CN105036562A - Anti-dazzle glass etching liquid and preparation method thereof - Google Patents
Anti-dazzle glass etching liquid and preparation method thereof Download PDFInfo
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- CN105036562A CN105036562A CN201510466659.0A CN201510466659A CN105036562A CN 105036562 A CN105036562 A CN 105036562A CN 201510466659 A CN201510466659 A CN 201510466659A CN 105036562 A CN105036562 A CN 105036562A
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- 239000011521 glass Substances 0.000 title claims abstract description 54
- 238000005530 etching Methods 0.000 title claims abstract description 43
- 238000002360 preparation method Methods 0.000 title claims description 17
- 239000007788 liquid Substances 0.000 title abstract 4
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims abstract description 45
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims abstract description 42
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 42
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 claims abstract description 42
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 claims abstract description 42
- -1 sodium fluoroborate Chemical compound 0.000 claims abstract description 24
- MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 claims abstract description 21
- 235000019270 ammonium chloride Nutrition 0.000 claims abstract description 21
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims abstract description 21
- 229910001634 calcium fluoride Inorganic materials 0.000 claims abstract description 21
- 229910000160 potassium phosphate Inorganic materials 0.000 claims abstract description 21
- 235000011009 potassium phosphates Nutrition 0.000 claims abstract description 21
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 claims abstract description 21
- 229910052939 potassium sulfate Inorganic materials 0.000 claims abstract description 21
- 235000011151 potassium sulphates Nutrition 0.000 claims abstract description 21
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 19
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 18
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229920001817 Agar Polymers 0.000 claims abstract description 14
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 claims abstract description 14
- 229930006000 Sucrose Natural products 0.000 claims abstract description 14
- 239000008272 agar Substances 0.000 claims abstract description 14
- 239000000661 sodium alginate Substances 0.000 claims abstract description 14
- 235000010413 sodium alginate Nutrition 0.000 claims abstract description 14
- 229940005550 sodium alginate Drugs 0.000 claims abstract description 14
- 239000005720 sucrose Substances 0.000 claims abstract description 14
- 238000003756 stirring Methods 0.000 claims description 28
- 235000013772 propylene glycol Nutrition 0.000 claims description 26
- 239000002994 raw material Substances 0.000 claims description 24
- ASZZHBXPMOVHCU-UHFFFAOYSA-N 3,9-diazaspiro[5.5]undecane-2,4-dione Chemical compound C1C(=O)NC(=O)CC11CCNCC1 ASZZHBXPMOVHCU-UHFFFAOYSA-N 0.000 claims description 20
- LDDQLRUQCUTJBB-UHFFFAOYSA-N ammonium fluoride Chemical compound [NH4+].[F-] LDDQLRUQCUTJBB-UHFFFAOYSA-N 0.000 claims description 20
- 229940093916 potassium phosphate Drugs 0.000 claims description 20
- 229910001495 sodium tetrafluoroborate Inorganic materials 0.000 claims description 19
- 239000001117 sulphuric acid Substances 0.000 claims description 17
- 235000011149 sulphuric acid Nutrition 0.000 claims description 17
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 13
- 229910052710 silicon Inorganic materials 0.000 claims description 13
- 239000010703 silicon Substances 0.000 claims description 13
- 229920003048 styrene butadiene rubber Polymers 0.000 claims description 13
- 230000032683 aging Effects 0.000 claims description 11
- 101100203596 Caenorhabditis elegans sol-1 gene Proteins 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 5
- 238000000889 atomisation Methods 0.000 abstract description 4
- 238000002834 transmittance Methods 0.000 abstract description 2
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 abstract 1
- DPXJVFZANSGRMM-UHFFFAOYSA-N acetic acid;2,3,4,5,6-pentahydroxyhexanal;sodium Chemical compound [Na].CC(O)=O.OCC(O)C(O)C(O)C(O)C=O DPXJVFZANSGRMM-UHFFFAOYSA-N 0.000 abstract 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 abstract 1
