the first passivation layer 107, institute
State the first color blocking, the second color blocking and the 3rd color blocking that chromatic filter layer 108 includes being arranged in order;Second passivation layer 109
The top of chromatic filter layer 108 is arranged at, for isolating the chromatic filter layer 108 and pixel electrode layer 110;The pixel
Electrode layer 110 is arranged at the top of the second passivation layer 109.
Referring to Fig. 2, it is the structural representation provided in an embodiment of the present invention that passage is blocked using public electrode wire;Institute
The color blocking crossover position for stating chromatic filter layer 108 opens up passage 111, in the first metal layer 102 of the corresponding passage 111
Upper setting public electrode wire 112, to realize shading;The color blocking crossover position is the overlapping region of adjacent color blocking.
In embodiments of the present invention, the passage 111 is opened in the color blocking crossover position of Y direction respectively.In Y-axis side
To the setting public electrode wire 112 on the first metal layer 102 of the corresponding passage 111, to realize shading.That is, institute
Data wire direction is stated, widens the width of the public electrode wire of the corresponding passage 111, to realize shading.Preferably, it is corresponding
The width of the public electrode wire of the passage is more than or equal to the width of the passage.
In embodiments of the present invention, color blocking crossover position can be that red color resistance and blue color blocking overlap, red color resistance and
Green color blocking overlaps, and either, blue color blocking and green color blocking overlap.So that red color resistance and blue color blocking are overlapping as an example, excavate
The color blocking of passage can be blue color blocking, red color resistance can also be dug out passage.
Also referring to Fig. 1 and Fig. 3, for it is provided in an embodiment of the present invention using set up at drain electrode a metal wire block it is logical
The structural representation in road.
Colorful filter array substrate includes:One glass substrate 101;One the first metal layer 102, an insulating barrier 103, one are active
104, one ohmic contact layer 105 of layer, a second metal layer 106, one first passivation layer 107, a chromatic filter layer 108, one second
Passivation layer 109 and pixel electrode layer 110.Wherein, the first metal layer 102 is arranged at the top of glass substrate 101, described
The first metal layer 102 includes the grid of scan line and TFT;The insulating barrier 103 is arranged at described
The top of one metal level 102;The active layer 104 is arranged on the top of insulating barrier 103, in the first metal layer 102
During opening, the electric charge of source electrode can be made to be conducting to drain electrode;The ohmic contact layer 105 is arranged at the both ends of active layer 104
Top, for making the contact resistance of the second metal layer 106 and the active layer 104 smaller, it is easier to turn on;Described second
Metal level 106 is arranged at the top of ohmic contact layer 105, and it is brilliant that the second metal layer 106 includes data wire, thin film field-effect
The source electrode of body pipe and drain electrode;First passivation layer 107 is arranged at the top of the second metal layer 106, for isolating described the
Two metal levels 106 and chromatic filter layer 108, the chromatic filter layer 108 is arranged at the top of the first passivation layer 107, described
Chromatic filter layer 108 includes the first color blocking, the second color blocking and the 3rd color blocking being arranged in order;Second passivation layer 109 is set
The top of chromatic filter layer 108 is placed in, for isolating the chromatic filter layer 108 and pixel electrode layer 110;The pixel electricity
Pole layer 110 is arranged at the top of the second passivation layer 109.
In embodiments of the present invention, passage 111 is opened up in the color blocking crossover position of the chromatic filter layer 108, corresponding
Metal wire 113 is set in the second metal layer 106 of the passage 111, to realize shading;The color blocking crossover position is phase
The overlapping region of adjacent color blocking.
In embodiments of the present invention, the passage 111 is opened in the color blocking crossover position of X-direction respectively.In X-axis side
To the setting metal wire 113 in the second metal layer 106 of the corresponding passage 111, to realize shading;In the present embodiment
In, the metal wire 113 is the prolongation of electric leakage polar curve.I.e. in the scan-line direction, pass through extension electric leakage polar curve to institute
State the position of passage so that the part of extension can shelter from passage, to realize shading.The width of the metal wire 113
More than or equal to the width of the passage.
