CN104403573A - Jade polishing powder - Google Patents
Jade polishing powder Download PDFInfo
- Publication number
- CN104403573A CN104403573A CN201410707729.2A CN201410707729A CN104403573A CN 104403573 A CN104403573 A CN 104403573A CN 201410707729 A CN201410707729 A CN 201410707729A CN 104403573 A CN104403573 A CN 104403573A
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- Prior art keywords
- parts
- oxide
- polishing powder
- jade
- polishing
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
- C09K3/1454—Abrasive powders, suspensions and pastes for polishing
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a jade polishing powder. The jade polishing powder is prepared from the following raw materials in parts by weight: 24-32 parts of cerium oxide, 18-26 parts of aluminum oxide, 15-23 parts of silicon oxide, 21-29 parts of ferric oxide, 17-25 parts of zirconium oxide, 7-15 parts of chromium oxide, 11-19 parts of lac, and 12-20 parts of ammonium oxalate. The jade polishing powder disclosed by the invention is high in abrasive hardness, narrow in grain fineness distribution range, and better in polishing effect; the mobility and the hardness of particles of the polishing powder are complementary; the polishing powder can be used for polishing the jade to achieve a better polishing effect, good brightness, uniform polishing, high glossiness, high flatness and the like; the preparation method of the polishing powder is simple; the polishing powder can be produced industrially, and provides convenience for the jade polishing technology.
Description
Technical field
The present invention relates to jade processing technique field, be specifically related to a kind of jade polishing powder.
Background technology
Jade can improve the sight of jade through sanding and polishing, adds artistry.Polishing has a variety of method, and the drill bit of band emery wheel is thick polishing, then choice refreshments emery cloth, emery cloth divides model again, thickness, substantially can not feel the grains of sand with staff, emery cloth can shear off by craftsman, be pasted onto on drill bit, polishing, certainly will add water when polishing, so more sliding, ancient method is first use skin to the processing of jade and polishing, rear silk.
The polishing technology of jade be unable to do without polishing powder, but traditional polishing powder polishing effect is poor, bright not, not evenly, glossiness is low, planeness is low, can not meet the requirement of modern jade processing.
Summary of the invention
The present invention aims to provide a kind of jade polishing powder, to solve the problem that polishing effect is poor, bright not, even not, glossiness is low, planeness is low that numerous jade polishing powder exists.
The present invention is achieved by the following technical programs:
A kind of jade polishing powder, it is made up of following raw material: cerium oxide 24-32 part, aluminum oxide 18-26 part, silicon oxide 15-23 part, ferric oxide 21-29 part, zirconium white 17-25 part, chromic oxide 7-15 part, lac 11-19 part, ammonium oxalate 12-20 part.
Described jade polishing powder is made up of following raw material: cerium oxide 26-30 part, aluminum oxide 20-24 part, silicon oxide 17-21 part, ferric oxide 23-27 part, zirconium white 19-23 part, chromic oxide 9-13 part, lac 13-17 part, ammonium oxalate 14-18 part.
Described jade polishing powder is made up of following raw material: cerium oxide 27-29 part, aluminum oxide 21-23 part, silicon oxide 18-20 part, ferric oxide 24-26 part, zirconium white 20-22 part, chromic oxide 10-12 part, lac 14-16 part, ammonium oxalate 15-17 part.
Described jade polishing powder is made up of following raw material: cerium oxide 28 parts, 22 parts, aluminum oxide, silicon oxide 19 parts, ferric oxide 25 parts, zirconium white 21 parts, 11 parts, chromic oxide, lac 15 parts, ammonium oxalate 16 parts.
Also containing diadust 9 parts in described jade polishing powder.
The granularity of described diadust is 6-12um.
Jade polishing powder of the present invention can be prepared from by the following method:
Get cerium oxide, zirconium white mixes with the ratio of water according to 1:3, slurries are stirred into after adding aluminum oxide, silicon oxide, ferric oxide, chromic oxide, lac mixing again, add after again ammonium oxalate being dissolved in water, 10min is stirred under normal temperature, reheat to 90 DEG C of reaction 50min, through comminution by gas stream after the roasting temperature 1.5h of 1000 DEG C, cooling, then mix with diadust and namely obtain jade polishing powder.
