CN104438022B - A kind of lunar dust measuring instrument viscous quartz crystal probe coating method - Google Patents

A kind of lunar dust measuring instrument viscous quartz crystal probe coating method Download PDF

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CN104438022B
CN104438022B CN201410449967.8A CN201410449967A CN104438022B CN 104438022 B CN104438022 B CN 104438022B CN 201410449967 A CN201410449967 A CN 201410449967A CN 104438022 B CN104438022 B CN 104438022B
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quartz crystal
film
frequency
viscous
coating
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CN104438022A (en
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姚日剑
王鹢
杨生胜
庄建宏
王锡来
柏树
邹昕
陈丽平
李存惠
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Lanzhou Institute of Physics of Chinese Academy of Space Technology
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Lanzhou Institute of Physics of Chinese Academy of Space Technology
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Abstract

The invention discloses a kind of lunar dust measuring instrument viscous quartz crystal (SQCM) to pop one's head in coating method. Use the present invention can be coated with vacuum grease on quartz crystal, and the viscous quartz crystal formed after film can be used in lunar dust and measures. Quartz crystal is carried out by the present invention initially with petroleum ether, and selects frequency quartz crystal in 9990000Hz~9995000Hz and carry out film; Do you adopt Apiezion? H fat carries out film as the overlay film of viscous quartz crystal, and in being coated with membrane process, monitor the frequency of quartz crystal, the frequency difference of the quartz crystal before and after smearing is about 2MHz, film completes, the detection Q-value of quartz crystal, resonance impedance and dynamic capacity, if meeting technical specification, then this quartz crystal may be used on viscous quartz crystal probe.