- 239000001768 carboxy methyl cellulose Substances 0.000 abstract 1
- VBKNTGMWIPUCRF-UHFFFAOYSA-M potassium;fluoride;hydrofluoride Chemical compound F.[F-].[K+] VBKNTGMWIPUCRF-UHFFFAOYSA-M 0.000 abstract 1
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical compound CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 abstract 1
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract 1
- 235000019812 sodium carboxymethyl cellulose Nutrition 0.000 abstract 1
- 229920001027 sodium carboxymethylcellulose Polymers 0.000 abstract 1
- 230000008901 benefit Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 239000000523 sample Substances 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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- Compositions Of Macromolecular Compounds (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
Abstract
The invention discloses anti-dazzle glass etching liquid which comprises, by weight parts, 35-45 parts of hydrofluoric acid, 5-10 parts of ammonium bifluoride, 12-20 parts of ammonium fluoride, 2-10 parts of calcium fluoride, 1-5 parts of potassium bifluoride, 10-25 parts of ammonium chloride, 3-10 parts of potassium sulfate, 1-5 parts of barium sulfate, 1-5 parts of potassium phosphate, 0.1-3 parts of sodium fluoroborate, 1-3 parts of agar, 1-3 parts of sodium alginate, 2-5 parts of sodium carboxymethyl cellulose, 0.1-2 parts of silica sol, 0.2-1.5 parts of butadiene styrene rubber, 1-3 parts of propylene glycol, 1-5 parts of propylene glycol, 1-5 parts of propanediol, 0.5-2 parts of sucrose, 30-50 parts of sulfuric acid solution and 100-150 parts of water. The invention further provides a method for preparing the anti-dazzle glass etching liquid. A process is simple, the conditions are moderate, the obtained etching liquid is good in stability; and prepared anti-dazzle glass is high in transmittance and degree of atomization, excellent in impact resistance and good in anti-dazzle effect.
Description
Technical field
The present invention relates to anti-glare glass technical field, particularly relate to a kind of anti-glare glass etching solution and preparation method thereof.
Background technology
Glass, because of advantages such as its intensity are high, excellent optical performance, long-term working stability are good, is widely used in daily life.But due to the reflectivity that glass surface is higher, often cause " dazzle attack ", namely we " light pollution " often said, such as we when operating computer usually for the scenery outside indicating meter cannot to see displaying contents and worried clearly in the reflection of display surface; When we stop before showcase, to probe into scenery in show window time, glass surface is reflective often makes us cannot observe scenery etc. in window clearly, and these are all because the luminous reflectance of glass surface causes.Reduce the impact of glass-reflected light, glass is carried out can play good effect without optical processing.
Anti-glare glass can reduce the interference of surround lighting, reduce screen reflecting, improve visible angle and the brightness of display frame, allow image is more clear, color is more gorgeous, color is more saturated, thus improve display effect, be widely used in the fields such as television splicing wall, flat panel TV, liquid-crystal display, touch-screen, industrial instrument and senior photo frame at present.In the preparation process of anti-glare glass, chemical method for etching is a kind of method often used, and etching solution is the important factor of impact etching; Its formula of existing etching solution is not quite reasonable, and the anti-glare glass obtained exists the defect of transmitance and condensation rate, shock resistance difference, limits the application of anti-glare glass.
Summary of the invention
Based on the technical problem that background technology exists, the present invention proposes a kind of anti-glare glass etching solution and preparation method thereof, described preparation method's technique is simple, mild condition, the anti-glare glass etching solution good stability obtained, the anti-glare glass transmitance prepared with it and degree of atomization high, excellent shock resistance, antiglare effect is good.
