CN105036562B - A kind of anti-dazzle glas etching solution and preparation method thereof - Google Patents
A kind of anti-dazzle glas etching solution and preparation method thereof Download PDFInfo
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- CN105036562B CN105036562B CN201510466659.0A CN201510466659A CN105036562B CN 105036562 B CN105036562 B CN 105036562B CN 201510466659 A CN201510466659 A CN 201510466659A CN 105036562 B CN105036562 B CN 105036562B
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- 238000005530 etching Methods 0.000 title claims abstract description 44
- 238000002360 preparation method Methods 0.000 title claims abstract description 19
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 claims abstract description 42
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims abstract description 42
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 claims abstract description 42
- LWIHDJKSTIGBAC-UHFFFAOYSA-K tripotassium phosphate Chemical compound [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 claims abstract description 41
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000002994 raw material Substances 0.000 claims abstract description 25
- 235000019270 ammonium chloride Nutrition 0.000 claims abstract description 21
- 239000011734 sodium Substances 0.000 claims abstract description 21
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 21
- DDFHBQSCUXNBSA-UHFFFAOYSA-N 5-(5-carboxythiophen-2-yl)thiophene-2-carboxylic acid Chemical compound S1C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)S1 DDFHBQSCUXNBSA-UHFFFAOYSA-N 0.000 claims abstract description 20
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims abstract description 20
- KVBCYCWRDBDGBG-UHFFFAOYSA-N azane;dihydrofluoride Chemical compound [NH4+].F.[F-] KVBCYCWRDBDGBG-UHFFFAOYSA-N 0.000 claims abstract description 20
- 229910000160 potassium phosphate Inorganic materials 0.000 claims abstract description 20
- 235000011009 potassium phosphates Nutrition 0.000 claims abstract description 20
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 claims abstract description 20
- 229910052939 potassium sulfate Inorganic materials 0.000 claims abstract description 20
- 235000011151 potassium sulphates Nutrition 0.000 claims abstract description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 19
- ASZZHBXPMOVHCU-UHFFFAOYSA-N 3,9-diazaspiro[5.5]undecane-2,4-dione Chemical compound C1C(=O)NC(=O)CC11CCNCC1 ASZZHBXPMOVHCU-UHFFFAOYSA-N 0.000 claims abstract description 16
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 claims abstract description 14
- ULWHHBHJGPPBCO-UHFFFAOYSA-N propane-1,1-diol Chemical class CCC(O)O ULWHHBHJGPPBCO-UHFFFAOYSA-N 0.000 claims abstract description 14
- 239000000661 sodium alginate Substances 0.000 claims abstract description 14
- 235000010413 sodium alginate Nutrition 0.000 claims abstract description 14
- 229940005550 sodium alginate Drugs 0.000 claims abstract description 14
- 229920001817 Agar Polymers 0.000 claims abstract description 13
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 13
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical compound O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 claims abstract description 13
- 229930006000 Sucrose Natural products 0.000 claims abstract description 13
- 239000008272 agar Substances 0.000 claims abstract description 13
- 235000010419 agar Nutrition 0.000 claims abstract description 13
- 239000005720 sucrose Substances 0.000 claims abstract description 13
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000001768 carboxy methyl cellulose Substances 0.000 claims abstract description 12
- 235000013772 propylene glycol Nutrition 0.000 claims abstract description 12
- DPXJVFZANSGRMM-UHFFFAOYSA-N acetic acid;2,3,4,5,6-pentahydroxyhexanal;sodium Chemical compound [Na].CC(O)=O.OCC(O)C(O)C(O)C(O)C=O DPXJVFZANSGRMM-UHFFFAOYSA-N 0.000 claims abstract description 11
- 235000019812 sodium carboxymethyl cellulose Nutrition 0.000 claims abstract description 11
- 229920001027 sodium carboxymethylcellulose Polymers 0.000 claims abstract description 11
- 238000003756 stirring Methods 0.000 claims description 21
- 230000032683 aging Effects 0.000 claims description 9
- -1 calcirm-fluoride Chemical compound 0.000 claims description 9
- 239000011737 fluorine Substances 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 238000003682 fluorination reaction Methods 0.000 claims description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims 2
