CN104978075A - Touch screen and preparation method thereof - Google Patents
Touch screen and preparation method thereof Download PDFInfo
- Publication number
- CN104978075A CN104978075A CN201510472234.0A CN201510472234A CN104978075A CN 104978075 A CN104978075 A CN 104978075A CN 201510472234 A CN201510472234 A CN 201510472234A CN 104978075 A CN104978075 A CN 104978075A
- Authority
- CN
- China
- Prior art keywords
- film layer
- substrate
- ito film
- silicon film
- screen
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
The invention provides a touch screen which sequentially comprises a substrate, a first silicon film layer, an ITO film layer and a second silicon film layer from bottom to top. The invention further provides a preparation method of the touch screen. The preparation method comprises the following steps: (1) providing the substrate, and performing film coating pretreatment on the substrate; (2) coating the surface of the substrate with the first silicon film layer; (3) coating the surface of the first silicon film layer with an ITO film layer, wherein a vacuum cathode magnetron sputtering method is adopted for coating of the ITO film layer, and the ratio of indium to tin of a target is 93 to 7; and (4) coating the surface of the ITO film layer with the second silicon film layer. According to the touch screen provided by the invention, the vacuum cathode magnetron sputtering method is adopted for coating of the ITO film layer, and the ratio of indium to tin of the target is 93 to 7; at the ratio, the roughness of the ITO film layer is effectively improved, and the raised part of the ITO film layer can not punch the second silicon film layer covering the surface of the ITO film layer, so that the problem of resistance leakage is solved.
Description
Technical field
The present invention relates to a kind of touch-screen and preparation method thereof.
Background technology
Flat panel display had development at full speed in nearly ten years, and the quality from the size of screen to display all achieves very much progress.Entered constantly effort, the performance of LCD each side has reached and even has surmounted traditional C RT.Along with the continuous expansion that flat panel display product is produced, the competition between each production firm is also growing more intense.Each manufacturer, while improving constantly properties of product, is also constantly making great efforts the production cost reducing product, thus is improving the competitive power in market.
Along with the development in market, more and more higher to the requirement of LCD substrate thickness (ultra-thin), client is to the raising of New Products & New Technology theory attention degree in addition, and new type superthin LCD product often can be taken the good opportunity in the market.Along with the continuous increase of LCD industry competition, how extensive high quality and low cost produces ultra-thin novel induction type touch-screen product becomes increasingly important.
Summary of the invention
Technical matters to be solved by this invention is to provide a kind of touch-screen that each rete is stablized, quality is high.
In order to solve the problems of the technologies described above, the present invention adopts following technical scheme: a kind of touch-screen, and it comprises substrate, the first silicon film, ito film layer and the second silicon film from bottom to up successively.
Described silicon film is SiO
2rete.
The advantage of a kind of touch-screen of the present invention is: the first silicon film and ito film layer are formed and touch required conducting function; the manufacturing demand of display can be met; second silicon film is as protective film; ito film layer can be protected; wearing and tearing are produced when avoiding touching; isolate drain potential simultaneously; improve application range of products; solve traditional capacitance screen when environment temperature, humidity and environment of electric field change; the drift of the capacitance plate caused; cause inaccurate problem, and outer hard rete is wear-resistant, the life-span is long.To sum up, each rete of a kind of touch-screen of the present invention is stable, product quality is high.
Further, described substrate is glass substrate, and thickness is 0.4mm-1.8mm.Adopt such technical scheme, the demand to touch-screen ultrathin can be met.
The present invention also provides the preparation method of above-mentioned a kind of touch-screen, comprises the following steps:
(1) provide substrate, plated film pre-treatment is carried out to substrate;
(2) at substrate plating surface first silicon film;
(3) at the first silicon film plated surface ito film layer, plating ito film layer adopts vacuum cathode magnetron sputtering method, and the indium tin ratio of target is 93:7;
(4) at ito film layer plated surface second silicon film.
Preparation method's advantage of a kind of touch-screen provided by the invention is: the present invention adopts vacuum cathode magnetron sputtering method to plate ito film layer, and the indium tin ratio determining target is 93:7, under this ratio, the roughness of ito film layer is effectively improved, the part of its projection can not pierce through the second silicon film covering its surface, and then solves the problem of leakage resistance.Preparation method's technique of a kind of touch-screen provided by the invention is simple in addition, cost is low, is applicable to large-scale industrial production.
Accompanying drawing explanation
Fig. 1 is the structural representation of a kind of touch-screen of the present invention.
Fig. 2 is the ito film layer design sketch of existing touch-screen preparation method.
Fig. 3 is the ito film layer design sketch of the preparation method of a kind of touch-screen of the present invention.
Embodiment
Below in conjunction with accompanying drawing, the invention will be further described:
See Fig. 1.
A kind of touch-screen of the present invention, it comprises substrate 1, first silicon film 2, ito film layer 3 and the second silicon film 4 from bottom to up successively, and substrate 1 is glass substrate, and thickness is 0.4mm-1.8mm.
The preparation method of above-mentioned a kind of touch-screen, comprises the following steps:
(1) substrate 1 is provided, plated film pre-treatment is carried out to substrate 1;
Plated film pre-treatment is generally cleaning, and cleaning process adopts clean-out system immersion, pure water and rear ultrasound wave to carry out the mode of cleaning;
(2) at substrate 1 plated surface first silicon film 2;
(3) at the first silicon film 2 plated surface ito film layer 3, plating ito film layer 3 adopts vacuum cathode magnetron sputtering method, and the indium tin ratio of target is 93:7;
(4) at ito film layer 3 plated surface second silicon film 4.