A kind of anti-glare glass etching solution that the present invention proposes, its raw material comprises following component by weight: hydrofluoric acid 35-45 part, ammonium bifluoride 5-10 part, Neutral ammonium fluoride 12-20 part, Calcium Fluoride (Fluorspan) 2-10 part, potassium hydrogen fluoride 1-5 part, ammonium chloride 10-25 part, potassium sulfate 3-10 part, barium sulfate 1-5 part, potassiumphosphate 1-5 part, Sodium tetrafluoroborate 0.1-3 part, agar 1-3 part, sodium alginate 1-3 part, Xylo-Mucine 2-5 part, silicon sol 0.1-2 part, styrene-butadiene rubber(SBR) 0.2-1.5 part, propyleneglycoles 1-3 part, propylene glycol 1-5 part, sucrose 0.5-2 part, massfraction is sulphuric acid soln 30-50 part of 20-30%, water 100-150 part.
In a particular embodiment, a kind of anti-glare glass etching solution that the present invention proposes, in its raw material, the weight part of hydrofluoric acid can be 35,36,37,38,39,42,43,44.6,45 parts; The weight part of ammonium bifluoride can be 5,6,7,7.5,8,8.6,9,9.3,9.4,10 parts; The weight part of Neutral ammonium fluoride can be 12,13,14,14.6,15,16,18,19,19.3,20 parts; The weight part of Calcium Fluoride (Fluorspan) can be 2,3,4,5,5.3,6,6.3,7,8,8.5,9,9.4,10 parts; The weight part of potassium hydrogen fluoride can be 1,1.2,1.8,2,2.3,2.8,3,3.4,4,4.5,5 part; The weight part of ammonium chloride can be 10,12,13,15,16,16.3,18,19,19.4,21,23,23.4,24,24.6,25 parts; The weight part of potassium sulfate can be 3,4,5,5.3,6,6.3,7,8,8.5,9,9.6,10 parts; The weight part of barium sulfate can be 1,1.2,1.8,2,2.3,2.7,3,3.4,3.8,4,4.5,5 part; The weight part of potassiumphosphate can be 1,1.2,1.8,2,2.6,3,3.4,3.8,4,4.6,5 part; The weight part of Sodium tetrafluoroborate can be 0.1,0.5,0.8,1,1.3,1.6,1.85,2,2.3,2.7,2.8,3 part; The weight part of agar can be 1,1.2,1.3,1.8,1.9,2,2.3,2.7,3 part; The weight part of sodium alginate can be 1,1.2,1.8,2,2.3,2.7,2.85,3 part; The weight part of Xylo-Mucine can be 2,2.3,2.7,2.8,3,3.4,4,4.2,4.8,5 parts; The weight part of silicon sol can be 0.1,0.2,0.5,0.8,1,1.2,1.6,1.85,1.9,1.94,2 part; The weight part of styrene-butadiene rubber(SBR) can be 0.2,0.3,0.5,0.8,1,1.2,1.26,1.3,1.34,1.5 part; The weight part of propyleneglycoles can be 1,1.2,1.3,1.5,1.8,2,2.3,2.7,2.86,3 part; The weight part of propylene glycol can be 1,1.2,1.5,1.8,2,2.6,2.8,3,3.4,3.5,4,4.7,5 part; The weight part of sucrose can be 0.5,0.6,0.8,1,1.2,1.5,1.68,1.8,1.94,2 part; Massfraction is that the weight part of the sulphuric acid soln of 20-30% can be 30,32,35,38,38.6,39,42,43,45,46,46.3,48,48.6,50 parts; The weight part of water can be 100,105,109,112,118,123,128,132,138,140,146,150 parts.
Preferably, in its raw material, the weight ratio of hydrofluoric acid, ammonium bifluoride, Neutral ammonium fluoride, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride, ammonium chloride, potassium sulfate, barium sulfate, potassiumphosphate is 39-43:7-9:15-18:6-8:3-4.5:17-20:6-8:3-3.5:4-4.5.