In embodiments of the present invention, color blocking crossover position can be that red color resistance and blue color blocking overlap, red color resistance and
Green color blocking overlaps, and either, blue color blocking and green color blocking overlap.So that red color resistance and blue color blocking are overlapping as an example, excavate
The color blocking of passage can be blue color blocking, red color resistance can also be dug out passage.
The embodiment of the present invention additionally provides a kind of liquid crystal display panel, and the liquid crystal display panel includes colour filter array
Substrate and liquid crystal layer.Wherein, the colorful filter array substrate includes:One glass substrate 101;One the first metal layer 102, one
Insulating barrier 103, an active layer 104, an ohmic contact layer 105, a second metal layer 106, one first passivation layer 107, one are colored
Filter layer 108, one second passivation layer 109 and pixel electrode layer 110.Wherein, the first metal layer 102 is arranged at the glass
The top of substrate 101, the first metal layer 102 include the grid of scan line and TFT;The insulating barrier
103 are arranged at the top of the first metal layer 102;The active layer 104 is arranged on the top of insulating barrier 103, in institute
When stating the opening of the first metal layer 102, the electric charge of source electrode can be made to be conducting to drain electrode;The ohmic contact layer 105 is arranged at described
The top at the both ends of active layer 104, for making the contact resistance of the second metal layer 106 and the active layer 104 smaller, more hold
Easily conducting;The second metal layer 106 is arranged at the top of ohmic contact layer 105, and the second metal layer 106 includes data
Line, the source electrode of TFT and drain electrode;First passivation layer 107 is arranged at the top of second metal layer 106,
For isolating the second metal layer 106 and chromatic filter layer 108, the chromatic filter layer 108 is arranged at first passivation
The top of layer 107, the chromatic filter layer 108 include the first color blocking, the second color blocking and the 3rd color blocking being arranged in order;Described
Two passivation layers 109 are arranged at the top of chromatic filter layer 108, for isolating the chromatic filter layer 108 and pixel electrode layer
110;The pixel electrode layer 110 is arranged at the top of the second passivation layer 109.
In embodiments of the present invention, passage 111 is opened up in the color blocking crossover position of the chromatic filter layer 108, specifically,
The passage 111 is opened in the color blocking crossover position of Y direction respectively, and the passage 111 is also opened in X-direction respectively
Color blocking crossover position.The color blocking crossover position is the overlapping region of adjacent color blocking.
In embodiments of the present invention, in Y direction, set on the first metal layer 102 of the corresponding passage 111
Public electrode wire 112, to realize shading.That is, in the data wire direction, the common electrical for corresponding to the passage 111 is widened
The width of polar curve, to realize shading.Preferably, the width of the public electrode wire of the corresponding passage is more than or equal to described
The width of passage.
In embodiments of the present invention, in X-direction, set in the second metal layer 106 of the corresponding passage 111
Metal wire 113, to realize shading;In the present embodiment, the metal wire 113 is the prolongation of electric leakage polar curve.I.e. described
Scan-line direction, by extending electric leakage polar curve to the position of the passage so that the part of extension can shelter from passage,
To realize shading.The width of the metal wire 113 is more than or equal to the width of the passage.
In embodiments of the present invention, color blocking crossover position can be that red color resistance and blue color blocking overlap, red color resistance and
Green color blocking overlaps, and either, blue color blocking and green color blocking overlap.So that red color resistance and blue color blocking are overlapping as an example, excavate
The color blocking of passage can be blue color blocking, red color resistance can also be dug out passage.
In summary, in order to not increase cost, the present invention is not on the basis of planarization layer is increased, to the knot of color blocking stacking
Structure is changed, to increase PI and liquid crystal circulation.Passage is excavated in the overlapping place of the color blocking of chromatic filter layer, now
Due to there was only one layer of color blocking at passage, so can not play a part of shading, the risk for having light leak, now the present invention is in Y-axis
Direction, sets public electrode wire on the first metal layer of the corresponding passage, and in X-direction, described in correspondence
Metal wire is set in the second metal layer of passage, to cover light leak herein.The embodiment of the present invention can not only effectively hide
Light leak is covered, and the circulation of PI and liquid crystal can also be increased.