Fig. 2 is the ito film layer design sketch of existing touch-screen preparation method, and Fig. 3 is the ito film layer design sketch of the preparation method of a kind of touch-screen of the present invention.As apparent from the contrast of Fig. 2 and Fig. 3 can, ito film layer of the present invention is more even, and roughness is effectively improved, and does not substantially pierce through the projection of the second silicon film 4, thus effectively can solve the problem of leakage resistance.
Be to be understood that example as herein described and embodiment only in order to illustrate, those skilled in the art can make various amendment or change according to it, when not departing from Spirit Essence of the present invention, all belong to protection scope of the present invention.
Claims (3)
1. a touch-screen, it comprises substrate, the first silicon film, ito film layer and the second silicon film from bottom to up successively.
2. a kind of touch-screen as claimed in claim 1, is characterized in that: described substrate is glass substrate, and thickness is 0.4mm-1.8mm.
3. the preparation method of a kind of touch-screen as claimed in claim 1 or 2, comprises the following steps:
(1) provide substrate, plated film pre-treatment is carried out to substrate;
(2) at substrate plating surface first silicon film;
(3) at the first silicon film plated surface ito film layer, plating ito film layer adopts vacuum cathode magnetron sputtering method, and the indium tin ratio of target is 93:7;
(4) at ito film layer plated surface second silicon film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510472234.0A CN104978075A (en) | 2015-08-01 | 2015-08-01 | Touch screen and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510472234.0A CN104978075A (en) | 2015-08-01 | 2015-08-01 | Touch screen and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN104978075A true CN104978075A (en) | 2015-10-14 |
Family
ID=54274640
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510472234.0A Pending CN104978075A (en) | 2015-08-01 | 2015-08-01 | Touch screen and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN104978075A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060114378A1 (en) * | 2004-11-26 | 2006-06-01 | Kyung-Ho Choi | Liquid crystal display device having OCB mode liquid crystal layer and method of fabricating the same |
| CN102324271A (en) * | 2011-10-14 | 2012-01-18 | 南昌欧菲光科技有限公司 | Crystallized type ITO (Indium Tin Oxide) transparent conductive film and preparation method thereof |
| CN102436319A (en) * | 2010-09-29 | 2012-05-02 | 可成科技股份有限公司 | Touch panel |
| CN103014644A (en) * | 2012-12-24 | 2013-04-03 | 南昌欧菲光科技有限公司 | ITO (indium tin oxide) film for touch screen and preparation method thereof |
| CN205318352U (en) * | 2015-08-01 | 2016-06-15 | 安徽省蚌埠华益导电膜玻璃有限公司 | Touch screen |
-
2015
- 2015-08-01 CN CN201510472234.0A patent/CN104978075A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20060114378A1 (en) * | 2004-11-26 | 2006-06-01 | Kyung-Ho Choi | Liquid crystal display device having OCB mode liquid crystal layer and method of fabricating the same |
| CN102436319A (en) * | 2010-09-29 | 2012-05-02 | 可成科技股份有限公司 | Touch panel |
| CN102324271A (en) * | 2011-10-14 | 2012-01-18 | 南昌欧菲光科技有限公司 | Crystallized type ITO (Indium Tin Oxide) transparent conductive film and preparation method thereof |
| CN103014644A (en) * | 2012-12-24 | 2013-04-03 | 南昌欧菲光科技有限公司 | ITO (indium tin oxide) film for touch screen and preparation method thereof |
| CN205318352U (en) * | 2015-08-01 | 2016-06-15 | 安徽省蚌埠华益导电膜玻璃有限公司 | Touch screen |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN102955615B (en) | The manufacture method of a kind of touch-screen, touch control display apparatus and a kind of touch-screen | |
| CN201218888Y (en) | Touch control structure integrated display panel | |
| CN102953037B (en) | Preparation method of conductive film on ultrathin glass substrate | |
| CN104461156A (en) | Touch screen manufacturing method, touch screen and touch device | |
| CN102776476B (en) | Composite film for touch screen and production method of composite film | |
| CN204674125U (en) | Transmission increasing disappears shadow AZO electro-conductive glass and contactor control device | |
| CN105271821A (en) | Processing method for double-sided shadow eliminating conductive glass of touch screen | |
| CN105819703A (en) | Preparation method of capacitive touch screen electro-conductive glass with shadow eliminating function | |
| CN102707832A (en) | Method for manufacturing touch screen display, touch screen display and terminal | |
| CN205318352U (en) | Touch screen | |
| CN205318357U (en) | Integration touch screen structure | |
| CN205247353U (en) | Array substrate and display panel | |
| CN104978075A (en) | Touch screen and preparation method thereof | |
| CN105739759B (en) | The production method of integrated touching device | |
| CN102543266B (en) | Transparent conducting film with copper conductor | |
| CN105271820A (en) | Processing method for single-sided shadow eliminating conductive glass of touch screen | |
| CN102642357B (en) | Multi-film optical plate and preparation method thereof | |
| CN201607715U (en) | Projected capacitive touch panel | |
| CN205176821U (en) | OGS capacitive touch screen and touch -sensitive display device | |
| CN202870781U (en) | Touch screen and touch control display device | |
| CN204676000U (en) | A kind of AZO conductive glass and contactor control device | |
| CN203894732U (en) | OGS capacitive touch screen of ITO bridge | |
| CN202711220U (en) | Function sheet for surface capacity touch screen | |
| CN102848655B (en) | Anti-static film and production method thereof | |
| CN105204691A (en) | Method for processing single-sided shadow mark vanishing conductive glass |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20151014 |