- AQLLBJAXUCIJSR-UHFFFAOYSA-N OC(=O)C[Na] Chemical compound OC(=O)C[Na] AQLLBJAXUCIJSR-UHFFFAOYSA-N 0.000 claims 1
- 240000000111 Saccharum officinarum Species 0.000 claims 1
- 235000007201 Saccharum officinarum Nutrition 0.000 claims 1
- 239000001257 hydrogen Substances 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 claims 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 claims 1
- 238000000034 method Methods 0.000 abstract description 7
- 230000000694 effects Effects 0.000 abstract description 6
- 238000000889 atomisation Methods 0.000 abstract description 4
- 230000035939 shock Effects 0.000 abstract description 3
- 239000011521 glass Substances 0.000 description 10
- FWZMWMSAGOVWEZ-UHFFFAOYSA-N potassium;hydrofluoride Chemical compound F.[K] FWZMWMSAGOVWEZ-UHFFFAOYSA-N 0.000 description 5
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000005864 Sulphur Substances 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- OCKPCBLVNKHBMX-UHFFFAOYSA-N butylbenzene Chemical compound CCCCC1=CC=CC=C1 OCKPCBLVNKHBMX-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 235000019197 fats Nutrition 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000010977 jade Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- ILRLTAZWFOQHRT-UHFFFAOYSA-N potassium;sulfuric acid Chemical compound [K].OS(O)(=O)=O ILRLTAZWFOQHRT-UHFFFAOYSA-N 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Surface Treatment Of Glass (AREA)
- Glass Compositions (AREA)
Abstract
The invention discloses a kind of anti-dazzle glas etching solution, its raw material includes 35 45 parts of hydrofluoric acid, 5 10 parts of ammonium acid fluoride, 12 20 parts of ammonium fluoride, 2 10 parts of calcirm-fluoride, 15 parts of potassium hydrogen fluoride, 10 25 parts of ammonium chloride, 3 10 parts of potassium sulfate, 15 parts of barium sulfate, 15 parts of potassium phosphate, 0.1 3 parts of sodium fluoborate, 13 parts of agar, 13 parts of sodium alginate, 25 parts of sodium carboxymethylcellulose, 0.1 2 parts of Ludox, 0.2 1.5 parts of butadiene-styrene rubber, 13 parts of propyleneglycoles, 15 parts of propane diols, 0.5 2 parts of sucrose, 30 50 parts of sulfuric acid solution, 100 150 parts of water by weight.The preparation method for the anti-dazzle glas etching solution that the present invention also proposes, technique is simple, mild condition, and obtained etching solution stability is good, and the anti-dazzle glas transmitance and degree of atomization of preparation are high, excellent shock resistance, and antiglare effect is good.
Description
Technical field
The present invention relates to anti-dazzle glas technical field, more particularly to a kind of anti-dazzle glas etching solution and preparation method thereof.
Background technology
The advantages that glass is because of its intensity height, excellent optical performance, good long-term working stability is extensive in daily life
With.But due to the higher reflectivity of glass surface, often result in " dazzle attack ", that is, we often say " light is dirty
Dye ", such as our scenery in operating computer usually from outside display can not be seen clearly aobvious in the reflection of display surface
Show content and worried；When we stop when scenery in show window is probed into before showcase, glass surface is reflective often to make our nothings
Scenery etc. in method window visible in detail, these are all because caused by the light reflection of glass surface.Reduce glass-reflected
The influence of light, glass is carried out to play good effect without light processing.
Anti-dazzle glas can reduce the interference of ambient light, reduce screen reflecting, improve the visible angle of display picture and bright
Degree, allows image is apparent, color is more gorgeous, color more saturation, so as to improve display effect, has been widely used in TV at present
The fields such as combination, flat panel TV, liquid crystal display, touch-screen, industrial instrument and advanced photo frame.In the preparation of anti-dazzle glas
During, chemical method for etching is a kind of method being commonly used, and etching solution is an important factor for influenceing etching；Existing etching solution
Its formula is not quite reasonable, and obtained anti-dazzle glas has the defects of transmitance and condensation rate, shock resistance difference, limits anti-dazzle glass
The application of glass.