Description

A kind of lunar dust measuring instrument viscous quartz crystal probe coating method
Technical field
The present invention relates to spatial environments dust field of measuring technique, be specifically related to a kind of lunar dust measuring instrument viscous quartz crystal (SQCM) and pop one's head in coating method.
Background technology
Lunar dust measuring instrument is the engineering parameter measurement device on lunar exploration the second stage of the project CE-3 lander, has now been transmitted into moonscape, just at operation on orbit. Lunar dust measuring instrument includes two probes, a SQCM probe, and one is solaode probe. SQCM probe is main measures the moon dust quantity that menology long-term lunar dust accumulation is special, the change of the long-pending quality of monitoring moon dust quantity; Solaode probe is main measures the moon dust quantity of splashing during lander landing menology. Utilize SQCM probe measurement menology accumulation moon dust quantity, still belong to the first time in the world. The lunar dust measuring instrument SQCM probe coating method development process for lunar dust measuring instrument plays two key technology difficult problems that vital effect, coating process and oscillating circuit are lunar dust measuring instruments. In development process, attempted multiple coating process method, such as evaporation coating method, lacquering technique, infusion process, spraying process and rolling brush coating method etc., but all unsuccessful. Such as:
Evaporation coating method: be placed in vacuum environment by vacuum grease heating evaporation, condenses in strand DNA on Surface of Quartz crystal, forms adhesive membrane. The method, film is uniform, but the adhesive film of film loses original performance, and the adhesive film of coating can not meet instructions for use.
Lacquering technique: be dissolved in volatile organic solvent by vacuum grease, makes the solution of certain solubility, drops in the surface of quartz crystal, by rotating quartz crystal, makes solution be distributed in strand DNA on Surface of Quartz crystal, after solvent volatilizees naturally, forms adhesive film. The thickness of the adhesive film of the coating of the method is radially distributed, and surrounding is thick, intermediate thin.
Infusion process: be dissolved in volatile organic solvent by vacuum grease, makes the solution of certain solubility, is impregnated in the solution by quartz crystal, after taking out solvent volatilization, obtains adhesive film. By controlling speed and the solution concentration of dipping, it is controlled the thickness of adhesive film. But the bad control in region to film.
Spraying process: be dissolved in volatile organic solvent by vacuum grease, makes the solution of certain solubility, utilizes spray gun spraying to the surface of quartz crystal, forms adhesive film after equal solvent volatilization.The spraying area of the method and the bad control of coating thickness.
Roll brush coating method: be coated on cylinder by vacuum grease, by cylindrical rolling, oils and fats be coated to strand DNA on Surface of Quartz crystal. The method, bad control thickness.
Summary of the invention
In view of this, the invention provides a kind of lunar dust measuring instrument viscous quartz crystal probe coating method, it is possible on quartz crystal, be coated with vacuum grease, and the viscous quartz crystal formed after film can be used in lunar dust and measures.
The lunar dust measuring instrument viscous quartz crystal probe coating method of the present invention, comprises the steps:
Step 1, is fixed on fixture by quartz crystal, adopts petroleum ether that quartz crystal is carried out;
Step 2, carries out no load test to quartz crystal: by quartz crystal Network Analyzer test quartz crystal parallel resonance frequency; If test frequency is not within the scope of 9990000Hz~9995000Hz, repeating step 1, after cleaning for three times, frequency does not reach requirement, changes quartz crystal; Test frequency is within the scope of 9990000Hz~9995000Hz, and recording frequency value is designated as quartz crystal frequency before film;
Step 3, film;
Step 3.1, with examination coating on clean sheet glass after the viscous ApiezonH fat of cotton swab, forms a facet in cotton swab end;
Step 3.2, adopts the examination coating cotton swab of step 3.1, uniformly smears on quartz crystal, and institute's film must cover upper electrode surface; Coating process monitors quartz crystal frequency with Network Analyzer, if the frequency difference of the forward and backward quartz crystal of film is more than 20500Hz, then repeats 3.1 and 3.2 with the ApiezonH fat that a clean cotton swab is viscous fewer than upper secondary amounts; If the frequency difference of the forward and backward quartz crystal of film is less than 19500Hz, then repeat 3.1 and 3.2 with the ApiezonH fat that a clean cotton swab is viscous more than upper secondary amounts; Until when the frequency difference of the forward and backward quartz crystal of film is within the scope of (20000 ± 500) Hz, stopping coating, recording frequency value, it is designated as quartz crystal frequency after film;
Step 3.3, under natural light, perusal, it is desirable to film surface free from admixture, spot, institute's film covers upper electrode surface;
Step 4, carries out film properties detection: tests quartz crystal Q-value, resonance impedance and dynamic capacity with quartz crystal Network Analyzer, and judges whether quartz crystal meets following technical specification: after film, quartz crystal Q-value is more than 1000; After film, Quartz crystal resonant impedance is less than 300 Ω; Quartz crystal dynamic capacity after film: more than 40fF, as met, then after film, quartz-crystal physical ability is for lunar dust measuring instrument, otherwise, repeats step 1.
