CN105052246B - 极紫外光源 - Google Patents

极紫外光源 Download PDF

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Publication number
CN105052246B
CN105052246B CN201480014562.XA CN201480014562A CN105052246B CN 105052246 B CN105052246 B CN 105052246B CN 201480014562 A CN201480014562 A CN 201480014562A CN 105052246 B CN105052246 B CN 105052246B
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CN
China
Prior art keywords
target
target material
light
distribution
spatially
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201480014562.XA
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English (en)
Chinese (zh)
Other versions
CN105052246A (zh
Inventor
陶业争
R·J·拉法克
I·V·福缅科夫
D·J·W·布朗
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ASML Netherlands BV
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ASML Netherlands BV
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Publication date
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Publication of CN105052246A publication Critical patent/CN105052246A/zh
Application granted granted Critical
Publication of CN105052246B publication Critical patent/CN105052246B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—Production of X-ray radiation generated from plasma
    • H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
    • H05G2/0082—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation the energy-carrying beam being a laser beam
    • H05G2/0086—Optical arrangements for conveying the laser beam to the plasma generation location

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  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Lasers (AREA)
CN201480014562.XA 2013-03-15 2014-02-25 极紫外光源 Expired - Fee Related CN105052246B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13/843,626 2013-03-15
US13/843,626 US8680495B1 (en) 2013-03-15 2013-03-15 Extreme ultraviolet light source
PCT/US2014/018422 WO2014149436A1 (en) 2013-03-15 2014-02-25 Extreme ultraviolet light source

Publications (2)

Publication Number Publication Date
CN105052246A CN105052246A (zh) 2015-11-11
CN105052246B true CN105052246B (zh) 2017-06-13

Family

ID=50288821

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201480014562.XA Expired - Fee Related CN105052246B (zh) 2013-03-15 2014-02-25 极紫外光源

Country Status (6)

Country Link
US (2) US8680495B1 (enExample)
JP (1) JP2016512913A (enExample)
KR (1) KR20150131187A (enExample)
CN (1) CN105052246B (enExample)
TW (1) TWI612850B (enExample)
WO (1) WO2014149436A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015528994A (ja) * 2012-08-01 2015-10-01 エーエスエムエル ネザーランズ ビー．ブイ． 放射を発生させるための方法及び装置
WO2014120985A1 (en) * 2013-01-30 2014-08-07 Kla-Tencor Corporation Euv light source using cryogenic droplet targets in mask inspection
US9000405B2 (en) 2013-03-15 2015-04-07 Asml Netherlands B.V. Beam position control for an extreme ultraviolet light source
WO2015036025A1 (de) * 2013-09-12 2015-03-19 Trumpf Laser- Und Systemtechnik Gmbh Strahlführungseinrichtung und euv-strahlungserzeugungsvorrichtung mit einer überlagerungseinrichtung
US9357625B2 (en) 2014-07-07 2016-05-31 Asml Netherlands B.V. Extreme ultraviolet light source
TWI739755B (zh) * 2015-08-12 2021-09-21 荷蘭商Ａｓｍｌ荷蘭公司 極紫外線光源中之目標擴張率控制
US9820368B2 (en) 2015-08-12 2017-11-14 Asml Netherlands B.V. Target expansion rate control in an extreme ultraviolet light source
US20170311429A1 (en) * 2016-04-25 2017-10-26 Asml Netherlands B.V. Reducing the effect of plasma on an object in an extreme ultraviolet light source
US10663866B2 (en) 2016-09-20 2020-05-26 Asml Netherlands B.V. Wavelength-based optical filtering
US9904068B1 (en) 2017-01-09 2018-02-27 Asml Netherlands B.V. Reducing an optical power of a reflected light beam
NL2023633A (en) * 2018-09-25 2020-04-30 Asml Netherlands Bv Laser system for target metrology and alteration in an euv light source
US12444901B2 (en) 2020-04-09 2025-10-14 Asml Netherlands B.V. Seed laser system for radiation source

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
US7491954B2 (en) * 2006-10-13 2009-02-17 Cymer, Inc. Drive laser delivery systems for EUV light source
US7928416B2 (en) 2006-12-22 2011-04-19 Cymer, Inc. Laser produced plasma EUV light source
US7361204B1 (en) * 2003-11-05 2008-04-22 Research Foundation Of The University Of Central Florida Generator for flux specific bursts of nano-particles
JP5156192B2 (ja) * 2006-01-24 2013-03-06 ギガフォトン株式会社 極端紫外光源装置
JP5358060B2 (ja) * 2007-02-20 2013-12-04 ギガフォトン株式会社 極端紫外光源装置
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
JP2010103499A (ja) * 2008-09-29 2010-05-06 Komatsu Ltd 極端紫外光源装置および極端紫外光生成方法
JP5426317B2 (ja) * 2008-10-23 2014-02-26 ギガフォトン株式会社 極端紫外光光源装置
JP5368261B2 (ja) * 2008-11-06 2013-12-18 ギガフォトン株式会社 極端紫外光源装置、極端紫外光源装置の制御方法
US8304752B2 (en) * 2009-04-10 2012-11-06 Cymer, Inc. EUV light producing system and method utilizing an alignment laser
JP5603135B2 (ja) * 2009-05-21 2014-10-08 ギガフォトン株式会社 チャンバ装置におけるターゲット軌道を計測及び制御する装置及び方法
US8173985B2 (en) * 2009-12-15 2012-05-08 Cymer, Inc. Beam transport system for extreme ultraviolet light source
JP2013004258A (ja) * 2011-06-15 2013-01-07 Gigaphoton Inc 極端紫外光生成装置及び極端紫外光の生成方法
JP5722061B2 (ja) * 2010-02-19 2015-05-20 ギガフォトン株式会社 極端紫外光源装置及び極端紫外光の発生方法
US9113540B2 (en) * 2010-02-19 2015-08-18 Gigaphoton Inc. System and method for generating extreme ultraviolet light
US9072153B2 (en) * 2010-03-29 2015-06-30 Gigaphoton Inc. Extreme ultraviolet light generation system utilizing a pre-pulse to create a diffused dome shaped target
JP2012199512A (ja) * 2011-03-10 2012-10-18 Gigaphoton Inc 極端紫外光生成装置及び極端紫外光生成方法
US8604452B2 (en) * 2011-03-17 2013-12-10 Cymer, Llc Drive laser delivery systems for EUV light source
US9516730B2 (en) * 2011-06-08 2016-12-06 Asml Netherlands B.V. Systems and methods for buffer gas flow stabilization in a laser produced plasma light source
WO2013029906A1 (en) * 2011-09-02 2013-03-07 Asml Netherlands B.V. Radiation source
JP2013140771A (ja) * 2011-12-09 2013-07-18 Gigaphoton Inc ターゲット供給装置

Also Published As

Publication number Publication date
CN105052246A (zh) 2015-11-11
US20140264092A1 (en) 2014-09-18
JP2016512913A (ja) 2016-05-09
TW201444416A (zh) 2014-11-16
WO2014149436A1 (en) 2014-09-25
US8866110B2 (en) 2014-10-21
KR20150131187A (ko) 2015-11-24
TWI612850B (zh) 2018-01-21
US8680495B1 (en) 2014-03-25

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Granted publication date: 20170613

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