CN105006254A - Large-stroke quick-response X-Y micro-motion workbench with double displacement magnification - Google Patents
Large-stroke quick-response X-Y micro-motion workbench with double displacement magnification Download PDFInfo
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- CN105006254A CN105006254A CN201410165010.0A CN201410165010A CN105006254A CN 105006254 A CN105006254 A CN 105006254A CN 201410165010 A CN201410165010 A CN 201410165010A CN 105006254 A CN105006254 A CN 105006254A
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Abstract
The invention relates to a large-stroke quick-response X-Y micro-motion workbench with double displacement magnification. The workbench comprises a pedestal, a motion platform, a top cap, leveling screws, piezoelectric ceramics, an object stage, capacitive displacement sensors, and the like, wherein the pedestal, the motion platform, and the top cap are fixed through screws; the piezoelectric ceramics are installed in displacement magnifying mechanisms and are tightly locked by screws; and the capacitive displacement sensors are installed between the object stage and rounding straight-beam flexible hinges. Improved parallelogram displacement magnifying mechanisms applicable to micro-nano structures are adopted in the workbench; joint parts of the mechanisms are connected by round flexible hinges; and the stiffness of the mechanisms determine the loading capability and quick response of the displacement magnifying mechanism. Two displacement magnifying mechanisms are connected in parallel, so that output force and output displacement are doubled, and displacement coupling of the object stage is reduced. A symmetrical structure is adopted in the micro-motion workbench to provide the workbench with relatively high bandwidth and repeated accuracy. A combination structure of rounding straight-beam and parallel-board flexible hinges is adopted, so that the micro-motion workbench is good in unidirectional displacement.
Description
Technical field
The present invention relates to a kind of micro-nano and measure the device with processing technique field, particularly relate to a kind of Long Distances with two displacement equations and respond X-Y micro displacement workbench fast.
Background technology
Micro-nano location technology is a gordian technique in modern high and new technology and modern industry, to measure and the numerous areas such as micro-manipulation has a wide range of applications in precision manufactureing, superfinishing.In recent years, micro-nano location technology is proposed to the requirement of Long Distances, high precision, small size and quick height such as response grade, wherein nanometer scale is reached to the requirement of positioning precision and resolution.
The level of micro-nano location technology reflects a national development in science and technology situation and comprehensive strength, and national governments drop into a large amount of man power and material one after another.Carry out the correlative study of micro-nano location technology, to promoting that the fast development of the hi-tech industries such as China advanced person manufacture, Ultra-precision Turning and measurement, biomedical engineering, defence and military has important and far-reaching meaning.Micro-nano positioning table and TT&C system thereof directly determine the precision of whole application system, efficiency and adaptability as core, conduct a research become the task of top priority to its gordian technique.
Chinese patent CN 103225728 A proposes a kind of two-dimensional parallel micromotion platform of Piezoelectric Ceramic.This locating platform adopts the secondary enlarger of flexible hinge and compound parallel four-bar guiding mechanism to be difficult to processing, and flexible hinge is much less than the rigidity of bar, causes enlarger oversize; Two-stage displacement amplifying mechanism also can make final power output decline at double, and then platform carrying load ability also can decline; Repeatedly adopting flexure hinge mechanism to realize Movement transmit can make system motion precision decline rapidly, and system bandwidth reduces, and the more difficult realization of system is accurately located at a high speed.
Chinese patent CN 102962683 A proposes a kind of Two-degree of freedom translational parallel high-bandwidth micro-motion platform, and the two-dimentional high bandwidth translation characteristic of this platform sacrifices the installation site of position transducer and the usable area of platform; Do not increase displacement amplifying mechanism in system, Long Distances motion cannot be realized.
Chinese patent CN 10176995 A proposes a kind of two translationa movement and jogging platform with redundancy branched chain, and what the design of this worktable made whole worktable utilizes area very little, and blank area is very large; And the rigidity of both sides has a long way to go, when applying single direction power, can there is obvious deflection at opposite side in platform, cause the appearance of additional angular displacement; Platform is excessive, without any loss of weight process, each position displacement of mass motion platform can be made inconsistent, thus affect positioning precision, and the driving force of piezoelectric ceramics also can be caused to reduce, system dynamic characteristic is poor simultaneously.
Chinese patent CN 103411106 A proposes a kind of nested type rhombus amplification two-dimensional precisely locating platform, the program is relative to the size of motion platform, drive and enlarger undersized, if driving force and the dynamic perfromance decline of system can be caused without the words of any loss of weight process; And motion platform is crossed conference and is caused the displacement of each position of motion platform inconsistent; The displacement equations coefficient that this kind relies on the stretcher strain on four limits to produce the parallelogram displacement amplifying mechanism of displacement equations presents non-linear, does not determine coefficient; System presents dissymmetrical structure, and platform natural frequency can be caused to reduce.
In view of some problems that the micromotion platform proposed in above-mentioned patent exists, a kind of Long Distances with two displacement equations of this patent design responds X-Y micro displacement workbench fast, the various features such as this worktable has that objective table utilizes that area is large, carrying load ability is strong, natural frequency is high, fast response time, movement travel are large, structural symmetry, by the design and optimization to worktable, make its Position location accuracy, reliability, fast response and stability similar X-Y micromotion platform more superior.