Preferably, in its raw material, the weight ratio of agar, sodium alginate, Xylo-Mucine, silicon sol, styrene-butadiene rubber(SBR), propyleneglycoles, propylene glycol, sucrose is 1.8-2.3:1.9-2.2:3-3.8:0.9-1.2:0.7-1:1.9-2.4:3.2-3.8:1.2-1.6.
Preferably, its raw material comprises following component by weight: 42 parts, hydrofluoric acid, ammonium bifluoride 8 parts, Neutral ammonium fluoride 13 parts, 8 parts, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride 4 parts, ammonium chloride 19 parts, potassium sulfate 6.8 parts, 3.2 parts, barium sulfate, potassiumphosphate 4.2 parts, Sodium tetrafluoroborate 0.9 part, 2 parts, agar, sodium alginate 2.2 parts, Xylo-Mucine 3.8 parts, silicon sol 1 part, 0.9 part, styrene-butadiene rubber(SBR), propyleneglycoles 2.2 parts, propylene glycol 3.5 parts, sucrose 1.3 parts, massfraction are sulphuric acid soln 40 parts, 120 parts, the water of 25%.
The preparation method of a kind of described anti-glare glass etching solution that the present invention also proposes, comprise the following steps: by proportioning, water being added massfraction is in the sulphuric acid soln of 20-30%, hydrofluoric acid, ammonium bifluoride, Neutral ammonium fluoride, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride, ammonium chloride, potassium sulfate, barium sulfate is added after stirring, stir, then add potassiumphosphate and Sodium tetrafluoroborate and stir, add remaining raw material afterwards, carry out ageing after stirring and obtain described anti-glare glass etching solution.
Preferably, the time of described ageing is 25-35h.
Preferably, the time of described ageing is 29h.
Have selected ammonium bifluoride, Neutral ammonium fluoride, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride in the present invention and coordinate source as fluorion with hydrofluoric acid, by optimizing the proportioning of multiple fluorochemical, its performance is worked in coordination with, a large amount of fluorions has been laid in while raising ionic strength, have adjusted the activity of reaction, prevent the problem that reaction is too fast, make reaction conditions gentle, the anti-glare glass surface obtained is made to produce concavo-convex phenomenon, slow releasing function can be played simultaneously, prevent the continuation of erosional surface to corrode, be conducive to being formed evenly trickle hair side; The cooperation of ammonium chloride, potassium sulfate, barium sulfate, Sodium tetrafluoroborate joins in system, have adjusted the salinity of system, facilitates the formation of nucleus and the refinement of crystal grain, make etch layer thinning, keeps the true of image; Potassiumphosphate joins in system, can form hydroxide radical and phosphate anion in system, Sodium tetrafluoroborate auxiliary under, further improve the etch effect of fluorochemical; The cooperation of agar, sodium alginate, Xylo-Mucine, silicon sol, styrene-butadiene rubber(SBR), propyleneglycoles, propylene glycol, sucrose joins in system, improve the viscosity of system on the one hand, etching solution is made not easily to occur sedimentation phenomenon, improve the stability of system, improve the ionic strength of system on the other hand.
In the present invention, by selecting suitable raw material, regulate the content of each raw material, make the performance complement of each raw material, the etching solution obtained for the preparation of anti-glare glass, the anti-glare glass transmitance of preparation and degree of atomization high, and thin and thick is even, surface is not easy to leave cut and fingerprint, for being widely used in the fields such as field such as television splicing wall, flat panel TV, liquid-crystal display, touch-screen, industrial instrument and senior photo frame, has good economic benefit and social benefit.
Embodiment
Below, by specific embodiment, technical scheme of the present invention is described in detail.