Beneficial effect:
(1) the inventive method solves the film problem of lunar dust measuring instrument SQCM probe, and the viscous quartz crystal formed after film can be used in lunar dust and measures, and realizes providing the foundation for lunar dust measuring instrument Orbital detection.
(2) quartz crystal is carried out by the present invention initially with petroleum ether, and petroleum ether dissolution is good, and after cleaning, petroleum ether can quickly volatilize, and will not remain.
(3) restriction number of times to quartz crystal cleaning, to prevent in cleaning process the damage to quarts crystal electrode. Owing to the certainty of measurement of viscous quartz crystal probe is high, it is therefore desirable to the parallel resonance frequency of quartz crystal after cleaning is detected, it is desirable to it is within the scope of 9990000Hz~9995000Hz, thus reaching probe measurement precision. Also need to quartz crystal simultaneously and can stablize starting of oscillation in oscillating circuit.
(4) select ApiezonH fat as the overlay film of viscous quartz crystal, it disclosure satisfy that the instructions for use of spatial environments, give vent to anger index, ultraviolet irradiation index and high energy particle irradiation index etc. including Nonmetal materials for satellite, and reliable and stable can open the requirement shaking and measuring range after this fat of quartz crystal film can be met.
(5) in coating process, the frequency of quartz crystal is monitored so that the frequency difference of quartz crystal before and after coating is about 2MHz, so that the quartz crystal after coating can reach the index request of measurement scope, and not easily failure of oscillation.
(6), during coating, first carry out examination coating with cotton swab, after ApiezonH fat is uniform on cotton swab, then be coated on quartz crystal, as such, it is possible to the problem of the uneven thickness formed when effectively preventing from being directly coated with.
Accompanying drawing explanation
Fig. 1 is SQCM of the present invention probe adhesive film film position view.
Fig. 2 is film flow chart of the present invention.
Fig. 3 is adhesive film material hot vacuum environment test temperature curve of the present invention.
Detailed description of the invention
Develop simultaneously embodiment below in conjunction with accompanying drawing, describe the present invention.
The invention provides a kind of lunar dust measuring instrument viscous quartz crystal probe coating method, specifically include following steps:
Step 1, is fixedly mounted on quartz crystal in film frock as shown in Figure 1.
Step 2, is carried out quartz crystal.
Owing to petroleum ether volatility is good, dissolubility is good, adopt petroleum ether not remain after being carried out, therefore, select petroleum ether that quartz crystal is carried out. Infiltrate cotton swab with petroleum ether, by position, viscous quartz germ nucleus, cotton swab is rotated in a clockwise direction cleaning strand DNA on Surface of Quartz crystal; Change clean cotton swab in triplicate; In cleaning process, firmly gently and uniformly, in case crushing quartz crystal. After cleaning, stand 3 minutes, wait petroleum ether volatilization.
Step 3, carries out no load test to quartz crystal.
Owing to the certainty of measurement of viscous quartz crystal probe is high, the reference frequency requiring quartz crystal reaches 10MHz, simultaneously because what the present invention adopted is the benchmark quartz crystal of parallel resonance, it is typically all and is positioned at below 10MHz, it is therefore desirable to the quartz crystal frequency after cleaning is within the scope of 9990000Hz~9995000Hz. 2 pins of the quartz crystal after cleaning are inserted in quartz crystal Network Analyzer sockets, by quartz crystal Network Analyzer test quartz crystal parallel resonance frequency; Test frequency, not within the scope of 9990000Hz~9995000Hz, repeats step 2, and after cleaning for three times, frequency is arrived requirement, changes quartz crystal (this is because the electrode that wash number too much may result in quartz crystal is dissolved). When test frequency reaches within the scope of 9990000Hz~9995000Hz, it was shown that this quartz crystal meets the requirements, record its frequency values, then test the quartz crystal after cleaning with quartz crystal Network Analyzer and record following items: quartz crystal Q-value; Quartz crystal resonant impedance and quartz crystal dynamic capacity, it is technically demanding for the Q-value of viscous quartz crystal of lunar dust detection, resonance impedance and dynamic capacity, generally speaking, quartz crystal all can reach requirement, after film, the performance of quartz crystal can be greatly reduced, therefore, it is also desirable to the Q-value of quartz crystal, resonance impedance and dynamic capacity after test film.
Step 4, film.
Consider the spatial environments of the fine vacuum that lunar dust measuring instrument viscous quartz crystal probe works, high radiation, select ApiezonH fat as the overlay film of quartz crystal.
Step 4.1, gluing a little ApiezonH fat with cotton swab, on clean sheet glass, examination coating, forms a facet in cotton swab end, so that ApiezonH fat is evenly distributed in cotton swab end, when being conducive to film by ApiezonH fat film equably on quartz crystal.