Summary of the invention
Not enough for prior art, a kind of Long Distances X-Y micro displacement workbench with two displacement amplifying mechanism is provided, this platform structure is reasonable, superior performance, two displacement amplifying mechanism parallel connection is adopted to realize displacement equations, not only reduce enlarger taken up space, improve objective table and can utilize area, and improve displacement amplifying mechanism power output, system band load capacity is strengthened greatly, symmetrical structure ensures that this micromotion platform has higher natural frequency, displacement transducer is placed between two parallel-plate flexible hinges, this platform is made to have compact conformation, volume is little, precision is high, the advantages such as fast response time.
To achieve these goals, the present invention adopts following technical scheme: a kind of Long Distances with two displacement equations provided by the invention responds X-Y micro displacement workbench fast, it is characterized in that, it mainly comprises base, motion platform, top cover, levelling bolt, piezoelectric ceramics, objective table, capacitance displacement sensor and socket head screw.Wherein levelling bolt is arranged on four corners of base, submounts is motion platform, it is top cover above motion platform, base, motion platform and top cover three are fixed together with four screws, first piezoelectric ceramics is arranged in the first parallelogram displacement amplifying mechanism, be locked with the first lock-screw, second piezoelectric ceramics is arranged in the second parallelogram displacement amplifying mechanism, be locked with the second lock-screw, 3rd piezoelectric ceramics is arranged in the 3rd parallelogram displacement amplifying mechanism, be locked with the 3rd lock-screw, 4th piezoelectric ceramics is arranged in the 4th parallelogram displacement amplifying mechanism, be locked with the 4th lock-screw, first capacitance displacement sensor is arranged on the right side of objective table, between first rounding straight beam type flexible hinge and the second rounding straight beam type flexible hinge, 3rd capacitance displacement sensor is arranged on the right side of objective table, between 3rd rounding straight beam type flexible hinge and the 4th rounding straight beam type flexible hinge.
Described X-Y micro displacement workbench comprises X-direction motion and Y-direction motion.Wherein, the X-direction of described X-Y micro displacement workbench comprises the first parallelogram displacement amplifying mechanism, second parallelogram displacement amplifying mechanism, first rounding straight beam type flexible hinge, second rounding straight beam type flexible hinge, the first parallel-plate flexible hinge, the second parallel-plate flexible hinge, wherein the first parallelogram displacement amplifying mechanism and the parallel placement of the second parallelogram displacement amplifying mechanism, all adopts the fixing lug boss with Rouno Cormer Pregrinding Wheel to be connected with motion platform frame on the left of both; First parallelogram displacement amplifying mechanism adopts the fixing lug boss with Rouno Cormer Pregrinding Wheel to be connected with motion platform frame with on the right side of the second parallelogram displacement amplifying mechanism with objective table; First rounding straight beam type flexible hinge and the second rounding straight beam type flexible hinge horizontal positioned, both left sides are all connected with on the right side of objective table; First rounding straight beam type flexible hinge is connected with the first parallel-plate flexible hinge is vertical; Second rounding straight beam type flexible hinge is connected with the second parallel-plate flexible hinge is vertical.
The Y-direction of described X-Y micro displacement workbench comprises the 3rd parallelogram displacement amplifying mechanism, 4th parallelogram displacement amplifying mechanism, 3rd rounding straight beam type flexible hinge, 4th rounding straight beam type flexible hinge, 3rd parallel-plate flexible hinge, 4th parallel-plate flexible hinge, wherein the 3rd parallelogram displacement amplifying mechanism and the parallel placement of the 4th parallelogram displacement amplifying mechanism, all adopt the fixing lug boss with Rouno Cormer Pregrinding Wheel to be connected with motion platform frame on the upside of both; 3rd parallelogram displacement amplifying mechanism adopts the fixing lug boss with Rouno Cormer Pregrinding Wheel to be connected with motion platform frame with on the downside of the 4th parallelogram displacement amplifying mechanism with objective table; 3rd rounding straight beam type flexible hinge and the 4th rounding straight beam type flexible hinge horizontal positioned, both upsides are all connected with on the downside of objective table; 3rd rounding straight beam type flexible hinge is connected with the 3rd parallel-plate flexible hinge is vertical; 4th rounding straight beam type flexible hinge is connected with the 4th parallel-plate flexible hinge is vertical.