Beneficial effect of the present invention is: jade polishing powder gouge hardness of the present invention is high, particle size distribution is narrow, between the powder of polishing powder mobility and soft durometer complementary, polishing effect is better, use this polishing powder to carry out polishing to jade and have that polishing effect is good, bright, polishing is even, glossiness is high, planeness high, and the preparation method of this polishing powder is simple, can realize suitability for industrialized production, the polishing technology for jade provides convenient.
Embodiment
Below in conjunction with specific embodiment, technical scheme of the present invention is further described, but described in claimed scope is not limited to.
Embodiment one
Component: cerium oxide 24 parts, 18 parts, aluminum oxide, silicon oxide 15 parts, ferric oxide 21 parts, zirconium white 17 parts, 7 parts, chromic oxide, lac 11 parts, ammonium oxalate 12 parts, diadust 9 parts.
Preparation method: get cerium oxide, zirconium white mixes with the ratio of water according to 1:3, slurries are stirred into after adding aluminum oxide, silicon oxide, ferric oxide, chromic oxide, lac mixing again, add after again ammonium oxalate being dissolved in water, 10min is stirred under normal temperature, reheat to 90 DEG C of reaction 50min, through comminution by gas stream after the roasting temperature 1.5h of 1000 DEG C, cooling, then mix with diadust and namely obtain jade polishing powder.
Embodiment two
Component: cerium oxide 32 parts, 26 parts, aluminum oxide, silicon oxide 23 parts, ferric oxide 29 parts, zirconium white 25 parts, 15 parts, chromic oxide, lac 19 parts, ammonium oxalate 20 parts, diadust 9 parts.
Preparation method: get cerium oxide, zirconium white mixes with the ratio of water according to 1:3, slurries are stirred into after adding aluminum oxide, silicon oxide, ferric oxide, chromic oxide, lac mixing again, add after again ammonium oxalate being dissolved in water, 10min is stirred under normal temperature, reheat to 90 DEG C of reaction 50min, through comminution by gas stream after the roasting temperature 1.5h of 1000 DEG C, cooling, then mix with diadust and namely obtain jade polishing powder.
Embodiment three
Component: cerium oxide 26 parts, 20 parts, aluminum oxide, silicon oxide 17 parts, ferric oxide 23 parts, zirconium white 19 parts, 9 parts, chromic oxide, lac 13 parts, ammonium oxalate 14 parts, diadust 9 parts.
Preparation method: get cerium oxide, zirconium white mixes with the ratio of water according to 1:3, slurries are stirred into after adding aluminum oxide, silicon oxide, ferric oxide, chromic oxide, lac mixing again, add after again ammonium oxalate being dissolved in water, 10min is stirred under normal temperature, reheat to 90 DEG C of reaction 50min, through comminution by gas stream after the roasting temperature 1.5h of 1000 DEG C, cooling, then mix with diadust and namely obtain jade polishing powder.
Embodiment four
Component: cerium oxide 30 parts, 24 parts, aluminum oxide, silicon oxide 21 parts, ferric oxide 27 parts, zirconium white 23 parts, 13 parts, chromic oxide, lac 17 parts, ammonium oxalate 18 parts, diadust 9 parts.
Preparation method: get cerium oxide, zirconium white mixes with the ratio of water according to 1:3, slurries are stirred into after adding aluminum oxide, silicon oxide, ferric oxide, chromic oxide, lac mixing again, add after again ammonium oxalate being dissolved in water, 10min is stirred under normal temperature, reheat to 90 DEG C of reaction 50min, through comminution by gas stream after the roasting temperature 1.5h of 1000 DEG C, cooling, then mix with diadust and namely obtain jade polishing powder.