Step 4.2, adopts the examination coating cotton swab of step 4.1, uniformly smears on quartz crystal, and institute's film must cover upper electrode surface.In coating process, monitor quartz crystal frequency with Network Analyzer. Require that before and after coating, quartz crystal frequency difference is within the scope of (20000 ± 500) Hz, this scope is to be required to determine by the range of lunar dust measuring instrument viscous quartz crystal probe, if quartz crystal frequency difference is less than 19500Hz before and after coating, then can not meet lunar dust measuring instrument measuring amount range request, if quartz crystal frequency difference is more than 20500Hz before and after coating, then the oscillation damping of quartz crystal can increase, it is easy to failure of oscillation.
Before and after coating, quartz crystal frequency difference is more than 20500Hz, then repeat 4.1 and 4.2 with the ApiezonH fat that a clean cotton swab is viscous fewer than upper secondary amounts; Before and after coating, quartz crystal frequency difference is less than 19500Hz, then repeat 4.1 and 4.2 with the ApiezonH fat that a clean cotton swab is viscous more than upper secondary amounts; Until quartz crystal frequency difference is within the scope of (20000 ± 500) Hz before and after coating, stop coating, recording frequency value.
Step 4.3 is under natural light, and perusal, it is desirable to film surface free from admixture, spot, institute's film covers upper electrode surface.
Step 5, carries out film properties detection.
By the Q-value of quartz crystal, resonance impedance and dynamic capacity after quartz crystal Network Analyzer test film, it is desirable to the quartz crystal after film meets the requirement of lunar dust detection, and namely the Q-value of the quartz crystal after film should be greater than 1000; Quartz crystal resonant impedance should be less than 300 Ω; Quartz crystal dynamic capacity should be greater than 40fF.
Requiring that adhesive film material does hot vacuum environment test, experiment condition is, vacuum :≤1.3 × 10-3Pa; Insulation forward horizontal stand 0.5h; Test period is 22h10min. After test, ApiezonH vacuum grease thin film still has test lunar dust function, refers to Fig. 3.
Requiring that adhesive film material does VUV Irradiation test, experiment condition is, vacuum :≤1.3 × 10-348.4 kilocalories/cm of Pa, irradiation spectrum: 200nm~400nm, total irradiation: >2, the test period: 25 days. After test, ApiezonH vacuum grease thin film still has test function.
Requiring that adhesive film material does the test of 60Co gamma-ray irradiation, experiment condition is, close rate: 1 × 105Rad (Si)/h; Absorb accumulated dose: 1.0 × 106Rad (Si). After test, ApiezonH vacuum grease thin film still has test function.
Requiring that vacuum matter damages test, result of the test requires that TML is less than 1%, and CVCM is less than 0.1%.
A concrete example is given below:
Step 1, is arranged in film frock (frock number: SQCM01) by quartz crystal by Fig. 1, fixes with 3-M2 × 10 screw.
Step 2, cleans. Infiltrate cotton swab with petroleum ether, by position, viscous quartz germ nucleus, cotton swab is rotated in a clockwise direction cleaning strand DNA on Surface of Quartz crystal; Change clean cotton swab in triplicate; Note: in cleaning process, firmly gently and uniformly, in case crushing quartz crystal. After cleaning, stand 3 minutes.
Step 3, no load test. 2 pins of quartz crystal (being arranged in film frock) are inserted in quartz crystal Network Analyzer socket, tests following items: quartz crystal parallel resonance frequency: 9994747Hz; Quartz crystal Q-value; 37K; Quartz crystal resonant impedance; 10.3 Ω; Quartz crystal dynamic capacity: 9.3pF.
Step 4, film.
Step 4.1, examination coating. Gluing a little ApiezonH fat with cotton swab, on clean sheet glass, examination coating, forms a facet in cotton swab end.
Step 4.2, coating. With 4.1 examination coating cotton swabs, uniformly smearing in region shown in Fig. 1, institute's film must cover upper electrode surface.Coating process is monitored quartz crystal frequency change.
Step 4.3, test. Quartz crystal frequency, quartz crystal frequency 9970422Hz is tested with Network Analyzer.
Step 4.4, then apply. Difference frequency is 24325Hz, and the ApiezonH fat viscous fewer than upper secondary amounts with a clean cotton swab repeats 4.1 and 4.2, and test frequency values is 9975605Hz; Repeating 4.1 and 4.2 with the ApiezonH fat that a clean cotton swab is viscous more than upper secondary amounts again, test frequency values is 9974480Hz. Stop coating, recording frequency value.
Step 4.5, post processing. Under natural light, perusal, it is desirable to film surface free from admixture, spot, institute's film covers upper electrode surface.
Step 5, film properties detects. Quartz crystal Q-value, resonance impedance, dynamic capacity after film record is tested with quartz crystal Network Analyzer. Require as follows: the forward and backward parallel resonance frequency of quartz crystal film is poor: 20267Hz; Quartz crystal Q-value: 10K; Quartz crystal resonant impedance: 40.4 Ω; Quartz crystal dynamic capacity: 27.2fF.
Step 6, post processing.
Step 6.1, takes pictures. With digital camera, quartz crystal coated surface being taken pictures, shooting angle is respectively as follows:
A. one, panorama directly over;
B. oblique 45 ° of four positive directions respectively clap one;
C. achieve after shooting.
Step 6.2, disassembling fixture. Remove film frock by Fig. 1, the quartz crystal after film is arranged in lunar dust measuring instrument SQCM probe.
In sum, these are only presently preferred embodiments of the present invention, be not intended to limit protection scope of the present invention. All within the spirit and principles in the present invention, any amendment of making, equivalent replacement, improvement etc., should be included within protection scope of the present invention.

