CN104619105B - The arc chamber of Xe medium capillary discharging detection EUV light source - Google Patents

The arc chamber of Xe medium capillary discharging detection EUV light source Download PDF

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Publication number
CN104619105B
CN104619105B CN201510084937.6A CN201510084937A CN104619105B CN 104619105 B CN104619105 B CN 104619105B CN 201510084937 A CN201510084937 A CN 201510084937A CN 104619105 B CN104619105 B CN 104619105B
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electrode
prepulsing
common electrode
shell
main pulse
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CN104619105A (en
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王骐
徐强
赵永蓬
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Harbin Institute of Technology
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Harbin Institute of Technology
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Abstract

The arc chamber of Xe medium capillary discharging detection EUV light source, is related to extreme ultraviolet (EUV) light source technology.It is in order to solve electric discharge cell structure discharge performance and the imperfect problem of cooling performance of routine.The high-pressure stage of main pulse power supply in the present invention shares an electrode with the earth polar of prepulsing power supply, on the right side of shell, prepulsing high-field electrode and common electrode are arranged at enclosure, and the position of prepulsing high-field electrode and common electrode is adjustable vertically, make prepulsing high-field electrode all adjustable with the distance of main pulse ground electrode with the distance of main pulse ground electrode and common electrode, improve main pulse power supply and the discharge performance of prepulsing power supply.Prepulsing high-field electrode and common electrode are internally provided with water-cooling system.The present invention has good insulating properties, discharge performance, cooling performance and vacuum performance it is adaptable to Xe medium capillary discharging detection EUV light source.