Although the present invention, those skilled in the art have shown and described relative to one or more implementations
Based on the reading to the specification and drawings and understand it will be appreciated that equivalent variations and modification.The present invention includes all such repair
Change and modification, and be limited only by the scope of the following claims.In particular, to the various functions performed by said modules, use
Being intended to correspond to the specified function of performing the component in the term of component as description, (such as it is functionally of equal value
) random component (unless otherwise instructed), with performing the exemplary realization of this specification shown in this article in structure
The open structure of function in mode is not equivalent.In addition, although the special characteristic of this specification is relative to some realization sides
Only one in formula is disclosed, but this feature can with as can be it is expected and favorably for given or application-specific
Other one or more combinations of features of other implementations.Moreover, with regard to term " comprising ", " having ", " containing " or its deformation
For being used in embodiment or claim, such term is intended to the bag in a manner of similar to term "comprising"
Include.
In summary, although the present invention is disclosed above with preferred embodiment, above preferred embodiment simultaneously is not used to limit
The system present invention, one of ordinary skill in the art, without departing from the spirit and scope of the present invention, it can make various changes and profit
Decorations, therefore protection scope of the present invention is defined by the scope that claim defines.
Claims (11)
1. a kind of colorful filter array substrate, it is characterised in that the colorful filter array substrate includes:
One glass substrate;
One the first metal layer, it is arranged above the glass substrate, the first metal layer includes scan line and thin film field is imitated
Answer the grid of transistor;
One insulating barrier, it is arranged above the first metal layer;
One active layer, it is arranged on above the insulating barrier;
One ohmic contact layer, it is arranged at the top at the active layer both ends;
One second metal layer, it is arranged above the ohmic contact layer, the second metal layer includes data wire, thin film field-effect
The source electrode of transistor and drain electrode;
One first passivation layer, it is arranged above the second metal layer, for isolating the second metal layer and chromatic filter layer;
One chromatic filter layer, it is arranged above first passivation layer, the chromatic filter layer includes the first color being arranged in order
Resistance, the second color blocking and the 3rd color blocking;
One second passivation layer, it is arranged above the chromatic filter layer, for isolating the chromatic filter layer and pixel electrode layer;
One pixel electrode layer, it is arranged above second passivation layer;
Wherein, passage is opened up in the color blocking crossover position of the chromatic filter layer, in first metal of the corresponding passage
Public electrode wire is set on layer, to realize shading;The color blocking crossover position is the overlapping region of adjacent color blocking.
2. colorful filter array substrate according to claim 1, it is characterised in that the passage is opened in Y-axis side respectively
To color blocking crossover position.
3. colorful filter array substrate according to claim 2, it is characterised in that the passage is also opened in X-axis respectively
The color blocking crossover position in direction, metal wire is set in the second metal layer of the corresponding passage, to realize shading.
4. colorful filter array substrate according to claim 3, it is characterised in that the metal wire prolongs for electric leakage polar curve
Long part.
5. colorful filter array substrate according to claim 1, it is characterised in that the color blocking crossover position is red color
Resistance and blue color blocking overlap, and red color resistance and green color blocking overlap, and either, blue color blocking and green color blocking overlap.