Described first parallelogram displacement amplifying mechanism comprises the first enlarger first limit, first enlarger Second Edge, first enlarger the 3rd limit, first enlarger the 4th limit, first enlarger first piezoelectric ceramics mount pad, first enlarger second piezoelectric ceramics mount pad, first enlarger first flexible hinge, first enlarger second flexible hinge, first enlarger the 3rd flexible hinge, first enlarger the 4th flexible hinge, first enlarger the 5th flexible hinge, first enlarger the 6th flexible hinge, first enlarger the 7th flexible hinge, first enlarger the 8th flexible hinge, wherein the first enlarger first limit is connected with boss by the first enlarger first flexible hinge, be connected with the first enlarger first piezoelectric ceramics mount pad by the first enlarger second flexible hinge, first enlarger first piezoelectric ceramics mount pad is connected with the first enlarger Second Edge by the first enlarger the 3rd flexible hinge, first enlarger Second Edge is connected with boss by the first enlarger the 4th flexible hinge, boss is connected with the first enlarger the 4th limit by the first enlarger the 5th flexible hinge, first enlarger the 4th limit is connected with the first enlarger second piezoelectric ceramics mount pad by the first enlarger the 6th flexible hinge, first enlarger second piezoelectric ceramics mount pad is connected and is connected with the first enlarger the 4th limit by the first enlarger the 7th flexible hinge, first enlarger the 4th limit is connected with boss by the first enlarger the 8th flexible hinge.
Described second parallelogram displacement amplifying mechanism, the 3rd parallelogram displacement amplifying mechanism, the 4th parallelogram displacement amplifying mechanism, forms with the first parallelogram displacement amplifying mechanism and is connected similar, not repeating them here.
Described motion platform first lock-screw, the second lock-screw, the 3rd lock-screw, the 4th lock-screw and platform base just have a through hole respectively to locating, for lock-screw outside pedestal.
The performance index that described motion platform requires comprise: installing space is less than 30s in 90mm*90mm, resolution 10nm, positioning time.
Performance after described motion platform emulation comprises: maximum stress appears at the 8th flexible hinge place of the 4th parallelogram displacement amplifying mechanism, is 455.057249N/mm^2, is less than yield stress 505 N/mm^2 of material; Dragging platform maximum displacement is 138 μm, and coupling displacement is 3.185 μm, and the degree of coupling is 2.31%.
Described base, motion platform, cap material are aluminium alloy 7075-T651, adopt precision WEDM machine lathe to adopt slow wire feeding to cut.
Described base is also provided with the outlet of piezoelectric ceramics signal wire.
On described motion platform, there is screwing through hole at four angles, for connecting top cover and base.
The present invention, compared with existing micromotion platform, has following beneficial effect:
(1) the present invention adopts a kind of modified parallelogram displacement amplifying mechanism being applied to micro nano structure, articular portion adopts circular flexible hinge, this place adopts flexible hinge structure both can realize the spinfunction being similar to hinge, realize the motion of parallelogram sturcutre, and then generation displacement equations, also the rigidity of parallelogram displacement amplifying mechanism be can be determined by the stress calculated herein, and then carrying load ability and the fast-response of parallelogram displacement amplifying mechanism improved; This kind of design makes the displacement equations ratio of system can require to design with output displacement according to output displacement.
(2) the present invention adopts two parallelogram displacement amplifying mechanism in parallel, while guarantee Large travel range stroke, the power output of displacement amplifying mechanism is doubled.By the statical moment analysis to unidirectional two parallelogram displacement amplifying mechanisms, determine scale-up factor between the two, and then control the power output of two parallelogram displacement amplifying mechanisms respectively, make objective table level off to zero in the displacement in other directions, and then eliminate displacement coupling.
(3) the present invention adopts symmetrical structure on the whole, makes objective table both sides rigidity as far as possible close, thus makes system have bandwidth high as far as possible, can have very high repeatable accuracy under high-frequency operation environment.
(4) the present invention adopts the unitized construction of rounding straight beam type flexible hinge and parallel-plate flexible hinge, the system displacement of making has good one-way, that is: when single direction applies power, same direction rounding straight beam type spring rates of flexure hinges is large and parallel-plate spring rates of flexure hinges is little, little and the parallel-plate spring rates of flexure hinges of vertical direction rounding straight beam type spring rates of flexure hinges is large, makes system in the displacement stroke of force direction much larger than the additional displacement of vertical direction.
Accompanying drawing explanation
Fig. 1 is the monnolithic case figure of X-Y micro displacement workbench provided by the invention;
Fig. 2 is X-Y micro displacement workbench inner structure three-dimensional structure diagram provided by the invention;
Fig. 3 is the mechanism principle figure of motion platform provided by the invention;
Fig. 4 is the structural drawing of motion platform provided by the invention;
Fig. 5 is parallelogram displacement amplifying mechanism structural drawing provided by the invention;
Fig. 6 is the first five rank mode schematic diagram of X-Y micro displacement workbench provided by the invention;
The scale diagrams of the circular flexible hinge that Fig. 7 adopts for parallelogram displacement amplifying mechanism provided by the invention;
Fig. 8 is the size of rounding straight beam type flexible hinge provided by the invention is intention.