The content of the invention
Based on technical problem existing for background technology, the present invention proposes a kind of anti-dazzle glas etching solution and its preparation side
Method, the preparation method technique is simple, mild condition, and obtained anti-dazzle glas etching solution stability is good, is prepared with it anti-dazzle
Glass transmitance and degree of atomization are high, excellent shock resistance, and antiglare effect is good.
A kind of anti-dazzle glas etching solution proposed by the present invention, its raw material include following components by weight：Hydrofluoric acid 35-45
Part, ammonium acid fluoride 5-10 parts, ammonium fluoride 12-20 parts, calcirm-fluoride 2-10 parts, potassium hydrogen fluoride 1-5 parts, ammonium chloride 10-25 parts, sulfuric acid
Potassium 3-10 parts, barium sulfate 1-5 parts, potassium phosphate 1-5 parts, sodium fluoborate 0.1-3 parts, agar 1-3 parts, sodium alginate 1-3 parts, carboxylic first
Base sodium cellulosate 2-5 parts, Ludox 0.1-2 parts, butadiene-styrene rubber 0.2-1.5 parts, propyleneglycoles 1-3 parts, propane diols 1-5 parts,
Sucrose 0.5-2 parts, sulfuric acid solution 30-50 parts, water 100-150 part that mass fraction is 20-30%.
In a particular embodiment, a kind of anti-dazzle glas etching solution proposed by the present invention, in its raw material, the parts by weight of hydrofluoric acid
It can be 35,36,37,38,39,42,43,44.6,45 parts；The parts by weight of ammonium acid fluoride can be 5,6,7,7.5,8,8.6,9,
9.3rd, 9.4,10 parts；The parts by weight of ammonium fluoride can be 12,13,14,14.6,15,16,18,19,19.3,20 parts；Calcirm-fluoride
Parts by weight can be 2,3,4,5,5.3,6,6.3,7,8,8.5,9,9.4,10 parts；The parts by weight of potassium hydrogen fluoride can be 1,1.2,
1.8th, 2,2.3,2.8,3,3.4,4,4.5,5 parts；The parts by weight of ammonium chloride can be 10,12,13,15,16,16.3,18,19,
19.4th, 21,23,23.4,24,24.6,25 parts；The parts by weight of potassium sulfate can be 3,4,5,5.3,6,6.3,7,8,8.5,9,
9.6th, 10 parts；The parts by weight of barium sulfate can be 1,1.2,1.8,2,2.3,2.7,3,3.4,3.8,4,4.5,5 part；Potassium phosphate
Parts by weight can be 1,1.2,1.8,2,2.6,3,3.4,3.8,4,4.6,5 part；The parts by weight of sodium fluoborate can be 0.1,
0.5th, 0.8,1,1.3,1.6,1.85,2,2.3,2.7,2.8,3 part；The parts by weight of agar can be 1,1.2,1.3,1.8,1.9,
2nd, 2.3,2.7,3 parts；The parts by weight of sodium alginate can be 1,1.2,1.8,2,2.3,2.7,2.85,3 part；Carboxymethyl cellulose
The parts by weight of sodium can be 2,2.3,2.7,2.8,3,3.4,4,4.2,4.8,5 parts；The parts by weight of Ludox can be 0.1,
0.2nd, 0.5,0.8,1,1.2,1.6,1.85,1.9,1.94,2 part；The parts by weight of butadiene-styrene rubber can be 0.2,0.3,0.5,
0.8th, 1,1.2,1.26,1.3,1.34,1.5 part；The parts by weight of propyleneglycoles can be 1,1.2,1.3,1.5,1.8,2,
2.3rd, 2.7,2.86,3 parts；The parts by weight of propane diols can be 1,1.2,1.5,1.8,2,2.6,2.8,3,3.4,3.5,4,4.7,
5 parts；The parts by weight of sucrose can be 0.5,0.6,0.8,1,1.2,1.5,1.68,1.8,1.94,2 part；Mass fraction is 20-
The parts by weight of 30% sulfuric acid solution can be 30,32,35,38,38.6,39,42,43,45,46,46.3,48,48.6,50
Part；The parts by weight of water can be 100,105,109,112,118,123,128,132,138,140,146,150 parts.