Embodiment 1
A kind of anti-glare glass etching solution that the present invention proposes, its raw material comprises following component by weight: 35 parts, hydrofluoric acid, ammonium bifluoride 10 parts, Neutral ammonium fluoride 12 parts, 10 parts, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride 1 part, ammonium chloride 25 parts, potassium sulfate 3 parts, 5 parts, barium sulfate, potassiumphosphate 1 part, Sodium tetrafluoroborate 3 parts, 1 part, agar, sodium alginate 3 parts, Xylo-Mucine 2 parts, silicon sol 2 parts, 0.2 part, styrene-butadiene rubber(SBR), propyleneglycoles 3 parts, propylene glycol 1 part, sucrose 2 parts, massfraction are sulphuric acid soln 50 parts, 100 parts, the water of 20%.
The preparation method of a kind of anti-glare glass etching solution that the present invention proposes, comprise the following steps: by proportioning, water being added massfraction is in the sulphuric acid soln of 20%, hydrofluoric acid, ammonium bifluoride, Neutral ammonium fluoride, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride, ammonium chloride, potassium sulfate, barium sulfate is added after stirring, stir, then add potassiumphosphate and Sodium tetrafluoroborate and stir, add remaining raw material afterwards, carry out ageing 30h after stirring and obtain described anti-glare glass etching solution.
Embodiment 2
A kind of anti-glare glass etching solution that the present invention proposes, its raw material comprises following component by weight: 45 parts, hydrofluoric acid, ammonium bifluoride 5 parts, Neutral ammonium fluoride 20 parts, 2 parts, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride 5 parts, ammonium chloride 10 parts, potassium sulfate 10 parts, 1 part, barium sulfate, potassiumphosphate 5 parts, Sodium tetrafluoroborate 0.1 part, 3 parts, agar, sodium alginate 1 part, Xylo-Mucine 5 parts, silicon sol 0.1 part, 1.5 parts, styrene-butadiene rubber(SBR), propyleneglycoles 1 part, propylene glycol 5 parts, sucrose 0.5 part, massfraction are sulphuric acid soln 30 parts, 150 parts, the water of 30%.
The preparation method of a kind of anti-glare glass etching solution that the present invention proposes, comprise the following steps: by proportioning, water being added massfraction is in the sulphuric acid soln of 30%, hydrofluoric acid, ammonium bifluoride, Neutral ammonium fluoride, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride, ammonium chloride, potassium sulfate, barium sulfate is added after stirring, stir, then add potassiumphosphate and Sodium tetrafluoroborate and stir, add remaining raw material afterwards, carry out ageing 27h after stirring and obtain described anti-glare glass etching solution.
Embodiment 3
A kind of anti-glare glass etching solution that the present invention proposes, its raw material comprises following component by weight: 42 parts, hydrofluoric acid, ammonium bifluoride 8 parts, Neutral ammonium fluoride 13 parts, 8 parts, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride 4 parts, ammonium chloride 19 parts, potassium sulfate 6.8 parts, 3.2 parts, barium sulfate, potassiumphosphate 4.2 parts, Sodium tetrafluoroborate 0.9 part, 2 parts, agar, sodium alginate 2.2 parts, Xylo-Mucine 3.8 parts, silicon sol 1 part, 0.9 part, styrene-butadiene rubber(SBR), propyleneglycoles 2.2 parts, propylene glycol 3.5 parts, sucrose 1.3 parts, massfraction are sulphuric acid soln 40 parts, 120 parts, the water of 25%.
The preparation method of a kind of anti-glare glass etching solution that the present invention proposes, comprise the following steps: by proportioning, water being added massfraction is in the sulphuric acid soln of 25%, hydrofluoric acid, ammonium bifluoride, Neutral ammonium fluoride, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride, ammonium chloride, potassium sulfate, barium sulfate is added after stirring, stir, then add potassiumphosphate and Sodium tetrafluoroborate and stir, add remaining raw material afterwards, carry out ageing 35h after stirring and obtain described anti-glare glass etching solution.