In figure: 1 top cover, 2 motion platforms, 3 bases, 4 levelling bolts, 5 capacitance displacement sensors 1 upper slice, 6 capacitance displacement sensor 1 bottom sheet, 7 objective tables, 8 capacitive transducer 2 bottom sheet, 9 capacitive transducers upper slice, 10 lock-screws, 11 first piezoelectric ceramics, 12 second piezoelectric ceramics, 13 the 3rd piezoelectric ceramics, 14 the 4th piezoelectric ceramics, 15 bolts hole, 16 first parallel-plate flexible hinges, 17 first rounding straight beam type flexible hinges, 18 second rounding straight beam type flexible hinges, 19 second parallel-plate flexible hinges, 20 drag platform, 21 the 3rd parallel-plate flexible hinges, 22 the 3rd rounding straight beam type flexible hinges, 23 the 4th rounding straight beam type flexible hinges, 24 the 4th parallel-plate flexible hinges, 25 second right connection boss, 26 second parallelogram displacement amplifying mechanisms, 27 second left connection boss, 28 first parallelogram displacement amplifying mechanisms, 29 first right connection boss, 30 first left connection boss, 31 screw holes, 32 the 3rd times connection boss, boss is connected on 33 the 3rd, 34 the 3rd parallelogram displacement amplifying mechanisms, 35 the 4th parallelogram displacement amplifying mechanisms, 36 the 4th convex platforms connect, 37 the 4th lower convex platforms connect, 38 motion platform frames, 39 second flexible hinges, 40 first piezoelectric ceramics mount pads, 41 the 3rd flexible hinges, 42 Second Edges, 43 the 4th flexible hinges, 44 export boss, 45 the 5th flexible hinges, 46 the 3rd limits, 47 the 6th flexible hinges, 48 second piezoelectric ceramics mount pads, 49 the 7th flexible hinges, 50 the 4th limits, 51 the 8th flexible hinges, 52 fixing lug boss.
Embodiment
Elaborate to embodiments of the invention below, the present embodiment is implemented under premised on technical solution of the present invention, give detailed embodiment and concrete operating process, but protection scope of the present invention is not limited to following embodiment.
As Fig. 1,2, shown in 4, a kind of Long Distances X-Y micro displacement workbench with two displacement amplifying mechanism provided by the invention, it is characterized in that, it mainly comprises base 3, motion platform 2, top cover 1, levelling bolt 4, piezoelectric ceramics (11,12,13,14), objective table 7, capacitance displacement sensor (5,6,8,9) and lock-screw 10.Wherein levelling bolt 4 is arranged on four corners of base 3, base 3 is motion platform 2 above, motion platform 2 is top cover 1 above, base 3, motion platform 2 and top cover 1 three are fixed together with four screws, first piezoelectric ceramics 11 is arranged in the first parallelogram displacement amplifying mechanism 26, be locked with the first lock-screw 10, second piezoelectric ceramics 12 is arranged in the second parallelogram displacement amplifying mechanism 28, be locked with the second lock-screw, 3rd piezoelectric ceramics 13 is arranged in the 3rd parallelogram displacement amplifying mechanism 34, be locked with the 3rd lock-screw, 4th piezoelectric ceramics 14 is arranged in the 4th parallelogram displacement amplifying mechanism 35, be locked with the 4th lock-screw, objective table dragging platform 20 first capacitance displacement sensor 5 and 6 that four screws are fixed on motion platform 2 is arranged on the right side of dragging platform 20, between first rounding straight beam type flexible hinge 17 and the second rounding straight beam type flexible hinge 18, 3rd capacitance displacement sensor 8 and 9 is arranged on and drags on the right side of platform 20, between 3rd rounding straight beam type flexible hinge 22 and the 4th rounding straight beam type flexible hinge 23.
The X-direction of described X-Y micro displacement workbench comprises the first parallelogram displacement amplifying mechanism 26, second parallelogram displacement amplifying mechanism 28, first rounding straight beam type flexible hinge 17, second rounding straight beam type flexible hinge 18, first parallel-plate flexible hinge 16, second parallel-plate flexible hinge 19, wherein the first parallelogram displacement amplifying mechanism 26 and the parallel placement of the second parallelogram displacement amplifying mechanism 28, all adopts the fixing lug boss 27 with Rouno Cormer Pregrinding Wheel to be connected with motion platform frame 38 with 28 on the left of both; First parallelogram displacement amplifying mechanism 26 adopts the fixing lug boss 29 with Rouno Cormer Pregrinding Wheel to be connected with motion platform frame 38 with 25 with on the right side of the second parallelogram displacement amplifying mechanism 28 with objective table; Drag in the middle part of platform 20 and emptied; First rounding straight beam type flexible hinge 17 and the second rounding straight beam type flexible hinge 18 horizontal positioned, both left sides all with on the right side of dragging platform 20 are connected; First rounding straight beam type flexible hinge 17 is connected with the first parallel-plate flexible hinge 16 is vertical; Second rounding straight beam type flexible hinge 18 is connected with the second parallel-plate flexible hinge 19 is vertical.