Preferably, in its raw material, hydrofluoric acid, ammonium acid fluoride, ammonium fluoride, calcirm-fluoride, potassium hydrogen fluoride, ammonium chloride, potassium sulfate,
Barium sulfate, the weight ratio of potassium phosphate are 39-43：7-9：15-18：6-8：3-4.5：17-20：6-8：3-3.5：4-4.5.
Preferably, in its raw material, agar, sodium alginate, sodium carboxymethylcellulose, Ludox, butadiene-styrene rubber, propylene second two
Alcohol, propane diols, the weight ratio of sucrose are 1.8-2.3：1.9-2.2：3-3.8：0.9-1.2：0.7-1：1.9-2.4：3.2-3.8：
1.2-1.6。
Preferably, its raw material includes following components by weight：42 parts of hydrofluoric acid, 8 parts of ammonium acid fluoride, 13 parts of ammonium fluoride,
8 parts of calcirm-fluoride, 4 parts of potassium hydrogen fluoride, 19 parts of ammonium chloride, 6.8 parts of potassium sulfate, 3.2 parts of barium sulfate, 4.2 parts of potassium phosphate, sodium fluoborate
0.9 part, 2 parts of agar, 2.2 parts of sodium alginate, 3.8 parts of sodium carboxymethylcellulose, 1 part of Ludox, 0.9 part of butadiene-styrene rubber, propylene
2.2 parts of ethylene glycol, 3.5 parts of propane diols, 1.3 parts of sucrose, 40 parts of the sulfuric acid solution that mass fraction is 25%, 120 parts of water.
A kind of preparation method for anti-dazzle glas etching solution that the present invention also proposes, comprises the following steps：Will by proportioning
Water is added in the sulfuric acid solution that mass fraction is 20-30%, is stirring evenly and then adding into hydrofluoric acid, ammonium acid fluoride, ammonium fluoride, fluorination
Calcium, potassium hydrogen fluoride, ammonium chloride, potassium sulfate, barium sulfate, stir, and then add potassium phosphate and sodium fluoborate and are stirred,
Remaining raw material is added afterwards, is aged to obtain the anti-dazzle glas etching solution after stirring.
Preferably, the time of the ageing is 25-35h.
Preferably, the time of the ageing is 29h.
Ammonium acid fluoride, ammonium fluoride, calcirm-fluoride, potassium hydrogen fluoride and hydrofluoric acid is have selected in the present invention to coordinate as fluorine ion
Source, by optimizing the proportioning of a variety of fluorides, its performance is cooperateed with, substantial amounts of fluorine has been laid in while ionic strength is improved
Ion, have adjusted the activity of reaction, it is therefore prevented that react the problem of too fast, make reaction condition gentle, so as to get anti-dazzle glas table
Face produces concavo-convex phenomenon, while can play slow releasing function, it is therefore prevented that erosional surface continues to corrode, and advantageously forms uniformly trickle
Hair side；Ammonium chloride, potassium sulfate, barium sulfate, sodium fluoborate, which coordinate, to be added in system, be have adjusted the salinity of system, is promoted crystalline substance
The formation of core and the refinement of crystal grain, make etching layer thinning, keep the true of image；Potassium phosphate is added in system, can be in system
Middle formation hydroxyl and phosphate anion, under the auxiliary of sodium fluoborate, further improve the etch effect of fluoride；Fine jade
Fat, sodium alginate, sodium carboxymethylcellulose, Ludox, butadiene-styrene rubber, propyleneglycoles, propane diols, sucrose, which coordinate, is added to body
In system, the viscosity of system is on the one hand improved, etching solution is less prone to sedimentation phenomenon, improve the stability of system, it is another
Aspect improves the ionic strength of system.
In the present invention, by selecting suitable raw material, the content of each raw material is adjusted, makes the performance complement of each raw material, obtains
Etching solution be used for the preparation of anti-dazzle glas, the anti-dazzle glas transmitance and degree of atomization of preparation are high, and thin and thick is uniform, and surface is not allowed
Cut and fingerprint easily are left, for can be widely applied to television splicing wall, flat panel TV, liquid crystal display, touch-screen, industrial instrument
The fields such as the field such as table and advanced photo frame, there is good economic benefit and social benefit.
Embodiment
Below, technical scheme is described in detail by specific embodiment.