Embodiment 4
A kind of anti-glare glass etching solution that the present invention proposes, its raw material comprises following component by weight: 39 parts, hydrofluoric acid, ammonium bifluoride 9 parts, Neutral ammonium fluoride 15 parts, 8 parts, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride 3 parts, ammonium chloride 20 parts, potassium sulfate 6 parts, 3.5 parts, barium sulfate, potassiumphosphate 4 parts, Sodium tetrafluoroborate 1.3 parts, 1.8 parts, agar, sodium alginate 2.2 parts, Xylo-Mucine 3 parts, silicon sol 1.2 parts, 0.7 part, styrene-butadiene rubber(SBR), propyleneglycoles 2.4 parts, propylene glycol 3.2 parts, sucrose 1.6 parts, massfraction are sulphuric acid soln 42 parts, 110 parts, the water of 20%.
The preparation method of a kind of anti-glare glass etching solution that the present invention proposes, comprise the following steps: by proportioning, water being added massfraction is in the sulphuric acid soln of 20%, hydrofluoric acid, ammonium bifluoride, Neutral ammonium fluoride, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride, ammonium chloride, potassium sulfate, barium sulfate is added after stirring, stir, then add potassiumphosphate and Sodium tetrafluoroborate and stir, add remaining raw material afterwards, carry out ageing 25h after stirring and obtain described anti-glare glass etching solution.
Embodiment 5
A kind of anti-glare glass etching solution that the present invention proposes, its raw material comprises following component by weight: 43 parts, hydrofluoric acid, ammonium bifluoride 7 parts, Neutral ammonium fluoride 18 parts, 6 parts, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride 4.5 parts, ammonium chloride 17 parts, potassium sulfate 8 parts, 3 parts, barium sulfate, potassiumphosphate 4.5 parts, Sodium tetrafluoroborate 0.8 part, 2.3 parts, agar, sodium alginate 1.9 parts, Xylo-Mucine 3.8 parts, silicon sol 0.9 part, 1 part, styrene-butadiene rubber(SBR), propyleneglycoles 1.9 parts, propylene glycol 3.8 parts, sucrose 1.2 parts, massfraction are sulphuric acid soln 39 parts, 125 parts, the water of 30%.
The preparation method of a kind of anti-glare glass etching solution that the present invention proposes, comprise the following steps: by proportioning, water being added massfraction is in the sulphuric acid soln of 30%, hydrofluoric acid, ammonium bifluoride, Neutral ammonium fluoride, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride, ammonium chloride, potassium sulfate, barium sulfate is added after stirring, stir, then add potassiumphosphate and Sodium tetrafluoroborate and stir, add remaining raw material afterwards, carry out ageing 29h after stirring and obtain described anti-glare glass etching solution.
The glass of pre-etched utilized successively organic solvent and washed with de-ionized water and carry out drying, by preheating glass after drying to 20-30 DEG C, add in the anti-glare glass etching solution in embodiment 1-5, be soak 40-100s in the etching solution of 20-30 DEG C to obtain anti-glare glass in temperature, the transmittance of described anti-glare glass is greater than 89%, degree of atomization is 4-5.5%, and reflectivity is 6-7.5%, and glossiness is greater than 85%.
The above; be only the present invention's preferably embodiment; but protection scope of the present invention is not limited thereto; anyly be familiar with those skilled in the art in the technical scope that the present invention discloses; be equal to according to technical scheme of the present invention and inventive concept thereof and replace or change, all should be encompassed within protection scope of the present invention.
Claims (7)
1. an anti-glare glass etching solution, it is characterized in that, its raw material comprises following component by weight: hydrofluoric acid 35-45 part, ammonium bifluoride 5-10 part, Neutral ammonium fluoride 12-20 part, Calcium Fluoride (Fluorspan) 2-10 part, potassium hydrogen fluoride 1-5 part, ammonium chloride 10-25 part, potassium sulfate 3-10 part, barium sulfate 1-5 part, potassiumphosphate 1-5 part, Sodium tetrafluoroborate 0.1-3 part, agar 1-3 part, sodium alginate 1-3 part, Xylo-Mucine 2-5 part, silicon sol 0.1-2 part, styrene-butadiene rubber(SBR) 0.2-1.5 part, propyleneglycoles 1-3 part, propylene glycol 1-5 part, sucrose 0.5-2 part, massfraction is sulphuric acid soln 30-50 part of 20-30%, water 100-150 part.