Claims (1)

1. a lunar dust measuring instrument viscous quartz crystal probe coating method, it is characterised in that comprise the steps:
Step 1, is fixed on fixture by quartz crystal, adopts petroleum ether that quartz crystal is carried out;
Step 2, carries out no load test to quartz crystal: by quartz crystal Network Analyzer test quartz crystal parallel resonance frequency; If test frequency is not within the scope of 9990000Hz~9995000Hz, repeating step 1, after cleaning for three times, frequency does not reach requirement, changes quartz crystal; Test frequency is within the scope of 9990000Hz~9995000Hz, and recording frequency value is designated as quartz crystal frequency before film;
Step 3, film;
Step 3.1, with examination coating on clean sheet glass after the viscous ApiezonH fat of cotton swab, forms a facet in cotton swab end;
Step 3.2, adopts the examination coating cotton swab of step 3.1, even application on quartz crystal, and institute's film must cover upper electrode surface; Coating process monitors quartz crystal frequency with Network Analyzer, if the frequency difference of the forward and backward quartz crystal of film is more than 20500Hz, then repeats 3.1 and 3.2 with the ApiezonH fat that a clean cotton swab is viscous fewer than upper secondary amounts; If the frequency difference of the forward and backward quartz crystal of film is less than 19500Hz, then repeat 3.1 and 3.2 with the ApiezonH fat that a clean cotton swab is viscous more than upper secondary amounts; Until when the frequency difference of the forward and backward quartz crystal of film is within the scope of 20000Hz ± 500Hz, stopping coating, recording frequency value, it is designated as quartz crystal frequency after film;
Step 3.3, under natural light, perusal, it is desirable to film surface free from admixture, spot, institute's film covers upper electrode surface;
Step 4, carries out film properties detection: tests quartz crystal Q-value, resonance impedance and dynamic capacity with quartz crystal Network Analyzer, and judges whether quartz crystal meets following technical specification: after film, quartz crystal Q-value is more than 1000;After film, Quartz crystal resonant impedance is less than 300 Ω; Quartz crystal dynamic capacity after film: more than 40fF, as met, then after film, quartz-crystal physical ability is for lunar dust measuring instrument, otherwise, repeats step 1.
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CN108333076A (en) * 2017-12-25 2018-07-27 兰州空间技术物理研究所 A kind of room atmosphere surface density detection sensor and preparation method thereof
CN114674917B (en) * 2022-03-25 2023-07-18 兰州空间技术物理研究所 Moon surface dust deposition quality in-situ detector and manufacturing method thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101693598A (en) * 2009-10-13 2010-04-14 中国航天科技集团公司第五研究院第五一〇研究所 Process for preparing adhesive film
CN101713722A (en) * 2009-12-17 2010-05-26 中国航天科技集团公司第五研究院第五一○研究所 Testing method of grease evaporation rate in vacuum environment
CN101762434A (en) * 2009-10-13 2010-06-30 中国航天科技集团公司第五研究院第五一〇研究所 Measuring method of tiny dust
US8765230B1 (en) * 2009-12-01 2014-07-01 The Boeing Company Thermal barrier coated RF radomes and method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9956743B2 (en) * 2010-12-20 2018-05-01 The Regents Of The University Of California Superhydrophobic and superoleophobic nanosurfaces

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101693598A (en) * 2009-10-13 2010-04-14 中国航天科技集团公司第五研究院第五一〇研究所 Process for preparing adhesive film
CN101762434A (en) * 2009-10-13 2010-06-30 中国航天科技集团公司第五研究院第五一〇研究所 Measuring method of tiny dust
US8765230B1 (en) * 2009-12-01 2014-07-01 The Boeing Company Thermal barrier coated RF radomes and method
CN101713722A (en) * 2009-12-17 2010-05-26 中国航天科技集团公司第五研究院第五一○研究所 Testing method of grease evaporation rate in vacuum environment

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