Embodiment 1
A kind of anti-dazzle glas etching solution proposed by the present invention, its raw material include following components by weight：35 parts of hydrofluoric acid,
10 parts of ammonium acid fluoride, 12 parts of ammonium fluoride, 10 parts of calcirm-fluoride, 1 part of potassium hydrogen fluoride, 25 parts of ammonium chloride, 3 parts of potassium sulfate, barium sulfate 5
Part, 1 part of potassium phosphate, 3 parts of sodium fluoborate, 1 part of agar, 3 parts of sodium alginate, 2 parts of sodium carboxymethylcellulose, 2 parts of Ludox, butylbenzene
0.2 part of rubber, 3 parts of propyleneglycoles, 1 part of propane diols, 2 parts of sucrose, 50 parts of the sulfuric acid solution that mass fraction is 20%, water 100
Part.
A kind of preparation method of anti-dazzle glas etching solution proposed by the present invention, comprises the following steps：Added water to by proportioning
Mass fraction is in 20% sulfuric acid solution, is stirring evenly and then adding into hydrofluoric acid, ammonium acid fluoride, ammonium fluoride, calcirm-fluoride, hydrogen fluoride
Potassium, ammonium chloride, potassium sulfate, barium sulfate, stir, and then add potassium phosphate and sodium fluoborate and are stirred, add afterwards
Remaining raw material, ageing 30h is carried out after stirring and obtains the anti-dazzle glas etching solution.
Embodiment 2
A kind of anti-dazzle glas etching solution proposed by the present invention, its raw material include following components by weight：45 parts of hydrofluoric acid,
5 parts of ammonium acid fluoride, 20 parts of ammonium fluoride, 2 parts of calcirm-fluoride, 5 parts of potassium hydrogen fluoride, 10 parts of ammonium chloride, 10 parts of potassium sulfate, 1 part of barium sulfate,
5 parts of potassium phosphate, 0.1 part of sodium fluoborate, 3 parts of agar, 1 part of sodium alginate, 5 parts of sodium carboxymethylcellulose, 0.1 part of Ludox, fourth
1.5 parts of benzene rubber, 1 part of propyleneglycoles, 5 parts of propane diols, 0.5 part of sucrose, 30 parts of the sulfuric acid solution that mass fraction is 30%, water
150 parts.
A kind of preparation method of anti-dazzle glas etching solution proposed by the present invention, comprises the following steps：Added water to by proportioning
Mass fraction is in 30% sulfuric acid solution, is stirring evenly and then adding into hydrofluoric acid, ammonium acid fluoride, ammonium fluoride, calcirm-fluoride, hydrogen fluoride
Potassium, ammonium chloride, potassium sulfate, barium sulfate, stir, and then add potassium phosphate and sodium fluoborate and are stirred, add afterwards
Remaining raw material, ageing 27h is carried out after stirring and obtains the anti-dazzle glas etching solution.
Embodiment 3
A kind of anti-dazzle glas etching solution proposed by the present invention, its raw material include following components by weight：42 parts of hydrofluoric acid,
8 parts of ammonium acid fluoride, 13 parts of ammonium fluoride, 8 parts of calcirm-fluoride, 4 parts of potassium hydrogen fluoride, 19 parts of ammonium chloride, 6.8 parts of potassium sulfate, barium sulfate 3.2
Part, 4.2 parts of potassium phosphate, 0.9 part of sodium fluoborate, 2 parts of agar, 2.2 parts of sodium alginate, 3.8 parts of sodium carboxymethylcellulose, Ludox
1 part, 0.9 part of butadiene-styrene rubber, 2.2 parts of propyleneglycoles, 3.5 parts of propane diols, 1.3 parts of sucrose, mass fraction be 25% sulfuric acid
40 parts of solution, 120 parts of water.
A kind of preparation method of anti-dazzle glas etching solution proposed by the present invention, comprises the following steps：Added water to by proportioning
Mass fraction is in 25% sulfuric acid solution, is stirring evenly and then adding into hydrofluoric acid, ammonium acid fluoride, ammonium fluoride, calcirm-fluoride, hydrogen fluoride
Potassium, ammonium chloride, potassium sulfate, barium sulfate, stir, and then add potassium phosphate and sodium fluoborate and are stirred, add afterwards
Remaining raw material, ageing 35h is carried out after stirring and obtains the anti-dazzle glas etching solution.