Embodiment five
Component: cerium oxide 27 parts, 21 parts, aluminum oxide, silicon oxide 18 parts, ferric oxide 24 parts, zirconium white 20 parts, 10 parts, chromic oxide, lac 14 parts, ammonium oxalate 15 parts, diadust 9 parts.
Preparation method: get cerium oxide, zirconium white mixes with the ratio of water according to 1:3, slurries are stirred into after adding aluminum oxide, silicon oxide, ferric oxide, chromic oxide, lac mixing again, add after again ammonium oxalate being dissolved in water, 10min is stirred under normal temperature, reheat to 90 DEG C of reaction 50min, through comminution by gas stream after the roasting temperature 1.5h of 1000 DEG C, cooling, then mix with diadust and namely obtain jade polishing powder.
Embodiment six
Component: cerium oxide 29 parts, 23 parts, aluminum oxide, silicon oxide 20 parts, ferric oxide 26 parts, zirconium white 22 parts, 12 parts, chromic oxide, lac 16 parts, ammonium oxalate 17 parts, diadust 9 parts.
Preparation method: get cerium oxide, zirconium white mixes with the ratio of water according to 1:3, slurries are stirred into after adding aluminum oxide, silicon oxide, ferric oxide, chromic oxide, lac mixing again, add after again ammonium oxalate being dissolved in water, 10min is stirred under normal temperature, reheat to 90 DEG C of reaction 50min, through comminution by gas stream after the roasting temperature 1.5h of 1000 DEG C, cooling, then mix with diadust and namely obtain jade polishing powder.
Embodiment seven
Component: cerium oxide 28 parts, 22 parts, aluminum oxide, silicon oxide 19 parts, ferric oxide 25 parts, zirconium white 21 parts, 11 parts, chromic oxide, lac 15 parts, ammonium oxalate 16 parts, diadust 9 parts.
Preparation method: get cerium oxide, zirconium white mixes with the ratio of water according to 1:3, slurries are stirred into after adding aluminum oxide, silicon oxide, ferric oxide, chromic oxide, lac mixing again, add after again ammonium oxalate being dissolved in water, 10min is stirred under normal temperature, reheat to 90 DEG C of reaction 50min, through comminution by gas stream after the roasting temperature 1.5h of 1000 DEG C, cooling, then mix with diadust and namely obtain jade polishing powder.
Claims (7)
1. a jade polishing powder, is characterized in that: it is made up of following raw material: cerium oxide 24-32 part, aluminum oxide 18-26 part, silicon oxide 15-23 part, ferric oxide 21-29 part, zirconium white 17-25 part, chromic oxide 7-15 part, lac 11-19 part, ammonium oxalate 12-20 part.
2. jade polishing powder according to claim 1, is characterized in that: described jade polishing powder is made up of following raw material: cerium oxide 26-30 part, aluminum oxide 20-24 part, silicon oxide 17-21 part, ferric oxide 23-27 part, zirconium white 19-23 part, chromic oxide 9-13 part, lac 13-17 part, ammonium oxalate 14-18 part.
3. jade polishing powder according to claim 1, is characterized in that: described jade polishing powder is made up of following raw material: cerium oxide 27-29 part, aluminum oxide 21-23 part, silicon oxide 18-20 part, ferric oxide 24-26 part, zirconium white 20-22 part, chromic oxide 10-12 part, lac 14-16 part, ammonium oxalate 15-17 part.
4. jade polishing powder according to claim 1, is characterized in that: described jade polishing powder is made up of following raw material: cerium oxide 28 parts, 22 parts, aluminum oxide, silicon oxide 19 parts, ferric oxide 25 parts, zirconium white 21 parts, 11 parts, chromic oxide, lac 15 parts, ammonium oxalate 16 parts.
5. jade polishing powder according to claim 1, is characterized in that: also containing diadust 9 parts in described jade polishing powder.
6. jade polishing powder according to claim 5, is characterized in that: the granularity of described diadust is 6-12um.