Description

The arc chamber of Xe medium capillary discharging detection EUV light source
Technical field
The present invention relates to 13.5nm extreme ultraviolet (EUV) light source technology is and in particular to a kind of Xe medium capillary discharging detects Arc chamber with 13.5nm EUV light source.
Background technology
In order to realize the great-leap-forward development of China's super large-scale integration, the year two thousand twenty is realized 45nm～22nm and is carved by country Line is planned as the Long-and Medium-term Development of China's microelectronic industry, and it is special thus to have formulated national science and technology key special subjects 02.Past Decades, microelectronic industry develops rapidly, integrated circuit minimum feature size determine on a chip can be integrated crystalline substance Body pipe quantity, also determines the integrated circuit speed of service and memory capacity.Photoetching technique, as the technical foundation of integrated circuit, is Determine a key factor of integrated circuit development speed.Physics limit R of litho machine resolution determines integrated circuit Little characteristic size, physics limit R of litho machine resolution determines the minimum feature size of integrated circuit, can pass through resolution Enhancement techniques reduce process factor k1, or reduce photo-etching machine exposal wavelength X, or the method improving numerical aperture NA, improve Litho machine resolution R.Wherein, reducing photo-etching machine exposal wavelength is one of main method.Extreme ultraviolet lithography adopts 13.5nm (2% bandwidth) radiant light as exposure light source, be most possibly realize the even following Next Generation Lithography of 16nm node it One.
For large-scale industrial production (HVM) various critical components in EUV lithography machine, such as light source, collection mirror, mask Version, photoresist etc., its performance parameter is more harsh compared with the part in conventional lithographic machine, and testing conditions are increasingly complex, needs Using 13.5nm light source detection radiation of light source characteristic and power stability, collect mirror surface roughness, surface precision, mask plate essence Degree, photoresist are to parameters such as 13.5nm (2% bandwidth) rdaiation response sensitivity.Detection EUV light source is by power-supply system, electric discharge system System, vacuum system, detection system, collection optical system and go a few part such as chip system to form, power-supply system is arranged on electric discharge Chamber interior.During the work of 1kHz test light source, power 50kW, being wherein converted to luminous energy is 20kW, and remaining 30kW electric energy turns It is changed to heat energy to be deposited in arc chamber, this needs arc chamber to have good cooling performance.On the other hand, arc chamber needs work In vacuum environment, this makes arc chamber be able to maintain that good vacuum performance, and the arc chamber that this is also conventional cannot meet.
Content of the invention
The invention aims to solving conventional electric discharge cell structure discharge performance and the imperfect problem of cooling performance, A kind of arc chamber of Xe medium capillary discharging detection EUV light source is provided.
The arc chamber of Xe medium capillary discharging detection EUV light source of the present invention, including main pulse ground electrode 1st, the capillary tube 5 of prepulsing high-field electrode 2, common electrode 3, shell 4 and EUV light source；
Described main pulse ground electrode 1 is the ground electrode of the described main pulse power supply of EUV light source, described pre- arteries and veins Rush the high-field electrode that high-field electrode 2 is the described prepulsing power supply of EUV light source, described common electrode 3 is EUV light source The high-field electrode of main pulse power supply and prepulsing power supply ground electrode common electrode 3；
Prepulsing high-field electrode 2, common electrode 3 and shell 4 are round tube shape structure, and center overlapping of axles；
One end closing of shell 4, another end opening；
The inner and outer surfaces of the tube wall of main pulse ground electrode 1, prepulsing high-field electrode 2 and common electrode 3 are covered with insulating Layer；
Main pulse ground electrode 1 is annular, and capillary tube 5 is embedded in the center in the hole of this annulus, main pulse ground electrode 1 and hair Tubule 5 collectively covers the open side in shell 4, and junction sealing；
Common electrode 3 is located inside shell 4, and prepulsing high-field electrode 2 is located inside common electrode 3；
Venthole for evacuation is had on shell 4；
Air inlet is also had on shell 4；
It is additionally provided with cooling system, for freezing to prepulsing high-field electrode 2 and common electrode 3 inside shell 4.
Described EUV light source mainly includes power supply, arc chamber, vacuum chamber three parts, and arc chamber is connected with vacuum chamber Connect.Wherein, power supply includes main pulse power supply and prepulsing power supply two parts.About 15mm at arc chamber capillary discharging position × In 15mm × 300mm regional extent, need to load the high-voltage pulse that two pressure reduction are respectively 20kV and 25kV, two simultaneously simultaneously Power supply needs to share an electrode, and in order to improve discharge performance in addition it is also necessary to adjust interelectrode relative position, this discharges to whole Cell structure proposes very high requirement.In the present invention, the high-pressure stage of main pulse power supply shares one with the earth polar of prepulsing power supply Electrode.Common electrode 3 is located on the right side of shell 4, the left end face closure of shell 4.The surface of three electrodes is covered with insulating Layer, has good insulating properties.Prepulsing high-field electrode 2 and common electrode 3 are arranged inside shell 4, and prepulsing is high The position of piezoelectricity pole 2 and common electrode 3 is adjustable vertically so that the distance of prepulsing high-field electrode 2 and main pulse ground electrode 1 and Common electrode 3 is all adjustable with the distance of main pulse ground electrode 1, improves main pulse power supply and the discharge performance of prepulsing power supply. In addition, electric discharge interior also sets up cooling system, for freezing to electrode.The present invention has good insulating properties, electric discharge Performance, cooling performance and vacuum performance.