Embodiment 4
A kind of anti-dazzle glas etching solution proposed by the present invention, its raw material include following components by weight：39 parts of hydrofluoric acid,
9 parts of ammonium acid fluoride, 15 parts of ammonium fluoride, 8 parts of calcirm-fluoride, 3 parts of potassium hydrogen fluoride, 20 parts of ammonium chloride, 6 parts of potassium sulfate, barium sulfate 3.5
Part, 4 parts of potassium phosphate, 1.3 parts of sodium fluoborate, 1.8 parts of agar, 2.2 parts of sodium alginate, 3 parts of sodium carboxymethylcellulose, Ludox
1.2 parts, 0.7 part of butadiene-styrene rubber, 2.4 parts of propyleneglycoles, 3.2 parts of propane diols, 1.6 parts of sucrose, mass fraction be 20% sulphur
42 parts of acid solution, 110 parts of water.
A kind of preparation method of anti-dazzle glas etching solution proposed by the present invention, comprises the following steps：Added water to by proportioning
Mass fraction is in 20% sulfuric acid solution, is stirring evenly and then adding into hydrofluoric acid, ammonium acid fluoride, ammonium fluoride, calcirm-fluoride, hydrogen fluoride
Potassium, ammonium chloride, potassium sulfate, barium sulfate, stir, and then add potassium phosphate and sodium fluoborate and are stirred, add afterwards
Remaining raw material, ageing 25h is carried out after stirring and obtains the anti-dazzle glas etching solution.
Embodiment 5
A kind of anti-dazzle glas etching solution proposed by the present invention, its raw material include following components by weight：43 parts of hydrofluoric acid,
7 parts of ammonium acid fluoride, 18 parts of ammonium fluoride, 6 parts of calcirm-fluoride, 4.5 parts of potassium hydrogen fluoride, 17 parts of ammonium chloride, 8 parts of potassium sulfate, barium sulfate 3
Part, 4.5 parts of potassium phosphate, 0.8 part of sodium fluoborate, 2.3 parts of agar, 1.9 parts of sodium alginate, 3.8 parts of sodium carboxymethylcellulose, silicon are molten
0.9 part of glue, 1 part of butadiene-styrene rubber, 1.9 parts of propyleneglycoles, 3.8 parts of propane diols, 1.2 parts of sucrose, the sulphur that mass fraction is 30%
39 parts of acid solution, 125 parts of water.
A kind of preparation method of anti-dazzle glas etching solution proposed by the present invention, comprises the following steps：Added water to by proportioning
Mass fraction is in 30% sulfuric acid solution, is stirring evenly and then adding into hydrofluoric acid, ammonium acid fluoride, ammonium fluoride, calcirm-fluoride, hydrogen fluoride
Potassium, ammonium chloride, potassium sulfate, barium sulfate, stir, and then add potassium phosphate and sodium fluoborate and are stirred, add afterwards
Remaining raw material, ageing 29h is carried out after stirring and obtains the anti-dazzle glas etching solution.
The glass of pre-etched is cleaned and is dried using organic solvent and deionized water successively, glass after drying is pre-
Heat is added in the anti-dazzle glas etching solution in embodiment 1-5 to 20-30 DEG C, is soaked in the etching solution that temperature is 20-30 DEG C
40-100s obtains anti-dazzle glas, and the light transmittance of the anti-dazzle glas is more than 89%, degree of atomization 4-5.5%, reflectivity 6-
7.5%, glossiness is more than 85%.
The foregoing is only a preferred embodiment of the present invention, but protection scope of the present invention be not limited thereto,
Any one skilled in the art the invention discloses technical scope in, technique according to the invention scheme and its
Inventive concept is subject to equivalent substitution or change, should all be included within the scope of the present invention.