The Y-direction of described X-Y micro displacement workbench comprises the 3rd parallelogram displacement amplifying mechanism 34,4th parallelogram displacement amplifying mechanism 35,3rd rounding straight beam type flexible hinge 22,4th rounding straight beam type flexible hinge 23,3rd parallel-plate flexible hinge 21,4th parallel-plate flexible hinge 24, wherein the 3rd parallelogram displacement amplifying mechanism 34 and the parallel placement of the 4th parallelogram displacement amplifying mechanism 35, all adopts the fixing lug boss 33 with Rouno Cormer Pregrinding Wheel to be connected with motion platform frame 38 with 36 on the upside of both; 3rd parallelogram displacement amplifying mechanism 34 adopts the fixing lug boss 32 with Rouno Cormer Pregrinding Wheel to be connected with motion platform frame 38 with 37 with on the downside of the 4th parallelogram displacement amplifying mechanism 35 with dragging platform 20; 3rd rounding straight beam type flexible hinge 22 and the 4th rounding straight beam type flexible hinge 23 horizontal positioned, both upsides all with on the downside of dragging platform 20 are connected; 3rd rounding straight beam type flexible hinge 22 is connected with the 3rd parallel-plate flexible hinge 21; 4th rounding straight beam type flexible hinge 23 is connected with the 4th parallel-plate flexible hinge 24 is vertical.
The structural scheme of mechanism with the Long Distances X-Y micro displacement workbench of two displacement amplifying mechanism parallel connection provided by the invention as shown in Figure 3.When the first piezoelectric ceramics 11 is energized work, a displacement is in the same way produced in its length direction, due to the constraint of the first lock-screw 10, make the first piezoelectric ceramics mount pad 40 of the first parallelogram displacement amplifying mechanism 26, move with the second piezoelectric ceramics mount pad 48, due to the constraint of the second flexible hinge 39 and the 3rd flexible hinge 41, first piezoelectric ceramics mount pad 40 moves drive second flexible hinge 39 and the 3rd flexible hinge 41 is out of shape, thus realize the first limit 54 and Second Edge 42 moves, because the first limit 54 and Second Edge 42 rotate around the first flexible hinge 53 and the 4th flexible hinge 43 respectively, and the first flexible hinge 53 is fixed in fixing lug boss 52, vertical displacement passes to the 4th flexible hinge 43, and cause the motion exporting boss 44.In like manner, second piezoelectric ceramics mount pad 48 moves, due to the constraint of the 6th flexible hinge 47 and the 7th flexible hinge 49, second piezoelectric ceramics mount pad 48 moves and the 6th flexible hinge 47 and the 7th flexible hinge 49 can be driven to be out of shape, thus drive the 3rd limit 46 and the 4th limit 50 to move, because the 3rd limit 46 and the 4th limit 50 are rotated around the 5th flexible hinge 45 and the 8th flexible hinge 51 respectively, and the 8th flexible hinge 51 is fixed in fixing lug boss 52, vertical displacement transmission gives the 5th flexible hinge 45, and causes the motion exporting boss 44.The Movement transmit of the second parallelogram displacement amplifying mechanism 26 is consistent with the first parallelogram displacement amplifying mechanism 28, and two displacement amplifying mechanisms cooperations jointly make to drag platform 20 and produce displacement in X-direction.Drag platform and drive the first rounding straight beam type flexible hinge 17 and the second rounding straight beam type flexible hinge 18 in the motion of X-direction, both motions can drive the first parallel-plate flexible hinge 16 and the second parallel-plate flexible hinge 19 respectively.Drag platform drives the 3rd rounding straight beam type flexible hinge 22 and the 4th rounding straight beam type flexible hinge 23 simultaneously motion in the motion of X-direction, both motions drive the 3rd parallel-plate flexible hinge 21 and the 4th parallel-plate flexible hinge 24 respectively.
As shown in Figure 5, described first parallelogram displacement amplifying mechanism comprises the first enlarger first limit 54, first enlarger Second Edge 42, first enlarger the 3rd limit 46, first enlarger the 4th limit 50, first enlarger first piezoelectric ceramics mount pad 40, first enlarger second piezoelectric ceramics mount pad 48, first enlarger first flexible hinge 53, first enlarger second flexible hinge 39, first enlarger the 3rd flexible hinge 41, first enlarger the 4th flexible hinge 43, first enlarger the 5th flexible hinge 45, first enlarger the 6th flexible hinge 47, first enlarger the 7th flexible hinge 49, first enlarger the 8th flexible hinge 51, wherein the first enlarger first limit 54 is connected 52 by the first enlarger first flexible hinge 53 with boss, be connected with the first enlarger first piezoelectric ceramics mount pad 40 by the first enlarger second flexible hinge 39, first enlarger first piezoelectric ceramics mount pad 40 is connected 42 by the first enlarger the 3rd flexible hinge 41 and is connected with the first enlarger Second Edge, first enlarger Second Edge 42 is connected with boss 44 by the first enlarger the 4th flexible hinge 43, boss 44 is connected with the first enlarger the 3rd limit 46 by the first enlarger the 5th flexible hinge 45, first enlarger the 3rd limit 46 is connected with the first enlarger second piezoelectric ceramics mount pad 48 by the first enlarger the 6th flexible hinge 47, first enlarger second piezoelectric ceramics mount pad 48 is connected and is connected with the first enlarger the 4th limit 50 by the first enlarger the 7th flexible hinge 49, first enlarger the 4th limit 50 is connected with boss 52 by the first enlarger the 8th flexible hinge 51.