Brief description
Fig. 1 is the structural representation of the arc chamber of Xe medium capillary discharging detection EUV light source of the present invention Figure.
Specific embodiment
Specific embodiment one：In conjunction with Fig. 1, present embodiment is described, the Xe medium capillary discharging described in present embodiment The arc chamber of detection EUV light source includes main pulse ground electrode 1, prepulsing high-field electrode 2, common electrode 3, shell 4 and pole The capillary tube 5 of ultraviolet source；
Described main pulse ground electrode 1 is the ground electrode of the described main pulse power supply of EUV light source, described pre- arteries and veins Rush the high-field electrode that high-field electrode 2 is the described prepulsing power supply of EUV light source, described common electrode 3 is EUV light source The high-field electrode of main pulse power supply and prepulsing power supply ground electrode common electrode 3；
Prepulsing high-field electrode 2, common electrode 3 and shell 4 are round tube shape structure, and center overlapping of axles；
One end closing of shell 4, another end opening；
The inner and outer surfaces of the tube wall of main pulse ground electrode 1, prepulsing high-field electrode 2 and common electrode 3 are covered with insulating Layer；
Main pulse ground electrode 1 is annular, and capillary tube 5 is embedded in the center in the hole of this annulus, main pulse ground electrode 1 and hair Tubule 5 collectively covers the open side in shell 4, and junction sealing；
Common electrode 3 is located inside shell 4, and prepulsing high-field electrode 2 is located inside common electrode 3；
Venthole for evacuation is had on shell 4；
Air inlet is also had on shell 4；
It is additionally provided with cooling system, for freezing to prepulsing high-field electrode 2 and common electrode 3 inside shell 4.
In present embodiment, the high-pressure stage of main pulse power supply shares an electrode with the earth polar of prepulsing power supply, that is, share Electrode 3.As shown in figure 1, common electrode 3 is located on the right side of shell 4, the left end face closure of shell 4.The surface of three electrodes It is covered with insulating barrier, there are good insulating properties.Prepulsing high-field electrode 2 and common electrode 3 are arranged inside shell 4, And the position of prepulsing high-field electrode 2 and common electrode 3 is adjustable vertically so that prepulsing high-field electrode 2 and main pulse ground are electric The distance of pole 1 and common electrode 3 are all adjustable with the distance of main pulse ground electrode 1, improve main pulse power supply and prepulsing power supply Discharge performance.In addition, electric discharge interior also sets up cooling system, for freezing to electrode.
During use, first vacuum chamber is connected with arc chamber.With mechanical pump, evacuation is carried out to arc chamber, until air pressure is low In 1Pa, then it is evacuated down to 10 with molecular pump-4Pa magnitude.Further according to needing to be filled with appropriate various gases, subsequently using pre--main Electric discharge is combined in pulse, realizes EUV-radiation light output.
Specific embodiment two：In conjunction with Fig. 1, present embodiment is described, present embodiment is to the Xe described in embodiment one The restriction further of the arc chamber of medium capillary discharging detection EUV light source, in present embodiment,
One end of common electrode 3 is located inside shell 4, and the other end passes through the end face of shell 4, extends to the outside of shell 4, And the end face closing extending out；
One end of prepulsing high-field electrode 2 is located at the inside of common electrode 3, and the other end passes through the end face of common electrode 3, prolongs Extend the outside of common electrode 3, and the end face closing extending out；The outer wall of prepulsing high-field electrode 2 is interior with common electrode 3 Space is left between wall；
A number water inlet 7 and an outlet 8 be provided with the side wall of common electrode 3, a described water inlet 7 and No. one Outlet 8 is substantially symmetrical about its central axis with regard to common electrode 3, and a water inlet 7 and outlet 8 are respectively positioned on the outside of shell 4；
It is additionally provided with dividing plate 6, the inside of prepulsing high-field electrode 2 is divided into by this dividing plate 6 inside prepulsing high-field electrode 2 Two spaces being connected；No. two water inlets 9 and No. two outlets 10 are had on the side wall of prepulsing high-field electrode 2, described two Number water inlet 9 is connected with above-mentioned two space respectively with No. two outlets 10, and No. two water inlets 9 and No. two outlets 10 equal Outside positioned at common electrode 3.
Present embodiment is freezed to electrode using water-cooling pattern.Two water-flowing paths are set altogether, wherein one is pre- Space between high voltage pulse electrode 2 and common electrode 3, another is the space between prepulsing high-field electrode 2 and dividing plate 6.Water Flow through in electrode interior, compared with other refrigeration modes, refrigeration greatly improves.