Claims (7)
1. a kind of anti-dazzle glas etching solution, it is characterised in that its raw material includes following components by weight：Hydrofluoric acid 35-45 parts,
Ammonium acid fluoride 5-10 parts, ammonium fluoride 12-20 parts, calcirm-fluoride 2-10 parts, potassium hydrogen fluoride 1-5 parts, ammonium chloride 10-25 parts, potassium sulfate
3-10 parts, barium sulfate 1-5 parts, potassium phosphate 1-5 parts, sodium fluoborate 0.1-3 parts, agar 1-3 parts, sodium alginate 1-3 parts, carboxymethyl
Sodium cellulosate 2-5 parts, Ludox 0.1-2 parts, butadiene-styrene rubber 0.2-1.5 parts, propyleneglycoles 1-3 parts, propane diols 1-5 parts, sugarcane
Sugared 0.5-2 parts, sulfuric acid solution 30-50 parts, water 100-150 part that mass fraction is 20-30%.
2. anti-dazzle glas etching solution according to claim 1, it is characterised in that in its raw material, hydrofluoric acid, ammonium acid fluoride, fluorine
It is 39-43 to change ammonium, calcirm-fluoride, potassium hydrogen fluoride, ammonium chloride, potassium sulfate, barium sulfate, the weight ratio of potassium phosphate：7-9：15-18：6-
8：3-4.5：17-20：6-8：3-3.5：4-4.5.
3. anti-dazzle glas etching solution according to claim 1 or claim 2, it is characterised in that in its raw material, agar, sodium alginate, carboxylic
Sodium carboxymethylcellulose pyce, Ludox, butadiene-styrene rubber, propyleneglycoles, propane diols, the weight ratio of sucrose are 1.8-2.3：1.9-2.2：
3-3.8：0.9-1.2：0.7-1：1.9-2.4：3.2-3.8：1.2-1.6.
4. anti-dazzle glas etching solution according to claim 1, it is characterised in that its raw material includes following components by weight：
42 parts of hydrofluoric acid, 8 parts of ammonium acid fluoride, 13 parts of ammonium fluoride, 8 parts of calcirm-fluoride, 4 parts of potassium hydrogen fluoride, 19 parts of ammonium chloride, potassium sulfate 6.8
Part, 3.2 parts of barium sulfate, 4.2 parts of potassium phosphate, 0.9 part of sodium fluoborate, 2 parts of agar, 2.2 parts of sodium alginate, sodium carboxymethylcellulose
3.8 parts, 1 part of Ludox, 0.9 part of butadiene-styrene rubber, 2.2 parts of propyleneglycoles, 3.5 parts of propane diols, 1.3 parts of sucrose, mass fraction
For 25% 40 parts of sulfuric acid solution, 120 parts of water.
A kind of 5. preparation method of the anti-dazzle glas etching solution as any one of claim 1-4, it is characterised in that including with
Lower step：Added water to by proportioning in the sulfuric acid solution that mass fraction is 20-30%, be stirring evenly and then adding into hydrofluoric acid, fluorination
Hydrogen ammonium, ammonium fluoride, calcirm-fluoride, potassium hydrogen fluoride, ammonium chloride, potassium sulfate, barium sulfate, stir, and then add potassium phosphate and fluorine
Boratex is simultaneously stirred, and adds remaining raw material afterwards, is aged to obtain the anti-dazzle glas etching solution after stirring.
6. the preparation method of anti-dazzle glas etching solution according to claim 5, it is characterised in that the time of the ageing is
25-35h。
7. according to the preparation method of the anti-dazzle glas etching solution of claim 5 or 6, it is characterised in that the time of the ageing
For 29h.
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| CN106746703A (en) * | 2017-01-09 | 2017-05-31 | 天津美泰真空技术有限公司 | For the composition of TFT glass substrate thinnings technique pretreatment |
| CN107226624A (en) * | 2017-08-01 | 2017-10-03 | 合肥利裕泰玻璃制品有限公司 | It is a kind of for etching solution of electro-conductive glass and preparation method thereof |
| CN109082274A (en) * | 2018-08-29 | 2018-12-25 | 江苏金琥珀光学科技股份有限公司 | Etching solution and the obtained method without the remaining cell phone rear cover of fingerprint of the utilization etching solution |
| CN111393031B (en) * | 2020-03-21 | 2022-02-15 | 郑州恒昊光学科技有限公司 | Etching solution for preparing filter glass and preparation method of filter glass |
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| CN112777941A (en) * | 2021-01-13 | 2021-05-11 | 赣州帝晶光电科技有限公司 | Preparation method of AG anti-dazzle glass etching process |
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