As shown in Figure 6, the structure that motion workbench adopts symmetrical structure and Rouno Cormer Pregrinding Wheel to connect makes the natural frequency of motion workbench be in high value: as shown in (a), (b) in Fig. 6, front two rank natural frequency reflection planes internal characteristics, are respectively 1938.3Hz and 2057.6Hz; Characteristic outside the natural frequency reflection planes of rear several rank, wherein the 3rd rank are reflected in the vibration characteristics of Z axis, in Fig. 6 shown in (c), for 2289.9Hz, in Fig. 6, shown in (d), (e), quadravalence, the 5th rank natural frequency reflect that micromotion platform is around X respectively, Y-axis revolving property, is respectively 2874.2Hz, 4881.2Hz.Out-of-plane high natural frequency makes micromotion platform operationally, and motion workbench 2 keeps good translation characteristic.Thus micromotion platform has higher dynamic perfromance, is convenient to control.
Fig. 7 is the circular flexible hinge arrangement figure of X-Y micro displacement workbench provided by the invention, the flexible hinge that all parallelogram displacement amplifying mechanisms use all adopts circular flexible hinge, and all circular flexible hinge arrangements and measure-alike, flexible hinge radius of circle r is 1mm, hinge width t is 0.5mm, and hinge thickness w is 10mm.
Fig. 8 is the parallel-plate flexible hinge structure figure of X-Y micro displacement workbench provided by the invention, and the structure of all parallel-plate flexible hinges and measure-alike, parallel-plate flexible hinge width b is 10mm, height H is 6mm, minimum thickness t is 1.5mm rounding radii R is 1.5mm, and linear beam portion length L is 12mm.
Claims (10)
1. the Long Distances with two displacement equations responds an X-Y micro displacement workbench fast, it is characterized in that, it mainly comprises base, motion platform, top cover, levelling bolt, piezoelectric ceramics, objective table, capacitance displacement sensor and socket head screw.
2. wherein levelling bolt is arranged on four corners of base, submounts is motion platform, it is top cover above motion platform, base, motion platform and top cover three are fixed together with four screws, first piezoelectric ceramics is arranged in the first parallelogram displacement amplifying mechanism, be locked with the first lock-screw, second piezoelectric ceramics is arranged in the second parallelogram displacement amplifying mechanism, be locked with the second lock-screw, 3rd piezoelectric ceramics is arranged in the 3rd parallelogram displacement amplifying mechanism, be locked with the 3rd lock-screw, 4th piezoelectric ceramics is arranged in the 4th parallelogram displacement amplifying mechanism, be locked with the 4th lock-screw, first capacitance displacement sensor is arranged on the right side of objective table, between first rounding straight beam type flexible hinge and the second rounding straight beam type flexible hinge, 3rd capacitance displacement sensor is arranged on the right side of objective table, between 3rd rounding straight beam type flexible hinge and the 4th rounding straight beam type flexible hinge.
3. a kind of Long Distances with two displacement equations responds X-Y micro displacement workbench fast as claimed in claim 1, it is characterized in that, the X-direction of described X-Y micro displacement workbench comprises the first parallelogram displacement amplifying mechanism, second parallelogram displacement amplifying mechanism, first rounding straight beam type flexible hinge, second rounding straight beam type flexible hinge, first parallel-plate flexible hinge, second parallel-plate flexible hinge, wherein the first parallelogram displacement amplifying mechanism and the parallel placement of the second parallelogram displacement amplifying mechanism, both left sides all adopt the fixing lug boss with Rouno Cormer Pregrinding Wheel to be connected with motion platform frame, stress can be reduced concentrate, first parallelogram displacement amplifying mechanism adopts the fixing lug boss with Rouno Cormer Pregrinding Wheel to be connected with motion platform frame with on the right side of the second parallelogram displacement amplifying mechanism with objective table, emptied in the middle part of objective table, this design proposal can reduce objective table weight, improves the dynamic perfromance of platform, first rounding straight beam type flexible hinge and the second rounding straight beam type flexible hinge horizontal positioned, both left sides are all connected with on the right side of objective table, first rounding straight beam type flexible hinge is connected with the first parallel-plate flexible hinge is vertical, second rounding straight beam type flexible hinge is connected with the second parallel-plate flexible hinge is vertical.
4. a kind of Long Distances with two displacement equations responds X-Y micro displacement workbench fast as claimed in claim 1, it is characterized in that, the Y-direction of described X-Y micro displacement workbench comprises the 3rd parallelogram displacement amplifying mechanism, 4th parallelogram displacement amplifying mechanism, 3rd rounding straight beam type flexible hinge, 4th rounding straight beam type flexible hinge, 3rd parallel-plate flexible hinge, 4th parallel-plate flexible hinge, wherein the 3rd parallelogram displacement amplifying mechanism and the parallel placement of the 4th parallelogram displacement amplifying mechanism, both left sides all adopt the fixing lug boss with Rouno Cormer Pregrinding Wheel to be connected with motion platform frame, stress can be reduced concentrate, 3rd parallelogram displacement amplifying mechanism adopts the fixing lug boss with Rouno Cormer Pregrinding Wheel to be connected with motion platform frame with on the right side of the 4th parallelogram displacement amplifying mechanism with objective table, emptied in the middle part of objective table, this design proposal can reduce objective table weight, improves the dynamic perfromance of platform, 3rd rounding straight beam type flexible hinge and the 4th rounding straight beam type flexible hinge horizontal positioned, both left sides are all connected with on the right side of objective table, 3rd rounding straight beam type flexible hinge is connected with the 3rd parallel-plate flexible hinge is vertical, 4th rounding straight beam type flexible hinge is connected with the 4th parallel-plate flexible hinge is vertical.