6. a kind of colorful filter array substrate, it is characterised in that the colorful filter array substrate includes:
One glass substrate;
One the first metal layer, it is arranged above the glass substrate, the first metal layer includes scan line and thin film field is imitated
Answer the grid of transistor;
One insulating barrier, it is arranged above the first metal layer;
One active layer, it is arranged on above the insulating barrier;
One ohmic contact layer, it is arranged at the top at the active layer both ends;
One second metal layer, it is arranged above the ohmic contact layer, the second metal layer includes data wire, thin film field-effect
The source electrode of transistor and drain electrode;
One first passivation layer, it is arranged above the second metal layer, for isolating the second metal layer and chromatic filter layer;
One chromatic filter layer, it is arranged above first passivation layer, the chromatic filter layer includes the first color being arranged in order
Resistance, the second color blocking and the 3rd color blocking;
One second passivation layer, it is arranged above the chromatic filter layer, for isolating the chromatic filter layer and pixel electrode layer;
One pixel electrode layer, it is arranged above second passivation layer;
Wherein, passage is opened up in the color blocking crossover position of the chromatic filter layer, in second metal of the corresponding passage
Metal wire is set on layer, to realize shading;The color blocking crossover position is the overlapping region of adjacent color blocking.
7. colorful filter array substrate according to claim 6, it is characterised in that the metal wire prolongs for electric leakage polar curve
Long part.
8. colorful filter array substrate according to claim 6, it is characterised in that the passage is opened in X-axis side respectively
To color blocking crossover position.
9. colorful filter array substrate according to claim 6, it is characterised in that the width of the metal wire is more than or waited
In the width of the passage.
10. colorful filter array substrate according to claim 6, it is characterised in that the color blocking crossover position is red
Color blocking and blue color blocking overlap, and red color resistance and green color blocking overlap, and either, blue color blocking and green color blocking overlap.
A kind of 11. liquid crystal display panel of the colorful filter array substrate including described in any one of claim 1 to 5.
Priority Applications (6)
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CN201510504676.9A CN105068346B (en) | 2015-08-17 | 2015-08-17 | A kind of colorful filter array substrate and liquid crystal display panel |
KR1020187007111A KR102032488B1 (en) | 2015-08-17 | 2015-08-20 | Color filter array substrate and liquid crystal display panel |
GB1802130.3A GB2557485B (en) | 2015-08-17 | 2015-08-20 | Color filter array substrate and liquid crystal display panel |
JP2018507732A JP6564526B2 (en) | 2015-08-17 | 2015-08-20 | Color filter array substrate and liquid crystal display panel |
PCT/CN2015/087619 WO2017028298A1 (en) | 2015-08-17 | 2015-08-20 | Color filter array substrate and liquid crystal display panel |
EA201890517A EA034149B1 (en) | 2015-08-17 | 2015-08-20 | Color filter array substrate and liquid crystal display panel |
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CN201510504676.9A CN105068346B (en) | 2015-08-17 | 2015-08-17 | A kind of colorful filter array substrate and liquid crystal display panel |
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CN105068346A CN105068346A (en) | 2015-11-18 |
CN105068346B true CN105068346B (en) | 2017-11-28 |
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JP (1) | JP6564526B2 (en) |
KR (1) | KR102032488B1 (en) |
CN (1) | CN105068346B (en) |
EA (1) | EA034149B1 (en) |
GB (1) | GB2557485B (en) |
WO (1) | WO2017028298A1 (en) |
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CN105425487A (en) * | 2015-12-25 | 2016-03-23 | 深圳市华星光电技术有限公司 | Thin-film transistor array substrate |