7. according to the arbitrary described jade polishing powder of claim 1-4, it is characterized in that: preparation method is: get cerium oxide, zirconium white mixes with the ratio of water according to 1:3, slurries are stirred into after adding aluminum oxide, silicon oxide, ferric oxide, chromic oxide, lac mixing again, add after again ammonium oxalate being dissolved in water, 10min is stirred under normal temperature, reheat to 90 DEG C of reaction 50min, through comminution by gas stream after the roasting temperature 1.5h of 1000 DEG C, cooling, then mix with diadust and namely obtain jade polishing powder.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410707729.2A CN104403573A (en) | 2014-11-27 | 2014-11-27 | Jade polishing powder |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201410707729.2A CN104403573A (en) | 2014-11-27 | 2014-11-27 | Jade polishing powder |
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| CN104403573A true CN104403573A (en) | 2015-03-11 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201410707729.2A Pending CN104403573A (en) | 2014-11-27 | 2014-11-27 | Jade polishing powder |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106566419A (en) * | 2016-10-28 | 2017-04-19 | 扬州翠佛堂珠宝有限公司 | Jade polishing powder |
| CN106566473A (en) * | 2016-10-28 | 2017-04-19 | 扬州翠佛堂珠宝有限公司 | Ruby grinding liquid |
| CN106675416A (en) * | 2016-11-30 | 2017-05-17 | 安徽电气集团股份有限公司 | Rare earth material polishing powder |
| CN111454666A (en) * | 2020-05-25 | 2020-07-28 | 安徽禾臣新材料有限公司 | High-suspension polishing powder and preparation method thereof |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1064495A (en) * | 1992-03-12 | 1992-09-16 | 武汉工业大学 | Spray abrasive for diamond |
| CN1699305A (en) * | 2005-05-19 | 2005-11-23 | 蒋文兰 | Water-preserving nutrient soil for indoor flowers |
| US20070093183A1 (en) * | 2005-10-19 | 2007-04-26 | Hitachi Chemical Co., Ltd. | Cerium oxide slurry, cerium oxide polishing slurry and method for polishing substrate using the same |
| CN101205455A (en) * | 2006-12-18 | 2008-06-25 | 天津鑫泰利科技发展有限公司 | Method for making jade abrasive paste |
| CN103923569A (en) * | 2014-05-06 | 2014-07-16 | 济南大学 | Preparation method of jade polishing powder |
-
2014
- 2014-11-27 CN CN201410707729.2A patent/CN104403573A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1064495A (en) * | 1992-03-12 | 1992-09-16 | 武汉工业大学 | Spray abrasive for diamond |
| CN1699305A (en) * | 2005-05-19 | 2005-11-23 | 蒋文兰 | Water-preserving nutrient soil for indoor flowers |
| US20070093183A1 (en) * | 2005-10-19 | 2007-04-26 | Hitachi Chemical Co., Ltd. | Cerium oxide slurry, cerium oxide polishing slurry and method for polishing substrate using the same |
| CN101205455A (en) * | 2006-12-18 | 2008-06-25 | 天津鑫泰利科技发展有限公司 | Method for making jade abrasive paste |
| CN103923569A (en) * | 2014-05-06 | 2014-07-16 | 济南大学 | Preparation method of jade polishing powder |
Non-Patent Citations (1)
| Title |
|---|
| 陈兴汉: "宝石加工工艺简介(二)", 《江西地质科技》 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106566419A (en) * | 2016-10-28 | 2017-04-19 | 扬州翠佛堂珠宝有限公司 | Jade polishing powder |
| CN106566473A (en) * | 2016-10-28 | 2017-04-19 | 扬州翠佛堂珠宝有限公司 | Ruby grinding liquid |
| CN106675416A (en) * | 2016-11-30 | 2017-05-17 | 安徽电气集团股份有限公司 | Rare earth material polishing powder |
| CN111454666A (en) * | 2020-05-25 | 2020-07-28 | 安徽禾臣新材料有限公司 | High-suspension polishing powder and preparation method thereof |
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Application publication date: 20150311 |