5. a kind of Long Distances with two displacement equations responds X-Y micro displacement workbench fast as claimed in claim 1, it is characterized in that, described first parallelogram displacement amplifying mechanism comprises the first enlarger first limit, first enlarger Second Edge, first enlarger the 3rd limit, first enlarger the 4th limit, first enlarger first piezoelectric ceramics mount pad, first enlarger second piezoelectric ceramics mount pad, first enlarger first flexible hinge, first enlarger second flexible hinge, first enlarger the 3rd flexible hinge, first enlarger the 4th flexible hinge, first enlarger the 5th flexible hinge, first enlarger the 6th flexible hinge, first enlarger the 7th flexible hinge, first enlarger the 8th flexible hinge, wherein the first enlarger first limit is connected with boss by the first enlarger first flexible hinge, by the first enlarger second flexible hinge and the first enlarger first piezoelectric ceramics mount pad, first enlarger first piezoelectric ceramics mount pad is connected with the first enlarger Second Edge by the first enlarger the 3rd flexible hinge, first enlarger Second Edge is connected with boss by the first enlarger the 4th flexible hinge, boss is connected with the first enlarger the 4th limit by the first enlarger the 5th flexible hinge, first enlarger the 4th limit is connected with the first enlarger second piezoelectric ceramics mount pad by the first enlarger the 6th flexible hinge, first enlarger second piezoelectric ceramics mount pad is connected and is connected with the first enlarger the 4th limit by the first enlarger the 7th flexible hinge, first enlarger the 4th limit is connected with boss by the first enlarger the 8th flexible hinge.
6. a kind of Long Distances with two displacement equations responds X-Y micro displacement workbench fast as claimed in claim 1, it is characterized in that, described second parallelogram displacement amplifying mechanism, the 3rd parallelogram displacement amplifying mechanism, the 4th parallelogram displacement amplifying mechanism structure are identical with the structure of the first parallelogram displacement amplifying mechanism, do not repeat them here.
7. a kind of Long Distances with two displacement equations responds X-Y micro displacement workbench fast as claimed in claim 1, it is characterized in that, described motion platform first lock-screw, second lock-screw, the 3rd lock-screw, the 4th lock-screw and platform base just have a through hole respectively to locating, for lock-screw outside pedestal.
8. a kind of Long Distances with two displacement equations responds X-Y micro displacement workbench fast as claimed in claim 1, it is characterized in that, described base, motion platform, cap material are aluminium alloy 7075-T651, adopt precision WEDM machine lathe to adopt slow wire feeding to cut.
9. a kind of Long Distances with two displacement equations responds X-Y micro displacement workbench fast as claimed in claim 1, it is characterized in that, described base is also provided with the outlet of piezoelectric ceramics signal wire.
10. a kind of Long Distances with two displacement equations responds four angles on motion platform described in X-Y micro displacement workbench fast and has screwing through hole, for connecting top cover and base as claimed in claim 1.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410165010.0A CN105006254B (en) | 2014-04-23 | 2014-04-23 | Large-stroke quick-response X-Y micro-motion workbench with double displacement magnification |
Applications Claiming Priority (1)
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Cited By (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105904443A (en) * | 2016-06-17 | 2016-08-31 | 华南理工大学 | Two-degree-of-freedom flexible parallel mechanism for motion decoupling |
| CN106299103A (en) * | 2016-09-09 | 2017-01-04 | 西安交通大学 | A kind of rhombus compliant mechanism with high natural frequency and displacement equations ratio |
| CN108494285A (en) * | 2018-05-14 | 2018-09-04 | 西安科技大学 | A kind of accurate amplification flexible micro system |
| CN109261995A (en) * | 2018-09-29 | 2019-01-25 | 宁波大学 | A kind of five degree of freedom fast servo tool micromotion platform |
| CN110010189A (en) * | 2019-04-23 | 2019-07-12 | 山东理工大学 | A kind of big stroke two dimension precise jiggle platform of achievable mobile decoupling |
| CN110155935A (en) * | 2019-05-13 | 2019-08-23 | 天津大学 | The XY θ three freedom meek precisively positioning platform of second level displacement equations |
| CN110211627A (en) * | 2019-05-14 | 2019-09-06 | 江南大学 | High-precision large-stroke table space translation precisely locating platform effective greatly |