CN110579919B (en) * | 2019-08-08 | 2020-12-04 | 深圳市华星光电技术有限公司 | Array substrate and liquid crystal panel |
CN115933244A (en) * | 2022-12-22 | 2023-04-07 | 惠科股份有限公司 | Display mother board, preparation method thereof, liquid crystal display panel and electronic paper |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004212972A (en) * | 2002-12-26 | 2004-07-29 | Lg Philips Lcd Co Ltd | Liquid crystal display device, its manufacture method and method for manufacturing array substrate for liquid crystal display device |
CN102269834A (en) * | 2011-07-22 | 2011-12-07 | 深圳市华星光电技术有限公司 | Color optical filter and manufacturing method thereof |
CN104656330A (en) * | 2013-11-20 | 2015-05-27 | 乐金显示有限公司 | Liquid Crystal Display Device And Method Of Fabricating The Same |
CN104698713A (en) * | 2015-04-07 | 2015-06-10 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and liquid crystal display device |
CN104808411A (en) * | 2015-05-19 | 2015-07-29 | 友达光电股份有限公司 | Thin film transistor liquid crystal display |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002014374A (en) * | 2000-04-28 | 2002-01-18 | Hitachi Ltd | Liquid crystal display device |
JP3558533B2 (en) * | 1998-09-16 | 2004-08-25 | シャープ株式会社 | Liquid crystal display |
JP3171174B2 (en) * | 1998-11-06 | 2001-05-28 | 東レ株式会社 | Color filter and liquid crystal display |
JP4637312B2 (en) * | 2000-01-28 | 2011-02-23 | 株式会社半導体エネルギー研究所 | Liquid crystal display device and manufacturing method thereof |
US6747289B2 (en) * | 2000-04-27 | 2004-06-08 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method of fabricating thereof |
TW594343B (en) * | 2003-05-23 | 2004-06-21 | Toppoly Optoelectronics Corp | Color filter structure and method of fabrication |
KR101090245B1 (en) * | 2003-12-10 | 2011-12-06 | 삼성전자주식회사 | Thin film transistor array panel and method for manufacturing the panel |
JP4230425B2 (en) * | 2004-07-26 | 2009-02-25 | シャープ株式会社 | Color filter substrate and display device |
CN102004310B (en) * | 2005-02-23 | 2013-08-28 | 皮克斯特隆尼斯有限公司 | Display methods and apparatus |
KR101350671B1 (en) * | 2006-05-24 | 2014-01-10 | 엘지디스플레이 주식회사 | liquid crystal display device and method for fabricating the same |
KR101318771B1 (en) * | 2006-12-05 | 2013-10-16 | 삼성디스플레이 주식회사 | Liquid crystal display apparatus |
CN104597656B (en) * | 2015-02-13 | 2018-04-06 | 深圳市华星光电技术有限公司 | Color membrane substrates, manufacture method and liquid crystal panel |
-
2015
- 2015-08-17 CN CN201510504676.9A patent/CN105068346B/en active Active
- 2015-08-20 WO PCT/CN2015/087619 patent/WO2017028298A1/en active Application Filing
- 2015-08-20 JP JP2018507732A patent/JP6564526B2/en active Active
- 2015-08-20 KR KR1020187007111A patent/KR102032488B1/en active IP Right Grant
- 2015-08-20 EA EA201890517A patent/EA034149B1/en not_active IP Right Cessation
- 2015-08-20 GB GB1802130.3A patent/GB2557485B/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004212972A (en) * | 2002-12-26 | 2004-07-29 | Lg Philips Lcd Co Ltd | Liquid crystal display device, its manufacture method and method for manufacturing array substrate for liquid crystal display device |
CN102269834A (en) * | 2011-07-22 | 2011-12-07 | 深圳市华星光电技术有限公司 | Color optical filter and manufacturing method thereof |
CN104656330A (en) * | 2013-11-20 | 2015-05-27 | 乐金显示有限公司 | Liquid Crystal Display Device And Method Of Fabricating The Same |
CN104698713A (en) * | 2015-04-07 | 2015-06-10 | 深圳市华星光电技术有限公司 | Liquid crystal display panel and liquid crystal display device |
CN104808411A (en) * | 2015-05-19 | 2015-07-29 | 友达光电股份有限公司 | Thin film transistor liquid crystal display |
Also Published As
Publication number | Publication date |
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KR20180041696A (en) | 2018-04-24 |
EA034149B1 (en) | 2020-01-09 |
JP2018527614A (en) | 2018-09-20 |
CN105068346A (en) | 2015-11-18 |
JP6564526B2 (en) | 2019-08-21 |
KR102032488B1 (en) | 2019-10-15 |
EA201890517A1 (en) | 2018-07-31 |
GB2557485A (en) | 2018-06-20 |
WO2017028298A1 (en) | 2017-02-23 |
GB201802130D0 (en) | 2018-03-28 |
GB2557485B (en) | 2021-03-31 |
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