2. anti-glare glass etching solution according to claim 1, it is characterized in that, in its raw material, the weight ratio of hydrofluoric acid, ammonium bifluoride, Neutral ammonium fluoride, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride, ammonium chloride, potassium sulfate, barium sulfate, potassiumphosphate is 39-43:7-9:15-18:6-8:3-4.5:17-20:6-8:3-3.5:4-4.5.
3. anti-glare glass etching solution according to claim 1 or 2, it is characterized in that, in its raw material, the weight ratio of agar, sodium alginate, Xylo-Mucine, silicon sol, styrene-butadiene rubber(SBR), propyleneglycoles, propylene glycol, sucrose is 1.8-2.3:1.9-2.2:3-3.8:0.9-1.2:0.7-1:1.9-2.4:3.2-3.8:1.2-1.6.
4. anti-glare glass etching solution according to any one of claim 1-3, it is characterized in that, its raw material comprises following component by weight: 42 parts, hydrofluoric acid, ammonium bifluoride 8 parts, Neutral ammonium fluoride 13 parts, 8 parts, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride 4 parts, ammonium chloride 19 parts, potassium sulfate 6.8 parts, 3.2 parts, barium sulfate, potassiumphosphate 4.2 parts, Sodium tetrafluoroborate 0.9 part, 2 parts, agar, sodium alginate 2.2 parts, Xylo-Mucine 3.8 parts, silicon sol 1 part, 0.9 part, styrene-butadiene rubber(SBR), propyleneglycoles 2.2 parts, propylene glycol 3.5 parts, sucrose 1.3 parts, massfraction is the sulphuric acid soln 40 parts of 25%, 120 parts, water.
5. the preparation method of an anti-glare glass etching solution according to any one of claim 1-4, it is characterized in that, comprise the following steps: by proportioning, water being added massfraction is in the sulphuric acid soln of 20-30%, hydrofluoric acid, ammonium bifluoride, Neutral ammonium fluoride, Calcium Fluoride (Fluorspan), potassium hydrogen fluoride, ammonium chloride, potassium sulfate, barium sulfate is added after stirring, stir, then add potassiumphosphate and Sodium tetrafluoroborate and stir, add remaining raw material afterwards, carry out ageing after stirring and obtain described anti-glare glass etching solution.
6. the preparation method of anti-glare glass etching solution according to claim 5, it is characterized in that, the time of described ageing is 25-35h.
7. the preparation method of anti-glare glass etching solution according to claim 5 or 6, it is characterized in that, the time of described ageing is 29h.
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| CN106746703A (en) * | 2017-01-09 | 2017-05-31 | 天津美泰真空技术有限公司 | For the composition of TFT glass substrate thinnings technique pretreatment |
| CN107226624A (en) * | 2017-08-01 | 2017-10-03 | 合肥利裕泰玻璃制品有限公司 | It is a kind of for etching solution of electro-conductive glass and preparation method thereof |
| CN109082274A (en) * | 2018-08-29 | 2018-12-25 | 江苏金琥珀光学科技股份有限公司 | Etching solution and the obtained method without the remaining cell phone rear cover of fingerprint of the utilization etching solution |
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| CN112608753A (en) * | 2020-11-25 | 2021-04-06 | 重庆臻宝实业有限公司 | Etching liquid for general resistance silicon product and its etching method |
| CN112777941A (en) * | 2021-01-13 | 2021-05-11 | 赣州帝晶光电科技有限公司 | Preparation method of AG anti-dazzle glass etching process |
| CN113173710A (en) * | 2021-06-03 | 2021-07-27 | 江苏亿豪新材料科技有限公司 | Formula and etching process of etching liquid for glass product |
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