| CN110364221A (en) * | 2018-11-27 | 2019-10-22 | 广东工业大学 | A kind of two-freedom nanometer displacement locating platform in parallel based on flexible hinge |
| CN110815147A (en) * | 2019-11-06 | 2020-02-21 | 青岛理工大学 | Micro-displacement platform driven by piezoelectric ceramics |
| CN112994513A (en) * | 2021-02-08 | 2021-06-18 | 合肥工业大学 | Hollow two-dimensional piezoelectric inertia impact driving platform |
| CN114155908A (en) * | 2021-10-28 | 2022-03-08 | 佛山科学技术学院 | Concentrated flexible bridge type displacement amplification mechanism with flexible hinge optimized topological structure |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01107188A (en) * | 1987-10-20 | 1989-04-25 | Fujitsu Ltd | Finely adjusting x-y stage |
| CN2621876Y (en) * | 2003-04-14 | 2004-06-30 | 浙江大学 | Twe-D superprecision positioning, damping vernier working platform based on piezoelectric driver |
| JP4674490B2 (en) * | 2005-05-17 | 2011-04-20 | 株式会社島津製作所 | Moving stage device |
| CN102543217A (en) * | 2012-01-20 | 2012-07-04 | 澳门大学 | Macro-micro driven bidimensional integrated micro positioning platform |
| CN102962683A (en) * | 2012-11-22 | 2013-03-13 | 上海交通大学 | Two-degree of freedom translational parallel high-bandwidth micro-motion platform |
-
2014
- 2014-04-23 CN CN201410165010.0A patent/CN105006254B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01107188A (en) * | 1987-10-20 | 1989-04-25 | Fujitsu Ltd | Finely adjusting x-y stage |
| CN2621876Y (en) * | 2003-04-14 | 2004-06-30 | 浙江大学 | Twe-D superprecision positioning, damping vernier working platform based on piezoelectric driver |
| JP4674490B2 (en) * | 2005-05-17 | 2011-04-20 | 株式会社島津製作所 | Moving stage device |
| CN102543217A (en) * | 2012-01-20 | 2012-07-04 | 澳门大学 | Macro-micro driven bidimensional integrated micro positioning platform |
| CN102962683A (en) * | 2012-11-22 | 2013-03-13 | 上海交通大学 | Two-degree of freedom translational parallel high-bandwidth micro-motion platform |
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105904443B (en) * | 2016-06-17 | 2018-07-20 | 华南理工大学 | A kind of two-freedom compliant parallel mechanism of mobile decoupling |
| CN105904443A (en) * | 2016-06-17 | 2016-08-31 | 华南理工大学 | Two-degree-of-freedom flexible parallel mechanism for motion decoupling |
| CN106299103A (en) * | 2016-09-09 | 2017-01-04 | 西安交通大学 | A kind of rhombus compliant mechanism with high natural frequency and displacement equations ratio |
| CN106299103B (en) * | 2016-09-09 | 2018-11-23 | 西安交通大学 | Diamond shape compliant mechanism a kind of while that there is high natural frequency and displacement equations ratio |
| CN108494285A (en) * | 2018-05-14 | 2018-09-04 | 西安科技大学 | A kind of accurate amplification flexible micro system |
| CN109261995A (en) * | 2018-09-29 | 2019-01-25 | 宁波大学 | A kind of five degree of freedom fast servo tool micromotion platform |
| CN110364221A (en) * | 2018-11-27 | 2019-10-22 | 广东工业大学 | A kind of two-freedom nanometer displacement locating platform in parallel based on flexible hinge |
| CN110010189A (en) * | 2019-04-23 | 2019-07-12 | 山东理工大学 | A kind of big stroke two dimension precise jiggle platform of achievable mobile decoupling |
| CN110155935A (en) * | 2019-05-13 | 2019-08-23 | 天津大学 | The XY θ three freedom meek precisively positioning platform of second level displacement equations |
| CN110211627A (en) * | 2019-05-14 | 2019-09-06 | 江南大学 | High-precision large-stroke table space translation precisely locating platform effective greatly |
| CN110211627B (en) * | 2019-05-14 | 2023-12-22 | 江南大学 | High-precision large-stroke large-effective table top space translational precision positioning platform |
| CN110815147A (en) * | 2019-11-06 | 2020-02-21 | 青岛理工大学 | Micro-displacement platform driven by piezoelectric ceramics |
| CN112994513A (en) * | 2021-02-08 | 2021-06-18 | 合肥工业大学 | Hollow two-dimensional piezoelectric inertia impact driving platform |
| CN114155908A (en) * | 2021-10-28 | 2022-03-08 | 佛山科学技术学院 | Concentrated flexible bridge type displacement amplification mechanism with flexible hinge optimized topological structure |
| CN114155908B (en) * | 2021-10-28 | 2023-03-10 | 佛山科学技术学院 | Concentrated flexible bridge type displacement amplification mechanism with flexible hinge optimized topological structure |
| CN114629375A (en) * | 2022-03-14 | 2022-06-14 | 东莞市卓聚科技有限公司 | Micro-force applying device |
| CN114629375B (en) * | 2022-03-14 | 2024-03-29 | 松山湖材料实验室 | Micro force applying device |
| CN114992453A (en) * | 2022-06-07 | 2022-09-02 | 重庆大学 | Controllable plane high-precision flexible displacement platform with high load and large stroke |
| CN114992453B (en) * | 2022-06-07 | 2024-02-27 | 重庆大学 | Controllable plane high-precision flexible displacement platform with high load and large stroke |
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