CN1045218C - 用超声波振动器振动输送液体的装置 - Google Patents
用超声波振动器振动输送液体的装置 Download PDFInfo
- Publication number
- CN1045218C CN1045218C CN95121660A CN95121660A CN1045218C CN 1045218 C CN1045218 C CN 1045218C CN 95121660 A CN95121660 A CN 95121660A CN 95121660 A CN95121660 A CN 95121660A CN 1045218 C CN1045218 C CN 1045218C
- Authority
- CN
- China
- Prior art keywords
- liquid
- transporting apparatus
- inwall
- raw material
- internals
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D33/00—Non-positive-displacement pumps with other than pure rotation, e.g. of oscillating type
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Pipeline Systems (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
Description
Claims (11)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6322662A JP2565146B2 (ja) | 1994-12-26 | 1994-12-26 | 液体定量輸送装置 |
JP322662/94 | 1994-12-26 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1135454A CN1135454A (zh) | 1996-11-13 |
CN1045218C true CN1045218C (zh) | 1999-09-22 |
Family
ID=18146205
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN95121660A Expired - Fee Related CN1045218C (zh) | 1994-12-26 | 1995-12-26 | 用超声波振动器振动输送液体的装置 |
Country Status (3)
Country | Link |
---|---|
US (1) | US5660528A (zh) |
JP (1) | JP2565146B2 (zh) |
CN (1) | CN1045218C (zh) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1999010031A1 (en) * | 1997-08-27 | 1999-03-04 | Farrens Frank L | Device for injecting material beneath the skin of a human or animal |
EP0990486B1 (en) * | 1997-12-08 | 2004-04-14 | Ebara Corporation | Polishing solution feeder |
US20030101938A1 (en) * | 1998-10-27 | 2003-06-05 | Applied Materials, Inc. | Apparatus for the deposition of high dielectric constant films |
DE10005820C1 (de) * | 2000-02-10 | 2001-08-02 | Schott Glas | Gasversorungsvorrichtung für Precursoren geringen Dampfdrucks |
US6811385B2 (en) * | 2002-10-31 | 2004-11-02 | Hewlett-Packard Development Company, L.P. | Acoustic micro-pump |
US7274996B2 (en) * | 2003-10-20 | 2007-09-25 | Genscape Intangible Holding, Inc. | Method and system for monitoring fluid flow |
SG186677A1 (en) * | 2005-04-25 | 2013-01-30 | Advanced Tech Materials | Liner-based liquid storage and dispensing systems with empty detection capability |
KR20080059594A (ko) * | 2005-10-28 | 2008-06-30 | 산요덴키가부시키가이샤 | 유체 이송 장치 및 이를 이용한 연료 전지 및 전자 기기 |
DE102009022492A1 (de) | 2009-05-25 | 2010-12-02 | Sensaction Ag | Vorrichtung zur Bestimmung der Eigenschaften eines Mediums in Form einer Flüssigkeit oder eines weichen Materials |
JP2011034809A (ja) * | 2009-07-31 | 2011-02-17 | Sanyo Electric Co Ltd | 生成水除去装置 |
JP2011033274A (ja) * | 2009-07-31 | 2011-02-17 | Sanyo Electric Co Ltd | 生成水除去装置 |
JP2011034808A (ja) * | 2009-07-31 | 2011-02-17 | Sanyo Electric Co Ltd | 生成水除去装置 |
US20110195187A1 (en) * | 2010-02-10 | 2011-08-11 | Apple Inc. | Direct liquid vaporization for oleophobic coatings |
WO2014158410A1 (en) * | 2013-03-13 | 2014-10-02 | Applied Materials, Inc | Acoustically-monitored semiconductor substrate processing systems and methods |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5496820A (en) * | 1978-01-17 | 1979-07-31 | Hitachi Zosen Corp | Unloading device of liquefied gas |
JPS631476A (ja) * | 1986-06-20 | 1988-01-06 | Tdk Corp | 液体霧化装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU857544A1 (ru) * | 1978-07-21 | 1981-08-23 | Каунасский Политехнический Институт Им.Антанаса Снечкуса | Способ регулировани производительности волновых насосов |
US5371429A (en) * | 1993-09-28 | 1994-12-06 | Misonix, Inc. | Electromechanical transducer device |
-
1994
- 1994-12-26 JP JP6322662A patent/JP2565146B2/ja not_active Expired - Fee Related
-
1995
- 1995-12-26 US US08/578,319 patent/US5660528A/en not_active Expired - Fee Related
- 1995-12-26 CN CN95121660A patent/CN1045218C/zh not_active Expired - Fee Related
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5496820A (en) * | 1978-01-17 | 1979-07-31 | Hitachi Zosen Corp | Unloading device of liquefied gas |
JPS631476A (ja) * | 1986-06-20 | 1988-01-06 | Tdk Corp | 液体霧化装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH08178197A (ja) | 1996-07-12 |
CN1135454A (zh) | 1996-11-13 |
US5660528A (en) | 1997-08-26 |
JP2565146B2 (ja) | 1996-12-18 |
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C06 | Publication | ||
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C14 | Grant of patent or utility model | ||
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ASS | Succession or assignment of patent right |
Owner name: NEC ELECTRONICS TAIWAN LTD. Free format text: FORMER OWNER: NIPPON ELECTRIC CO., LTD. Effective date: 20030404 |
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C41 | Transfer of patent application or patent right or utility model | ||
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Effective date of registration: 20030404 Address after: Kawasaki, Kanagawa, Japan Patentee after: NEC Corp. Address before: Tokyo, Japan Patentee before: NEC Corp. |
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Owner name: ERBIDA MEMORY CO., LTD. Free format text: FORMER OWNER: NEC ELECTRONICS TAIWAN LTD. Effective date: 20040806 |
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