Claims (1)

  1. The arc chamber of 1.Xe medium capillary discharging detection EUV light source, including main pulse ground electrode (1), prepulsing high pressure Electrode (2), the capillary tube (5) of common electrode (3), shell (4) and EUV light source；
    Described main pulse ground electrode (1) is the ground electrode of the described main pulse power supply of EUV light source, described prepulsing High-field electrode (2) is the high-field electrode of the described prepulsing power supply of EUV light source, and described common electrode (3) is extreme ultraviolet The common electrode (3) of the ground electrode of the high-field electrode of main pulse power supply in source and prepulsing power supply；
    Prepulsing high-field electrode (2), common electrode (3) and shell (4) are round tube shape structure, and center overlapping of axles；
    One end closing of shell (4), another end opening；
    The inner and outer surfaces of the tube wall of main pulse ground electrode (1), prepulsing high-field electrode (2) and common electrode (3) are covered with insulating Layer；
    Main pulse ground electrode (1) is annular, and capillary tube (5) is embedded in the center in the hole of this annulus, main pulse ground electrode (1) with Capillary tube (5) collectively covers the open side in shell (4), and junction sealing；
    Common electrode (3) is located at shell (4) inside, and it is internal that prepulsing high-field electrode (2) is located at common electrode (3)；
    Venthole for evacuation is had on shell (4)；
    Shell also has air inlet on (4)；
    It is additionally provided with cooling system, for prepulsing high-field electrode (2) and common electrode (3) refrigeration inside shell (4)；
    It is characterized in that：
    One end of common electrode (3) is located at shell (4) inside, and the other end passes through the end face of shell (4), extends to shell (4) Outside, and the end face closing extending out；
    One end of prepulsing high-field electrode (2) is located at the inside of common electrode (3), and the other end passes through the end face of common electrode (3), Extend to the outside of common electrode (3), and the end face closing extending out；The outer wall electricity consumption together of prepulsing high-field electrode (2) Space is left between the inwall of pole (3)；
    A number water inlet (7) and an outlet (8) be provided with the side wall of common electrode (3), a described water inlet (7) and A number outlet (8) is substantially symmetrical about its central axis with regard to common electrode (3), and a water inlet (7) and an outlet (8) are respectively positioned on The outside of shell (4)；
    Is additionally provided with dividing plate (6) inside prepulsing high-field electrode (2), this dividing plate (6) is by the interior part of prepulsing high-field electrode (2) It is divided into two spaces being connected；No. two water inlets (9) and No. two outlets are had on the side wall of prepulsing high-field electrode (2) (10), described No. two water inlets (9) are connected with above-mentioned two space respectively with No. two outlets (10), and No. two water inlets (9) and No. two outlets (10) are respectively positioned on the outside of common electrode (3).
CN201510084937.6A 2015-02-16 2015-02-16 The arc chamber of Xe medium capillary discharging detection EUV light source Active CN104619105B (en)

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CN106054537B (en) * 2016-05-31 2017-11-03 哈尔滨工业大学 A kind of load system for capillary discharging EUV light source

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JPH05175581A (en) * 1991-12-25 1993-07-13 Toshiba Corp High repetition pulse laser electrode
JP2003288998A (en) * 2002-03-27 2003-10-10 Ushio Inc Extreme ultraviolet light source
US7302792B2 (en) * 2003-10-16 2007-12-04 The Johns Hopkins University Pulsed plasma thruster and method of making
CN102496538A (en) * 2011-11-28 2012-06-13 哈尔滨工业大学 Discharge electrode used for capillary extreme ultraviolet photoetching light source
CN103560393B (en) * 2013-11-19 2016-03-16 哈尔滨工业大学 The removable sparking electrode applied in capillary discharging soft x-ray laser
CN103559993B (en) * 2013-11-20 2015-09-16 哈尔滨工业大学 Prepulsing is isolated inductance and is utilized the capillary discharging soft x-ray laser device of this inductance

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